CN103084051A - Scrubbing tower used for acidic and alkaline exhaust gas of semiconductor plants - Google Patents
Scrubbing tower used for acidic and alkaline exhaust gas of semiconductor plants Download PDFInfo
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- CN103084051A CN103084051A CN2011103416405A CN201110341640A CN103084051A CN 103084051 A CN103084051 A CN 103084051A CN 2011103416405 A CN2011103416405 A CN 2011103416405A CN 201110341640 A CN201110341640 A CN 201110341640A CN 103084051 A CN103084051 A CN 103084051A
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- scrubbing tower
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- cleaning agent
- circulation cleaning
- agent case
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Abstract
The invention discloses a scrubbing tower used for acidic and alkaline exhaust gas of semiconductor plants. The scrubbing tower comprises a circulation detergent box. A porous separation plate is arranged at the middle of the circulation detergent box. The part of the circulation detergent box below the separation plate is used for collecting a detergent. A filling material used for increasing the contact area between the acidic and alkaline exhaust gas and the detergent is arranged on the separation plate. The scrubbing tower also comprises a circulation pump and a circulation pipeline. The circulation pump is connected with the circulation detergent box through the circulation pipeline, and is used for driving the circulation flow of the detergent. The scrubbing tower also comprises a liquidometer which is arranged on the lower part of the circulation detergent box and is connected with the circulation detergent box through a connection device. A filtering device is arranged on the connection device. With the scrubbing tower provided by the invention, impurities and scraps of filling materials can be effectively prevented from entering the liquidometer and damaging the liquidometer; and scrubbing tower scrubbing effect is prevented from being affected by excessively low liquid level in the scrubbing tower. The scrubbing tower has a simple structure, and provides an excellent processing effect upon semiconductor plant acidic and alkaline exhaust gases.
Description
Technical field
The present invention relates to semiconductor applications, relate in particular to a kind of scrubbing tower of the Acidity of Aikalinity exhaust for the semiconductor factory building.
Background technology
The gas that the process gases system of the toilets such as semiconductor factory building discharges is Acidity of Aikalinity usually, pollutes if directly be discharged into can produce in environment, therefore, can adopt scrubbing tower that this Acidity of Aikalinity exhaust is processed.The Acidity of Aikalinity exhaust when the scrubbing tower with its in washing agent generation chemical reaction, the Acidity of Aikalinity composition that is comprised with removal.
In scrubbing tower, the moisturizing of washing agent liquid level and draining etc. are controlled by the liquid level gauge interlock.The scrubbing tower of most of factory building is installed in outdoor, after long-term operation, can have a large amount of foreign material in the washing agent in scrubbing tower.In addition, in order to increase the treatment effeciency of scrubbing tower, usually can be provided with filler in scrubbing tower, the phenomenon of embrittlement fragmentation can occur in filler after long-term work.If the broken thing of above-mentioned foreign material and filler etc. enters liquid level gauge and in time do not process, may cause the liquid level gauge ball float to block, and cause liquid level gauge can't correctly react the liquid level of washing agent in scrubbing tower.Its consequence is that in time moisturizing can have a strong impact on the clean result of scrubbing tower if liquid level is too low, and then environment is caused adverse influence.
Therefore, need a kind of scrubbing tower of the Acidity of Aikalinity exhaust for the semiconductor factory building to address the above problem.
Summary of the invention
In order to overcome above-mentioned the deficiencies in the prior art, the invention provides a kind of scrubbing tower of the Acidity of Aikalinity exhaust for the semiconductor factory building, described scrubbing tower comprises:
Circulation cleaning agent case, the middle part of described circulation cleaning agent case is provided with the dividing plate of porous, the described circulation cleaning agent case of described dividing plate below is used for collecting washing agent, is provided with the filler be used to the contact area that increases described Acidity of Aikalinity exhaust and described washing agent on described dividing plate;
Circulating pump and circulation line, described circulating pump is connected with described circulation cleaning agent case by described circulation line, is used for driving described washing agent and circulates; And
Liquid level gauge, described liquid level gauge are arranged on the bottom of described circulation cleaning agent case, and are connected with described circulation cleaning agent case by jockey, are provided with filter on described jockey.
Preferably, described jockey comprises the first flange ring on the inlet tube that is arranged on described liquid level gauge, is arranged on the second flange ring on the outlet of described circulation cleaning agent case and the connector that is used for connecting described the first flange ring and described the second flange ring.
Preferably, described filter is arranged between described the first flange ring and described the second flange ring.
Preferably, described filter is screen pack.
Preferably, described screen pack is made by nonmetallic materials.
Preferably, described screen pack is made by the nonwoven braided material.
Preferably, described filler is the filler of Te Laruide ring structure.
Preferably, the entrance of described circulation line in described circulation cleaning agent case is arranged on the top of described washing agent circulating box, and the porch of described circulation line is provided with nozzle.
Preferably, the front-end and back-end of described circulation cleaning agent case are respectively arranged with gas access and gas vent, discharge so that described Acidity of Aikalinity exhaust enters from described gas access via described filler and from described gas vent.
Broken thing that not only can effectively prevent foreign material and filler according to the scrubbing tower of the Acidity of Aikalinity exhaust for the semiconductor factory building of the present invention etc. enters liquid level gauge and with its damage, and then avoid due to the too low clean result that affects scrubbing tower of liquid level in scrubbing tower, also have simple in structure, to the advantages such as Acidity of Aikalinity pump-down process effect excellence of semiconductor factory building.
Introduced the concept of a series of reduced forms in the summary of the invention part, this will further describe in specific embodiment part.Content part of the present invention does not also mean that key feature and the essential features that will attempt to limit technical scheme required for protection, does not more mean that the protection domain of attempting to determine technical scheme required for protection.
Below in conjunction with accompanying drawing, describe advantages and features of the invention in detail.
Description of drawings
Following accompanying drawing of the present invention is used for understanding the present invention at this as a part of the present invention.Shown in the drawings of embodiments of the invention and description thereof, be used for explaining principle of the present invention.In the accompanying drawings,
Fig. 1 is the schematic diagram according to the scrubbing tower of the Acidity of Aikalinity exhaust that is used for the semiconductor factory building of one embodiment of the present invention; And
Fig. 2 is the zoomed-in view of regional A in Fig. 1.
The specific embodiment
In the following description, a large amount of concrete details have been provided in order to more thorough understanding of the invention is provided.Yet, it will be apparent to one skilled in the art that the present invention can need not one or more these details and be implemented.In other example, for fear of obscuring with the present invention, be not described for technical characterictics more well known in the art.
In order thoroughly to understand the present invention, detailed structure will be proposed in following description.Obviously, execution of the present invention is not limited to the specific details that those skilled in the art has the knack of.Preferred embodiment of the present invention is described in detail as follows, yet except these were described in detail, the present invention can also have other embodiments.
Fig. 1 is the schematic diagram according to the scrubbing tower of the Acidity of Aikalinity exhaust that is used for the semiconductor factory building of one embodiment of the present invention.Below in conjunction with Fig. 1, the scrubbing tower (hereinafter to be referred as scrubbing tower) according to the Acidity of Aikalinity exhaust for the semiconductor factory building of the present invention is described in detail.As shown in Figure 1, scrubbing tower 100 comprises circulation cleaning agent case 110, circulating pump 120, circulation line 130 and liquid level gauge 140.
The middle part of circulation cleaning agent case 110 is provided with the dividing plate 111 of porous, and the position of the dividing plate 111 shown in figure in circulation cleaning agent case 110 is only exemplary, and those skilled in the art can reasonably arrange dividing plate 111 according to needs such as treatment effeciencies.The circulation cleaning agent case 110 of dividing plate 111 belows is used for collecting washing agent, hereinafter will be described in detail this collecting action.Be provided with the filler 112 for the contact area that increases Acidity of Aikalinity exhaust and washing agent on dividing plate 111, dividing plate 111 plays the supporting role to filler 112.As example, the filler of filler 112 Ke Yi Wei Te Laruide ring structures is to increase better the contact area of Acidity of Aikalinity exhaust and washing agent.
Circulating pump 120 is connected with circulation cleaning agent case 110 by circulation line 130, is used for driving washing agent and circulates.Arrow method shown in Fig. 1 is the flow direction of washing agent.As example, the entrance of circulation line 130 in circulation cleaning agent case 110 is arranged on the top of washing agent circulating box 110, and the porch of circulation line 130 is provided with nozzle 131.Circulating pump 120 drives washing agent and flows from bottom to top along circulation line 130, and enters circulation cleaning agent case 110 from the top of circulation cleaning case 110.Being arranged on the top of circulation cleaning agent case 110 and nozzle 130 is set in the porch by the entrance with circulation line 130 to make washing agent equably by filler 112, so that the Acidity of Aikalinity exhaust when the filler 112 can with washing agent equably, reaction fully, and then improve treatment effect to the Acidity of Aikalinity exhaust.
As example, the front-end and back-end of circulation cleaning agent case 110 are respectively arranged with gas access (not shown) and gas vent (not shown), discharge so that the Acidity of Aikalinity exhaust enters from the gas access via filler 112 and from gas vent.The technique of painting to circulation cleaning agent case 110 in Fig. 1 is appreciated that it is the cutaway view along its cross section of circulation cleaning agent case 110, gas access and gas vent are separately positioned on the two ends of circulation cleaning agent case 110, so that acidic and alkaline gas flows along the axis direction vertical with cross section.
Washing agent is driven by circulating pump 120, flows along circulation line 130, and is sprayed by nozzle 131 from the top of circulation cleaning agent case 110.To falling in filler 112, the washing agent that falls gradually in filler 112 is collected in the circulation cleaning agent case 110 of dividing plate 111 belows after fully reacting with the acidic and alkaline gas that flows along axis direction the washing agent that sprays due to Action of Gravity Field.The washing agent that is collected in circulation cleaning agent case 110 rises and again enters into circulation cleaning agent case 110 from the top of circulation cleaning agent case 110 along circulation line 130 under the driving of circulating pump 120, carries out next circulation.
Fig. 2 is the zoomed-in view of regional A in Fig. 1.Below in conjunction with jockey 150 and the filter of Fig. 2 detailed description according to one embodiment of the present invention.Should be noted in the discussion above that parts identical with Fig. 1 in Fig. 2 adopt identical Reference numeral.
As shown in Figure 2, jockey 150 comprises the first flange ring 151, the second flange ring 152 and connector 153.The first flange ring 151 is arranged on the inlet tube of liquid level gauge 140, and the second flange ring 152 is arranged on the outlet of circulation cleaning agent case 110, the first flange ring 151 be connected flange ring 152 and connect by connector 153.Connector 153 can be bolt or screw etc.As example, filter 200 is arranged between the first flange ring 151 and the second flange ring 152.Filter 200 can be this area sedimeter commonly used.Preferably, filter 200 can be screen pack, to reduce costs, simplifies and installs.In the situation that filter 200 is screen pack, connector 153 passes the first flange ring 151, screen pack and the second flange ring 152, and screen pack is fixed on jockey 150.Further, because washing agent is Acidity of Aikalinity, therefore, screen pack is preferably made by nonmetallic materials.More preferably, screen pack is made by the nonwoven braided material.Use the nonwoven braided material as screen pack have good filtration effect, material source is abundant and the advantage such as with low cost.
Broken thing that not only can effectively prevent foreign material and filler according to the scrubbing tower of the Acidity of Aikalinity exhaust for the semiconductor factory building of the present invention etc. enters liquid level gauge and with its damage, and then avoid due to the too low clean result that affects scrubbing tower of liquid level in scrubbing tower, also have simple in structure, to the advantages such as Acidity of Aikalinity pump-down process effect excellence of semiconductor factory building.
The present invention is illustrated by above-described embodiment, but should be understood that, above-described embodiment just is used for for example and the purpose of explanation, but not is intended to the present invention is limited in described scope of embodiments.It will be appreciated by persons skilled in the art that in addition the present invention is not limited to above-described embodiment, can also make more kinds of variants and modifications according to instruction of the present invention, these variants and modifications all drop in the present invention's scope required for protection.Protection scope of the present invention is defined by the appended claims and equivalent scope thereof.
Claims (9)
1. a scrubbing tower that is used for the Acidity of Aikalinity exhaust of semiconductor factory building, is characterized in that, described scrubbing tower comprises:
Circulation cleaning agent case, the middle part of described circulation cleaning agent case is provided with the dividing plate of porous, the described circulation cleaning agent case of described dividing plate below is used for collecting washing agent, is provided with the filler be used to the contact area that increases described Acidity of Aikalinity exhaust and described washing agent on described dividing plate;
Circulating pump and circulation line, described circulating pump is connected with described circulation cleaning agent case by described circulation line, is used for driving described washing agent and circulates; And
Liquid level gauge, described liquid level gauge are arranged on the bottom of described circulation cleaning agent case, and are connected with described circulation cleaning agent case by jockey, are provided with filter on described jockey.
2. according to scrubbing tower claimed in claim 1, it is characterized in that, described jockey comprises the first flange ring on the inlet tube that is arranged on described liquid level gauge, be arranged on the second flange ring on the outlet of described circulation cleaning agent case and the connector that is used for connecting described the first flange ring and described the second flange ring.
3. according to scrubbing tower claimed in claim 2, it is characterized in that, described filter is arranged between described the first flange ring and described the second flange ring.
4. according to scrubbing tower claimed in claim 3, it is characterized in that, described filter is screen pack.
5. according to scrubbing tower claimed in claim 4, it is characterized in that, described screen pack is made by nonmetallic materials.
6. according to scrubbing tower claimed in claim 5, it is characterized in that, described screen pack is made by the nonwoven braided material.
7. according to scrubbing tower claimed in claim 1, it is characterized in that, described filler is the filler of Te Laruide ring structure.
8. according to scrubbing tower claimed in claim 1, it is characterized in that, the entrance of described circulation line in described circulation cleaning agent case is arranged on the top of described washing agent circulating box, and the porch of described circulation line is provided with nozzle.
9. according to scrubbing tower claimed in claim 1, it is characterized in that, the front-end and back-end of described circulation cleaning agent case are respectively arranged with gas access and gas vent, discharge so that described Acidity of Aikalinity exhaust enters from described gas access via described filler and from described gas vent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103416405A CN103084051A (en) | 2011-11-03 | 2011-11-03 | Scrubbing tower used for acidic and alkaline exhaust gas of semiconductor plants |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103416405A CN103084051A (en) | 2011-11-03 | 2011-11-03 | Scrubbing tower used for acidic and alkaline exhaust gas of semiconductor plants |
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| Publication Number | Publication Date |
|---|---|
| CN103084051A true CN103084051A (en) | 2013-05-08 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2011103416405A Pending CN103084051A (en) | 2011-11-03 | 2011-11-03 | Scrubbing tower used for acidic and alkaline exhaust gas of semiconductor plants |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015141936A1 (en) * | 2014-03-17 | 2015-09-24 | (주)세움 | Scrubber nozzle testing device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2347143Y (en) * | 1998-08-06 | 1999-11-03 | 王俊杰 | Level meter coupling with throttle valve and cleanable filter |
| CN101032678A (en) * | 2006-03-07 | 2007-09-12 | 黄立维 | Method for eliminating oxynitride from air flow and the special equipment thereof |
| CN101496993A (en) * | 2009-01-07 | 2009-08-05 | 上海水天环保科技有限公司 | Method and device for processing malodorous gas by active bamboo charcoal-H2O2 complex phase catalytic oxidation |
| CN201823440U (en) * | 2010-08-31 | 2011-05-11 | 宇星科技发展(深圳)有限公司 | Acid-base waste gas purifying and absorbing tower |
| KR20110067866A (en) * | 2009-12-15 | 2011-06-22 | (주)하멜 | Gas scrubber having improved protecting function of outlet pipe |
-
2011
- 2011-11-03 CN CN2011103416405A patent/CN103084051A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2347143Y (en) * | 1998-08-06 | 1999-11-03 | 王俊杰 | Level meter coupling with throttle valve and cleanable filter |
| CN101032678A (en) * | 2006-03-07 | 2007-09-12 | 黄立维 | Method for eliminating oxynitride from air flow and the special equipment thereof |
| CN101496993A (en) * | 2009-01-07 | 2009-08-05 | 上海水天环保科技有限公司 | Method and device for processing malodorous gas by active bamboo charcoal-H2O2 complex phase catalytic oxidation |
| KR20110067866A (en) * | 2009-12-15 | 2011-06-22 | (주)하멜 | Gas scrubber having improved protecting function of outlet pipe |
| CN201823440U (en) * | 2010-08-31 | 2011-05-11 | 宇星科技发展(深圳)有限公司 | Acid-base waste gas purifying and absorbing tower |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015141936A1 (en) * | 2014-03-17 | 2015-09-24 | (주)세움 | Scrubber nozzle testing device |
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Application publication date: 20130508 |