CN103060873B - Electrodip process prepares the method for hierarchy porous array ZnO film - Google Patents
Electrodip process prepares the method for hierarchy porous array ZnO film Download PDFInfo
- Publication number
- CN103060873B CN103060873B CN201310016812.0A CN201310016812A CN103060873B CN 103060873 B CN103060873 B CN 103060873B CN 201310016812 A CN201310016812 A CN 201310016812A CN 103060873 B CN103060873 B CN 103060873B
- Authority
- CN
- China
- Prior art keywords
- template
- conductive glass
- fto conductive
- zno film
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Laminated Bodies (AREA)
- Catalysts (AREA)
Abstract
The present invention relates to a kind of method that electrodip process prepares hierarchy porous array ZnO film: 1), on FTO conductive glass, assemble the number of plies PS template different with particle diameter respectively, and it is dry gained template to be put into after drying at room temperature vacuum drying oven; 2), using the obtained masterplate of step 1) as working electrode, being to electrode with platinized platinum, is reference electrode with saturated calomel electrode, take zinc salt solution as deposit fluid, and-1.3V deposits 10 ~ 30min; 3), by step 2) template secondary deionized water after galvanic deposit rinses, and puts into vacuum drying oven drying after drying at room temperature; 4), soak in toluene solution to dissolve and remove PS template, ZnO film is taken out.The present invention can prepare the controlled ZnO porous array film with hierarchy of the number of plies and aperture, reduces operative technique difficulty, achieve with electrodip process prepared layer number and aperture controlled, and there is the ZnO porous array film of hierarchy.
Description
Technical field
The present invention relates to field of nano material preparation, be specifically related to a kind of method that electrodip process prepares hierarchy porous array ZnO film.
Background technology
The zinc oxide (ZnO) of hexagonal wurtzite structure is a kind of wide band gap semiconducter, has a wide range of applications in luminescence, sensor, super hydrophobic material, dye sensitization solar battery, photocatalytic degradation organic waste water etc.ZnO, as one of conventional functional materials, has the advantages such as nontoxic, catalytic activity is high, oxidation capacity is strong.The performance of ZnO film material is slightly poorer than powder body material, but is convenient to thin-film material and has easily separated and advantage that is reusable edible.
At present, the method for making ZnO film mainly contains magnetron sputtering method, chemical Vapor deposition process, hydrothermal synthesis method, sol-gel method, thermal decomposition method, electrochemical deposition method etc.Wherein electrochemical deposition method simple to operate, cost is low, can operate at low temperatures, be applicable to scale operation, be a kind of competitive preparation method.In addition, preparation has the porous micro/nano structure material of high-specific surface area is one of effective ways of the performance improving thin-film material.
Preparation for ZnO array film adopts aluminum oxide (AAO) template to prepare usually, but this method need previously prepared go out high-quality porous array alumina formwork, but also needing good template transfer technology, preparation process requires higher to the basic skills of operator.
The method of another making ZnO porous-film is using the bubble hydrogen of cathodic reduction as dynamic template, utilizes electrochemical deposition method to prepare.Although this method is simple to operate, and surface topography and the microtexture of settled layer can be controlled by changing galvanic deposit parameter, but wayward aperture size.
Summary of the invention
The object of the invention is the deficiency for solving the problems of the technologies described above, providing a kind of electrodip process to prepare the method for hierarchy porous array ZnO film, simple to operate, aperture and the controlled ZnO porous array film of the number of plies can be prepared.
The present invention is the deficiency solved the problems of the technologies described above, and the technical scheme adopted is: electrodip process prepares the method for hierarchy porous array ZnO film, comprises the following steps:
1), on FTO conductive glass, assemble the number of plies PS template different with particle diameter respectively, wherein the area of PS template is 1/2 of FTO conductive glass area; And gained template is put into after drying at room temperature vacuum drying oven in 110 DEG C of dryings 10 minutes, obtain the PS template being carried on FTO conductive glass;
2) the PS template being carried on FTO conductive glass, using step 1) obtained is as working electrode, and being to electrode with platinized platinum, take saturated calomel electrode as reference electrode, take zinc salt solution as deposit fluid, deposit fluid temperature is 0 DEG C, and deposition voltage is-1.3V, deposition 10 ~ 30min;
Wherein, Zn in zinc salt solution
2+volumetric molar concentration be 10mmol/L, NO
3 -1volumetric molar concentration be 0.2mol/L, zinc salt solution, pH is 5.0;
3), by step 2) working electrode secondary deionized water after galvanic deposit rinses, and puts into vacuum drying oven 80 DEG C of dryings 2 hours after drying at room temperature;
4) working electrode, after step 3) process soaks 30min and dissolves removal PS template in toluene solution, is taken out by ZnO film afterwards, in stink cupboard, volatilize residual toluene with tweezers.
The concrete grammar assembling the number of plies PS template different with particle diameter in described step 1) on FTO conductive glass is respectively:
A, get slide glass cleaning after, be dipped vertically in the PS aqueous solution and leave standstill 2 ~ 3min, then vertically pull out with the pull rate of 4cm/min, dry under room temperature, obtain monolayer array template, then monolayer array template is slowly inserted in water with 45 ° of angles of inclination, PS bead automatically peel off and again with form of single sheet regular be arranged on the water surface, obtain the individual layer PS template floating on the water surface;
B, get FTO conductive glass as carrier with tweezers, the place of PS is not had to insert water with 45 ° of obliquitys from the water surface in carrier after cleaning up, then carrier is slowly moved to below PS template, slowly mention afterwards, PS can be assembled on FTO conductive glass again, substrate is placed in vacuum drying oven 110 DEG C of dry 10min, obtains the PS template being carried on FTO conductive glass;
Concrete grammar is: getting the FTO conductive glass cleaned up with tweezers does not have the place of PS to insert (water herein refers to the floating aqueous solution having PS single tier templates obtained in step) water with 45 ° of obliquitys from the water surface it, then FTO conductive glass is slowly moved to below PS template, FTO conductive glass inserts after below PS template, mobile FTO conductive glass makes itself and plane-parallel, then slowly mention, PS can be assembled on FTO conductive glass again.
C, the PS choosing different-grain diameter prepare the PS aqueous solution, and repeating step operation preparation a) floats on the individual layer PS template of the water surface, and the PS template being carried on FTO conductive glass obtained with step b) is for carrier, repeating step b) operation, obtain two-layer PS template;
D, with the obtained two-layer PS template of step c) for carrier, repeating step c) operation steps obtain multilayer PS template.
Described zinc salt solution is Zn (NO
3)
2and KNO
3mixing solutions, use HNO
3or KOH adjust ph.
beneficial effect
The present invention can prepare the controlled ZnO porous array film with hierarchy of the number of plies and aperture, reduces operative technique difficulty, achieve with electrodip process prepared layer number and aperture controlled, and there is the ZnO porous array film of hierarchy.
Accompanying drawing explanation
Figure 1 shows that technical solution of the present invention demonstration schematic diagram;
Figure 2 shows that the SEM photo of the embodiment of the present invention 1 gained single layered porous array ZnO film;
Figure 3 shows that the SEM photo of the embodiment of the present invention 1 gained single layered porous array ZnO film;
Figure 4 shows that the SEM photo of the embodiment of the present invention 2 gained double-layer network porous array ZnO film;
Figure 5 shows that the SEM photo of the embodiment of the present invention 2 gained double-layer network porous array ZnO film;
Figure 6 shows that the SEM photo of the double-deck classifying porous array structure ZnO film of the embodiment of the present invention 3 gained;
Figure 7 shows that the SEM photo of the double-deck classifying porous array structure ZnO film of the embodiment of the present invention 3 gained;
Figure 8 shows that the XRD diffraction spectrogram of the embodiment of the present invention 3 products obtained therefrom.
Embodiment
Electrodip process prepares the method for hierarchy porous array ZnO film, comprises the following steps:
1), on FTO conductive glass, assemble the number of plies PS template different with particle diameter respectively, wherein the area of template is 1/2 of FTO conductive glass; And gained template is put into after drying at room temperature vacuum drying oven in 110 DEG C of dryings 10 minutes, concrete grammar is:
A, get slide glass cleaning after, be dipped vertically in the PS aqueous solution and leave standstill 2 ~ 3min, then vertically pull out with the pull rate of 4cm/min, dry under room temperature, obtain monolayer array template, then monolayer array template is slowly inserted in water with 45 ° of angles of inclination, PS bead automatically peel off and again with form of single sheet regular be arranged on the water surface, obtain the individual layer PS template floating on the water surface;
B, get another substrate as carrier with tweezers, the place of PS is not had to insert water with 45 ° of obliquitys from the water surface in carrier after cleaning up, then carrier is slowly moved to below PS template, slowly mention afterwards, PS can be assembled in substrate again, substrate is placed in vacuum drying oven 110 DEG C of dry 10min, obtains the PS template being carried on substrate;
During rigging, area is a bit larger tham 1/2, and redundance can be wiped with filter paper.A blank sheet of paper can be transferred at FTO glass, paper marks graduated straight line as scale by stroke one.
C, the PS choosing different-grain diameter prepare the PS aqueous solution, and repeating step operation preparation a) floats on the individual layer PS template of the water surface, and the PS template being carried on substrate obtained with step b) is for carrier, repeating step b) operation, obtain two-layer PS template;
D, with the obtained two-layer PS template of step c) for carrier, repeating step c) operation steps obtain multilayer PS template;
2), using the obtained template of step 1) as working electrode, be to electrode with platinized platinum, is reference electrode with saturated calomel electrode, take zinc salt solution as deposit fluid, and deposit fluid temperature is 0 DEG C, and deposition voltage is-1.3V, deposits 10 ~ 30min;
Wherein, Zn in zinc salt solution
2+volumetric molar concentration be 10mmol/L, NO
3 -1volumetric molar concentration be 0.2mol/L, zinc salt solution, pH is 5.0;
3), by step 2) template secondary deionized water after galvanic deposit rinses, and puts into vacuum drying oven 80 DEG C of dryings 2 hours after drying at room temperature;
4) template, after step 3) process is soaked 30min and is dissolved removal PS template in toluene solution, is taken out by ZnO film afterwards, in stink cupboard, volatilize residual toluene with tweezers.
Described zinc salt solution is Zn (NO
3)
2and KNO
3mixing solutions, use HNO
3or KOH adjust ph.
Fig. 1 is material preparation technology schematic diagram of the present invention.As shown in Figure 1: the present invention can prepare single layered porous ZnO array through route a; Two-layer (or multilayer) three-dimensional network porous ZnO array can be prepared through route b; Multilayer hierarchical structure porous ZnO array can be prepared through route c.
embodiment 1
Electrodip process prepares the method for hierarchy porous array ZnO film, comprises the following steps:
1), on FTO conductive glass, assemble the number of plies PS template different with particle diameter respectively, concrete grammar is:
A, get slide glass cleaning after, being dipped vertically into PS particle diameter is leave standstill 2 ~ 3min in the PS aqueous solution (the PS mass concentration of the PS aqueous solution is 5%) of 2.5 μm, then vertically pull out with the pull rate of 4cm/min, dry under room temperature, obtain monolayer array template, then monolayer array template is slowly inserted in water with 45 ° of angles of inclination, PS bead automatically peel off and again with form of single sheet regular be arranged on the water surface, obtain the individual layer PS template floating on the water surface;
B, (FTO conductive glass is of a size of 2x1cm to get another FTO conductive glass with tweezers
2) as carrier, the place of PS is not had to insert water with 45 ° of obliquitys from the water surface in carrier after cleaning up, then carrier is slowly moved to below PS template, slowly mention afterwards, PS can be assembled on FTO conductive glass again, substrate is placed in vacuum drying oven 110 DEG C of dry 10min, (area of template is 1x1cm to obtain being carried on the PS template of FTO conductive glass
2);
2), using the obtained template of step 1) as working electrode, with platinized platinum (1x1cm
2) be to electrode, being reference electrode with saturated calomel electrode, take zinc salt solution as deposit fluid, and deposit fluid temperature is 0 DEG C, and deposition voltage is-1.3V, deposition 10min;
Wherein, Zn in zinc salt solution
2+volumetric molar concentration be 10mmol/L, NO
3 -1volumetric molar concentration be 0.2mol/L, zinc salt solution, pH is 5.0;
Described zinc salt solution is Zn (NO
3)
2and KNO
3mixing solutions, use HNO
3or KOH adjust ph.
3), by step 2) template secondary deionized water after galvanic deposit rinses, and puts into vacuum drying oven 80 DEG C of dryings 2 hours after drying at room temperature;
4) template, after step 3) process is soaked 30min and is dissolved removal PS template in toluene solution, is taken out by ZnO film afterwards, in stink cupboard, volatilizes residual toluene, obtain product with tweezers.
Fig. 2, Fig. 3 obtains by embodiment 1 the SEM photo of product.As seen from the figure, present method can obtain large-area ZnO porous membrane, and porous-film is individual layer, and aperture is 2.5 μm, identical with PS template size, illustrates by the control PS template number of plies and particle diameter to control the number of plies and the aperture of ZnO film.
embodiment 2
Electrodip process prepares the method for hierarchy porous array ZnO film, comprises the following steps:
1), on FTO conductive glass, assemble the number of plies PS template different with particle diameter respectively, concrete grammar is:
A, get slide glass cleaning after, being dipped vertically into PS particle diameter is leave standstill 2 ~ 3min in the PS aqueous solution of 2.5 μm, then vertically pull out with the pull rate of 4cm/min, dry under room temperature, obtain monolayer array template, then monolayer array template is slowly inserted in water with 45 ° of angles of inclination, PS bead automatically peel off and again with form of single sheet regular be arranged on the water surface, obtain the individual layer PS template floating on the water surface;
B, (FTO conductive glass is of a size of 2x1cm to get another FTO conductive glass with tweezers
2) as carrier, the place of PS is not had to insert water with 45 ° of obliquitys from the water surface in carrier after cleaning up, then carrier is slowly moved to below PS template, slowly mention afterwards, PS can be assembled on FTO conductive glass again, substrate is placed in vacuum drying oven 110 DEG C of dry 10min, (area of template is 1x1cm to obtain being carried on the PS template of FTO conductive glass
2);
C, to choose particle diameter be that the PS of 2.5 μm prepares the PS aqueous solution, repeating step operation preparation a) floats on the individual layer PS template of the water surface, and the PS template being carried on FTO conductive glass obtained with step b) is for carrier, repeating step b) operation, obtain two-layer PS template;
2), using the obtained template of step 1) as working electrode, with platinized platinum (1x1cm
2) be to electrode, being reference electrode with saturated calomel electrode, take zinc salt solution as deposit fluid, and deposit fluid temperature is 0 DEG C, and deposition voltage is-1.3V, heavy 20min;
Wherein, Zn in zinc salt solution
2+volumetric molar concentration be 10mmol/L, NO
3 -1volumetric molar concentration be 0.2mol/L, zinc salt solution, pH is 5.0; Described zinc salt solution is Zn (NO
3)
2and KNO
3mixing solutions, use HNO
3or KOH adjust ph.
3), by step 2) template secondary deionized water after galvanic deposit rinses, and puts into vacuum drying oven 80 DEG C of dryings 2 hours after drying at room temperature;
4) template, after step 3) process is soaked 30min and is dissolved removal PS template in toluene solution, is taken out by ZnO film afterwards, in stink cupboard, volatilizes residual toluene, obtain product with tweezers.
Fig. 4, Fig. 5 obtains by embodiment 2 the SEM photo of product.As seen from the figure, present method can obtain large-area ZnO porous membrane, and porous-film is double-layer network structure, and aperture is 2.5 μm, identical with PS template size, illustrates by the control PS template number of plies and particle diameter to control the number of plies and the aperture of ZnO film.
embodiment 3
Electrodip process prepares the method for hierarchy porous array ZnO film, comprises the following steps:
1), on FTO conductive glass, assemble the number of plies PS template different with particle diameter respectively, concrete grammar is:
A, get slide glass cleaning after, being dipped vertically into PS particle diameter is leave standstill 2 ~ 3min in the PS aqueous solution of 2.5 μm, then vertically pull out with the pull rate of 4cm/min, dry under room temperature, obtain monolayer array template, then monolayer array template is slowly inserted in water with 45 ° of angles of inclination, PS bead automatically peel off and again with form of single sheet regular be arranged on the water surface, obtain the individual layer PS template floating on the water surface;
B, (FTO conductive glass is of a size of 2x1cm to get another FTO conductive glass with tweezers
2) as carrier, the place of PS is not had to insert water with 45 ° of obliquitys from the water surface in carrier after cleaning up, then carrier is slowly moved to below PS template, slowly mention afterwards, PS can be assembled on FTO conductive glass again, substrate is placed in vacuum drying oven 110 DEG C of dry 10min, (area of template is 1x1cm to obtain being carried on the PS template of FTO conductive glass
2);
C, to choose particle diameter be that the PS of 500nm prepares the PS aqueous solution, repeating step operation preparation a) floats on the individual layer PS template of the water surface, and the PS template being carried on FTO conductive glass obtained with step b) is for carrier, repeating step b) operation, obtain two-layer PS template;
2), using the obtained template of step 1) as working electrode, with platinized platinum (1x1cm
2) be to electrode, being reference electrode with saturated calomel electrode, take zinc salt solution as deposit fluid, and deposit fluid temperature is 0 DEG C, and deposition voltage is-1.3V, heavy 30min;
Wherein, Zn in zinc salt solution
2+volumetric molar concentration be 10mmol/L, NO
3 -1volumetric molar concentration be 0.2mol/L, zinc salt solution, pH is 5.0; Described zinc salt solution is Zn (NO
3)
2and KNO
3mixing solutions, use HNO
3or KOH adjust ph.
3), by step 2) template secondary deionized water after galvanic deposit rinses, and puts into vacuum drying oven 80 DEG C of dryings 2 hours after drying at room temperature;
4) template, after step 3) process is soaked 30min and is dissolved removal PS template in toluene solution, is taken out by ZnO film afterwards, in stink cupboard, volatilizes residual toluene, obtain product with tweezers.
Fig. 6, Fig. 7 obtains by embodiment 3 the SEM photo of product.As seen from the figure, present method can obtain large-area ZnO porous membrane, porous-film is double-deck hierarchical network structure, aperture is respectively hole on 2.5 μm (bottom outlets) and 500nm(), identical with PS template size, illustrate by the control PS template number of plies and particle diameter to control the number of plies and the aperture of ZnO film.
Fig. 8 is the XRD diffraction spectrogram of embodiment 3 products obtained therefrom.As seen from the figure, products obtained therefrom of the present invention is wurtzite ZnO.
Claims (3)
1. electrodip process prepares the method for hierarchy porous array ZnO film, it is characterized in that: comprise the following steps:
1), on FTO conductive glass, assemble the number of plies PS template different with particle diameter respectively, wherein the area of PS template is 1/2 of FTO conductive glass area; And gained template is put into after drying at room temperature vacuum drying oven in 110 DEG C of dryings 10 minutes, obtain the PS template being carried on FTO conductive glass;
2) the PS template being carried on FTO conductive glass, using step 1) obtained is as working electrode, and being to electrode with platinized platinum, take saturated calomel electrode as reference electrode, take zinc salt solution as deposit fluid, deposit fluid temperature is 0 DEG C, and deposition voltage is-1.3V, deposition 10 ~ 30min;
Wherein, Zn in zinc salt solution
2+volumetric molar concentration be 10mmol/L, NO
3 -volumetric molar concentration be 0.2mol/L, zinc salt solution, pH is 5.0;
3), by step 2) working electrode secondary deionized water after galvanic deposit rinses, and puts into vacuum drying oven 80 DEG C of dryings 2 hours after drying at room temperature;
4) working electrode, after step 3) process soaks 30min and dissolves removal PS template in toluene solution, is taken out by ZnO film afterwards, in stink cupboard, volatilize residual toluene with tweezers.
2. electrodip process as claimed in claim 1 prepares the method for hierarchy porous array ZnO film, it is characterized in that: the concrete grammar assembling the number of plies PS template different with particle diameter in described step 1) on FTO conductive glass is respectively:
A, get slide glass cleaning after, be dipped vertically in the PS aqueous solution and leave standstill 2 ~ 3min, then vertically pull out with the pull rate of 4cm/min, dry under room temperature, obtain monolayer array template, then monolayer array template is slowly inserted in water with 45 ° of angles of inclination, PS bead automatically peel off and again with form of single sheet regular be arranged on the water surface, obtain the individual layer PS template floating on the water surface;
B, get FTO conductive glass as carrier with tweezers, the place of PS is not had to insert water with 45 ° of obliquitys from the water surface in carrier after cleaning up, then carrier is slowly moved to below PS template, slowly mention afterwards, PS can be assembled on FTO conductive glass again, substrate is placed in vacuum drying oven 110 DEG C of dry 10min, obtains the PS template being carried on FTO conductive glass;
C, the PS choosing different-grain diameter prepare the PS aqueous solution, and repeating step operation preparation a) floats on the individual layer PS template of the water surface, and the PS template being carried on FTO conductive glass obtained with step b) is for carrier, repeating step b) operation, obtain two-layer PS template;
D, with the obtained two-layer PS template of step c) for carrier, repeating step c) operation steps obtain multilayer PS template.
3. electrodip process as claimed in claim 1 prepares the method for hierarchy porous array ZnO film, it is characterized in that: described zinc salt solution is Zn (NO
3)
2and KNO
3mixing solutions, use HNO
3or KOH adjust ph.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310016812.0A CN103060873B (en) | 2013-01-17 | 2013-01-17 | Electrodip process prepares the method for hierarchy porous array ZnO film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310016812.0A CN103060873B (en) | 2013-01-17 | 2013-01-17 | Electrodip process prepares the method for hierarchy porous array ZnO film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103060873A CN103060873A (en) | 2013-04-24 |
| CN103060873B true CN103060873B (en) | 2016-03-30 |
Family
ID=48103757
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310016812.0A Expired - Fee Related CN103060873B (en) | 2013-01-17 | 2013-01-17 | Electrodip process prepares the method for hierarchy porous array ZnO film |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103060873B (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103320827B (en) * | 2013-06-13 | 2015-12-09 | 江苏大学 | A kind of preparation method of inorganic-salt-dopednano nano zinc oxide film |
| CN103422129B (en) * | 2013-07-24 | 2015-09-30 | 浙江大学 | A kind of by adding Ca 2+change the method for appearance of ZnO |
| CN106283191B (en) * | 2015-06-19 | 2018-11-06 | 中国科学院金属研究所 | A kind of preparation method of metal oxide porous monocrystalline array film |
| CN105836789B (en) * | 2016-01-15 | 2017-10-24 | 武汉理工大学 | A kind of method that original position prepares loose structure nanometic zinc oxide rod array |
| CN106449117B (en) * | 2016-09-08 | 2019-02-26 | 宁波华坤新材料科技有限公司 | Preparation method of transparent grid electrode |
| CN106498458B (en) * | 2016-12-30 | 2018-06-29 | 福建钢泓金属科技股份有限公司 | A kind of automatically cleaning stainless steel plate and its production method |
| CN109553162B (en) * | 2018-11-27 | 2021-08-20 | 昆明理工大学 | Stainless steel-based nano-array beta-PbO with ordered porous ZnO as template2Method for preparing electrode |
| CN111153602B (en) * | 2020-01-12 | 2022-05-17 | 常州大学 | Preparation method of basic zinc acetate film with hierarchical structure |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101497067A (en) * | 2009-01-16 | 2009-08-05 | 北京航空航天大学 | Preparation method for assembling large-area ordered microsphere template by liquid level swirl method |
| CN102199790A (en) * | 2010-03-23 | 2011-09-28 | 中国科学院合肥物质科学研究院 | Binary ordered colloidal crystal template and preparation method and use thereof |
-
2013
- 2013-01-17 CN CN201310016812.0A patent/CN103060873B/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101497067A (en) * | 2009-01-16 | 2009-08-05 | 北京航空航天大学 | Preparation method for assembling large-area ordered microsphere template by liquid level swirl method |
| CN102199790A (en) * | 2010-03-23 | 2011-09-28 | 中国科学院合肥物质科学研究院 | Binary ordered colloidal crystal template and preparation method and use thereof |
Non-Patent Citations (3)
| Title |
|---|
| 不同维度ZnO纳米结构的合成和光学性能研究;严鸿维;《中国博士学位论文数据库-工程科技I辑》;20090615;全文 * |
| 双模板法制备分级孔ZnO及其电致发光性能;陈小琴等;《功能材料》;20100930;第41卷(第9期);1494-1496页，1500页 * |
| 聚苯乙烯球模板辅助电沉积制备多孔片晶ZnO薄膜;刘志锋等;《硅酸盐学报》;20051231;第33卷(第12期);1478左栏最后一段，右栏第一段 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103060873A (en) | 2013-04-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103060873B (en) | Electrodip process prepares the method for hierarchy porous array ZnO film | |
| Dubal et al. | Effect of morphology on supercapacitive properties of chemically grown β-Ni (OH) 2 thin films | |
| CN105040025B (en) | Compound porous pucherite optoelectronic pole of double-metal hydroxide and preparation method thereof | |
| US10626518B2 (en) | Method for treating a surface of a metallic structure | |
| CN109440130A (en) | A kind of large-sized nanoporous BiVO4 light anode and the preparation method and application thereof | |
| Tian et al. | Facile preparation of aligned NiO nanotube arrays for electrochromic application | |
| CN101823759A (en) | Continuous large-area zinc oxide nano-sheet and preparation method thereof | |
| CN102174709B (en) | Three-dimensional metallic nickel nano tapered body array structure and preparation method thereof | |
| CN105226297B (en) | A kind of preparation method of classifying porous air electrode | |
| CN104588021A (en) | Preparation method and application of TiO2 photocatalytic coating | |
| CN103406248B (en) | The preparation method of copper substrate superhydrophobic surface structure | |
| CN102664107A (en) | Preparation method of nano-manganese dioxide electrode | |
| Liang et al. | Exploiting electrodeposited flower-like Zn4 (OH) 6SO4· 4H2O nanosheets as precursor for porous ZnO nanosheets | |
| Ou et al. | WO3· n H2O Crystals with Controllable Morphology/Phase and Their Optical Absorption Properties | |
| CN102651279B (en) | Preparation method of high-energy storage polymer nanotube capacitor array | |
| CN101624208A (en) | Method for preparing zinc oxide nanowire array based on coordination chemical reaction theory | |
| CN104846411B (en) | The method and its product of flower-like nanometer metal cobalt are prepared using anodic oxidation aluminium formwork | |
| CN102121130A (en) | ZnO nano slice/nano wire composite structure with photocatalysis characteristic and preparation method thereof | |
| US11408084B2 (en) | Thin film electrode containing nanostructured cobalt oxide for water splitting | |
| CN102534718A (en) | Method for preparing PbO2-modified TiO2 nanotube electrode | |
| CN104098147A (en) | Preparation of rose-shaped NiO nanometer particles through electrochemical method | |
| Gao et al. | Study on the crystallinity and oxidation states of nanoporous anodized tin oxide films regulated by annealing treatment for supercapacitor application | |
| Liu et al. | Fabrication of ZnO nanostructures sensitized with CdS quantum dots for photovoltaic application using a convenient solution method | |
| CN105420761B (en) | Method for preparing various metal Janus particles by self-reducing on aluminum oxide template | |
| JP2012104230A (en) | Metal oxide semiconductor electrode and dye-sensitized solar cell |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160330 Termination date: 20170117 |