CN103060873A - Method for preparing porous array ZnO thin film in graded structure by electro-deposition method - Google Patents
Method for preparing porous array ZnO thin film in graded structure by electro-deposition method Download PDFInfo
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Abstract
The invention relates to a method for preparing a porous array ZnO thin film in a graded structure by an electro-deposition method. The method comprises the following steps of: 1) respectively assembling PS (Poly Styrene) moulds with different numbers of layers and grains on FTO (Fluorinedoped Tin Oxide) conducting glass, and placing the moulds dried at room temperature into a vacuum drying box to dry; 2) using the moulds prepared by the step 1) as a working electrode, a platinum sheet as a counter electrode, a saturated calomel electrode as a reference electrode and zinc salt aqueous liquor as a deposition liquid, depositing for 10-30minutes at -1.3V; 3) washing the electro-deposited moulds by secondary deionized water, and placing the moulds dried at room temperature into the vacuum drying box to dry; and 4) soaking the moulds in a toluene liquid to dissolve and remove the PS moulds and taking out the ZnO thin film. According to the invention, the ZnO porous array thin film in the graded structure with controllable numbers of layers and aperture can be prepared, so that the operating technical difficulty is reduced. The ZnO porous array thin film in the graded structure with controllable numbers of layers and aperture is prepared by the electro-deposition method.
Description
Technical field
The present invention relates to field of nano material preparation, be specifically related to the method that a kind of electrodip process prepares hierarchy porous array ZnO film.
Background technology
The zinc oxide of hexagonal wurtzite structure (ZnO) is a kind of wide band gap semiconducter, has a wide range of applications at aspects such as luminous, sensor, super hydrophobic material, dye sensitization solar battery, photocatalytic degradation organic waste waters.ZnO has the advantages such as nontoxic, that catalytic activity is high, oxidation capacity is strong as one of functional materials commonly used.The performance of ZnO film material is slightly poorer than powder body material, has easily separated and advantage reusable edible but be convenient to thin-film material.
At present, the method for making ZnO film mainly contains magnetron sputtering method, chemical Vapor deposition process, hydrothermal synthesis method, sol-gel method, thermal decomposition method, electrochemical deposition method etc.Wherein electrochemical deposition method simple to operate, cost is low, can operate at low temperatures, is fit to scale operation, is a kind of competitive preparation method.In addition, the porous micro/nano structure material of preparation with high-specific surface area is one of the effective ways that improve the performance of thin-film material.
Usually adopt aluminum oxide (AAO) template to prepare for the preparation of ZnO array film, but this method need to be prepared high-quality porous array alumina formwork in advance, but also needing good template transfer technology, preparation process is had relatively high expectations to operator's basic skills.
The method of another making ZnO porous-film be bubble hydrogen with cathodic reduction as dynamic template, utilize the electrochemical deposition method preparation.Although this method is simple to operate, and can control surface topography and the microtexture of settled layer by changing the galvanic deposit parameter, but wayward aperture size.
Summary of the invention
The objective of the invention is the deficiency for solving the problems of the technologies described above, the method that provides a kind of electrodip process to prepare hierarchy porous array ZnO film, simple to operate, can prepare the controlled ZnO porous array film of aperture and the number of plies.
The present invention is the deficiency that solves the problems of the technologies described above, and the technical scheme that adopts is: electrodip process prepares the method for hierarchy porous array ZnO film, may further comprise the steps:
1), on the FTO conductive glass, assemble respectively the number of plies PS template different with particle diameter, wherein the area of PS template is 1/2 of FTO conductive glass area; And the gained template put into vacuum drying oven in 110 ℃ of dryings 10 minutes after drying at room temperature, obtain being carried on the PS template of FTO conductive glass;
2), the PS template that is carried on the FTO conductive glass that makes with step 1) is as working electrode, take platinized platinum as to electrode, take saturated calomel electrode as reference electrode, take zinc salt solution as deposit fluid, the deposit fluid temperature is 0 ℃, and deposition voltage is-1.3V deposition 10～30min;
Wherein, Zn in the zinc salt solution
2+Volumetric molar concentration be 10 mmol/L, NO
3 -1Volumetric molar concentration be 0.2mol/L, zinc salt solution, pH are 5.0;
3), with step 2) working electrode after the galvanic deposit washes with secondary deionized water, puts into 80 ℃ of dryings of vacuum drying oven 2 hours after drying at room temperature;
4), the working electrode after step 3) is processed soaks 30 min dissolving removal PS template in toluene solution, with tweezers ZnO film is taken out afterwards, volatilizes residual toluene in stink cupboard.
The concrete grammar of assembling respectively the number of plies PS template different with particle diameter in the described step 1) on the FTO conductive glass is:
A, get slide glass and clean after, be dipped vertically in the PS aqueous solution and leave standstill 2～3min, then vertically pull out with the pull rate of 4cm/min, dry under the room temperature, obtain the monolayer array template, then the monolayer array template is slowly inserted in the water with 45 ° of angles of inclination, the PS bead is automatically peeled off and again with regular being arranged on the water surface of form of single sheet, is obtained floating on the individual layer PS template of the water surface;
B, get the FTO conductive glass as carrier with tweezers, there is not the place of PS to insert the water with 45 ° of obliquitys from the water surface in carrier after cleaning up, then carrier is slowly moved to PS template below, slowly mention afterwards, PS can be assembled on the FTO conductive glass again, substrate is placed 110 ℃ of dry 10min of vacuum drying oven, obtain being carried on the PS template of FTO conductive glass;
Concrete grammar is: getting the FTO conductive glass that cleans up with tweezers does not have the place of PS to insert the water (water herein refers to the aqueous solution of the floating PS of the having single tier templates that makes in the step) with 45 ° of obliquitys from the water surface it, then the FTO conductive glass is slowly moved to PS template below, after the FTO conductive glass inserts PS template below, mobile FTO conductive glass makes it parallel with horizontal plane, then slowly mention, PS can be assembled on the FTO conductive glass again.
C, the PS that chooses different-grain diameter prepare the PS aqueous solution, and repeating step operation preparation a) floats on the individual layer PS template of the water surface, and the PS template that is carried on the FTO conductive glass that obtains take step b) is as carrier, repeating step b) operation, obtain two-layer PS template;
D, the two-layer PS template that makes take step c) be as carrier, repeating step c) operation steps obtain multilayer PS template.
Described zinc salt solution is Zn (NO
3)
2And KNO
3Mixing solutions, use HNO
3Or KOH regulates the pH value.
Beneficial effect
The present invention can prepare the controlled ZnO porous array film with hierarchy of the number of plies and aperture, reduces the operative technique difficulty, has realized using electrodip process prepared layer number and aperture controlled, and has the ZnO porous array film of hierarchy.
Description of drawings
Fig. 1 is depicted as technical solution of the present invention demonstration synoptic diagram;
Fig. 2 is depicted as the SEM photo of the embodiment of the invention 1 gained individual layer porous array ZnO film;
Fig. 3 is depicted as the SEM photo of the embodiment of the invention 1 gained individual layer porous array ZnO film;
Fig. 4 is depicted as the SEM photo of the embodiment of the invention 2 gained double-layer network porous array ZnO films;
Fig. 5 is depicted as the SEM photo of the embodiment of the invention 2 gained double-layer network porous array ZnO films;
Fig. 6 is depicted as the SEM photo of the double-deck classifying porous array structure ZnO film of the embodiment of the invention 3 gained;
Fig. 7 is depicted as the SEM photo of the double-deck classifying porous array structure ZnO film of the embodiment of the invention 3 gained;
Fig. 8 is depicted as the XRD diffraction spectrogram of the embodiment of the invention 3 products obtained therefroms.
Embodiment
Electrodip process prepares the method for hierarchy porous array ZnO film, may further comprise the steps:
1), on the FTO conductive glass, assemble respectively the number of plies PS template different with particle diameter, wherein the area of template is 1/2 of FTO conductive glass; And the gained template put into vacuum drying oven in 110 ℃ of dryings 10 minutes after drying at room temperature, concrete grammar is:
A, get slide glass and clean after, be dipped vertically in the PS aqueous solution and leave standstill 2～3min, then vertically pull out with the pull rate of 4cm/min, dry under the room temperature, obtain the monolayer array template, then the monolayer array template is slowly inserted in the water with 45 ° of angles of inclination, the PS bead is automatically peeled off and again with regular being arranged on the water surface of form of single sheet, is obtained floating on the individual layer PS template of the water surface;
B, get another substrate as carrier with tweezers, there is not the place of PS to insert the water with 45 ° of obliquitys from the water surface in carrier after cleaning up, then carrier is slowly moved to PS template below, slowly mention afterwards, PS can be assembled in the substrate again, substrate is placed 110 ℃ of dry 10min of vacuum drying oven, obtain being carried on the PS template of substrate;
Area is a bit larger tham 1/2 during rigging, and redundance can be wiped with filter paper.Can transfer a blank sheet of paper at FTO glass, mark graduated straight line as scale with one of stroke on the paper.
C, the PS that chooses different-grain diameter prepare the PS aqueous solution, and repeating step operation preparation a) floats on the individual layer PS template of the water surface, and the PS template that is carried on substrate that obtains take step b) is as carrier, repeating step b) operation, obtain two-layer PS template;
D, the two-layer PS template that makes take step c) be as carrier, repeating step c) operation steps obtain multilayer PS template;
2), the template that makes with step 1) is as working electrode, take platinized platinum as to electrode, take saturated calomel electrode as reference electrode, take zinc salt solution as deposit fluid, the deposit fluid temperature is 0 ℃, deposition voltage is-1.3V deposition 10～30min;
Wherein, Zn in the zinc salt solution
2+Volumetric molar concentration be 10 mmol/L, NO
3 -1Volumetric molar concentration be 0.2 mol/L, zinc salt solution, pH are 5.0;
3), with step 2) template after the galvanic deposit washes with secondary deionized water, puts into 80 ℃ of dryings of vacuum drying oven 2 hours after drying at room temperature;
4), the template after step 3) is processed soaks 30 min dissolving removal PS template in toluene solution, with tweezers ZnO film is taken out afterwards, volatilizes residual toluene in stink cupboard.
Described zinc salt solution is Zn (NO
3)
2And KNO
3Mixing solutions, use HNO
3Or KOH regulates the pH value.
Fig. 1 is material preparation technology synoptic diagram of the present invention.As shown in Figure 1: the present invention can prepare individual layer porous ZnO array through route a; Can prepare two-layer (or multilayer) three-dimensional network porous ZnO array through route b; Can prepare multilayer hierarchical structure porous ZnO array through route c.
Electrodip process prepares the method for hierarchy porous array ZnO film, may further comprise the steps:
1), on the FTO conductive glass, assemble respectively the number of plies PS template different with particle diameter, concrete grammar is:
A, get slide glass and clean after, be dipped vertically into the PS particle diameter and be in the PS aqueous solution (the PS mass concentration of the PS aqueous solution is 5%) of 2.5 μ m and leave standstill 2～3min, then vertically pull out with the pull rate of 4cm/min, dry under the room temperature, obtain the monolayer array template, then the monolayer array template is slowly inserted in the water with 45 ° of angles of inclination, the PS bead is automatically peeled off and again with regular being arranged on the water surface of form of single sheet, is obtained floating on the individual layer PS template of the water surface;
B, (the FTO conductive glass is of a size of 2x1 cm to get another FTO conductive glass with tweezers
2) as carrier, there is not the place of PS to insert the water with 45 ° of obliquitys from the water surface in carrier after cleaning up, then carrier is slowly moved to PS template below, slowly mention afterwards, PS can be assembled on the FTO conductive glass again, substrate is placed 110 ℃ of dry 10min of vacuum drying oven, and (area of template is 1x1 cm to obtain being carried on the PS template of FTO conductive glass
2);
2) template that, makes with step 1) is as working electrode, with platinized platinum (1x1 cm
2) be to electrode, take saturated calomel electrode as reference electrode, take zinc salt solution as deposit fluid, the deposit fluid temperature is 0 ℃, deposition voltage is-1.3V deposition 10min;
Wherein, Zn in the zinc salt solution
2+Volumetric molar concentration be 10 mmol/L, NO
3 -1Volumetric molar concentration be 0.2mol/L, zinc salt solution, pH are 5.0;
Described zinc salt solution is Zn (NO
3)
2And KNO
3Mixing solutions, use HNO
3Or KOH regulates the pH value.
3), with step 2) template after the galvanic deposit washes with secondary deionized water, puts into 80 ℃ of dryings of vacuum drying oven 2 hours after drying at room temperature;
4), the template after step 3) is processed soaks 30 min dissolving removal PS template in toluene solution, with tweezers ZnO film is taken out afterwards, volatilizes residual toluene in stink cupboard, obtains product.
Fig. 2, Fig. 3 are the SEM photo of embodiment 1 resulting product.As seen from the figure, present method can obtain large-area ZnO porous membrane, and porous-film is individual layer, and the aperture is 2.5 μ m, and is identical with PS template size, and explanation can be controlled by the control PS template number of plies and particle diameter the number of plies and the aperture of ZnO film.
Electrodip process prepares the method for hierarchy porous array ZnO film, may further comprise the steps:
1), on the FTO conductive glass, assemble respectively the number of plies PS template different with particle diameter, concrete grammar is:
A, get slide glass and clean after, be dipped vertically into the PS particle diameter and be in the PS aqueous solution of 2.5 μ m and leave standstill 2～3min, then vertically pull out with the pull rate of 4cm/min, dry under the room temperature, obtain the monolayer array template, then the monolayer array template is slowly inserted in the water with 45 ° of angles of inclination, the PS bead is automatically peeled off and again with regular being arranged on the water surface of form of single sheet, is obtained floating on the individual layer PS template of the water surface;
B, (the FTO conductive glass is of a size of 2x1 cm to get another FTO conductive glass with tweezers
2) as carrier, there is not the place of PS to insert the water with 45 ° of obliquitys from the water surface in carrier after cleaning up, then carrier is slowly moved to PS template below, slowly mention afterwards, PS can be assembled on the FTO conductive glass again, substrate is placed 110 ℃ of dry 10min of vacuum drying oven, and (area of template is 1x1 cm to obtain being carried on the PS template of FTO conductive glass
2);
C, to choose particle diameter be that the PS of 2.5 μ m prepares the PS aqueous solution, repeating step operation preparation a) floats on the individual layer PS template of the water surface, and the PS template that is carried on the FTO conductive glass that obtains take step b) is as carrier, repeating step b) operation, obtain two-layer PS template;
2) template that, makes with step 1) is as working electrode, with platinized platinum (1x1 cm
2) be to electrode, take saturated calomel electrode as reference electrode, take zinc salt solution as deposit fluid, the deposit fluid temperature is 0 ℃, deposition voltage is-1.3V heavy 20min;
Wherein, Zn in the zinc salt solution
2+Volumetric molar concentration be 10 mmol/L, NO
3 -1Volumetric molar concentration be 0.2mol/L, zinc salt solution, pH are 5.0; Described zinc salt solution is Zn (NO
3)
2And KNO
3Mixing solutions, use HNO
3Or KOH regulates the pH value.
3), with step 2) template after the galvanic deposit washes with secondary deionized water, puts into 80 ℃ of dryings of vacuum drying oven 2 hours after drying at room temperature;
4), the template after step 3) is processed soaks 30 min dissolving removal PS template in toluene solution, with tweezers ZnO film is taken out afterwards, volatilizes residual toluene in stink cupboard, obtains product.
Fig. 4, Fig. 5 are the SEM photo of embodiment 2 resulting products.As seen from the figure, present method can obtain large-area ZnO porous membrane, and porous-film is the double-layer network structure, and the aperture is 2.5 μ m, and is identical with PS template size, and explanation can be controlled by the control PS template number of plies and particle diameter the number of plies and the aperture of ZnO film.
Embodiment 3
Electrodip process prepares the method for hierarchy porous array ZnO film, may further comprise the steps:
1), on the FTO conductive glass, assemble respectively the number of plies PS template different with particle diameter, concrete grammar is:
A, get slide glass and clean after, be dipped vertically into the PS particle diameter and be in the PS aqueous solution of 2.5 μ m and leave standstill 2～3min, then vertically pull out with the pull rate of 4cm/min, dry under the room temperature, obtain the monolayer array template, then the monolayer array template is slowly inserted in the water with 45 ° of angles of inclination, the PS bead is automatically peeled off and again with regular being arranged on the water surface of form of single sheet, is obtained floating on the individual layer PS template of the water surface;
B, (the FTO conductive glass is of a size of 2x1 cm to get another FTO conductive glass with tweezers
2) as carrier, there is not the place of PS to insert the water with 45 ° of obliquitys from the water surface in carrier after cleaning up, then carrier is slowly moved to PS template below, slowly mention afterwards, PS can be assembled on the FTO conductive glass again, substrate is placed 110 ℃ of dry 10min of vacuum drying oven, and (area of template is 1x1 cm to obtain being carried on the PS template of FTO conductive glass
2);
C, to choose particle diameter be that the PS of 500nm prepares the PS aqueous solution, repeating step operation preparation a) floats on the individual layer PS template of the water surface, and the PS template that is carried on the FTO conductive glass that obtains take step b) is as carrier, repeating step b) operation, obtain two-layer PS template;
2) template that, makes with step 1) is as working electrode, with platinized platinum (1x1 cm
2) be to electrode, take saturated calomel electrode as reference electrode, take zinc salt solution as deposit fluid, the deposit fluid temperature is 0 ℃, deposition voltage is-1.3V heavy 30min;
Wherein, Zn in the zinc salt solution
2+Volumetric molar concentration be 10 mmol/L, NO
3 -1Volumetric molar concentration be 0.2mol/L, zinc salt solution, pH are 5.0; Described zinc salt solution is Zn (NO
3)
2And KNO
3Mixing solutions, use HNO
3Or KOH regulates the pH value.
3), with step 2) template after the galvanic deposit washes with secondary deionized water, puts into 80 ℃ of dryings of vacuum drying oven 2 hours after drying at room temperature;
4), the template after step 3) is processed soaks 30 min dissolving removal PS template in toluene solution, with tweezers ZnO film is taken out afterwards, volatilizes residual toluene in stink cupboard, obtains product.
Fig. 6, Fig. 7 are the SEM photo of embodiment 3 resulting products.As seen from the figure, present method can obtain large-area ZnO porous membrane, porous-film is double-deck hierarchical network structure, the aperture is respectively 2.5 μ m(bottom outlets) and the upper hole of 500nm(), identical with PS template size, explanation can be controlled by the control PS template number of plies and particle diameter the number of plies and the aperture of ZnO film.
Fig. 8 is the XRD diffraction spectrogram of embodiment 3 products obtained therefroms.As seen from the figure, products obtained therefrom of the present invention is wurtzite ZnO.
Claims (3)
1. electrodip process prepares the method for hierarchy porous array ZnO film, it is characterized in that: may further comprise the steps:
1), on the FTO conductive glass, assemble respectively the number of plies PS template different with particle diameter, wherein the area of PS template is 1/2 of FTO conductive glass area; And the gained template put into vacuum drying oven in 110 ℃ of dryings 10 minutes after drying at room temperature, obtain being carried on the PS template of FTO conductive glass;
2), the PS template that is carried on the FTO conductive glass that makes with step 1) is as working electrode, take platinized platinum as to electrode, take saturated calomel electrode as reference electrode, take zinc salt solution as deposit fluid, the deposit fluid temperature is 0 ℃, and deposition voltage is-1.3V deposition 10～30min;
Wherein, Zn in the zinc salt solution
2+Volumetric molar concentration be 10 mmol/L, NO
3 -1Volumetric molar concentration be 0.2mol/L, zinc salt solution, pH are 5.0;
3), with step 2) working electrode after the galvanic deposit washes with secondary deionized water, puts into 80 ℃ of dryings of vacuum drying oven 2 hours after drying at room temperature;
4), the working electrode after step 3) is processed soaks 30 min dissolving removal PS template in toluene solution, with tweezers ZnO film is taken out afterwards, volatilizes residual toluene in stink cupboard.
2. electrodip process as claimed in claim 1 prepares the method for hierarchy porous array ZnO film, it is characterized in that: the concrete grammar of assembling respectively the number of plies PS template different with particle diameter in the described step 1) on the FTO conductive glass is:
A, get slide glass and clean after, be dipped vertically in the PS aqueous solution and leave standstill 2～3min, then vertically pull out with the pull rate of 4cm/min, dry under the room temperature, obtain the monolayer array template, then the monolayer array template is slowly inserted in the water with 45 ° of angles of inclination, the PS bead is automatically peeled off and again with regular being arranged on the water surface of form of single sheet, is obtained floating on the individual layer PS template of the water surface;
B, get the FTO conductive glass as carrier with tweezers, there is not the place of PS to insert the water with 45 ° of obliquitys from the water surface in carrier after cleaning up, then carrier is slowly moved to PS template below, slowly mention afterwards, PS can be assembled on the FTO conductive glass again, substrate is placed 110 ℃ of dry 10min of vacuum drying oven, obtain being carried on the PS template of FTO conductive glass;
C, the PS that chooses different-grain diameter prepare the PS aqueous solution, and repeating step operation preparation a) floats on the individual layer PS template of the water surface, and the PS template that is carried on the FTO conductive glass that obtains take step b) is as carrier, repeating step b) operation, obtain two-layer PS template;
D, the two-layer PS template that makes take step c) be as carrier, repeating step c) operation steps obtain multilayer PS template.
3. electrodip process as claimed in claim 1 prepares the method for hierarchy porous array ZnO film, it is characterized in that: described zinc salt solution is Zn (NO
3)
2And KNO
3Mixing solutions, use HNO
3Or KOH regulates the pH value.
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| CN103320827A (en) * | 2013-06-13 | 2013-09-25 | 江苏大学 | Preparation method of inorganic-salt-doped nano zinc oxide film |
| CN103422129A (en) * | 2013-07-24 | 2013-12-04 | 浙江大学 | Method for changing appearance of ZnO by adding Ca<2+> |
| CN105836789A (en) * | 2016-01-15 | 2016-08-10 | 武汉理工大学 | Method for in-situ preparation of porous structure zinc oxide nanometer rod array |
| CN106283191A (en) * | 2015-06-19 | 2017-01-04 | 中国科学院金属研究所 | A kind of preparation method of metal-oxide porous monocrystalline array film |
| CN106449117A (en) * | 2016-09-08 | 2017-02-22 | 宁波华坤新材料科技有限公司 | Preparation method of transparent grid electrode |
| CN106498458A (en) * | 2016-12-30 | 2017-03-15 | 福建钢泓金属科技股份有限公司 | A kind of automatically cleaning corrosion resistant plate and its production method |
| CN109553162A (en) * | 2018-11-27 | 2019-04-02 | 昆明理工大学 | It is a kind of using ordered porous ZnO as the stainless steel base nano array β-PbO of template2The preparation method of electrode |
| CN111153602A (en) * | 2020-01-12 | 2020-05-15 | 常州大学 | Preparation method of basic zinc acetate film with hierarchical structure |
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| CN103320827A (en) * | 2013-06-13 | 2013-09-25 | 江苏大学 | Preparation method of inorganic-salt-doped nano zinc oxide film |
| CN103320827B (en) * | 2013-06-13 | 2015-12-09 | 江苏大学 | A kind of preparation method of inorganic-salt-dopednano nano zinc oxide film |
| CN103422129A (en) * | 2013-07-24 | 2013-12-04 | 浙江大学 | Method for changing appearance of ZnO by adding Ca<2+> |
| CN103422129B (en) * | 2013-07-24 | 2015-09-30 | 浙江大学 | A kind of by adding Ca 2+change the method for appearance of ZnO |
| CN106283191B (en) * | 2015-06-19 | 2018-11-06 | 中国科学院金属研究所 | A kind of preparation method of metal oxide porous monocrystalline array film |
| CN106283191A (en) * | 2015-06-19 | 2017-01-04 | 中国科学院金属研究所 | A kind of preparation method of metal-oxide porous monocrystalline array film |
| CN105836789A (en) * | 2016-01-15 | 2016-08-10 | 武汉理工大学 | Method for in-situ preparation of porous structure zinc oxide nanometer rod array |
| CN106449117A (en) * | 2016-09-08 | 2017-02-22 | 宁波华坤新材料科技有限公司 | Preparation method of transparent grid electrode |
| CN106449117B (en) * | 2016-09-08 | 2019-02-26 | 宁波华坤新材料科技有限公司 | A kind of transparent grid electrode preparation method |
| CN106498458A (en) * | 2016-12-30 | 2017-03-15 | 福建钢泓金属科技股份有限公司 | A kind of automatically cleaning corrosion resistant plate and its production method |
| CN106498458B (en) * | 2016-12-30 | 2018-06-29 | 福建钢泓金属科技股份有限公司 | A kind of automatically cleaning stainless steel plate and its production method |
| CN109553162A (en) * | 2018-11-27 | 2019-04-02 | 昆明理工大学 | It is a kind of using ordered porous ZnO as the stainless steel base nano array β-PbO of template2The preparation method of electrode |
| CN109553162B (en) * | 2018-11-27 | 2021-08-20 | 昆明理工大学 | Stainless steel-based nano-array beta-PbO with ordered porous ZnO as template2Method for preparing electrode |
| CN111153602A (en) * | 2020-01-12 | 2020-05-15 | 常州大学 | Preparation method of basic zinc acetate film with hierarchical structure |
| CN111153602B (en) * | 2020-01-12 | 2022-05-17 | 常州大学 | Preparation method of basic zinc acetate film with hierarchical structure |
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