CN103018800A - Surface-plasma-enhanced symmetric structure and preparation method thereof - Google Patents
Surface-plasma-enhanced symmetric structure and preparation method thereof Download PDFInfo
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- CN103018800A CN103018800A CN2011102855689A CN201110285568A CN103018800A CN 103018800 A CN103018800 A CN 103018800A CN 2011102855689 A CN2011102855689 A CN 2011102855689A CN 201110285568 A CN201110285568 A CN 201110285568A CN 103018800 A CN103018800 A CN 103018800A
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Abstract
The invention discloses a surface-plasma-enhanced symmetric structure and a preparation method thereof. The symmetric structure comprises a supporting film, a periodic metal particle array and a substrate, wherein the supporting film is provided with a light transmitting window for electromagnetic waves with application wavelength and comprises a plurality of supporting sub-film layers formed in two times; the periodic metal particle array is formed among the supporting sub-film layers formed in two times, and a plane formed by the periodic metal particle array is parallel to a plane of the supporting film; and the substrate is located below the supporting film and outside a downward projection area of the periodic metal particle array. The surface-plasma-enhanced symmetric structure and the preparation method disclosed by the invention have great advantages in the aspect of antennas and biological liquid sensors, can ensure the complete accordance of ambient environments of the periodic metal array, and can effectively alleviate the influence to diffracted intensity of the substrate so as to improve transmittance.
Description
Technical field
The present invention relates to microelectronic industry surface plasma subwavelength optics technical field, relate in particular to a kind of surface plasma and strengthen symmetrical structure and preparation method thereof.
Background technology
The surface plasma subwavelength optics is that research is at the new subject of the electromagnetic wave macroscopic property being regulated and control less than the metal micro-nanostructure upper surface plasma of wavelength dimension.The surface plasma subwavelength optics has two typical unusual optical characteristics: electromagnetic wave can be broken through the restriction of diffraction limit after by the unit that is made of the metal micro-nanostructure less than wavelength, and assembles at energy localization on the yardstick of wavelength and to strengthen.Novel artificial structured material, device and system based on surface plasma subwavelength optics Strange properties, will be integrated at super-high density photoelectricity, many-sided association area science and technology that cause such as luminous, the ultra-sensitivity biological detection identification of super-resolution imaging, novel active and active treatment change, and the future economy, society and national security are produced important and far-reaching impact.
The metal periodic array structure periphery environment great majority that exist at present are for dissymmetrical structure or utilize water or oily symmetrical structure with the refractive index of substrate approximate match.In this approximate match symmetrical structure, at first produce the metallic particles that is the square lattice array at quartz glass, the water or the oil that approach of spin coating and quartz glass refractive index more afterwards is so that up and down environment approximate match of metallic particles.But because quartz glass has obvious difference with the refractive index of oil or water, therefore be difficult to reach fully coupling, and the quartz glass substrate has a great impact to diffracted intensity, thus the raising of transmissivity be an obstacle.
Summary of the invention
The technical matters that (one) will solve
For solving above-mentioned one or more technical matterss, the invention provides a kind of surface plasma and strengthen symmetrical structure and preparation method thereof, to solve existing metal periodic array structure periphery environment great majority as dissymmetrical structure or to utilize water or oil causes the not high problem of approximate match precision with the symmetrical structure of refractive index of substrate approximate match, and remove the quartz glass substrate to the impact of diffracted intensity, reach the purpose that improves diffracted intensity and transmissivity.
(2) technical scheme
According to an aspect of the present invention, provide a kind of surface plasma to strengthen symmetrical structure.This structure comprises: support film, and this support film has optical transmission window for the electromagnetic wave of using wavelength, and support film comprises the sub-support film layer that forms at twice; The metallic particles periodic array is formed between the sub-support film layer that forms at twice the plane that it consists of and the plane parallel of support film; Substrate is positioned at the below of support film, and the metallic particles periodic array is the position outside the view field downwards.
Preferably, surface plasma of the present invention strengthens in the symmetrical structure, and the sub-support film layer that forms at twice is symmetrical about the metallic particles periodic array.
Preferably, surface plasma of the present invention strengthens in the symmetrical structure, and the metallic particles periodic array is to be the gold grain array that square lattice is arranged.
Preferably, surface plasma of the present invention strengthens in the symmetrical structure, and the diameter of gold grain is between between the 50nm to 100nm, and the cycle of gold grain array is between between the 500nm to 1000nm.
Preferably, surface plasma of the present invention strengthens in the symmetrical structure, and substrate is Si base substrate; The sub-support film layer of twice formation is Kapton, and the gross thickness of support film is between between the 600nm to 1200nm.
According to another aspect of the present invention, also provide a kind of preparation table surface plasma to strengthen the method for symmetrical structure.The method comprises: steps A, form the first sub-support film layer at substrate; Step B, on the first sub-support film layer the spin coating photoresist; Step C, utilize electron beam exposure, development, form the groove corresponding with pre-prepared periodic array at photoresist, the bottom of groove communicates with the first sub-support film layer; Step D, in groove deposit metallic material, form the metallic particles periodic array at the first sub-support film layer; Remaining photoresist on step e, removal the first sub-support film layer; Step F, form the second support film layer at the first sub-support film layer, the first sub-support film layer and the second sub-support film layer are wrapped in the metallic particles periodic array wherein jointly; Step G, etching metallic particles periodic array be the substrate of view field downwards.
(3) beneficial effect
Surface plasma of the present invention strengthens symmetrical structure and preparation method thereof is having very large advantage aspect antenna and the biofluid sensor, has following beneficial effect:
(1) preparation method of this structure is compatible, reliable and stable mutually with traditional photoetching process;
(2) this method preparation table surface plasma of twice polyimide of spin coating that utilizes provided by the invention strengthens symmetrical structure, can guarantee that metal periodic array surrounding environment is in full accord; With the metal periodic array surrounding environment dissymmetrical structure of present existence and utilize water or oil is compared with the structure of quartz substrate refractive index approximate match, can effectively reduce substrate to the impact of diffracted intensity, improve transmissivity.
Description of drawings
Fig. 1 is the schematic diagram that embodiment of the invention surface plasma strengthens symmetrical structure;
Fig. 2 A to Fig. 2 F is that embodiment of the invention preparation table surface plasma strengthens the structural representation after each step of execution in the symmetrical structure method.
Embodiment
For making the purpose, technical solutions and advantages of the present invention clearer, below in conjunction with specific embodiment, and with reference to accompanying drawing, the present invention is described in more detail.In addition, although this paper can provide the demonstration of the parameter that comprises particular value, should be appreciated that, parameter need not definitely to equal corresponding value, but can be in acceptable error margin or design constraint the value of being similar to.
In one exemplary embodiment of the present invention, proposed a kind of surface plasma and strengthened symmetrical structure.Fig. 1 is the schematic diagram that embodiment of the invention surface plasma strengthens symmetrical structure.As shown in Figure 1, this structure comprises:
Kapton, this Kapton has optical transmission window for the electromagnetic wave of preset wavelength, Kapton comprises the sub-thin layer that forms at twice, and certainly, those skilled in the art also can select according to needed printing opacity wavelength the self-supporting film of other materials;
The metallic particles periodic array, be formed between the sub-support film layer that forms at twice, the plane parallel of the plane that it consists of and support film layer, the sub-support film layer that forms at twice is symmetrical about the metallic particles periodic array, and the metallic particles periodic array is to be the gold grain array that square lattice is arranged;
Substrate is positioned at the below of support film, and the metallic particles periodic array is the position outside the view field downwards, and in the present embodiment, the material of substrate is semicon industry Si substrate the most commonly used.
The principle of work of this structure is as follows: when light beam impinged perpendicularly on the Kapton window, metallic particles interacted with incident light, produced the surface plasma body resonant vibration enhancement effect.The effect of polyimide self-supporting film window mainly is to replace quartz glass to remove the conventional quartz glass substrate to the impact of diffracted intensity; Kapton mainly is in order to support the cycle metallic particles, and guaranty money's metal particles environment full symmetric up and down, improves transmitance; The metallic particles interaction of sharing the same light forms surface plasma and strengthens.
Below will be described in more detail the present invention from the preparation method aspect.In one exemplary embodiment of the present invention, the method that a kind of preparation table surface plasma strengthens symmetrical structure is disclosed.The method comprises:
Step S02, spin-on polyimide on the silicon substrate that cleaned forms film through bakingout process;
Wherein, the thickness of spin-on polyimide is under the prerequisite that satisfies follow-up self-supported membrane technological requirement, should get over Bao Yuehao, between 600nm to 1200nm, be conducive to reduce in the follow-up test process film to transmitted light and catoptrical absorption, strengthen signal, utilize thermal treatment to make the polyimide film forming, in heat treatment process, guarantee polyimide in 80 ℃ and 250 ℃ of environment each 2 hours, and naturally cool off.
Step S04, spin coating positive electronic bundle resist ZEP520A, and utilize beamwriter lithography to form periodic structure;
Wherein, spin coating positive electronic bundle resist ZEP520A 100nm to 700nm, and utilize beamwriter lithography formation characteristic dimension to be the array structure figure of 50nm to 100nm cycle for 500nm to 1000nm.
Step S06, the required metal of electron beam evaporation, and the removal electron sensitive resist obtains the cycle metallic particles;
Wherein, utilize electron beam evaporation process, at resist evaporation 50nm to 100nm gold, remove resist by stripping technology, obtain metal periodic array structure.
Step S08, spin-on polyimide forms film through bakingout process;
Wherein, spin-on polyimide, thickness is the thickness that the thickness of the Kapton for preparing among the step S02 adds metal, guarantees that final structure is symmetrical up and down, its Technology for Heating Processing is with step S02.
Step S10 utilizes wet etching to remove part silica-based, forms the Kapton window, obtains surface plasma and strengthens symmetrical structure, and it specifically comprises:
Utilizing hydrofluorite, nitric acid and glacial acetic acid is 12: 1: 2 in mol ratio, and temperature is under 30 ℃ the condition, and wet etching is removed below the metal periodic array structure corresponding silica-based, obtains self-supporting Kapton window.
Below will on the basis of above-described embodiment, provide optimum embodiment of the present invention.Need to illustrate, this optimum embodiment only is used for understanding the present invention, is not limited to protection scope of the present invention.And, the feature among the optimum embodiment, in the situation that without indicating especially, all be applicable to simultaneously embodiment of the method and device embodiment, the technical characterictic that occurs in identical or different embodiment can be used in combination in not conflicting situation.
The present embodiment has proposed a kind of method of utilizing the sandwich periodic array metallic particles of Kapton preparation table surface plasma to strengthen symmetrical structure subwavelength optics element.Fig. 2 A to Fig. 2 F is that embodiment of the invention preparation table surface plasma strengthens the structural representation after each step of execution in the symmetrical structure method.The present embodiment comprises:
Steps A, on silicon-based substrate, the thick polyimide of spin coating 1 μ m, through bakingout process, 90 ℃ and 180 ℃ are each two hours in the baking oven, and naturally cooling forms film, shown in Fig. 2 A;
Step B, the ZEP520A electron sensitive resist that spin coating 500nm is thick, thermal treatment, 180 ℃ of half an hours in the baking oven,, naturally cooling is shown in Fig. 2 B;
Step C, electron beam exposure, developing obtains the resist figure, and wherein the figure cycle is 500nm, and grain size is 80nm, shown in Fig. 2 C;
Step D utilizes electron-beam evaporation material gold, and thickness is 80nm, utilizes stripping technology to remove resist, obtains the metallic particles on the Kapton, shown in Fig. 2 D;
Step e, spin coating 1.08 μ m thick polyimides, thermal treatment, technological parameter is as Fig. 2-1 heat treatment parameter, shown in Fig. 2 E;
Step F, utilizing hydrofluorite, nitric acid and glacial acetic acid is 12: 1: 2 in mol ratio, temperature is under 30 ℃ the condition, corresponding silica-based below the wet etching removal metal periodic array structure, obtain self-supporting Kapton window, window size is 5mm * 5mm, finally obtains surface plasma and strengthens symmetrical structure, shown in Fig. 2 F.
Surface plasma of the present invention strengthens symmetrical structure and preparation method thereof is having very large advantage aspect antenna and the biofluid sensor, has following beneficial effect:
(1) preparation method of this structure is compatible, reliable and stable mutually with traditional photoetching process;
(2) this method preparation table surface plasma of twice polyimide of spin coating that utilizes provided by the invention strengthens symmetrical structure, can guarantee that metal periodic array surrounding environment is in full accord; With the metal periodic array surrounding environment dissymmetrical structure of present existence and utilize water or oil is compared with the structure of quartz substrate refractive index approximate match, can effectively reduce substrate to the impact of diffracted intensity, improve transmissivity.
Above-described specific embodiment; purpose of the present invention, technical scheme and beneficial effect are further described; institute is understood that; the above only is specific embodiments of the invention; be not limited to the present invention; within the spirit and principles in the present invention all, any modification of making, be equal to replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (11)
1. a surface plasma strengthens symmetrical structure, it is characterized in that, comprising:
Support film, this support film has optical transmission window for the electromagnetic wave of using wavelength, and described support film comprises the sub-support film layer that forms at twice;
The metallic particles periodic array is formed between the described sub-support film layer that forms at twice the plane that it consists of and the plane parallel of described support film;
Substrate is positioned at the below of described support film, and described metallic particles periodic array is the position outside the view field downwards.
2. surface plasma according to claim 1 strengthens symmetrical structure, it is characterized in that, the described sub-support film layer that forms at twice is symmetrical about described metallic particles periodic array.
3. surface plasma according to claim 1 strengthens symmetrical structure, it is characterized in that, described metallic particles periodic array is to be the gold grain array that square lattice is arranged.
4. surface plasma according to claim 3 strengthens symmetrical structure, it is characterized in that, the diameter of described gold grain is between between the 50nm to 100nm, and the cycle of gold grain array is between between the 500nm to 1000nm.
5. each described surface plasma strengthens symmetrical structure according to claim 1-4, it is characterized in that,
Described substrate is Si base substrate;
The sub-support film layer of described twice formation is Kapton, and the gross thickness of described support film is between between the 600nm to 1200nm.
6. the method for a preparation table surface plasma enhancing symmetrical structure is characterized in that, comprising:
Steps A, form the first sub-support film layer at substrate;
Step B, on the described first sub-support film layer the spin coating photoresist;
Step C, utilize electron beam exposure, development, form the groove corresponding with pre-prepared periodic array at described photoresist, the bottom of described groove communicates with the described first sub-support film layer;
Step D, in described groove deposit metallic material, form the metallic particles periodic array at the first sub-support film layer;
Remaining photoresist on step e, removal the described first sub-support film layer;
Step F, form the second support film layer at the described first sub-support film layer, the described first sub-support film layer and the second sub-support film layer are wrapped in described metallic particles periodic array wherein jointly;
Step G, the described metallic particles periodic array of etching be the substrate of view field downwards.
7. preparation table surface plasma according to claim 6 strengthens the method for symmetrical structure, it is characterized in that, the sub-support film that forms at twice in described steps A and the step F is symmetrical about described metallic particles periodic array.
8. preparation table surface plasma according to claim 6 strengthens the method for symmetrical structure, it is characterized in that, the metallic particles periodic array that forms among the described step D is to be the gold grain array that square lattice is arranged.
9. preparation table surface plasma according to claim 8 strengthens the method for symmetrical structure, it is characterized in that, the diameter of described gold grain is between between the 50nm to 100nm, and the cycle of gold grain array is between between the 500nm to 1000nm.
10. each described preparation table surface plasma strengthens the method for symmetrical structure according to claim 6-9, it is characterized in that, in described steps A and the step F, described formation support film layer comprises:
Spin coating support film solution on substrate or the first sub-support film layer;
Described support film solution is heat-treated, thereby form the support film layer.
11. each described preparation table surface plasma strengthens the method for symmetrical structure according to claim 6-9, it is characterized in that, described substrate is Si base substrate, and the sub-support film layer of described twice formation is Kapton, and described step G comprises:
Corresponding silicon-based substrate below the wet etching removal metal periodic array structure, obtain self-supporting Kapton window, the temperature of described wet etching is 30 ℃, and etching liquid is that configuration in 12: 1: 2 forms for utilizing hydrofluorite, nitric acid and glacial acetic acid in mol ratio.
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Cited By (2)
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| CN104162677A (en) * | 2014-04-12 | 2014-11-26 | 北京工业大学 | Preparing method of flat and columnar metal microparticles |
| CN104502421A (en) * | 2014-12-16 | 2015-04-08 | 电子科技大学 | Room-temperature P-N-P heterostructure hydrogen sensor and preparation method thereof |
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Cited By (3)
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| CN104162677A (en) * | 2014-04-12 | 2014-11-26 | 北京工业大学 | Preparing method of flat and columnar metal microparticles |
| CN104162677B (en) * | 2014-04-12 | 2016-08-17 | 北京工业大学 | Flat and the preparation method of cylindrical metal microparticle |
| CN104502421A (en) * | 2014-12-16 | 2015-04-08 | 电子科技大学 | Room-temperature P-N-P heterostructure hydrogen sensor and preparation method thereof |
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Application publication date: 20130403 |