CN103008879A - Rapid laser preprocessing method and device of transparent optical element - Google Patents
Rapid laser preprocessing method and device of transparent optical element Download PDFInfo
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- CN103008879A CN103008879A CN2012105473515A CN201210547351A CN103008879A CN 103008879 A CN103008879 A CN 103008879A CN 2012105473515 A CN2012105473515 A CN 2012105473515A CN 201210547351 A CN201210547351 A CN 201210547351A CN 103008879 A CN103008879 A CN 103008879A
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Abstract
The invention discloses a rapid laser preprocessing method and a rapid laser preprocessing device of a transparent optical element. According to the rapid laser preprocessing method and device, a series of laser reflecting devices is respectively arranged relative to the surface and the back surface of the transparent optical element, a laser beam to be preprocessed goes into the surface of the transparent optical element, penetrates through a sample to be processed and then goes out of the back surface of the sample to be preprocessed, and the emergent laser beam is reflected by the reflecting devices, then irradiates to the back surface of the sample to be preprocessed again, penetrates through the sample to be preprocessed and then goes out of the surface of the sample to be preprocessed; and as analogies, the laser beam to be preprocessed is subjected to the mutual reflection action of the front reflecting device and the rear reflecting device, the laser beam to be preprocessed passes through the transparent optical element for multiple times to carry out parallel multiple radiation preprocessing on the surface, the back surface and the inside of the element, and therefore the laser preprocessing speed of the transparent optical element is greatly increased. The rapid laser preprocessing method and device disclosed by the invention can be used for multiple fields, such as defect repair and in-vivo characteristic laser processing of the optical surface and subsurface and is particularly suitable for carrying out rapid laser preprocessing on the large-calibre transparent optical element so as to improve the laser damage resistance of the large-calibre transparent optical element.
Description
Technical field
The present invention relates to optical material laser pre-treated field, specifically a kind of fast laser preprocess method and device of transparent optical element.
Background technology
In light laser and application process thereof, the absorption characteristic of optical element, defect distribution and anti-damage ability thereof etc. all are the key factors that can system normally move.Under present technical conditions, to laser diode and the system that general industry is used, all be to comprise anti-laser damage ability by the optical property that the processing technology of improving optical element improves optical element usually.But the raising that Laser output energy or power level is required along with various application only improves from traditional processing method and technique and become technically more and more difficult, and cost is expensive.In some special applications, as set up the ultra-large type strong laser system and develop its application, adopt traditional processing method and technique to be difficult to satisfy specification requirement.
The optical property and the laser damage threshold thereof that improve optical element by laser pre-treated are a kind of effective methods.The laser pre-treated technology normally adopts power density or energy density optical element to be carried out the radiation treatment of 100% covering a little less than the laser beam (subthreshold value laser beam) of optic element damage threshold value.The laser pre-treated process can effectively be removed pollution and surperficial, the subsurface defect of optical element surface, thereby improves the laser damage threshold of element.
Generally in the laser pre-treated process, in order to reach better treatment effect, the laser beam that needs to adopt intensity to increase successively carries out the multi irradiation processing to sample, and will reasonably control the laser intensity of initial treatment and the laser intensity of all subsequent treatment etc. according to concrete element situation.In addition, because the damage threshold of the optical element in the ultra-large type strong laser system is had relatively high expectations, therefore it is carried out the subthreshold value laser pre-treated need to use higher power or energy density.So, utilize general industry commercial lasers device to carry out laser pre-treated, usually light beam need to be focused into smaller spot size and could satisfy the needed laser power of laser subthreshold value preliminary treatment or fluence level.
Transparent optical element commonly used in the ultra-large type strong laser system mainly contains vitreous silica (Fused Silica), KDP crystal etc.In actual the use, in order to increase the transmissivity of laser, meeting anti-reflection film on the plated surface of element.So, element surface pollutes, defective etc. in defective, the substrate surface under the film and subsurface defect in the film, the baseplate material body, all is the factor of potential reduction element laser damage threshold.Therefore according to specific circumstances, sometimes need the logical light volume of effects on surface, inferior surface and whole element all to carry out laser pre-treated.
Owing to above reason, laser pre-treated technique is usually not only time-consuming but also expensive, particularly to needed optical element in the ultra-large type strong laser system, because its optics bore is relatively very large, the laser pre-treated technology is relatively more slow and expensive, and becoming corresponds to reality hardly.
The preprocess method that adopts in present visible bibliographical information and the patent all is to focus on sample surfaces processing laser beam usually, and sample surfaces is carried out point by point scanning.Take the optical element of 0.5 meter of 0.5 meter X of a bore as example, if the preliminary treatment facula area is for being 1 millimeter of 1 millimeter X, the repetition rate of laser instrument is 10 Hz, when then its single surperficial all standing irradiation once just being cost approximately 7 hours.If technological requirement is processed 5 different-energy levels, then complete with time-consuming 35 hours to its single surface treatment.If two surfaces of element all are disposed, directly sweep time was with time-consuming 70 hours.This is usually also just only for the preprocessing process on surface.If carry out processing in the material bodies, consuming time will be longer.
Summary of the invention
The technical problem to be solved in the present invention provides a kind of fast laser preprocess method and device of transparent optical element, solution utilizes the laser pre-treated technology to improve in the optical elements of large caliber laser damage threshold process because consuming time long and can not satisfy the problem of actual operation requirements, the present invention recycles and reuses laser energy, and simultaneously optical element front surface, rear surface and body internal characteristic are carried out the parallel processing of multi irradiation, thereby can significantly improve the speed of laser pre-treated.
Technical scheme of the present invention is:
A kind of fast laser preprocess method of transparent optical element may further comprise the steps:
(1), the surface of transparent optical element arranges one group of front-reflection device at first relatively, the back side of transparent optical element arranges one group of back reflection device relatively;
(2), the process points 1 that the preliminary treatment laser beam is incided the transparent optical element surface is carried out the irradiation preliminary treatment, the preliminary treatment laser beam penetrates behind the pending sample process points 1 ' outgoing from the pending sample back side, laser beam after the outgoing shines the process points 2 ' on the treated sample back side again after the reflection of back reflection device, and penetrate behind the pending sample from process points 2 outgoing of pending sample surfaces, the laser beam after the outgoing shines the lip-deep process points 3 of treated sample more again after the reflection of front-reflection device; So analogize, the preliminary treatment laser beam is through the mutual reflex of front-reflection device and back reflection device, repeatedly pass through optical element, the irradiation preliminary treatment has all been carried out in zone to preliminary treatment light beam process between N process points at N the process points on transparent optical element surface, the back side and inner corresponding two process points of transparent optical element, wherein, N 〉=1.
A kind of fast laser pretreatment unit of transparent optical element, include the LASER Light Source that relative transparent optical element surface arranges, relatively one group of front-reflection device arranging of transparent optical element surface and one group of back reflection device of relative transparent optical element back side setting.
Described one group of front-reflection device is by the sub-installation composition of a plurality of front-reflections, and the sub-device of each front-reflection is comprised of one or more speculums or reflecting prism; Described one group of back reflection device is by the sub-installation composition of a plurality of back reflections, and the sub-device of each back reflection is comprised of one or more speculums or reflecting prism.
The fast laser pretreatment unit of described transparent optical element also includes the rear end and the laser energy between the transparent optical element surface that are set in turn in LASER Light Source and adjusts control device, laser beam shaping treating apparatus and optics light splitting wedge, be provided with the CCD imaging system behind the first reflection output of optics light splitting wedge, be provided with light-dividing device behind its second reflection output, be respectively arranged with photodetector and measurement of laser energy system behind two minutes light output ends of light-dividing device.
The fast laser pretreatment unit of described transparent optical element also includes the laser beam absorption plant of relative transparent optical element surface or back side setting.
Transparent optical element in the strong laser system, surface all can plate anti-reflection film usually.See Fig. 1, the transmitance of setting the sample front and back all is T; Front-reflection device 11 and back reflection device 12 are by the sub-installation composition of a plurality of reflections, and each reflects sub-device can be that one or more speculums form, or is comprised of reflecting prism.Reflect sub-device with each and consist of example by two-face mirror, the reflectivity of every laser high reflective mirror all is R; 9 of elements can be ignored to the absorption of laser energy as the laser-light transparent material.Like this, the laser intensity when process points 1 place is I
1, the laser intensity that process points 1 ' is located is I
1 '=TI
1, the light intensity that process points 2 ' is located is I
2 '=T
2R
2I
1, the intensity at process points 2 places is I
2=T
3R
2I
1, the like, to the process points N on the element and N ', if N is even number, then the laser intensity located of process points N and N ' is respectively I
N=T
2N-1R
2(N-1)I
1And I
N '=(TR)
2(N-1)I
1If N is odd number, then the laser intensity located of process points N and N ' is respectively I
N=(TR)
2(N-1)I
1And I
N '=T
2N-1R
2(N-1)I
1Suppose that transmitance and reflectivity all are 99.95%, the laser intensity at process points 10 places is 98.2% of process points 1 place, and the laser intensity at process points 30 places is 94.3% of process points 1 place; Suppose that transmitance and reflectivity are 99.5%, the laser intensity at process points 10 places still has 83.1% of process points 1 place.
The size of N is decided by the reflectivity of sample transmitance and laser reflection device in the practical application, optical element for high-transmission rate, assumes samples but the reflectivity of surperficial transmitance and laser high reflective mirror all is 99.95%, then aforementioned calculating shows when N=30, the laser intensity of this laser irradiation point can also reach initial treatment and put 94.3% of 1 place, satisfies common preliminary treatment laser system to the requirement of light intensity uniformity.When N=30, laser pre-treated speed has been brought up to 2N times of commonsense method, namely 60 times.In addition, sample body internal characteristic has also obtained processing simultaneously in scanning process in the present invention.
Advantage of the present invention:
Adopt method of the present invention to carry out laser pre-treated, after the horizontal single pass of the relative laser of sample is finished, will form simultaneously the treated hot spot overlay area (see figure 2) of N bar on sample 9 surfaces and the back side.And the common laser pre-treated device that does not adopt energy to reclaim only focuses on a surface usually, and after the relative laser transversal scanning of sample was once finished, laser only formed treated hot spot overlay area on a surface of sample.As seen, adopt the method for the invention, can make pretreated Speed improving to 2N times of commonsense method; In addition, sample body internal characteristic has also obtained processing simultaneously in scanning process in the present invention.
Description of drawings
Fig. 1 is principle schematic of the present invention.
Fig. 2 is the structural representation on the transparent optical element surface after the processing of the present invention.
Fig. 3 is the structural representation of the fast laser pretreatment unit of transparent optical element in the specific embodiment of the invention.
The specific embodiment
See Fig. 3, a kind of fast laser pretreatment unit of transparent optical element, include the LASER Light Source 1 that relatively processed transparent optical element 9 surfaces arrange, the laser energy that is set in turn between LASER Light Source 1 rear end and transparent optical element 9 surfaces is adjusted control device 2, laser beam shaping treating apparatus 3 and optics light splitting wedge 4, be arranged at the CCD imaging system 5 after optics light splitting wedge 4 first reflects outputs, be arranged at the light-dividing device 6 after optics light splitting wedge 4 second reflects outputs, be arranged at respectively measurement of laser energy system 7 and photodetector 8 behind 6 two minutes light output ends of light-dividing device, one group of back reflection device 12 that one group of front-reflection device 11 that relatively processed transparent optical element 9 surfaces arrange and relative transparent optical element 9 back sides arrange, the laser beam absorption plant 13 of relative transparent optical element back side setting.
A kind of fast laser preprocess method of transparent optical element may further comprise the steps:
(1), the laser beam that sent by LASER Light Source 1 adjusts control device 2 and laser beam shaping treating apparatus 3 through laser energy successively, laser energy is adjusted laser intensity and the light beam form that control device 2 and 3 pairs of laser beam shaping treating apparatus be applied on the transparent optical element and is accurately controlled;
(2), the light beam by 3 outgoing of laser beam shaping treating apparatus is divided into two less bundle folded light beam and the larger transmitted light beams of a beam energy of energy through optics light splitting wedge 4;
(3), the first bundle folded light beam enters CCD imaging system 5, be used for laser beam is carried out the beam quality monitoring, the second bundle folded light beam is divided into two-beam by light-dividing device 6, wherein light beam enters measurement of laser energy system 7, be used for the energy of laser beam is monitored, light beam then enters photodetector 8 in addition, and in order to laser pulse is carried out the monitoring of pulse proterties, also paired pulses quantity is counted and the laser pre-treated system is carried out other controls simultaneously;
(4), the laser beam incident that sees through optics light splitting wedge 4 is to the process points 1 on processed transparent optical element 9 surfaces and see through sample from the process points 1 ' outgoing at the sample back side, so just to the process points 1 of sample surfaces and 1 ' and 2 between the zone of sample interior laser beam process all carried out the irradiation preliminary treatment; Then after reflecting through back reflection device 12 from transparent optical element 9 back side process points 1 ' emitting laser light beam, shine the process points 2 ' at the sample back side and again see through transparent optical element 9, process points 2 outgoing by transparent optical element 9 surfaces, same, laser beam to process points 2 and 2 ' and 2 between the zone of sample interior laser beam process also all carried out the irradiation preliminary treatment, the laser beam of putting after 2 outgoing from transparent optical element 9 surface treatments shines the lip-deep process points 3 of treated sample more again after 11 reflections of front-reflection device; So analogize, the preliminary treatment laser beam is through the mutual reflex of front-reflection device and back reflection device, repeatedly pass through treated sample, the irradiation preliminary treatment has all been carried out in zone to preliminary treatment light beam process between N process points at N the process points on items surface, the back side and corresponding two process points of element internal, wherein, N 〉=1;
(5), absorbed by laser absorption device 13 through the laser beam after the individual process points of sample back side N '.
Claims (5)
1. the fast laser preprocess method of a transparent optical element is characterized in that: may further comprise the steps:
(1), the surface of transparent optical element arranges one group of front-reflection device at first relatively, the back side of transparent optical element arranges one group of back reflection device relatively;
(2), the process points 1 that the preliminary treatment laser beam is incided the transparent optical element surface is carried out the irradiation preliminary treatment, the preliminary treatment laser beam penetrates behind the pending sample process points 1 ' outgoing from the pending sample back side, laser beam after the outgoing shines the process points 2 ' on the treated sample back side again after the reflection of back reflection device, and penetrate behind the pending sample from process points 2 outgoing of pending sample surfaces, the laser beam after the outgoing shines the lip-deep process points 3 of treated sample again after the reflection of front-reflection device; So analogize, the preliminary treatment laser beam is through the mutual reflex of front-reflection device and back reflection device, repeatedly pass through transparent optical element, the irradiation preliminary treatment has all been carried out in zone to preliminary treatment light beam process between N process points at N the process points on transparent optical element surface, the back side and inner corresponding two process points of transparent optical element, wherein, N 〉=1.
2. the fast laser pretreatment unit of a transparent optical element, include the LASER Light Source that relative transparent optical element surface arranges, it is characterized in that: the one group of front-reflection device that includes also that relative transparent optical element surface arranges and one group of back reflection device of relative transparent optical element back side setting.
3. the fast laser pretreatment unit of a kind of transparent optical element according to claim 2, it is characterized in that: described one group of front-reflection device is by the sub-installation composition of a plurality of front-reflections, and the sub-device of each front-reflection is comprised of one or more speculums or reflecting prism; Described one group of back reflection device is by the sub-installation composition of a plurality of back reflections, and the sub-device of each back reflection is comprised of one or more speculums or reflecting prism.
4. the fast laser pretreatment unit of a kind of transparent optical element according to claim 2, it is characterized in that: the fast laser pretreatment unit of described transparent optical element also includes the rear end and the laser energy between the transparent optical element surface that are set in turn in LASER Light Source and adjusts control device, laser beam shaping treating apparatus and optics light splitting wedge, be provided with the CCD imaging system behind the first reflection output of optics light splitting wedge, be provided with light-dividing device behind its second reflection output, be respectively arranged with photodetector and measurement of laser energy system behind two minutes light output ends of light-dividing device.
5. the fast laser pretreatment unit of a kind of transparent optical element according to claim 2 is characterized in that: the fast laser pretreatment unit of described transparent optical element also includes the laser beam absorption plant that relative transparent optical element surface or the back side arrange.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105665921A (en) * | 2016-04-21 | 2016-06-15 | 中国工程物理研究院激光聚变研究中心 | Optical element laser pretreatment system |
| CN105750740A (en) * | 2016-04-21 | 2016-07-13 | 中国工程物理研究院激光聚变研究中心 | Optical element laser preprocessing system |
| CN105772937A (en) * | 2016-05-26 | 2016-07-20 | 中国科学院上海光学精密机械研究所 | Laser pretreatment device and method with transparent optical elements arranged side by side |
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| CN105665921A (en) * | 2016-04-21 | 2016-06-15 | 中国工程物理研究院激光聚变研究中心 | Optical element laser pretreatment system |
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| CN105772937A (en) * | 2016-05-26 | 2016-07-20 | 中国科学院上海光学精密机械研究所 | Laser pretreatment device and method with transparent optical elements arranged side by side |
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Application publication date: 20130403 |