CN102998871A - Reflecting film structure of transition layer - Google Patents
Reflecting film structure of transition layer Download PDFInfo
- Publication number
- CN102998871A CN102998871A CN2011102654834A CN201110265483A CN102998871A CN 102998871 A CN102998871 A CN 102998871A CN 2011102654834 A CN2011102654834 A CN 2011102654834A CN 201110265483 A CN201110265483 A CN 201110265483A CN 102998871 A CN102998871 A CN 102998871A
- Authority
- CN
- China
- Prior art keywords
- film structure
- reflecting film
- glass substrate
- transition bed
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Landscapes
- Optical Elements Other Than Lenses (AREA)
Abstract
The invention provides a reflecting film structure of a transition layer. The reflecting film structure comprises a glass substrate, a reflecting layer laminated on the glass substrate and a transition layer arranged between the reflecting layer and the glass substrate. The transition layer is made of Cr or stainless steel or Al or Ti or Ni or ITO or Xn3In2O6 or fluorine-mixed ITO or ZnO. The thickness of the transition layer is 5-200 nanometers. The reflecting film structure of the transition layer is made of the material similar to the reflecting layer, so that firmness in connection between the reflecting layer and the glass substrate is ensured, and color changing efficiency of a transmission layer can be improved.
Description
Technical field
The present invention relates to a kind of transition bed reflecting film structure, belong to automobile and use the anti-glare inner rear-view mirror field.
Background technology
Electrochromic device refers to that reversible variation occurs the optical property of off-color material under the outside alive driving, shows will occur painted on the color and variation that fade, can realize the purpose of light modulation according to painted and contrast that fade.Compare with traditional CRT display technique, electrochromic device has very low driving voltage; The characteristics such as color is adjustable.The particularly important is, electrochromic device super clearly contrast and broad visual angle will become one of main flow of paper type flat-panel monitor of new generation.In addition, because the change of electrochromic device color can be played the modulation to light, in auto industry, can be used for anti-dazzle driving mirror, in building construction as a kind of novel intelligent glass.
Electrochromic device generally comprises glass substrate, glue frame, electrochromic material, transparency conducting layer, conductive reflective.Because electrochromic material contains cathode electrochromic material and anode electrochromic material, and transparency conducting layer and conductive reflective are had certain corrosivity, therefore need transparency conducting layer and the certain corrosion resistance of conductive reflective needs.Generally select ITO at present transparency conducting layer, the ITO of doped with fluorine, ZnO, Zn
3In
2O
6, ITO/ metal/ITO (IMI) etc., materials belong to inorganic aspect, and corrosion resistance is better.Al has high reflectance in conductive reflective, but stability is poor, be easy to be subject to the corrosion of environment, generally seldom be used for doing independent conductive reflective, therefore conductive reflective is generally selected the metal alloy of silver alloy and so on, mainly be because silver has higher reflectivity, being coated on reflectivity on glass can arrive more than 98%, but silver is stable poor simultaneously, easily cohesion, apparent defective occurs, therefore have a lot of products and select silver alloy as the material of conduction reflectance coating.These materials mainly contain Ag/Au, Ag/Pt, and the alloy that the noble metals such as Ag/Pd form has higher stability, but because cost is higher, and just the someone had added Cu afterwards, Ti, stainless steel, Ni etc. are used for improving stability, reduce cost.
Principle of work in electrochromic device provides electronics for conductive reflective, and transparency conducting layer provides the hole.In order to reduce driving voltage, just need to improve electronics and hole such as efficient.Therefore require the work function of anode.(least energy that work function refers to make an electronics to overflow and must provide from solid surface immediately) is high as far as possible, and the work function of negative electrode is low as far as possible.Anode generally is to adopt transparent metal (such as Au), transparent conductive polymer (such as polyaniline) and the ITO electro-conductive glass with high work function, and the material that brings disaster to that the most generally adopts is ITO, and the work function that it has is 4.7eV.The work function of above-mentioned silver alloy negative electrode is also relatively high, has reduced the injection efficiency of electronics.Cause that thus driving voltage raises, and makes the device accelerated deteriorations such as electrochromic device or LCD, hydraulic performance decline.
Summary of the invention
For solving the problems of the technologies described above, the object of the present invention is to provide a kind of performance of improving electrochromic device, prolong its serviceable life, improve yield rate, the transition bed reflecting film structure that reduces production costs.
Transition bed reflecting film structure of the present invention comprises: glass substrate; Reflection horizon, described reflective layer are stacked on the described glass substrate; Between described reflection horizon and described glass substrate, be provided with a transition bed.
The material of described transition bed is Cr or stainless steel or Al or Ti or Ni or ITO or Zn
3In
2O
6Or mix fluorine ITO or ZnO.The thickness of described transition bed is 5 nanometers～200 nanometers.
Transition bed reflecting film structure of the present invention adopts the material similar with the reflection horizon, has guaranteed the fastness that is connected between reflection horizon and the glass substrate, can also improve the variable color efficient of emission layer simultaneously.
Description of drawings
Fig. 1 is transition bed reflecting film structure structural representation of the present invention.
Description of reference numerals in the transition bed reflecting film structure accompanying drawing of the present invention:
1-reflection horizon 2-glass substrate 3-transition bed
Embodiment
Below in conjunction with accompanying drawing transition bed reflecting film structure of the present invention is described in further detail.
As shown in Figure 1, transition bed reflecting film structure of the present invention comprises: glass substrate 2; Be layered in the reflection horizon 1 on the glass substrate 2; Be arranged on the transition bed 3 between reflection horizon 1 and the glass substrate 2.The material of transition bed 3 is ITO, and the thickness of transition bed 3 is 35 nanometers.
Transition bed reflecting film structure of the present invention adopts the material similar with the reflection horizon, has guaranteed the fastness that is connected between reflection horizon and the glass substrate, can also improve the variable color efficient of emission layer simultaneously.
Below the preferred embodiment of the invention is specified, but the invention is not limited to embodiment, those of ordinary skill in the art also can make all modification that is equal to or replacement under the prerequisite of the invention spirit, the modification that these are equal to or replacement all are included in the application's claim limited range.
Claims (3)
1. the transition bed reflecting film structure comprises: glass substrate; Reflection horizon, described reflective layer are stacked on the described glass substrate; And,
Be arranged on the transition bed between described reflection horizon and the described glass substrate.
2. transition bed reflecting film structure according to claim 1 is characterized in that, the material of described transition bed is Cr or stainless steel or Al or Ri or Ni or ITO or Zn
3In
2O
6Or mix fluorine ITO or ZnO.
3. transition bed reflecting film structure according to claim 2 is characterized in that, the thickness of described transition bed is 5 nanometers～200 nanometers.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011102654834A CN102998871A (en) | 2011-09-08 | 2011-09-08 | Reflecting film structure of transition layer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011102654834A CN102998871A (en) | 2011-09-08 | 2011-09-08 | Reflecting film structure of transition layer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102998871A true CN102998871A (en) | 2013-03-27 |
Family
ID=47927631
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011102654834A Pending CN102998871A (en) | 2011-09-08 | 2011-09-08 | Reflecting film structure of transition layer |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102998871A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103552508A (en) * | 2013-11-15 | 2014-02-05 | 哈尔滨固泰电子有限责任公司 | Super-hydrophobic anti-dazzle rearview mirror |
| CN104044314A (en) * | 2014-07-04 | 2014-09-17 | 苏州普京真空技术有限公司 | Infrared-reflection light-tunable glass |
| CN111897169A (en) * | 2020-01-08 | 2020-11-06 | 中国海洋大学 | Construction idea and preparation method of alternating composite structure electrochromic film |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1415979A (en) * | 2002-09-24 | 2003-05-07 | 中华研升科技股份有限公司 | Electric color change lens group and material of reflective layer |
| CN1536935A (en) * | 2003-04-07 | 2004-10-13 | 林月良 | Reflected color-developing component containing electrochromic material |
| CN101419374A (en) * | 2008-11-21 | 2009-04-29 | 宁波市金榜汽车电子有限公司 | Reflection layer material for electrochromic lens and device thereof |
| CN102851525A (en) * | 2011-06-28 | 2013-01-02 | 比亚迪股份有限公司 | Silver alloy reflection film, and electrochromic device provided with the same |
-
2011
- 2011-09-08 CN CN2011102654834A patent/CN102998871A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1415979A (en) * | 2002-09-24 | 2003-05-07 | 中华研升科技股份有限公司 | Electric color change lens group and material of reflective layer |
| CN1536935A (en) * | 2003-04-07 | 2004-10-13 | 林月良 | Reflected color-developing component containing electrochromic material |
| CN101419374A (en) * | 2008-11-21 | 2009-04-29 | 宁波市金榜汽车电子有限公司 | Reflection layer material for electrochromic lens and device thereof |
| CN102851525A (en) * | 2011-06-28 | 2013-01-02 | 比亚迪股份有限公司 | Silver alloy reflection film, and electrochromic device provided with the same |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103552508A (en) * | 2013-11-15 | 2014-02-05 | 哈尔滨固泰电子有限责任公司 | Super-hydrophobic anti-dazzle rearview mirror |
| CN104044314A (en) * | 2014-07-04 | 2014-09-17 | 苏州普京真空技术有限公司 | Infrared-reflection light-tunable glass |
| CN111897169A (en) * | 2020-01-08 | 2020-11-06 | 中国海洋大学 | Construction idea and preparation method of alternating composite structure electrochromic film |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102998870A (en) | Electro-chromic material | |
| CN101419374B (en) | Reflection layer material for electrochromic lens and device thereof | |
| JP4571490B2 (en) | Electrically controllable device with variable optical and / or energy characteristics | |
| CN206421132U (en) | Electrochromic window assemblies with good reflection or translucidus energy | |
| US20030227250A1 (en) | Silver alloy thin film reflector and transparent electrical conductor | |
| CN104979037A (en) | Transparent conducting thin film with enhanced thermal stability and preparation method and application thereof | |
| KR20150063773A (en) | Dual-mode pixels including emissive and reflective device and dual-mode display using the pixels | |
| CN114467054A (en) | Electrochromic device with low-resistance transparent electrode structure | |
| CN213071172U (en) | Quantum dot light-emitting device | |
| EP2680067A1 (en) | Reflecting electrochromic device | |
| CN102998871A (en) | Reflecting film structure of transition layer | |
| CN207232591U (en) | A kind of electrochromic rearview | |
| TW201537274A (en) | Electrochromic device and method of manufacturing the same | |
| CN202306080U (en) | Photoelectric color-changing lens reflection layer provided with adhesion layer | |
| CN102851525B (en) | Silver alloy reflection film, and electrochromic device provided with the same | |
| CN202383396U (en) | Conductive reflection structure | |
| CN102831962A (en) | Medium conductive film, preparation method and electrochromic rear view mirror | |
| CN202127021U (en) | Conductive glass for thin film solar cell | |
| CN108020974A (en) | Electrochromic window assemblies with good reflection or translucidus energy | |
| CN110658660A (en) | Electrochromic device based on multilayer functional thin film and preparation method thereof | |
| CN2842478Y (en) | Plane displaying apparatus | |
| CN208580288U (en) | Electrochromic device | |
| CN209417491U (en) | A kind of full-inorganic solid-state electrochromic device transparent conductive film structure | |
| CN202995202U (en) | Anti-dazzle rearview mirror | |
| CN209015727U (en) | A kind of transparent conductive film and touch screen |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C12 | Rejection of a patent application after its publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20130327 |