CN102978606B - 以TiO2、甲酰胺、炭黑、乙炔和氮气为组元的激光诱导金属表层复合TiCN强化方法 - Google Patents
以TiO2、甲酰胺、炭黑、乙炔和氮气为组元的激光诱导金属表层复合TiCN强化方法 Download PDFInfo
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- CN102978606B CN102978606B CN201210565232.2A CN201210565232A CN102978606B CN 102978606 B CN102978606 B CN 102978606B CN 201210565232 A CN201210565232 A CN 201210565232A CN 102978606 B CN102978606 B CN 102978606B
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- acetylene
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- carbon black
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- tio
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 title claims abstract description 43
- 239000002184 metal Substances 0.000 title claims abstract description 15
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 15
- 238000000034 method Methods 0.000 title claims abstract description 12
- 239000002131 composite material Substances 0.000 title claims abstract description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 6
- 239000002344 surface layer Substances 0.000 title abstract description 4
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 title abstract 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 title abstract 6
- 229910001873 dinitrogen Inorganic materials 0.000 title abstract 3
- 230000003014 reinforcing effect Effects 0.000 title abstract 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims abstract description 17
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims abstract description 17
- 239000006229 carbon black Substances 0.000 claims abstract description 11
- 239000000203 mixture Substances 0.000 claims abstract description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims description 20
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 17
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Natural products C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 14
- -1 methane amide Chemical class 0.000 claims description 14
- 239000011248 coating agent Substances 0.000 claims description 10
- 238000000576 coating method Methods 0.000 claims description 10
- 239000000470 constituent Substances 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 2
- 238000011065 in-situ storage Methods 0.000 abstract description 5
- 230000002708 enhancing effect Effects 0.000 abstract 1
- 230000002787 reinforcement Effects 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 7
- 241000931526 Acer campestre Species 0.000 description 6
- 229910000831 Steel Inorganic materials 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 239000010959 steel Substances 0.000 description 6
- 238000004381 surface treatment Methods 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 229910000851 Alloy steel Inorganic materials 0.000 description 3
- 229910000975 Carbon steel Inorganic materials 0.000 description 3
- 229910000639 Spring steel Inorganic materials 0.000 description 3
- 229910001315 Tool steel Inorganic materials 0.000 description 3
- 239000010962 carbon steel Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 2
- 101001087029 Chironomus tentans 60S ribosomal protein L15 Proteins 0.000 description 1
- 229910000997 High-speed steel Inorganic materials 0.000 description 1
- 101001097774 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) 40S ribosomal protein S21-A Proteins 0.000 description 1
- 101001097805 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) 40S ribosomal protein S21-B Proteins 0.000 description 1
- 101000724270 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) 60S ribosomal protein L15-A Proteins 0.000 description 1
- 101000724281 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) 60S ribosomal protein L15-B Proteins 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 235000006708 antioxidants Nutrition 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000004663 powder metallurgy Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 102200133015 rs2234916 Human genes 0.000 description 1
- 102220041874 rs587780791 Human genes 0.000 description 1
- 102200082901 rs713040 Human genes 0.000 description 1
- 102220060547 rs786203080 Human genes 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
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- Chemical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
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CN201210565232.2A CN102978606B (zh) | 2012-12-24 | 2012-12-24 | 以TiO2、甲酰胺、炭黑、乙炔和氮气为组元的激光诱导金属表层复合TiCN强化方法 |
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CN201210565232.2A CN102978606B (zh) | 2012-12-24 | 2012-12-24 | 以TiO2、甲酰胺、炭黑、乙炔和氮气为组元的激光诱导金属表层复合TiCN强化方法 |
Publications (2)
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CN102978606A CN102978606A (zh) | 2013-03-20 |
CN102978606B true CN102978606B (zh) | 2015-01-07 |
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CN201210565232.2A Expired - Fee Related CN102978606B (zh) | 2012-12-24 | 2012-12-24 | 以TiO2、甲酰胺、炭黑、乙炔和氮气为组元的激光诱导金属表层复合TiCN强化方法 |
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CN104827146B (zh) * | 2015-04-17 | 2017-08-29 | 江苏华耀机械制造有限公司 | 一种激光诱导轮对表面强化与光整加工方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101812684A (zh) * | 2010-04-19 | 2010-08-25 | 姚建华 | 一种金属表面激光强化涂层的制备方法 |
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2012
- 2012-12-24 CN CN201210565232.2A patent/CN102978606B/zh not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN101812684A (zh) * | 2010-04-19 | 2010-08-25 | 姚建华 | 一种金属表面激光强化涂层的制备方法 |
Non-Patent Citations (3)
Title |
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姚正军,等.多元Ti(CN)膜的制备和性能研究.《东南大学学报(自然科学版)》.2002,第32卷(第1期),86-89. * |
杨玉玲,等.激光熔覆原位自生Ti(C,N)陶瓷涂层的热力学理论及工艺.《东北大学学报(自然科学版)》.2010,第31卷(第8期),1165-1169. * |
王辉平,等.TiO2在N2气氛中碳热还原直接合成TiCN固溶体的研究.《稀有金属与硬质合金》.1996,(第127期),25-29. * |
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Inventor after: Wang Hui Inventor after: Chen Xiaolong Inventor after: Zuo Jianmin Inventor after: Tong Han Inventor after: Xiao Shengliang Inventor after: Zhang Rongrong Inventor before: Wang Hui Inventor before: Zuo Jianmin Inventor before: Tong Han Inventor before: Xiao Shengliang Inventor before: Zhang Rongrong |
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Effective date of registration: 20201110 Address after: 226600 No. 8, Xiao Xing Avenue, Chengdong Town, Haian City, Nantong, Jiangsu. Patentee after: HAIAN CHANGZHOU University HIGH TECH RESEARCH & DEVELOPMENT CENTER Address before: Gehu Lake Road Wujin District 213164 Jiangsu city of Changzhou province No. 1 Patentee before: CHANGZHOU University |
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