CN102970812A - Method for improving plasma uniformity - Google Patents
Method for improving plasma uniformity Download PDFInfo
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- CN102970812A CN102970812A CN2011102634953A CN201110263495A CN102970812A CN 102970812 A CN102970812 A CN 102970812A CN 2011102634953 A CN2011102634953 A CN 2011102634953A CN 201110263495 A CN201110263495 A CN 201110263495A CN 102970812 A CN102970812 A CN 102970812A
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- battery lead
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Abstract
The invention discloses a method for improving plasma uniformity. The method comprises the following steps of (a) providing a plasma generation device; (b) providing a metal surface treatment layer for an edge area of an electrode plate of the plasma generation device to change surface roughness of the electrode plate to adjust distribution of radio-frequency current; and (c) leading the radio-frequency current to the electrode plate and leading process gas into the plasma generation device to produce plasma. By means of the method, the plasma generation device can generate uniform plasma distribution.
Description
Technical field
The present invention relates to the inhomogeneity method of a kind of improvement electricity slurry, and it is a kind of by changing Metal Surface Roughness to improve the method for electricity slurry distributing homogeneity in the electric sizing device to be particularly related to use.
Background technology
In today semiconductor process techniques, such as wafer factory or chip-shaped solar energy factory, electricity slurry enhanced chemical formula gas-phase deposition (Plasma enhance chemical vapor deposition, PECVD) system can reach very high efficiency thin film deposition at the chip of wafer (disk) level.For in response to the volume production of industrial quarters now, the substrate of silicon film solar batteries has the gradually trend of large tracts of land.
The industrial electro slurry assists the frequency of the used r-f generator of gas-phase deposition system mostly to be 13.56MHz at present, for with five generation panel (when the above substrate of area: 1.1m * 1.4m) carries out silicon film solar batteries technique, its along with the lifting of electricity slurry frequency in the technique so that plated film speed also increase thereupon.Battery lead plate in the auxiliary gas-phase deposition system of electricity slurry can produce standing wave effect (standing wave effect) under this frequency, it is the increase because of frequency, cause shortening of wavelength, when the substrate area of wanting plated film increases, the electromagnetic wave that transmits on the substrate will change the change that causes electric field because of its phase place, has relatively also affected the uniformity of electric slurry and the efficient of plated film.There is in addition edge effect (edge effect) in the battery lead plate edge in PECVD, change because of how much external forms when radio-frequency current conducts to battery lead plate edge produces irregular variation radiated electric field, causes the electricity slurry at general battery lead plate edge to distribute more irregular.Eight cun, the 12 cun wafers that the coated basal plate size was known by former times in today increase to for film liquid crystal display (Thin film transistor liquid crystal display, TFT LCD) during the large-area glass substrate more than one square metre in factory or the thin film solar factory, the homogeneity question of electricity slurry will have a strong impact on efficient and the cost of volume production.In order to address the above problem, having to provide a kind of electrode that produces uniformity electricity pulp density that has, to overcome the shortcoming of prior art.
With reference to the disclosed precleaning reaction chamber assembly of semiconductor manufacturing equipment surface ceramic coating of Chinese patent, publication number CN101859691A number.This patent discloses a kind of ceramic coating layer improvement electricity slurry that uses special geometry to distribute and evenly distributes, and utilize follow-up blasting treatment to make uncoated zone have consistent surface roughness with the zone of coating, produce with the phenomenon that suppresses electricity slurry bombardment privileged site.Yet the processing that this patent discloses does not disclose surface roughness that sandblast produces and changes and can change the radio-frequency (RF) energy distribution yet, namely changes electricity slurry distribution consistency degree yet.
Have the electrode that improves plasma uniformity, publication number CN201185171 a number with reference to Chinese patent is disclosed.The perturbation slotted eye that this patent discloses on a kind of electrode slice effectively improves the electrode design that electricity is starched the uniformity, eliminate edge effect by digging the part of wearing battery lead plate edge, yet the required cost of machined electrode mode that this patent discloses is higher and time-consuming.
In view of this, a kind of inhomogeneity method of change electricity slurry that can meet aforementioned need need to be provided, change the electrode plate surface roughness with lower-cost sandblast processing method, dwindle by this edge effect electricity pulp density at substrate edges place and the distribution gap of other fringe region, to improve the substrate slurry distribution consistency degree that powers on.
Summary of the invention
The invention provides the inhomogeneity method of a kind of improvement electricity slurry, can have uniform electricity slurry when large-area substrate carries out the reaction of electricity slurry by the method and distribute, its step comprises:
(a) provide plasma generation apparatus (plasma generation apparatus); (b) fringe region at battery lead plate provides the Treatment of Metal Surface layer, distributes to adjust radio-frequency current in order to the surface roughness of the fringe region that changes battery lead plate; And (c) pass into radio-frequency current in battery lead plate, and pass into process gas to produce the electricity slurry.
Plasma generation apparatus comprises cavity, battery lead plate, radio-frequency electric current source and impedance matching box.Cavity ground connection also has air admission hole and venthole; Battery lead plate is arranged in the cavity; Radio-frequency electric current source is electrically connected at least one side of battery lead plate; Impedance matching box is electrically connected at radio-frequency electric current source and battery lead plate, in order to the impedance of the mating radio-frequency electric current source feed-in impedance to battery lead plate.
In step (b): Treatment of Metal Surface layer generation type is the combination that is selected from following mode: sandblast, chemical etching, anode are processed.Surface roughness is between 1 to 300 micron, and the surface-treated layer area is 1/20th to 1/10th of battery lead plate area.
The inhomogeneity method of a kind of improvement electricity slurry of the present invention has following effect:
1. change the surface roughness at battery lead plate edge with blasting craft, the radio-frequency current that affects the battery lead plate side distributes, and the distribution intensity of the electric field due to the change radio-frequency current on battery lead plate, use the electric distribution intensity of starching in process cavity of impact, reach large-area even electricity slurry distribution aspect;
2. avoid adopting battery lead plate is carried out the grooving hole, change the battery lead plate shape, dig the expensive processing mode of the mode of cutting electrode plate surface and holing the feed-in of battery lead plate center, reach the purpose that reduces production costs;
3. outside the fringe region of battery lead plate carrying technique substrate, carry out blasting treatment, have the advantage of the electricity slurry product on battery lead plate when conveniently the electric sizing process of removing carries out.
Describe the present invention below in conjunction with the drawings and specific embodiments, but not as a limitation of the invention.
Description of drawings
For above and other objects of the present invention, feature, advantage and embodiment can be become apparent, appended the description of the drawings is as follows:
Fig. 1 is the inhomogeneity method flow diagram of improvement electricity slurry of the present invention;
Fig. 2 is plasma generation apparatus schematic diagram of the present invention;
Fig. 3 is Treatment of Metal Surface layer schematic diagram of the present invention ();
Fig. 4 is Treatment of Metal Surface layer schematic diagram of the present invention ();
Fig. 5 A, Fig. 5 B are the radio-frequency current distribution map that emi analysis software calculates.
Wherein, Reference numeral
200: plasma generation apparatus
210: cavity
211: air admission hole
212: venthole
260: vacuum source
220: heater
230: substrate
240: battery lead plate
241: the front of battery lead plate
242: the back side of battery lead plate
250: radio-frequency electric current source
251: impedance matching box
310: the Treatment of Metal Surface layer
80: battery lead plate
801: the radio-frequency current at the battery lead plate edge of blasting treatment does not distribute
81: battery lead plate
811: the radio-frequency current at the battery lead plate edge after the blasting treatment distributes
90: the radio-frequency current input point
91: the radio-frequency current input point
Embodiment
Although the present invention can show as multi-form embodiment, but reaching below explanation shown in the accompanying drawing is to be preferred embodiment of the present invention, and please to understand disclosed herein be to be thought of as one example of the present invention, and be not that intention is in order to be limited to the present invention in accompanying drawing and/or the described specific embodiment.
Now please refer to Fig. 1, be the inhomogeneity method flow diagram of improvement electricity slurry of the present invention, comprise the following step:
Step 110 a: plasma generation apparatus is provided.
The plasma generation apparatus that this step provides as shown in Figure 2.Wherein, plasma generation apparatus 200 comprises cavity 210, battery lead plate 240, radio-frequency electric current source 250 and impedance matching box 251.
Step 120: the fringe region at the battery lead plate of plasma generation apparatus provides a Treatment of Metal Surface layer.
Fringe region outside the technique substrate 230 that battery lead plate 240 carries provides the Treatment of Metal Surface layer, and radio-frequency current distributes on the battery lead plate 240 in order to adjust.
Now please cooperate with reference to Fig. 2, the film forming operation is to carry out in cavity 210 again, and cavity is ground connection and has air admission hole 211 and venthole 212.In the situation of cavity 210 ground connection, configured electrodes plate 240 makes 240 of cavity 210 and battery lead plates produce a potential difference in cavity 210, and in order to the gas that dissociates, and produces fringe region in the relative space of battery lead plate 240 and cavity 210 to limit the electricity slurry.The material of battery lead plate 240 is to be selected from: the group that nickel, gold, silver, titanium, copper, palladium, stainless steel, beallon, aluminium, coating aluminium and combination thereof consist of.Battery lead plate 240 can result from the substrate 230 electricity slurry reaction product in order to carry technique substrate 230.Also namely, the area of battery lead plate 240 need be slightly larger than the area of substrate 230.The minimum area of substrate 230: 864cm2, maximum area can be 50400cm2, that is to say between between the 864cm2 to 50400cm2.In present embodiment, substrate 230 is preferably the use glass substrate, and its thickness is in the scope of 3mm to 5mm, and long is 140cm, and wide is 110cm, and area is 15400cm2; Battery lead plate 240 length are 151cm, and wide is 123cm, and area is that the material of 18573cm2 and battery lead plate 240 is aluminium.
Generating the required energy of electricity slurry is provided by radio-frequency electric current source 250, and it is electrically connected at least one side of battery lead plate 240, gives battery lead plate 240 in order to radio-frequency current to be provided.Wherein selecting of the frequency of radio-frequency electric current source 250 can determine electric reaction rate of starching product, and it improves with frequency and increases.In present embodiment, the frequency of radio-frequency electric current source 250 is between 10 to 150MHz, is to be 40.68MHz in another embodiment.240 of radio-frequency electric current source 250 and battery lead plates are electrically connected an impedance matching box 251, in order to the impedance of the mating radio-frequency electric current source 250 feed-in impedance to battery lead plate 240, make the unmatched situation of no resistance on the radio-frequency current transmission path, impedance mismatch will make radio-frequency current transmission benefit reduce.
In addition, plasma generation apparatus 200 also comprises vacuum source 260, is connected in cavity 210, is positioned between the 10-760 holder ear (Torr) in order to the force value of controlling cavity 210.Plasma generation apparatus 200 also comprises heater 220, be arranged in the cavity 210, in order to heated substrates 240 and cavity 210 to accelerate the reaction rate of electricity slurry product.
The plasma generation apparatus 200 that provides in step 110 can be used for substrate 230 is carried out etching, deposit film and surfaction technique.
Now please cooperate again with reference to Fig. 3, be Treatment of Metal Surface layer schematic diagram of the present invention (), wherein, radio-frequency current input point 90 is positioned at the central point at the back side 242 of battery lead plate 240, because boundary condition changes the edge effect produce, and cause the electric field strength that is distributed in this place and the outer edge region at battery lead plate 240 edges that gap is arranged when conducting to battery lead plate 240 edge for improving radio-frequency current.Radio-frequency current is because there being the characteristic of conducting in one specific thicknesses of metal surface, this characteristic thickness is called and the skin degree of depth (skin effect), so the kenel variation of metal surface can affect the conduction of radio-frequency current simultaneously.
Present embodiment is that the fringe region outside the substrate 230 that 241 edges, front of battery lead plate 240 carry provides Treatment of Metal Surface layer 310, distributes with radio-frequency current on the adjustment battery lead plate 240 in order to the surface roughness that changes battery lead plate 240 fringe regions.Treatment of Metal Surface layer 310 processing mode are the combinations that is selected from following mode: sandblast, chemical etching, anode are processed.In one embodiment of the invention, the generation type of Treatment of Metal Surface layer 310 is with blasting treatment control surface roughness, and the surface roughness of Treatment of Metal Surface layer 310 is between 1 to 300 micron.In another embodiment of the present invention, the surface roughness of Treatment of Metal Surface layer 310 is to be 6.3 microns.Treatment of Metal Surface layer 310 is the edges that are positioned at battery lead plate 240, and accounts for 1/20th to 1/10th of battery lead plate 240 areas.
Now please cooperate again with reference to Fig. 4, be the schematic diagram (two) of Treatment of Metal Surface layer of the present invention, wherein, radio-frequency current input point 91 is positioned at the edge of battery lead plate 240, for not affecting main radio-frequency current conducting path, Treatment of Metal Surface layer 310 is not disposed at the radio-frequency current input.
Now please cooperate again with reference to Fig. 5 A, Fig. 5 B the radio-frequency current distribution map that calculates for emi analysis software.By learning among the figure, the radio-frequency current at the battery lead plate edge after the blasting treatment distributes 811, and obviously more the radio-frequency current at the battery lead plate edge of blasting treatment distribution 801 minimizings are not many for the irregular Distribution Phenomena of radio-frequency current.
To sum up, the inhomogeneity method of a kind of improvement electricity slurry of the present invention has following effect:
1. change the surface roughness at battery lead plate edge with blasting craft, the radio-frequency current that affects the battery lead plate side distributes, and the distribution intensity of the electric field due to the change radio-frequency current on battery lead plate, use the electric distribution intensity of starching in process cavity of impact, reach large-area even electricity slurry distribution aspect;
2. avoid adopting battery lead plate is carried out the grooving hole, change the battery lead plate shape, dig the expensive processing mode of the mode of cutting electrode plate surface and holing the feed-in of battery lead plate center, reach the purpose that reduces production costs; And
3. outside the fringe region of battery lead plate carrying technique substrate, carry out blasting treatment, have the advantage of the electricity slurry product on battery lead plate in the time of can conveniently removing electric sizing process and carry out.
Certainly; the present invention also can have other various embodiments; in the situation that does not deviate from spirit of the present invention and essence thereof; those of ordinary skill in the art work as can make according to the present invention various corresponding changes and distortion, but these corresponding changes and distortion all should belong to the protection range of the appended claim of the present invention.
Claims (12)
1. one kind is improved the inhomogeneity method of electricity slurry, it is characterized in that step comprises:
(a) provide a plasma generation apparatus, this plasma generation apparatus comprises:
One cavity, this cavity ground connection and have an air admission hole and a venthole;
One battery lead plate is arranged in this cavity;
One radio-frequency electric current source, be electrically connected this battery lead plate at least on one side; And
One impedance matching box is electrically connected at this radio-frequency electric current source and this battery lead plate, in order to the impedance of mating this radio-frequency electric current source this feed-in impedance to this battery lead plate;
(b) fringe region at this battery lead plate provides a Treatment of Metal Surface layer, distributes to adjust this radio-frequency current in order to the surface roughness that changes this battery lead plate; And
(c) pass into this radio-frequency current in this battery lead plate, and pass into process gas to produce the electricity slurry.
2. the inhomogeneity method of improvement electricity slurry according to claim 1 is characterized in that this plasma generation apparatus also comprises a vacuum source, holds in the palm between the ear at 10-760 in order to the force value of controlling this cavity.
3. the inhomogeneity method of improvement electricity slurry according to claim 1 is characterized in that this plasma generation apparatus can be used for this substrate is carried out an etching, a deposit film or a surfaction technique.
4. the inhomogeneity method of improvement electricity slurry according to claim 1 is characterized in that the area of this battery lead plate is between between the 864cm2 to 50400cm2.
5. the inhomogeneity method of improvement electricity slurry according to claim 1 is characterized in that the material of this electrode is for to be selected from: the group that nickel, gold, silver, titanium, copper, palladium, stainless steel, beallon, aluminium, coating aluminium and combination thereof consist of.
6. the inhomogeneity method of improvement electricity slurry according to claim 1 is characterized in that the frequency of this radio-frequency current is between 10 to 150MHz.
7. the inhomogeneity method of improvement electricity slurry according to claim 1 is characterized in that the frequency of this radio-frequency current is 40.68MHz.
8. the inhomogeneity method of improvement electricity slurry according to claim 1 is characterized in that the generation type of this Treatment of Metal Surface layer of step (b) is the combination that is selected from following mode: sandblast, chemical etching, anode processing.
9. the inhomogeneity method of improvement electricity slurry according to claim 8 is characterized in that the generation type of this Treatment of Metal Surface layer of step (b) is better for blasting treatment control surface roughness.
10. the inhomogeneity method of improvement electricity slurry according to claim 1 is characterized in that the surface roughness of this Treatment of Metal Surface layer of step (b) is between 1 to 300 micron.
11. the inhomogeneity method of improvement electricity slurry according to claim 1 is characterized in that the surface roughness of this Treatment of Metal Surface layer of step (b) is preferably 6.3 microns.
12. the inhomogeneity method of improvement electricity slurry according to claim 1 is characterized in that this surface-treated layer of step (b) is positioned at the edge of this battery lead plate area, and accounts for 1/20th to 1/10th of this battery lead plate area.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011102634953A CN102970812A (en) | 2011-09-01 | 2011-09-01 | Method for improving plasma uniformity |
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| CN2011102634953A CN102970812A (en) | 2011-09-01 | 2011-09-01 | Method for improving plasma uniformity |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI578394B (en) * | 2015-12-28 | 2017-04-11 | Advanced Micro-Fabrication Equipment Inc | A plasma processing apparatus and method for uniformly etching a substrate |
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| TWI578394B (en) * | 2015-12-28 | 2017-04-11 | Advanced Micro-Fabrication Equipment Inc | A plasma processing apparatus and method for uniformly etching a substrate |
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Application publication date: 20130313 |