CN102956677B - A kind of OLED display and preparation method thereof - Google Patents
A kind of OLED display and preparation method thereof Download PDFInfo
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Abstract
The invention provides a kind of OLED display and preparation method thereof, described OLED display comprises: substrate, be positioned at the first electrode layer on described substrate, be positioned at organic function layer on described first electrode layer, be positioned at the first transparent electrode layer on described organic function layer, the case chip with described baseplate-laminating, wherein, described first electrode layer adopts and makes the electric conducting material of light reflectance more than 90% that wavelength is 620 ~ 760nm.Between the anode and transparent cathode of the making of transparent electric conducting material, form microcavity effect, ruddiness generation red shift organic function layer being produced by microcavity effect like this, make the x value of CIE reach more than 0.68, and then obtain peony OLED display.
Description
Technical field
The present invention relates to display device technology field, particularly relate to a kind of OLED display and preparation method thereof.
Background technology
Organic LED display device (OrganicLight-EmittingDiode; OLED), organic electroluminescence display device and method of manufacturing same (OrganicElectroluminesence is also called; OEL) be a quite young Display Technique.It utilizes organic semiconducting materials and luminescent material under the driving of electric current, produce luminescence to realize display.OLED and LCD compares and has many good qualities: ultralight, ultra-thin, high brightness, with great visual angle, pixel self luminescence, low-power consumption, fast-response, high definition, lower calorific value, excellent anti-seismic performance, low cost of manufacture, flexible etc.Generally believed it is the rising Display Technique of new generation of most by industry.
The principle of luminosity of OLED inserts organic function layer between the anode and cathode, and this organic function layer generally includes electric charge injection layer, charge transport layer and luminescent layer, applies suitable voltage in-between the electrodes, and device just can be luminous.OLED is divided into two kinds according to bright dipping mode, and light sends as bottom emitting type from real estate, and light sends as top emission type from rear capping.
Fig. 1 exemplifies the OLED display schematic cross-section of bottom emissive type of the prior art.The OLED display of this bottom emissive type comprises substrate 11, the anode 12 be formed on substrate 11, the organic function layer 13 be formed on anode 12, be formed at negative electrode 14, bonnet 15 and packaging plastic 16 on organic function layer 13, and bonnet 15 is fit together by packaging plastic 16 and substrate 11.Wherein, substrate 11 is generally glass, anode 12 is generally ITO transparent conductive film, organic function layer 13 generally includes hole injection layer, hole transmission layer, luminescent layer, electrode transport layer and electron injecting layer, negative electrode 14 is generally aluminium, silver, magnesium or its alloy, bonnet 15 comprises glass back cover and metal back cover, and packaging plastic 16 is generally ultraviolet curing glue.
The color of OLED display is generally made up of red, green, blue three primary colors, and three kinds of colors are sent by different luminescent materials respectively.The scope of the CIE value of red material is: the x value of CIE is the y value of 0.63 ~ 0.68, CIE is 0.30 ~ 0.35.The typical CIE value of red material is (0.66,0.34), and this kind of red application is comparatively extensive.But in some special purposes (as made trade mark), need more wine-colored CIE value, such as (0.70,0.30), redness (0.72,0.28) darker even.CIE comprises x, y two values, and in general, x value OLED display more than 0.68 of CIE just can reach peony effect, and the y value of CIE is little on wine-colored impact.
The basis of existing anode material (as ITO) is difficult to meet the requirements of peony CIE coordinate figure, this is because ITO is transparency electrode, reflectivity is very little, cannot form microcavity effect with negative electrode.It is generally acknowledged that CIE coordinate figure is between (0.68,0.32) ~ (0.72,0.28), just can reach wine-colored effect.
Summary of the invention
In order to meet the existing demand to peony OLED display, namely the x value of CIE reaches more than 0.68, and the technical solution used in the present invention is:
The invention provides a kind of OLED display, comprise: substrate, be positioned at the first electrode layer on described substrate, be positioned at organic function layer on described first electrode layer, be positioned at the first transparent electrode layer on described organic function layer, the case chip with described baseplate-laminating, it is characterized in that, described first electrode layer adopts to be made the electric conducting material of light reflectance more than 90% that wavelength is 620 ~ 760nm.
Preferably, described electric conducting material is metallic copper.
Preferably, the second transparent electrode layer between described first electrode layer and described organic function layer is also comprised.
Preferably, described second transparent electrode layer adopts ITO material to make.
Present invention also offers a kind of manufacture method of OLED display, comprising:
One substrate is provided;
The first electrode layer is made on described substrate;
Organic function layer is made on described first electrode layer;
The first transparent electrode layer is made on described organic function layer;
By described baseplate-laminating on case chip;
Wherein, described first electrode layer adopts and makes the electric conducting material of light reflectance more than 90% that wavelength is 620 ~ 760nm.
Preferably, described electric conducting material is metallic copper.
Preferably, described make the first electrode layer on the substrate after and described on described first electrode layer, make organic function layer before, also comprise: on described first electrode layer, make the second transparent electrode layer.
Preferably, described second transparent electrode layer adopts ITO material to make.
The present invention makes anode by adopting to the electric conducting material of light reflectance more than 90 that wavelength is 620 ~ 760nm, transparent metal makes negative electrode, because of the electric conducting material as anode, be that red light reflectance between 620 ~ 760nm is high to wavelength, can as reflecting electrode, transparent cathode is as transmission electrode, at the moon, organic function layer is made between sun two electrodes, during energising, red material in organic function layer can send red light, microcavity effect is formed like this between the anode made by opaque electric conducting material and transparent cathode, light generation red shift organic function layer being produced by microcavity effect, the value of the x of CIE is made to reach more than 0.68, peony OLED display can be obtained.
Accompanying drawing explanation
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, be briefly described to the accompanying drawing used required in embodiment or description of the prior art below, apparently, accompanying drawing in the following describes is some embodiments of the present invention, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings.
Fig. 1 is OLED structure schematic diagram of the prior art;
Fig. 2 is the schematic diagram of embodiment one in the present invention;
Fig. 3 is the schematic diagram of embodiment two in the present invention.
Embodiment
For enabling above-mentioned purpose of the present invention, feature and advantage become apparent more, are described in detail the specific embodiment of the present invention below in conjunction with accompanying drawing.
Set forth a lot of detail in the following description so that fully understand the present invention, but the present invention can also adopt other to be different from alternate manner described here to implement, those skilled in the art can when without prejudice to doing similar popularization when intension of the present invention, therefore, the present invention is not by the restriction of following public specific embodiment.
Embodiment one
Refer to Fig. 2 (comprising Fig. 2 (a) and Fig. 2 (b)).Fig. 2 (a) is the structural representation of the OLED display of the embodiment of the present invention one.This OLED display comprises: substrate 21, the case chip 25 being positioned at the first electrode layer 22 on substrate 21, being positioned at organic function layer 23 on the first electrode layer 22, being positioned at the first transparent electrode layer 24 on organic function layer 23, fit with substrate 21, this case chip 25 is fit together by packaging plastic 26 and substrate 21.Wherein, this first electrode layer 22 adopts the electric conducting material of light reflectance more than 90% to wavelength is 620 ~ 760nm to make.
This OLED display adopts the method as shown in Fig. 2 (b) to be made.Consult Fig. 2 (b) in detail.The manufacture method flow chart that Fig. 2 (b) is the OLED display of embodiment one.
S201, provide substrate:
There is provided a transparency carrier 21, as shown in Figure 2 (a) shows.Without restriction to the material of transparency carrier 21, can be PETG (PET), Merlon (PC), polymethyl methacrylate (PMMA), PEN (PEN), polyether sulfone (PES), cyclic olefin polymer (COC), glass or toughened glass etc.
S202, on described substrate, make the first electrode layer:
The method of magnetron sputtering is adopted to make the first electrode layer 22 on the base plate (21, as shown in Figure 2 (a) shows.The thickness of this first electrode layer 22 is 100 ~ 500nm, adopts the photoetching of gold-tinted processing procedure to obtain required electrode pattern.
The material making the first electrode layer 21 in the present embodiment is the light reflectance being 620 ~ 760nm to wavelength is the electric conducting material of more than 90%.Wavelength is the light of 620 ~ 760nm is ruddiness.Like this, when being energized, this electrode pair ruddiness has very high reflectivity, utilizes microcavity effect, easily obtains wine-colored OLED display, i.e. the OLED display of x value more than 0.68 of CIE.Broadly, as long as the material of this first electrode reaches more than 90% to red light reflectance, generally just can reach requirement, such as, metallic copper, metallic aluminium (Al), argent or its alloy to red light reflectance all more than 90%, wherein, metallic copper is preferred material, because itself color is copper red look, add its electric conductivity excellent, can as one of preferred material.
S203, on described first electrode layer, make organic function layer:
Under normal circumstances, the method for evaporation is adopted to make organic function layer 23 on the first electrode layer 22, as shown in Figure 2 (a) shows.This organic function layer 23 at least comprises organic luminous layer, and in order to make display unit have better display effect, organic function layer 23 generally includes: hole injection layer, hole transmission layer, luminescent layer, electron transfer layer, electron injecting layer.If the first electrode layer 22 is anode, the organic function layer of evaporation comprises successively: hole injection layer, hole transmission layer, luminescent layer, electron transfer layer, electron injecting layer.Wherein, the thickness of the hole injection layer of evaporation adjusts within the scope of 100 ~ 600nm, and the CIE value of OLED display changes along with the change of the thickness of organic function layer, adjusts as required, thus the OLED display that the x value that can obtain CIE is greater than 0.68.
S204, on described organic function layer, make the first transparent electrode layer:
Adopt evaporation coating method on organic function layer 23, make the first transparent electrode layer 24, as shown in Figure 2 (a) shows.This first transparent electrode layer 24 generally adopts metallic aluminium (Al), silver (Ag), magnesium (Mg) or its alloy to make.The thickness requirement of this first transparent electrode layer 24 is very thin, is preferably 5-20nm.Because if the thickness of this first transparent electrode layer 24 is too thick, the transmitance of light can be caused to decline.
S205, by described baseplate-laminating on case chip:
Packaging plastic 26 is adopted to be fitted on case chip 25 by described substrate 21, as shown in Figure 2 (a) shows.The packaging plastic 26 of usual employing is the packaging plastic of ultraviolet curing.
By the OLED display that the manufacture method of the present embodiment makes, adopt and anode is made to the electric conducting material of light reflectance more than 90% that wavelength is 620 ~ 760nm, negative electrode is made by the first transparent electrode layer, or, the electric conducting material of light reflectance more than 90% to wavelength being 620 ~ 760nm is made into negative electrode, and the first transparent electrode layer is made into anode.Like this, OLED display forms microcavity effect in the middle of two electrodes, because the luminescence of OLED is generally redness, CIE coordinate is (0.66,0.34), pass through microcavity effect, spectrum generation red shift in OLED, CIE coordinate figure can reach (0.68,0.32) ~ (0.72,0.28) scope, thus obtain peony OLED display.Because the y value of CIE is little on the impact of peony color, so CIE value can reach more than 0.68, OLED display just can send generally acknowledged peony.By the thickness of each layer of adjustment in the present embodiment, the x value of CIE even can be made to reach 0.72, this is difficult in prior art cannot accomplish in other words.
In addition, the manufacture method of the making OLED display that the embodiment of the present invention provides, simple to operate.
The anode of the OLED display in embodiment one only has one deck to the conductive material layer of the light reflectance of 620 ~ 760nm more than 90%.The transparency of this electric conducting material may not be very desirable, in order to the transparency of intensifier electrode, can also make the high transparent electrode layer of a transparency again on this conductive material layer i.e. the first electrode layer.
Embodiment two
Refer to Fig. 3 (comprising Fig. 3 (a) and Fig. 3 (b)).Fig. 3 (a) is the structural representation of the OLED display of the embodiment of the present invention two.The structure difference of the OLED in this OLED display structure and embodiment one is, also comprise the second transparent electrode layer 27 between the first electrode layer 22 and organic function layer 23, other structure and Reference numeral are identical with embodiment one, for the sake of brevity, state no longer in detail.
The manufacture method flow chart that Fig. 3 (b) is the OLED display of the embodiment of the present invention two.Step S301 is identical with S202 with the step S201 in embodiment one with S302.For the sake of brevity, be not described in detail, refer to the associated description of embodiment one.
S303, on described first electrode layer, make the second transparent electrode layer:
Under normal circumstances, the method for magnetron sputtering is adopted on the first electrode layer, to make the second transparent electrode layer 27, as shown in Fig. 3 (a).Second transparent electrode layer 27 can increase the transparency of this electrode.In theory, as long as the electric conducting material of second transparent electrode layer 27 high grade of transparency, preferred ITO material.
S304, on described second transparent electrode layer, make organic function layer:
Organic function layer 23 is made on the second transparent electrode layer 27.This step is identical with the step S203 in embodiment one, states no longer in detail, refers to the step S203 in embodiment one.
Step S305 to S306 is identical with the step S204 to S205 in embodiment one, for the sake of brevity, states no longer in detail, refers to the step S204 to S205 in embodiment one.
The above is only the preferred embodiment of the present invention; it should be pointed out that for those skilled in the art, under the premise without departing from the principles of the invention; can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (6)
1. an OLED display, comprise: substrate, be positioned at the first electrode layer on described substrate, be positioned at organic function layer on described first electrode layer, be positioned at the first transparent electrode layer on described organic function layer, the case chip with described baseplate-laminating, it is characterized in that, described first electrode layer adopts to be made the electric conducting material of light reflectance more than 90% that wavelength is 620 ~ 760nm, wherein, described electric conducting material is metallic copper, the light generation red shift produced to make described organic function layer, makes the x value of CIE value reach more than 0.68.
2. OLED display according to claim 1, is characterized in that, also comprises the second transparent electrode layer between described first electrode layer and described organic function layer.
3. OLED display according to claim 2, is characterized in that, described second transparent electrode layer adopts ITO material to make.
4. a manufacture method for OLED display, is characterized in that, comprising:
One substrate is provided;
The first electrode layer is made on described substrate;
Organic function layer is made on described first electrode layer;
The first transparent electrode layer is made on described organic function layer;
By described baseplate-laminating on case chip;
Wherein, described first electrode layer adopts to be made the electric conducting material of light reflectance more than 90% that wavelength is 620 ~ 760nm, and wherein, described electric conducting material is metallic copper, the light generation red shift produced to make described organic function layer, makes the x value of CIE value reach more than 0.68.
5. manufacture method according to claim 4, it is characterized in that, described make the first electrode layer on the substrate after and described on described first electrode layer, make organic function layer before, also comprise: on described first electrode layer, make the second transparent electrode layer.
6. manufacture method according to claim 5, is characterized in that, described second transparent electrode layer adopts ITO material to make.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN1934727A (en) * | 2004-03-19 | 2007-03-21 | 伊斯曼柯达公司 | Organic light-emitting device having improved stability |
| CN101097996A (en) * | 2007-06-20 | 2008-01-02 | 中国科学院长春光学精密机械与物理研究所 | Organic phosphorescent electroluminescence device based on cuprous complex material |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN1934727A (en) * | 2004-03-19 | 2007-03-21 | 伊斯曼柯达公司 | Organic light-emitting device having improved stability |
| CN101097996A (en) * | 2007-06-20 | 2008-01-02 | 中国科学院长春光学精密机械与物理研究所 | Organic phosphorescent electroluminescence device based on cuprous complex material |
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