CN102945716A - Annular resistor film correction method - Google Patents
Annular resistor film correction method Download PDFInfo
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- CN102945716A CN102945716A CN2012105057045A CN201210505704A CN102945716A CN 102945716 A CN102945716 A CN 102945716A CN 2012105057045 A CN2012105057045 A CN 2012105057045A CN 201210505704 A CN201210505704 A CN 201210505704A CN 102945716 A CN102945716 A CN 102945716A
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Abstract
The invention discloses an annular resistor film correction method. The correction method comprises the steps of: incising a carbon powder layer on the surface of an annular resistor film by use of a repair head to change the thickness of the carbon powder layer so as to change the total voltage of the annular resistor film; and stopping incising when the total voltage of the annular resistor film is equal to a preset total voltage to complete incision of the point. According to the method, an electric brush during processing can be omitted by introducing a total voltage feedback algorithm, thereby improving the measurement accuracy and simplifying the measurement and incision process.
Description
Technical field
The present invention relates to transducer and make the field, relate in particular to a kind of ring resistance diaphragm modification method.
Background technology
The synthetic film potential meter of annular need to be repaiied quarter to the ring resistance diaphragm in manufacturing process, so that the scale of the synthetic film potential meter of described annular is accurate.At present, what repairing of described ring resistance diaphragm generally adopted quarter is the mode that Bian Xiuke is measured on the limit, can be divided into two kinds according to the difference of supply power mode, and a kind of is the constant pressure source power supply, and another kind is constant current source power supply.
But repairing in the process at quarter of constant pressure source power supply, the contact resistance of brush can be introduced in the integrated circuit, thereby affects certainty of measurement.Repairing in the process at quarter of constant current source power supply, brush contacts with carbon film all the time, and the vibrations meeting of generation is so that brush is not firm with contacting of carbon film, thereby the accuracy of impact measurement.
As seen, at present the domestic potentiometer technology of repairing quarter all can have influence on the accuracy of measurement.
Summary of the invention
In view of this, the invention provides a kind of ring resistance diaphragm modification method, to solve the problem of the accuracy of repairing lithography impact measurement in the prior art, its concrete scheme is as follows:
A kind of ring resistance diaphragm modification method, described ring resistance diaphragm is in the constant current source power supply system, and described method comprises:
Determine center dead-center position and the carbon film border of described ring resistance diaphragm;
The zone is carved as repairing in center dead-center position and the zone between the carbon film border of described ring resistance diaphragm;
Carve the zone and choose and repair punctum described repairing;
Repair and carve head and repair the carbon dust layer that punctum is cut described ring resistance membrane surface along described, and detect the total voltage of annular resistive film sheet;
The total voltage of more described ring resistance diaphragm and default total voltage;
When the total voltage of described ring resistance diaphragm equates with the total voltage of presetting, the incision that stops to repair punctum.
Also comprise: set up the described corresponding relation of measuring quarter with total voltage of repairing, determine described default total voltage corresponding to punctum of repairing.
The process of determining the center dead-center position of described ring resistance diaphragm comprises:
Mobile described ring resistance diaphragm;
Gather the voltage between described brush contact and centre cap, when described voltage was zero, described ring resistance diaphragm stopped mobile, zero point centered by the position corresponding with described brush contact on the described ring resistance diaphragm.
The method of mobile described ring resistance diaphragm comprises:
Described ring resistance diaphragm is positioned on the rotary table, rotates described rotary table, described ring resistance diaphragm is along with described rotary table rotates;
When the voltage between the described brush that collects and centre cap during greater than the first predeterminated voltage value, described rotary table High Rotation Speed;
When the voltage between the described brush that collects and centre cap during less than the first predeterminated voltage value, the rotation of slowing down of described rotary table.
Determine the process on the carbon film border of described ring resistance diaphragm, comprising:
Mobile described brush gathers described brush and the center output voltage between zero point;
Draw described output voltage curve, there are four voltage kick points in described output voltage curve, and the position of choosing contiguous two corresponding ring resistance diaphragms of voltage kick point line mid point is the carbon film border of described ring resistance diaphragm.
Can find out from technique scheme, ring resistance diaphragm modification method disclosed by the invention, by repairing the carbon dust layer of carving head incision ring resistance membrane surface, the thickness of carbon dust layer is changed, thereby the total voltage of ring resistance diaphragm is changed, when the total voltage of ring resistance diaphragm equates with the total voltage of presetting, stop incision, finish the process at quarter of repairing of this point.Utilize this method, introduce the total voltage feedback algorithm and can exempt the participation that adds the brush in man-hour, improved certainty of measurement, make simultaneously to measure and repair the process at quarter to be simplified.
Description of drawings
In order to be illustrated more clearly in the embodiment of the invention or technical scheme of the prior art, the below will do to introduce simply to the accompanying drawing of required use in embodiment or the description of the Prior Art, apparently, accompanying drawing in the following describes only is some embodiments of the present invention, for those of ordinary skills, under the prerequisite of not paying creative work, can also obtain according to these accompanying drawings other accompanying drawing.
Fig. 1 is the flow chart of the disclosed ring resistance diaphragm of embodiment of the invention modification method;
Fig. 2 is the flow chart of the method at the disclosed definite center of embodiment of the invention zero point;
Fig. 3 is the flow chart of method on the carbon film border of the disclosed definite ring resistance diaphragm of the embodiment of the invention;
Fig. 4 is near the output voltage curve chart the disclosed ring resistance diaphragm of the embodiment of the invention left end silver band.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the invention, the technical scheme in the embodiment of the invention is clearly and completely described, obviously, described embodiment only is the present invention's part embodiment, rather than whole embodiment.Based on the embodiment among the present invention, those of ordinary skills belong to the scope of protection of the invention not making the every other embodiment that obtains under the creative work prerequisite.
The flow chart of ring resistance diaphragm modification method disclosed by the invention comprises as shown in Figure 1:
Step S11, the center dead-center position of determining described ring resistance diaphragm and carbon film border;
Determining of the center zero point of described ring resistance diaphragm and carbon film boundary position is the basis of ring resistance diaphragm correction.
Step S12, center dead-center position and the zone between the carbon film border of described ring resistance diaphragm is regional as repairing quarter;
The voltage of described center dead-center position is zero, in repairing the process at quarter, take the center dead-center position on the ring resistance diaphragm as benchmark, measure and repair quarter.
The zone that described ring resistance diaphragm need to be repaiied quarter is the carbon dust layer of ring resistance diaphragm, the carbon dust layer is positioned at the centre position of described ring resistance diaphragm, two ends are silver-colored zone, the carbon dust layer is with resistance, electrical resistance length is certain rule and changes, and the resistance of silver-colored zone is very little, and resistance variations can be very little, can ignore.
Step S13, carve the zone and choose and repair punctum described repairing;
Carve the zone and choose and repair punctum described repairing, when repairing punctum and be one, following steps only are to repair repairing quarter that punctum carries out to one; When to repair punctum be a plurality of, once repair the quarter process and finish, carry out the next one and repair repairing quarter of punctum, repair to carve and finish until all repair punctum.
Step S14, repair and carve head and repair the carbon dust layer that punctum is cut described ring resistance membrane surface along described, and detect the total voltage of annular resistive film sheet.
Repair and carve with repairing the head at quarter on the cutter, repair and carve head along repairing the carbon dust layer that punctum is cut described ring resistance membrane surface, described carbon dust layer has resistance, after repairing head incision at quarter carbon dust layer, the described thickness of repairing the carbon dust layer at punctum place changes, and the cross-sectional area of namely repairing the carbon dust layer at punctum place changes.
According to resistance calculations formula R=ρ l/S, wherein ρ is resistivity, and l is length, and S is cross-sectional area, can know, resistance and cross-sectional area are inversely proportional to, and namely cross-sectional area reduces, and resistance increases.Hence one can see that, when the cross-sectional area of the carbon dust layer of repairing the punctum place reduces, repaiies punctum and the center resistance between zero point and increase, and is made as Δ R
i
And this moment, the resistance of all the other points does not change on the ring resistance diaphragm, and therefore, the all-in resistance of described ring resistance diaphragm changes, and its all-in resistance variable quantity also is Δ R
i
Because described ring resistance diaphragm is in the constant current source power supply system, its electric current is certain, is made as I
c, therefore, the variable quantity that detects the total voltage of described ring resistance diaphragm is I
cΔ R
i, therefore, the total voltage of described ring resistance diaphragm also can obtain, and this process is called the total voltage feedback transmitter.
The total voltage of step S15, more described ring resistance diaphragm and default total voltage;
Repairing in the process at quarter of described ring resistance diaphragm, when repairing punctum and determine, the total voltage of ring resistance diaphragm is certain, default its total voltage, the total voltage of the described ring resistance diaphragm that relatively detects and default total voltage.
Step S16, when the total voltage of described ring resistance diaphragm equates with default total voltage, the incision that stops to repair punctum.
When the total voltage of the described ring resistance diaphragm that detects equated with the total voltage of presetting, the described punctum of repairing reached the amount that will repair in advance quarter, finishes described the repairing quarter of punctum of repairing.
Be not to only have to repair a punctum in the Ruo Xiuke zone, will continue that remaining is repaiied punctum and repair quarter this moment.
The repair and carving method that the present embodiment provides also comprises:
Set up the described corresponding relation of measuring quarter with total voltage of repairing, determine described default total voltage corresponding to punctum of repairing.Because it is different that each repaiies the position of punctum, thus need to preset each repair punctum repair quarter order and each repair punctum repair carve after corresponding total voltage, i.e. default total voltage variable quantity.Therefore, the total voltage of the described ring resistance diaphragm that detects and default total voltage can be compared, when treating that the two is identical, repair the quarter amount and just reached requirement, when namely stopping this being repaiied punctum and repair quarter.
The modification method of the disclosed ring resistance diaphragm of the present embodiment, realize exempting the participation of brush by introducing the total voltage feedback transmitter, avoided the contact resistance of brush is introduced integrated circuit, thereby affect the problem of certainty of measurement, in addition, utilize the total voltage feedback transmitter, make and repair the quarter process and be simplified, and improved certainty of measurement.
The flow chart of the method at definite center disclosed by the invention zero point comprises as shown in Figure 2:
Step S21, mobile described ring resistance diaphragm;
Mobile described ring resistance diaphragm makes described brush in the centre cap move left and right of described ring resistance diaphragm.The move mode of described ring resistance diaphragm can for manually, also can be machine turns.
Voltage between step S22, the described brush contact of collection and centre cap;
Gather the voltage between described brush contact and centre cap, when described brush contact was positioned at described centre cap left side, the described voltage that collects was negative value; When described brush contact is positioned at described centre cap right side, the described brush that collects on the occasion of.
Step S23, when collecting voltage between described brush contact and centre cap and be zero, described ring resistance diaphragm stops mobile.
When collecting voltage between described brush contact and centre cap and be zero, determine that the position is the position at zero point, center on the ring resistance diaphragm corresponding with described brush contact on the described ring resistance diaphragm.
Preferably, described ring resistance diaphragm is positioned on the rotary table, rotate described rotary table, described ring resistance diaphragm changes the centre tapped relative position on described brush and the described ring resistance diaphragm along with described rotary table rotates.
The rotary course of described rotary table is:
When the voltage between the described brush that collects and centre cap during greater than the first predeterminated voltage value, described rotary table High Rotation Speed;
When the voltage between the described brush that collects and centre cap during less than the first predeterminated voltage value, the rotation of slowing down of described rotary table.
Further, the voltage when between the described brush that collects and centre cap is less than the first predeterminated voltage value, and during greater than the second predeterminated voltage value, described rotary table slows down according to the functional relation of voltage-rotating speed and rotates.
Further, described the first predeterminated voltage value is 500mV, and described the second predeterminated voltage value is 100mV.
The method at the disclosed definite center of the present embodiment zero point by mobile described ring resistance diaphragm, changes the relative position of centre cap and brush, thereby the voltage between centre cap and the brush is changed, and then the position at definite center zero point.Realize determining fast and accurately the position at zero point, center.Further, utilize rotary table that the ring resistance diaphragm is moved, reduced manually operated program, improved automaticity.
The flow chart of the method on the carbon film border of definite ring resistance diaphragm disclosed by the invention comprises as shown in Figure 3:
Step S31, mobile described brush;
Shifting brush makes described brush mobile at the ring resistance diaphragm.
Step S32, the described brush of collection and the output voltage of center between zero point;
Along with the movement of brush, described brush and the center voltage between zero point changes, and gathers point and the center voltage between zero point that described brush is positioned at the diverse location of described ring resistance diaphragm.
Step S33, drafting output voltage curve;
When being positioned at diverse location according to the described brush that collects and the magnitude of voltage of center between zero point, drawing the output voltage curve, as shown in Figure 4, is near the output voltage curve chart the described ring resistance diaphragm left end silver band.
Step S34, according to described output voltage curve, determine the carbon film border of described ring resistance diaphragm.
The carbon film border of described ring resistance diaphragm, the i.e. border of carbon film district and silver-colored zone on the ring resistance diaphragm.According to the output voltage curve, determine the carbon film border.
Preferably, according to the output voltage curve, can find out, when described brush from the carbon film district to silver-colored zone, or the process from silver-colored zone to the carbon film district, the kick point can appear.As shown in Figure 4, two kick points occur near the described ring resistance diaphragm left end silver band, choose the mid point of line of two kick points as a carbon film border of described ring resistance diaphragm.Near choosing in like manner of the carbon film border described ring resistance diaphragm right-hand member silver band, near the mid point of two kick point lines the selection right-hand member silver band is as another carbon film border of described ring resistance diaphragm.
The method on the carbon film border of the disclosed definite ring resistance diaphragm of the present embodiment, by drawing the method for output voltage curve, Simple fast is the carbon film border of fixed ring shape resistance diaphragm really, carves for accurately repairing of ring resistance diaphragm and has set up the basis.
Each embodiment adopts the mode of going forward one by one to describe in this specification, and what each embodiment stressed is and the difference of other embodiment that identical similar part is mutually referring to getting final product between each embodiment.For the disclosed device of embodiment, because it is corresponding with the disclosed method of embodiment, so description is fairly simple, relevant part partly illustrates referring to method and gets final product.
To the above-mentioned explanation of the disclosed embodiments, make this area professional and technical personnel can realize or use the present invention.Multiple modification to these embodiment will be apparent concerning those skilled in the art, and General Principle as defined herein can be in the situation that do not break away from the spirit or scope of the present invention, in other embodiments realization.Therefore, the present invention will can not be restricted to these embodiment shown in this article, but will meet the widest scope consistent with principle disclosed herein and features of novelty.
Claims (5)
1. a ring resistance diaphragm modification method is characterized in that, described ring resistance diaphragm is in the constant current source power supply system, and described method comprises:
Determine center dead-center position and the carbon film border of described ring resistance diaphragm;
The zone is carved as repairing in center dead-center position and the zone between the carbon film border of described ring resistance diaphragm;
Carve the zone and choose and repair punctum described repairing;
Repair and carve head and repair the carbon dust layer that punctum is cut described ring resistance membrane surface along described, and detect the total voltage of annular resistive film sheet;
The total voltage of more described ring resistance diaphragm and default total voltage;
When the total voltage of described ring resistance diaphragm equates with the total voltage of presetting, the incision that stops to repair punctum.
2. method according to claim 1 is characterized in that, also comprises: set up the described corresponding relation of measuring quarter with total voltage of repairing, determine described default total voltage corresponding to punctum of repairing.
3. method according to claim 1 is characterized in that, determines that the process of the center dead-center position of described ring resistance diaphragm comprises:
Mobile described ring resistance diaphragm;
Gather the voltage between described brush contact and centre cap, when described voltage was zero, described ring resistance diaphragm stopped mobile, zero point centered by the position corresponding with described brush contact on the described ring resistance diaphragm.
4. method according to claim 3 is characterized in that, the method for mobile described ring resistance diaphragm comprises:
Described ring resistance diaphragm is positioned on the rotary table, rotates described rotary table, described ring resistance diaphragm is along with described rotary table rotates;
When the voltage between the described brush that collects and centre cap during greater than the first predeterminated voltage value, described rotary table High Rotation Speed;
When the voltage between the described brush that collects and centre cap during less than the first predeterminated voltage value, the rotation of slowing down of described rotary table.
5. method according to claim 1 is characterized in that, determines the process on the carbon film border of described ring resistance diaphragm, comprising:
Mobile described brush gathers described brush and the center output voltage between zero point;
Draw described output voltage curve, there are four voltage kick points in described output voltage curve, and the position of choosing contiguous two corresponding ring resistance diaphragms of voltage kick point line mid point is the carbon film border of described ring resistance diaphragm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210505704.5A CN102945716B (en) | 2012-11-30 | 2012-11-30 | A kind of annular resistor film correction method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210505704.5A CN102945716B (en) | 2012-11-30 | 2012-11-30 | A kind of annular resistor film correction method |
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| Publication Number | Publication Date |
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| CN102945716A true CN102945716A (en) | 2013-02-27 |
| CN102945716B CN102945716B (en) | 2015-11-18 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201210505704.5A Active CN102945716B (en) | 2012-11-30 | 2012-11-30 | A kind of annular resistor film correction method |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19514989A1 (en) * | 1995-04-24 | 1996-10-31 | Rheinmetall Ind Ag | Trimming process for electrical thin film resistors |
| CN2692808Y (en) * | 2004-04-21 | 2005-04-13 | 上海好光科工贸有限责任公司 | Potentiometer cutting device |
| CN101295572A (en) * | 2008-06-25 | 2008-10-29 | 东莞市华兰海电子有限公司 | Automatic resistance regulating machine of resistor type strain foil |
| CN201289771Y (en) * | 2008-10-29 | 2009-08-12 | 成都承宏机电有限公司 | Machine for repairing and engraving potentiometer |
| TW201137901A (en) * | 2010-04-16 | 2011-11-01 | Cyntec Co Ltd | A resistance trimmer, a resistance trimming method, and an electronic device having a resistance element |
| CN202523499U (en) * | 2012-01-17 | 2012-11-07 | 东莞市迈恩传感科技有限公司 | Resistance linearization repair carving machine |
-
2012
- 2012-11-30 CN CN201210505704.5A patent/CN102945716B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19514989A1 (en) * | 1995-04-24 | 1996-10-31 | Rheinmetall Ind Ag | Trimming process for electrical thin film resistors |
| CN2692808Y (en) * | 2004-04-21 | 2005-04-13 | 上海好光科工贸有限责任公司 | Potentiometer cutting device |
| CN101295572A (en) * | 2008-06-25 | 2008-10-29 | 东莞市华兰海电子有限公司 | Automatic resistance regulating machine of resistor type strain foil |
| CN201289771Y (en) * | 2008-10-29 | 2009-08-12 | 成都承宏机电有限公司 | Machine for repairing and engraving potentiometer |
| TW201137901A (en) * | 2010-04-16 | 2011-11-01 | Cyntec Co Ltd | A resistance trimmer, a resistance trimming method, and an electronic device having a resistance element |
| CN202523499U (en) * | 2012-01-17 | 2012-11-07 | 东莞市迈恩传感科技有限公司 | Resistance linearization repair carving machine |
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| CN102945716B (en) | 2015-11-18 |
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Inventor after: Zuo Xianghan Inventor after: Wang Huifeng Inventor after: Meng Shuhong Inventor after: Wang Guanglin Inventor after: Zeng Hao Inventor before: Zuo Xianghan Inventor before: Wang Huifeng Inventor before: Meng Shuhong Inventor before: Wang Guanglin Inventor before: Zeng Hao Inventor after: Meng Shuhong Inventor after: Wang Huifeng Inventor after: Zuo Xianghan Inventor after: Wang Guanglin Inventor after: Zeng Hao Inventor before: Zuo Xianghan Inventor before: Wang Huifeng Inventor before: Meng Shuhong Inventor before: Wang Guanglin Inventor before: Zeng Hao |
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Free format text: CORRECT: INVENTOR; FROM: ZUO XIANGHAN WANG HUIFENG MENG SHUHONG WANG GUANGLIN CENG HAO TO: MENG SHUHONG WANG HUIFENG ZUO XIANGHAN WANG GUANGLIN CENG HAO |
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Address after: 611130 Changan Road, Liucheng, Wenjiang District, Chengdu, Sichuan Province, No. 198 Patentee after: Sichuan Aerospace beacon Servo Control Technology Co., Ltd. Address before: 611100 Liucheng Road, Wenjiang, Sichuan, No. Changan Road, No. 198 Patentee before: Fenghuo Machine Works of China Aerospace Science and Technology Corporation |
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