CN102941014A - Method and device for eliminating chlorine generated in vapor phase method oxide production process - Google Patents
Method and device for eliminating chlorine generated in vapor phase method oxide production process Download PDFInfo
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- CN102941014A CN102941014A CN2012104233779A CN201210423377A CN102941014A CN 102941014 A CN102941014 A CN 102941014A CN 2012104233779 A CN2012104233779 A CN 2012104233779A CN 201210423377 A CN201210423377 A CN 201210423377A CN 102941014 A CN102941014 A CN 102941014A
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Abstract
The invention discloses a method for eliminating chlorine generated in vapor phase method oxide production process and a device thereof. According to the invention, by connecting a hydrogenation dechlorination unit on a gas conveying pipeline through which chlorine-containing tail gas discharged by a separator and a deacidification furnace leads to a tail gas treatment system to emlinate the chlorine in the tail gas; the temperature of the tail gas discharged by the separator and the deacidification furnace is lower than 400 DEG C, at the moment hydrogen is introduced into to react with chlorine to generate hydrogen chloride; in such an environment, hydrogen chloride is no longer able to react with oxygen to generate chlorine, thus good dechlorination effect can be achieved.
Description
Technical field
The invention belongs to vapor phase method oxide production field, particularly a kind of method and device of eliminating chlorine in the vapor phase method oxide production process.
Background technology
Vapor phase method oxide such as fumed silica, aluminium oxide, titanium oxide etc. are to carry out the pyrohydrolysis polycondensation reaction and the superfine powder that obtains in oxyhydrogen flame with the presoma chloride.Its reaction mechanism is as follows:
Wherein M is Si, Al, Ti etc.
Adopt gas-phase process to produce oxide, substantially all comprise reaction (hydrogen and oxygen reaction, the presoma hydrolysis condensation reaction), particle is assembled the operations such as (the primary partical Collision coagulation becomes aggregation, agglomerate, is convenient to separate and collection), gas solid separation (separating of oxide particle and gas), depickling (removing the hydrogen chloride that is adsorbed on particle surface), particle collection, vent gas treatment.Produce the patent many (such as CN200610035301.3, CN98114270.2, CN200610033695.9, CN200610033694.4 etc.) of the technique of oxide about vapor phase method.
In vapor phase method oxide production process, for guaranteeing to react completely and obtain needed high-temperature field, hydrogen and oxygen (air) generally all are to be higher than theoretical amount of calculation, therefore in vapor phase method oxide production technology, have following characteristics:
1) reaction temperature is high, 1000 ~ 2000 ℃ of the reaction zone temperatures that is formed by hydrogen and oxygen combustion, and in the operations such as gathering and depickling, temperature also is higher than 400 ℃;
2) produce byproduct hydrogen chloride (HCl);
3) contain aerobic in the system.
In above-mentioned environment, redox reaction easily occurs in HCl in the presence of high temperature and oxygen, generates the chlorine G﹠W, reacts suc as formula (3):
The generation of chlorine is for production brings very large trouble.Usual way is to adopt alkali lye (such as NaOH, calcium hydroxide etc.) that it is carried out washing absorption, thereby generates hypochlorite (such as calcium hypochlorite or clorox).Yet hypochlorite is unstable, discharges easily again chlorine under acid condition, does not therefore reach the purpose of eliminating chlorine.
Mentioned at collector among the CN 200610035301.3 hydrogenation plant has been set, in collector, added a certain amount of hydrogen, allowed hydrogen and chlorine reaction generate hydrogen chloride, thereby reached the purpose of eliminating chlorine.Yet description and formula (3) by the front know, hydrogen chloride at high temperature again easily and oxygen reaction, regenerates chlorine, and the dechlorination effect is undesirable.So find the method for the chlorine in a kind of effective elimination vapor phase method oxide production process to be necessary very much.
In traditional technique, have at collector hydrogenation plant such as CN200610035301.3, CN102120580A etc. are set, yet from practical application, the temperature in reactor is 1000-2000 ℃, enter collector after, even in the collector rear end, temperature also is higher than 400 ℃.Analysis by the front can know, pass into hydrogen after, although chlorine can generate hydrogen chloride with hydrogen reaction, yet at high temperature, hydrogen chloride will react with oxygen again, regenerate chlorine.In addition, even at collector chlorine has been eliminated, yet after entering deacidification furnace, still need have again partial oxidation hydrogen and oxygen reaction to generate chlorine through being higher than 400 ℃ high-temperature field, therefore this technique be for the dechlorination DeGrain.
Summary of the invention
The object of the invention is to overcome existing deficiency, a kind of method and device of eliminating chlorine in the vapor phase method oxide production process is provided.
The technical solution used in the present invention is:
A kind of method of eliminating chlorine in the vapor phase method oxide production process, may further comprise the steps: after the chloride exhaust temperature that produces in vapor phase method oxide production process is lower than 400 ℃, pass into hydrogen and catalysis itself and chlorine reaction and generate hydrogen chloride, then process discharging through exhaust treatment system.
Preferably, before exhaust emissions, eliminate excessive hydrogen in the tail gas.
A kind of device of eliminating chlorine in the vapor phase method oxide production process, comprise reactor (1), collector (2), separator (3), deacidification furnace (4) and exhaust treatment system (6), after reactant mixture enters aggregator aggregates from reactor, enter separator, isolated solids enter the deacidification furnace depickling, the chloride tail gas that separator and deacidification furnace are discharged enters exhaust treatment system and processes discharging, it is characterized in that: the gas transmission pipeline between separator and/or deacidification furnace and exhaust treatment system is connected with hydrogenation chlorine remover (5), and the hydrogenation chlorine remover is connected in series with in the gas transmission pipeline exhaust temperature and is not higher than 400 ℃ and locates.
Above-mentioned hydrogenation chlorine remover is the pipeline configuration that connects with flange, offers at least one inside puff prot on this pipeline, and the puff prot outside is connected to sources of hydrogen.
Preferably, the pipeline of hydrogenation chlorine remover is provided with the ultraviolet position of transmissive, and this position is outside equipped with ultraviolet source.Perhaps, be provided with catalysis H in the pipeline of hydrogenation chlorine remover
2And Cl
2The catalyst of reaction.
Preferably, at exhaust treatment system to being provided with between the exhaust port for the dehydrogenation device of eliminating the tail gas excess hydrogen.
The invention has the beneficial effects as follows:
The gas transmission pipeline that the chloride tail gas that the present invention discharges at separator and deacidification furnace leads to exhaust treatment system is connected the hydrogenation chlorine remover, because be lower than 400 ℃ from the exhaust temperature of separator and deacidification furnace discharge, pass into hydrogen this moment, generate hydrogen chloride with chlorine reaction, under this environment, hydrogen chloride will no longer generate chlorine with oxygen reaction, thereby can obtain the effect that well dechlorinates.
Description of drawings
Fig. 1 is method and the device schematic diagram of eliminating chlorine in the vapor phase method oxide production process;
Fig. 2 is hydrogenation chlorine remover schematic diagram.
The specific embodiment
A kind of method of eliminating chlorine in the vapor phase method oxide production process, may further comprise the steps: after the chloride exhaust temperature that produces in vapor phase method oxide production process is lower than 400 ℃, pass into hydrogen and catalysis itself and chlorine reaction and generate hydrogen chloride, then process discharging through exhaust treatment system.
Preferably, before exhaust emissions, eliminate excessive hydrogen in the tail gas.
A kind of device of eliminating chlorine in the vapor phase method oxide production process, comprise reactor (1), collector (2), separator (3), deacidification furnace (4) and exhaust treatment system (6), after reactant mixture enters aggregator aggregates from reactor, enter separator, isolated solids enter the deacidification furnace depickling, the chloride tail gas that separator and deacidification furnace are discharged enters exhaust treatment system and processes discharging, it is characterized in that: the gas transmission pipeline between separator and/or deacidification furnace and exhaust treatment system is connected with hydrogenation chlorine remover (5), and the hydrogenation chlorine remover is connected in series with in the gas transmission pipeline exhaust temperature and is not higher than 400 ℃ and locates.
Above-mentioned hydrogenation chlorine remover is the pipeline configuration that connects with flange, offers at least one inside puff prot on this pipeline, and the puff prot outside is connected to sources of hydrogen.
Preferably, the pipeline of hydrogenation chlorine remover is provided with the ultraviolet position of transmissive, and this position is outside equipped with ultraviolet source.Perhaps, be provided with catalysis H in the pipeline of hydrogenation chlorine remover
2And Cl
2The catalyst of reaction.
Preferably, at exhaust treatment system to being provided with between the exhaust port for the dehydrogenation device of eliminating the tail gas excess hydrogen.
Gas solid separation can be used the methods such as conventional cyclonic separation, sedimentation separation, and the present invention adopts cyclonic separation.
For chlorine reaction in the hydrogen that impels adding and the tail gas, can offer the ultraviolet position of transmissive at the pipeline of hydrogenation chlorine remover, outside this position ultraviolet source is set, promote H by ultraviolet irradiation
2And Cl
2Reaction; Certainly, also catalysis H can be set in the pipeline of hydrogenation chlorine remover
2And Cl
2The catalyst of reaction, its reaction of catalysis.In this specific embodiment, adopt the method for ultraviolet irradiation.
The hydrogenation chlorine remover certainly, also can be arranged at A or the B place of Fig. 1 except the position that is connected on Fig. 1 sign.If be arranged at the A place, in the pipeline of exhaust treatment system, be provided with catalyst at the tail gas that deacidification furnace is discharged simultaneously, the excess hydrogen that the hydrogenation chlorine remover passes into is enough to still guarantee that the chlorine that the back deacidification furnace is discharged is eliminated; If the hydrogenation chlorine remover is arranged at the B place, method and principle are the same.
Be the potential safety hazard that prevents from when dechlorination has passed into excessive hydrogen at exhaust emissions in the hydrotreater, having brought, before exhaust emissions, need to eliminate excessive hydrogen in the tail gas, so, the present invention to being provided with the dehydrogenation device between the exhaust port, is equipped with the hydrogen in catalyst or adsorbent or the employing firing method elimination tail gas at exhaust treatment system in the dehydrogenation device.In this specific embodiment, adopt to be heated to 150 ~ 300 ℃ cupric oxide and the hydrogen reaction in the tail gas.
In the deacidification of deacidification furnace, for better removing the sour gas that is adsorbed on particle surface, except deacidification furnace is heated, also can pass into depickling assist medium such as steam, inert gas, alkaline gas etc.Preferably pass into the alkaline gas such as the inert gases such as nitrogen or ammonia, thereby avoid producing extra chlorine in case locking system is brought excessive oxygen into.
Below in conjunction with accompanying drawing and following examples, the present invention is specifically described, but is not limited to this.
With reference to Fig. 1, method and the device of eliminating chlorine in the vapor phase method oxide production process are: enter reactor 1 after former material precursor chloride and hydrogen, oxygen mix are even, carry out high-temperature hydrolysis; The gases such as the oxide particle that reaction generates and HCl enter collector 2; Gas-solid mixture after assembling enters separator 3; After separator separated, solids flowed downward and enter deacidification furnace 4, and gas is discharged from the separator top; After the deacidification furnace depickling, be adsorbed on the hydrogen chloride of solid particle surfaces and chlorine by desorption, to discharge from the deacidification furnace top, the particle after the depickling is delivered to feed bin 7, carries out the packing of product; The gas transmission pipeline that the tail gas of discharging at separator and deacidification furnace leads to exhaust treatment system 6 arranges a hydrogenation chlorine remover 5, the exhaust temperature of herein discharging is not higher than 400 ℃, under the ultraviolet lighting, chlorine in separator and the deacidification furnace discharge tail gas and the hydrogen of adding react at this, generate hydrogen chloride; Then tail gas enters exhaust treatment system and processes; After the processing, enter dehydrogenation device 8, eliminate hydrogen excessive in the tail gas after, emission.
With reference to Fig. 2, the hydrogenation chlorine remover is the pipeline configuration that connects with flange 9, offers at least one inside puff prot 10 on this pipeline, the outside sources of hydrogen that connects of puff prot, and hydrogen sprays into pipe interior by this spout; The pipeline of hydrogenation chlorine remover is provided with the ultraviolet position 11 of transmissive, and this position is outside equipped with ultraviolet source 12, and ultraviolet light sees through this position irradiation pipe interior, and under ultraviolet lighting, chlorine and hydrogen react at this, generate hydrogen chloride.
Claims (7)
1. method of eliminating chlorine in the vapor phase method oxide production process, it is characterized in that: after the chloride exhaust temperature that produces in vapor phase method oxide production process is lower than 400 ℃, pass into hydrogen and catalysis itself and chlorine reaction and generate hydrogen chloride, then process discharging through exhaust treatment system.
2. a kind of method of eliminating chlorine in the vapor phase method oxide production process according to claim 1 is characterized in that: eliminate excessive hydrogen in the tail gas before exhaust emissions.
3. device of eliminating chlorine in the vapor phase method oxide production process, comprise reactor (1), collector (2), separator (3), deacidification furnace (4) and exhaust treatment system (6), after reactant mixture enters aggregator aggregates from reactor, enter separator, isolated solids enter the deacidification furnace depickling, the chloride tail gas that separator and deacidification furnace are discharged enters exhaust treatment system and processes discharging, it is characterized in that: the gas transmission pipeline between separator and/or deacidification furnace and exhaust treatment system is connected with hydrogenation chlorine remover (5), and the hydrogenation chlorine remover is connected in series with in the gas transmission pipeline exhaust temperature and is not higher than 400 ℃ and locates.
4. device according to claim 3 is characterized in that: the pipeline configuration of described hydrogenation chlorine remover for connecting with flange, offer at least one inside puff prot on this pipeline, and the puff prot outside is connected to sources of hydrogen.
5. device according to claim 4, it is characterized in that: the pipeline of described hydrogenation chlorine remover is provided with the ultraviolet position of transmissive, and this position is outside equipped with ultraviolet source.
6. device according to claim 4 is characterized in that: be provided with catalysis H in the pipeline of described hydrogenation chlorine remover
2And Cl
2The catalyst of reaction.
7. device according to claim 3 is characterized in that: at exhaust treatment system to being provided with between the exhaust port for the dehydrogenation device of eliminating the tail gas excess hydrogen.
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| CN201210423377.9A CN102941014B (en) | 2012-10-30 | 2012-10-30 | Method and device for eliminating chlorine generated in vapor phase method oxide production process |
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| CN201210423377.9A CN102941014B (en) | 2012-10-30 | 2012-10-30 | Method and device for eliminating chlorine generated in vapor phase method oxide production process |
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| CN102941014A true CN102941014A (en) | 2013-02-27 |
| CN102941014B CN102941014B (en) | 2014-10-01 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107963634A (en) * | 2017-12-12 | 2018-04-27 | 宜昌汇富硅材料有限公司 | Collector for fume colloidal silica production |
| CN110371990A (en) * | 2019-07-02 | 2019-10-25 | 新疆晶硕新材料有限公司 | A kind of hydrolysis furnace producing fumed silica and system |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030023127A1 (en) * | 2001-07-30 | 2003-01-30 | Taiheiyo Cement Corporation | Waste processing method, waste processing system, integrated waste processing method, and integrated waste processing system |
| CN1850599A (en) * | 2006-04-29 | 2006-10-25 | 广州吉必时科技实业有限公司 | Comprehensive utilization method of by-product for poycrystalline silicon production process |
| CN102120580A (en) * | 2011-03-10 | 2011-07-13 | 上海竟茨环保科技有限公司 | Pipeline hydrogenation device used for producing gaseous phase method silicon dioxide |
-
2012
- 2012-10-30 CN CN201210423377.9A patent/CN102941014B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030023127A1 (en) * | 2001-07-30 | 2003-01-30 | Taiheiyo Cement Corporation | Waste processing method, waste processing system, integrated waste processing method, and integrated waste processing system |
| CN1850599A (en) * | 2006-04-29 | 2006-10-25 | 广州吉必时科技实业有限公司 | Comprehensive utilization method of by-product for poycrystalline silicon production process |
| CN102120580A (en) * | 2011-03-10 | 2011-07-13 | 上海竟茨环保科技有限公司 | Pipeline hydrogenation device used for producing gaseous phase method silicon dioxide |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107963634A (en) * | 2017-12-12 | 2018-04-27 | 宜昌汇富硅材料有限公司 | Collector for fume colloidal silica production |
| CN110371990A (en) * | 2019-07-02 | 2019-10-25 | 新疆晶硕新材料有限公司 | A kind of hydrolysis furnace producing fumed silica and system |
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| Publication number | Publication date |
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| CN102941014B (en) | 2014-10-01 |
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Effective date of registration: 20191031 Address after: Nanxiang three road, Science City high tech Industrial Development Zone, Guangzhou city of Guangdong Province, No. 15 510663 Patentee after: Guangzhou GBS High-Tech & Industry Co., Ltd. Address before: Three road 510663 Guangdong city of Guangzhou province Luogang District Science City Nanxiang No. 15 Co-patentee before: Lianyungang Jibi Shenggui Materials Co.,Ltd. Patentee before: Guangzhou GBS High-Tech & Industry Co., Ltd. |
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Effective date of registration: 20200402 Address after: 443007 66-2, Lanting Avenue, Lanting District, Yichang City, Hubei Province Patentee after: YICHANG HUIFU SILICON MATERIAL Co.,Ltd. Address before: Nanxiang three road, Science City high tech Industrial Development Zone, Guangzhou city of Guangdong Province, No. 15 510663 Patentee before: GUANGZHOU GBS HIGH-TECH & INDUSTRY Co.,Ltd. |
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Address after: 66-2 No. 443007 Hubei city of Yichang province located in Xiaoting District Road Patentee after: Hubei HuiFu nano materials Co., Ltd Address before: 443007 66-2, Lanting Avenue, Lanting District, Yichang City, Hubei Province Patentee before: YICHANG HUIFU SILICON MATERIAL Co.,Ltd. |