CN102898953A - Cerium-based mischmetal polishing material and preparation method thereof - Google Patents
Cerium-based mischmetal polishing material and preparation method thereof Download PDFInfo
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- CN102898953A CN102898953A CN2012104293962A CN201210429396A CN102898953A CN 102898953 A CN102898953 A CN 102898953A CN 2012104293962 A CN2012104293962 A CN 2012104293962A CN 201210429396 A CN201210429396 A CN 201210429396A CN 102898953 A CN102898953 A CN 102898953A
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Abstract
The invention aims to disclose a cerium-based mischmetal polishing material and a preparation method thereof. The material comprises the following components in percentage by weight: 83 to 99 percent of cerium-based mischmetal polishing powder, 1 to 15 percent of clay and 0.1 to 0.5 percent of polycarboxylic acid compound. Compared with the prior art, the material has the advantages that the aggregative trend of the polishing powder is restrained, suspending and dispersing properties of the polishing powder during use are effectively improved, specific gravity of the polishing powder is reduced, and the polishing powder is high in suspending property and universality, easy to clean after polishing, high in polishing efficiency and the like, so that the aim of the invention is fulfilled.
Description
Technical field
The present invention relates to a kind of rare-earth polishing material and preparation method thereof, particularly a kind of cerium base mishmetal polishing material that is applicable to the electronics and information industry accurate device surface finish such as plane demonstration and opticglass and preparation method thereof.
Background technology
At present, various glass materials are widely used, and these materials all need be through necessary surface finish before being employed.The early stage main materials such as zirconium white, ferric oxide or silicon-dioxide that use polish various glass surfaces, in recent years, consider that from polishing efficiency and precision aspect rare earth oxide (particularly cerium oxide) is considered to be more suitable for surface finish in glass material for the polishing material of main component.
Fast development along with electronic information technology, the demand of the glass baseplates such as lens, sheet glass, liquid-crystal display (LCD), glasses, optical element and stupalith increases greatly, precision and polishing speed for polishing material are also had higher requirement, this just impels manufacturer to improve constantly product specification, to adapt to the requirement of New Products, polishing powder from rare earth has become now applied widely, consumption rare earth application product large, with high content of technology.
But the proportion of polishing powder from rare earth is larger, in use precipitates easily, is difficult for recycling after the precipitation on the one hand, and the minimizing that has caused polishing powder in use relatively to polish particle has reduced polishing efficiency; On the other hand, polishing powder is deposited on the board, has caused the increase of the consumption of polishing powder.Therefore, the suspension that improves polishing powder is very necessary.
In order to improve the suspension of polishing powder from rare earth, on the one hand, control the bulk density of polishing powder by maturing temperature at present.The particle diameter of supposing polishing material is basic identical, and maturing temperature is higher so, and sedimentary bulk density is larger; Maturing temperature is lower, and sedimentary bulk density is less.No matter be that maturing temperature is too high, perhaps too low, all will affect the polishing efficiency of polishing powder, even can cause the scuffing of goods.On the other hand, by in polishing powder, adding dispersion agent, improve polishing powder suspension row in use.
The patent of invention of China Patent Publication No. CN101671525A discloses a kind of method of improving suspension property of rare earth polishing powder, in polishing powder, to add dispersing auxiliary, wherein auxiliary agent be selected from that methylene radical bitter edible plant sulfonic acid is received or ethyl tea sulfonic acid is received a kind of or their composition.
The patent of invention of China Patent Publication No. CN101993662A discloses a kind of preparation method of cerium-based polishing powder suspension, and the method is to add Sodium dodecylbenzene sulfonate and hexadecyl octyl phenyl ether in cerium based relief polishing powder.
The patent of invention of Chinese patent notification number CN1289626C has been announced a kind of cerium base polishing material and cerium base polishing slurries, and this patent proposes, when with the 10%(quality) amount when being dispersed in water, the bulk density of this polishing material is 0.8g/ml to 1.0g/ml.Add tensio-active agent in this polishing material, wherein tensio-active agent is selected from least a in anion surfactant and the nonionogenic tenside.
Can be found out that by above the at present improvement of the suspension of polishing powder mainly is to process by adding tensio-active agent.But tensio-active agent in use bubbles easily, is unfavorable for using.Simultaneously tensio-active agent is mainly reflected in the raising of the suspension of small-particle particle to the modification of polishing powder suspension, has caused apparent suspension to improve, and person's concentration gradient is not but arranged, and is bad to the improvement of the suspension of polishing powder.
Therefore, need especially a kind of cerium base mishmetal polishing material and preparation method thereof, solved the problem of above-mentioned existing existence.
Summary of the invention
The object of the present invention is to provide a kind of cerium base mishmetal polishing material and preparation method thereof, for the deficiencies in the prior art, the reunion trend that can suppress polishing powder, suspended dispersed performance in the use procedure of Effective Raise polishing powder, reduce polishing powder proportion, have easy cleaning and polishing efficiency advantages of higher after polishing powder suspension height, highly versatile, the polishing.
Technical problem solved by the invention can realize by the following technical solutions:
On the one hand, the invention provides a kind of cerium base mishmetal polishing material, it is characterized in that it comprises the following component of following weight percent: cerium base polishing powder from rare earth 83-99%, clay 1-15%, polycarboxylate compound 0.1-0.5%.
In one embodiment of the invention, the meso-position radius D50 of described cerium base polishing powder from rare earth is 0.5-3.0 μ m, and wherein total amount of rare earth (REO) is 90-100%, cerium content (CeO
2/ REO) be 60-100%.
In one embodiment of the invention, described clay is selected from one or more the combination in kaolin or the montmorillonite.
In one embodiment of the invention, described polycarboxylate compound is selected from one or more the combination in polyacrylic acid or the sodium polyacrylate.
On the other hand, the invention provides a kind of preparation method of rare-earth polishing material, it is characterized in that, it comprises the steps: cerium base polishing powder from rare earth, clay and polycarboxylate compound proportionally to be carried out the dry ball milling preparation and get.
In one embodiment of the invention, described dry ball milling is to adopt ball mill to carry out ball milling.
Further, the Ball-milling Time of described dry ball milling is 0.5-2h.
The preparation method of cerium base mishmetal polishing material of the present invention, compared with prior art, the reunion trend that can suppress polishing powder, suspended dispersed performance in the use procedure of Effective Raise polishing powder, reduce polishing powder proportion, have polishing powder suspension height, highly versatile, easy cleaning and polishing efficiency advantages of higher realize purpose of the present invention after the polishing.
Characteristics of the present invention can be consulted the detailed description of the graphic and following better embodiment of this case and be obtained to be well understood to.
Description of drawings
Fig. 1 is the particle size distribution figure of the cerium base polishing powder from rare earth of embodiments of the invention 1 and Comparative Examples 1 selection.
Embodiment
For technique means, creation characteristic that the present invention is realized, reach purpose and effect is easy to understand, below in conjunction with concrete diagram, further set forth the present invention.
Cerium base mishmetal polishing material of the present invention, it comprises the following component of following weight percent: cerium base polishing powder from rare earth 83-99%, clay 1-15%, polycarboxylate compound 0.1-0.5%.
In the present invention, the meso-position radius D50 of described cerium base polishing powder from rare earth is 0.5-3.0 μ m, and wherein total amount of rare earth (REO) is 90-100%, cerium content (CeO
2/ REO) be 60-100%.
In the present invention, described clay is selected from one or more the combination in kaolin or the montmorillonite.
In the present invention, described polycarboxylate compound is selected from one or more the combination in polyacrylic acid or the sodium polyacrylate.
The preparation method of rare-earth polishing material of the present invention, it comprises the steps: cerium base polishing powder from rare earth, clay and polycarboxylate compound proportionally to be carried out the dry ball milling preparation and get.
In the present invention, described dry ball milling is to adopt ball mill to carry out ball milling; The Ball-milling Time of described dry ball milling is 0.5-2h.
Described dry ball milling purpose is that each component such as cerium base polishing powder from rare earth, clay and polycarboxylate compound are fully mixed.
Cerium base polishing powder from rare earth, clay and polycarboxylate compound are proportionally used TOSHIBA E658157 ball mill dry ball milling and get.Table 1 has provided each composition and the content of cerium base mishmetal polishing material of the present invention.
Polishing performance appreciation condition and the evaluation result of cerium base mishmetal polishing material of the present invention are as follows:
The application performance evaluation is carried out in each polishing according to table 1 preparation.
Evaluation method is as follows:
Get rare-earth polishing material 500g, add deionized water to 5L, getting concentration is the polishing fluid slurries of 100g/L.Employing UNIPOL802(Shenyang section crystalline substance) precise grinding polisher polishes K9 glass, the automatic stirring making beating, and filtration cycle is used, and polishing arbor rotating speed is 100 rev/mins, and pressure is 660N/cm
2, polished leather is KSP66B-1.25, polishing time is 6.5 hours, tests at regular intervals the granularity of slurries and the weight of the dried glass of record washing.Mass Calculation according to the polished front and back of take by weighing polishing element goes out difference, and this difference is the erosion amount of throwing divided by polishing time.Polishing performance calculates with relative polishing speed, counts 100, the average throwing erosion amount of average throwing erosion amount/Comparative Examples 1 of the relative polishing speed=embodiment of all the other products * 100% with the average throwing erosion amount of the polishing material of Comparative Examples 1 gained
The Data Comparison of embodiment and Comparative Examples is referring to table 2 and table 3
Table 2
| Relative polishing | Suspension | |
| Embodiment | ||
| 1 | 120 | |
| Embodiment | ||
| 2 | 135 | Good |
| Embodiment 3 | 130 | Good |
| Comparative Examples 1 | 100 | Nothing |
Table 3
| Relative polishing | Suspension | |
| Embodiment | ||
| 4 | 120 | Good |
| Comparative Examples 1 | 100 | Nothing |
More than show and described ultimate principle of the present invention and principal character and advantage of the present invention.The technician of the industry should understand; the present invention is not restricted to the described embodiments; that describes in above-described embodiment and the specification sheets just illustrates principle of the present invention; without departing from the spirit and scope of the present invention; the present invention also has various changes and modifications; these changes and improvements all fall in the claimed scope of the invention, and the claimed scope of the present invention is defined by appending claims and equivalent thereof.
Claims (7)
1. a cerium base mishmetal polishing material is characterized in that it comprises the following component of following weight percent: cerium base polishing powder from rare earth 83-99%, clay 1-15%, polycarboxylate compound 0.1-0.5%.
2. cerium base mishmetal polishing material as claimed in claim 1 is characterized in that, the meso-position radius D50 of described cerium base polishing powder from rare earth is 0.5-3.0 μ m, and wherein total amount of rare earth (REO) is 90-100%, cerium content (CeO
2/ REO) be 60-100%.
3. cerium base mishmetal polishing material as claimed in claim 1 is characterized in that, described clay is selected from one or more the combination in kaolin or the montmorillonite.
4. cerium base mishmetal polishing material as claimed in claim 1 is characterized in that, described polycarboxylate compound is selected from one or more the combination in polyacrylic acid or the sodium polyacrylate.
5. the preparation method of a rare-earth polishing material is characterized in that, it comprises the steps: cerium base polishing powder from rare earth, clay and polycarboxylate compound proportionally to be carried out the dry ball milling preparation and get.
6. the preparation method of cerium base mishmetal polishing material as claimed in claim 5 is characterized in that, described dry ball milling is to adopt ball mill to carry out ball milling.
7. the preparation method of cerium base mishmetal polishing material as claimed in claim 6 is characterized in that, the Ball-milling Time of described dry ball milling is 0.5-2h.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103555206A (en) * | 2013-10-22 | 2014-02-05 | 上海华明高纳稀土新材料有限公司 | Rare earth polishing powder and preparation method thereof |
| CN114015360A (en) * | 2021-11-23 | 2022-02-08 | 浙江奥首材料科技有限公司 | Water-based full-suspension diamond polishing solution for sapphire, preparation method and application thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101186783A (en) * | 2007-12-11 | 2008-05-28 | 河南理工大学 | Method for producing polishing powder from kaolin |
| JP2011001515A (en) * | 2009-06-22 | 2011-01-06 | Mitsui Mining & Smelting Co Ltd | Abrasive composition powder and abrasive composition slurry |
-
2012
- 2012-10-31 CN CN2012104293962A patent/CN102898953A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101186783A (en) * | 2007-12-11 | 2008-05-28 | 河南理工大学 | Method for producing polishing powder from kaolin |
| JP2011001515A (en) * | 2009-06-22 | 2011-01-06 | Mitsui Mining & Smelting Co Ltd | Abrasive composition powder and abrasive composition slurry |
Non-Patent Citations (1)
| Title |
|---|
| 周新木等: "高铈抛光粉表面电性及悬浮液分散稳定性研究", 《稀土》 * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103555206A (en) * | 2013-10-22 | 2014-02-05 | 上海华明高纳稀土新材料有限公司 | Rare earth polishing powder and preparation method thereof |
| CN103555206B (en) * | 2013-10-22 | 2015-07-08 | 上海华明高纳稀土新材料有限公司 | Rare earth polishing powder and preparation method thereof |
| CN114015360A (en) * | 2021-11-23 | 2022-02-08 | 浙江奥首材料科技有限公司 | Water-based full-suspension diamond polishing solution for sapphire, preparation method and application thereof |
| CN114015360B (en) * | 2021-11-23 | 2022-07-05 | 浙江奥首材料科技有限公司 | Water-based full-suspension diamond polishing solution for sapphire, preparation method and application thereof |
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Application publication date: 20130130 |