A kind of flexible high-definition intelligent heavy curtain
Technical field
The present invention relates to a kind of flexible high-definition intelligent heavy curtain.
Background technology
Heavy curtain or curtain have become article indispensable in our live and work, no matter are at home, and in company, in the market, in place, hotel etc., we can both see heavy curtain miscellaneous or curtain.The Main Function of heavy curtain or curtain is to be hedged off from the outer world, and keeps the privacy in room, and it is again indispensable ornament simultaneously.
In modern age, because the development of science and technology, the heavy curtain material has had the development of leap, heavy curtain or the curtain made as material take aluminium alloy, wood chip, nonwoven have occurred.Its common characteristics are that material itself is light tight, light is all blocked cause indoor light not enough, and needing to open local lighting increases energy resource consumption; When using mechanical system opening section roller shutter that part light is entered when indoor, another part light still is blocked, and causes the indoor light skewness.Simultaneously, the grease proofing antistatic arrangement of various waterproof and dustproofs on weaving face fabric needs to consume a large amount of energy and the processing of sewage discharge.
Summary of the invention
The present invention relates to a kind of flexible high-definition intelligent heavy curtain, can not only effectively completely cut off ultraviolet and infrared light in the sunlight, and can be according to the strong and weak changes colour depth of sunshine, thereby according to the strong and weak material light transmission that changes of sunshine.
Flexible high-definition intelligent heavy curtain of the present invention is composited by function sunlight control optical thin film and functional film, can two-layer or two-layer above structure.
As preferably, two outer surfaces of flexible high-definition intelligent heavy curtain carry out the nanometer cure process.Conventional nanometer hardening process has showering and roller coating dual mode.
The thickness of the functional sunlight control optical thin film that the present invention relates to, preferred 10-110um, most preferably 20-60um.The functional optical film by base material film and on base material film the successively dielectric membranous layer of sequential aggradation, metallic diaphragm, dielectric membranous layer, doping VO
2Rete, dielectric membranous layer form;
Perhaps by base material film and on base material film the doping VO of sequential aggradation successively
2Rete, dielectric membranous layer, metallic diaphragm, dielectric membranous layer form;
Perhaps reach dielectric membranous layer, metallic diaphragm, dielectric membranous layer, metallic diaphragm, the doping VO that on base material film, deposits successively by base material film
2Rete, dielectric membranous layer form.
Wherein adjacent metallic diaphragm and dielectric film can only deposit once, also can repeated deposition, i.e. repeated deposition after having deposited layer of metal rete, dielectric film is such as the successively dielectric membranous layer of sequential aggradation, metallic diaphragm, dielectric membranous layer, metallic diaphragm, dielectric membranous layer, doping VO on base material film
2Rete, dielectric membranous layer; Sequential aggradation doping VO successively on base material film
2Rete, dielectric membranous layer, metallic diaphragm, dielectric membranous layer, metallic diaphragm, dielectric membranous layer; On base material film, deposit successively dielectric membranous layer, metallic diaphragm, dielectric membranous layer, metallic diaphragm, dielectric membranous layer, metallic diaphragm, doping VO
2Rete, dielectric membranous layer.Several retes of above-mentioned successively sequential aggradation are called 1 film layer group, can deposit one or more film layer group on the base material film.
Base material film is thickness 8um-100um, the flexible continuous coiled material of width 1000mm-2500mm, and material is selected from various plastic sheetings, such as PET, EVA, PVC, PP, PE film etc.; Perhaps nonmetallic materials braid, such as glass fabric, basalt fiber cloth, various synthetic fiber cloths etc.
The metal film material is selected from a kind of or several arbitrarily in silver, copper, gold, aluminium, nickel, zinc, molybdenum, titanium, chromium, tin, platinum, tungsten, palladium, vanadium, tantalum, the indium.The preferred silver of metal material, copper or nichrome, it is suitable for making the IR absorbing film of high performance-price ratio most.The thickness 5nm-250nm of every tunic, optimal deposition thickness 10nm-80nm.Metal level is used for absorbing IR, and thicknesses of layers is thicker, and the infrared ray absorbing rate is higher.The metal film of 5nm-250nm different-thickness can make the light transmittance of light screening material from 12%---75%, and reflecting rate is from 5%---65%, and solar energy always partition rate is regulated between the 40%---85%.
The dielectric membranous layer material is selected from a kind of or several arbitrarily of metal oxide, metal sulfide, metal boride, carbonitride, metal nitride.The preferable alloy oxide is such as zinc oxide, aluminium oxide, and titanium oxide, indium oxide, zirconia, tantalum oxide, metal nitride is such as silicon nitride, aluminium nitride, titanium nitride, dielectric membranous layer optimal deposition thickness 2nm-200nm.The effect of dielectric layer is antireflection part light, and can protect metal film, prevents its loss.
Doping VO
2Rete is to select doping metals and vanadium oxide material jointly to deposit thermochromism blooming under the specified temp of acquisition, and aforementioned fixing metal film produces specific ir-absorbance, doping VO
2Film changes ir-absorbance with serviceability temperature again under specific ir-absorbance.Doping metals is selected from gold, silver, tungsten, molybdenum, copper, aluminium or titanium, and the deposit thickness of every tunic is at 2nm-50nm.
This functional optical thin film technology method: with thickness 8um-100um, the flexible continuous coiled material of width 1000mm-2500mm is base material, enters continuously in the magnetic control sputtering device reative cell through guide roller is smooth, and reative cell vacuumizes, and vacuum is not less than 2 * 10
-3Pa adopts vacuum coating technology to deposit successively each rete on base material.
The thickness of the functional film that the present invention relates to, preferred 50-400um, preferred 50-260um.Functional film is at EVA, PVC, and PET, PP, PE adds photochromic material among TPU or the PC, and macromolecule preparation technology (extrude or the be coated with) mode by routine is prepared from, preferred EVA.The said photochromic material of the present invention comprises organic photochromic material and inorganic photochromic material.Organic photochromic material can be the photochromic compound of spiro-pyrans class and modification thereof, the photochromic compound spirooxazine of pyrans class and modification thereof and the photochromic compound of modification thereof, the photochromic compound of fulgides and modification thereof, the photochromic compound of imidazoles and modification thereof, the photochromic compound of diarylethene and modification thereof, salicylidene phenyl amines photochromic compound, condensed ring fragrance photochromic compound, the thiazide photochromic compound, the Phenoxynaphthacenequinones photochromic compound, in one or more; Inorganic photochromic material can be tungstic acid, molybdenum trioxide, titanium oxide, silver chlorate, silver bromide, one or more in the silver iodide.Preferred organic photochromic material
The preferred 0.01%-5% of organic photochromic material involved in the present invention mass percent in functional film, most preferably 0.05-1%.
Heavy curtain involved in the present invention is to adopt conventional lamination, extrudes, and coating or calendering mode overlay film form.
Flexible intelligent high definition heavy curtain of the present invention has high definition, without water wave, and high transparent, high thermal insulation can effectively completely cut off ultraviolet and infrared light in the sunlight; Intelligent curtain of the present invention can be according to the strong and weak turn colors of illumination, and illumination is stronger, and color is darker, when unglazed the photograph, can return to primary colors.
Description of drawings
The flexible high-definition intelligent heavy curtain typical case of Fig. 1 two-layer structure schematic diagram
The flexible high-definition intelligent heavy curtain typical case of Fig. 2 two-layer structure schematic diagram
The flexible high-definition intelligent heavy curtain typical case of Fig. 3 three-decker schematic diagram
The flexible high-definition intelligent heavy curtain typical case of Fig. 4 three-decker schematic diagram
Fig. 5 equipment structure chart, Irf are base material, and 2m is the film thickness measuring device, 3a is guide roller, 4cr is cooling or warm-up mill, and 5ms, 6ms, 7ms are respectively three main sputter target position (each contains a, b, the auxiliary target position of three independences of c), and 5is, 6is, 7is are respectively ion gun
The specific embodiment
Embodiment 1
TiN/VO
2.Mo/ SiO
2/ Ag/ Al
2O
3/ Ag/ Al
2O3 functional optical thin film technology:
Make backing material A take thickness as 110um eva film coiled strip, through one group of smooth entering continuously in the magnetic control sputtering device reative cell of tension force control guide roller 3a, place down on the base material deposited surface, can effectively prevent granular impurity to the staining of substrate surface, and the reative cell vacuum is extracted into 2 * 10
-3Pa, the 5ms-a target position is made reacting gas with Ar as sputter gas and pure N2 and is entered reative cell for ion gun take metal Ti as target in figure two, adopts direct current reaction magnetron sputtering deposit transparent Ti layer.The flow-rate ratio Ar:N of sputter/increased response gas
2=1:2, gas pressure intensity are 1.0Pa, and sputtering power is 2800W, and underlayer temperature is 80 degree, carry out the imitative gold deposition of titanium nitride.Simulating golden colour purity determines N
2Consumption.TiN is a kind of imitative golden film, as imitating gold decorating
After the transparent titanium nitride film of ground floor deposition finishes, be installed in the 5ms-b target position take 99.99% vanadium oxide pottery as target again, again with Ar as sputter gas and pure O
2Make assisting ion and strengthen gas input reative cell, adopt direct current reaction magnetron sputtering deposit transparent VO
2Layer.The flow-rate ratio Ar:O of sputter/increased response gas
2=1:2, gas pressure intensity are 1.0Pa, and sputtering power is 2800W, and underlayer temperature is 80 ℃, carries out deposition growing.Transparent VO
2Layer thickness is 10nm, at the 5ms-c target position Mo target is installed simultaneously. sputtering power is 500W supplementary doping Mo metal.
Treat the transparent VO of the second layer
2After deposition finishes, be installed in again the 6ms-a target position take 99.99% silicon oxide ceramics as target, again with Ar as sputter gas and pure O
2Make assisting ion and strengthen gas input reative cell, adopt direct current reaction magnetron sputtering deposit transparent SiO
2Layer.The flow-rate ratio Ar:O of sputter/increased response gas
2=1:2.5, gas pressure intensity are 1.0Pa, and sputtering power is 2600W, and underlayer temperature is 80 ℃, carries out deposition growing.Transparent SiO
2Layer thickness is 15nm, growth.
Treat three-layer metal SiO
2Behind the layer sputtering sedimentation 15nm thickness, be installed in again the 6ms-b target position take 99.99%Ag as target, input reative cell with pure Ar as sputter gas, adopt direct current reaction magnetron sputtering plated metal Ag layer.Gas pressure intensity is 1.0Pa, and sputtering power 1800W, underlayer temperature are normal temperature, carry out deposition growing.
Behind the 4th layer of metal A g layer sputtering sedimentation 9.2nm thickness, be installed in again the 6ms-c target position take 99.99% aluminium oxide ceramics as target, again with Ar as sputter gas and pure O
2Make assisting ion and strengthen gas input reative cell, adopt direct current reaction magnetron sputtering deposit transparent Al
2O
3Layer.The flow-rate ratio Ar:O of sputter/increased response gas
2=1:3, gas pressure intensity are 1.0Pa, and sputtering power is 2600W, and underlayer temperature is normal temperature, carries out deposition growing.Transparent Al
2O
3Layer thickness is 15nm
Treat the transparent Al of layer 5
2O
3After layer deposition finishes, be placed on again 7ms-a target position among the figure two take the Ag metal as target, input reative cell with pure Ar as sputter gas, adopt direct current reaction magnetron sputtering plated metal Ag layer.Gas pressure intensity is 1.0Pa, and sputtering power 1800W, underlayer temperature are normal temperature, carry out deposition growing.
Behind layer 6 metal A g layer sputtering sedimentation 9.2nm thickness, be installed in again the 7ms-b target position take 99.99% aluminium oxide ceramics as target, again with Ar as sputter gas and pure O
2Make assisting ion and strengthen gas input reative cell, adopt direct current reaction magnetron sputtering deposit transparent Al
2O
3Layer.The flow-rate ratio Ar:O of sputter/increased response gas
2=1:2, gas pressure intensity are 1.0Pa, and sputtering power is 2400W, and underlayer temperature is normal temperature, carries out deposition growing.Transparent Al
2O
3Layer thickness is 15nm, and thickness is determined by growth time, adopts vibration film thickness monitoring Real Time Monitoring, and accurately measures with ellipsometer test.
Carry out the nano surface cure process at outer surface by the mode of showering.Get the functional optical film.
In EVA, add Photo-chromic Compounds of Spriopyrans (the oxford blue products in the Reversacol Photochromic Dyes series of products of Vivimed Labs company), mass percent in the mixture of EVA and photochromic compound is 0.3%, be prepared into the thick functional eva film of 260um by extruder processing, carry out surperficial cure process in a side of eva film by the mode of showering.
With the one side of functional optical film and functional eva film process nanometer cure process, two outer surfaces as heavy curtain become heavy curtain by laminating machine with the double-layer films overlay film.
The reflecting rate 55% of this flexible high-definition intelligent heavy curtain, light transmittance 42%, solar energy be partition rate 75% always, every ultraviolet rate 99%; In the situation that there is not illumination, colourless, along with the continuous reinforcement of illumination, color can gradually become navy blue; But after solar radiation, heavy curtain returns to again colourless.
Embodiment 2
Al
2O
3/ Ag/ Al
2O
3/ VO
2.W/ Al
2O
3The functional optical film preparation:
PET film coiled strip take thickness as 10um is made backing material A, through one group of smooth entering continuously in the magnetic control sputtering device reative cell of tension force control guide roller 3a, place down on the base material deposited surface, can effectively prevent granular impurity to the staining of substrate surface, and the reative cell vacuum is extracted into 2 * 10
-3Pa, in figure two the 5ms-a target position take 99.99% aluminium oxide ceramics as target, with Ar as sputter gas and pure O
2Make assisting ion and strengthen gas input reative cell, adopt direct current reaction magnetron sputtering deposit transparent Al
2O
3Layer.The flow-rate ratio Ar:O of sputter/increased response gas
2=1:3, gas pressure intensity are 1.0Pa, and sputtering power is 2000W, and underlayer temperature is normal temperature, carries out deposition growing.
Treat the transparent Al of ground floor
2O
3Layer thickness is after the 10nm deposition finishes, to be placed on 5ms-b target position among the figure two take the Ag metal as target again, inputs reative cell with pure Ar as sputter gas, adopts direct current reaction magnetron sputtering plated metal Ag layer.Gas pressure intensity is 1.0Pa, and sputtering power 1800W, underlayer temperature are normal temperature, carry out deposition growing.
Behind second layer metal Ag layer sputtering sedimentation 8nm thickness, be installed in again the 5ms-c target position take 99.99% aluminium oxide ceramics as target, again with Ar as sputter gas and pure O
2Make assisting ion and strengthen gas input reative cell, adopt direct current reaction magnetron sputtering deposit transparent Al
2O
3Layer.The flow-rate ratio Ar:O of sputter/increased response gas
2=1:3, gas pressure intensity are 1.0Pa, and sputtering power is 2600W, and underlayer temperature is normal temperature, carries out deposition growing.Transparent Al
2O
3Layer thickness is 15nm, and thickness has growth time to determine, adopts vibration film thickness monitoring Real Time Monitoring, and accurately measures with ellipsometer test.
Treat three-layer metal Al
2O
3Behind the layer sputtering sedimentation 15nm thickness, be installed in the 6ms-a target position take 99.99% vanadium dioxide pottery as target again, again with Ar as sputter gas and pure O
2Make assisting ion and strengthen gas input reative cell, adopt direct current reaction magnetron sputtering deposit transparent VO
2Layer.The flow-rate ratio Ar:O of sputter/increased response gas
2=1:3, gas pressure intensity are 1.0Pa, and sputtering power is 2800W, and underlayer temperature is normal temperature, carries out deposition growing.Transparent VO
2Layer thickness is 10nm, at the 6ms-b target position W tungsten target is installed simultaneously. sputtering power is that 500W supplementary doping tungsten metal .6ms-c target position is installed Al
2O
3The outer surface that target technique and 6msa target position coexist mutually near PET one side carries out the nano surface cure process by the mode of showering.Get Al
2O
3/ Ag/Al
2O
3/ VO
2.W/ Al
2O
3The functional optical film.
In EVA, add spirooxazine and two kinds of photochromic compounds of spiro-pyrans class (the midnight grey in the Reversacol Photochromic Dyes series of products of Vivimed Labs company and two kinds of products of volcanic grey), both mass ratioes are 1:1, the mass percent that photochromic compound accounts for EVA and photochromic compound mixture is 0.5%, is prepared into the thick functional eva film of 50um by extruder processing.
Functional eva film is placed the centre, and two-layer functional optical film is positioned at the both sides of EVA, wherein does the surface of nanometer cure process as two outer surfaces of heavy curtain, by laminating machine the three-layer thin-film overlay film is become heavy curtain.
The reflecting rate 55% of these three layers of flexible high-definition intelligent heavy curtains, light transmittance 45%, solar energy be partition rate 76% always, every ultraviolet rate 99%; In the situation that do not have illumination, and light gray, along with the continuous reinforcement of illumination, color can gradually become Dark grey; But after solar radiation, heavy curtain returns to again light gray.
Take above-mentioned foundation desirable embodiment of the present invention as enlightenment, by above-mentioned description, the relevant staff can in the scope that does not depart from this invention technological thought, carry out various change and modification fully.The technical scope of this invention is not limited to the content on the specification, must determine its technical scope according to the claim scope.