CN102866444B - Precise grating manufacturing method taking time reference as reference - Google Patents
Precise grating manufacturing method taking time reference as reference Download PDFInfo
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- CN102866444B CN102866444B CN201210371250.7A CN201210371250A CN102866444B CN 102866444 B CN102866444 B CN 102866444B CN 201210371250 A CN201210371250 A CN 201210371250A CN 102866444 B CN102866444 B CN 102866444B
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Abstract
The invention discloses a precise grating manufacturing method taking time reference as reference. The precise grating manufacturing method provides a method utilizing time mapping length as processing control quantity reference during nanometer manufacturing, utilizes high-energy beams (electronic beams, ion beams, laser beams and the like) as processing energy sources to realize nanoscale/sub-nanoscale precise grating manufacturing. In the precise grating manufacturing method aiming to remove nanoscale precise materials during nanometer manufacturing, a mode of taking length as processing control quantity reference conventionally is avoided, and conventional length metering precision is improved by 2 orders of magnitudes. The method taking time for measuring length is applied to precise grating manufacturing and can meet processing precision requirements of nanoscale/sub-nanoscale precision gratings.
Description
Technical field
The invention belongs to technical field of micro-nano manufacture, particularly a kind ofly take the precise grating method for high-precision manufacturing that time reference is reference.The method is mainly used in the manufacture of precise grating, comprises round grating, long grating, concave grating etc.
Background technology
Precise grating is one of critical component of current Precision Machining equipment, precision measurement, optical modulation etc., is widely used in the fields such as the energy, accurate manufacture, space flight detection, ultraprecise optical engineering.At present, the cycle of precise grating is generally 500nm ~ 10 μ m, and trench structure is mainly rectangle, sinusoidal, serrate, trapezoidal etc. according to different application occasion.Along with further developing of super hot investment casting and ultraprecise optical engineering, the accuracy requirement that precise grating is manufactured is more and more higher, the grating cycle may extend to 10nm, and the surface smoothness of optical grating construction requires to reach Subnano-class, and this has proposed serious challenge to existing grating manufacture method.
At present, precise grating manufacture method mainly contains the methods such as mechanical scratching processing, laser interference process technology, optical lithography processing.In above-mentioned manufacturing technology, the shaping of grating nano structure is to be all that benchmark is measured based on length, and carrys out the parameters in controlled working process with this, as processing duration, energy density, process velocity etc.This is machined in theory with traditional macroscopic view is consistent.The micro-nano manufacturing process that the length of take is benchmark, is difficult to realize the manufacture of nanoscale, Subnano-class precision.
In the 17 General Conference of Weights and Measures of holding in Paris October nineteen eighty-three, passed through the new definition of length standard unit-meter: " rice is the light length of stroke in a vacuum in time interval of 1/299792458 second." in fact, rice is to be defined as the distance that light was passed by 0.000000003335640952 second that measures with pt atom clock.The definition of rice means that in metering meaning, long measure (rice) is to derive from chronomere's (second), realizes higher accuracy class.The measuring accuracy grade of existing chronomere (second) has reached 10
-17, and the measuring accuracy grade of long measure (rice) is 10 than its low two orders of magnitude
-15.
In sum, the length of take is compared and be take the time and be that the mete-wand of processing will differ two precision orders of magnitude as the mete-wand of processing, and especially in nanometer manufacture, this will manifest obvious inferior position, and the raising of the machining precision grade of will restriction nanometer manufacturing.The present invention intends providing a kind of usings the time as machining benchmark, realizes the precise grating job operation of nano-precision.
Summary of the invention
The defect and the deficiency that for above-mentioned existing precise grating process technology, exist, the object of the invention is to, and proposes a kind of precise grating method for high-precision manufacturing that time reference is reference of take.The method be take the time as machining benchmark, by the machining control amount Zeitigung of grating manufacture process, has avoided traditional and take length as machining benchmark, thereby improved from measuring standard the machining precision that precise grating is manufactured.
For achieving the above object, the present invention takes following technical solution:
The precise grating manufacture method that the time reference of take is reference, comprises the steps:
1) clean workpiece to be processed;
2) conversion of time map length: the material according to the structural parameters of workpiece to be processed, workpiece, adds workpiece
The speed of feed of the pulsewidth of the high energy beam of work, energy density and workpiece, carries out take the time as benchmark mapping length
The conversion of benchmark, the nanoprocessing controlled quentity controlled variable that to obtain take the time be benchmark: groove place processes umber of pulse N continuously
1with
High energy beam cyclic process times N
2;
3) according to umber of pulse N
1control the opening of clock switch, according to high energy beam cyclic process times N
2reach required nanometer
The groove depth of structure, carries out the manufacture of precise grating.
Preferably, described step 2), groove place processes umber of pulse N continuously
1with high energy beam cyclic process times N
2computing method as follows: first, calculate single groove place's pulse continuous process time of t
1:
groove place processes umber of pulse N continuously
1:
then, calculate single high spot pulse off-air time t
2:
high energy beam cyclic process times N
2:
wherein, the nanostructured of workpiece to be processed: L
1for groove width, L
2for ledge width, H is groove depth, and Δ T is high energy beam pulsewidth, and h is the degree of depth of single pulse processing; V is the speed of feed of workpiece to be processed.
Preferably, by regulating pulsewidth Δ T, the work capacity density of high energy beam bundle spot and the speed of feed v of workpiece of high energy beam, regulate the machining precision of grating.
Preferably, the processing of the grating in the cycle that is 10nm ~ 100nm for nanoscale, described high energy beam is electron beam or ion beam.
Preferably, for sub-micron to micro-meter scale, be the grating processing in 100nm ~ 20 μ m cycle, described high energy beam is ion beam or laser.
The invention has the beneficial effects as follows:
The present invention be take time reference as reference, by traditional, take the processing capacity that length is benchmark and be converted to time controlled quentity controlled variable, by calculating the machining control amount Zeitigung of high energy beam umber of pulse during nanometer is manufactured, utilize dissimilar high energy beam to realize that nanoscale in the manufacture of nanoscale precise grating requires and the precision requirement of Subnano-class.The introducing of time reference improves the accuracy of measurement of machining control amount, and the introducing of high energy beam has realized nano-precision requirement.
Accompanying drawing explanation
Fig. 1 is the high energy beam machining sketch chart of time map length.
Fig. 2 is that high energy beam pulse shapes schematic diagram.
Fig. 3 is the basic parameter of high energy beam processing.
Fig. 4 is the Zeitigung of high energy beam machining control amount.
Fig. 5 is time map length high energy beam work flow.
Number designation in accompanying drawing represents respectively: 1, negative electrode, 2, control grid, 3, accelerating anode, 4, focusing system, 5, high energy beam spot, 6, clock switch, 7, workpiece to be processed.
Embodiment
Below by accompanying drawing and concrete embodiment, the present invention will be further described.
As shown in Figure 1, the present invention realizes by following step with a kind of embodiment of the novel job operation of high energy beam nanoscale of time reference mapping length.This example utilizes foregoing invention in cylindrical roller, to process the accurate master grating mould of a high line number (1000l/mm ~ 5000l/mm), requires the crest line of grating strain line to have the precision of Subnano-class, adopts the method for limit removal limit correction of the flank shape in process.This example comprises the following steps:
The preparation of the first step, workpiece to be processed 7: the cylinder smooth roll that Choice and process is good, by abluent wash, the mode such as acetone/alcohol ultrasonic cleaning cleans, and dries up moisture after oven for baking 30min, clamping is on rotary table after cooling.
Second step, input machined parameters and high energy beam parameter: according to structural parameters such as the grooved of precise grating structure to be processed (as rectangle, sawtooth, trapezoidal, sinusoidal etc.), cycle (10nm ~ 20 μ m), depth-to-width ratios (0.1 ~ 5), the material of workpiece (as metal, polymkeric substance, quartz etc.), the pulsewidth (10 of high energy beam (electron beam, ion beam, laser beam etc.)
-6s～10
-15s), the speed of feed (0.01mm/s ~ 10mm/s) of energy density and workpiece, etc. parameter input computing machine, in order to the conversion of time map length, calculate.
The Zeitigung controlled quentity controlled variable of the 3rd step, processing is calculated: by the single groove of described calculating place's pulse continuous process time of t above
1, groove place processes umber of pulse N continuously
1, single high spot pulse off-air time t
2with high energy beam cyclic process times N
2.
The nanometer high precision processing that high-energy extremely short pulse is time map length provides the bridge of conversion, as shown in Figure 3.The nanostructured of member to be processed: L
1for groove width, L
2for ledge width, L
1+ L
2for one-period width, H is groove depth; The beam spot diameter, of high energy beam is d, and high energy beam pulsewidth is Δ T, and the degree of depth of single pulse processing is h; Workpiece to be processed is with constant speed v feeding.Carry out according to this mapping of time to length:
Single groove place's pulse continuous process time of t
1
Groove place processes umber of pulse N continuously
1
Single high spot pulse off-air time t
2
High energy beam cyclic process times N
2
Like this, the controlled quentity controlled variable measuring standard of precise grating in manufacturing is by length transition to time (shown in Fig. 4), and by clock switch gating pulse number, high precision that can realize target graphic structure is shaped.
The 4th step, the processing of high energy beam high precision: as shown in Figure 4, utilize high energy beam to carry out Precision Machining to master grating.The nanoscale that adopts laser or ion beam to carry out master grating grooved is shaped and processes.
According to the Zeitigung machining control amount of calculating gained, high energy beam is carried out to actual machining control: in processing place of actual grooved, according to umber of pulse N
1that controls clock switch opens to form processing; At high spot, according to pulse off-air time t
2control closing of clock switch; According to high energy beam cyclic process times N
2reach the groove depth of required nanostructured.For different job requirements, can also to the pulsewidth Δ T of high energy beam, regulate by high energy beam pulse width modulator, work capacity density by high energy beam energy regulator halved tie spot regulates, and Negotiation speed regulator regulates and controls the speed of feed v of workpiece, jointly realize the conversion and control of time map length, guarantee the nano-precision of processing.
The present invention can, for different grating accuracy class and processing requests, select different high energy beams.For the grating processing in nanoscale (10nm ~ 100nm) cycle, select electron beam, ion beam to form processing, guarantee nano-scale precision; Grating processing for sub-micron to micro-meter scale (100nm ~ 20 μ m), selects ion, Shu Jiguang to process, and guarantees the accuracy requirement of grating, improves working (machining) efficiency.
Claims (5)
1. the precise grating manufacture method that the time reference of take is reference, is characterized in that, comprises the steps:
1) clean workpiece to be processed;
2) conversion of time map length: according to the material of the structural parameters of workpiece to be processed, workpiece, the speed of feed of the pulsewidth of the high energy beam that workpiece is processed, energy density and workpiece, the time of carrying out take is the conversion of benchmark mapping length standard, the nanoprocessing controlled quentity controlled variable that to obtain take the time be benchmark: groove place processes umber of pulse N continuously
1with high energy beam cyclic process times N
2;
3) according to umber of pulse N
1control the opening of clock switch, according to high energy beam cyclic process times N
2reach the groove depth of required nanostructured, carry out the manufacture of precise grating.
2. method according to claim 1, is characterized in that: described step 2), groove place processes umber of pulse N continuously
1with high energy beam cyclic process times N
2computing method as follows:
First, calculate single groove place's pulse continuous process time of t
1:
groove place processes umber of pulse N continuously
1:
Then, calculate single high spot pulse off-air time t
2:
high energy beam cyclic process times N
2:
Wherein, the nanostructured of workpiece to be processed: L
1for groove width, L
2for ledge width, H is groove depth, and Δ T is high energy beam pulsewidth, and h is the degree of depth of single pulse processing; V is the speed of feed of workpiece to be processed.
3. method according to claim 2, is characterized in that: by regulating pulsewidth Δ T, the work capacity density of high energy beam bundle spot and the speed of feed v of workpiece of high energy beam, regulate the machining precision of grating.
4. according to the method described in claim 1-3 any one, it is characterized in that: for the grating processing in nanoscale cycle of 10nm～100nm, described high energy beam is electron beam or ion beam.
5. according to the method described in claim 1-3 any one, it is characterized in that: the sub-micron for 100nm～20 μ m is processed to the grating in micro-meter scale cycle, and described high energy beam is ion beam or laser.
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| CN102866444B true CN102866444B (en) | 2014-09-03 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2002062260A (en) * | 2000-08-16 | 2002-02-28 | Konica Corp | Diffraction element reader |
| US7110180B2 (en) * | 2002-10-09 | 2006-09-19 | Ricoh Company, Ltd. | Diffraction grating, method of fabricating diffraction optical element, optical pickup device, and optical disk drive |
| PL1611466T3 (en) * | 2003-03-21 | 2008-01-31 | Ovd Kinegram Ag | Method for producing two overlaying microstructures |
| JP4350471B2 (en) * | 2003-09-10 | 2009-10-21 | 株式会社リコー | Electron beam drawing method and drawing apparatus |
| CN102096133B (en) * | 2010-12-27 | 2012-07-18 | 北京航空航天大学 | Adjustable nano grating, nano grating accelerometer and processing method of adjustable nano grating or nano grating accelerometer |
| CN102323634B (en) * | 2011-10-19 | 2016-06-22 | 苏州大学 | A kind of manufacture method of holographic double balzed grating |
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