CN102856229A - Wafer position detecting device and method in treatment cavity - Google Patents
Wafer position detecting device and method in treatment cavity Download PDFInfo
- Publication number
- CN102856229A CN102856229A CN2012103668665A CN201210366866A CN102856229A CN 102856229 A CN102856229 A CN 102856229A CN 2012103668665 A CN2012103668665 A CN 2012103668665A CN 201210366866 A CN201210366866 A CN 201210366866A CN 102856229 A CN102856229 A CN 102856229A
- Authority
- CN
- China
- Prior art keywords
- wafer
- process chamber
- monitor
- light source
- camera
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2012103668665A CN102856229A (en) | 2012-09-27 | 2012-09-27 | Wafer position detecting device and method in treatment cavity |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2012103668665A CN102856229A (en) | 2012-09-27 | 2012-09-27 | Wafer position detecting device and method in treatment cavity |
Publications (1)
Publication Number | Publication Date |
---|---|
CN102856229A true CN102856229A (en) | 2013-01-02 |
Family
ID=47402694
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2012103668665A Pending CN102856229A (en) | 2012-09-27 | 2012-09-27 | Wafer position detecting device and method in treatment cavity |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN102856229A (en) |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004186521A (en) * | 2002-12-05 | 2004-07-02 | Sony Corp | Aligner |
JP2006196833A (en) * | 2005-01-17 | 2006-07-27 | Toshiba Corp | Semiconductor manufacturing apparatus and method for manufacturing semiconductor device |
KR100783072B1 (en) * | 2006-12-27 | 2007-12-07 | 세메스 주식회사 | Apparatus for processing a substrate |
US20090249880A1 (en) * | 2008-04-07 | 2009-10-08 | Tech Semiconductor Singapore Pte Ltd | Real-time detection of wafer shift/slide in a chamber |
JP4357619B2 (en) * | 1999-02-09 | 2009-11-04 | キヤノンアネルバ株式会社 | Multi-chamber system |
CN101719462A (en) * | 2008-10-09 | 2010-06-02 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Process chamber, plasma device and chamber state detecting method |
KR20100077241A (en) * | 2008-12-29 | 2010-07-08 | 주식회사 동부하이텍 | Chemical vapor depostion device and method for using the same |
-
2012
- 2012-09-27 CN CN2012103668665A patent/CN102856229A/en active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4357619B2 (en) * | 1999-02-09 | 2009-11-04 | キヤノンアネルバ株式会社 | Multi-chamber system |
JP2004186521A (en) * | 2002-12-05 | 2004-07-02 | Sony Corp | Aligner |
JP2006196833A (en) * | 2005-01-17 | 2006-07-27 | Toshiba Corp | Semiconductor manufacturing apparatus and method for manufacturing semiconductor device |
KR100783072B1 (en) * | 2006-12-27 | 2007-12-07 | 세메스 주식회사 | Apparatus for processing a substrate |
US20090249880A1 (en) * | 2008-04-07 | 2009-10-08 | Tech Semiconductor Singapore Pte Ltd | Real-time detection of wafer shift/slide in a chamber |
CN101719462A (en) * | 2008-10-09 | 2010-06-02 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Process chamber, plasma device and chamber state detecting method |
KR20100077241A (en) * | 2008-12-29 | 2010-07-08 | 주식회사 동부하이텍 | Chemical vapor depostion device and method for using the same |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
MX364088B (en) | METHOD and APPARATUS FOR OPTICAL DETECTION OF BIO-CONTAMINANTS. | |
WO2008129550A3 (en) | Method and apparatus for contamination-free transfer of a hazardous drug | |
TW201510909A (en) | Support information display method, maintenance support method of substrate processing apparatus, support information display control apparatus, substrate processing system and recording medium | |
CN104380450A (en) | Semiconductor inspection system and method for preventing condensation at interface part | |
US20170275083A1 (en) | Substrate Cassette | |
CN105186363A (en) | Electric power safe rapid inspection system | |
CN106707571A (en) | Separation device and separation method of touch control panel and display panel | |
CN102856229A (en) | Wafer position detecting device and method in treatment cavity | |
JP2023545627A (en) | smart camera board | |
CN111332734B (en) | Transfer device and cleaning method thereof | |
TWI582852B (en) | Method and apparatus for monitoring edge bevel removal area in semiconductor apparatus and electroplating system | |
CN204557568U (en) | Based on the express delivery state monitoring apparatus of mobile network | |
JP2014157975A (en) | Carriage for cleanness measurement and cleanness measurement system | |
CN109786300A (en) | Delivery chamber | |
CN103693409A (en) | Device for detecting positive and negative surfaces of clamps for aligning and combining of PDP (plasma display panel) screen | |
CN204313835U (en) | Visual detection equipment | |
CN108745934A (en) | A kind of light bulb wick detection device | |
CN204320675U (en) | A kind of automated fiber optic end surface measurement system | |
CN203179707U (en) | Jacketing machine used for aluminum electrolytic capacitor | |
CN109166816B (en) | Wafer processing apparatus and operating method thereof | |
CN103364706A (en) | Acceptance testing device and acceptance testing method for disposable programmable device | |
CN104324893A (en) | Automatic optical fiber end face detection system | |
CN209946014U (en) | Flange plate applied to SF6 electrical equipment | |
CN202601581U (en) | Defect detection device | |
WO2018131489A1 (en) | Panel inspection system |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
ASS | Succession or assignment of patent right |
Owner name: SHANGHAI HUAHONG GRACE SEMICONDUCTOR MANUFACTURING Free format text: FORMER OWNER: HONGLI SEMICONDUCTOR MANUFACTURE CO LTD, SHANGHAI Effective date: 20140428 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20140428 Address after: 201203 Shanghai Zhangjiang hi tech park Zuchongzhi Road No. 1399 Applicant after: Shanghai Huahong Grace Semiconductor Manufacturing Corporation Address before: 201203 Shanghai Guo Shou Jing Road, Pudong New Area Zhangjiang hi tech Park No. 818 Applicant before: Hongli Semiconductor Manufacture Co., Ltd., Shanghai |
|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20130102 |
|
WD01 | Invention patent application deemed withdrawn after publication |