CN102830587A - Mask plate, CF (Color Filter), LCD (Liquid Crystal Display) device and manufacturing method - Google Patents
Mask plate, CF (Color Filter), LCD (Liquid Crystal Display) device and manufacturing method Download PDFInfo
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- CN102830587A CN102830587A CN2012103349477A CN201210334947A CN102830587A CN 102830587 A CN102830587 A CN 102830587A CN 2012103349477 A CN2012103349477 A CN 2012103349477A CN 201210334947 A CN201210334947 A CN 201210334947A CN 102830587 A CN102830587 A CN 102830587A
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Abstract
The invention provides a mask plate, a CF (Color Filter), an LCD (Liquid Crystal Display) device and a manufacturing method. The mask plate comprises a transmitting area and a shading area, wherein a light intensity transition area is arranged between the transmitting area and the shading area, and the light intensity transition area comprises the transmitting area and the shading area which are in interlacing arrangement. According to the technical scheme disclosed by the invention, the angle end difference of the LCD due to the using of the CF and the follow-up working procedure poorness which is caused and can be possibly caused by the angle end difference can be reduced, and the product yield is finally increased.
Description
Technical field
The present invention relates to technical field of liquid crystal display, be meant a kind of mask plate, colored filter, liquid crystal display and method for making especially.
Background technology
As shown in Figure 1; Be the partial structurtes figure of colorful filter structure of the prior art after accomplishing black matrix exposure; The black matrix 11 that comprises substrate 10 and on substrate 10, form, the shape of the mask plate that existing colored filter uses is as shown in Figure 2, and wherein 12 is the lightproof area of mask plate; 13 are the transmission region of mask plate (being the exposure area); Chromatic photoresist layer shape after it is shaped is as shown in Figure 3, and 14 is the corresponding chromatic photoresist layer of transmission region of mask plate, and the cross section of the chromatic photoresist layer after the shaping is as shown in Figure 4.
Concrete, shown in Fig. 5 A, Fig. 5 B and Fig. 5 C, Fig. 5 A is the chromatic photoresist of the colored filter after the existing mask plate completion of the use chromatic photoresist exposure technology and the sectional view of black matrix overlapping region; Fig. 5 B is to use the chromatic photoresist of the colored filter behind the exposure of existing mask plate completion chromatic photoresist, the developing process and the sectional view of black matrix overlapping region; Fig. 5 C is to use the final colored filter partial section that accomplishes of existing mask plate; Wherein, in Fig. 5 A, label 10 is a glass substrate, and label 11 is black matrix, the photoresist layer that label 14 makes public for the mask plate that uses prior art, and make public fully in this zone, and the exposure reaction rate is higher, and photoresistance is cured basically; Label 31 indicated parts are that masked plate blocks unexposed photoresistance part in the exposure process; In Fig. 5 B, label 31 indicated unexposed photoresistance parts are being eliminated through behind the developing process; In Fig. 5 C; The photoresistance of the final exposure that obtains after the operations such as the process of the photoresistance of exposure shown in the label 14 cleaning; The photoresistance thicknesses of layers of exposure area has certain reduction; By chromatic photoresist at the area that is parallel to the development face on the glass substrate direction much larger than perpendicular to the development face on the glass substrate direction, behind the developing procedure, chromatic photoresist change in size in the horizontal direction is also less relatively.
Owing to need block mixed and disorderly light, need the black matrix of a fixed structure and area coverage on the colored filter of LCD (liquid crystal display), the part shown in the label 11 among Fig. 1-Fig. 5 C through the non-uniform electric field zone; From to colored filter surface topography, angle end difference and to the consideration of back operation segment process influence; In order to prevent light leak; Common color film can have overlapping region with black arranged in matrix; In color filter producing process, black matrix is accomplished in the operation of exposure for the first time usually, carries out the exposure of red, green, blue photoresistance after black matrix is accomplished again.But because the existence of black matrix; After accomplishing the exposure technology of chromatic photoresist; Always can be higher than the thicknesses of layers of the chromatic photoresist of transmission region with the overlap chromatic photoresist thicknesses of layers of part of black matrix; As shown in Figure 4, it is poor that the photoresistance rete gross thickness of the part that overlaps and the difference of transmission region photoresistance film thickness are called the angle end.
Because the existence of angle end difference, back operation section is friction orientation procedure especially, and the friction orientation of the friction orientation of the film surface of overlapping partial colour photoresistance and the film surface of transmission region chromatic photoresist possibly accomplished in full accord aspect concrete effect hardly.And the difference of the concrete effect of friction orientation can bring in various degree light leak, liquid crystal molecule action to wait a series of problem partially slowly.
And the reason that causes the problems referred to above that occur in the operation section of back is: when making the chromatic photoresist layer, the mask plate of employing makes this angle end difference existence, and perhaps angle end difference is bigger.
Summary of the invention
The technical matters that the present invention will solve provides a kind of mask plate, colored filter, liquid crystal display and method for making; It is poor with the angle end of colored filter to have reduced LCD; And the back operation section that angle end difference has caused and possibly cause is bad, has finally improved the product yield.
For solving the problems of the technologies described above; Embodiments of the invention provide a kind of mask plate; Comprise transmission region and lightproof area, be provided with the light intensity zone of transition between said transmission region and the lightproof area, said light intensity zone of transition comprises transmission region and the lightproof area that is crisscross arranged.
Wherein, interface, boundary indentation, wedge shape or the pulse shape of said transmission region that is crisscross arranged and lightproof area.
Wherein, the drift angle of said sawtooth is 15 ° ~ 165 °, and two edge lengths of said sawtooth are 2 μ m ~ 10 μ m.
Wherein, the both sides equal in length of said sawtooth.
Embodiments of the invention also provide a kind of colored filter, comprising: the black matrix on substrate, the said substrate and be formed at said substrate and said black matrix on the chromatic photoresist layer of exposure area; Said chromatic photoresist layer utilizes as above each described mask plate to process.
Embodiments of the invention also provide a kind of liquid crystal display, comprise aforesaid colored filter.
Embodiments of the invention also provide a kind of color filter making method, comprising:
One substrate is provided;
On said substrate, form black matrix;
The mask plate that utilizes transmission region and lightproof area to be crisscross arranged, the exposure area on said substrate and said black matrix forms the chromatic photoresist layer.
Wherein, said method also comprises: said chromatic photoresist layer is carried out step of developing.
Wherein, said method also comprises: to having carried out the colored filter step of heat treatment after the development.
Wherein, said thermal treatment is baking processing.
The beneficial effect of technique scheme of the present invention is following:
In the such scheme, the transmission region (being the exposure area) of the mask plate through the chromatic photoresist film and boundary indentation, wedge shape or the pulse shape of lightproof area.In the exposure developing process process later: for the bossing of zigzag, wedge shape or the pulse at edge, exposure area; From the edge of chromatic photoresist film to center position (from the top of bossing to root); Because further near blanket exposure zone (mask plate and substrate overlapping areas); The firm degree that the photoresistance film solidifies also increases gradually, and it is fewer and feweri to be developed the part that liquid washes off, for the recessed portion of zigzag, wedge shape or the pulse shape at edge, exposure area; From the edge of chromatic photoresist film to center position (from the top of bossing to root); Because further near blanket exposure zone, simultaneously under the protection of adjacent exposure area, both sides (the chromatic photoresist film is partly solidified), it is also fewer and feweri that the chromatic photoresist film is developed the part that liquid rinses out.Finally; Because edge indentation, wedge shape or the pulse shape of the exposure area of mask plate; The quantity of illumination that the quantity of illumination that this zone in exposure process (being chromatic photoresist film and black matrix overlapping areas) chromatic photoresist film is accepted is accepted than transmission region chromatic photoresist film has minimizing to a certain degree; The firm degree that the photoresistance film solidifies also has corresponding reduction, so in the process of developing, the photoresistance film of concaveconvex shape exposure area also can be rinsed more on thickness direction.Colored filter more of the prior art; The colored filter that the present invention proposes will be lower than the colored filter that uses existing mask plate exposure to obtain at the thickness of the rete of black matrix and chromatic photoresist overlapping region; Therefore; It is poor with the angle end of colored filter to have reduced LCD, and the back operation section that angle end difference has caused and possibly cause is bad, has finally improved the product yield.
Description of drawings
Fig. 1 is a colored filter partial structurtes synoptic diagram of having accomplished black matrix exposure technology in the prior art;
Fig. 2 is the partial view after mask plate is accomplished with the glass substrate contraposition of accomplishing black matrix exposure technology in the prior art;
Fig. 3 is to use the colored filter partial view after existing mask plate is accomplished chromatic photoresist exposure, developing process;
Fig. 4 is to use the final colored filter partial section that accomplishes of existing mask plate;
Fig. 5 A is to use the colored filter partial section after existing mask plate is accomplished the chromatic photoresist exposure technology;
Fig. 5 B is to use the colored filter partial section after existing mask plate is accomplished chromatic photoresist exposure, developing process;
Fig. 5 C is to use the final colored filter partial section that accomplishes of existing mask plate;
Fig. 6 is the partial view after mask plate proposed by the invention is accomplished with the substrate contraposition of accomplishing black matrix exposure technology;
Fig. 7 is to use the colored filter partial view after mask plate proposed by the invention is accomplished chromatic photoresist exposure, developing process;
Fig. 8 is to use the final colored filter partial section that accomplishes of mask plate proposed by the invention;
Fig. 9 is the partial view after another mask plate proposed by the invention is accomplished with the substrate contraposition of accomplishing black matrix exposure technology;
Figure 10 is the partial view after another mask plate proposed by the invention is accomplished with the substrate contraposition of accomplishing black matrix exposure technology.
Figure 11 A is to use the colored filter partial section after mask plate proposed by the invention is accomplished the chromatic photoresist exposure technology;
Figure 11 B is to use the colored filter partial section after mask plate proposed by the invention is accomplished chromatic photoresist exposure, developing process;
Figure 11 C is to use the final colored filter partial section that accomplishes of mask plate proposed by the invention.
Description of reference numerals:
10-substrate (prior art)
11-black matrix (prior art)
The lightproof area of 12-mask plate (prior art)
The transmission region of 13-mask plate (prior art)
The chromatic photoresist film (prior art) of 14-mask plate exposure
The unexposed photoresistance of 31-mask plate (prior art)
The 20-substrate
21-deceives matrix
The lightproof area of 22-mask plate
The transmission region of 23-mask plate
The chromatic photoresist of 24-mask plate exposure
The unexposed photoresistance of 31B-mask plate
Embodiment
For technical matters, technical scheme and advantage that the present invention will be solved is clearer, will combine accompanying drawing and specific embodiment to be described in detail below.
Embodiments of the invention provide a kind of mask plate, comprise transmission region and lightproof area, are provided with the light intensity zone of transition between said transmission region and the lightproof area, and said light intensity zone of transition comprises transmission region and the lightproof area that is crisscross arranged.
The transmission region that is crisscross arranged 23 of said mask plate is zigzag as shown in Figure 6, wedge shape or pulse shape shown in figure 10 as shown in Figure 9 with the interface, boundary of lightproof area 22.
As shown in Figure 6 again, said zigzag is a predetermined included angle A, and this angle is the drift angle of sawtooth; Be preferably 15 ° ~ 165 °, the both sides of said sawtooth have a predetermined length respectively, and are preferred; The predetermined length on said sawtooth both sides is 2 μ m ~ 10 μ m; Preferably, the predetermined length on said sawtooth both sides equates, is d.
Like Fig. 7, shown in Figure 8, embodiments of the invention also provide colored filter, comprising: the black matrix 21 on substrate 20, the said substrate 20 and be formed at said substrate 20 and the chromatic photoresist 24 of the exposure area of said black matrix 21 tops; Wherein, said chromatic photoresist 24 is to utilize the transmission region 23 that is crisscross arranged to process with the mask plate of lightproof area 22.
In the above embodiment of the present invention; When exposure area (the being above-mentioned transmission region 23) periphery of the mask plate of making chromatic photoresist rete is zigzag; As shown in Figure 6, in the exposure developing process process later: for the pointed bossing of exposure area zigzag fashion, from the edge of chromatic photoresist film to center position (from the top of bossing to root); The width of exposure area increases gradually; The firm degree that the photoresistance film solidifies also increases gradually, thereby it is fewer and feweri to be developed the part that liquid washes off, for the recessed portion of the zigzag fashion of exposure area; From the edge of chromatic photoresist layer to center position (from the top of bossing to root); The width of unexposed area (being lightproof area 22) reduces gradually, and simultaneously under the protection of adjacent exposure area, both sides (the chromatic photoresist film is partly solidified), it is also fewer and feweri that the chromatic photoresist film is developed the part that liquid rinses out.Finally; Because mask plate indention shape; The quantity of illumination that the quantity of illumination that this regional chromatic photoresist film is accepted in exposure process is accepted than transmission region chromatic photoresist film has minimizing to a certain degree; The firm degree that the photoresistance film solidifies also has corresponding reduction, so in the process of developing, the photoresistance film of zigzag fashion exposure area also can be rinsed more on thickness direction.Colored filter more of the prior art; The thickness of the chromatic photoresist film of the colored filter that the present invention proposes and the rete of black matrix overlapping region will be lower than the colored filter (as shown in Figure 8) that uses existing mask plate exposure to obtain; Therefore, it is poor with the angle end of colored filter to have reduced LCD.And in final baking process process of solidifying; The chromatic photoresist periphery also has small flowing to a certain degree; Through the flowability of raising chromatic photoresist material before coating and final heat curing, thereby further reduce chromatic photoresist and black matrix overlapping thickness partly.For Fig. 9 and mask plate structure shown in Figure 10, the thickness of rete of chromatic photoresist film and the black matrix overlapping region of the colored filter after the shaping is lower than use the thicknesses of layers of the colored filter same position that existing mask plate exposure obtains.
Shown in Figure 11 A-Figure 11 C, wherein, Figure 11 A is to use the colored filter partial section after mask plate proposed by the invention is accomplished the chromatic photoresist exposure technology; Figure 11 B is to use mask plate completion chromatic photoresist exposure proposed by the invention, the chromatic photoresist of the colored filter behind the developing process and the sectional view of black matrix overlapping region; Figure 11 C is to use the chromatic photoresist of the final colored filter of accomplishing of mask plate proposed by the invention and the sectional view of black matrix overlapping region.Wherein label 24 is for using the photoresistance of mask plate exposure of the present invention; Because the exposure area shown in this zone is a zigzag; The exposure energy that the exposure area received will be lower than region of normal exposure, and the exposure reaction rate is lower relatively, and the degree that photoresistance is cured is also lower; The indicated part of label 31B is that masked plate blocks unexposed photoresistance part in the exposure process; In Figure 11 B; The indicated unexposed photoresistance part of label 31B is being eliminated through behind the developing process, and when making public owing to preceding operation, the degree that the photoresistance of zigzag exposure area is cured is lower relatively; Therefore post-develop resistance thicknesses of layers also has reduction largely; And by chromatic photoresist at the area that is parallel to the development face on the glass substrate direction much larger than perpendicular to the development face on the glass substrate direction, behind the developing procedure, chromatic photoresist change in size in the horizontal direction is also less relatively; In Figure 11 C, the photoresistance of exposure shown in the label 24 is the photoresistance through the final exposure that obtains after the operations such as cleaning; And can find out also that from figure the thickness of this photoresistance 24 is starkly lower than the thicknesses of layers (photoresistance that obtains in the prior art shown in Fig. 5 C) of the photoresistance 14 that uses the colored filter same position that existing mask plate exposure obtains, thereby it is poor to have reduced the angle end.
The present invention is through the structure of improvement back mask plate, and it is poor with the angle end of colored filter to have reduced LCD, and it is bad to have reduced the back operation section that angle end difference caused and possibly cause, and has finally improved the product yield.
Embodiments of the invention also provide a kind of liquid crystal display; Comprise colored filter, and said colored filter to the array base palte of box and be filled in said colored filter and said array base palte between liquid crystal, said colored filter be as above-mentioned Fig. 7, Fig. 8, Fig. 9 or embodiment illustrated in fig. 10 in colored filter.
Said liquid crystal display specifically can be like display panels (LCD), liquid crystal module (LCM) or the final LCD that is packaged into.
Embodiments of the invention also provide a kind of color filter making method, comprising:
Step 12 forms black matrix on said substrate;
Step 13, the mask plate that utilizes transmission region and lightproof area to be crisscross arranged, the exposure area above said substrate and said black matrix forms the chromatic photoresist layer.Wherein, the interface, boundary of the transmission region of mask plate and lightproof area is preferably zigzag, wedge shape or pulse shape, like Fig. 6, Fig. 9 and shape shown in Figure 10.
Further, said method can also comprise: the processing step that said chromatic photoresist film is developed.
Further, said method can also comprise: heat-treat processing step (like baking processing) to having carried out the colored filter behind the developing process.
In above-mentioned exposure developing process process later: for the bossing of the concaveconvex shape at edge, exposure area; From the edge of chromatic photoresist film to center position (from the top of bossing to root); Because further near blanket exposure zone (mask plate and substrate overlapping areas); The firm degree that the photoresistance film solidifies also increases gradually, and it is fewer and feweri to be developed the part that liquid washes off, for the recessed portion of exposure area concaveconvex shape; From the edge of chromatic photoresist film to center position (from the top of bossing to root); Because further near blanket exposure zone, simultaneously under the protection of adjacent exposure area, both sides (the chromatic photoresist film is partly solidified), it is also fewer and feweri that the chromatic photoresist film is developed the part that liquid rinses out.Finally; Because mask plate is concaveconvex shape; The quantity of illumination that the quantity of illumination that this zone in exposure process (being chromatic photoresist film and black matrix overlapping areas) chromatic photoresist film is accepted is accepted than transmission region chromatic photoresist film has minimizing to a certain degree; The firm degree that the photoresistance film solidifies also has corresponding reduction, so in the process of developing, the photoresistance film of concaveconvex shape exposure area also can be rinsed more on thickness direction.
The embodiment of this method is equally through the structure of improvement mask plate, and the angle end of the colored filter that has reduced to process is poor, has reduced angle end difference and has caused with the back operation section that possibly cause badly, has finally improved the product yield.
In addition; In above-mentioned all embodiment; The transmission region that is crisscross arranged of Fig. 6, Fig. 9 and mask plate shown in Figure 10 and lightproof area can also transpositions; But the transmission region of the mask plate behind the transposition and the boundary of lightproof area be indentation, wedge shape or pulse shape still; Utilize the thickness of rete of chromatic photoresist film and the black matrix overlapping region of the colored filter that the mask plate behind transmission region and the lightproof area transposition processes still to be lower than the colored filter that uses existing mask plate exposure to obtain; Thereby it is poor with the angle end of colored filter to have reduced LCD, has reduced angle end difference and has caused with the back operation section that possibly cause badly, has finally improved the product yield.
The above is a preferred implementation of the present invention; Should be pointed out that for those skilled in the art, under the prerequisite that does not break away from principle according to the invention; Can also make some improvement and retouching, these improvement and retouching also should be regarded as protection scope of the present invention.
Claims (10)
1. a mask plate comprises transmission region and lightproof area, it is characterized in that, is provided with the light intensity zone of transition between said transmission region and the lightproof area, and said light intensity zone of transition comprises transmission region and the lightproof area that is crisscross arranged.
2. mask plate according to claim 1 is characterized in that, interface, boundary indentation, wedge shape or the pulse shape of said transmission region that is crisscross arranged and lightproof area.
3. mask plate according to claim 2 is characterized in that, the drift angle of said sawtooth is 15 ° ~ 165 °, and two edge lengths of said sawtooth are 2 μ m ~ 10 μ m.
4. mask plate according to claim 3 is characterized in that, the both sides equal in length of said sawtooth.
5. colored filter comprises: the black matrix on substrate, the said substrate and be formed at said substrate and said black matrix on the chromatic photoresist layer of exposure area; It is characterized in that said chromatic photoresist layer utilizes each described mask plate of claim 1 ~ 4 to process.
6. a liquid crystal display is characterized in that, comprises colored filter as claimed in claim 5.
7. a color filter making method is characterized in that, comprising:
One substrate is provided;
On said substrate, form black matrix;
The mask plate that utilizes transmission region and lightproof area to be crisscross arranged, the exposure area on said substrate and said black matrix forms the chromatic photoresist layer.
8. color filter making method according to claim 7 is characterized in that, also comprises: said chromatic photoresist layer is carried out step of developing.
9. color filter making method according to claim 8 is characterized in that, also comprises:
To having carried out the colored filter step of heat treatment after the development.
10. according to the method for making of the said chromatic colour optical filter of claim 9, it is characterized in that said thermal treatment is baking processing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012103349477A CN102830587A (en) | 2012-09-11 | 2012-09-11 | Mask plate, CF (Color Filter), LCD (Liquid Crystal Display) device and manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012103349477A CN102830587A (en) | 2012-09-11 | 2012-09-11 | Mask plate, CF (Color Filter), LCD (Liquid Crystal Display) device and manufacturing method |
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| CN102830587A true CN102830587A (en) | 2012-12-19 |
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| CN2012103349477A Pending CN102830587A (en) | 2012-09-11 | 2012-09-11 | Mask plate, CF (Color Filter), LCD (Liquid Crystal Display) device and manufacturing method |
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| CN104297996A (en) * | 2014-11-10 | 2015-01-21 | 上海天马微电子有限公司 | Color film substrate, liquid crystal display panel and display device |
| CN104391349A (en) * | 2014-12-01 | 2015-03-04 | 深圳市华星光电技术有限公司 | Method for producing color filter, color filter and liquid crystal display panel |
| CN104570183A (en) * | 2014-12-26 | 2015-04-29 | 深圳市华星光电技术有限公司 | Filter, LCD (liquid crystal display) panel and manufacture method of filter |
| CN104714363A (en) * | 2015-03-26 | 2015-06-17 | 南京中电熊猫液晶显示科技有限公司 | Gray-scale mask plate and method for manufacturing liquid crystal display by employing gray-scale mask plate |
| CN104749674A (en) * | 2013-12-30 | 2015-07-01 | 上海仪电显示材料有限公司 | Light filter manufacturing method and exposure mask plate |
| CN105404050A (en) * | 2016-01-04 | 2016-03-16 | 京东方科技集团股份有限公司 | Color film substrate and manufacture method and display device thereof |
| CN105511221A (en) * | 2016-01-05 | 2016-04-20 | 京东方科技集团股份有限公司 | Film layer, preparation method of film layer, substrate and display device |
| CN106444274A (en) * | 2016-09-05 | 2017-02-22 | 深圳市国华光电科技有限公司 | Mask plate, method for preparing lower substrate from mask plate, and application of method |
| CN108153033A (en) * | 2016-12-02 | 2018-06-12 | 上海仪电显示材料有限公司 | Optical filter and its manufacturing method, mask plate and liquid crystal display device |
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| CN104749674A (en) * | 2013-12-30 | 2015-07-01 | 上海仪电显示材料有限公司 | Light filter manufacturing method and exposure mask plate |
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| CN104714363A (en) * | 2015-03-26 | 2015-06-17 | 南京中电熊猫液晶显示科技有限公司 | Gray-scale mask plate and method for manufacturing liquid crystal display by employing gray-scale mask plate |
| CN105404050A (en) * | 2016-01-04 | 2016-03-16 | 京东方科技集团股份有限公司 | Color film substrate and manufacture method and display device thereof |
| CN105404050B (en) * | 2016-01-04 | 2018-04-20 | 京东方科技集团股份有限公司 | Color membrane substrates and preparation method thereof, display device |
| CN105511221A (en) * | 2016-01-05 | 2016-04-20 | 京东方科技集团股份有限公司 | Film layer, preparation method of film layer, substrate and display device |
| CN105511221B (en) * | 2016-01-05 | 2019-11-19 | 京东方科技集团股份有限公司 | Film layer and preparation method thereof, substrate, display device |
| CN106444274A (en) * | 2016-09-05 | 2017-02-22 | 深圳市国华光电科技有限公司 | Mask plate, method for preparing lower substrate from mask plate, and application of method |
| CN108153033A (en) * | 2016-12-02 | 2018-06-12 | 上海仪电显示材料有限公司 | Optical filter and its manufacturing method, mask plate and liquid crystal display device |
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Application publication date: 20121219 |