CN102804406A - Roll-to-roll deposition apparatus with improved web transport system - Google Patents
Roll-to-roll deposition apparatus with improved web transport system Download PDFInfo
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- CN102804406A CN102804406A CN2010800246849A CN201080024684A CN102804406A CN 102804406 A CN102804406 A CN 102804406A CN 2010800246849 A CN2010800246849 A CN 2010800246849A CN 201080024684 A CN201080024684 A CN 201080024684A CN 102804406 A CN102804406 A CN 102804406A
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- width
- cloth material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H23/00—Registering, tensioning, smoothing or guiding webs
- B65H23/04—Registering, tensioning, smoothing or guiding webs longitudinally
- B65H23/16—Registering, tensioning, smoothing or guiding webs longitudinally by weighted or spring-pressed movable bars or rollers
Abstract
A system for the continuous deposition of a semiconductor material onto one or more webs of substrate material which are advanced therethrough includes a web transport system having a plurality of web support assemblies. Each web support assembly includes a base having a primary support arm pivotally mounted thereto so as to be displaceable from a first position to a second position. The support includes a first biasing member in mechanical communication with the primary support arm. The first biasing member operates to impart a first biasing force to the primary support arm so as to move it from its first position to its second position. The support includes a dancer arm which is pivotally mounted to the primary support arm so as to be displaceable from a first position to a second position relative to the primary support arm. The system further includes a second biasing member in mechanical communication with the dancer arm. The second biasing member operates to impart a second biasing force to the dancer arm so as to move it from its first position to its second position. A roller is rotatably supported on the dancer arm. The roller is configured to engage a portion of the web. The web support assembly operates to maintain continuous contact between the roller and the moving web of substrate material as it passes through the deposition system.
Description
The cross reference of related application
The application requires the rights and interests of the U.S. Patent Application Serial Number 12/418,066 of submission on April 3rd, 2009, and its full content is included in this for your guidance.
Technical field
The present invention relates generally to the volume to volume equipment of semi-conducting material successive sedimentation on the moving web of backing material.More particularly, the present invention relates to comprise the volume to volume system of following assembly, said assembly is used for elongated web along with the vertical layout of backing material from wherein passing and an end portion of this width of cloth material of support and guidance.Especially, the present invention relates to a kind of system that is used for producing continuously electrooptical device.
Background technology
Some system and methods have been developed for a large amount of manufacturings of semiconductor structure such as electrooptical device.In such technology; From emitting bin (payout chamber) through one or more backing material width of cloth material of a plurality of deposition station continuous feeds; Wherein this backing material is generally stainless steel or composite material, and semiconductor material layer is deposited on the width of cloth material in succession in deposition station.Then, the width of cloth material that is coated is wrapped on the reel that extracts in the bin and is removed to be used to get into the subsequent handling of optical-electric module.In the concrete system of the type, along with backing material width of cloth material passes depositing device, it remains on vertical direction.For example at United States Patent (USP) 4,423,701 with some systems of the type shown in the U.S. Patent No. application 2004/0040506, its full content is included in this for your guidance.
In the depositing system of the type, width of cloth material transmission (web transport) and guiding are key parameter.In order to ensure the deposition of high-quality semiconductor layer, must between the active components of motion substrate width of cloth material and depositing system, keep precision tolerance.Equally, motion width of cloth material must be advanced through each bin along accurate path, so as to avoid endangering substrate width of cloth material integrality or harm depositing system be stained with sticking, distortion or other distortion.All these problems all due to the fact that and complicated; The depositing system that is the type all has at any time about 300 feet or the longer substrate width of cloth material length of active movement from start to finish usually, and typical backing material has the weight of approximate 1/4 pound of every linear foot.Phase counterweight and long relatively substrate can cause problem sagging and distortion, because gravity trends towards making substrate to become catenary configuration, and these problems can be enlarged owing to the differential thermal expansion of width of cloth material profile variation in the equipment and width of cloth material.
In the equipment of the type, the transmission system of substrate width of cloth material also must be designed to avoid with the active face that is deposited on substrate width of cloth material on semi-conducting material contact because this contact can reduce the runnability of semiconductor device.And last, the substrate transport system also must be designed to avoid the bending of substrate width of cloth material, band burr or other distortion, because the backing material that such damage is coated prevention is wrapped on the even reel.This factor is very crucial, because any inhomogeneities on the reel can both be at the responsive semiconductor layer of subsequent handling damage during.In a kind of art methods, like disclosed method in the U.S. Patent application that is disclosed 2006/0278163, substrate support system comprises magnetic directing assembly and many back-up rollers, thereby vertically-oriented width of cloth material is transmitted through depositing system.
' edge of the cylinder guided-moving width of cloth material of system is the edge guiding of this motion width of cloth material also in 163 in patent application.Yet, in service in the system of the type, found and can have problems because of irregular in the width of cloth material material self, wherein said irregular be because the distortion that profile variation in the manufacturing of width of cloth material and/or differential thermal expansion cause causes.Because such variation, the amount of the power that motion substrate width of cloth material applies on any one cylinder can change along with this width of cloth material moves through it.Too much power can make the edge deformation of width of cloth material between cylinder and the width of cloth material, thereby produces burr, wrinkling or crooked.Power between cylinder and the width of cloth material reduces also can become problem; If it is especially especially true under width of cloth material moves the situation of leaving cylinder; Because under the high vacuum that in the deposition bin, meets with, the relatively-high temperature condition; The cold welding of substrate and cylinder can take place when contacting again, causes the damage to width of cloth material and/cylinder.Therefore need a kind of width of cloth material support system, it can reliability service, and accurately mobile phase counterweight and long backing material width of cloth material through being used for the multistage high vacuum depositing system type that electrooptical device and other semiconductor devices are made.Any such system all should be relatively simple and reliable, and should be compatible with high vacuum, utmost point clean conditions, and should be with the pollutant drawing-in system.
Be described below, the present invention is provided for preparing continuously the hicap of photoelectricity and other semiconductor devices, and this system comprises improved width of cloth material transmission assembly.To make these and other aspect of the present invention and advantage obvious through following accompanying drawing, discussion and explanation.
Summary of the invention
The present invention comprises the system of a kind of continuous volume to volume deposited semiconductor material such as photoelectric material.Native system comprises width of cloth material Transmission Part, and it moves backing material width of cloth material and therefrom passes through.Width of cloth material Transmission Part comprises the improvement width of cloth material supporting component that supports and guide this width of cloth material.Width of cloth material supporting component comprises substrate, master arm and first biasing member, and wherein master arm pivots and is mounted to substrate so that can be displaced to the second place from primary importance with respect to substrate, and first biasing member is communicated with master arm machinery.Thereby can operate first biasing member and apply first biasing force, so that it is moved to its second place from its primary importance to first support arm.Width of cloth material supporting component further comprises swing arm, and it is pivoted on the master arm, so that can be displaced to the second place from primary importance with respect to master arm.Second biasing member is communicated with swing arm machinery.Can operate second biasing member, thereby apply second biasing force, so that it is moved to its second place from its primary importance to swing arm.Width of cloth material supporting component further comprises width of cloth material back-up roller, and it is by the swing arm rotational support.Thereby this cylinder is through the part of configuration engagement width of cloth material.Under special circumstances, first biasing force is bigger than second biasing force.Under particular case, biasing member can be spring, elastomer, pneumatic cylinder, magnetic devices, hydraulic cylinder and various combination thereof.
Under special circumstances, the spring of first biasing member between master arm and substrate, extending.In some cases, second biasing member can be the spring that between swing arm and master arm, extends.
Under special circumstances, width of cloth material back-up roller comprises groove, thereby it is through configuration engagement width of cloth material, and this groove can be asymmetric groove under special circumstances.In some cases, configurable this asymmetric groove is so that two faces of groove form an angle of 90 degrees.Under special circumstances, dispose this groove, so that the end surface of substrate does not contact the substrate of groove.
Description of drawings
Fig. 1 illustrates the end view of width of cloth material supporting component of the present invention;
Fig. 2 illustrates the perspective view of the width of cloth material supporting component among Fig. 1, and it illustrates the backing material width of cloth material with its engagement;
Fig. 3 illustrates the master arm of the width of cloth material supporting component among Fig. 1 and the perspective view of swing arm;
The width of cloth material supporting component that Fig. 4 illustrates Fig. 1 is in the figure of lower position, has applied high substrate load on it;
The width of cloth material supporting component that Fig. 5 illustrates Fig. 1 is in the figure of top position, wherein on substrate, applies low-level contact force; And
Fig. 6 illustrates the cross-sectional view of a part that the present invention meshes the cylinder of backing material width of cloth material.
Embodiment
The present invention comprises a kind of volume to volume depositing device, and it comprises improved width of cloth material transmission system, and the latter comprises many width of cloth material supporting components, and said width of cloth material supporting component capable of using supports and guides backing material to pass through treatment system.In this regard, the present invention will be useful in a large amount of such systems, and wherein the transmission of web of material is the one side of treatment system.To describe the present invention about concrete application, thereby wherein use the present invention in such system, to guide and support substrates width of cloth material, this system is used at a large amount of deposition of continuous volume to volume technology photoelectric semiconductor material.
No matter width of cloth material supporting component of the present invention is configured to the substrate width and/or how fluctuate the position, all keeps the part of width of cloth material strutting piece to contact with the continuous edge of substrate.In addition, width of cloth material supporting component is configured to minimize excessive force between the strutting piece of edge and contact of substrate width of cloth material.In exemplary embodiments, width of cloth material supporting component comprises multiple bias voltage layout, and it is configured to substrate width of cloth material is biased between the primary importance and the second place.In exemplary embodiments, multiple bias voltage arranges and comprises the biasing force transition region that it has discontinuous contact force at width of cloth material/strutting piece contact position.In exemplary embodiments, it is zero deflection basically that a part of width of cloth material that contacts with width of cloth material strutting piece has in the biasing force transition region.In exemplary embodiments, compare with the biasing force that on width of cloth material, applies along second direction, width of cloth material supporting component along first direction with this width of cloth material of bigger biasing force bias voltage.
The system of embodiment of the present invention in many examples.A specific embodiments of using in the equipment of electrooptical device will be particularly suitable for making this illustrate.In some embodiments, will utilize more than first width of cloth material supporting component, thus first edge of support/guiding substrate width of cloth material, thus and use second edge of one or more width of cloth material supporting component support/guiding substrate width of cloth material.In certain embodiments, it is different with other width of cloth material supporting components along first and/or second edge of width of cloth material that the part of a plurality of width of cloth material supporting components will be configured to, for example aspect structure construction, load/temperature performance, material or the like aspect.But However, it should be understood that also other embodiment of embodiment of the present invention, and similarly, system of the present invention and equipment can be comprised in the system that is used for making various materials.Should further understand the application's accompanying drawing not drawn on scale; But draw accompanying drawing by the mode that the most clearly is illustrated in the principle of the present disclosure of this discussion.
With reference now to Fig. 1 and Fig. 2,, it illustrates width of cloth material supporting component 10, and it is configured according to embodiments of the invention.Width of cloth material supporting component 10 comprises base part 12, and it act as the remainder of supporting component and further act as and allows assembly to be mounted to other structures.Substrate 12, and other parts of width of cloth material supporting component can be by bearing its load that applies and can not making the material of system process degradation make.For example, the material release of not expecting width of cloth material supporting component can be made gas or other pollutants of integrality degradation of semiconductor deposition process.In certain embodiments, assembly material comprises aluminium, mild steel or high strength steel, stainless steel, highstrenghtpiston and combination thereof.In the present embodiment, only if at this explanation is arranged in addition, most of component parts is all made of aluminum.Master arm 14 pivots through trochoid 16 and is mounted to substrate 12, and wherein trochoid 16 allows master arm 14 to move to the second place from primary importance with respect to substrate.
Width of cloth material supporting component also comprises biasing member, in this case for being installed in the helical spring 18 between substrate 12 and the master arm 14.Thereby helical spring 18 operations apply the biasing force of attempting master arm is moved to from primary importance the second place.In many examples, spring 18 will be by the preload scheduled volume, and the master arm that impels for example as shown in Figure 1 makes progress (for example, the second place), thereby is fit to the structure (for example, geometrical construction and weight) of width of cloth material and the width of cloth material kinematic parameter in the treatment system.Though the bias voltage embodiment among Fig. 1 is accomplished by helical spring 18, also can use other biasing member, for example elastomeric material such as artificial or natural rubber, thus biasing force is provided.Also can use at other bias mechanisms known in the art as biasing member, for example inner gas pressure cylinder, hydraulic cylinder, counterweight, magnetic devices (comprising calutron) or the like.Equally,, should understand, can it be arranged in other positions though the spring 18 that illustrates is in the particular location between substrate 12 and the support arm 14.For example, can realize bias voltage through the helical spring of related pivot 16.Replacedly, biasing member need not produce any mechanical connection with substrate.For example, can be through at master arm 14 and place the spring or the elastomer that extend between some other parts of equipment of native system and realize bias voltage.
The width of cloth material supporting component 10 of Fig. 1-3 further comprises swing arm 20, and it on master arm 14, is supported through trochoid 22 by pivotal support in this case.Between swing arm 20 and master arm 14, arrange second helical spring 24, thereby and its operation swing arm 20 is biased between first and second positions with respect to master arm 14.As above said about first spring 18, second spring 24 can otherwise be arranged; Perhaps, it can comprise the biasing member of other types, like elastomer, pneumatic cylinder, hydraulic cylinder, counterweight, magnetic devices or the like.What connect swing arm 20 (at 28 places, hole shown in Figure 3) rotationally is back-up roller 26, thus the edge of its operation engagement backing material width of cloth material, and likewise, it can be configured to help its maintenance for width of cloth material by fluting or other modes.In this embodiment, back-up roller is mainly processed by nonmagnetic substance, 304 stainless steels.In alternative embodiment, back-up roller can comprise the ceramic material of contact width of cloth material.
With reference now to Fig. 2,, it illustrates the perspective view of the width of cloth material supporting component 10 among Fig. 1, the part of its engagement backing material 30 width of cloth materials.Should be understood that in typical application backing material 30 comprises elongated material width of cloth material; Yet, for the purpose of simplifying, only in the part of the material of the width of cloth shown in Fig. 2.In addition, the embodiment of the width of cloth material supporting component shown in the allocation plan 2, so that can independently guide/support two width of cloth materials, wherein each cylinder all supports/guides a width of cloth material and is independent of the interaction of another width of cloth material-cylinder and on cylinder, moves.For purpose clearly, only in Fig. 2, a width of cloth material is shown with empty outline line.Should understand; Though only the side of Fig. 2 (width of cloth material strutting piece) has Reference numeral and same side shown in other accompanying drawings, also is applied to other width of cloth material strutting pieces of no Reference numeral among Fig. 2 about the part of representing with Reference numeral principle described here.
In Fig. 2, back-up roller 26 has meshed the edge of the substrate 30 of vertical layout, and can see, the maintenance that the groove 27 in the cylinder promotes substrate 30.With reference to figure 4, the weight that substrate 30 applies on cylinder 26 has compressed second helical spring between swing arm 20 and the master arm 14 (in like Fig. 1 24).This is because in this embodiment, the biasing force of second spring is selected to littler than the biasing force of first spring 18, and is enough to overcome the weight of swing arm and cylinder.In the structure of Fig. 2, first spring 18 supports principal arm 14, swing arm 20 and cylinder 26 power that applies with opposing substrate 30 downwards.If this power increases because of the distortion of substrate width of cloth material or other situation, then spring 18 will absorb further downward power, and preventing the damage to width of cloth material, and maintenance contacts with the good of width of cloth material simultaneously.In non-limitative example, can cause the distortion of substrate width of cloth material by width of cloth material profile variation, heat and dynamic load or the like.For example, if the part at the lower surface/edge of the substrate width of cloth material that is supported by cylinder is placed in below the current line (pass line) of theory of width of cloth material, then width of cloth material will attempt on cylinder, to apply contact force, thereby towards position traveling roller shown in Figure 4.Here; Theoretical current line is the line of travel at the lower surface/edge of width of cloth material under following situation; If promptly it is straight fully, the perhaps current line of the width of cloth material lower surface situation of not twisting from this line because of part/width of cloth material profile variation, heat and dynamic load, kinematic parameter or the like.In this embodiment, dispose first spring, so that be no more than the predetermined contact force of threshold value between cylinder and the width of cloth material.The threshold value contact force can be determined based on distortion, width of cloth material/cylinder deflection, material yield or the like.In this embodiment, the threshold value contact force is based on such predetermined force, promptly is placed in current line when following when width of cloth material, and this predetermined force will not make width of cloth material distortion (for example recessed, fold or the like) surpass the amount of being scheduled to.
In this, Fig. 4 is illustrated in the end view of the assembly 10 of biased downward position.Under the situation that the downward power of width of cloth material reduces, spring 18 is the swing arm 20 and the cylinder 26 of bias voltage master arm 14, association towards the neutral position backward.Under following situation; The downward power of width of cloth material still reduces, if promptly moving web is so that rise from cylinder, for example under the situation when the lower surface of width of cloth material moves on the theoretical current line; Like Fig. 2, Fig. 3, shown in Figure 5, then spring 18 will order about master arm 14 and reach its range; And at that point, thereby second spring 24 will move and rise swing arm 20, so that further lifting back-up roller 26, and therefore keep the EDGE CONTACT with width of cloth material.As stated, the biasing force of second spring 24 is usually less than the biasing force of first spring 18.Therefore, the pressure that is applied on the width of cloth material of cylinder will be less than at the complete downwards pressure of contact position; But this pressure will be enough to both are kept in touch, and prevent that the width of cloth material from leaving cylinder.Be described below, can select the biasing force of spring based on the specification of treatment system and substrate width of cloth material.In this embodiment, thus first and second springs through configuration when cylinder is in the power transition region between the cylinder position of Fig. 4 and Fig. 5, the conversion of discontinuous contact force is provided between cylinder and width of cloth material.In this transition region, have such position, the vertical displacement of its intermediate roll is zero basically, and the power between width of cloth material and the cylinder depend on width of cloth material whether on current line or under direction move and increase or reduce.In the above-described embodiments, can width of cloth material strutting piece be regarded as bias voltage substrate width of cloth material between following two positions, promptly be similar to the position under the current line of theory shown in Figure 4 and be similar to another position that is higher than current line shown in Figure 5.
Can diversely dispose be used to contact and support/guide the cylinder of width of cloth material.In this embodiment, cylinder comprises groove or some other characteristics that are used to keep substrate and cylinder engagement.With reference now to Fig. 6,, the part of cylinder 26 of the present invention shown in it, the backing material width of cloth material 30 with mesh groove 27 as shown in Figure 2 in it.In the embodiment of Fig. 6, groove is asymmetric groove.In other words, two of groove masks have the different contact angles with substrate 30.Groove has first 32, and it is with first or the edge on surface of first jiao of A contact substrate 30, and first jiao of A spends to 45 degree scopes 5 in certain embodiments.Groove comprises second 34, and it is spent to 45 degree scopes 5 with 30, the second jiaos of B of second jiao of B contact substrate in certain embodiments.Under concrete condition, angle B is bigger than angle A.In addition, in an embodiment, angle A and angle B be complementary angle each other; In other words, both additions and be 90 the degree.Under concrete condition, configuration-system is so that being deposited on the face that limits angle A in the substrate 30 of semi-conducting material takes place.Can implement other angular dependence and orientation.In Fig. 6, can predict, the face of substrate width of cloth material 30 or end surface do not contact the substrate of groove yet.Set up the contact between cylinder 26 and the width of cloth material 30 through the face 32,34 of cylinder and the edge or the mounting board between the corner of width of cloth material.Find that such contact provides good width of cloth material support/guiding, and further prevents the face of substrate or the damage of end surface.
With semiconductor material deposition in the system of motion substrate width of cloth material, wherein semiconductor deposition occurs on the width of cloth face near rolling drum surface 32, finds to utilize the geometrical construction relation of Fig. 6 to have very good result.In this, be effective in very much substrate 30 maintenances with during deposition station accurately aligns and avoid damage simultaneously according to the cylinder of Fig. 5 configuration substrate.
Through preceding text, those skilled in the art can dispose various supporting components easily.The accurate dimension of assembly and characteristic will depend on concrete application.As stated, a large amount of continuous processing apparatus of the typical case of deposited semiconductor material can use such stainless steel lining bottom material, and it has the weight of about 1/4 pound/linear foot.In the system an of the type, with coiling of about 8000 feet length backing material is provided, and in any one preset time, about 279 feet substrate width of cloth materials were initiatively transported depositing system.And as further said, this system can comprise that it therefrom moves through with substantially parallel relation up to 6 width of cloth materials.In this structure, each width of cloth material all has 60 strutting pieces related with it.Therefore, each cylinder will on average support about 1.16 pounds.In the system of the type, main spring (in the preceding text 18) will be pre-loaded to about 2.5 to 3.5 pounds level usually, and will select swing spring (in the preceding text 24) so that 0.75 to 1 pound load is depressed into it as shown in Figure 4 fully to upper/lower positions.Under the situation of using heteroid system and/or substrate width of cloth material, can corresponding adjustment spring or the biasing force of other biasing members.
Arrange vertically that about width of cloth material supporting component support of the present invention and guiding the usage of the bottom margin of substrate is described it.Yet the assembly of the type also can be configured to mesh the top of vertical layout substrate.In this case, can corresponding adjustment biasing force.Equally, also with being used in combination of steel substrate it is described about supporting component.Should be understood that can be such assembly can be used to support the substrate width of cloth material of other types, comprise polymer substrate, compound substrate, fibrous substrate or the like.
Because in the instruction of this proposition, those skilled in the art should understand other changes of the present invention, variation and embodiment.All such embodiment within the scope of the invention.Accompanying drawing, discussion and explanation are merely the illustration specific embodiment of the invention, and are not intended to limit implementing.Accompanying claims comprises all equivalents that define scope of the present invention.
Claims (24)
1. the volume to volume system of a successive sedimentation semi-conducting material on backing material width of cloth material; Wherein said backing material width of cloth material advances through it continuously when the operation of said equipment; Wherein said system comprises a plurality of width of cloth material supporting components; Said width of cloth material supporting component is along with said width of cloth material passes said system and meshes and guide said width of cloth material, and each width of cloth material supporting component all comprises:
Substrate;
Master arm, it is pivoted in the said substrate so that can move to the second place from primary importance with respect to said master arm;
First biasing member, the said master arm of its mechanical connection, said first biasing member can be operated to apply first biasing force to said master arm, so that said master arm is moved to its second place from its primary importance;
Swing arm, it is pivoted on the said master arm, so that can move to the second place from primary importance with respect to said master arm;
Second biasing member, the said swing arm of its mechanical connection, said second biasing member can be operated to apply second biasing force to said swing arm, so that said swing arm is moved to its second place from its primary importance; And
Width of cloth material back-up roller, it is supported by said swing arm rotationally, thus said cylinder meshes the part of said width of cloth material through configuration.
2. system according to claim 1, in said width of cloth material supporting component, said first biasing force is bigger than said second biasing force.
3. system according to claim 1, wherein in said width of cloth material supporting component, said first biasing member and said second biasing member are selected from the group of forming with lower device: spring, elastomer, pneumatic cylinder, hydraulic cylinder, magnetic and combination thereof.
4. system according to claim 1, wherein in said width of cloth material supporting component, said first biasing member is the spring that between said master arm and said substrate, extends.
5. system according to claim 1, wherein in said width of cloth material supporting component, said second biasing member is the spring that between said swing arm and said master arm, extends.
6. system according to claim 1, wherein in said width of cloth material supporting component, said width of cloth material back-up roller comprises groove, thus it meshes the edge of said width of cloth material through configuration.
7. system according to claim 6, wherein said groove is asymmetric groove.
8. system according to claim 6, wherein said groove comprises first and second, and wherein said first and said second forms an angle of 90 degrees.
9. system according to claim 6; Wherein said groove is configured to make said groove to comprise first and second; And wherein said each face is set up mounting board with said substrate and is contacted, so that the end surface of said substrate does not contact the bottom of said groove.
10. system according to claim 6; Wherein said cylinder is configured to make when said backing material width of cloth material is placed within the said groove; First of said groove with said width of cloth material first forms first jiao of A; And second of said groove with said width of cloth material second forms second jiao of B, and wherein angle A is different with angle B.
11. system according to claim 10, wherein angle A and angle B are surplus mutually.
12. system according to claim 1, wherein said substrate width of cloth material vertically advances through said system continuously, and in wherein said a plurality of substrate supports assembly at least some mesh the lower edge of said width of cloth material.
13. system according to claim 12, at least one in wherein said a plurality of substrate supports assemblies meshes the top edge of said width of cloth material.
14. comparing with other width of cloth material supporting components, system according to claim 12, at least one in wherein said a plurality of substrate supports assemblies have different structures.
15. system according to claim 1, wherein when the operation of said system, a plurality of backing material width of cloth materials advance through it continuously, and wherein said width of cloth material supporting component is along with said a plurality of width of cloth materials pass said system and mesh and guide said width of cloth material.
16. system according to claim 15, wherein said system comprise first width of cloth material supporting component and second width of cloth material supporting component, it is through disposing so that first width of cloth material in a plurality of width of cloth material and second width of cloth material have isolated substantially parallel relation.
17. system according to claim 16, the width of cloth material back-up roller of wherein said first width of cloth material supporting component is configured to be independent of the reciprocation of said second width of cloth material and cylinder and support/guide said first width of cloth material about said second width of cloth material supporting component.
18. system according to claim 17, wherein said first and second width of cloth material supporting components are attached to public substrate.
19. system according to claim 1, wherein said system can operate on said backing material width of cloth material, to deposit photoelectric semiconductor material.
20. the volume to volume system of a successive sedimentation semi-conducting material on backing material width of cloth material; Wherein when said equipment operation; Through it forward, wherein said system comprises a plurality of width of cloth material supporting components to said backing material width of cloth material continuously, and said width of cloth material supporting component is along with said width of cloth material passes said system and meshes and guide said width of cloth material; Each width of cloth material supporting component all comprises multiple bias voltage and arranges; Said multiple bias voltage is arranged and is configured to the surface of first biasing force along the said width of cloth material of first direction bias voltage, and with second biasing force this surface along the said width of cloth material of second direction bias voltage, said second direction is basic opposite with said first direction.
21. width of cloth material supporting component according to claim 16; Wherein said multiple bias voltage arranges and is configured between the width of cloth material primary importance and the width of cloth material second place, to have the biasing force transition region that it is zero deflection basically that wherein said width of cloth material has in said biasing force transition region.
22. width of cloth material supporting component according to claim 16, wherein said multiple bias voltage are arranged along said first direction, to compare the said surface of the bigger said width of cloth material of power bias voltage with the biasing force that on said width of cloth material, applies along said second direction.
23. width of cloth material supporting component according to claim 18; It further comprises cylinder; Wherein said first biasing force of the said first direction in edge is with reaction to the said cylinder that moves of width of cloth material; And along with said width of cloth material leaves said cylinder, said second biasing force of the said second direction in edge is used to keep the contact between said cylinder and the said width of cloth material.
24. width of cloth material supporting component according to claim 16, wherein said bias voltage are arranged and are comprised helical spring.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/418,066 US20100252606A1 (en) | 2009-04-03 | 2009-04-03 | Roll-to-roll deposition apparatus with improved web transport system |
| US12/418,066 | 2009-04-03 | ||
| PCT/US2010/029661 WO2010115023A2 (en) | 2009-04-03 | 2010-04-01 | Roll-to-roll deposition apparatus with improved web transport system |
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| Publication Number | Publication Date |
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| CN102804406A true CN102804406A (en) | 2012-11-28 |
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| CN2010800246849A Pending CN102804406A (en) | 2009-04-03 | 2010-04-01 | Roll-to-roll deposition apparatus with improved web transport system |
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| US (1) | US20100252606A1 (en) |
| CN (1) | CN102804406A (en) |
| WO (1) | WO2010115023A2 (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103436852A (en) * | 2013-08-22 | 2013-12-11 | 胡增鑫 | Flexible substrate foil roll-to-roll conveyer and conveying method |
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| US9592637B2 (en) * | 2015-05-19 | 2017-03-14 | Xerox Corporation | Direct marking build cart that is robust to rail contamination by under-rail mounting and compliant top wheel |
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- 2010-04-01 CN CN2010800246849A patent/CN102804406A/en active Pending
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| US3238920A (en) * | 1962-06-29 | 1966-03-08 | Dick Co Ab | Facsimile printing machine |
| US5364481A (en) * | 1992-07-24 | 1994-11-15 | Fuji Electric Co., Ltd. | Apparatus for manufacturing a thin-film photovoltaic conversion device |
| CN101351572A (en) * | 2005-12-28 | 2009-01-21 | 3M创新有限公司 | Rotatable aperture mask assembly and deposition system |
| CN101281938A (en) * | 2008-05-28 | 2008-10-08 | 安泰科技股份有限公司 | Method and apparatus for montage and assemble of thin film solar battery component as well as product thereof |
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| CN103436852A (en) * | 2013-08-22 | 2013-12-11 | 胡增鑫 | Flexible substrate foil roll-to-roll conveyer and conveying method |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2010115023A3 (en) | 2011-01-13 |
| WO2010115023A2 (en) | 2010-10-07 |
| US20100252606A1 (en) | 2010-10-07 |
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Application publication date: 20121128 |