CN102768926B - Gas discharge electrode structure - Google Patents
Gas discharge electrode structure Download PDFInfo
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- CN102768926B CN102768926B CN201110319546.XA CN201110319546A CN102768926B CN 102768926 B CN102768926 B CN 102768926B CN 201110319546 A CN201110319546 A CN 201110319546A CN 102768926 B CN102768926 B CN 102768926B
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Abstract
The invention discloses a gas discharge electrode structure. The shape of an electrode downstream side is correspondingly adjusted and changed according to the outgoing direction of the electrode downstream side, so that the electrode upstream side and the electrode downstream side are in an asymmetric shape. According to the gas discharge electrode structure, the distribution of an aerodynamic flow field close to an electrode in a chamber is effectively improved, the discharge heat accumulation close to the electrode is reduced, the service life of the electrode is prolonged, so that the stability of system high-voltage discharge is improved; and electrode structure for gas discharge is simple in structure, and convenient to process and install.
Description
Technical field
The invention belongs to high-pressure discharge technology and gas laser application, relate to a kind of gas discharge electrode structure supporting effectively electric discharge particularly.
Background technology
High-pressure discharge process is mainly based on the electrode discharge under aerodynamics condition, and discharge gas flows through electrode zone through the circulatory system, and sparking electrode brings out plasma state under the condition of high pressure activation, thus finally realizes stable electric discharge and energy emission process.Be directed to high-pressure discharge process at present, in the middle part of electrode, main discharge region has cutting-edge structure, and the electric discharge be beneficial under condition of high voltage produces, and electrode shape structure and electrode main discharge region both sides are symmetric design.
As shown in Figure 1, be known high-pressure discharge cavity discharging electrode structure and flow field, region situation.Electrion form is hot cathode and hot anode two type, illustrates below for hot cathode.
Top triangle in Fig. 1 is illustrated as cathodic discharge electrode, bottom triangle is illustrated as anode discharge electrode, gas flows from left to right (by Fig. 1 direction of arrow), gas enters region of discharge through flow-guiding channel, then experience electrion and flow out region of discharge, then move in circles under circulatory system support.Sparking electrode be symmetrical structure design, tip is main discharge region, along gas flow through the direction of electrode and front and back, air-flow is divided into air-flow upstream and airflow downstream, equally by the both sides of electrode also referred to as electrode upstream side and electrode downstream.
Because discharge gas in gas laser maintains one-way circulation flowing, our experiments show that, the discharge cavity structure of the flowing of discharge gas one-way circulation and symmetrical structure, air-flow can be caused under electrion condition to form the Flow Field Distribution do not matched with electrode downstream shape under pressure, the a large amount of heat energy produced due to electrion are swum under a gas flow to be formed between side and electrode downstream to accumulate, near electrode (mainly hot cathode or hot anode) airflow downstream, too much heat accumulation can cause the discharge instability of electrode and the reduction in life-span, thus the consumption of accelerating electrode, reduce useful life.Will inevitably impact for gas flowfield distribution, electric discharge heat energy distribution and the electric discharge reliability of quality and lifetime of system problem in electrion process like this, make gas high pressure discharge energy radiation efficiency relatively low, affect even more serious when working under high repetition frequency condition.Due in electrion process, under hot cathode condition the temperature rise of cathode zone and energy changing the most violent, illustrate so only marked thermal accumlation situation in upper cathodic downstream and airflow downstream side in Fig. 1, associated gas flow field and thermal accumlation situation have also been obtained checking in an experiment.
Therefore, for the high-pressure discharge process of gas laser, the optimal design of electrode structure is for gas discharge, reliable and stable running and long-lived operation are extremely important effectively.
Summary of the invention
The object of the invention is to propose a kind of gas discharge electrode structure supporting effectively electric discharge, to improve the defect existed in known technology.
For achieving the above object, the present invention proposes a kind of technical scheme of asymmetric electrode, according to direction and the cavity flow field layout of gas circulating flow, the electrode shape of corresponding change air-flow upstream and airflow downstream, namely according to the shape in airflow downstream sidewind exit direction adjustment electrode downstream, make electrode upstream and downstream side be asymmetrical shape, effectively guide flow field, reduce local thermal energy buildup, promote the adaptability of unidirectional flow field for cavity symmetrical structure to greatest extent.
Compared with known technology, the present invention not only effectively improves aerodynamics distribution near intracavity electrode, decreases ate electrode electric discharge thermal accumlation, intensifier electrode useful life, thus the stability improving system high pressure electric discharge, structure is simple simultaneously, be convenient to processing, easy for installation.
Accompanying drawing explanation
Fig. 1 is known technology mesohigh gas discharge electrode structure and flow pattern schematic diagram.
Fig. 2 is high-pressure discharge electrode structure proposed by the invention and flow pattern schematic diagram.
Embodiment
The electrode shape that discharges under the present invention is directed to the high-pressure discharge cavity configuration of gas laser application proposes a kind of technical scheme of asymmetric electrode, based on cavity flow field layout, unsymmetric structure electrode design is utilized to solve a large amount of accumulation problem of the amount of localized heat of current symmetry electrode under unidirectional flow field and electrion condition, effective flow field of improving is moved towards, and improves effective electric discharge and the useful life of electrode.
Electrode structure shape of the present invention as shown in Figure 2, under the prerequisite ensureing stable good electric discharge, according to the changes in distribution characteristic in flow field near sparking electrode, the shape in electrode downstream is changed according to the corresponding adjustment of airflow downstream sidewind exit direction, electrode upstream side and downstream is made to be asymmetrical shape, eliminate the heat accumulation between negative electrode downstream and airflow downstream side, thus the effective useful life promoting discharge stability and electrode.
Asymmetric electrode of the present invention changes the shape of electrode structure airflow downstream accordingly, and make the flowing of gas more smooth and easy, amount of localized heat is gathered situation and improved.Thus provide support for effective gas discharge.
Claims (1)
1. a gas discharge electrode structure, is characterized in that, changes the shape in electrode downstream, make electrode upstream side and downstream be asymmetrical shape, to eliminate the heat accumulation between negative electrode downstream and airflow downstream side according to airflow downstream sidewind exit direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110319546.XA CN102768926B (en) | 2011-10-20 | 2011-10-20 | Gas discharge electrode structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110319546.XA CN102768926B (en) | 2011-10-20 | 2011-10-20 | Gas discharge electrode structure |
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| Publication Number | Publication Date |
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| CN102768926A CN102768926A (en) | 2012-11-07 |
| CN102768926B true CN102768926B (en) | 2015-07-22 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201110319546.XA Active CN102768926B (en) | 2011-10-20 | 2011-10-20 | Gas discharge electrode structure |
Country Status (1)
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| CN (1) | CN102768926B (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1295729A (en) * | 1998-03-04 | 2001-05-16 | 西默股份有限公司 | Reliable, Modular, production quality narrow-band KrF excimer laser |
| CN1780073A (en) * | 2004-11-18 | 2006-05-31 | 中国科学院电子学研究所 | Preionizing device for impusle gas laser |
| CN202307767U (en) * | 2011-10-20 | 2012-07-04 | 中国科学院光电研究院 | Asymmetric gas-discharge electrode structure |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6466602B1 (en) * | 2000-06-09 | 2002-10-15 | Cymer, Inc. | Gas discharge laser long life electrodes |
| US7230965B2 (en) * | 2001-02-01 | 2007-06-12 | Cymer, Inc. | Anodes for fluorine gas discharge lasers |
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2011
- 2011-10-20 CN CN201110319546.XA patent/CN102768926B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1295729A (en) * | 1998-03-04 | 2001-05-16 | 西默股份有限公司 | Reliable, Modular, production quality narrow-band KrF excimer laser |
| CN1780073A (en) * | 2004-11-18 | 2006-05-31 | 中国科学院电子学研究所 | Preionizing device for impusle gas laser |
| CN202307767U (en) * | 2011-10-20 | 2012-07-04 | 中国科学院光电研究院 | Asymmetric gas-discharge electrode structure |
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| CN102768926A (en) | 2012-11-07 |
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Effective date of registration: 20160914 Address after: 100176, Yizhuang economic and Technological Development Zone, Beijing, Daxing District Hai Industrial Park, No. 10 building Patentee after: Beijing science and Technology Co., Ltd. Address before: 100094 Haidian District, Deng Zhuang Road, No. 9, Beijing Patentee before: Inst of Photoelectrics, C.A.S |