CN102758189B - Vacuum film-forming method and the layered product obtained by this method - Google Patents
Vacuum film-forming method and the layered product obtained by this method Download PDFInfo
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- CN102758189B CN102758189B CN201210130235.3A CN201210130235A CN102758189B CN 102758189 B CN102758189 B CN 102758189B CN 201210130235 A CN201210130235 A CN 201210130235A CN 102758189 B CN102758189 B CN 102758189B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
- H01L21/67173—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers in-line arrangement
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Abstract
The present invention provides a kind of vacuum film-forming method and the layered product obtained by this method.By the film build method, it can further seek to improve operating efficiency in volume to volume technology or further seek to improve its technology, this method includes：Extract the stage of the first matrix out from the first roller room on from the first roller room towards the first direction of the second roller room；The stage being de-gassed to the first matrix；In stage of second film forming room by the second membrane material film forming on the first matrix；By the stage that the first matrix is generated in the second roller room the first matrix of winding；And then from the second roller room towards the first roller room second direction on carry out for produce the second matrix same action.Herein, when generation film forming has the first matrix of the second membrane material, the first cathode electrode of the first film forming room is removed from the first film forming room, and when generation film forming has the second matrix of the first membrane material, the second cathode electrode of the second film forming room is removed from the second film forming room.
Description
Technical field
The present invention relates to a kind of film build method, more particularly, to continuously carrying out vacuum film formation on the matrix of long size
Film build method and the layered product obtained by this method.
Background technology
As film build method, exploitation has the various methods such as vacuum vapour deposition, sputtering method, ion plating method.By these into
The layered product that film method is obtained is widely used in display device, semiconductor device such as liquid crystal display and organic el display
Deng in manufacture.Layered product can as these display devices and semiconductor device etc. protective film, optical light filter, antireflection
The various functions such as film films is used.
In recent years, LCD TV, mobile phone, electronic game machine etc. are quickly increased using the demand of the equipment of these functional films
It is long.With the growth of demand, the technological development of production functional film turns into the task of top priority in large quantities in a short time.In order to answer
To this demand, volume to volume technology is developed.Volume to volume technology makes the matrix for the long size being rolled into a roll convey between the rolls, from
And can continuous film forming, thus seek improve operating efficiency.
But, existing simple volume to volume technology also has limitation in yield.In addition, the layer required by functional film
Composition is sometimes different in response to the device difference with the functional film, and because of performance required by functional film etc. no
It is different together, therefore, expect that exploitation can easily and inexpensively produce the flexible of the layered product of many spline structures in a short time
Film build method.
Patent No. 4415584 (patent documents 1) discloses one of the film build method using volume to volume technology.In the film forming
In method, a going barrel is set between two rolls, one going barrel of carrying substrate can be carried out continuously using multiple targets
Film forming, so as to seek to improve operating efficiency.
In JP No. 2010-236076 (patent document 2) and Unexamined Patent 07-098854 (patent document 3), disclose
Using volume to volume technology can two-sided carry out film forming film build method.In order that two-sided film forming is possibly realized, so, make herein
With two going barrels and a winding up roller being configured between them, on the roller exported from outlet roller, by each other to opposite
Direction rotate in two going barrels and after carrying out film forming, be wound with take-up roll.
Patent document 1：Patent 4415584
Patent document 2：JP 2010-236076
Patent document 3：Unexamined Patent 07-098854
But, in the device for implementing these existing film build methods, target is fixed to separate regulation relative to going barrel
Distance, in order to which these targets supported by cathode electrode are safeguarded with, it is necessary to interrupt film forming operation, its result has operation effect
The problem of rate declines.
In addition, by patent document 2 and the film build method of patent document 3, film only is manufactured on two-sided or one side at most,
The layered product of many spline structures in addition can not be produced, therefore in order to manufacture various layered products, it is necessary to set every time
The different production line of meter, this causes cost to increase.
Moreover, in these existing film build methods, it is also possible to heat insufficient, its knot after film forming is carried out
Fruit there may be the problem of can not fully being crystallized by the membrane material of film forming.
The content of the invention
The present invention develops to solve these prior art problems, its object is to there is provided a kind of film build method,
In volume to volume technology, for example, in the case where removing the cathode electrode for needing to safeguard from film forming room, realizing the efficiency of film forming operation
Change, additionally, it is provided it is a kind of for example in the film forming inside double film forming and table can accordingly film forming simultaneously film build method, realize
The efficient activity of operation or improvement.
To achieve these goals, the present invention provides a kind of film build method, and vacuum is continuously carried out to the matrix of long size
Film forming, it is characterised in that including：A) on from the first roller room towards the first direction of the second roller room, taken out from the first roller room
Go out the stage of the first matrix of the long size being rolled into a roll；B) first matrix extracted out along the first direction is carried out
The stage of degassing；C) using the target supported by the second cathode electrode of the second film forming room, by the second membrane material film forming in degassing
Stage on first matrix；D) by winding first base that film forming has stated the second membrane material in the second roller room
Body and generate the stage that film forming has the first matrix of second membrane material；Also include：A ') from the second roller room towards institute
In the second direction for stating the first roller room, from the second roller room extract out be rolled into a roll long size it is different from first matrix
The second matrix stage；B ') to stage for being de-gassed along second matrix that the second direction is extracted out；C ') make
With by first film forming room the first cathode electrode support target, by the first membrane material film forming degassing second matrix
On stage；D ') generated into by having stated second matrix of the first membrane material in the first roller room winding film forming
Film has the stage of the second matrix of first membrane material；When generation film forming has the first matrix of second membrane material, from
First film forming room removes the first cathode electrode of first film forming room；Also, there is first membrane material in generation film forming
During the second matrix of material, the second cathode electrode of second film forming room is removed from second film forming room.According to this composition,
The upkeep operation of the target of membrane material is carried out in a film forming room in first and second film forming room, and in first and second film forming room
In another film forming room in can continue to carry out film forming operation, therefore, it is possible to improve production efficiency.
, can also be after being extracted out from the first roller room and by the second membrane material film forming in above-mentioned film build method
Before, plasma treatment is carried out to first matrix, alternatively, it is also possible to after being extracted out from the second roller room and by described in
Before first membrane material film forming, plasma treatment is carried out to second matrix.Thereby, it is possible to seek to strengthen plasma treatment.
Moreover, in above-mentioned film build method, can also be after being extracted out from the first roller room and in first film forming room
Before being de-gassed, first matrix is de-gassed, alternatively, it is also possible to after being extracted out from the second roller room and described
Before second film forming room is de-gassed, second matrix is de-gassed.Thereby, it is possible to seek to strengthen degassing process.
In addition, in above-mentioned film build method, can also be after by the first membrane material film forming and in the first roller room
Before being wound, second matrix is annealed, alternatively, it is also possible to after by the second membrane material film forming and in institute
State before the second roller room is wound, first matrix is annealed.Thus, it is possible to seek reinforcing to make annealing treatment.
It should be noted that first membrane material and second membrane material can also be nesa coatings.
In addition, in order to realize the purpose, the present invention provides a kind of film build method, including：A) from the first roller room direction
On the first direction of second roller room, the stage of the matrix for the long size being rolled into a roll is extracted out from the first roller room；B) to along
The stage that the described matrix that the first direction is extracted out is de-gassed；C) the second membrane material film forming is being deaerated in the second film forming room
Described matrix face on stage；D) rank that film forming has stated the described matrix of the second membrane material is wound in the second roller room
Section；E) in the second direction from the second roller room towards the first roller room, extracted out from the second roller room described the
The stage of the described matrix of two roller rooms winding；F) the first membrane material film forming is taken out along the second direction in the first film forming room
Stage on the face of the described matrix gone out；G) it is laminated with the first roller room on second membrane material described
The stage of the described matrix of first membrane material；The second membrane material film forming is extracted out along the first direction in the second film forming room
Described matrix the face on when, removed from first film forming room supporting first membrane material target it is described the first one-tenth
First cathode electrode of film room；Also, the first membrane material film forming is being extracted out along the second direction in the first film forming room
When on the face of described matrix, second film forming of the target of supporting second membrane material is removed from second film forming room
Second cathode electrode of room.According to this composition, the target of membrane material is carried out in a film forming room in first and second film forming room
Upkeep operation, and can continue to carry out film forming operation, therefore energy in another film forming room in first and second film forming room
Enough improve production efficiency.Moreover, according to this composition, leading in first that described matrix is conveyed from the first roller room to the second roller room
Can be by the second membrane material film forming, in the alternate path of return of described matrix is conveyed to the first roller room from the second roller room in road
Can be by the first membrane material film forming, therefore, can be with volume to volume by making matrix be come and gone between the first roller room and the second roller room
Mode is continuously manufactured by being laminated with the layered product of the second membrane material and the first membrane material in order.
In addition, in order to realize the purpose, the present invention provides a kind of film build method, including：A) from the first roller room direction
On the first direction of second roller room, the stage of the matrix for the long size being rolled into a roll is extracted out from the first roller room；B) to along
The stage that the described matrix that the first direction is extracted out is de-gassed；C-1) have in the first transport path：By the institute of degassing
State matrix to guide to the second film forming room in said first direction, in the second film forming room by the second membrane material film forming along described
First direction be directed in described matrix the first face on, the second roller room winding film forming stated the second membrane material
Described matrix, in the second direction from the second roller room towards the first roller room, is extracted out in institute from the second roller room
State the second roller room winding described matrix, the first film forming room by the first membrane material film forming on the second membrane material, second film
Material filming is on first face for the described matrix extracted out along the second direction, in the first roller room wound on institute
State the stage for the described matrix that first membrane material is laminated with the second membrane material；Or, c-2) in the second transport path
Have：The described matrix of degassing is guided to first film forming room in said first direction, will in first film forming room
Film forming is had described by tertiary membrane material filming on first face of the described matrix in being directed along the first direction
The described matrix of tertiary membrane material is guided to second film forming room in this second direction, in second film forming room by the
Second face of the side opposite with first face of described matrix of the four membrane material film forming in being directed along the second direction
On, there is the tertiary membrane material wound on film forming on first face in the 3rd spool room and film forming has been on second face
State the stage of the described matrix of the 4th membrane material；In first transport path, the second film forming room by the second membrane material into
When film is on first face for first matrix extracted out along the first direction, branch is removed from first film forming room
Hold the first cathode electrode of first film forming room of the target of first membrane material；Also, in first transport path,
In the first film forming room by the first membrane material film forming in first face for first matrix extracted out along the second direction
When upper, the second negative electrode electricity of second film forming room of the target of supporting second membrane material was removed from second film forming room
Pole.According to this composition, a film forming room in first and second film forming room carries out the upkeep operation of the target of membrane material, and the
One and second film forming room another film forming room can continue to carry out film forming operation, therefore, it is possible to improve production efficiency.Moreover, root
According to this composition, in the first transport path, by making matrix be come and gone between the first roller room and the second roller room, along first party
To in being directed, on the first face by the second membrane material film forming, in being directed along second direction, on the first face by first
Membrane material film forming, so as to be continuously manufactured by matrix being laminated with the second membrane material and first in order in volume to volume mode
The layered product of membrane material；On the other hand, in the second transport path, in being directed along a first direction, on the first face will
Tertiary membrane material filming, in being directed along second direction, on the second surface by the 4th membrane material film forming, so as to volume
The film forming on first face of described matrix is continuously manufactured by volume mode has the tertiary membrane material and in second face
Upper film forming has the layered product of the 4th membrane material.
In accordance with the invention it is possible to seek to realize the efficient activity of film forming using volume to volume technology or seek it to improve.
Brief description of the drawings
Fig. 1 is to represent that the figure of the film formation device one of the film build method of the present invention can be implemented；
Fig. 2 (a), (b) are the figures for representing the possible configuration of cathode electrode under the film build method of the present invention；
Fig. 3 is the figure of the configuration example for the layered product for representing the film build method manufacture by the present invention；
Fig. 4 is to represent that the figure of one of other film formation devices of the film build method of the present invention can be implemented；
Fig. 5 is the figure of the configuration example for the layered product for representing the film build method manufacture by the present invention.
Description of reference numerals
1 film formation device
2 film formation devices
10 matrixes
29 deflector rolls
31 heating chambers
40 plasma treatment appts
41 first film forming room
42 second film forming room
51 first going barrels
52 second going barrels
83 switching rollers
The first rollers of W1 room
The second rollers of W2 room
The roller rooms of W3 the 3rd
Embodiment
Below, referring to the drawings, the preferred embodiment to the present invention is illustrated.
Fig. 1 is to represent that one of the film formation device 1 of the first film build method of the present invention and the second film build method can be implemented.
The film formation device 1 for example including：The the first roller room W1 and the second roller room W2 for the long size matrix 10 being rolled into a roll can be housed, set
The first film forming room 41 and the second film forming room 42 between these first rollers room W1 and the second roller room W2, located at the first roller room W1 and
Heating chamber 31 between first film forming room 41 and the plasma treatment between the first heating chamber 31 and the first film forming room 41
Device 40.
Be used as vacuum film-forming method, it is known that have vacuum vapour deposition, sputtering method, chemical vapour deposition technique (CVD) etc..This dress
Putting 1 can be using any of these methods method.Especially, according to sputtering method, the uniform of large area can be carried out and splashed
Penetrate, moreover, continuous production is high, have good stability, the film of densification can be formed.Splashed especially in accordance with the DC magnetic controls in sputtering method
Method is penetrated, magnetic field can be formed on the target surface and electronics is controlled, is damaged therefore, it is possible to suppress matrix.
In order to effectively keep vacuum state, dividing plate 14 is provided between each room of the present apparatus 1 and room.Moreover, respectively every
Plate 14, which is provided with, makes the gap 13 that matrix 10 passes through.
As long as the matrix 10 used in the method is by film-formable material, various resin films, aluminium such as PET film
The various sheet metals such as paper tinsel are constituted, and there is no particular limitation for its material.But, matrix 10 is that entire length is long, with flexibility,
The material that can be rolled into a roll.In film forming, matrix 10 using arrangement multiple deflector rolls 29 etc., along from the first roller room W1 towards the
Two roller room W2 first direction A and along from the second roller room W2 towards the first roller room W1 second direction B, in volume to volume mode
Between the first roller room W1 and the second roller room W2, according to circumstances conveyed between other roller rooms.
In order to which matrix 10 is rolled into a roll, the first extraction take-up roll 21 is provided with the first roller room W1, in the second roller room
Volume Two is provided with W2 around draw-off roller 22.When matrix 10, A is conveyed along a first direction, the first extraction take-up roll 21 is carried out
Extract out, the second extraction take-up roll 22 is wound.On the other hand, when matrix 10 is conveyed along second direction B, second extracts out
Take-up roll 22 is extracted out, and the first extraction take-up roll 21 is wound.
Heating chamber 31 is used for heated substrate 10.The position of heating chamber is set to be not particularly limited, still, will be in following explanation
In mention, it is also different according to the position of heating chamber 31 and the effect that is obtained of occupation mode difference.
For example shown in Fig. 1, in the case where heating chamber 31 is located between the first roller room W1 and the first film forming room 41, the
Carried out in one film forming room 41 before film forming, matrix 10 is heated in heating chamber 31.In the case where carrying out application of vacuum etc., sometimes from
Matrix 10 produces moisture, and the influence that the moisture is produced to the composition of the film of film forming is big.By setting heating chamber 31 in the position,
Matrix 10 is de-gassed before film forming, moisture is removed, influence can be reduced.
In addition, without especially illustrating, but it is also possible to which heating chamber is located at into such as the second film forming room 42 and the second roller room
Between W2.By setting heating chamber in such position, base can be heated after the second film forming room 42 carries out film forming to matrix 10
Body 10, anneals thereby, it is possible to the membrane material to the film forming on matrix 10, makes the atomic arrangement of film and turns into regularly arranged crystalline substance
Grain.
In addition, as needed, such as can also between the first film forming room 41 and the second film forming room 42 wait setting heating chamber.
But, heating chamber is not necessarily necessary, for example, it is also possible to be not provided with heating chamber and can be obtained using the heating function of film forming room
Same effect.
Plasma treatment appts are used to carry out plasma treatment to matrix 10.By implementing plasma treatment, make matrix 10
Surface active, additionally it is possible to cleaned, thus, it is possible to more efficiently carry out film forming.It is same with heating chamber, plasma is set
There is no particular limitation for the position of processing unit.
For example, in the example in fig 1, by plasma treatment appts 40 located at the first heating chamber 31 and the first film forming room 41 it
Between.By setting plasma treatment appts in above-mentioned position, matrix 10 can be carried out before the film forming of the first film forming room 41 etc.
Ion processing.In addition, as needed, heating chamber can also be set between such as the first film forming room 41 and the second film forming room 42.
It should be noted that plasma treatment appts are not necessarily necessary, the heating of the going barrel of film forming room described later can also be utilized
Function etc. and omit plasma treatment appts.
Film formation device 1 at least has Liang Ge film forming room between the first roller room W1 and the second roller room W2, is herein the first one-tenth
The film forming room 42 of film room 41 and second.As long as film forming room is just enough at least provided with two, but it is also possible to additional to set film forming room.Set
As long as the position of additional film forming room is just not particularly limited between the first roller room W1 and the second roller room W2.For example, can set
Between the film forming room 41 of heating chamber 31 and first.In addition, in these film forming room the membrane material of film forming also there is no particular limitation,
It can also be for example metal or nesa coating, as metal, there is copper, copper alloy, Huo Zheyin, silver alloy.It is used as silver alloy, example
It such as can also be the alloy for being referred to as APC (Ag-Pd-Cu) that palladium (Pd) and copper (Cu) are with the addition of in silver-colored (Ag).In this case, silver-colored
As APC principal component, its content can be in more than 90 atom %.
First film forming room 41 possesses the first going barrel 51 and the first cathode electrode 61.First going barrel 51 with by matrix 10 to
The mode that first direction A or second direction B is carried is rotated freely, and matrix 10 passes through around them to first direction A or second
Direction B is conveyed.In addition, the first going barrel 51 can also have the function of heated substrate 10.It is considered that passing through the first going barrel
The effect that 10 heating function is obtained is identical with the effect obtained by heating chamber.As a result, can also be by the first going barrel 51
Instead of the heating function of heating chamber, on the contrary, the heating function of the first going barrel 51 can also be replaced by the heating function of heating chamber.
First going barrel 51 is provided with multiple first cathode electrodes 61.These multiple first cathode electrodes 61 are propped up respectively
Hold for by the target of defined membrane material film forming, in this condition, these multiple first cathode electrodes 61 are with movable state and the
One going barrel 51 is configured relatively.Film forming membrane material can freely be changed according to the occupation mode of device.For example, working as
Matrix 10 along a first direction by the surrounding of the first going barrel 51 when, it should the membrane material of film forming can be the first membrane material or
Person's tertiary membrane material etc..These first membrane materials and tertiary membrane material can freely be changed according to the occupation mode of device.Profit
With first cathode electrode 61, during matrix 10 is by around the first going barrel 51, by the first membrane material or tertiary membrane
Membrane material film forming is on matrix 10 as defined in material etc..
Second film forming room 42 have with the first film forming room 41 same or similar composition and function, at least possess the second rotation
The cathode electrode 62 of drum 52 and second.Second going barrel 52 can be such that matrix 10 passes through around it to first direction A and second direction B
Continuously convey, in addition, also being capable of heated substrate 10.Around the second going barrel 52, match somebody with somebody in opposite directions with the second going barrel 52
Multiple second cathode electrodes 62 are equipped with, the membrane material of the second cathode electrode 62 is in week of such as matrix 10 by the second going barrel 52
It can be the second membrane material to enclose when leading to first direction, and in matrix 10 by leading to second direction around the second going barrel 52
When can be the 4th membrane material etc..These second membrane materials and the 4th membrane material can freely become according to the occupation mode of device
More.Using these the second cathode electrodes 62, during matrix 10 is by around the second going barrel 52, by defined membrane material
Film forming is on matrix 10.
It should be noted that the heating of the first going barrel 51 and the second going barrel 52 and film forming are processed as independently of one another
Function, for example, only being heated in the first film forming room 41, and film process is only carried out into the second film forming room 42.
In addition, in order to fully be heated, the diameter of the first going barrel 51 and the second going barrel 52 can also be set as comparing
It is big to extend time of delivery.
Referring to Figures 1 and 2, the first film build method of the invention using film formation device 1 is illustrated.Fig. 2 is represented first
The figure of the configuration of possible cathode electrode in the case of film build method.According to first film build method, from the first roller room W1 courts
To on the second roller room W2 first direction A, can manufacture the membrane material of film forming second matrix (for ease of illustration, hereon referred to as
" the first matrix "), and then on from the second roller room W2 towards the first roller room W1 second direction B, film forming first can be manufactured
The matrix (for ease of illustration, hereon referred to as " the second matrix ") of membrane material.
As shown in figure 1, first, by the first matrix, A is extracted out from the first roller room W1 in the first direction.The the first matrix profit extracted out
It is de-gassed with the heating function of the first heating chamber 31 and the first going barrel 51 of the first film forming room 41.And then, the of degassing
On one matrix, using the second cathode electrode 62 of the second film forming room 42 by the second membrane material film forming, enter afterwards in the second roller room W2
Row winding.And then, by second matrix different from the first matrix, B is extracted out from the second roller room W2 in a second direction.Second extracted out
Matrix deaerates in the second film forming room 42, and then on the second matrix of degassing, uses the first negative electrode electricity of the first film forming room 41
First membrane material film forming is wound by pole 61 in the first roller room W1 afterwards.
Fig. 2 (a) is the first negative electrode for representing possible first film forming room 41 when upper first matrixes of A are by film forming in a first direction
The diagrammatic top view of the configuration status of second cathode electrode 62 of the film forming room 42 of electrode 61 and second, Fig. 2 (b) is represented second
The second of first cathode electrode 61 of possible first film forming room 41 and the second film forming room 42 when B upper second matrixes in direction are by film forming
The diagrammatic top view of the configuration status of cathode electrode 62.
In the case of first film build method, for example, when generating film forming and having the first matrix of the second membrane material, the
As long as the heating (degassing) that a film forming room 41 carries out the first going barrel 51 of the first film forming room 41 is just enough, it is not necessary to carry out
Using the first cathode electrode 61 into film process, therefore, such as shown in Fig. 2 (a), by the main body for making the first cathode electrode of supporting 61
60 movements etc., can be de-gassed in the state of the first cathode electrode 61 of the first film forming room 41 is removed from the first film forming room 41
Deng.As a result, the first cathode electrode 61 that removed from the first film forming room 41 can be carried out the maintenance such as changing, and in this dimension
Protect in operation, also can continue to carry out film forming in the second film forming room 42.It should be noted that facing if it is necessary, can use
When lid etc. closing because from the first film forming room 41 remove the first cathode electrode 61 and the first film forming room 41 produce opening.
Equally, in the case of first film build method, for example, having the second matrix of the first membrane material in generation film forming
When, as long as the heating (degassing) that the second going barrel 52 of the second film forming room 42 is carried out in the second film forming room 42 is just enough,
It need not carry out using the second cathode electrode 62 into film process, therefore, can be from second film forming room 42 as shown in Fig. 2 (b)
It is de-gassed in the state of the second cathode electrode 62 for removing the second film forming room 42.As a result, to being gone from the second film forming room 42
The second cathode electrode 62 removed can carry out the maintenance such as changing, and in this upkeep operation, also can in the first film forming room 41
Enough proceed film forming.It should be noted that as described above, if necessary, the closing such as substitution can be used because from second
The opening that film forming room 42 removes the second cathode electrode 62 and produced in the second film forming room 42.
So, according to the first film build method, energy in a film forming room in the first film forming room 41 and the second film forming room 42
The upkeep operation of the first cathode electrode 61 or the second cathode electrode 62 is enough carried out, and in the first film forming room 41 and the second film forming room 42
In another film forming room in can continue to carry out film forming operation, therefore, it is possible to improve the production efficiency of matrix.
It should be noted that in first film build method, example is as used in the first heating chamber 31 and the first film forming room 41
Between the plasma treatment appts 40 that set, or at the plasma set between the first film forming room 41 and the second film forming room 42
Device (not shown) is managed, before after the first roller room W1 extractions and in the second film forming room 42 by the second membrane material film forming,
Also plasma treatment can be carried out to the first matrix.In addition, example is set as used between the second roller room W2 and the second film forming room 42
At the plasma treatment appts (not shown) put, or the plasma set between the second film forming room 42 and the first film forming room 41
Device (not shown) is managed, before after the second roller room W2 extractions and in the first film forming room 41 by the first membrane material film forming,
Also plasma treatment can be carried out to the second matrix.By implementing plasma treatment, film forming can be more efficiently carried out.
In addition, for example using the heating chamber 31 between the first roller room W1 and the first film forming room 41, from the first roller room
After W1 is extracted out and before being de-gassed by the heating function (51) of the first film forming room 41, the first matrix can also be carried out
Degassing.In addition, for example using the heating chamber (not shown) between the second roller room W2 and the second film forming room 42, from the second roller
After room W2 is extracted out and before being de-gassed by the heating function (52) of the second film forming room 42, the second matrix can also be entered
Row degassing.
Moreover, for example using the heating chamber 31 between the first film forming room 41 and the first roller room W1, in the first membrane material
After film forming and before the first roller room W1 is by winding, the second matrix can also be annealed.In addition, for example using located at
Heating chamber (not shown) between two film forming room 42 and the second roller room W2, after the second membrane material film forming and in the second roller room W2
Before winding, the first matrix can also be annealed.
Fig. 1 is referred again to, illustrates the second film build method of the invention using above-mentioned film formation device 1.
In the second film build method, first, the first path of matrix 10 is being conveyed from the first roller room W1 to the second roller room W2
In, extract matrix 10 out from the first roller room W1 on A in a first direction, to the matrix 10 of extraction, use the first heating chamber 31 or the first
The heating function of first going barrel 51 of film forming room 41 is de-gassed.Moreover, on the face of the matrix 10 of degassing, using second into
Second cathode electrode 62 of film room 42 is by the second membrane material film forming, and afterwards, film forming has the matrix 10 of the second membrane material in the second roller
Room W2 temporal volumes around.Then, in the alternate path of return of matrix 10 is conveyed to the first roller room W1 from the second roller room W2, the
On two direction B matrix 10 is extracted out from the second roller room W2, it is cloudy using the first of the first film forming room 41 on the face of the matrix 10 of extraction
First membrane material film forming finally, is laminated with the matrix 10 of the first membrane material in the first roller by pole electrode 61 on the second membrane material
Room W1 is wound.
As can be seen that according to second film build method, by making matrix 10 between the first roller room W1 and the second roller room W2
Come and go, can be continuously manufactured by being laminated with a stacking of the second membrane material and the first membrane material in volume to volume mode in order
Body.Fig. 3 represents the configuration example of the layered product manufactured by second film build method.Layered product has the in order on matrix 10
Two membrane material 10-2 and the first membrane material 10-1.For example, as the first membrane material 10-1, copper (Cu) or copper can also be used to close
Gold or the silver metal such as (Ag) or silver alloy (APC etc.), as the second membrane material 10-2, can also use noncrystalline or crystallization ITO
Deng nesa coating.But, there is no particular limitation for these membrane materials.
It should be noted that in second film build method, such as can use located at the first heating chamber 31 and the first one-tenth
At plasma treatment appts 40 between film room 41, or plasma between the first film forming room 41 and the second film forming room 42
Device (not shown) is managed, it is right after being extracted out from the first roller room W1 and before the second film forming room 42 is by the second membrane material film forming
Matrix 10 carries out plasma treatment.In addition, such as can use between the second roller room W2 and the second film forming room 42 from
Sub-processing unit (not shown), or plasma treatment appts between the second film forming room 42 and the first film forming room 41 are (not
Diagram), after being extracted out from the second roller room W2 and before the first film forming room 41 is by the first membrane material film forming, matrix 10 is carried out etc.
Ion processing.
In addition, can for example use the heating chamber 31 between the first roller room W1 and the first film forming room 41, located at first
Heating chamber (not shown) between film forming room 42 of film forming room 41 and second, and then use the first going barrel 51 of the first film forming room 41
Heating function, from the first roller room W1 extraction after and before the second film forming room 42 is by the second membrane material film forming, to matrix
10 are de-gassed.In addition, can for example use the heating chamber (not shown) between the second roller room W2 and the second film forming room 42,
Heating chamber (not shown), the second going barrel 52 of the second film forming room 42 between the second film forming room 42 and the first film forming room 41
Heating function, from the second roller room W2 extraction after and before the first film forming room 41 is by the first membrane material film forming, to matrix
10 are de-gassed.
In addition, the heating chamber (not shown) between the second film forming room 42 and the second roller room W2 can be for example used,
After second membrane material film forming and before the second roller room W2 is by winding, matrix 10 is annealed.
It should be noted that in second film build method, it is also same with the first film build method, such as in the first path
During by the second membrane material film forming, it need not be carried out using first cathode electrode 61 into film process in the first film forming room 41, therefore,
It can be de-gassed in the state of the first cathode electrode 61 of the first film forming room 41 is removed from the first film forming room 41.It is tied
Really, the first cathode electrode 61 that removed from the first film forming room 41 can be carried out the maintenance such as changing, in this upkeep operation,
Film forming can be proceeded in the second film forming room 42.
Equally, for example in alternate path, when on the second membrane material by the first membrane material film forming, in the second film forming room 42
It need not carry out using the second cathode electrode 62 into film process, therefore, it is possible to remove the second film forming from the second film forming room 42
It is de-gassed in the state of second cathode electrode 62 of room 42.As a result, can to removed from the second film forming room 42 second
Cathode electrode 62 carries out the maintenance such as changing, and in this upkeep operation, also can proceed film forming in the first film forming room 41.
Fig. 4 represents that the configuration example of the film formation device of the 3rd film build method of the present invention can be implemented.In Fig. 4, for
Mark and Fig. 1 identical reference marks on the identical part of film formation device 1 shown in Fig. 1.It should be noted that the film formation device
2 is are mainly used in implementing the film formation device of the 3rd film build method, still, it can also be seen that not only can be with from following record
Implement the 3rd film build method, the first film build method described above and the second film build method can also be implemented.
There is film formation device 2 film formation device 1 with Fig. 1 to be similarly comprised, still, on the basis of the composition of film formation device 1
On, film formation device 2 is also equipped with the 3rd roller room W3, switching roller 83,83 ' and utilizes two kinds of these switching formation of rollers 83,83 ' to lead
Roll row is arranged.Here, for purposes of illustration only, the transport path that the deflector roll for being assembled with switching roller 83 is arranged into constituted matrix is referred to as the
One transport path, the transport path that the deflector roll for being assembled with switching roller 83 ' is arranged into constituted matrix is referred to as the second transport path.
When matrix 10 is extracted out from the first roller room W1 and is conveyed in a first direction, matrix 10 in the first transport path and
The same path movement in forward position of switching roller 83 is reached on second transport path.Reach after switching roller 83, matrix 10 is in the first conveying
In path, as shown by the solid line, A is by the second film forming room 42 along a first direction, and by switching roller in the second transport path
83 ' reversions, it is shown in dotted line, pass through the second film forming room 42 along second direction B.
Below, the 3rd film build method is described in more detail.Taken out on the first in a first direction A of matrix 10 from the first roller room W1
Go out, afterwards, be de-gassed using the heating function of the first heating chamber 31 and the first going barrel 51 of the first film forming room 41.After degassing
Matrix 10 after moved along the first transport path or the second transport path using switching roller 83,83 '.
On the first transport path, the matrix 10 of degassing is directed on A to the second film forming room 42 in a first direction, is being drawn
With the second cathode electrode 62 of the second film forming room 42 by the second membrane material film forming on first face of the matrix 10 led, afterwards, into
The matrix 10 that film has the second membrane material is wound temporarily in the second roller room W2.Then, on second direction B identical matrix 10 from
Second roller room W2 is extracted out, with the first cathode electrode 61 of the first film forming room 41 by the first membrane material on the face of the matrix 10 of extraction
Film forming, finally, the matrix 10 that the first membrane material is laminated with the second membrane material are wound in the first roller room W1.So, as above
Described, the first transport path makes matrix 10 to be moved with the second film build method identical mode, by the first roller room W1 and
Come and go matrix 10 between two roller room W2, in A is directed to along a first direction, on the first face by the second membrane material film forming,
And in being directed to along second direction, on the first face by the first membrane material film forming, so as to continuous in volume to volume mode
Ground manufactures the layered product for being laminated with the second membrane material and the first membrane material in order on matrix.
On the other hand, in the second transport path, the first heating chamber 31 be degassed or use the first film forming room 41
The first going barrel 51 be de-gassed in matrix 10 the first face a on, use the first cathode electrode 61 of the first film forming room 41
By tertiary membrane material filming, then, film forming has the matrix 10 of tertiary membrane material using switching roller 83 ' on second direction B to the
Two film forming room 42 are directed, on the second face b of the side opposite with the first face a of matrix 10 in being directed to along second direction,
Using the second cathode electrode 62 of the second film forming room 42, by the fourth membrane material film forming different from tertiary membrane material, afterwards
Three roller room W3 are wound.So, in the second transport path, in being directed to along a first direction, on the first face by the 3rd
Membrane material film forming, in being directed to along second direction, on the second surface by the 4th membrane material film forming, therefore, it is possible to volume pair
Volume mode continuously manufactures the layered product that tertiary membrane material and the 4th membrane material are respectively formed with surface and the back side.
As can be seen that the layered product obtained via the first transport path is identical with Fig. 3 layered product.With Fig. 3 layered product
Equally, for example, as the first membrane material, copper (Cu) or copper alloy, or the silver gold such as (Ag) or silver alloy (APC etc.) can be used
Category, as the second membrane material, can use the nesa coating such as noncrystalline or crystallization ITO, there is no particular limitation for membrane material.
Fig. 5 represents the configuration example of the layered product obtained via the second transport path.It is laminated with the first face a of matrix 10
Tertiary membrane material 10-3, and it is laminated with the 4th membrane material 10-4 on the second face b.For example shown in the example of diagram, it is used as tertiary membrane
Material 10-3 and the 4th membrane material 10-4, can also use the nesa coating such as noncrystalline or crystallization ITO.But, membrane material does not have
There is special restriction.
It should be noted that in the 3rd film build method, such as it is practical to be located at the first heating chamber 31 and the first film forming room
Plasma treatment appts 40 between 41, or between the first film forming room 41 and the 3rd roller room W3 or located at the 3rd roller room
Plasma treatment appts (not shown) between W3 and the second film forming room 42, for example after the first roller room W1 extractions and by the
Before two membrane material film forming, plasma treatment can also be carried out to matrix 10.
In addition, for example using the heating chamber (not shown) between the second film forming room 42 and the second roller room W2, from
After one roller room W1 is extracted out and before the second roller room W2 is by winding, matrix 10 can also be annealed.
It should be noted that in the 3rd film build method, it is also same with first and second film build method, such as first
In transport path, when the second film forming room 42 is by the second membrane material film forming, it need not carry out using first in the first film forming room 41
Cathode electrode 61 into film process, therefore, it is possible to remove the first cathode electrode of the first film forming room 41 from the first film forming room 41
It is de-gassed in the state of 61.As a result, can be changed to the first cathode electrode 61 removed from the first film forming room 41
Deng safeguarding, in the upkeep operation, also film forming can be proceeded in the second film forming room 42.
Equally, for example in the first transport path, when the second film forming room 42 is by the second membrane material film forming, in the second film forming
Room 42 need not be carried out using the second cathode electrode 62 into film process, therefore, it is possible to remove second from the second film forming room 42
It is de-gassed in the state of second cathode electrode 62 of film forming room 42.As a result, can be to removing from the second film forming room 42
Second cathode electrode 62 carries out the maintenance such as changing, and in the upkeep operation, also can proceed film forming in the first film forming room 41.
It should be noted that, although illustrate to be provided only with the example of Liang Ge film forming room, still, even in be provided with three with
On film forming room in the case of, naturally it is also possible to obtain same effect.In addition, that described in the explanation that device is constituted
Sample, can also be suitably disposed at appropriate position by heating chamber and plasma treatment appts and be incorporated into film forming side of the invention
Method.
As described above, the various variations that the present invention is included including its technological thought.
Industrial applicibility
The method of the present invention can be widely used in various film formation devices.
Claims (8)
1. a kind of film build method, vacuum film formation is continuously carried out to the matrix of long size, it is characterised in that including：
A) on from the first roller room towards the first direction of the second roller room, the long size being rolled into a roll is extracted out from the first roller room
The first matrix stage；
B) stage to being de-gassed along first matrix that the first direction is extracted out；
C) using the target supported by the second cathode electrode of the second film forming room, by the second membrane material film forming described the first of degassing
Stage on matrix；
D) film forming is generated by having stated first matrix of the second membrane material in the second roller room winding film forming
State the stage of the first matrix of the second membrane material；
Also include：
A ') in the second direction from the second roller room towards the first roller room, extract rolled out from the second roller room
The stage of second matrixes different from first matrix of the long size of shape；
B ') to stage for being de-gassed along second matrix that the second direction is extracted out；
C ') using the target supported by the first cathode electrode of the first film forming room, by the first membrane material film forming described the of degassing
Stage on two matrixes；
D ') generate film forming by having stated second matrix of the first membrane material in the first roller room winding film forming
State the stage of the second matrix of the first membrane material；
When generation film forming has the first matrix of second membrane material, first film forming room is removed from first film forming room
The first cathode electrode；Also,
When generation film forming has the second matrix of first membrane material, second film forming room is removed from second film forming room
The second cathode electrode.
2. film build method as claimed in claim 1, it is characterised in that first membrane material and second membrane material are
Bright conducting film.
3. a kind of film build method, vacuum film formation is continuously carried out to the matrix of long size, it is characterised in that including：
A) on from the first roller room towards the first direction of the second roller room, the long size being rolled into a roll is extracted out from the first roller room
Matrix stage；
B) stage being de-gassed to the described matrix extracted out along the first direction；
C) stage in the second film forming room by the second membrane material film forming on the face of the described matrix of degassing；
D) stage that film forming has stated the described matrix of the second membrane material is wound in the second roller room；
E) in the second direction from the second roller room towards the first roller room, extracted out from the second roller room described the
The stage of the described matrix of two roller rooms winding；
F) the first film forming room by the first membrane material film forming on the face for the described matrix extracted out along the second direction
Stage；
G) rank of the described matrix of first membrane material is laminated with second membrane material in the first roller room
Section；
The second film forming room by the second membrane material film forming on the face for the described matrix extracted out along the first direction when,
The first cathode electrode of first film forming room of the target of supporting first membrane material is removed from first film forming room；And
And,
The first film forming room by the first membrane material film forming on the face for the described matrix extracted out along the second direction when,
The second cathode electrode of second film forming room of the target of supporting second membrane material is removed from second film forming room.
4. film build method as claimed in claim 3, it is characterised in that in first film forming room, in the first direction
On be directed in described matrix be de-gassed.
5. film build method as claimed in claim 3, it is characterised in that first membrane material is metal, second membrane material
Expect for nesa coating.
6. a kind of film build method, vacuum film formation is continuously carried out to the matrix of long size, it is characterised in that including：
A) on from the first roller room towards the first direction of the second roller room, the long size being rolled into a roll is extracted out from the first roller room
Matrix stage；
B) stage being de-gassed to the described matrix extracted out along the first direction；
C-1) have in the first transport path：
The described matrix of degassing is guided to the second film forming room in said first direction,
In the first face of described matrix of second film forming room by the second membrane material film forming in being directed along the first direction
On,
The described matrix that film forming has stated the second membrane material is wound in the second roller room,
In the second direction from the second roller room towards the first roller room, extracted out from the second roller room described second
The described matrix of roller room winding,
The first film forming room by the first membrane material film forming on the second membrane material, the second membrane material film forming is along described second
On first face for the described matrix that direction is extracted out,
The stage of the described matrix of first membrane material is laminated with second membrane material in the first roller room；
Or
C-2) have in the second transport path：
The described matrix of degassing is guided to first film forming room in said first direction,
In the institute of described matrix of first film forming room by tertiary membrane material filming in being directed along the first direction
State on the first face,
The described matrix that film forming has the tertiary membrane material is guided to second film forming room in this second direction,
Described matrix of second film forming room by the 4th membrane material film forming in being directed along the second direction with
On second face of the opposite side in first face,
There is the tertiary membrane material wound on film forming on first face in the 3rd spool room and film forming has on second face
The stage of the described matrix of 4th membrane material；
In first transport path, the second membrane material film forming is being extracted out along the first direction in the second film forming room
When on first face of described matrix, described the first of the target of supporting first membrane material is removed from first film forming room
First cathode electrode of film forming room；Also,
In first transport path, the first membrane material film forming is being extracted out along the second direction in the first film forming room
When on first face of described matrix on the second membrane material of film forming, supporting second film is removed from second film forming room
Second cathode electrode of second film forming room of the target of material.
7. film build method as claimed in claim 6, it is characterised in that first membrane material is metal, second membrane material
Expect for nesa coating.
8. film build method as claimed in claim 6, it is characterised in that the tertiary membrane material is nesa coating, described the
Four membrane materials are nesa coating.
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| JP2011-100508 | 2011-04-28 | ||
| JP2011100508 | 2011-04-28 |
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| EP (1) | EP2518761B1 (en) |
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| JP5959099B2 (en) | 2011-07-29 | 2016-08-02 | 日東電工株式会社 | Manufacturing method of laminate |
| JP5963193B2 (en) | 2011-07-29 | 2016-08-03 | 日東電工株式会社 | Manufacturing method of laminate |
| EP2762607B1 (en) * | 2013-01-31 | 2018-07-25 | Applied Materials, Inc. | Deposition source with adjustable electrode |
| JP6268568B2 (en) * | 2013-04-09 | 2018-01-31 | 大日本印刷株式会社 | LAMINATE MANUFACTURING METHOD AND LAMINATE |
| JP5969953B2 (en) * | 2013-05-31 | 2016-08-17 | 株式会社神戸製鋼所 | Deposition equipment |
| JP7063709B2 (en) * | 2018-04-27 | 2022-05-09 | 株式会社アルバック | Equipment for manufacturing substrates with transparent conductive film, manufacturing method for substrates with transparent conductive film |
| CN113169025A (en) * | 2018-12-21 | 2021-07-23 | 瑞士艾发科技 | Vacuum processing apparatus and method for vacuum plasma processing at least one substrate or for manufacturing a substrate |
| CN109609910B (en) * | 2019-01-10 | 2021-04-13 | 深圳市致远动力科技有限公司 | Thin film battery preparation device and method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3933644A (en) * | 1972-03-23 | 1976-01-20 | Varian Associates | Sputter coating apparatus having improved target electrode structure |
| CN101982031A (en) * | 2008-03-27 | 2011-02-23 | 株式会社普利司通 | Optical filter for display, method for manufacturing the same, and display and plasma display panel equipped with optical filter for display |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0798854A (en) | 1993-09-30 | 1995-04-11 | Kao Corp | Apparatus for production of magnetic recording medium |
| GB9722650D0 (en) * | 1997-10-24 | 1997-12-24 | Univ Nanyang | Cathode ARC source with target feeding apparatus |
| DE10157186C1 (en) * | 2001-11-22 | 2003-01-16 | Ardenne Anlagentech Gmbh | Vacuum deposition device comprises a roller frame fixed on a point in a coiling chamber, a process roller frame fixed on points in a process chamber, and a roller frame for winding on a point in a further coiling chamber |
| JP4415584B2 (en) | 2003-03-14 | 2010-02-17 | 住友ベークライト株式会社 | Vacuum film forming apparatus for film and plastic film using the same |
| GB0404436D0 (en) * | 2004-02-27 | 2004-03-31 | Nanofilm Technologies Int | Continuous arc deposition apparatus and method with multiple available targets |
| JP5182610B2 (en) * | 2007-10-11 | 2013-04-17 | 富士電機株式会社 | Thin film solar cell manufacturing equipment |
| EP2257986A4 (en) * | 2008-03-04 | 2012-06-13 | Solexant Corp | Process for making solar cells |
| TW201034228A (en) * | 2008-12-05 | 2010-09-16 | Solopower Inc | Method and apparatus for forming contact layers for continuous workpieces |
| EP2216831A1 (en) * | 2009-02-05 | 2010-08-11 | Applied Materials, Inc. | Modular PVD system for flex PV |
| JP2010236076A (en) | 2009-03-31 | 2010-10-21 | Fujifilm Corp | Evaporation system |
| JP5319373B2 (en) * | 2009-04-10 | 2013-10-16 | 富士フイルム株式会社 | Gas barrier film and method for producing gas barrier film |
| KR20110012182A (en) * | 2009-07-30 | 2011-02-09 | 지 . 텍 (주) | Roll-to-roll sputter apparatus capable of continuous sputtering and method of continuous sputtering |
| US20110067998A1 (en) * | 2009-09-20 | 2011-03-24 | Miasole | Method of making an electrically conductive cadmium sulfide sputtering target for photovoltaic manufacturing |
| JP5959099B2 (en) * | 2011-07-29 | 2016-08-02 | 日東電工株式会社 | Manufacturing method of laminate |
| JP5963193B2 (en) | 2011-07-29 | 2016-08-03 | 日東電工株式会社 | Manufacturing method of laminate |
-
2012
- 2012-03-26 JP JP2012068802A patent/JP5831759B2/en not_active Expired - Fee Related
- 2012-04-26 EP EP12165705.0A patent/EP2518761B1/en not_active Not-in-force
- 2012-04-27 TW TW101115179A patent/TWI577816B/en not_active IP Right Cessation
- 2012-04-27 US US13/458,692 patent/US9206505B2/en not_active Expired - Fee Related
- 2012-04-28 CN CN201210130235.3A patent/CN102758189B/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3933644A (en) * | 1972-03-23 | 1976-01-20 | Varian Associates | Sputter coating apparatus having improved target electrode structure |
| CN101982031A (en) * | 2008-03-27 | 2011-02-23 | 株式会社普利司通 | Optical filter for display, method for manufacturing the same, and display and plasma display panel equipped with optical filter for display |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102758189A (en) | 2012-10-31 |
| JP2012237058A (en) | 2012-12-06 |
| TWI577816B (en) | 2017-04-11 |
| TW201250027A (en) | 2012-12-16 |
| JP5831759B2 (en) | 2015-12-09 |
| US9206505B2 (en) | 2015-12-08 |
| EP2518761B1 (en) | 2016-11-09 |
| EP2518761A1 (en) | 2012-10-31 |
| US20120276397A1 (en) | 2012-11-01 |
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