CN102722090B - Illumination uniformity compensating device - Google Patents
Illumination uniformity compensating device Download PDFInfo
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- CN102722090B CN102722090B CN201210187778.9A CN201210187778A CN102722090B CN 102722090 B CN102722090 B CN 102722090B CN 201210187778 A CN201210187778 A CN 201210187778A CN 102722090 B CN102722090 B CN 102722090B
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Abstract
An illumination uniformity compensating device comprises a first compensating component and a second compensating component which are vertical to the direction of an optical axis of a system. Each compensating component consists of a plurality of compensating units, the quantity of the compensating units of the first compensating component is equal to that of the compensating units of the second compensating component, and the corresponding compensating units form compensating unit pairs. Each compensating unit can move in and out of an illumination viewing field along a scanning direction of the illumination viewing field, and obscures partial illuminating light, and the purpose of adjusting integral energy uniformity of a scanning viewing field is achieved. The compensating units of the uniformity compensating device are elongated sheets, one end, which is inserted into the illumination viewing field, of each elongated sheet is polygonal or arc-shaped, the compensating units are divided into two layers to be arranged, and a gap formed by each two corresponding compensating units of one layer is covered by the corresponding compensating units of the other layer. The quantity of equally divided parts of the illumination viewing field is effectively increased, the width of each equal part is reduced, accordingly, compensation precision of the compensating device is improved without increasing the number of the compensating units, difficulty in mechanical design and design of a control system is not increased, and the illumination uniformity compensating device is realized easily.
Description
Technical field
The present invention relates to a kind of uniformity compensating, the illumination uniformity compensating especially in lithography illuminating system.
Background technology
For mask face provides Uniform Illumination to be the major function of lithography illuminating system, good maintaining uniform illumination performance reduces the photoetching process factor, improves the resolution of whole etching system; Otherwise the unevenness distribution of illumination can make thickness silicon chip face exposing lines uneven, has a strong impact on photoetching quality.
Along with the continuous shortening of lithographic wavelength, constantly reducing of characteristic dimension, the uniformity requirement of photoetching to illuminator is more and more higher, only uses traditional light balancing device and even smooth principle not to reach or be difficult to reach uniformity requirement.In addition, in illuminator, device constantly can wear and tear along with the time, reduces its even optical property, introduces new heterogeneity.Therefore, in order to reach the requirement of lithographic illumination homogeneity, the heterogeneity that in bucking-out system, Different factor is introduced, needs to increase illumination uniformity compensating in systems in which.
US Patent No. 7173688 provides a kind of uniformity compensating of two-sided infix form, the compensator device of this structure is arranged on the both sides of illumination field of view multiple compensating unit, each compensating unit is rectangular flat structure, illumination field of view can be inserted along direction of scanning, bright field, shield portions illumination light, reaches the object of adjustment illumination field of view integral energy distributing homogeneity.In that patent, all compensating units are in same plane, placed side by side, there is gap, cause light leak between compensating unit adjacent like this, can cause new unevenness.In addition, the compensation system that makes placed side by side equals compensating unit width to the equal portions width that illumination field of view divides, namely the adjustment space periodic of homogeneity is equaled to the width of compensating unit, therefore the compensation system of this form can only be greater than the unevenness of compensating unit width the compensation space cycle, and Adjustment precision is lower.
In Chinese patent CN101221373A, the uniformity compensating that a kind of compensating unit overlaps is proposed, the compensating unit of this compensation system is also rectangular flat structure, divide two-layer being staggeredly placed, gap between the adjacent compensating unit of mutual another layer of covering two, efficiently solves the problem of light leak in US Patent No. 7173688 like this.In addition overlapping placement form also makes compensation system be less than compensating unit width to the equal portions width that illumination field of view divides, and namely the adjustment space periodic of homogeneity is less than to the width of compensating unit, improves the compensation precision of compensation system to a certain extent.But the increase of its compensation precision is based upon in the increase of compensating unit number, in the same space, the compensating unit number difficulty of bringing to Machine Design and control system larger more, and therefore this patent adds the difficulty of Machine Design and control while improving compensation precision.Along with the development of science and technology, require more and more higher to the illumination uniformity of lithography illuminating system, due to restriction that is mechanical and level of control, be more and more difficult to realization by the approach increasing compensating unit number and reduction compensating unit size raising uniformity compensating compensation precision.
Summary of the invention
In order to overcome the defect of prior art, the object of this invention is to provide a kind of illumination uniformity compensating, it does not need the compensating unit number reducing compensating unit width or increase, while not increasing Machine Design and control difficulty, increase compensation system to numbers such as the divisions of illumination field of view, reduce the width dividing equal portions, thus improve the compensation precision of compensation system.
In order to realize described object, the technical scheme that the present invention proposes is:
A kind of illumination uniformity compensating, near the face, visual field being placed on illuminator or its conjugate plane, comprise first, second compensation assembly along arranging perpendicular to systematic optical axis direction, each compensation assembly forms by multiple compensating unit, and the compensating unit number of first, second compensation assembly is equal, corresponding compensating unit forms compensating unit pair.Each compensating unit all can move along illumination field of view direction of scanning turnover illumination field of view, blocks partial illumination light, reaches the object of adjustment scanning field of view integral energy homogeneity.
Wherein, the compensating unit of described illumination uniformity compensating is insert the thin plate that illumination field of view end makes polygon or arc-shaped structure, divide two-layer arrangement, the gap formed between mutual another layer of covering two compensating unit, such version and arrangement mode can increase the division equal portions quantity of illumination field of view effectively, reduce the width of every equal portions, thus improve the compensation precision of compensator.
The polygon insertion end of described compensating unit, often accounts for that whole compensating unit width is of a size of 1/2 or 1/3,1/4 equal proportion; The angles be positioned between 0 ~ 90 ° such as 30 °, 45 °, 60 ° are got at the pitch angle on every one side.
Described compensating unit is strip thin plate, and the one end of inserting illumination field of view is the shape of corner cut rectangle.
Each corner cut of described corner cut rectangle compensating unit accounts for that whole compensating unit width is of a size of 1/2 or 1/3,1/4 equal proportion; The angles be positioned between 0 ~ 90 ° such as 30 °, 45 °, 60 ° are got at the pitch angle of each corner cut.
Described compensating unit is strip thin plate, and the one end of inserting illumination field of view is the shape of arc, and its radian is determined according to actual needs.
First, second described compensation assembly, its all compensating unit is two-layer arrangement in compensation plane, upper strata compensating unit hides the gap formed between adjacent two compensating units of lower floor, and in like manner, lower floor's compensating unit also hides the gap formed between adjacent two compensating units in upper strata simultaneously.
The first and second described compensation assembly full symmetrics, are distributed in illumination field of view both sides, and compensating unit corresponding on first, second compensation assembly forms a compensating unit pair, its mode of motion full symmetric, namely insert illumination field of view time consistency, insertion is equal, and direction is contrary.
The transmitance distribution of the material that described compensating unit uses and material is identical, can by opaque material, also can be made by the material with certain transmitance, now transmitance obeys certain function distribution along the direction of insertion of compensating unit, but its transmitance can not be 1, namely can not adopt the material of complete printing opacity.
The present invention compared with prior art has the following advantages:
(1) because one end of each compensating unit insertion illumination field of view is polygonal shape, often while the shielded area of contrast bright field is different during insertion illumination field of view, thus be several regions less than local width the illumination field of view Region dividing of a compensating unit impact, obtain better compensation effect under identical condition.
(2) compensating unit of the present invention is layering, staggered, and such arrangement mode combines with insertion end is polygon-shaped, further same illumination field of view can be divided into more less zonings, improve the compensation precision of uniformity compensating.
(3) the present invention does not increase compensating unit number while raising uniformity compensation precision, does not introduce additional driven unit yet, controls difficulty, obtain better compensation effect under identical condition, with low cost, is easy to realize.
Accompanying drawing explanation
Figure 1 shows that uniformity compensating of the present invention is applied to the schematic diagram of litho machine projection exposure system therefor light channel structure;
Figure 2 shows that the structural representation of uniformity compensating of the present invention;
Figure 3 shows that the schematic diagram that the uniformity compensating that rectangular configuration individual layer is arranged divides illumination field of view;
Figure 4 shows that the schematic diagram that the uniformity compensating of the double-layer staggered arrangement of rectangular configuration divides illumination field of view;
Figure 5 shows that the schematic diagram that the uniformity compensating of the double-layer staggered arrangement of corner cut rectangular configuration of the present invention divides illumination field of view;
Figure 6 shows that the uniformity compensating visual field of rectangle individual layer, rectangular double-layer and corner cut rectangular double-layer divides comparison diagram;
Figure 7 shows that the structural representation of the compensating unit of various embodiments of the present invention.
Embodiment
Below in conjunction with the drawings and specific embodiments, the specific embodiment of the present invention is described in further detail.
Fig. 1 is that described illumination uniformity compensating of the present invention is applied to litho machine projection exposure optical system light path structural representation.Typical lithography projection exposure optical system comprises system source 101, illuminator 102, mask plate 104, projection objective 105 and silicon chip 106.The laser that light source 101 sends incides in illuminator 102, illuminator 102 comprise expand, collimate, steady bundle, light illumination mode conversion, illumination field of view formation, the edge of a knife, illumination objective lens etc. assembly, respectively the effects such as collimator and extender, stable, specific pupil formation, the formation of specific illumination visual field and Uniform Illumination light are produced to incident light, make incident light after illuminator 102, on mask plate 104, obtain the Uniform Illumination visual field of specific illumination visual field shape, specific shape of exit pupil.Mask plate 104 through illuminator illumination after emergent light through projection objective 105 projection imaging on silicon chip 106, silicon chip 106 obtains mask plate 104 clearly as, thus can the photoresist on silicon chip 106 be exposed, said process completes the exposure process of photoetching, is transferred on silicon chip 106 by the pattern projection on mask plate 104.
The illumination light field of litho machine projection exposure system therefor requires to have very high homogeneity, and any illumination of the heterogeneity to mask plate 104 all can be projected on silicon chip 106 by projection objective 105, causes departing from of obtained actual graphical and Ideal graph.In the photolithographic procedures of reality, the foozle of each element of illuminator, and the loss of each element in use procedure, all can introduce unevenness to the illuminator emergent light inciding mask plate 104.Along with the continuous reduction of lithographic feature size, more and more higher to the illumination uniformity of illumination system exit light, it is more and more difficult that the element be only suitable in illuminator will reach required illumination uniformity, by using uniformity compensating 103 between illuminator 102 and mask plate 104, the emergent light energy distribution of illuminator 102 can be adjusted, the illumination light making to incide on mask plate 104 is more even, thus reaches the object compensating pattern uniformity on silicon chip 106.
Figure 2 shows that the structural representation of uniformity compensating of the present invention.Uniformity compensating 103 is made up of two groups of compensation assemblies 202 and 203, be arranged near etching system mask face or its conjugate plane perpendicular in the xy plane of systematic optical axis z, be arranged in the both sides of rectangular illumination field 201 along non-scan direction x, often organize compensation assembly and all comprise several compensating units 202a ~ 202n, 203a ~ 203n.Each compensating unit all can independently to move turnover illuminated field along the direction of scanning y of illuminated field, and the direction of motion of two groups is contrary, and one group is moved along y-axis positive dirction, and another group is then moved along y-axis negative direction.
Compensating unit corresponding in two groups of described compensation assemblies, as 202a and 203a forms a compensating unit pair, its direction of motion is contrary, keep strokes, insertion is identical, to keep the symmetry of instantaneous field of view, cover the same area of illumination field of view, the illumination light energy distribution in common this region of adjustment.
Described compensation assembly 202 and 203, as shown in Figure 2, its compensating unit is strip thin-slab construction, sheet gauge grade, micron order etc., and front end (inserting one end of illuminated field) is corner cut rectangular shape.Two corner cuts can be symmetrical, and in also can using according to reality, the photic-energy transfer that throws light on make asymmetrical shape, and each corner cut accounts for a half-size scale (namely 1/2) of whole compensating unit width, or are other ratios such as 1/3,1/4 according to actual needs.In addition, different according to the slope of actual illumination Light Energy distribution, the pitch angle of two corner cuts needs corresponding with it, generally gets the angles be positioned between 0 ~ 90 ° such as 30 °, 45 °, 60 °.
Described compensation assembly 202 and 203, the transmitance distribution of the material used and material is identical, can by opaque material, also can be made by the material with certain transmitance, now transmitance obeys certain function distribution along the direction of insertion of compensating unit, but its transmitance can not be 1, namely can not adopt the material of complete printing opacity.
Described compensation assembly 202 and 203, compensation plane is two-layer arrangement, upper strata compensating unit hides the gap formed between adjacent two compensating units of lower floor, in like manner, lower floor's compensating unit also hides the gap formed between adjacent two compensating units in upper strata simultaneously, this avoid the light leak of gap location, avoid the new uneven distribution increased in illumination field of view.
Described uniformity compensating 103, be made up of multiple compensating unit, each compensating unit self-movement, affect the illumination intensity of certain area in illumination field of view, therefore its illumination field of view has been divided into several parts, and various piece, along the size in non-scan direction (x direction), determines the compensation precision of uniformity compensating, namely each several part size divided is less, and compensation precision is higher.Therefore, the compensation precision of uniformity compensating 103 depends on compensating unit size in the x-direction (width), and arrangement mode between each compensating unit and mode of motion.
The polygonized structure of the insertion illumination field of view end of compensating unit in the present invention, and compensating unit layering, staggered arrangement mode, makes it compared with prior art, same illumination field of view can be divided into more less zonings, there is higher illumination uniformity compensation precision.
Fig. 3 is the schematic diagram that the uniformity compensating of rectangular configuration individual layer arrangement divides illumination field of view, Fig. 4 is the schematic diagram that the uniformity compensating of compensating unit rectangular configuration bilayer arrangement divides illumination field of view, Fig. 5 is one of specific embodiments of the invention, and namely compensating unit is the schematic diagram that the uniformity compensating of corner cut rectangular configuration bilayer arrangement divides illumination field of view.By the contrast to above-mentioned three figure, the compensation ability of various forms of uniformity compensating can be seen, wherein, Fig. 3 is owing to being that individual layer is arranged side by side between its compensating unit 302a ~ 302n, illumination field of view is divided into the quantity some equal portions equal with compensating unit number by compensation system, the width of every portion equals the width of single compensating unit, and as shown in Figure 3, illumination field of view 201 is divided into 3011 ~ 3,014 four equal portions by 4 compensating units.Space periodic is greater than to the non-uniform illumination energy distribution of equal portions width, use this rectangular configuration individual layer to arrange can compensate, and space periodic is less than to the uneven energy distribution of equal portions width, as there is the uneven distribution in n cycle in equal portions 3011, this kind of uniformity compensating is then helpless, i.e. the uniformity compensating compensation precision of rectangular configuration individual layer arrangement equals the width of compensating unit.
As shown in Figure 4, use the uniformity compensating of rectangular configuration bilayer arrangement compensation system can be divided ability to illumination field of view to double.This compensation system superposes one deck compensating unit on the compensating unit of the individual layer arrangement shown in Fig. 3, and as shown in phantom in FIG., two-layer compensating unit is staggeredly placed, and hides mutually the gap formed between another layer two compensating unit.Such arrangement mode makes illumination field of view 201 be divided into 4011 ~ 4,018 eight equal portions, and be original 2 times, every equal portions width equals the half of single compensating unit width.Compensation precision due to compensation system equals the width that illumination field of view divides equal portions, and the compensation system that the compensation precision of this compensation system is arranged than individual layer doubles.But its compensating unit number is also many one times than the compensation system of individual layer arrangement, this will give Machine Design and the very large difficulty of Control System Design increase.
Fig. 5 is one of specific embodiments of the invention, i.e. the schematic diagram that the uniformity compensating of the double-layer staggered arrangement of corner cut rectangular configuration divides illumination field of view.Compensating unit is made corner cut rectangular configuration by it on the basis of the uniformity compensating of rectangular configuration bilayer arrangement, canted section is different from the compensation rate that non-canted section compares illumination field of view, thus be less part the illumination field of view Region dividing of a compensating unit impact, thus be 5011 ~ 5026 have 16 equal portions altogether by illumination field of view 201 Further Division, the uniformity compensating of ratio of precision rectangular configuration bilayer arrangement is doubled again, and it does not increase the compensating unit number of compensator, increase difficulty can not to Machine Design and Control System Design.
Fig. 6 is the uniformity compensating compensation effect comparison diagram of Fig. 3, Fig. 4, Fig. 5 tri-kinds of forms, and curve 601,602,603 is respectively the rectangular configuration individual layer arrangement of Fig. 3, the compensation effect curve of the rectangular configuration bilayer arrangement of Fig. 4 and corner cut rectangular configuration bilayer arrangement three kinds of compensation systems of Fig. 5.Because visual field division equal portions are minimum, equal portions width is maximum, and the compensation system compensation effect curve 601 of rectangular configuration individual layer arrangement is the most coarse, stepped curve.And the visual field division equal portions of corner cut rectangular configuration bilayer arrangement compensation system of the present invention are maximum, width is minimum, compensation effect curve 603 is the most level and smooth, and division equal portions place curve corresponding to the corner cut of its each compensating unit has certain slope, which increases the smooth effect of curve.The compensation effect curve 602 of rectangular configuration bilayer arrangement compensation system falls between, and the same with curve 601 is staircase curve, but ladder width is smaller, closer to Compensation Objectives curve.
Main thought of the present invention is that the insertion end of compensating unit is made certain shape, the different piece of shape blocks area difference when inserting illumination field of view to illumination light, the illumination field of view making compensating unit width corresponding is divided into multiple part with different compensation rate, match with the arrangement mode of compensating unit and mode of motion again, then can reduce the width of compensation system to the division equal portions of illumination field of view, thus improve the compensation precision of compensation system.
Thought accordingly, as shown in Figure 7, its front end of the compensating unit of uniformity compensating of the present invention (inserting one end of illumination field of view) is except can making the shape of corner cut rectangle (as Suo Shi 701 in Fig. 7), other polygon can also be made, structure as shown in 702 in Fig. 7, so that illumination field of view corresponding for compensating unit is divided into less, more division part, polygon can be symmetrical, also the photic-energy transfer that throws light in can using according to reality makes asymmetrical shape, every limit accounts for whole compensating unit width and is of a size of 1/3, 1/4 equal proportion, in addition, different according to the slope of actual illumination Light Energy distribution, the every pitch angle of polygon needs correspondence with it, generally gets the angles be positioned between 0 ~ 90 ° such as 30 °, 45 °, 60 °.Camber can be done in the front end of compensating unit, and as shown in 703 in Fig. 7, namely a compensating unit is divided into numerous infinitesimal region, can also be parabolic configuration certainly, or other is irregularly shaped, as taper or triangle etc.
Non-elaborated part of the present invention belongs to the known technology of those skilled in the art.
Those of ordinary skill in the art will be appreciated that, above embodiment is only used to the present invention is described, and be not used as limitation of the invention, as long as in spirit of the present invention, change the above embodiment, modification all will drop in the scope of claims of the present invention.
Claims (10)
1. an illumination uniformity compensating, comprises first, second compensation assembly along arranging perpendicular to systematic optical axis direction, each compensation assembly forms by multiple compensating unit, and first, the compensating unit number of the second compensation assembly is equal, corresponding compensating unit forms compensating unit pair, each compensating unit all can move along illumination field of view direction of scanning turnover illumination field of view, block partial illumination light, reach the object of adjustment scanning field of view integral energy homogeneity, it is characterized in that: described compensating unit is insert the thin plate that polygon or arcuate structure are made in one end of illumination field of view, it does not need the compensating unit number reducing compensating unit width or increase, while not increasing Machine Design and control difficulty, increase compensation system to numbers such as the divisions of illumination field of view, reduce the width dividing equal portions, thus improve the compensation precision of uniformity compensating.
2. illumination uniformity compensating according to claim 1, is characterized in that: described compensating unit is the thin plate of strip, and the one end of inserting illumination field of view is polygonal shape.
3. illumination uniformity compensating according to claim 2, is characterized in that: the polygon insertion end of described compensating unit, and often accounting for whole compensating unit width is of a size of 1/2,1/3 or 1/4 ratio; The pitch angle on every one side is between 0 ~ 90 °.
4. illumination uniformity compensating according to claim 1, is characterized in that: described compensating unit is strip thin plate, and the one end of inserting illumination field of view is the shape of corner cut rectangle.
5. illumination uniformity compensating according to claim 4, is characterized in that: each corner cut of described corner cut rectangle compensating unit accounts for that whole compensating unit width is of a size of 1/2 or 1/3,1/4 ratio; The pitch angle of each corner cut is between 0 ~ 90 °.
6. illumination uniformity compensating according to claim 1, is characterized in that: described compensating unit is strip thin plate, and the one end of inserting illumination field of view is the shape of arc.
7. according to the illumination uniformity compensating one of claim 1 to 6 Suo Shu, it is characterized in that: in first, second compensation assembly described, its all compensating unit is two-layer arrangement in compensation plane, upper strata compensating unit hides the gap formed between adjacent two compensating units of lower floor, and lower floor's compensating unit also hides the gap formed between adjacent two compensating units in upper strata simultaneously.
8. according to the illumination uniformity compensating one of claim 1 to 6 Suo Shu, it is characterized in that, described first and second compensation assembly full symmetrics, be distributed in illumination field of view both sides, compensating unit corresponding on first, second compensation assembly forms a compensating unit pair, its mode of motion full symmetric, namely inserts illumination field of view time consistency, insertion is equal, and direction is contrary.
9. illumination uniformity compensating according to claim 7, it is characterized in that, described first and second compensation assembly full symmetrics, be distributed in illumination field of view both sides, compensating unit corresponding on first, second compensation assembly forms a compensating unit pair, its mode of motion full symmetric, namely inserts illumination field of view time consistency, insertion is equal, and direction is contrary.
10. according to the illumination uniformity compensating one of claim 1 to 6 Suo Shu, it is characterized in that, the transmitance distribution of the material that described compensating unit uses and material is identical, can by opaque material, also can be made by the material with certain transmitance, now transmitance obeys certain function distribution along the direction of insertion of compensating unit, but its transmitance can not be 1, namely can not adopt the material of complete printing opacity.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201210187778.9A CN102722090B (en) | 2012-06-08 | 2012-06-08 | Illumination uniformity compensating device |
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| CN201210187778.9A CN102722090B (en) | 2012-06-08 | 2012-06-08 | Illumination uniformity compensating device |
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| CN110658689B (en) * | 2018-06-29 | 2021-02-05 | 上海微电子装备（集团）股份有限公司 | Method and device for compensating illumination uniformity of photoetching machine, illumination system and photoetching machine |
| CN109657402B (en) * | 2019-01-07 | 2021-02-26 | 中国科学院光电技术研究所 | Light intensity distribution modeling method and device, electronic equipment and storage medium |
| CN116243563B (en) * | 2022-09-09 | 2024-04-02 | 上海镭望光学科技有限公司 | Correction method of photoetching machine illumination uniformity correction device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200809920A (en) * | 2006-05-17 | 2008-02-16 | Canon Kk | Light blocking device and exposure apparatus |
| CN101221373A (en) * | 2008-01-25 | 2008-07-16 | 上海微电子装备有限公司 | Device for correcting illumination homogeneity |
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| JP2005012169A (en) * | 2003-05-22 | 2005-01-13 | Canon Inc | Exposure apparatus and device manufacturing method |
| US7362413B2 (en) * | 2004-12-09 | 2008-04-22 | Asml Netherlands B.V. | Uniformity correction for lithographic apparatus |
| US7173688B2 (en) * | 2004-12-28 | 2007-02-06 | Asml Holding N.V. | Method for calculating an intensity integral for use in lithography systems |
| WO2008053881A1 (en) * | 2006-11-01 | 2008-05-08 | Nikon Corporation | Dimmer plate, exposure apparatus, method of exposure and process for manufacturing device |
| EP2178107A4 (en) * | 2007-08-10 | 2011-04-13 | Nikon Corp | Lighting optical apparatus, photolithography equipment and device manufacturing method |
| US8350235B2 (en) * | 2009-07-27 | 2013-01-08 | Freescale Semiconductor | Semiconductor intra-field dose correction |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200809920A (en) * | 2006-05-17 | 2008-02-16 | Canon Kk | Light blocking device and exposure apparatus |
| CN101221373A (en) * | 2008-01-25 | 2008-07-16 | 上海微电子装备有限公司 | Device for correcting illumination homogeneity |
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