CN102656644A - Non-parallel grating arrangement with on-the-fly phase stepping, X-ray system and use - Google Patents
Non-parallel grating arrangement with on-the-fly phase stepping, X-ray system and use Download PDFInfo
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Abstract
The present invention relates to X-ray image acquisition technology in general. Employing phase-contrast imaging for X-ray image acquisition may significantly enhance the visibility of structures in images acquired. However, phase-contrast information may only be obtainable in a small detector region with subsequent image acquisitions requiring individual phase stepping states to allow reconstruction of an X-ray image. Accordingly, a grating arrangement for phase-contrast imaging is provided which may allow on the fly phase stepping during a field of view scan. According to the present invention a grating arrangement (1) for phase-contrast imaging is provided, comprising a first grating element (8) and a second grating element (10). Each of the first grating element (8) and the second grating element (10) comprises a trench structure. The trench structure comprises at least one trench region (9) and at least one barrier region (3). The at least one trench region (9) and the at least one barrier region (3) are at least locally arranged in parallel. The first grating element (8) and the second grating element (10) are arranged such that the trench structure of the first grating element (8) and the trench structure of the second grating element (10) are non-parallel comprising an angle alpha.
Description
Technical field
The present invention relates in general to the radioscopic image collection.More specifically, the present invention relates to adopt the IMAQ of match (phase-contrast).Particularly, the present invention relates to be used for to match imaging mounting for grating, x-ray system and relate at least one the use of mounting for grating in x-ray system, transmission x-ray system, CT system and tomography synthesis system.
Background technology
In the radioscopic image acquisition technique, the object of examine, patient for example is placed between the X ray generating apparatus or x-ray source and X-ray detector of X-ray tube for example.Possibly adopt collimating element by direction generation fladellum or the pencil-beam of x-ray source along X-ray detector.The examine object that is arranged in the path of X radiation depends on that its inner structure carries out spatial attenuation to X-ray beam.Through the X of the spatial attenuation radiation X-ray detector that arrives soon after, the intensity distributions of X radiation is determined and is converted into subsequently electric signal, to be used for the further processing and the demonstration of radioscopic image.
The two can be installed in X ray generating apparatus and X-ray detector on the frame, so that rotate around the object of examine.Through providing and changing, can obtain the three-dimensional reconstruction of object external morphology with respect to the aiming at and the corresponding rotation of collection subsequently of the different x-ray image of orientation of examine object.
Yet; Even within the inner different tissues of object; Special object possibly only have the decay or the difference in attenuation of less X radiation; Thereby causing the radioscopic image of decaying quite equably, this image has low contrast, and therefore hinders inner each important document (element) of object of distinguishing examine.Though the zones of different in the subject possibly have similar attenuation properties, they possibly influence the phase place of the X radiation that penetrates this object to a greater extent.
Thereby, can adopt the imaging that matches, so that the phase information of the X radiation through treating imaging object is carried out visual, particularly, this X radiation part at least is relevant X ray.Except the X ray transmission imaging of the amplitude fading of only considering the X radiation, matching imaging not only can be confirmed the absorbent properties of object to be formed images along projection line, but also the phase shift of the X ray that can confirm to be transmitted.The phase shift that is detected thereby extra information can be provided can be adopted this information, so that enhancing contrast ratio is confirmed material composition, this possibly cause the minimizing of X radiation dose.
Because the phase place of ripple possibly directly not measured, thereby can adopt through two or more wave interferences and convert phase shift to intensity modulated.
In differential matched imaging, the use of cone-beam geometry can constitute the restriction to the available size of X-ray detector element, particularly when phase place and/or absorption grating and the groove (trench) that is parallel to optical axis on time.In distance from the about 1m of x-ray source, the point that phse sensitivity descends with respect to the middle section of imaging system significantly apart from optical axis about+-3cm.This restriction possibly depended on grating character, visibility, distance and the angle of pencil-beam or fladellum especially.
Some that use, detect imaging applications or safe imaging applications for medical imaging are for example used, at least maybe be too little along the visual field that is less than 6cm of a direction of two-dimensional x-ray images and can not be rationally feasible.In addition, for the imaging that matches, the multiple image of necessary pickup area, this multiple image has individual phase place stepping state, so that image information is carried out preferred reconstruction.
Thereby, possibly be desirably in and reduce owing to the necessary collection stepping of the phase place stepping during images acquired information the time, be increased in the visual field of adopting the image that can obtain when matching imaging.
Summary of the invention
Thereby, be provided at the mounting for grating that permission scanned the visual field of expectation when (on the fly) phase place stepping immediately was provided.
According to example embodiment of the present invention, a kind of mounting for grating of the imaging that is used to match is provided, this mounting for grating comprises first optical grating element and second optical grating element.In first optical grating element and second optical grating element each all comprises groove structure, and wherein, said groove structure comprises at least one trench region and at least one barrier zone.Said at least one trench region is arranged to parallel in the part with at least one barrier zone at least; And wherein; First optical grating element and second optical grating element are arranged such that the groove structure of groove structure and second optical grating element of first optical grating element is not parallel, comprise angle [alpha].
According to another example embodiment of the present invention, a kind of x-ray system is provided, this system comprise x-ray source and also comprise the X-ray detector element according to mounting for grating of the present invention.Object can be disposed between x-ray source and the mounting for grating, and x-ray source and mounting for grating operationally be coupled, and makes it possible to obtain the image that matches of object.
According to another example embodiment of the present invention, mounting for grating according to the present invention is used at least one of x-ray system, CT system and tomography synthesis system.
In order to obtain the phase information of X-ray beam, can adopt interferometer.Preferably, object to be formed images is passed in relevant X radiation, and X-ray detector arrives soon after.Since maybe be direct Measurement Phase information, thereby the disappearing mutually or long mutually mutual implication of two or more wavefront that can adopt the intensity modulated that possibly cause surveying by X-ray detector.
Can be through between the object of examine and X-ray detector, providing phase-shifted grating or beam splitter grating to obtain corresponding interference.X radiation through the beam splitter grating thereby cause the interference pattern (pattern) of beam splitter grating back comprises the information about the phase shift of the relative position of its minimal value and maximum value within the X-ray beam, i.e. the corresponding local strength of X-ray beam.The intensity pattern of gained comprises minimal value and the maximum value with the distance that is in big approximate number micron usually.
Yet X-ray detector can only comprise and being in approximately ~ resolution of 50 to 150 μ m, and thereby may not differentiate the correspondingly fine structure of the interference pattern that is generated.Therefore, can adopt phase analyzer grating or absorber grating, comprise transmission and absorb stripe cell or the periodicity pattern in trench region and barrier zone, this pattern has the periodicity similar with interference pattern.
Through shining the beam splitter grating individually,, also can generate interference pattern in the position of analyser gratings even under the situation that does not have analyser gratings.Thereby, maybe be because the X-ray detector element that adopted only require analyser gratings, this does not provide interference figure or the spatial resolution of striped of enough height with direct detection beam splitter grating.Thus, can adopt analyzer.At a phase place stepping position, let striped maximum value after transversal displacement, transmit and arrive detector, can in golden groove, absorb this maximum value.
By the similar periodicity of analyser gratings, can generate the intensity modulated pattern at the back in the lip-deep analyser gratings of X-ray detector.Corresponding pattern can have bigger substantially periodicity, thereby this pattern can be surveyed by the X-ray detector with the resolution that is in 50 to 150 μ m.X-ray detector element pixel can be surveyed interference pattern, as average intensity value.In order to obtain the image that matches; Particularly in order to obtain differential phase shift; Can require the analyser gratings lateral excursion; Promptly along squinting perpendicular to the two grid or the direction of band of analyser gratings and beam splitter grating, these gratings are arranged to the fraction of the grating space p that can be in about 1 μ m parallel substantially with respect to the grating band.For example, can with from a grating gap or trench region change to for example about 4 times or 8 times of the position change in grating gap subsequently.The corresponding lateral excursion of carrying out with the fraction of grating space p can be called as the phase place stepping.X-ray beam through grating in the instance of single-phase stepping thereby comprise individual phase place stepping state.
Then, can from the X-ray detector element of two grid back during the phase place stepping of measuring of analyser gratings, observed intensity modulated extract phase shift to each position (for example to each phase place stepping state).Particularly,, for example have 4 or 8 positions of different phase stepping state, can obtain phase information through measuring a plurality of positions.Because X ray is incident to the incident angle on the grating, visibility can be regarded as reducing to bigger off-axis position with respect to the extending transversely of groove to grating.Also guarantee the detectivity of X-ray detector thus in order to ensure enough visibilitys to the X ray phase place; For example in system length; Be that distance between x-ray source and the X-ray detector element is approximately 1m; Energy is approximately 20-30kVp, and groove structure has under the situation of parallel construction, and the visual field can be limited to the size of about 6cm.The a solution that increases the visual field can be regarded as moving X-ray detector, obtains a plurality of subregions of visual field thus subsequently.Because each position for X-ray detector; Can require individual phase place stepping; 4 or the 8 individuals IMAQs that promptly for example have out of phase stepping state, thereby the combination of corresponding motion, displacement, inclination or the rotation of X-ray detector and corresponding phase place stepping possibly be the process of numerous length.
In the absorption contrast projection imaging of routine, stack is along the multiple object structure of incident X-rays direction in transmission or projected image.This possibly usually make confirms that individual configurations is complicated and thereby the readability of corresponding X ray is diminished.Can be through total radiation dosage being distributed on some angular views so that improve the improvement that obtains picture quality about the depth information of object inner structure.It is synthetic that corresponding technology can be called as tomography, and, can adopt should technology especially for gathering the three-dimensional volumetric images data.Corresponding system can require x-ray source and X-ray detector to be disposed on the frame, so that rotate around the object of examine.Likewise, can mobile x-ray source, and mobile detector thus, particularly with respect to the transverse movement of examine object.
Even in the imaging that matches, single projection also can comprise the structure of stack and thereby also benefit from tomography synthetic operation pattern.Therefore, employing can the synthetic system that matches of tomography can overcome the readability that diminishes through the stack of anatomical structure.
For example the requirement of enough fringe visibilities of the enough big intensity modulated in match imaging, particularly differential match imaging possibly impose restriction to the degree of freedom of the relative motion between x-ray source and the grating.Generally speaking, only can allow x-ray source along the relative motion of linear grating groove, thereby, through the tomography resultant motion of the edge direction parallel with the groove of the Si-gate lattice of grating is provided, from realizing that tomography is synthetic and the compatibility between the imaging of matching.Thereby, can be regarded as the incident angle of in plane, measuring of the X radiation to grating usefully perpendicular to linear grating groove, be not higher than specified level during the tomography scan synthesis, not increase to.
Also thereby through the visual field scanning X-ray detector expand the visual field through moving X-ray detector, may be required in each position that is directed against X-ray detector within the visual field and come the excute phase stepping.For example, in certain location, can require to have separately 4 or 8 phase place steppings of gathering stepping of out of phase stepping state.Subsequently; Can make the X-ray detector displacement; With gather with the visual field within the previous layout subregion of contiguous visual field substantially, adopt the phase place stepping of 4 or 8 IMAQ steppings of the image information that matches subsequently with second subregion that is used for acquisition field of view.Yet; Can not require that X-ray detector comes displacement with the size of expansion or the width of X-ray detector itself; But can be only come displacement with fraction (as 1/4 or 1/8) or its active area that is used for the X ray collection of the expansion of X-ray detector; Maybe even only come displacement with an X-ray detector element pixel; Parallel phase place stepping not only gather maybe with the radioscopic image information of the slightly different subregion of the visual field of previous subregion overlapping 3/4 or 7/8, but also gather radioscopic image information with the desired different phase stepping of the generation subsequently state that adopts the radioscopic image information that matches.Pixel-shift can allow maybe be in the detection in the out of phase stepping state in slightly different place.1/4 or 1/8 displacement can be interpreted as, and possibly be under the uniform situation in the district of the total pixel that comprises sub-pixel at object for example, and then pixel is utilized 1/4 or 1/8 phase step to come in to gather to have and such skew of measuring identical value.This maybe restricted quarter resolution.The for example sequential scanning through utilizing the phase place stepping or gather simultaneously all steppings or through above combination through the sub-pixel that utilizes phase shift can be imagined the combination of phase place stepping of counting the quantity of the displacement carried out and minimizing with specific pixel.
From practical angle, for example, about making according to equipment of the present invention, the groove of grating can preferred vertical in the plane of X-ray detector.
Routinely, beam splitter grating and analyser gratings can be by the silicon wafer manufacturings.For analyser gratings, possibly require other electroplating process, so that utilize for example golden high absorption material to fill said groove.Manufacture process can be for example begins with the coating of passivation layer, follows by etchant flow.Being passivated layer region covered possibly not influenced by etching process, thereby the groove pattern that is required usually.Yet, possibly be difficult to come etched trench along the direction that is different from perpendicular to the direction of wafer surface.For the pencil-beam X ray system that matches, the etching direction can depend on the position on the wafer consumingly, makes groove to focus on to be designed to after a while predefine position with the x-ray source position consistency.
Corresponding layout can be regarded as particularly in the scope of about 6cm the reason that the visibility of structure reduces when optical axis leaves.Particularly, for example under the situation of about 20-30keV, the distance of the about 1m between x-ray source and the X-ray detector can be restricted to about 6cm with detector size.
When adopting at least the partial coherence x-ray source, the imaging of can implementing valuably to match.Yet; Because relevant x-ray source can only be provided by for example synchrotron, other grating especially; Thereby can between the object in the beam path of x-ray source and X ray, adopt the source grating; To generate the relevant x-ray source of a plurality of individualities, for example, optical grating element utilizes absorbing material to come filling groove to make up approximating a plurality of μ focusing X-ray hot spot or line.Perhaps, can adopt x-ray source a plurality of individualities, that be concerned with substantially, for example distributed x-ray source is like the transmitter based on CNT.
In order to obtain the image that matches subsequently; Particularly in order to rebuild match image or the differential image that matches, require with respect to detector element pixel or the capable or detector element row of detector element and the out of phase stepping state of each image that matches of gathering at least from the image information that matches of being gathered.In other words, consider fixing detector element, the image request phase place stepping state that matches subsequently changes, with the reconstruction subsequently of permission to the image that matches of the image information of a plurality of collections.Under the situation of fixing detector, can pass through beam splitter grating G
1With respect to analyser gratings G
2The fraction of displacement grating period p is come the corresponding poor of acquisition phase stepping state, thereby gathers individual phase place stepping state.
Under the situation of the X-ray detector element that moves, can immediately realize corresponding phase place stepping according to the present invention, thereby realize the change of phase place stepping state.
According to the present invention, the groove structure through making one of optical grating element can obtain the individual phase place stepping state of each X-ray detector element pixel, pixel column or pixel column with respect to the groove structure inclination low-angle α of another optical grating element.Angle [alpha] can depend on especially as size, grating space and the requirement of X-ray detector element pixel/parameter of phase place stepping amount of state of expectation.For example, about the optical grating element spacing displacement at 2 μ m of 8 pixel columns, for example, for 8 different, individual phase place stepping states, for the pixel size of 150 μ m of supposition, the α maximal value is about 0.1 °.Under the situation of less pixel size, angle value can increase.
Under the situation of a groove structure with respect to the corresponding mounting for grating of another groove structure inclination or rotation; The phase place stepping can be considered to through the unit transverse with detector element and optical grating element move to detector row and thereby mounting for grating laterally moved to detector row provides, this possibly occur in the scan period of visual field.In other words, for example, with X-ray detector and mounting for grating size, for example depend on travel direction and displacement single file or when single-row, beam splitter grating G as an X-ray detector element of individual unit displacement pixel
1With analyser gratings G
2Corresponding layout comprise particularly single pixel, single file or single-row direction at X-ray detector toward each other different relative aligning when x-ray source is watched.In addition, can the optical grating element with groove structure of embodiment as squinting to the laterally discrete groove of having of each pixel column.Corresponding discrete lateral trench squints thereby can represent individual phase place stepping state.
For example, if the ad hoc structure of the object of examine can be by having beam splitter grating G
1With analyser gratings G
2The X-ray detector of layout of definition be listed as and survey, so, because the inclination of the optical grating construction of two gratings or become the angle, skew in the scanning motion or displacement possibly cause can be by have the grating G that aims at because of displacement relative to each other differently
1And G
2The identical structure surveyed of other X-ray detector element row.The corresponding skew of displacement is linear deflection or swing offset particularly.Yet, can imagine other displacements arbitrarily, this displacement can provide has out of phase stepping state, for example the aligned position of two gratings of 4 or 8 out of phase stepping states.
Thereby when comprising that having size scans through the visual field or move when gathering bigger radioscopic image less than the mounting for grating of the X-ray detector of visual field, phase place stepping state can be regarded as along with scanning motion immediately changes.Can not require single X-ray detector element pixel, row or row individuality and thereby the phase place stepping state of unique fully (unique).For example, if gather 4, the 8 or 9 individuals image that matches, so that calculate radioscopic image subsequently, then 4,8 or 9 individuals, different, unique phase place stepping states can be enough.Yet, in this case, possibly require to make mounting for grating and the displacement of X-ray detector element, make the ad hoc structure of examine object arrange, thereby be in different phase stepping state with respect to mounting for grating and X-ray detector.
For example; If 8 exemplary individuals phase place stepping states are provided; And thereby the mounting for grating that has cycle of 8 with respect to individual X-ray detector element pixel, row or row is provided; So, should avoid making mounting for grating and X-ray detector some pixel displacements with the multiple that equals cycle or cycle.For example, under the situation in cycle 8, can be preferred, should avoid when making identical set, making the scanning motion of mounting for grating and X-ray detector element with 8 pixel displacements with 9 pixels, 11 pixels, 13 or 15 displacements such as pixel.Detector can also be with 1,2,3,4,5,6 or 7 pixel displacement.
In addition, can also pass through to adopt two absorption gratings, but not a phase place and an absorption grating are carried out the imaging that matches.Thereby also can require phase place stepping according to present patent application.
Likewise, can require dynamically with the X radiation collimation, to pass through object so that guarantee the X radiation that only allows to be detected with respect to the X-ray detector element that moves.
Object can also be disposed between first optical grating element and second optical grating element, particularly between beam splitter grating and analyser gratings.
The X-ray detector element through or scanning or displacement movement on the visual field possibly be not required for pure transversal displacement, yet, can also be circular motion, sinusoidal motion, zigzag motion or even maybe be by the motion arbitrarily of computer system control.Likewise, can adopt above combination displacement.Hereinafter, especially in regard to mounting for grating and x-ray system other example embodiment of the present invention is described.Yet, should be noted that corresponding explanation is applied to the use of all mounting for gratings, x-ray system and mounting for grating.
Should be noted that, the single or a plurality of characteristics between the claim change arbitrarily and exchange and the entity of particularly being advocated be imaginabale and the scope that drops on present patent application with open within.
According to another example embodiment of the present invention, first optical grating element can be arranged to parallel substantially with second optical grating element.According to another example embodiment of the present invention, first optical grating element can be used as that the beam splitter grating provides and/or second optical grating element can be used as analyser gratings and provides.
The corresponding device that comprises beam splitter grating and analyser gratings can allow to gather the image information that matches.
According to another example embodiment of the present invention; Mounting for grating can also comprise the X-ray detector element with detector size; Wherein, the X-ray detector element can be arranged to substantially perpendicular in first optical grating element and second optical grating element at least one.
The X-ray detector element comprised allow the unit that possibly provide compact to the mounting for grating, with the collection image information that matches with the relation of each element definition relative to each other.Each element can be arranged to be close to substantially and maybe can be arranged to the distance with definition each other, thereby the gap between each element can be provided.
According to another example embodiment of the present invention, at least one in first optical grating element and second optical grating element is suitable for influencing the amplitude of electromagnetic radiation and at least one parameter of phase place.
Thereby optical grating element is used as the X ray active component and provides.According to another example embodiment of the present invention, α can be in about 1 ° to 0.01 ° scope, particularly 0.1 °, 0.2 ° or 0.3 °.According to another example embodiment of the present invention; The X-ray detector element can comprise the array of X-ray detector element pixel; Wherein, at least one in X-ray detector element pixel, X-ray detector element pixel column and the X-ray detector element pixel column can comprise individual phase place stepping state.
In other words; When correspondingly when the direction of x-ray source and examine object is watched; First optical grating element on the top of X-ray detector element and the layout of second optical grating element provide individual phase place stepping state, particularly are directed against individual phase place stepping state individuality, unique that do not have of X-ray detector element pixel, X-ray detector element pixel column and X-ray detector pixel column.Yet, can not require unique phase place stepping state, more properly, the minimum number of the special use of out of phase stepping state can be enough, for example 4 or 8.If the intensity level of " quasi sine shape " curve, then the corresponding quantity of IMAQ stepping can be regarded sampling as.4 different phase stepping states can be enough, because more individual stepping provides better signal quality, yet possibly require to increase acquisition time at interval, and possibly increase exposure dose.The geometry that depends on the optical grating element that is adopted can side by side be gathered a plurality of different phase stepping states.
For example, can be side by side, however in different positions, carry out the collection of out of phase stepping state.For example, the sub-pixel of four vicinities of formation pixel can comprise four kinds of different phase stepping states.Thereby, for pixel, can gather four kinds of different phase stepping states, yet, spatial resolution possibly reduced.
According to another example embodiment of the present invention, x-ray system can be suitable for gathering the image that matches that has greater than the visual field of detector size, and wherein, mounting for grating can displacement, and wherein, through the displacement of mounting for grating, can obtain the image that matches of visual field.
Thereby, through the motion of mounting for grating, particularly have the scanning motion of instant phase place stepping, can obtain the image that matches greater than the visual field of detector size.
According to another example embodiment of the present invention, the X-ray detector element can be suitable for the subregion of acquisition field of view.Therefore, total visual field can be greater than the size of X-ray detector element.
According to another example embodiment of the present invention, X-ray detector and/or mounting for grating can be suitable for scanning field of view.
Thereby, through scanning motion, can obtain the visual field, this visual field can not receive the restriction of X-ray detector element size, but receives the restriction of the enforcement of scanning motion.
According to another example embodiment of the present invention, X-ray detector element and/or mounting for grating can from be used to gather first match image information primary importance and/or orientation be moved to gather second match information the second place and/or orientation.
Therefore; Size through can being substantially the X-ray detector element or for example 1/4,1/8 or 1/9 fraction that should size or even the only displacement of an X-ray detector pixel; Can gather the different information that matches, can adopt this information subsequently to generate the radioscopic image of visual field.
According to another example embodiment of the present invention, x-ray system can also comprise the 3rd optical grating element, particularly source grating or source optical grating element.
Through between the examine object in the path of x-ray source and X-ray beam the source grating being provided, can adopt the irrelevant x-ray source of possibility, with the imaging that matches.
According to another example embodiment of the present invention, x-ray source and/or the 3rd optical grating element can carry out displacement with respect at least one of first optical grating element, second optical grating element, object and X-ray detector element.
In this article, the different visuals field that can be through being used to provide the X radiation of passing through object that arrives the grating and the X-ray detector that arrives soon after or projection, x-ray source and/or the 3rd optical grating element implement scanning motion with respect to for example motion of objects.
With reference to the described embodiment of hereinafter, these and other aspect of the present invention will become obvious and be able to illustrate.
Below with reference to accompanying drawing example embodiment of the present invention is described.
Illustrating in the accompanying drawing is schematic.In different accompanying drawings, similar or components identical provides similar or identical reference marker.
Accompanying drawing is not proportionally drawn, yet, can describe qualitative ratio.
Description of drawings
Fig. 1 a-c shows the example embodiment according to the equipment of the imaging that is used to match of the present invention;
Fig. 2 shows the example embodiment according to interference pattern of the present invention;
Fig. 3 a, b show the exemplary image that matches of the collection according to the present invention;
Fig. 4 shows the exemplary visibility of interference fringe according to the present invention with respect to the off-axis position of detector element pixel;
Fig. 5 a, b show the example embodiment that has the mounting for grating of X-ray detector element according to of the present invention; And
Fig. 6 shows another example embodiment according to optical grating element of the present invention.List of reference signs
1 mounting for grating
2 x-ray sources
3 barriers zone
4 source grating G
0
5 X radiation
6 objects
7 optical axises
8 beam sorter grating/phase grating G
1
9 trench regions
10 analyser gratings/absorber grating G
2
11 base substrate
12 X-ray detector elements
13 barriers zone/cross section barrier element
14 focal spots
16 rectilinear motions
19 trench regions
The elongated portion of 20 cross section barrier elements
Embodiment
With reference now to 1a-c,, described example embodiment according to the equipment of the imaging that is used to match of the present invention.
Fig. 1 a shows the three dimensional representation of example embodiment of the equipment of the imaging that is used to match.Sizable x-ray source 2 is arranged to adjacent source grating 4.Because x-ray source 2 is with respect to the size of the wavelength of institute's radiation emitted, it is noncoherent that x-ray source 2 can be considered to, thereby adopt source grating G
04, so that a plurality of single relevant x-ray source of describing like the four-headed arrow among Fig. 1 b is provided.
Analyser gratings 10G
2Be disposed in beam splitter grating G
18 and X-ray detector 12 between.Distance between source grating and the beam splitter grating 8 is depicted as l, and the distance between beam splitter grating 8 and the analyser gratings 10 is depicted as apart from d.Come from beam splitter grating 8G along the direction of X-ray detector
1A plurality of ripples arrive analyser gratings 10G
2, on the surface of X-ray detector 12, produce intensity modulated pattern (referring to Fig. 2) subsequently.
Through with respect to analyser gratings 10 offset beam splitter gratings 8, thus relative to each other and displacement with grating, particularly with the grating period p
1Or p
2Fraction carry out displacement, can obtain a plurality of intensity modulated of causing by the phase place stepping by image detector 12 because individual phase place stepping state is different between individual phase place stepping, i.e. G
1With respect to G
2Aligning different.Therefore, through a plurality of Mores (Moir é) pattern, can generate the radioscopic image of examine object.Apart from l can be about 50-150cm, 80cm for example, yet, even can imagine several meters, and can be about 2-20cm apart from d, depend on Taibo (Talbot) order of magnitude, emittance and the grating space in the design of interferometer, selected.The first mark talbot distance for the emittance of 17keV, is in about 50mm, perhaps, for the emittance of 25keV, is in about 120mm.The higher order of magnitude of talbot distance, for example n=3,5,7 is integer multiples of these distances.Can through equation 1 calculate the first mark talbot distance apart from d, M=is because the amplification factor that causes of beam geometries, p
1=phase grating G
1Grating space, the wavelength of the average radiation energy of and λ=be used to match:
With reference now to Fig. 1 c,, described grating G
0To G
2Exemplary cross section.Grating G
0And G
2Can be filled with gold (Au) especially.Can realize grating G based on the material of silicon with the groove that grating is provided through etching
1And G
2The grating period p of source grating
0Can be in about 200 μ m, in addition littler, G
1The grating period p
1Can be exemplary, be in the scope of 2 to 6 μ m, particularly 4 μ m, and G
2The grating period p
2Can be exemplary, be in the scope of 1 to 3 μ m, particularly 2 μ m.
With reference now to Fig. 2,, described example embodiment according to interference pattern of the present invention.
Fig. 2 has described at beam splitter grating G
18 with analyser gratings G
2The interference pattern of creating between 10 proves characteristic distance d
1, d
2And d
3In grid have image effect (Tabo effect) of one's own.The relative position of minimal value and maximum value can particularly depend on and is incident on beam splitter grating G
1On the phase shift of wavefront.d
1Can be in particular for big approximate number cm.If monochromatic plane wave is incident on the beam splitter grating; This causes
particularly phase shift of π; Intensity is divided into two main orders of diffraction, the cancellation zero level.Interference effect causes from G
1The discrete distance place of playing downstream is incident in G
1On wavefront certainly the imaging effect.This effect is called as Tabo effect.For example, locating apart from pl^2/8* λ (lambda), the phase modulation (PM) of the incident wavefront that is caused by G1 is transformed to the intensity modulated with double frequency.Analyser gratings is sampled to these modulation, and allows to measure by the phase gradient that causes via phase step and then the object to the X ray wavefront.
With reference now to Fig. 3 a, b,, described according to the present invention the exemplary image that matches of collection.
In Fig. 3 a, exemplary four width of cloth images of the object that phase step through adopting four phase place steppings and then collection comprise individual bubble also thereby are gathered four individuals phase place stepping state a-d.Apart from x
1-x
4With grid G
1With respect to G
2Displacement relevant, to create intensity modulated.From x
1-x
4The entire motion that rises is at grating G
2One-period within (<2 μ m).Absorber grid or analyzer grid G
2The direction x skew that 10 edges are parallel with grating planar.The Wave-front phase difference that two position sets and " 2 " are located can be from for example to four sampling location x Fig. 3 a
1-x
4The phase shift of measured intensity modulated
Extract.
With reference now to Fig. 4,, described the exemplary visibility of interference fringe according to the present invention with respect to the off-axis position of detector element pixel.
Can understand the degeneration of the fringe visibility of the off-axis position that depends on detector pixel from Fig. 4.5 or bigger fringe visibility can be considered to provide reasonably matching of being used for that image generates and handling.Three kinds of functions are provided in Fig. 4, and these three kinds of functions depend on the grating G that the darker groove in the grating is provided
2The optical grating construction of (referring to Fig. 1 c), for example 35 μ m obtain spreading all over the for example more shallow grating depth H of 15 μ m
2Weaken from the axle visibility.As understandable from Fig. 4, the both sides collimation must be lower than 6cm, thus Δ x should<3cm, thereby will be restricted to about 6cm as the match available size of the planar detector in forming images that matches of breast photography of for example differential.
With reference now to Fig. 5 a, b,, described the example embodiment that has the mounting for grating of X-ray detector element according to of the present invention.
For example second optical grating element of first optical grating element of beam splitter grating 8 and for example analyser gratings 10 is arranged to and is parallel to substantially each other and parallel with X-ray detector element 12.Each of source grating 8 and analyser gratings 10 all comprises base substrate 11, and individual barrier zone 3 is disposed on this base substrate 11.Between barrier zone 3, be furnished with trench region 9.The groove structure or the optical grating construction of the continuous formation optical grating element 8 of barrier zone 3 and trench region 9.
In Fig. 5 a, the groove structure of analyser gratings 10 is with respect to the optical grating construction of beam splitter grating 8 and X-ray detector element arrays device and exemplarily angled.Yet, can also imagine that the groove structure of analyser gratings 10 is parallel with the array structure of X-ray detector element, beam splitter grating 8 tilts with angle [alpha].
In Fig. 5 a, X radiation 5 exemplarily is depicted as the pencil-beam from x-ray source 2 emissions with focal spot 14.Object 6 is disposed in the pencil-beam of X radiation 5, and X radiation 5 penetrates object 6, and the beam splitter grating 8 that arrives soon after, analyser gratings 10 are last, arrives X-ray detector element 12, with the generation image information that matches.
With reference now to Fig. 5 b,, described the scanning motion of mounting for grating 1.Mounting for grating 1 in having the scanning or the scanning motion of direction of motion for example with the linear mode displacement.Through scanning motion; Can obtain to have image, cause instant phase place stepping owing to beam splitter grating 8 and analyser gratings 10 concern with respect to the mounting for grating of automatically arranging again of the object 6 of x-ray source and examine greater than the visual field of the size of X-ray detector 12.
With reference now to Fig. 6,, described another example embodiment according to optical grating element of the present invention.
Optical grating element according to Fig. 6 is exemplary, yet analyser gratings 10 according to like characteristic described above, can also be a phase-shifted grating particularly.The optical grating construction of the analyser gratings 10 of Fig. 6 is included in groove structure discrete on the cross section, and this groove structure comprises barrier zone 13 and trench region 19.Trench region can provide the for example filling material of the high z metal of gold (Au) of the employing in Fig. 6, do not described individually especially.The individual body section barrier element that constitutes barrier zone 13 is arranged on the cross section and disperses the elongated portion 20 with length.Elongated portion 20 can be in 1,2,3,4,5,6,7,8 or the order of magnitude of multidetector pixel more especially.
Individual body section barrier element can be considered to aim at abreast substantially with the groove structure of another optical grating element of the for example beam splitter grating of in Fig. 6, not describing 8 separately.The cross section barrier element that each cross section barrier element extremely is close to incremental displacement, thereby, when adopting another optical grating element, possibly cause different phase stepping state.Can also imagine that the optical grating element of Fig. 6 not only comprises like the discrete groove structure of describing, but also in addition as described above with respect to another optical grating element and angled.
The transversal displacement of the cross section barrier element of Fig. 6 can also comprise sinusoidal shape or curved shape.
Should be noted that term " comprises " does not get rid of other elements or step, and " one " or " one " does not get rid of a plurality of.Likewise, can the element of describing with reference to different embodiment be made up.
Should also be noted that the reference marker in claims should not be interpreted as the scope of restriction claims.
Claims (15)
1. mounting for grating (1) of imaging that is used to match comprises:
First optical grating element (8); And
Second optical grating element (10);
Wherein, each in said first optical grating element (8) and said second optical grating element (10) all comprises groove structure;
Wherein, said groove structure comprises at least one trench region (9) and at least one barrier zone (3);
Wherein, said at least one trench region (9) is arranged to parallel in the part with said at least one barrier zone (3) at least; And
Wherein, said first optical grating element (8) and said second optical grating element (10) are arranged such that the said groove structure of said groove structure and said second optical grating element (10) of said first optical grating element (8) is local at least not parallel.
2. according to the described mounting for grating of aforementioned claim,
Wherein, said first optical grating element (8) is arranged to parallel substantially with said second optical grating element (10).
3. according to a described mounting for grating in the aforementioned claim,
Wherein, said first optical grating element (8) is used as beam splitter grating (8) provides; And/or
Wherein, said second optical grating element (10) is used as analyser gratings (10) provides.
4. according to a described mounting for grating in the aforementioned claim, also comprise:
X-ray detector element (12) with detector size;
Wherein, said X-ray detector element (12) is arranged at least one that is parallel to substantially in said first optical grating element (8) and said second optical grating element (10).
5. according to a described mounting for grating in the aforementioned claim,
Wherein, at least one in said first optical grating element (8) and said second optical grating element (10) is suitable for influencing the amplitude of electromagnetic radiation and at least one parameter in the phase place.
6. according to a described mounting for grating in the aforementioned claim,
Wherein, the said groove structure of the said groove structure of said first optical grating element (8) and said second optical grating element (10) comprises angle [alpha]; And
Wherein, α is in about 1 ° to 0.01 ° scope, particularly 0.1 °, 0.2 ° or 0.3 °.
7. according to a described mounting for grating in the aforementioned claim,
Wherein, said X-ray detector element (12) comprises the array of X-ray detector element pixel; And
Wherein, at least one in X-ray detector element pixel, X-ray detector element pixel column and the X-ray detector element pixel column comprises individual phase place stepping state.
8. x-ray system comprises:
X-ray source (2);
Also comprise X-ray detector element (12) according to each the described mounting for grating (1) in the aforementioned claim;
Wherein, object (6) can be disposed between said x-ray source (12) and the said mounting for grating (1);
Wherein, said x-ray source (12) operationally is coupled with said mounting for grating (1), makes it possible to obtain the image that matches of said object (6).
9. x-ray system according to claim 8,
Wherein, said x-ray system is suitable for gathering the image that matches that has greater than the visual field of said detector size;
Wherein, said mounting for grating (1) can displacement; And
Wherein, through the said mounting for grating of displacement (1), can obtain the image that matches of said visual field.
10. according to Claim 8 or 9 described x-ray systems,
Wherein, said X-ray detector element (12) is suitable for gathering the subregion of said visual field.
11. a described x-ray system in 10 according to Claim 8,
Wherein, said X-ray detector element (12) and/or said mounting for grating (1) are suitable for scanning said visual field.
12. a described x-ray system in 11 according to Claim 8,
Wherein, said X-ray detector element (12) and/or said mounting for grating (1) can from be used to gather first match image information primary importance and/or orientation be moved to be used to gather second match information the second place and/or orientation.
13. a described x-ray system in 12 also comprises the 3rd optical grating element (4), particularly source grating (4) according to Claim 8.
14. a described x-ray system in 13 according to Claim 8,
Wherein, said x-ray source (2) and/or said the 3rd optical grating element (4) can carry out displacement with respect in said first optical grating element (8), said second optical grating element (10), said object (6) and the said X-ray detector element (12) at least one.
15. according at least one the described mounting for grating (1) in the claim 1 to 7 at x-ray system, CT system, breast photography x-ray system, detect the use at least one of x-ray system, safe x-ray system, industrial X-ray system and tomography synthesis system.
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US8848863B2 (en) | 2014-09-30 |
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