CN102643011A - Structure for improving melting uniformity of borosilicate glass - Google Patents
Structure for improving melting uniformity of borosilicate glass Download PDFInfo
- Publication number
- CN102643011A CN102643011A CN2012100880479A CN201210088047A CN102643011A CN 102643011 A CN102643011 A CN 102643011A CN 2012100880479 A CN2012100880479 A CN 2012100880479A CN 201210088047 A CN201210088047 A CN 201210088047A CN 102643011 A CN102643011 A CN 102643011A
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- China
- Prior art keywords
- fritting
- glass
- district
- furnace
- admixtion
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B3/00—Charging the melting furnaces
- C03B3/02—Charging the melting furnaces combined with preheating, premelting or pretreating the glass-making ingredients, pellets or cullet
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/18—Stirring devices; Homogenisation
- C03B5/193—Stirring devices; Homogenisation using gas, e.g. bubblers
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Abstract
The invention discloses a structure for improving the melting uniformity of borosilicate glass, aiming at achieving the purposes of improving the melting uniformity of the borosilicate glass through reducing the volatilization of boron on a mixture surface and a glass liquid surface. The structure is characterized by comprising a pre-melting area which is provided with at least one mixture at a tank furnace feeding area. Through the structure, the flying of the mixture entering into a furnace can be reduced, the distance from a feeder to a glass liquid surface is decreased, the temperature of a flame space at the discharge port of the tank furnace is lowered, the retention time of aluminum-layer-rich glass melt at the tank bottom in the furnace is shortened, and gas is blown into the glass melt so as to achieve the purpose of homogenizing the glass melt.
Description
Technical field
The invention belongs to the manufacturing technology field of TFT-LCD glass substrate, relate to the process of founding, particularly solve the method and apparatus that borosilicate is founded problem of non-uniform at borosilicate.
Background technology
The glass substrate that is used for TFT-LCD; Need forming nesa coating, insulating film, semi-conductor (polysilicon, amorphous silicon etc.) film and metallic membrane on bottom base plate glass surface through technology such as sputter, chemical vapor deposition (CVD)s; Form various circuit and figure through optical lithography then, if glass contains alkalimetal oxide (Na
2O, K
2O, Li
2O), alkalimetal ion diffuses into deposited semiconductor material in heat treatment process, infringement semiconductor film characteristic, and therefore, glass is answered the alkali-free MOX, must adopt non-alkali glass, and first-selected is with SiO2, Al
2O3, B
2O3 and alkaline earth metal oxide R0 (R=Mg, Ca, Sr, Ba) grade is the aluminiu-boron silicate glass without alkali of principal constituent.
Up to the present, the production flat-panel screens has three kinds of main manufacturing technologies with glass substrate, is respectively float glass process, slot draw method and overflow scorification.The glass baseplate surface that float glass process is produced can produce scar and concavo-convex, needs to polish through surface grinding again, and polishing process is expensive and time-consuming, can produce broad glassy product and the bigger advantage of output but have; The production of small area substrate during the slot draw method only is applicable to; The overflow fusion technology can output have the surperficial ultra-thin glass substrate of two pristine glasses; Compare with the slot draw method with float glass process; Can exempt post-treatment processes such as grinding or polishing, in the flat-panel screens manufacturing processed, also not note simultaneously because of having original simultaneously and the different glass surface that contacts being arranged with liquid tin; Or contact to some extent with grinding medium and cause glass surface nature difference etc., oneself becomes the main flow of ultra-thin flat glass moulding.The production of glass substrate generally comprises step: (1) batching and fusion; (2) clarification and homogenization; (3) cooling; (4) moulding; (5) annealing, cutting, check and packing etc.
The fusion operation is key and the prerequisite that makes high quality glass, but contains a large amount of Al in the non-alkali glass batching
2O, B
2The O3 composition, B wherein
2O3 at high temperature is a kind of volatile material; Changed the structure of original glass ingredient after the boron volatilization, the glass metal surface sediment lighter silicon-rich layer, heavier rich aluminium lamination has been piled up in the glass bottom; Cause the uneven problem of glass melting, influence final quality product.
The volatilization of boron oxide can be divided into 3 stages.Fs, along with temperature raises, boric acid changed into HBO successively before 300 ℃
2, H
2B
2O
4, B
2O
3With the compound of other boron oxides and water, these compounds have lower fusing point and boiling point (like HBO
2236 ℃ of boiling points), therefore, the appearance of a large amount of boron matter liquid raises the vp of this stage boron oxide rapidly, causes B
2O
3Evaporation rate quite big, this stage B
2O
3Volatile quantity account for omnidistance volatile quantity about 28%.
Subordinate phase is in the formation stage of borosilicate and glass (greatly about 300～1000 ℃), this stage along with temperature raises, various salts begin to resolve into nascent state oxidation thing, like CaO, Al
2O
3Deng.These oxide compounds have the good chemical reactive behavior, form all cpds with higher melt with boron oxide, and its corresponding saturated vapor pressure is just lower, and therefore, the rate of volatilization of boron slows down, and this stage boron volatile quantity accounts for 63% of omnidistance volatile quantity.
Phase III, this moment, boron volatilization reality only took place on the glass metal surface owing to the generation of a large amount of glass metals at 1000～1550 ℃; Evaporation rate depends on the velocity of diffusion of boron oxide in glass metal, and full-bodied glass metal makes boron oxide become very little to the velocity of diffusion on surface, and this moment, the volatile quantity of boron was very little; More than 1400 ℃; Because the viscosity of glass metal significantly descends, and make the volatile quantity of boron slightly be the trend of increase, the volatile quantity of this stage boron oxide accounts for 9% of omnidistance volatile quantity.
The volatilization that can find out boron mainly occurred in before 1000 ℃, and the volatilization that how to reduce this stage boron is the key of dealing with problems, and reducing the glass metal surface temperature simultaneously also is the thinking of dealing with problems.
Summary of the invention
The present invention is directed to borosilicate and the uneven problem of dissolving takes place, a kind of uneven method and structure of dissolving that overcomes is provided, improve the fusion quality, for operation production high quality glass in back creates conditions in the fusion stage.
Technical scheme of the present invention is to reduce the volatilization of boron in admixtion and the glass metal, and the component of stabilized glass overcomes glass and dissolves uneven generation; Another technical scheme is to reduce the influence of the rich aluminium lamination stores in glass metal bottom to whole glass ingredient, reaches the purpose that solves the inhomogeneous generation of dissolving.
A kind of minimizing material charging region admixtion boron evaporable structure is included in the fritting district that the tank furnace material charging region has an admixtion at least, and the fritting district provides the admixtion surface that the condition of solid-solid reaction takes place rapidly, reduces the volatilization of boron at high temperature of powdery admixtion; There is extension in the fritting district to the tank furnace outside, shortens the length on material mountain in the tank furnace.
The discharge end in said fritting district is connected with tank furnace internal high temperature space, and the fritting district has a batch feeding end and a discharge end at least.
Said fritting district comprises antetheca, left and right sides wall and loam cake, and antetheca, left and right sides wall and loam cake all use non-metallic refractory to build by laying bricks or stones.
Longitudinal length D3 length in said fritting district is more than or equal to 0.5 times of level.
Said fritting district can have at least one dog-house, and each dog-house can hold at least one batch charger.
A kind of minimizing glass metal surface boron evaporable method, the admixtion of material charging region is by both sides electrode equipment heating and melting; The supporting cold gas compensating port in combustion rifle hole, tank furnace discharge port place.
Said cold gas is an air or oxygen.
A kind of structure that reduces the accumulation of the rich aluminium lamination of furnace bottom, the discharge outlet of furnace lower edge is less to the distance of tank furnace, avoids the accumulation of rich aluminium lamination glass melt in smelting furnace at the bottom of the pond, it is characterized in that this distance is smaller or equal to 0.25 times of level.
A kind of method of using gas homogenizing glass melt, with gas from the pond pucking go into glass melt, make the glass melt homogenizing, the device that blasts gas is positioned at back 2/3 zone of tank furnace longitudinal length, i.e. D2=2D1.
It is said that what blast gas can be air or oxygen.
Realize that method of the object of the invention is, in admixtion fritting district of discharge end increase of admixtion, the admixtion that gets into the fritting district rose to before 1000 ℃ in temperature, produced a large amount of boron volatile matters and was limited in the less space.Along with the rising of temperature, ruckbildung has appearred in the admixtion on surface, material mountain, intercepts boron oxide and further volatilizees.There is the extension of certain depth in the fritting district to the tank furnace inboard, increases the fritting regional space, shortens the length on material mountain in the tank furnace, avoids expecting the avalanche on mountain, improves dissolved stability.
Realize that method of the object of the invention is, both sides, admixtion material mountain are not provided with gas-operated thermal bath facility, reduce the combustion gas surging force admixtion is caused the phenomenon of flying upward of dust, reduce the volatilization of admixtion boron; The supporting cold gas compensating port in tank furnace discharge port combustion rifle hole increases a certain amount of cooling gas in stove, reduce the temperature on this glass metal surface, zone, reduces the volatilization of glass metal surface boron.
Realize that another method of the object of the invention is, guarantee discharge outlet of furnace to the tank furnace bottom less distance, reduce the accumulation of rich aluminium lamination glass melt in smelting furnace at the bottom of the pond, make after flowing into the rich aluminum material in the operation glass melt even as far as possible.
Realize that another method of the object of the invention is, at the bottom of the pond, increase bubbling device, through the stirring action of gas, glass metal stir, homogenizing, the bubble that blasts simultaneously can also be taken away the small bubbles in the glass melt, plays clarifying effect.
Description of drawings
Fig. 1 is a side-looking master map of the present invention.
Fig. 2 is that an instance A-A of the present invention is to view.
Fig. 3 is that another instance A-A of the present invention is to view.
Embodiment
Fig. 1 is the cross-sectional view in glass-melting furnace that arrives 120 involved in the present invention and fritting zone 110, and it comprises glass-melting furnace 120, and it is the container of batch melting and generation glass metal.Smelting furnace 120 is made up of resistant to elevated temperatures refractory materials usually.Admixtion 131 is sent into glass-melting furnace 120 by feed appliance 140 in the present invention, after admixtion 131 enters into glass-melting furnace 120, is deposited near the antetheca 111 of glass-melting furnace 120.Because admixtion 131 produces the boron volatilization at metal line 142 with top under hot environment, glass ingredient changes, and the dissolving non-uniform phenomenon has appearred in glass metal, forms lighter silicon-rich layer 132 on the glass metal surface, forms rich aluminium lamination 133 in smelting furnace 120 bottoms.The glass metal of fusion homogenizing flows out smelting furnace 120 through discharge port 122 and enters into down operation.
Fritting district 110 is made up of tank furnace antetheca 111 (121), left and right sides wall 112 (212) and loam cake 114, is positioned at tank furnace foremost.Be deposited in fritting district 110 after admixtion 131 gets into tank furnace, because only there is a pair of heating electrode these both sides, position, the top, space does not have gas-operated thermal bath facility 143, belongs to temperature lowermost extent in the tank furnace.Fritting district 131 longitudinal length D3 have increased the length on material mountain, are tended towards stability in the material mountain, have reduced being exposed to the above part of liquid level.
Contain a large amount of B in the borosilicate glass component
2O
3, and the HBO that forms
2, H
2B2O
4, they are easy evaporable materials under hot environment, especially before 1000 ℃.Boron volatilization phenomenon in the fritting district 110 is limited in the tank furnace front end.Along with the rising of admixtion 131 temperature, the surface is softening, and volatilization is blocked, and perhaps begins to get into solution inside, and the volatilization of boron begins to weaken.
Boron evaporable glass metal has taken place in part, the phenomenon of uneven components occurred, the upper strata silicon-rich layer 132 that proportion is lighter adrift, and lower floor is depositing the heavier rich aluminium lamination 133 of proportion.The present invention has bubbling device 151 at the bottom of pond, the later half district of tank furnace, the rising power that gets into the bubble of glass metal at the bottom of the pond has played stirring effect to glass metal, the formation of minimizing pond bottom sediments layer, and the clear liquor to glass metal plays partial action simultaneously.
Cold gas compensating port 141 of the present invention continues the two-way mirror (non-foam is floating) of tank furnace discharging top is replenished cooling gas, reduces the glass metal surface temperature, reduces the boron substance volatilization, promotes discharge port 122 glass metals to form convection current, reaches homogenizing.
At the bottom of being created in the pond, form the rich aluminium lamination 133 heavy than anharmonic ratio.Discharge port 122 remains to small distance at the bottom of the pond, and operation can discharged or flow into down to the rich aluminium lamination 33 that is deposited at the bottom of the pond as early as possible.
Fig. 2 be the A-A of one embodiment of the invention to vertical view, antetheca 111 and left and right sides wall 112 among this embodiment, and loam cake 114 forms fritting districts 110, has at least a batch charger 140 to tank furnace 120 admixtion 131 to be provided.
Fig. 3 be the A-A of another embodiment of the present invention to vertical view, two fritting districts 210 are arranged among this embodiment, respectively by antetheca 211 and left and right sides wall 212, and loam cake 114 forms, each fritting district is by 1 independently batch charger 140 feeding.Have at least a batch charger 140 admixtion 131 to be provided in this system to tank furnace 120.The above only is preferred embodiment of the present invention, is not the present invention is done any pro forma restriction; Though the present invention discloses as above with preferred embodiment; Yet be not in order to limiting the present invention, anyly be familiar with the professional and technical personnel, in not breaking away from technical scheme scope of the present invention; When the method for above-mentioned announcement capable of using and technology contents are made a little change or be modified to the equivalent embodiment of equivalent variations; In every case be the content that does not break away from technical scheme of the present invention, to any simple modification, equivalent variations and modification that above embodiment did, still belong in the scope of technical scheme of the present invention according to technical spirit of the present invention.
Claims (10)
1. one kind is reduced material charging region admixtion boron evaporable structure; It is characterized in that: be included in the fritting district that the tank furnace material charging region has an admixtion at least; The fritting district provides the admixtion surface that the condition of solid-solid reaction takes place rapidly, reduces the volatilization of boron at high temperature of powdery admixtion; There is extension in the fritting district to the tank furnace outside, is used to shorten the length on material mountain in the tank furnace.
2. structure as claimed in claim 1 is characterized in that: the discharge end in said fritting district is connected with tank furnace internal high temperature space, and the fritting district has a batch feeding end and a discharge end at least.
3. structure as claimed in claim 1 is characterized in that: said fritting district comprises antetheca, and left and right sides wall and loam cake, antetheca, left and right sides wall and loam cake all use non-metallic refractory to build by laying bricks or stones.
4. structure as claimed in claim 1 is characterized in that: longitudinal length D3 length in said fritting district is more than or equal to 0.5 times of level.
5. structure as claimed in claim 1 is characterized in that: said fritting district can have at least one dog-house, and each dog-house can hold at least one batch charger.
6. one kind is reduced glass metal surface boron evaporable method, and it is characterized in that: the admixtion of material charging region is by both sides electrode equipment heating and melting; The supporting cold gas compensating port in combustion rifle hole, tank furnace discharge port place.
7. method as claimed in claim 6 is characterized in that: said cold gas is an air or oxygen.
8. structure that reduces the accumulation of the rich aluminium lamination of furnace bottom, it is characterized in that: the discharge outlet of furnace lower edge is less to the distance of tank furnace, avoids the accumulation of rich aluminium lamination glass melt in smelting furnace at the bottom of the pond, and this distance is smaller or equal to 0.25 times of level.
9. the method for a using gas homogenizing glass melt is characterized in that: with gas from the pond pucking go into glass melt, make the glass melt homogenizing, the device that blasts gas is positioned at back 2/3 zone of tank furnace longitudinal length, i.e. D2=2D1.
10. method as claimed in claim 9 is characterized in that: said what blast gas is air or oxygen.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012100880479A CN102643011A (en) | 2012-03-29 | 2012-03-29 | Structure for improving melting uniformity of borosilicate glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012100880479A CN102643011A (en) | 2012-03-29 | 2012-03-29 | Structure for improving melting uniformity of borosilicate glass |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102643011A true CN102643011A (en) | 2012-08-22 |
Family
ID=46656134
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012100880479A Pending CN102643011A (en) | 2012-03-29 | 2012-03-29 | Structure for improving melting uniformity of borosilicate glass |
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| CN (1) | CN102643011A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104609701A (en) * | 2015-02-06 | 2015-05-13 | 成都光明光电有限责任公司 | Continuous preparation device and method of glass raw material coarse fusant |
| CN106946439A (en) * | 2017-04-28 | 2017-07-14 | 中建材（宜兴）新能源有限公司 | A kind of large glass melting furnaces charging device |
| WO2019006041A1 (en) * | 2017-06-28 | 2019-01-03 | Corning Incorporated | Melters for glass forming apparatuses |
| CN113252497A (en) * | 2021-05-12 | 2021-08-13 | 攀钢集团重庆钒钛科技有限公司 | Method for detecting uniformity of organic coating of titanium dioxide special for plastics |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008137861A (en) * | 2006-12-04 | 2008-06-19 | Daido Steel Co Ltd | Glass melting furnace |
| CN101880120A (en) * | 2009-05-08 | 2010-11-10 | 河北东旭投资集团有限公司 | Glass tank for melting high-boron low-alkali or alkali-free glass |
-
2012
- 2012-03-29 CN CN2012100880479A patent/CN102643011A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008137861A (en) * | 2006-12-04 | 2008-06-19 | Daido Steel Co Ltd | Glass melting furnace |
| CN101880120A (en) * | 2009-05-08 | 2010-11-10 | 河北东旭投资集团有限公司 | Glass tank for melting high-boron low-alkali or alkali-free glass |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104609701A (en) * | 2015-02-06 | 2015-05-13 | 成都光明光电有限责任公司 | Continuous preparation device and method of glass raw material coarse fusant |
| CN106946439A (en) * | 2017-04-28 | 2017-07-14 | 中建材（宜兴）新能源有限公司 | A kind of large glass melting furnaces charging device |
| WO2019006041A1 (en) * | 2017-06-28 | 2019-01-03 | Corning Incorporated | Melters for glass forming apparatuses |
| CN110831904A (en) * | 2017-06-28 | 2020-02-21 | 康宁股份有限公司 | Melter for glass forming apparatus |
| JP2020526469A (en) * | 2017-06-28 | 2020-08-31 | コーニング インコーポレイテッド | Melting part of glass forming device |
| JP7086113B2 (en) | 2017-06-28 | 2022-06-17 | コーニング インコーポレイテッド | Melting part of glass forming device |
| CN110831904B (en) * | 2017-06-28 | 2022-07-19 | 康宁股份有限公司 | Melter for glass forming apparatus |
| US11492281B2 (en) | 2017-06-28 | 2022-11-08 | Corning Incorporated | Melters for glass forming apparatuses |
| JP7086113B6 (en) | 2017-06-28 | 2023-08-18 | コーニング インコーポレイテッド | Melting section of glass forming equipment |
| CN113252497A (en) * | 2021-05-12 | 2021-08-13 | 攀钢集团重庆钒钛科技有限公司 | Method for detecting uniformity of organic coating of titanium dioxide special for plastics |
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Application publication date: 20120822 |