CN102612250B - 一种管式介质阻挡放电等离子体产生系统及其应用 - Google Patents
一种管式介质阻挡放电等离子体产生系统及其应用 Download PDFInfo
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CN102814109B (zh) * | 2012-08-29 | 2014-07-02 | 西安交通大学 | 一种基于介质阻挡电晕放电等离子体处理废气的装置 |
CN105664679A (zh) * | 2016-01-13 | 2016-06-15 | 长沙上意电子科技有限公司 | Dbd等离子体废气处理设备 |
CN113694701B (zh) * | 2021-09-01 | 2022-05-13 | 南京工业大学 | 一种提高介质阻挡放电co2分解转化性能的装置及其方法 |
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TW497986B (en) * | 2001-12-20 | 2002-08-11 | Ind Tech Res Inst | Dielectric barrier discharge apparatus and module for perfluorocompounds abatement |
CN1798871A (zh) * | 2003-05-29 | 2006-07-05 | 三菱电机株式会社 | 放电表面处理用电极和放电表面处理方法及放电表面处理装置 |
CN101091871A (zh) * | 2007-05-23 | 2007-12-26 | 万京林 | 低温等离子体工业废气处理装置 |
CN201551954U (zh) * | 2009-10-27 | 2010-08-18 | 侯正奇 | 一种介质阻挡放电电极 |
CN101835336A (zh) * | 2010-05-21 | 2010-09-15 | 江苏大学 | 一种双介质阻挡放电低温等离子体发生器 |
CN102134116A (zh) * | 2011-03-16 | 2011-07-27 | 华中科技大学 | 一种同轴线管式介质阻挡电晕放电反应装置 |
CN202907328U (zh) * | 2012-03-08 | 2013-04-24 | 山东派力迪环保工程有限公司 | 一种管式介质阻挡放电等离子体产生系统 |
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JP2001080909A (ja) * | 1999-09-09 | 2001-03-27 | Yaskawa Electric Corp | オゾン発生器 |
GB0221973D0 (en) * | 2002-09-21 | 2002-10-30 | Accentus Plc | Non-thermal plasma reactor |
US20080131333A1 (en) * | 2006-12-04 | 2008-06-05 | High Power-Factor Ac/Dc Converter With Parallel Power Processing | Lateral-flow waste gas treatment device using nonthermal plasma |
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Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW497986B (en) * | 2001-12-20 | 2002-08-11 | Ind Tech Res Inst | Dielectric barrier discharge apparatus and module for perfluorocompounds abatement |
CN1798871A (zh) * | 2003-05-29 | 2006-07-05 | 三菱电机株式会社 | 放电表面处理用电极和放电表面处理方法及放电表面处理装置 |
CN101091871A (zh) * | 2007-05-23 | 2007-12-26 | 万京林 | 低温等离子体工业废气处理装置 |
CN201551954U (zh) * | 2009-10-27 | 2010-08-18 | 侯正奇 | 一种介质阻挡放电电极 |
CN101835336A (zh) * | 2010-05-21 | 2010-09-15 | 江苏大学 | 一种双介质阻挡放电低温等离子体发生器 |
CN102134116A (zh) * | 2011-03-16 | 2011-07-27 | 华中科技大学 | 一种同轴线管式介质阻挡电晕放电反应装置 |
CN202907328U (zh) * | 2012-03-08 | 2013-04-24 | 山东派力迪环保工程有限公司 | 一种管式介质阻挡放电等离子体产生系统 |
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Effective date of registration: 20180710 Address after: 255086 B 2201, advanced ceramic industry innovation park, No. 125, Liu Quan Road, hi tech Zone, Zibo, Shandong Patentee after: SHANDONG PAILIDI PLASMA TECHNOLOGY Co.,Ltd. Address before: 255086 the development zone of Zibo hi tech Development Zone, east of North Road and north of Xin Road, Shandong. Patentee before: SHANDONG PALLET ENVIRONMENTAL ENGINEERING Co.,Ltd. |
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Address after: 255086 B 2201, advanced ceramic industry innovation park, No. 125, Liu Quan Road, hi tech Zone, Zibo, Shandong Patentee after: Shandong pailidi Environmental Technology Co.,Ltd. Address before: 255086 B 2201, advanced ceramic industry innovation park, No. 125, Liu Quan Road, hi tech Zone, Zibo, Shandong Patentee before: SHANDONG PAILIDI PLASMA TECHNOLOGY Co.,Ltd. |
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Address after: 255086, North Road, hi tech Zone, Shandong, Zibo Patentee after: SHANDONG PALLET ENVIRONMENTAL ENGINEERING Co.,Ltd. Address before: 255086 B 2201, advanced ceramic industry innovation park, No. 125, Liu Quan Road, hi tech Zone, Zibo, Shandong Patentee before: Shandong pailidi Environmental Technology Co.,Ltd. |