CN102584033A - Non-conducting metal film coated glass and preparation method thereof - Google Patents
Non-conducting metal film coated glass and preparation method thereof Download PDFInfo
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- CN102584033A CN102584033A CN2012100525424A CN201210052542A CN102584033A CN 102584033 A CN102584033 A CN 102584033A CN 2012100525424 A CN2012100525424 A CN 2012100525424A CN 201210052542 A CN201210052542 A CN 201210052542A CN 102584033 A CN102584033 A CN 102584033A
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Abstract
The invention aims to provide a non-conducting metal film coated glass and a preparation method thereof. According to a magnetic control sputtering method, a color adjusting film, a non-conducting metal film and a nitride protecting film are stacked and plated on the surface of the glass from inside to outside in turn; the square resistance of the non-conducting metal film is 5-270 teraohm; and the visible light transmissivity of the coated glass is 20%-42%. The preparation method comprises the following steps of in turn: 1) washing the to-be-coated glass with the deionized water with the resistance more than 13 teraohm, drying by using an air knife; 2) under the working air pressure of 0.30-0.25Pa, performing reactive sputtering deposition with Ar and O2, wherein the volume ratio Ar to O2 is equal to (3:1)-(3:2), and coating a color adjusting layer stannic oxide on a glass substrate; 3) under the working air pressure of 0.30-0.35Pa, taking Ar as the working gas, and coating a silicon-aluminum alloy non-conducting film on the color adjusting layer; and 4) under the working air pressure of 0.30-0.25Pa, performing reactive sputtering deposition with Ar and N2, wherein the volume ratio Ar to N2 is equal to (0.7:1)-(3:1), and coating a silicon nitride protecting film on the silicon-aluminum alloy non-conducting film.
Description
Technical field
The present invention is specifically related to a kind of at product that is coated with the non-conducting metal film layer on glass and preparation method thereof.This coated glass surface has metalluster and conduction (more than square resistance 5 megaohms), the incomplete premium properties of shielding electromagnetic wave hardly, and glass is had good decoration function.The invention belongs to display device glass, automobile, train, steamer, building, household electrical appliances with glass and lighting glass technology field.
Background technology
In some special occasions; Glass is asked to possess the outward appearance that shows metalluster, the transmission of visible light of half perspective; With can not stop performances such as electromagnetic transmission fully; For example: display device glass is coated with non-conducting metal film, shows the gloss of metal, and shielding electromagnetic wave does not influence display device work fully; At some special spaces, window glass had not only required metallization, but also need keep electromagnetic transmission.Simultaneously, non-conducting metal film layer coated glass can also reach half perspective visible light, reflected infrared, reaches indoor heat insulation effect.At present, existing a lot of methods (technologies such as sputter, vapor deposition, vapour deposition, plating) can be through being coated with the purpose that metallic diaphragm reaches glass-reflected metalluster, reduces transmission of visible light on glass.But, at present with these process methodes all conduct electricity at the metallic diaphragm that is coated with on glass, shielding electromagnetic wave, having influenced some needs the working space of Electromgnetically-transparent.On plastic cement, be coated with non-conducting metal film (201010129693.6; A kind of making method that is used for the non-conducting metal film of surface of plastic product); Need in the plastic cement substrate, be coated with the UV rete; Vacuum evaporation tin or tin alloy membrane prepare non-conducting metal film go out Vakuumkammer at last and under normal pressure, are coated with the resist that the UV cured layer is done non-conducting metal film more again; This method technology is loaded down with trivial details, the non-conducting metal film layer is not firm, the color of rete can not be adjusted; And on plastic rubber substrate, be coated with non-conducting metal film,, also be not suitable under the ultraviolet environment of permanent contact such as building, locomotive, using because the weather resistance of base material is lower than glass.
Summary of the invention
Technical problem:The objective of the invention is to provides coated glass of a kind of non-conducting metal film layer and preparation method thereof at the non-conducting metal film layer that is coated with on glass.That the coated glass performance comprises is translucent, the reflected light color can be adjusted, the square resistance of face is greater than 5 megaohms.
Technical scheme:Non-conducting metal film layer coated glass of the present invention is outside successively from glass surface with magnetically controlled sputter method, stacked color adjustment film, non-conducting metal film, the protecting nitride film of being coated with on the glass surface upper strata; The square resistance of non-conducting metal film is 5～270 megaohms, and the transmission of visible light of coated glass is 20%～42%.
Described color adjustment film is the tindioxide rete with tin target oxidizing reaction sputtering sedimentation; Non-conducting metal film is the sial rete with silicon-aluminium alloy target material sputtering sedimentation isolated island shape structure; Protecting nitride film is the silicon nitride protective film with silicon target material nitrogenizing reaction sputtering sedimentation.
The thickness of color adjustment rete, silumin rete and protective film is respectively: 10～90 nanometers, 5～30 nanometers, 10～30 nanometers.
The preparation method of described non-conducting metal film layer coated glass is followed successively by following steps:
1). treat coated glass with the washed with de-ionized water of resistance greater than 13 megaohms, air knife carries out drying;
2). operating air pressure is 0.30～0.25Pa, with Ar and O
2Reactive sputter-deposition, wherein, volume ratio Ar/O
2=3:1～3:2 is coated with color adjustment layer tindioxide on glass substrate;
3). operating air pressure is 0.30～0.35Pa, as working gas, on color adjustment layer, is coated with the non-conductive film of silumin with Ar;
4). operating air pressure is 0.30～0.25Pa, with Ar and N
2Reactive sputter-deposition, wherein, volume ratio Ar/ N
2=0.7:1～3:1 is coated with the silicon nitride protective membrane on the non-conductive film of silumin.
Said color adjustment rete changes its thickness, and the reflection luminous energy of coated glass shows silver grey, golden yellow or blue.
Beneficial effect:Preparing method of the present invention is simple; And the coated glass surface is except having metalluster and conduction (more than square resistance 5 megaohms), incomplete shielding electromagnetic wave and glass had the good decoration function hardly; Also have rete firmly, the advantage that can adjust of the color of good endurance, rete, can contact use under the ultraviolet environment for a long time.
The membranous layer ingredient of sputter coating of the present invention is simple, the sputtering target material expense is low, can adjust color, visible light transmittance, rete square resistance according to the thickness of rete; Production process does not have three waste discharge.
The present invention has application widely at display glass, automobile, train, steamer, building, household electrical appliances with glass and illuminating glass lamp industry, has a extensive future.
Embodiment
Outside successively from glass surface, adjust film, non-conducting metal film, protecting nitride film (glass/color adjustment film/non-conducting metal film/protecting nitride film) with magnetically controlled sputter method in the color that is coated with on glass; This trilamellar membrane is accomplished at sputtering chamber successively.It is characterized in that: contain the silumin rete in the film of the coated glass system, utilize the silumin film to present the characteristic of isolated island shape structure during less than 30nm, form the discontinuous conduction film at thickness.On (coated glass) macroscopic view is exactly non-conducting metal film, and square resistance is greater than 5 megaohms.
The adjustment of described color rete, silumin rete and protective film, respectively with tin target oxidizing reaction sputtering sedimentation tin oxide film, with silicon-aluminium alloy target material sputtering sedimentation isolated island shape structure sial film, with silicon target material nitrogenizing reaction sputtering sedimentation silicon nitride protective membrane.
The thickness of described color adjustment rete, silumin rete and protective film is respectively: 10～90 nanometers, 5～30 nanometers, 10～30 nanometers.
Non-conducting metal film layer coated glass of the present invention and preparation method thereof comprises the steps:
1) at first treat the coated glass substrate with the washed with de-ionized water of resistance greater than 13 megaohms, air knife carries out drying;
2) put into sputtering chamber to clean glass substrate then; Sputtering chamber back of the body end vacuum is less than 2.5X10
-3Pa;
3) feed working gas (argon gas) and reactant gases (oxygen); Or working gas (argon gas); Or working gas (argon gas) and reactant gases (nitrogen), on the glass substrate of clean dried, be coated with color adjustment rete, silumin rete and protective film successively with sputtering method.
Instance 1:
Prepare the non-conducting metal film coated glass with sputtering method, comprise the steps:
1) treats that the coated glass substrate cleans, drying; Substrate glass is 91% to visible light transmittance in the solar spectrum;
2) operating air pressure is 0.30Pa, with Ar and O
2Reactive sputter-deposition, wherein Ar/O
2=3:2 (volume ratio) is coated with color adjustment layer tindioxide on glass substrate;
3) operating air pressure is 0.35Pa, as working gas, on color adjustment layer, is coated with the non-conductive film of silumin with Ar;
4) operating air pressure is 0.30Pa, with Ar and N
2Reactive sputter-deposition, wherein Ar/ N
2=0.7:1 (volume ratio); On the non-conductive film of silumin, be coated with the silicon nitride protective membrane;
The performance of the non-conducting metal film coated glass that obtains is following: the thick 10nm of color adjustment tunic, silumin thickness 5nm, silicon nitride protection thickness 10; Visible light transmissivity 42%, square resistance 270 megaohms; The rete reflected colour is yellowish; The physicochemical property of coated glass meets country's " coated glass " standard (GB/T18915.1～18915.2-2002).
Instance 2:
Prepare the non-conducting metal film coated glass with sputtering method, comprise the steps:
1) treats that the coated glass substrate cleans, drying; Substrate glass is 91% to visible light transmittance in the solar spectrum;
2) operating air pressure is 0.30Pa, with Ar and O
2Reactive sputter-deposition, wherein Ar/O
2=3:1 (volume ratio) is coated with color adjustment layer tindioxide on glass substrate;
3) operating air pressure is 0.35Pa, as working gas, on color adjustment layer, is coated with the non-conductive film of silumin with Ar;
4) operating air pressure is 0.30Pa, with Ar and N
2Reactive sputter-deposition, wherein Ar/ N
2=1:1 (volume ratio); On the non-conductive film of silumin, be coated with the silicon nitride protective membrane;
The performance of the non-conducting metal film coated glass that obtains is following: the thick 18nm of color adjustment tunic, silumin thickness 10nm, silicon nitride protection thickness 20; Visible light transmissivity 34%, square resistance 150 megaohms; The rete reflected colour appears silver grey; The physicochemical property of coated glass meets country's " coated glass " standard (GB/T18915.1～18915.2-2002).
Instance 3:
Prepare the non-conducting metal film coated glass with sputtering method, comprise the steps:
1) treats that the coated glass substrate cleans, drying; Substrate glass is 91% to visible light transmittance in the solar spectrum;
2) operating air pressure is 0.30Pa, with Ar and O
2Reactive sputter-deposition, wherein Ar/O
2=3:1 (volume ratio) is coated with color adjustment layer tindioxide on glass substrate;
3) operating air pressure is 0.30Pa, as working gas, on color adjustment layer, is coated with the non-conductive film of silumin with Ar;
4) operating air pressure is 0.30Pa, with Ar and N
2Reactive sputter-deposition, wherein Ar/ N
2=2:1 (volume ratio); On the non-conductive film of silumin, be coated with the silicon nitride protective membrane;
The performance of the non-conducting metal film coated glass that obtains is following: the thick 40nm of color adjustment tunic, silumin thickness 20nm, silicon nitride protection thickness 30; Visible light transmissivity 32%, square resistance 130 megaohms; The rete reflected colour appears golden yellow; The physicochemical property of coated glass meets country's " coated glass " standard (GB/T18915.1～18915.2-2002).
Instance 4:
Prepare the non-conducting metal film coated glass with sputtering method, comprise the steps:
1) treats that the coated glass substrate cleans, drying; Substrate glass is 91% to visible light transmittance in the solar spectrum;
2) operating air pressure is 0.25Pa, with Ar and O
2Reactive sputter-deposition, wherein Ar/O
2=3:1 (volume ratio) is coated with color adjustment layer tindioxide on glass substrate;
3) operating air pressure is 0.30Pa, as working gas, on color adjustment layer, is coated with the non-conductive film of silumin with Ar;
4) operating air pressure is 0.25Pa, with Ar and N
2Reactive sputter-deposition, wherein Ar/ N
2=2:1 (volume ratio); On the non-conductive film of silumin, be coated with the silicon nitride protective membrane;
The performance of the non-conducting metal film coated glass that obtains is following: the thick 70nm of color adjustment tunic, silumin thickness 25nm, silicon nitride protection thickness 30; Visible light transmissivity 30%, square resistance 80 megaohms; The rete reflected colour presents blueness; The physicochemical property of coated glass meets country's " coated glass " standard (GB/T18915.1～18915.2-2002).
Instance 5:
Prepare the non-conducting metal film coated glass with sputtering method, comprise the steps:
1) treats that the coated glass substrate cleans, drying; Substrate glass is 91% to visible light transmittance in the solar spectrum;
2) operating air pressure is 0.25Pa, with Ar and O
2Reactive sputter-deposition, wherein Ar/O
2=3:1 (volume ratio) is coated with color adjustment layer tindioxide on glass substrate;
3) operating air pressure is 0.30Pa, as working gas, on color adjustment layer, is coated with the non-conductive film of silumin with Ar;
4) operating air pressure is 0.25Pa, with Ar and N
2Reactive sputter-deposition, wherein Ar/ N
2=2:1 (volume ratio); On the non-conductive film of silumin, be coated with the silicon nitride protective membrane;
The performance of the non-conducting metal film coated glass that obtains is following: the thick 90nm of color adjustment tunic, silumin thickness 30nm, silicon nitride protection thickness 30; Visible light transmissivity 20%, square resistance 6 megaohms; The rete reflected colour presents blueness; The physicochemical property of coated glass meets country's " coated glass " standard (GB/T18915.1～18915.2-2002).
Claims (5)
1. a non-conducting metal film layer coated glass is characterized in that this glass is outside successively from glass surface with magnetically controlled sputter method, stacked color adjustment film, non-conducting metal film, the protecting nitride film of being coated with on the glass surface upper strata; The square resistance of non-conducting metal film is 5～270 megaohms, and the transmission of visible light of coated glass is 20%～42%.
2. non-conducting metal film layer coated glass according to claim 1 is characterized in that, described color adjustment film is the tindioxide rete with tin target oxidizing reaction sputtering sedimentation; Non-conducting metal film is the sial rete with silicon-aluminium alloy target material sputtering sedimentation isolated island shape structure; Protecting nitride film is the silicon nitride protective film with silicon target material nitrogenizing reaction sputtering sedimentation.
3. non-conducting metal film layer coated glass according to claim 1 and 2 is characterized in that, the thickness of color adjustment rete, silumin rete and protective film is respectively: 10～90 nanometers, 5～30 nanometers, 10～30 nanometers.
4. the preparation method of a non-conducting metal film layer coated glass as claimed in claim 1 is characterized in that this preparation method is followed successively by following steps:
1). treat coated glass with the washed with de-ionized water of resistance greater than 13 megaohms, air knife carries out drying;
2). operating air pressure is 0.30～0.25Pa, with Ar and O
2Reactive sputter-deposition, wherein, volume ratio Ar/O
2=3:1～3:2 is coated with color adjustment layer tindioxide on glass substrate;
3). operating air pressure is 0.30～0.35Pa, as working gas, on color adjustment layer, is coated with the non-conductive film of silumin with Ar;
4). operating air pressure is 0.30～0.25Pa, with Ar and N
2Reactive sputter-deposition, wherein, volume ratio Ar/ N
2=0.7:1～3:1 is coated with the silicon nitride protective membrane on the non-conductive film of silumin.
5. the preparation method of non-conducting metal film layer coated glass according to claim 4 is characterized in that said color adjustment rete, changes its thickness, and the reflection luminous energy of coated glass shows silver grey, golden yellow or blue.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105825768A (en) * | 2016-03-31 | 2016-08-03 | 维沃移动通信有限公司 | Method for manufacturing three-dimensional logo, three-dimensional logo and application method of three-dimensional logo |
| CN106565113A (en) * | 2016-11-03 | 2017-04-19 | 武汉理工大学 | Colorful non-conducting metallic luster printed and film-coated ornamental glass and preparation method therefor |
| TWI586524B (en) * | 2012-09-05 | 2017-06-11 | China Steel Corp | Surface anti-fingerprint substrate and manufacturing method thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1806791A2 (en) * | 2006-01-09 | 2007-07-11 | Samsung Electronics Co., Ltd. | Inorganic electroluminescent diode and method of fabricating the same |
| CN101157522A (en) * | 2007-09-26 | 2008-04-09 | 武汉理工大学 | Visible light anti-reflection and ultraviolet radiation cut-off bifunctional coated glass and preparation method thereof |
| CN101619437A (en) * | 2008-07-04 | 2010-01-06 | 中国钢铁股份有限公司 | The shell of silicon based metal alloy firm, this film of tool and electronic installation and manufacture method |
| CN101717202A (en) * | 2009-11-24 | 2010-06-02 | 江苏秀强玻璃工艺股份有限公司 | Ultraviolet-cutoff coated glass containing silicon film and preparation method thereof |
| CN102061443A (en) * | 2011-01-31 | 2011-05-18 | 华映光电股份有限公司 | Method for plating tin oxide film through magnetic sputtering |
-
2012
- 2012-03-02 CN CN2012100525424A patent/CN102584033A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1806791A2 (en) * | 2006-01-09 | 2007-07-11 | Samsung Electronics Co., Ltd. | Inorganic electroluminescent diode and method of fabricating the same |
| CN101157522A (en) * | 2007-09-26 | 2008-04-09 | 武汉理工大学 | Visible light anti-reflection and ultraviolet radiation cut-off bifunctional coated glass and preparation method thereof |
| CN101619437A (en) * | 2008-07-04 | 2010-01-06 | 中国钢铁股份有限公司 | The shell of silicon based metal alloy firm, this film of tool and electronic installation and manufacture method |
| CN101717202A (en) * | 2009-11-24 | 2010-06-02 | 江苏秀强玻璃工艺股份有限公司 | Ultraviolet-cutoff coated glass containing silicon film and preparation method thereof |
| CN102061443A (en) * | 2011-01-31 | 2011-05-18 | 华映光电股份有限公司 | Method for plating tin oxide film through magnetic sputtering |
Non-Patent Citations (3)
| Title |
|---|
| 中华人民共和国国家质量监督检验检疫总局、中国国家标准化管理委员会: "《中华人民共和国国家标准-分析实验室用水规格和试验方法》", 1 November 2008, article "《中华人民共和国国家标准-分析实验室用水规格和试验方法》", pages: GB/T - 6682-2008 * |
| 中华人民共和国国家质量监督检验检疫总局、中国国家标准化管理委员会: "《中华人民共和国国家标准-电子级水》", 31 December 1997, article "《中华人民共和国国家标准-电子级水》", pages: GB/T - 11446.1-1997 * |
| 汉斯•琼彻•格雷瑟: "《大面积玻璃镀膜》", 30 April 2006, article "《大面积玻璃镀膜》", pages: 15 - 26-37 * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI586524B (en) * | 2012-09-05 | 2017-06-11 | China Steel Corp | Surface anti-fingerprint substrate and manufacturing method thereof |
| CN105825768A (en) * | 2016-03-31 | 2016-08-03 | 维沃移动通信有限公司 | Method for manufacturing three-dimensional logo, three-dimensional logo and application method of three-dimensional logo |
| CN106565113A (en) * | 2016-11-03 | 2017-04-19 | 武汉理工大学 | Colorful non-conducting metallic luster printed and film-coated ornamental glass and preparation method therefor |
| CN106565113B (en) * | 2016-11-03 | 2019-10-01 | 武汉理工大学 | Colorful non-conductive metallic luster printing plated film ambetti of one kind and preparation method thereof |
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Application publication date: 20120718 |