CN102569265A - Mask plate static electricity resisting ring - Google Patents
Mask plate static electricity resisting ring Download PDFInfo
- Publication number
- CN102569265A CN102569265A CN201210014991XA CN201210014991A CN102569265A CN 102569265 A CN102569265 A CN 102569265A CN 201210014991X A CN201210014991X A CN 201210014991XA CN 201210014991 A CN201210014991 A CN 201210014991A CN 102569265 A CN102569265 A CN 102569265A
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- CN
- China
- Prior art keywords
- mask plate
- antistatic ring
- ring
- static electricity
- plate antistatic
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
The invention relates to the field of semiconductor manufacturing, in particular to a mask plate static electricity resisting ring. The inner angles of the corners of the mask plate static electricity resisting ring are obtuse angles or in circular arc shapes, so that point discharge can be effectively avoided; and therefore, graphics inside a mask plate are protected from being damaged by static electricity.
Description
Technical field
The present invention relates to semiconductor integrated circuit and manufacturing field thereof, relate in particular to a kind of mask plate antistatic ring.
Background technology
Follow the continuous progress of integrated circuit fabrication process, it is more and more littler that the area of semiconductor device is just becoming, and semi-conductive layout develops into the integrated circuit of integrating high-density multifunction from common simple function discrete device; By initial integrated circuit (Integrated Circuit; Abbreviation IC) progressively develops into large scale integrated circuit (Large Scale Integrated circuit is called for short LSI), very lagre scale integrated circuit (VLSIC) (Very Large Scale Integrated Circuit is called for short VLSI); (the Ultra Large Scale Integration of ULSI until now; Be called for short ULSI), the area of semiconductor device is more and more littler, and function is but powerful more comprehensively.
But; Consider the restriction of complexity, chronicity and the high unfavorable factors such as cost of technique research and development; How on the basis of prior art level, further improve the integration density of device, dwindle area of chip, promptly as much as possiblely on same piece of silicon chip obtain effective chip-count; Thereby the raising overall interests are with the attention that more and more receives chip designer and manufacturer.Wherein, photoetching process is one of key factor that improves integration density, and mask plate is a material indispensable in the photoetching process.
In integrated circuit fabrication process, through laser beam or electron beam the circuit that designs is transferred on the mask plate usually, again through the exposure mode with the figure transfer on the mask to silicon chip.Because the dimension of picture on the mask plate all is a micron order, than being easier to receive electrostatic breakdown, therefore usually can be when mask plate designs the destruction of antistatic ring of mask plate periphery design to protect mask plate in making, transportation and use, not receive static.
Fig. 1 is the structural representation of antistatic ring traditional in the background technology of the present invention; As shown in Figure 1, turning interior angle 11 places of traditional antistatic ring 1 use right-angle design, because the existence of point discharge phenomenon, the inner figure of mask plate still is vulnerable to the destruction of static.
Summary of the invention
The invention discloses a kind of mask plate antistatic ring, comprise a mask plate antistatic ring body, wherein, the turning interior angle of this mask plate antistatic ring is set at least two obtuse angle shapes or circular shape.
Above-mentioned mask plate antistatic ring, wherein, when the turning interior angle of mask plate antistatic ring was the obtuse angle shape, the length on the limit at its obtuse angle was more than or equal to 0.5um.
Above-mentioned mask plate antistatic ring, wherein, when angular shape was set to two obtuse angle shapes in the turning of mask plate antistatic ring, the length on the limit at its obtuse angle is 5um preferably.
Above-mentioned mask plate antistatic ring, wherein, when the turning interior angle of mask plate antistatic ring was set to circular shape, its radius of curvature was more than or equal to 0.5um.
Above-mentioned mask plate antistatic ring, wherein, when the turning interior angle of mask plate antistatic ring was set to circular shape, its radius of curvature is 5um preferably.
In sum; Owing to adopted technique scheme, the present invention to propose a kind of mask plate antistatic ring, the turning interior angle through mask plate antistatic ring is set to obtuse angle or circular shape; Can effectively avoid point discharge, thus the destruction of having protected the inner figure of mask plate not receive static.
Description of drawings
Fig. 1 is the structural representation of antistatic ring traditional in the background technology of the present invention;
Fig. 2 is the structural representation of mask plate antistatic ring of the present invention;
Fig. 3 is the structural representation that the turning interior angle adopts the obtuse angle shape in the structure of mask plate antistatic ring of the present invention;
Fig. 4 is the structural representation that the turning interior angle adopts circular shape in the structure of mask plate antistatic ring of the present invention.
Embodiment
Be further described below in conjunction with the accompanying drawing specific embodiments of the invention:
Fig. 2 is the structural representation of mask plate antistatic ring of the present invention; Fig. 3 is the structural representation that the turning interior angle adopts the obtuse angle shape in the structure of mask plate antistatic ring of the present invention; Fig. 4 is the structural representation that the turning interior angle adopts circular shape in the structure of mask plate antistatic ring of the present invention.
Shown in Fig. 2-3, a kind of mask plate antistatic of the present invention ring:
The turning interior angle 21 of mask plate antistatic ring 2 is set to two obtuse angle shapes, and the length d on the limit at its obtuse angle is 5um, avoiding point discharge, thus the destruction of having protected the inner figure of mask plate not receive static.
As shown in Figure 4, can also the turning interior angle 31 of mask plate antistatic ring 3 be set to the circular shape shape, and radius of curvature r is 5um, avoiding point discharge, thus the destruction of having protected the inner figure of mask plate not receive static.
In sum; Owing to adopted technique scheme, the present invention to propose a kind of mask plate antistatic ring, the turning interior angle through mask plate antistatic ring is set to obtuse angle or circular shape; Can effectively avoid point discharge, thus the destruction of having protected the inner figure of mask plate not receive static.
Through explanation and accompanying drawing, provided the exemplary embodiments of the ad hoc structure of embodiment, based on the present invention's spirit, also can do other conversion.Although foregoing invention has proposed existing preferred embodiment, yet these contents are not as limitation.
For a person skilled in the art, read above-mentioned explanation after, various variations and revise undoubtedly will be obvious.Therefore, appending claims should be regarded whole variations and the correction of containing true intention of the present invention and scope as.Any and all scope of equal value and contents all should be thought still to belong in the intent of the present invention and the scope in claims scope.
Claims (5)
1. a mask plate antistatic ring comprises a mask plate antistatic ring body, it is characterized in that the turning interior angle of this mask plate antistatic ring is set at least two obtuse angle shapes or circular shape.
2. mask plate antistatic ring according to claim 1 is characterized in that when the turning interior angle of mask plate antistatic ring was the obtuse angle shape, the length on the limit at its obtuse angle was more than or equal to 0.5um.
3. mask plate antistatic ring according to claim 1 and 2 is characterized in that, when angular shape was set to two obtuse angle shapes in the turning of mask plate antistatic ring, the length on the limit at its obtuse angle is 5um preferably.
4. mask plate antistatic ring according to claim 1 is characterized in that when the turning interior angle of mask plate antistatic ring was set to circular shape, its radius of curvature was more than or equal to 0.5um.
5. according to claim 1 or 4 described mask plate antistatic rings, it is characterized in that when the turning interior angle of mask plate antistatic ring was set to circular shape, its radius of curvature is 5um preferably.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210014991XA CN102569265A (en) | 2012-01-18 | 2012-01-18 | Mask plate static electricity resisting ring |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210014991XA CN102569265A (en) | 2012-01-18 | 2012-01-18 | Mask plate static electricity resisting ring |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102569265A true CN102569265A (en) | 2012-07-11 |
Family
ID=46414300
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210014991XA Pending CN102569265A (en) | 2012-01-18 | 2012-01-18 | Mask plate static electricity resisting ring |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102569265A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109270786A (en) * | 2018-12-10 | 2019-01-25 | 长江存储科技有限责任公司 | A kind of mask plate |
| CN111323952A (en) * | 2020-03-16 | 2020-06-23 | Tcl华星光电技术有限公司 | LCD mother board |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6365303B1 (en) * | 2000-04-24 | 2002-04-02 | Taiwan Semiconductor Manufacturing Company | Electrostatic discharge damage prevention method on masks |
| CN1459667A (en) * | 2002-05-15 | 2003-12-03 | 台湾积体电路制造股份有限公司 | Light cage for preventing electrostatic break down |
| US20050238964A1 (en) * | 2004-04-26 | 2005-10-27 | Chao-Yung Chu | Photomask |
| US20100266939A1 (en) * | 2009-04-17 | 2010-10-21 | Haiko Rolff | Lithographic Mask and Method of Forming a Lithographic Mask |
-
2012
- 2012-01-18 CN CN201210014991XA patent/CN102569265A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6365303B1 (en) * | 2000-04-24 | 2002-04-02 | Taiwan Semiconductor Manufacturing Company | Electrostatic discharge damage prevention method on masks |
| CN1459667A (en) * | 2002-05-15 | 2003-12-03 | 台湾积体电路制造股份有限公司 | Light cage for preventing electrostatic break down |
| US20050238964A1 (en) * | 2004-04-26 | 2005-10-27 | Chao-Yung Chu | Photomask |
| US20100266939A1 (en) * | 2009-04-17 | 2010-10-21 | Haiko Rolff | Lithographic Mask and Method of Forming a Lithographic Mask |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109270786A (en) * | 2018-12-10 | 2019-01-25 | 长江存储科技有限责任公司 | A kind of mask plate |
| CN109270786B (en) * | 2018-12-10 | 2022-03-15 | 长江存储科技有限责任公司 | Mask plate |
| CN111323952A (en) * | 2020-03-16 | 2020-06-23 | Tcl华星光电技术有限公司 | LCD mother board |
| CN111323952B (en) * | 2020-03-16 | 2022-11-25 | Tcl华星光电技术有限公司 | LCD mother board |
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Application publication date: 20120711 |