CN102566309A - Method for measuring dynamic stability of plate-making lithography equipment - Google Patents
Method for measuring dynamic stability of plate-making lithography equipment Download PDFInfo
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- CN102566309A CN102566309A CN2012100084370A CN201210008437A CN102566309A CN 102566309 A CN102566309 A CN 102566309A CN 2012100084370 A CN2012100084370 A CN 2012100084370A CN 201210008437 A CN201210008437 A CN 201210008437A CN 102566309 A CN102566309 A CN 102566309A
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Abstract
The invention belongs to the technical field of plate-making lithography and in particular relates to a method for measuring the dynamic stability of plate-making lithography equipment. The method comprises the following steps of: fixing a mask on a platform, and manufacturing a plurality of positioning marks on the mask; selecting a positioning mark, and recording a coordinate of the platform when the center of the positioning mark is overlapped with a field-of-view center of a charge coupled device (CCD) camera; taking the coordinate as a center to make a carrier platform shift out and return, and calculating a center offset between the enter of the positioning mark and the field-of-view center of the CCD camera when the carrier platform returns; repeating to obtain a plurality of center offsets, and calculating a resetting accuracy value which corresponds to the center of the positioning mark according to a plurality of center offsets through an algorithm; repeating the steps for each positioning mark, and thus obtaining resetting accuracy values which correspond to the enters of a plurality of positioning marks; and calculating a dynamic resetting accuracy value of the system through a plurality of resetting accuracy values. The method has high measurement accuracy and is easy to reset and low in measurement cost.
Description
Technical field
The invention belongs to the plate-making technical field of lithography, be specifically related to a kind of dynamic stability measuring method of the lithographic equipment that is used to make a plate.
Background technology
Photoetching technique is used on substrate surface the composition that printing has characteristic, said substrate comprise be used for producing the semiconductor devices, the substrate of multiple integrated circuit, flat-panel screens (for example LCD), circuit board, biochip, micromechanics electronic chip, photoelectron circuit chip etc.The substrate that often uses is semiconductor crystal wafer or mask plate.
In photoetching plate-making process, with mask plate be placed on can the accurate article carrying platform that moves on, through the exposure device in the lithographic equipment, feature pattern is projected the assigned address on mask plate surface.For guaranteeing that feature pattern can accurately project assigned address, need satisfy following two conditions: at first the article carrying platform at needs mask plate place satisfies certain bearing accuracy; Moreover need the overall optical etching system reliable and stable.
Weigh the stability of etching system, be divided into usually dynamically and static two aspects.Dynamic stability is to weigh in normal operation; Needs according to photoetching process; The moving components such as article carrying platform at mask plate place will move, and this moment, system received the influence of dynamic factors such as external force, moving component inertial force, positioning system repeatability and the offset that produces.Static stability is to weigh under certain environmental conditions, and when movement-less part inertial force and external force influenced, system received the influence of factors such as environment temperature, humidity, vibration and system self rigidity and the position excursion that causes.
In order to guarantee the stability of overall optical etching system in the exposure process, need the static state and the dynamic offset of accurate measuring light etching system, thereby realize the demarcation or the compensation of exposed feature figure launching position.Said etching system also is the summation of whole plate-making lithographic equipment.The stability measurement of traditional etching system is to adopt high-accuracy laser interferometer; But this metering system not only cost is high; And the installation of measurement mechanism and the adjustment difficulty big; Measuring accuracy is affected by environment big, simultaneously because laser interferometer self also is a heater element, therefore when laser interferometer is measured, can produce extra influence to the stability of etching system.
Summary of the invention
The dynamic stability measuring method that the purpose of this invention is to provide a kind of lithographic equipment that is used to make a plate; This method makes full use of the CCD camera in the plate-making lithographic equipment; Can realize the accurate measurement of etching system dynamic stability, measuring accuracy height and measuring process are easy.
Be to realize above-mentioned purpose, the present invention has adopted following technical scheme: a kind of dynamic stability measuring method of the lithographic equipment that is used to make a plate is characterized in that comprising following steps:
1), mask plate is fixed on the article carrying platform, and (P＞1) the individual telltale mark of on mask plate, making P;
2), select one of them telltale mark; Said telltale mark is imaged in the CCD viewing field of camera in the plate-making lithographic equipment; And through image processing techniques telltale mark is handled and calculated, to draw the side-play amount at said specifically labelled center and CCD viewing field of camera center, move article carrying platform then; Said specifically labelled center is moved to CCD viewing field of camera center coincide, and the space physics coordinate of record article carrying platform this moment;
3), the space physics coordinate with article carrying platform is the center; Article carrying platform is done in the visual field of CCD camera to be shifted out and returning movement; Also promptly make article carrying platform outwards move a segment distance from its space physics coordinate place earlier; After treating that article carrying platform comes to a complete stop, make article carrying platform move to its space physics coordinate place again again; After article carrying platform moves to its space physics coordinate place again, gather specifically labelled image through the CCD camera, and calculate the center offset between specifically labelled center and the CCD viewing field of camera center;
4), making article carrying platform in the visual field of CCD camera, repeat to do shifts out and returning movement; Then obtain a plurality of center offsets, a plurality of center offsets that obtain are calculated and the corresponding repetitive positioning accuracy value in this specifically labelled center through the mathematical statistics algorithm;
5), each telltale mark is repeated 2)～4) step is to obtain and P the repetitive positioning accuracy value that specifically labelled center is corresponding respectively;
6), at last P repetitive positioning accuracy value calculated the dynamic repetitive positioning accuracy value of this etching system through the mathematical statistics algorithm.
Originally the dynamic stability measuring method of lithographic equipment of being used to make a plate can also be able to further realization in the following manner:
P telltale mark repeated 3 one by one), 4) step m time, finally each telltale mark is all obtained m repetitive positioning accuracy value, at last P * m repetitive positioning accuracy value calculated the dynamic stability value of this etching system through the mathematical statistics algorithm.
Preferably, said telltale mark is evenly distributed on the mask plate, then can measure and the distribution situation of the corresponding repetitive positioning accuracy of each telltale mark in whole working face.
Concrete; With the working face of mask plate also is directions X and Y direction n five equilibrium along two-dimensional directional respectively, obtains n * n little square region, processes telltale mark at the drift angle place of each little square region; Obtain finally that equally distributed n+1 is capable, n+1 row telltale mark, and P=(n+1) * (n+1).
Further, said telltale mark is crosswise, and this structure not only makes telltale mark comparatively simple, easy to implement, and is convenient to accurately calculate specifically labelled geometric center position.
Said plate-making lithographic equipment comprises exposure light source, optical light-collecting system, projection optical system, camera lens throw-over gear, optical alignment detection system and focusing system; The light that focusing light source in the said focusing system is sent is successively through being radiated on the mask plate behind the optical device in optical alignment detection system and the projection optical system, light through the mask plate reflection after more successively through the optical device of the optical device in the projection optical system, optical alignment detection system in the CCD viewing field of camera in outgoing to the optical alignment detection system; In step 2) in; Move article carrying platform and the telltale mark of choosing is got in the CCD viewing field of camera, utilize the focusing technology again, calculate the focal plane position of CCD camera; And drive article carrying platform and realize specifically labelled focusing, realize promptly that also said telltale mark images in the CCD viewing field of camera.
Further, said optical light-collecting system comprises optical light-collecting device and pattern generator, and said exposure light source is corresponding with the optical light-collecting device; Said projection optical system comprises first lens or lens combination, first Amici prism, second Amici prism and at least two projection lens; Said first lens or lens combination and first Amici prism are successively set on the downside of pattern generator from top to bottom; Second Amici prism is arranged on the side of first Amici prism; Said projection lens is arranged on the downside of second Amici prism, and said projection lens is arranged in the camera lens throw-over gear of wheel plate-like; Said optical alignment detection system comprises CCD camera, second lens or lens combination and the 3rd Amici prism that is provided with from top to bottom, and second lens or lens combination are corresponding with said projection lens through the 3rd Amici prism and second Amici prism successively from top to bottom; Said focusing system is arranged on the side of projection optical system.
Preferably, in step 3), article carrying platform is the center of circle at the space physics coordinate with article carrying platform, with a be to do in the spacing circle of radius to shift out and returning movement, and a is less than or equal to the visual field radius of CCD camera.
Further, said article carrying platform shifts out apart from a along eight directions respectively in spacing circle, and the angle angle between the adjacent both direction is 45 °.
The present invention has following beneficial effect:
What 1), the present invention had directly utilized various optical components and mask plate place in the plate-making lithographic equipment can the accurate article carrying platform that moves; Not only realized the measurement of etching system dynamic stability; And measuring accuracy high, be easy to debug, also reduced the measurement cost simultaneously widely.
2), the present invention not only can measure the dynamic stability of etching system in real time; Can also measure the distribution situation of the repetitive positioning accuracy in the whole working face of article carrying platform, test effectively and the checking means thereby can provide a kind of for structural design, systematic analysis and the demarcation of plate-making lithographic equipment.
Description of drawings
Fig. 1 is the structural representation of plate-making lithographic equipment.
Fig. 2 is the distribution synoptic diagram of telltale mark on the mask plate working face.
Fig. 3 is the structural representation of spacing circle.
The implication of mark is following among the figure:
1-exposure light source 2-optical light-collecting device 3-pattern generator
4-first lens or the lens combination 5-first Amici prism 6-second Amici prism
7-projection lens 8-CCD camera 9-second lens or lens combination
10-the 3rd Amici prism 11-camera lens throw-over gear 12-mask plate
13-article carrying platform 14-focusing catoptron 15-is to focus lens or lens combination
The spacing circle of 16-focusing light source 17-telltale mark 18-
Embodiment
As shown in Figure 1, said plate-making lithographic equipment comprises exposure light source 1, optical light-collecting system, projection optical system, camera lens throw-over gear, optical alignment detection system and focusing system.
Said optical light-collecting system comprises optical light-collecting device 2 and pattern generator 3, and said exposure light source 1 is corresponding with optical light-collecting device 2; Said projection optical system comprises first lens or lens combination 4, first Amici prism 5, second Amici prism 6 and at least two projection lens 7; Said first lens or lens combination 4 and first Amici prism 5 are successively set on the downside of pattern generator 3 from top to bottom; Second Amici prism 6 is arranged on the side of first Amici prism 5; Said projection lens 7 is arranged on the downside of second Amici prism 6, and said projection lens 7 is arranged in the camera lens throw-over gear 11 of wheel plate-like; Said optical alignment detection system comprises that from top to bottom the CCD camera 8, second lens or the lens combination 9 that are provided with and the 3rd Amici prism 10, the second lens or lens combination 9 are corresponding with said projection lens 7 through the 3rd Amici prism 10, second Amici prism 6 successively through from top to bottom; Said focusing system is arranged on the side of projection optical system.
Focusing system comprises from top to bottom the focusing light source 16 that is provided with, to focus lens or lens combination 15 and focusing catoptron 14.
Light path in light path in the focusing system and the optical alignment detection system is parallel.
The light that focusing light source 16 in the said focusing system is sent is successively through to the 3rd Amici prism 10 places in focus lens or lens combination 15, focusing catoptron 14 back outgoing to the optical alignment detection systems, passed through second Amici prism 6 and projection lens 7 outgoing in the projection optical system again after 10 reflections of the 3rd Amici prism successively to mask plate 12 places; Light through mask plate 12 reflection after, more successively through the projection lens 7 in the projection optical system and the 3rd Amici prism 10 in second Amici prism 6 and the optical alignment detection system and second lens or lens combination 9 outgoing to the visual field of CCD camera 8.
Further specify below in conjunction with 1～3 pair of course of work of the present invention of accompanying drawing.
1), through the vacuum suction technology with mask plate 12 be fixed on can the accurate article carrying platform 13 that moves on; And with the working face of mask plate 12 respectively along X, Y direction n five equilibrium; Obtain n * n little square region; Four drift angle places in each little square region process specific telltale mark, obtain (n+1) row, (n+1) row telltale mark, like Fig. 1, shown in 2; Wherein said specific telltale mark is crosswise;
2), through moving horizontally article carrying platform 13, the telltale mark of the 1st row the 1st row is moved in the CCD viewing field of camera;
3), utilize the focusing technology, calculate the focal plane position of CCD camera, and through the oscilaltion article carrying platform to realize the specifically labelled focusing of the 1st row the 1st row;
4), utilize image processing techniques; Calculate the center offset between the 1st row the 1st row telltale mark center and the CCD viewing field of camera center; And through moving horizontally article carrying platform; The center that the specifically labelled center of the 1st row the 1st row is moved to the CCD viewing field of camera coincides, simultaneously the space physics coordinate (X of record article carrying platform this moment
11, Y
11);
5), with the space physics coordinate (X of article carrying platform
11, Y
11) be the center of circle; In spacing circle 18, move horizontally article carrying platform; And article carrying platform is shifted out apart from a respectively along 0 °, 45 °, 90 °, 135 °, 180 °, 225 °, 270 °, 315 ° eight directions; As shown in Figure 3, saidly be the radius of spacing circle 18, and a is less than or equal to the visual field radius of CCD camera apart from a;
Shift out at every turn treat that article carrying platform 13 comes to a complete stop after, move article carrying platform 13 again and make it be repositioned to coordinate (X
11, Y
11) locate, behind article carrying platform 13 returns, gather the specifically labelled image of the 1st row the 1st row through the CCD camera again, and calculate the center offset between the 1st row the 1st row telltale mark center and the CCD viewing field of camera center, obtain the center offset E of eight measurements altogether
111, E
112..., E
118, cooperate the mathematical statistics algorithm, calculate and the 1st row the 1st row telltale mark center corresponding repetitive positioning accuracy value E
11
6), through moving article carrying platform, the telltale mark of the 1st row the 2nd row is moved in the CCD viewing field of camera, and repeats step 3)～5), obtain the center offset E that the 1st row the 2nd row telltale mark is measured for eight times
121, E
122..., E
128, cooperate the mathematical statistics algorithm, calculate and the 1st row the 1st row telltale mark center corresponding repetitive positioning accuracy value E
12
7), Using such method, line by line each telltale mark is carried out above-mentioned measurement, obtain and each corresponding repetitive positioning accuracy in telltale mark center, accumulative total can record (n+1) * (n+1) individual repetitive positioning accuracy value;
8), utilize the repetitive positioning accuracy value of (n+1) * (n+1) individual point that step 7) gathers, cooperate the mathematical statistics algorithm, can count the dynamic repetitive positioning accuracy value of this etching system, thereby realize accurate measurement power system dynamic stability property.
Further, can also do more accurately the dynamic stability of etching system and measure, also promptly can also carry out following two steps operation:
9), repeating step 7) m time, obtain m group (n+1) * (n+1) individual repetitive positioning accuracy value;
10), utilize the repetitive positioning accuracy value of m group (n+1) * (n+1) individual point that step 9) gathers, cooperate the mathematical statistics algorithm, can count the dynamic stability value of this etching system.
The present invention makes full use of the aligning imaging system of plate-making lithographic equipment self, adopts image processing techniques, the dynamic stability of accurate measuring light etching system, and method is unique novel, and simple and feasible.Pass through this method; Not only can measure the dynamic deviation amount of lithographic objective and mask plate in the plate-making lithographic equipment quickly and easily; To measure the dynamic stability of etching system in real time; Can also measure the distribution of repetitive positioning accuracy in whole working face of article carrying platform, thus for plate-making lithographic equipment structural design, systematic analysis and demarcation a kind of effective test and checking means are provided.
Claims (9)
1. the dynamic stability measuring method of the lithographic equipment that is used to make a plate is characterized in that comprising following steps:
1), mask plate is fixed on the article carrying platform, and (P＞1) the individual telltale mark of on mask plate, making P;
2), select one of them telltale mark; Said telltale mark is imaged in the CCD viewing field of camera in the plate-making lithographic equipment; And through image processing techniques telltale mark is handled and calculated, to draw the side-play amount at said specifically labelled center and CCD viewing field of camera center, move article carrying platform then; Said specifically labelled center is moved to CCD viewing field of camera center coincide, and the space physics coordinate of record article carrying platform this moment;
3), the space physics coordinate with article carrying platform is the center; Article carrying platform is done in the visual field of CCD camera to be shifted out and returning movement; Also promptly make article carrying platform outwards move a segment distance from its space physics coordinate place earlier; After treating that article carrying platform comes to a complete stop, make article carrying platform move to its space physics coordinate place again again; After article carrying platform moves to its space physics coordinate place again, gather specifically labelled image through the CCD camera, and calculate the center offset between specifically labelled center and the CCD viewing field of camera center;
4), making article carrying platform in the visual field of CCD camera, repeat to do shifts out and returning movement; Then obtain a plurality of center offsets, a plurality of center offsets that obtain are calculated and the corresponding repetitive positioning accuracy value in this specifically labelled center through the mathematical statistics algorithm;
5), each telltale mark is repeated 2)～4) step is to obtain and P the repetitive positioning accuracy value that specifically labelled center is corresponding respectively;
6), at last P repetitive positioning accuracy value calculated the dynamic repetitive positioning accuracy value of this etching system through the mathematical statistics algorithm.
2. the dynamic stability measuring method of the lithographic equipment that is used to make a plate according to claim 1; It is characterized in that: P telltale mark repeated 3 one by one), 4) step m time; Finally each telltale mark is all obtained m repetitive positioning accuracy value, at last P * m repetitive positioning accuracy value calculated the dynamic stability value of this etching system through the mathematical statistics algorithm.
3. the dynamic stability measuring method of the lithographic equipment that is used to make a plate according to claim 1 and 2, it is characterized in that: said telltale mark is evenly distributed on the mask plate.
4. the dynamic stability measuring method of the lithographic equipment that is used to make a plate according to claim 1 and 2, it is characterized in that: said plate-making lithographic equipment comprises exposure light source, optical light-collecting system, projection optical system, camera lens throw-over gear, optical alignment detection system and focusing system; The light that focusing light source in the said focusing system is sent is successively through being radiated on the mask plate behind the optical device in optical alignment detection system and the projection optical system, light through the mask plate reflection after more successively through the optical device of the optical device in the projection optical system, optical alignment detection system in the CCD viewing field of camera in outgoing to the optical alignment detection system;
In step 2) in; Move article carrying platform and the telltale mark of choosing is got in the CCD viewing field of camera, utilize the focusing technology again, calculate the focal plane position of CCD camera; And drive article carrying platform and realize specifically labelled focusing, realize promptly that also said telltale mark images in the CCD viewing field of camera.
5. the dynamic stability measuring method of the lithographic equipment that is used to make a plate according to claim 3; It is characterized in that: with the working face of mask plate also is directions X and Y direction n five equilibrium along two-dimensional directional respectively; Obtain n * n little square region; Drift angle place in each little square region processes telltale mark, obtains finally that equally distributed n+1 is capable, n+1 row telltale mark, and P=(n+1) * (n+1).
6. the dynamic stability measuring method of the lithographic equipment that is used to make a plate according to claim 4 is characterized in that: said optical light-collecting system comprises optical light-collecting device and pattern generator, and said exposure light source is corresponding with the optical light-collecting device; Said projection optical system comprises first lens or lens combination, first Amici prism, second Amici prism and at least two projection lens; Said first lens or lens combination and first Amici prism are successively set on the downside of pattern generator from top to bottom; Second Amici prism is arranged on the side of first Amici prism; Said projection lens is arranged on the downside of second Amici prism, and said projection lens is arranged in the camera lens throw-over gear of wheel plate-like; Said optical alignment detection system comprises CCD camera, second lens or lens combination and the 3rd Amici prism that is provided with from top to bottom, and second lens or lens combination are corresponding with said projection lens through the 3rd Amici prism and second Amici prism successively from top to bottom; Said focusing system is arranged on the side of projection optical system.
7. according to the dynamic stability measuring method of claim 1 or 2 or the 3 or 5 described lithographic equipments that are used to make a plate, it is characterized in that: said telltale mark is crosswise.
8. according to the dynamic stability measuring method of claim 1 or 2 or the 3 or 5 described lithographic equipments that are used to make a plate; It is characterized in that: in step 3); Article carrying platform is the center of circle at the space physics coordinate with article carrying platform; Be to do in the spacing circle of radius to shift out and returning movement with a, and a is less than or equal to the visual field radius of CCD camera.
9. the dynamic stability measuring method of the lithographic equipment that is used to make a plate according to claim 8 is characterized in that: said article carrying platform shifts out apart from a along eight directions respectively in spacing circle, and the angle angle between the adjacent both direction is 45 °.
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| CN2012100084370A CN102566309A (en) | 2012-01-12 | 2012-01-12 | Method for measuring dynamic stability of plate-making lithography equipment |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105241399A (en) * | 2015-09-09 | 2016-01-13 | 合肥芯碁微电子装备有限公司 | Method of measuring dynamic flatness of precision positioning platform |
| CN108053803A (en) * | 2017-12-29 | 2018-05-18 | 广东欧珀移动通信有限公司 | Display bearing calibration, display correction device and the display correction system of display module |
| CN113567397A (en) * | 2021-08-11 | 2021-10-29 | 苏州索真生物技术有限公司 | Microfluidic chip, microfluidic chip channel positioning structure and positioning method |
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| CN102289153A (en) * | 2011-05-31 | 2011-12-21 | 合肥芯硕半导体有限公司 | Method for measuring steady state stability of plate-making etching equipment |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105241399A (en) * | 2015-09-09 | 2016-01-13 | 合肥芯碁微电子装备有限公司 | Method of measuring dynamic flatness of precision positioning platform |
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Application publication date: 20120711 |