CN102566030B - Liquid film dynamic compensating device - Google Patents

Liquid film dynamic compensating device Download PDF

Info

Publication number
CN102566030B
CN102566030B CN201210036504.XA CN201210036504A CN102566030B CN 102566030 B CN102566030 B CN 102566030B CN 201210036504 A CN201210036504 A CN 201210036504A CN 102566030 B CN102566030 B CN 102566030B
Authority
CN
China
Prior art keywords
liquid
round
liquid film
recovery
film dynamic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201210036504.XA
Other languages
Chinese (zh)
Other versions
CN102566030A (en
Inventor
陈晖�
杜恒
陈淑梅
陈传铭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuzhou University
Original Assignee
Fuzhou University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuzhou University filed Critical Fuzhou University
Priority to CN201210036504.XA priority Critical patent/CN102566030B/en
Publication of CN102566030A publication Critical patent/CN102566030A/en
Application granted granted Critical
Publication of CN102566030B publication Critical patent/CN102566030B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

The invention discloses a liquid film dynamic compensation device. The liquid film dynamic compensation device is arranged between an optical lens and a substrate, a self-adaptive gas sealing belt is arranged at the periphery of a liquid injecting cavity, an isolation belt, a gas releasing cavity and a recovery end sealing belt are arranged at the periphery of a row of recovery holes, and thus the long-term stability of a flow field boundary under the dynamic update of the liquid is facilitated. Based on the pressure distribution characteristic of the flow field, non-uniform energy is applied to the boundary so that the liquid is facilitated to gather towards the center, and thus the impact at a low-pressure position of the flow field, caused by overlarge sealing energy, and the leakage at a high-pressure position of the flow field, caused by the shortage of the sealing energy, are avoided; and due to a corresponding structure at the periphery of the recovery holes, the sealing is reliable, the recovery gas-liquid two-phase flow is simultaneously restrained, and the stability of a system is enhanced. According to the liquid film dynamic compensation device disclosed by the invention, the flow updating of the liquid can be realized, thus the improvement of the cleanliness of the liquid at an observation area is facilitated, the reliability of observation imaging is enhanced, and the requirement for the cleanliness of the environment is lowered.

Description

A kind of liquid film dynamic compensating device
Technical field
The present invention relates to a kind of liquid film dynamic compensating device, particularly relates to a kind of liquid film dynamic compensating device for immersion microscope (Immersion Microscope).
Background technology
In industries such as semiconductors, for Fault analytical and the reliability evaluation of trickle electron device, be the key of guaranteeing yield rate.Conventionally the mode adopting is using electron device as sample, observes under the microscope, to determine whether to exist defect or the impurity that affects the normal work of device.Yet the characteristic line breadth that is accompanied by electron device constantly dwindles below towards 32 nanometers, and the continuous increase of substrate (as semi-conductor silicon chip) size, the technical costs of traditional observed pattern is in rapid rising.
Immersion microscopic system, by filling the liquid such as pure water in the thin layer gap between object lens front end and substrate (as silicon chip or crystal liquid substrate etc.), form liquid film, to improve the refractive index of this Region Medium, thereby indirectly increase the numerical aperture (NA) of object lens, obtained higher observation resolution (for example, referring to Chinese patent 200680039343.2).Because immersion mode relates generally to the region between object lens front end and substrate, little for original light path system impact, therefore well inherited prior art, when improving observation resolution, possessed good economy.
Immersion microscopic system, mainly by being interrupted the mode of feed flow, is transported to liquid in the gap area of substrate top and object lens front end at present, shows as dropping liquid observation and monitoring fluid infusion two schemes.Dropping liquid observation program (for example, referring to US Patent No. 2005179997A1) is before starting observation, and input certain capacity liquid, to surface to be observed, completes after this time observed and by reclaim line, liquid detached.Monitoring fluid infusion scheme (for example, referring to Jap.P. JP2010026218A) is on the basis of dropping liquid observation, observation area drop capacity is monitored in real time, when capacity is less than preset value, carry out fluid infusion, suppress thus the observation that drop evaporation causes unreliable, to adapt to long-time observation.
Be interrupted feed flow and adopt the once pattern of the corresponding feed flow of observation, there is form simply and be easy to the advantages such as realization.Yet owing to not upgrading in observation process, liquid is easily contaminated, and exist for thus following problems:
1) be interrupted feed liquid way and easily cause the accumulation of polluting, the reliability of impact observation.In micro-nano observation process, be filled in the liquid between object lens and substrate, become in fact a part for light path, played the effect of object lens, therefore need to possess the cleanliness of height.Yet, because liquid does not flow, being accompanied by the carrying out of observation, the pollution of substrate top layer and periphery, flow field is constantly spread and is accumulated to observation area, and liquid quality will face deterioration; Especially for long-time observation operating mode, breed bacteria even thus.This will change liquid property, and cause the one-tenth image distortion of micro-nano observation.
2) be accompanied by the accumulation of flow field internal contamination, pollutant constantly deposits to objective lens surface, will have a strong impact on observation quality.After observation, increasing object lens matting (as referring to Jap.P. JP2007065257A) will contribute to obtain clean objective lens surface, but has therefore reduced work efficiency, has indirectly increased the cost of observation.
3) adverse effect of for suppressing the pollutions such as the peripheral organism in flow field and particle, observation liquid being brought, the ventilating system (as referring to Jap.P. JP2007127939A) that applies purified treatment in liquid to be observed periphery is an effective approach.Yet because liquid is in immobilising zero-pressure state, the gas exerts of certain pressure, at the less liquid edge of capacity, will force liquid boundary that fluctuation occurs and increase the possibility of leakage; In addition, if liquid supplements not in time, liquid periphery applies the mode meeting accelerating liquid evaporation of ventilation, and impels the generation of water stain defect.
Summary of the invention
The object of the invention is to provide a kind of liquid film dynamic compensating device, between substrate and the end component of object lens in real-time update liquid, pressure distribution feature according to observation flow field, applies non-homogeneous sealing energy to obtain reliable and stable border, flow field in its periphery.
In order to achieve the above object, the technical solution used in the present invention is as follows: comprise that a center has the disk body in column observation chamber, one side of described disk body has fluid injection chamber and self-adaptation air seal band successively, and described fluid injection chamber is that radian is got 30~150 ° of ring-shaped cylinder cavitys; Described self-adaptation air seal band is that 1~3 group of radian is got the ring-shaped cylinder round array of 60~180 °; The opposite side of described disk body has successively and reclaims round, isolation strip, air release chamber and recovery end band, and described recovery round is that radian is got the annular round array of 30~150 °; Described isolation strip is that radian is got the annular boss of 30~150 °; Described air release chamber is that radian is got the ring-shaped cylinder cavity of 30~150 °; Described recovery end band is that 1 ~ 6 group of radian is got the ring-shaped cylinder round array of 60~180 °.
Round aperture on described self-adaptation air seal band along with and the plane of symmetry (P-P cross section) between distance increase and diminish.
Round hole personal attendant on described self-adaptation air seal band and the plane of symmetry (P-P cross section) between distance increase and become large.
The aperture of self-adaptation air seal band is 0.05~3mm, and the aperture of described recovery end band is 0.05~1mm.Between the lower surface of isolation strip and recovery round lower surface, distance is 0.1~0.8mm; Between the lower surface of isolation strip and time air release chamber lower surface, distance is 0.1~0.5mm.
Meanwhile, in liquid film dynamic compensating device periphery, drying device is set, drains and be dried the drop that may leak.Drying device can force liquid backflow in flow field by applying the gas of certain pressure, or applies the liquid that certain negative pressure is leaked with row's suction.
The beneficial effect that the present invention has is:
1) effectively improve the cleanliness factor of observation area liquid, and strengthen the reliability of observation imaging.The mobile renewal of liquid, will take away the pollution existing in flow field in real time, makes liquid keep high cleaning; Especially for the operating mode of long-time observation, than being interrupted feed liquid way, liquid upgrades the quality that can significantly improve observation.
2) accumulation that inhibition is polluted and resident, lowers the requirement to environment cleanliness.Liquid upgrade can block contaminants to diffusion and the deposition of objective lens surface, effectively improve the cleanliness factor of object lens, significantly reduce thus object lens wash number, increase work efficiency; In addition, periphery, flow field diffuses into the pollutant of liquid, also will be accompanied by liquid flow and takes away in real time, thereby reduce the requirement of stream field environment cleanliness, contributes to simplify or cancel current purification ventilating system.
3) the non-homogeneous energy sealing means based on fluid field pressure characteristic distributions, contributes to obtain reliable and stable border, flow field, is particularly useful for the operating mode of long-time observation.Based on fluid field pressure characteristic distributions, on border, apply the mode of impelling the non-homogeneous energy that liquid gathers to center, by the leakage that contributes to resist Non-uniform Currents pressure and border molecular diffusion and cause, to obtain long-acting stable border, flow field.Than the all-round even sealing means of classics, this mode can avoid low pressure place, flow field because of the sealing energy excessive disturbance of border, flow field and the impact causing, and the leak of liquid that causes because of sealing energy shortage of high pressure place, flow field.
4) the dual recovery structure having complementary functions, contributes to the gas-liquid two-phase medium in separated removal process, thus biphase gas and liquid flow and the vibration that causes thereof in suppress reclaiming.
Accompanying drawing explanation
Fig. 1 rough schematic view that to be the present invention assemble mutually with lens combination.
Fig. 2 is the upward view of liquid film dynamic compensating device of the present invention.
Fig. 3 is P-P cross section view of the present invention.
Fig. 4 is flow field of the present invention sealing principle.
Fig. 5 is the fluid injection end hermetically-sealed construction of first embodiment of the invention.
Fig. 6 is the fluid injection end hermetically-sealed construction of second embodiment of the invention.
Fig. 7 characterizes the feed flow principle that substrate is moved along fluid injection cavity direction by center.
Fig. 8 characterizes the recovery principle that substrate is moved along fluid injection cavity direction by center.
Fig. 9 be characterize substrate by mind-set reclaim the sealing principle under round direction motion state.
In figure: 1, immersion microscope, 2, lens combination, 3, liquid film dynamic compensating device, 4, substrate, 5, eyepiece, 6, observation chamber, 7, fluid injection chamber, 8A, reclaim round, 8B, air release chamber, 9A, self-adaptation air seal band, 9B, recovery end band, 10, isolation strip, 11, drying device, 12, gap liquid film, 13, liquid flow track, 14, sealing gas, 15, non-uniform holes gas access, 16, seal gas pressure field, 17, long gas access, non-homogeneous hole, 18, liquid velocity distributes, 19, boss, 20, interface drop, 21, pipeline drop.
Embodiment
Below in conjunction with drawings and Examples, the specific embodiment of the present invention is described.
Fig. 1 has schematically shown the liquid film dynamic compensating device of embodiment of the present invention and the assembling of lens combination, and the liquid film dynamic compensating device 3 arranging between lens combination 2 and substrate 4 can be applied in the microscopy apparatus such as immersion microscope 1.In actual observation, substrate 4(silicon chip or crystal liquid substrate etc.) surperficial light, via gap liquid film and the lens combination 2 of substrate 4 tops, is obtained for microscopic analysis by relevant device.For the consideration of plant factor and economy, can there are direct range estimation and two kinds of patterns of image analysis in immersion microscopic observation.If the wavelength of viewing ray is visible ray, can directly observe by eyepiece 5; If employing ultraviolet light first by CCD collected by camera observation data, and is shown in monitoring equipment.
Fig. 2~Fig. 3 has schematically shown the liquid film dynamic compensating device of embodiment of the present invention, and center has the observation chamber 6 of column,
Outside perpendicular to substrate 4, a side has fluid injection chamber 7 successively, for radian, gets 30~150 ° of ring-shaped cylinder cavitys, and fluid injection chamber 7 is preferably 120 °; Self-adaptation air seal band 9A is that 1~3 group of radian is got the ring-shaped cylinder round array of 60~180 °;
Outside perpendicular to substrate 4, opposite side has successively and reclaims round 8A, for radian is got the annular round array of 30~150 °, reclaims round 8A and is preferably 120 °; Isolation strip 10, for radian is got the annular boss of 30~150 °; Air release chamber 8B, for radian is got the ring-shaped cylinder cavity of 30~150 °; Recovery end band 9B is that 1 ~ 6 group of radian is got the ring-shaped cylinder round array of 60~180 °.
Self-adaptation air seal band 9A along with and P-P cross section between distance increase, the aperture of its round ( d) diminish, the hole length of its round ( l) become large.The aperture of self-adaptation air seal band 9A is 0.05~3mm, and the aperture of recovery end band 9B is 0.05~1mm.Between the lower surface of isolation strip 10 and recovery round 8A lower surface, distance is 0.1~0.8mm; Between the lower surface of isolation strip 10 and time air release chamber 8B lower surface, distance is 0.1~0.5mm.
Meanwhile, in liquid film dynamic compensating device periphery, drying device 11 is set, drains and be dried the drop that may leak.
In the initialization of flow field, from the liquid of extraneous pipeline access, under certain pressure effect, via fluid injection chamber 7, input, formation gap, the region liquid film 12 between observation chamber 6 and substrate 4, reclaims from reclaiming round 8A realization subsequently.When liquid flow upgrades, via self-adaptation air seal band 9A and the recovery end band 9B of periphery, flow field, liquid boundary is applied to the air curtain of non-homogeneous pressure, impel border liquid to inside, flow field, to gather to suppress to leak.In addition, by 8BHe isolation strip, air release chamber 10 is set, the gas that suppresses recovery end entrainments and biphase gas and liquid flow, and encloses outside and put 11 pairs of drying devices and may leak drop and implement dry.
Fig. 4 has schematically represented flow field of the present invention sealing principle.Liquid by 7 inputs of fluid injection chamber, via the below in observation chamber 6, reclaims by reclaiming round 8A realization under liquid supply pressure drives.It is preferred adopting annular fluid injection and recovery structure, and than rectangular configuration, it has larger input and output area, thereby increase liquid, inputs to improve the cleanliness factor in flow field and the reliability of observation.Fig. 4 has provided the liquid flow track 13 under annular liquid feeding structure.
In concrete enforcement, reclaim round 8A and preferably adopt negative pressure suction, which can reduce the input pressure requirement to fluid injection chamber 7, thereby reduces near the liquid in fluid injection chamber 7 to the drive of external leakage.The liquid of recovery end is after the obstruct of the absorption through recovery round 8A and isolation strip 10, and the probability that leakage occurs in observation process is less.But, in substrate, from observation area, enter the process of next observation area, liquid still may cause leakage under substrate rapid movement tractive.For this reason, in isolation strip, 10 periphery arranges air release chamber 8B and recovery end band 9B.Recovery end band 9B inputs little pressed gas, and drains by air release chamber 8B, normally works when disturbing avoiding to reclaiming round 8A, and round 8A is peripheral forms one sealing barrier reclaiming.In force, recovery end band 9B conventionally only crosses over when outwards move in isolation strip 10 and just works at substrate tractive liquid.
Under the typical condition reclaiming in malleation fluid injection and negative pressure, flow field is by the pressure distribution forming as shown in Figure 4, and wherein "+" represents malleation, and "-" represents negative pressure, and more than " +/-" number, representative pressure numerical value is larger.The liquid of inputting due to annular fluid injection chamber 7 is tending towards to flow field center flow, this effect of gathering makes the attached paracentral pressure in fluid injection chamber 7 maximum (+++), and upper and lower pressure at two ends (+) less than normal forms different big or small pressure distribution thus in 7 outsides, fluid injection chamber.The present invention applies self-adaptation air seal band 9A by near the border, flow field fluid injection chamber 7, forms the air curtain of non-homogeneous sealing load, to resist the not identical fluid field pressure of distribution.Sealing mode helps avoid low pressure place, flow field and impacts because of the excessive liquid perturbation that causes of sealing energy, and the leak of liquid that causes because of sealing energy shortage of high pressure place, flow field.
Fig. 5 is the fluid injection end hermetically-sealed construction of first embodiment of the invention.What the figure shows is the Q-Q cut-open view of self-adaptation air seal band 9A in Fig. 4.From front analysis, near fluid injection chamber 7, upper and lower pressure at two ends is less than normal and center pressure is maximum, and the sealing energy that periphery, flow field applies same Changing Pattern is useful.Based in the flowing of gas in circular hole, be subject to aperture ddirect impact, aperture is larger, flow resistance and pressure drop are just less, the pressure of output is also just larger; In this enforcement, the aperture of self-adaptation air seal band 9A dpresent feature broad in the middle, narrowing toward each end.The sealing gas 14 of input is via non-uniform holes gas access 15 thus, seal gas pressure field 16 broad in the middle by forming above substrate 4, narrowing toward each end, thereby preferably and fluid field pressure match, contribute to form reliable and stable border, flow field.
Fig. 6 is the fluid injection end hermetically-sealed construction of second embodiment of the invention.It is based on gas flow, to be subject to the impact of circular hole parameter equally that this structure is implemented principle, and circular hole length is shorter, and flow resistance and pressure drop are just less, and the pressure of output is also just larger.In this enforcement, the hole of self-adaptation air seal band 9A is long lthe feature of short in the middle of presenting, two length of sides.The sealing gas 14 of input is grown gas access 17 via non-homogeneous hole thus, seal gas pressure field 16 broad in the middle by forming above substrate 4, narrowing toward each end, thus match with the pressure on border, flow field.
In order further to strengthen sealing reliability, the present embodiment can be combined with the first embodiment, the structure of large footpath, short hole, two ends slotted hole path in the middle of self-adaptation air seal band 9A is arranged to, further to strengthen the sealing effectiveness near the border, flow field center, fluid injection chamber.
Fig. 7 characterizes the feed flow principle that substrate is moved along fluid injection cavity direction by center.When immersion microscope is when observation area enters into next observation area, substrate will move, and speed is faster, and efficiency is just higher.Due to the effect of liquid viscosity power, substrate 4 moves tractive gap liquid film 12, and forms the liquid velocity distribution 18 in figure, will increase the instability on border, flow field thus, even causes and leaks.Be accompanied by the outside motion of substrate, partially liq is done same movement under substrate viscosity tractive, yet liquid flow has been subject to the obstruction of boss 19 and place, gap interfacial tension, thereby causes the pressure in this region prise.In this enforcement, preferably fluid injection chamber 7 adopts constant-pressure liquid supply, and self-adaptation air seal band 9A applies the gas of constant flow.Pressure when below, fluid injection chamber pduring rising, the mode of constant-pressure liquid supply contributes to reduce the input of liquid, lowers the risk of leaking.In addition, when liquid outwards moves, be accompanied by the dwindling of air release space of self-adapting seal band 9A below, constant flow sealing gas is hindered, and causes pressure p arise, strengthen thus the sealing effectiveness on stream field border.Same, being accompanied by substrate 4 by Flow Field outside central motion, sealing gas is interrupted to be reduced, and pressure decreased has reduced the impact on stream field border thus.
Fig. 8 characterizes the recovery principle that substrate is moved along fluid injection cavity direction by center.Recovery end and near, working fluid and ambient atmos are easily recovered under suction function simultaneously, interaction of gas and liquid easily forms bubble breaking, and forms thus impact, has increased the instability of system.In this enforcement, due to the iris action of isolation strip 10, when substrate 4 is static, liquid mainly absorbs by reclaiming round 8A, and ambient atmos is drained by air release chamber 8B.Be accompanied by substrate to the motion of fluid injection cavity direction, the little pressed gas of recovery end band 9B input tends to drain from the less air release chamber 8B of resistance equally, has suppressed thus gas and has entrainmented into recovery round 8A and the two-phase flow that causes thereof.
Fig. 9 be characterize substrate by mind-set reclaim the sealing principle under round direction motion state.Under this operating mode, liquid is likely broken through isolation strip 10 to external leakage.If leakage rate is hour, recovery end band 9B input have the body of calming the anger by forcing the interface drop 20 that may leak out to be back in gap liquid film 12, maintain the stability on border.Under some exceedingly odious operating modes, recovery end band 9B and air release chamber 8B will form the barrier of sealing jointly, now air release chamber 8B will play the effect of outside recycling cavity, and liquid is recovered the form with pipeline drop 21 or continuous flow through air release chamber 8B.In concrete enforcement, the negative pressure value of air release chamber 8B should be less than and reclaim round 8A, to impel liquid preferentially to drain from reclaiming round 8A.

Claims (4)

1. a liquid film dynamic compensating device, the liquid film dynamic compensating device (3) arranging between lens combination (2) and substrate (4), is characterized in that: comprise that a center has the disk body in column observation chamber (6),
One side of described disk body has fluid injection chamber (7) and self-adaptation air seal band (9A) successively, and 30~150 ° of ring-shaped cylinder cavitys are got for radian in described fluid injection chamber (7); Described self-adaptation air seal band (9A) is that 1~3 group of radian is got the ring-shaped cylinder round array of 60~180 °;
The opposite side of described disk body has successively and reclaims round (8A), isolation strip (10), air release chamber (8B) and recovery end band (9B), and described recovery round (8A) is got the annular round array of 30~150 ° for radian; The annular boss of 30~150 ° is got for radian in described isolation strip (10); The ring-shaped cylinder cavity of 30~150 ° is got for radian in described air release chamber (8B); Described recovery end band (9B) is that 1 ~ 6 group of radian is got the ring-shaped cylinder round array of 60~180 °;
The aperture of described self-adaptation air seal band (9A) is 0.05~3mm, and the aperture of described recovery end band (9B) is 0.05~1mm;
Between the lower surface of described isolation strip (10) and recovery round (8A) lower surface, distance is 0.1~0.8mm; Between the lower surface of isolation strip (10) and air release chamber (8B) lower surface, distance is 0.1~0.5mm;
Described fluid injection chamber (7), self-adaptation air seal band (9A), reclaim in round (8A), isolation strip (10), air release chamber (8B) and recovery end band (9B) each and all using column and observe a centre section in chamber be symmetrical arranged as the plane of symmetry (P-P).
2. a kind of liquid film dynamic compensating device according to claim 1, is characterized in that: the round aperture on described self-adaptation air seal band (9A) ( d) along with and the plane of symmetry (P-P) between distance increase and diminish.
3. a kind of liquid film dynamic compensating device according to claim 1, is characterized in that: round hole on described self-adaptation air seal band (9A) long ( l) along with and the plane of symmetry (P-P) between distance increase and become large.
4. a kind of liquid film dynamic compensating device according to claim 1, is characterized in that: the periphery of described liquid film dynamic compensating device (3) is provided with drying device (11).
CN201210036504.XA 2012-02-18 2012-02-18 Liquid film dynamic compensating device Expired - Fee Related CN102566030B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201210036504.XA CN102566030B (en) 2012-02-18 2012-02-18 Liquid film dynamic compensating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201210036504.XA CN102566030B (en) 2012-02-18 2012-02-18 Liquid film dynamic compensating device

Publications (2)

Publication Number Publication Date
CN102566030A CN102566030A (en) 2012-07-11
CN102566030B true CN102566030B (en) 2014-05-07

Family

ID=46411853

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201210036504.XA Expired - Fee Related CN102566030B (en) 2012-02-18 2012-02-18 Liquid film dynamic compensating device

Country Status (1)

Country Link
CN (1) CN102566030B (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7580112B2 (en) * 2005-08-25 2009-08-25 Nikon Corporation Containment system for immersion fluid in an immersion lithography apparatus
CN100565352C (en) * 2008-07-29 2009-12-02 浙江大学 Be used for litho machine submergence control device
CN101403861B (en) * 2008-10-21 2010-08-25 浙江大学 Immersion self-adapting seal control device used for photo-etching machine
CN100595678C (en) * 2008-10-21 2010-03-24 浙江大学 Immerging liquid recovering damping control device used for mask aligner

Also Published As

Publication number Publication date
CN102566030A (en) 2012-07-11

Similar Documents

Publication Publication Date Title
KR100505180B1 (en) A liquid crystal dispensing apparatus with a nozzle cleaning device and a method of dispensing liquid crystal using thereof
CN103962341B (en) A kind of blow device for removing electrostatic chuck surface foreign matter
CN102566030B (en) Liquid film dynamic compensating device
CN102566031B (en) Anti-bubble liquid control device
CN205840827U (en) Oil gas field waste liquid high efficiency separation processing system
CN104238277A (en) Immersion-type photoetching machine and flow field maintaining method
CN102540443B (en) Slit flow stability control device
CN102937777B (en) Gas-sealing and gas-liquid isolating device for immersed type photoetching machine
CN102707580B (en) Hermetic sealing and gas-liquid separation and recovery device for immersed photoetching machine
CN103149672B (en) Gap flow control device of immersion microscope
KR20090070735A (en) Fluid dispensing device and cleaning method thereof
CN105664630A (en) Air cleaning apparatus for livestock breeding
KR200444567Y1 (en) The Method of optical device for dust protection housing Front glass
CN206676807U (en) A kind of silicon wafer turnover flusher
CN105807566A (en) Maintenance apparatus for immersion lithography machine immersion flow field
CN103149673A (en) Gap flowing status maintaining device
CN103969964B (en) For hermetic seal and the micropore packoff of immersed photoetching machine
CN103268059B (en) Multi-stage negative pressure recovery seal and gas seal device for immersed lithography machine
CN105223786A (en) For preventing method and the device of camera lens atomized inside
CN203474748U (en) Filler flushing device of biological desulfurization tower
CN207042146U (en) A kind of spinning and weaving workshop removes weaving dirt device with movable type
CN206334929U (en) A kind of sample needle cleaning device
US20060108321A1 (en) Etching apparatus
CN112680338B (en) Inoculation and sampling device for walnut endophytic bacterium HB1310 fermented cotton stalk hydrolyzed sugar liquid oil production fermentation broth
TW201922087A (en) Floating irrigation device

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20140507

Termination date: 20170218

CF01 Termination of patent right due to non-payment of annual fee