CN102560363A - Method for manufacturing anti-reflecting film for reflecting achromatic light in visible light area - Google Patents

Method for manufacturing anti-reflecting film for reflecting achromatic light in visible light area Download PDF

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Publication number
CN102560363A
CN102560363A CN2012100600092A CN201210060009A CN102560363A CN 102560363 A CN102560363 A CN 102560363A CN 2012100600092 A CN2012100600092 A CN 2012100600092A CN 201210060009 A CN201210060009 A CN 201210060009A CN 102560363 A CN102560363 A CN 102560363A
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China
Prior art keywords
vakuumkammer
coating equipment
film
coating
sheet material
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CN2012100600092A
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Chinese (zh)
Inventor
沈励
陈奇
石富银
许沐华
吴克坚
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TIANJIN AMTECH VACUUM TECHNOLOGY Co Ltd
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TIANJIN AMTECH VACUUM TECHNOLOGY Co Ltd
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Priority to CN2012100600092A priority Critical patent/CN102560363A/en
Publication of CN102560363A publication Critical patent/CN102560363A/en
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Abstract

The invention discloses a method for manufacturing an anti-reflecting film for reflecting achromatic light in a visible light area. The method comprises the following steps of: I. dehumidifying a PMMA (polymethyl methacrylate) plate; II. vacuum-plating the anti-reflecting film: (1). placing the PMMA plate into a vacuum chamber of a film-plating machine, (2). removing water from the upper surface of the PMMA plate, (3). cleaning and activating the surface of the PMMA plate, (4) heating the vacuum chamber of the film-plating machine and (5) depositing a 12.6nm-13.6nm thick zirconium oxide film, a 17.2nm-18.2nm thick silicon dioxide film, a 83.4nm-88.2nm thick zirconium oxide film and a 62nm-65.8nm thick silicon dioxide film on the upper surface of the PMMA plate in turn; and III. taking the PMMA plate plated with the anti-reflecting film from the vacuum chamber of the film-plating machine. After an incident light passes through the anti-reflecting film, the antireflection is realized while the value of the reflectivity of the visible light area is almost kept consistent, so that the reflected light of the anti-reflecting film tends to be the achromatic light and the obtained reflected light is excellent in anti-reflecting effect.

Description

A kind of antireflective coating making method that reflects non-colored light in the visible region
Technical field
The present invention relates to a kind of antireflective coating preparation method, particularly relate to a kind of antireflective coating making method that reflects non-colored light in the visible region.
Background technology
Along with popularizing and application of smart mobile phone product, also increasingly high for the display color requirement of liquid crystal display screen of mobile phone, people expect the visual impact that color is true to nature, gorgeous.Along with the use of iphone4 series IPS3.5 inch image display Retina technique of display on liquid crystal display screen of mobile phone, promoting whole form industry to the low reflection of high definition era development.
Along with antireflective coating in the application aspect LCD of mobile phone protection screen and the camera, people also more and more expect the application of antireflective coating on aspect LCD protection screen and the camera.
Traditional antireflective coating is because there is deviation in the reflectivity in the visible region; So on reflection colour, also there is inconsistent problem; Several kinds of common colors have inclined to one side blueness, green partially, redness or the like partially, and the shortcoming of this design is that the colour consistency of entire block is poor.
In addition, protecting screen of mobile phone generally adopts first coated with antireflection film to republish the mode that black covers printing ink and produces, and can present distinct colors after reflecting the antireflective coating printing of different colours light like this.Influence consistency of product.
Summary of the invention
The present invention provides a kind of antireflective coating making method that reflects non-colored light in the visible region for solving the technical problem that exists in the known technology.
The technical scheme that the present invention takes for the technical problem that exists in the solution known technology is: a kind of antireflective coating making method that reflects non-colored light in the visible region may further comprise the steps:
One) PMMA sheet material dehumidifying;
Two) vacuum coated with antireflection film:
1) PMMA sheet material is put into the Vakuumkammer of coating equipment,
2) upper surface to PMMA sheet material dewaters;
3) PMMA sheet material is carried out cleaning surfaces and activation;
4) Vakuumkammer to coating equipment heats;
5) layer by layer deposition thickness is that the zirconium oxide film of 12.6nm～13.6nm, the silicon dioxide film that thickness is 17.2nm～18.2nm, zirconium oxide film and the thickness that thickness is 83.4nm～88.2nm are the silicon dioxide film of 62nm～65.8nm on the upper surface of PMMA sheet material;
Three) from the Vakuumkammer of coating equipment, take out the PMMA plate that has plated antireflective coating.
Said step 2) the coating process condition of step 5) does in, closes the interior no cathode ion source of Vakuumkammer of coating equipment, and to the lasting vacuum suction of the Vakuumkammer of coating equipment, vacuum tightness is lower than 3 * 10 in the Vakuumkammer of coating equipment -5During torr; Open electron beam gun and the no cathode ion source on the electron beam gun on the coating equipment; Open the no cathode ion source on the Vakuumkammer of coating equipment, and in the Vakuumkammer of coating equipment, to feed flow be the oxygen of 8～20sccm, in the electron beam gun of coating equipment, feeding flow is the oxygen of 5-15sccm.
In said step 2) step 4) in, with the heating of the Vakuumkammer of coating equipment and remain on 60～80 ℃.
Said step 2) step 3) in is: vacuum tightness is lower than 5 * 10 in the Vakuumkammer of coating equipment -5Behind the torr, open the no cathode ion source on the Vakuumkammer of coating equipment, and in the Vakuumkammer of coating equipment, to feed flow be the oxygen of 10～30sccm, the time of aerating oxygen is 30～180s.
Advantage and positively effect that the present invention has are: the ZrO2 film of the two-layer high refractive index through adopting staggered overlay metallizing and the SiO2 film of two-layer low-refraction; And through optimizing the thickness of each tunic; Realized incident light behind the process antireflective coating, the antireflecting while, the reflectivity in the visible region keeps numerical value consistent basically; It is colourless that thereby the reflected light that makes antireflective coating trends towards, to obtain reflecting colourless good anti-reflective effect.
Description of drawings
Fig. 1 is the structural representation of the antireflective coating of employing the present invention making.
Among the figure: 1, PMMA sheet material, 2, zirconium oxide film, 3, silicon dioxide film, 4, zirconium oxide film, 5, silicon dioxide film.
Embodiment
For further understanding summary of the invention of the present invention, characteristics and effect, the following examples of giving an example now, and conjunction with figs. specifies as follows:
Embodiment 1:
See also Fig. 1, a kind of antireflective coating making method that reflects non-colored light in the visible region:
One) PMMA sheet material dehumidifying
With PMMA sheet material 1 baking that dehumidifies, storing temperature is 30 ℃, and storing time is 3 hours.
Two) vacuum coated with antireflection film
1) the PMMA sheet material after will toasting places on the substrate frame, in the Vakuumkammer of the coating equipment of packing into;
2) Vakuumkammer carries out fine pumping, starts the deep cooling low temperature machine that is provided in the Vakuumkammer, makes its design temperature be lower than-120 ℃, can the moisture of PMMA sheet material 1 upper surface thoroughly be removed like this.
3) upper surface to PMMA sheet material 1 cleans and activation
Vacuum tightness is lower than 5 * 10 in the Vakuumkammer of coating equipment -5Behind the torr, open the no cathode ion source on the Vakuumkammer of coating equipment, and in the Vakuumkammer of coating equipment, to feed flow be the oxygen of 20sccm, aeration time is 100s, carries out clean and surface active with the upper surface to PMMA sheet material 1.
4) Vakuumkammer to coating equipment heats
Open the well heater on the Vakuumkammer of coating equipment, the Vakuumkammer of heating coating equipment reaches the vacuum room temp of coating equipment and remains on 70 ℃.
5) coated with antireflection film
Close the no cathode ion source on the Vakuumkammer of coating equipment, the Vakuumkammer of coating equipment is continued vacuum suction, vacuum tightness is lower than 3 * 10 in the Vakuumkammer of coating equipment -5During torr; Open electron beam gun and the no cathode ion source on the electron beam gun on the coating equipment; Open the no cathode ion source on the Vakuumkammer of coating equipment; In the Vakuumkammer of coating equipment, feeding flow is the oxygen of 15sccm, and in the electron beam gun of coating equipment, feeding flow is the oxygen of 10sccm, and successively deposit thickness is the zirconium white (ZrO of 13nm on the upper surface of PMMA base material 1 2) film 2, thickness be the silicon-dioxide (SiO of 17.8nm 2) film 3, thickness be the zirconium white (ZrO of 85.8nm 2) film 4 is the silicon-dioxide (SiO of 64nm with thickness 2) film 5.
Three) from the Vakuumkammer of coating equipment, take out the PMMA plate that has plated antireflective coating
Automatically close no cathode ion source and electron beam gun after plated film is accomplished, deep cooling low temperature machine quits work simultaneously, and the Vakuumkammer of coating equipment is inflated, and when vacuum tightness arrived atmospheric condition in the Vakuumkammer of machine to be coated, door for vacuum chamber was opened automatically.This is just can from the Vakuumkammer of coating equipment, take out substrate frame, and the PMMA plate that is coated with antireflective coating is taken off from substrate frame.
Adopt spectrophotometer that above-mentioned antireflective coating is tested, the numerical value of transmitance and reflectivity is following:
Wavelength nm Transmitance % Wavelength nm Transmitance % Wavelength nm Reflectivity % Wavelength nm Reflectivity %
400 93.16 560 94.09 400 0 560 0.46
410 93.66 570 94.09 410 0 570 0.41
420 93.88 580 94.08 420 0.04 580 0.41
430 93.97 590 94.06 430 0.26 590 0.38
440 94.07 600 94.13 440 0.36 600 0.46
450 94.04 610 94.12 450 0.49 610 0.38
460 94.06 620 94.08 460 0.53 620 0.44
470 94.05 630 94.05 470 0.61 630 0.39
480 94.01 640 94.08 480 0.6 640 0.49
490 94.07 650 94.08 490 0.59 650 0.37
500 94.04 660 94.06 500 0.61 660 0.42
510 94.07 670 94.06 510 0.58 670 0.5
520 94.11 680 93.96 520 0.54 680 0.35
530 94.08 690 93.9 530 0.5 690 0.56
540 94.09 700 93.74 540 0.49 700 0.41
550 94.12 550 0.46
Data in the last table show: incident light is being realized the antireflecting while through behind the antireflective coating, the reflectivity basically identical in the visible region, thus make the reflected light trend of antireflective coating colourless, obtained the good anti-reflective effect of reflection non-colored light.
Embodiment 2:
See also Fig. 1, a kind of antireflective coating making method that reflects non-colored light in the visible region:
One) PMMA sheet material dehumidifying
With PMMA sheet material 1 baking that dehumidifies, storing temperature is 55 ℃, and storing time is 2 hours.
Two) vacuum coated with antireflection film
1) the PMMA sheet material after will toasting places on the substrate frame, in the Vakuumkammer of the coating equipment of packing into;
2) Vakuumkammer carries out fine pumping, starts the deep cooling low temperature machine that is provided in the Vakuumkammer, makes its design temperature be lower than-120 ℃.
3) upper surface to PMMA sheet material 1 cleans and activation
Vacuum tightness is lower than 5 * 10 in the Vakuumkammer of coating equipment -5Behind the torr, open the no cathode ion source on the Vakuumkammer of coating equipment, and in the Vakuumkammer of coating equipment, to feed flow be the oxygen of 10sccm, aeration time is 180s.
4) Vakuumkammer to coating equipment heats
Open the well heater on the Vakuumkammer of coating equipment, the Vakuumkammer of heating coating equipment reaches the vacuum room temp of coating equipment and remains on 60 ℃.
5) coated with antireflection film
Close the no cathode ion source on the Vakuumkammer of coating equipment, the Vakuumkammer of coating equipment is continued vacuum suction, vacuum tightness is lower than 3 * 10 in the Vakuumkammer of coating equipment -5During torr; Open electron beam gun and the no cathode ion source on the electron beam gun on the coating equipment; Open the no cathode ion source on the Vakuumkammer of coating equipment; In the Vakuumkammer of coating equipment, feeding flow is the oxygen of 20sccm, and in the electron beam gun of coating equipment, feeding flow is the oxygen of 15sccm, and successively deposit thickness is the zirconium white (ZrO of 13.6nm on the upper surface of PMMA base material 1 2) film 2, thickness be the silicon-dioxide (SiO of 18.2nm 2) film 3, thickness be the zirconium white (ZrO of 88.2nm 2) film 4 is the silicon-dioxide (SiO of 65.8nm with thickness 2) film 5.
Three) from the Vakuumkammer of coating equipment, take out the PMMA plate that has plated antireflective coating
Automatically close no cathode ion source and electron beam gun after plated film is accomplished, deep cooling low temperature machine quits work simultaneously, and the Vakuumkammer of coating equipment is inflated, and when vacuum tightness arrived atmospheric condition in the Vakuumkammer of machine to be coated, door for vacuum chamber was opened automatically.This is just can from the Vakuumkammer of coating equipment, take out substrate frame, and the PMMA plate that is coated with antireflective coating is taken off from substrate frame.
Adopt spectrophotometer that above-mentioned antireflective coating is tested, the numerical value of transmitance and reflectivity is following:
Wavelength nm Transmitance % Wavelength nm Transmitance % Wavelength nm Reflectivity % Wavelength nm Reflectivity %
400 93.88 560 94.08 400 0.04 560 0.41
410 93.97 570 94.06 410 0.26 570 0.38
420 94.07 580 94.13 420 0.36 580 0.46
430 94.04 590 94.12 430 0.49 590 0.38
440 94.06 600 94.08 440 0.53 600 0.44
450 94.05 610 94.05 450 0.61 610 0.39
460 94.01 620 94.08 460 0.6 620 0.49
470 94.07 630 94.08 470 0.59 630 0.37
480 94.04 640 94.06 480 0.61 640 0.42
490 94.07 650 94.06 490 0.58 650 0.5
500 94.11 660 93.96 500 0.54 660 0.35
510 94.08 670 93.9 510 0.5 670 0.56
520 94.09 680 93.74 520 0.49 680 0.41
530 94.12 690 93.62 530 0.46 690 0.40
540 94.09 700 93.60 540 0.46 700 0.39
550 94.09 550 0.41
Data in the last table show: incident light is being realized the antireflecting while through behind the antireflective coating, the reflectivity basically identical in the visible region, thus make the reflected light trend of antireflective coating colourless, obtained the good anti-reflective effect of reflection non-colored light.
Embodiment 3:
See also Fig. 1, a kind of antireflective coating making method that reflects non-colored light in the visible region:
One) PMMA sheet material dehumidifying
With PMMA sheet material 1 baking that dehumidifies, storing temperature is 80 ℃, and storing time is 0.5 hour.
Two) vacuum coated with antireflection film
1) the PMMA sheet material after will toasting places on the substrate frame, in the Vakuumkammer of the coating equipment of packing into;
2) Vakuumkammer carries out fine pumping, starts the deep cooling low temperature machine that is provided in the Vakuumkammer, makes its design temperature be lower than-120 ℃.
3) upper surface to PMMA sheet material 1 cleans and activation
Vacuum tightness is lower than 5 * 10 in the Vakuumkammer of coating equipment -5Behind the torr, open the no cathode ion source on the Vakuumkammer of coating equipment, and in the Vakuumkammer of coating equipment, to feed flow be the oxygen of 30sccm, aeration time is 30s.
4) Vakuumkammer to coating equipment heats
Open the well heater on the Vakuumkammer of coating equipment, the Vakuumkammer of heating coating equipment reaches the vacuum room temp of coating equipment and remains on 80 ℃.
5) coated with antireflection film
Close the no cathode ion source on the Vakuumkammer of coating equipment, the Vakuumkammer of coating equipment is continued vacuum suction, vacuum tightness is lower than 3 * 10 in the Vakuumkammer of coating equipment -5During torr; Open electron beam gun and the no cathode ion source on the electron beam gun on the coating equipment; Open the no cathode ion source on the Vakuumkammer of coating equipment; In the Vakuumkammer of coating equipment, feeding flow is the oxygen of 8sccm, and in the electron beam gun of coating equipment, feeding flow is the oxygen of 5sccm, and successively deposit thickness is the zirconium white (ZrO of 12.6nm on the upper surface of PMMA base material 1 2) film 2, thickness be the silicon-dioxide (SiO of 17.2nm 2) film 3, thickness be the zirconium white (ZrO of 83.4nm 2) film 4 is the silicon-dioxide (SiO of 62nm with thickness 2) film 5.
Three) from the Vakuumkammer of coating equipment, take out the PMMA plate that has plated antireflective coating
Automatically close no cathode ion source and electron beam gun after plated film is accomplished, deep cooling low temperature machine quits work simultaneously, and the Vakuumkammer of coating equipment is inflated, and when vacuum tightness arrived atmospheric condition in the Vakuumkammer of machine to be coated, door for vacuum chamber was opened automatically.This is just can from the Vakuumkammer of coating equipment, take out substrate frame, and the PMMA plate that is coated with antireflective coating is taken off from substrate frame.
Adopt spectrophotometer that above-mentioned antireflective coating is tested, the numerical value of transmitance and reflectivity is following:
Wavelength nm Transmitance % Wavelength nm Transmitance % Wavelength nm Reflectivity % Wavelength nm Reflectivity %
400 93.06 560 94.09 400 0.01 560 0.49
410 93.14 570 94.12 410 0.02 570 0.46
420 93.16 580 94.09 420 0 580 0.46
430 93.66 590 94.09 430 0 590 0.41
440 93.88 600 94.08 440 0.04 600 0.41
450 93.97 610 94.06 450 0.26 610 0.38
460 94.07 620 94.13 460 0.36 620 0.46
470 94.04 630 94.12 470 0.49 630 0.38
480 94.06 640 94.08 480 0.53 640 0.44
490 94.05 650 94.05 490 0.61 650 0.39
500 94.01 660 94.08 500 0.6 660 0.49
510 94.07 670 94.08 510 0.59 670 0.37
520 94.04 680 94.06 520 0.61 680 0.42
530 94.07 690 94.06 530 0.58 690 0.5
540 94.11 700 93.96 540 0.54 700 0.35
550 94.08 550 0.5
Data in the last table show: incident light is being realized the antireflecting while through behind the antireflective coating, the reflectivity basically identical in the visible region, thus make the reflected light trend of antireflective coating colourless, obtained the good anti-reflective effect of reflection non-colored light.
Although combine accompanying drawing that the preferred embodiments of the present invention are described above; But the present invention is not limited to above-mentioned embodiment, and above-mentioned embodiment only is schematically, is not restrictive; Those of ordinary skill in the art is under enlightenment of the present invention; Not breaking away under the scope situation that aim of the present invention and claim protect, can also make a lot of forms, these all belong within protection scope of the present invention.

Claims (4)

1. an antireflective coating making method that reflects non-colored light in the visible region is characterized in that, may further comprise the steps:
One) PMMA sheet material dehumidifying;
Two) vacuum coated with antireflection film:
1) PMMA sheet material is put into the Vakuumkammer of coating equipment,
2) upper surface to PMMA sheet material dewaters;
3) PMMA sheet material is carried out cleaning surfaces and activation;
4) Vakuumkammer to coating equipment heats;
5) layer by layer deposition thickness is that the zirconium oxide film of 12.6nm～13.6nm, the silicon dioxide film that thickness is 17.2nm～18.2nm, zirconium oxide film and the thickness that thickness is 83.4nm～88.2nm are the silicon dioxide film of 62nm～65.8nm on the upper surface of PMMA sheet material;
Three) from the Vakuumkammer of coating equipment, take out the PMMA plate that has plated antireflective coating.
2. the antireflective coating making method that reflects non-colored light in the visible region according to claim 1; It is characterized in that; Said step 2) the coating process condition of step 5) does in; Close the interior no cathode ion source of Vakuumkammer of coating equipment, to the lasting vacuum suction of the Vakuumkammer of coating equipment, vacuum tightness is lower than 3 * 10 in the Vakuumkammer of coating equipment -5During torr; Open electron beam gun and the no cathode ion source on the electron beam gun on the coating equipment; Open the no cathode ion source on the Vakuumkammer of coating equipment, and in the Vakuumkammer of coating equipment, to feed flow be the oxygen of 8～20sccm, in the electron beam gun of coating equipment, feeding flow is the oxygen of 5～15sccm.
3. the antireflective coating making method in visible region reflection non-colored light according to claim 2 is characterized in that, in said step 2) step 4) in, with the Vakuumkammer heating of coating equipment and remain on 60～80 ℃.
4. the antireflective coating making method in visible region reflection non-colored light according to claim 3 is characterized in that said step 2) in step 3) be: vacuum tightness is lower than 5 * 10 in the Vakuumkammer of coating equipment -5Behind the torr, open the no cathode ion source on the Vakuumkammer of coating equipment, and in the Vakuumkammer of coating equipment, to feed flow be the oxygen of 10～30sccm, the time of aerating oxygen is 30～180s.
CN2012100600092A 2012-03-08 2012-03-08 Method for manufacturing anti-reflecting film for reflecting achromatic light in visible light area Pending CN102560363A (en)

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CN2012100600092A CN102560363A (en) 2012-03-08 2012-03-08 Method for manufacturing anti-reflecting film for reflecting achromatic light in visible light area

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Application Number Priority Date Filing Date Title
CN2012100600092A CN102560363A (en) 2012-03-08 2012-03-08 Method for manufacturing anti-reflecting film for reflecting achromatic light in visible light area

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104264112A (en) * 2014-10-15 2015-01-07 福建省石狮市通达电器有限公司 Vacuum optical coating method for matte films

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CN101508191A (en) * 2009-03-30 2009-08-19 天津美泰真空技术有限公司 Anti-reflection film on polycarbonate/polymethylacrylate composite plate and preparation method thereof
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Application publication date: 20120711