CN102534492B - SiCN/TiCN multi-layer film tool coating layer and preparation method thereof - Google Patents
SiCN/TiCN multi-layer film tool coating layer and preparation method thereof Download PDFInfo
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- CN102534492B CN102534492B CN201210010276.9A CN201210010276A CN102534492B CN 102534492 B CN102534492 B CN 102534492B CN 201210010276 A CN201210010276 A CN 201210010276A CN 102534492 B CN102534492 B CN 102534492B
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Abstract
The invention discloses an SiCN/TiCN multi-layer film tool coating layer and a preparation method thereof. The SiCN/TiCN multi-layer film tool coating layer is prepared by alternately depositing SiCN and TiCN; the outermost layer of the coating layer is an SiCN layer, and the innermost layer of the coating layer is a TiCN layer. The multi-layer film coating layer fully combines the advantages of SiCN and TiCN thin films, realizes the multiple functions of one coating, has the characteristics of low friction, high hardness, anti-oxidation and the like and simultaneously can remarkably reduce the surface roughness of the tool. The SiCN/TiCN multi-layer film tool coating layer is obtained by adopting a vapor deposition process; the preparation process is relatively simple and is suitable for industrialized production; and the prepared coating layer is stable in performance and can be applied to different types of cutting tools.
Description
Technical field
The invention belongs to technical field of mechanical cutting tool manufacture, particularly a kind of SiCN/TiCN multilayer film cutter coat and preparation method thereof.
Background technology
The use properties that can improve cutter at metal cutter surface deposition hard coat, cuts down finished cost, and improves working (machining) efficiency and quality, tool life.At present common cutter coat adopts TiN, TiCN, TiAlN, CrN and DLC etc., comprises their single or multiple lift composite structure coating.Development along with modern processing, particularly high-speed, high precision numerically-controlled machine processing to car for mill, with milling for mill, to bore the future development of generation hinge, cutter coat is had higher requirement at aspects such as cutting ability, hardness, antioxidant property and surface smoothnesses.
SiCN film is a kind of ternary film growing up on carbon nitrogen binary Membranous Foundations, and research shows that SiCN film has very high hardness.The SiCN film hardness that adopts magnetron sputtering to prepare can reach 30GPa[S.L.Ma, B.Xu, G.Z.Wu, et al., Surf.Coat.Technol.202 (2008) 5379-5382.], even reach 40GPa[J.
m.Kormunda, J.
et a]., Diamond Relat.Mater.12 (2003) 1287-1294].Another large advantage of SiCN film is to obtain relatively smooth surface, by selecting appropriate process and parameters optimization can obtain very low surfaceness.J.
deng employing magnetically controlled DC sputtering technology, prepared the thick SiCN film of 1.0-1.5 μ m, its surfaceness is less than 0.8nm[J.
m.Kormunda, J.
et al., Surf.Coat.Technol.160 (2002) 74-81], the people such as Gao Peng adopt microwave electron magnetic rotation resonance technique at Si (100)/Al
2o
3the SiCN film that thickness is about 1.8nm has been prepared on surface, and the surfaceness that records film is only 0.094nm[Gao Peng, Xu Jun, and Ding Wanyu, et al., Chin.Phys.Lett.26 (2009) 065203.].The frictional coefficient of SiCN film is adjustable within the specific limits, and when carbon content is higher, frictional coefficient is lower.Because of the existence of silicon and nitrogen element, SiCN film has good pyro-oxidation resistance.
SiCN coating fragility is larger, and after thickness increase, internal stress also improves thereupon, if therefore use and certainly exist weakness as cutter single coating.The laminated coating structure that the mutual alternating deposit of two or more differing materials is formed, can realize individual material properties and have complementary advantages, and improves the over-all properties of coating; Also can improve coating structure, realize the unapproachable property of single coating, can meet the demand of some special applications.TiCN coating is a kind of cutter coat growing up on TiN and TiC basis, and it has higher hardness and wear resistance, and the composition by modulation C, N and Ti, can reduce coating internal stress, improves toughness, and Anticrack reduces tipping.Therefore SiCN coating and TiCN coating are combined with, can have complementary advantages, overcome the shortcoming of single coating.
Summary of the invention
For the problems referred to above, the present invention aims to provide a kind of have low friction, high rigidity, the SiCN/TiCN multilayer film cutter coat that anti-oxidant and surface smoothness is good and preparation method thereof.
For achieving the above object, the present invention takes following technical scheme: a kind of SiCN/TiCN multilayer film cutter coat, is characterized in that: on the basis of tool matrix, and alternating deposit TiCN layer and SiCN layer successively, what be close to tool matrix is TiCN layer, and outermost layer is SiCN layer.
The thickness of each TiCN layer and SiCN layer can be determined according to specific requirement.
The number of times of TiCN layer and SiCN layer alternating deposit can be determined according to specific requirement.
In SiCN and TiCN, each element percentage composition also can be adjusted as required.
The tool matrix of selecting is Hardmetal materials.
A method of preparing SiCN/TiCN multilayer film cutter coat, comprises the following steps:
A. pre-treatment: tool matrix is cleaned, remove surperficial greasy dirt and other dirt settlings, put into coating equipment after drying up, be evacuated to predefined vacuum tightness.
B. sputter clean: with Ion Cleaning tool matrix surface.
C. depositing Ti CN layer: utilize CVD (Chemical Vapor Deposition) method depositing Ti CN layer, control TiCN layer thickness by controlling deposition parameter.
D. deposit SiCN layer: utilize CVD (Chemical Vapor Deposition) method deposition SiCN layer, by controlling deposition parameter, control SiCN layer thickness.
E. repeat c, d step, outermost layer is SiCN layer.
F. aftertreatment: as required the coating of deposition is carried out in-situ annealing or naturally cool to room temperature under certain vacuum degree.
G. close vacuum apparatus, coating has deposited.
The present invention is owing to taking above technical scheme, and it has the following advantages: 1, to take SiCN and TiCN be coating main ingredient in the present invention, SiCN and TiCN alternating deposit coating.On the basis of tool matrix, the coating of being close to matrix is TiCN, and coating SiCN on TiCN basis presses TiCN and SiCN alternating deposit later successively, and outermost layer is SiCN.The laminated coating overall characteristic that the present invention deposits is good.2, multilayer cutter coat of the present invention fully combines SiCN and TiCN film feature separately, and TiCN layer, as innermost layer, can improve the bonding force of coating and tool matrix.SiCN film has the advantages such as low friction, high rigidity, anti-oxidant and high surface finish.The present invention combines application by two kinds of films, can greatly improve coated cutting tool cutting quality and work-ing life.3, the present invention also provides a kind of actual coating method that technique is relatively simple, be applicable to industrialization production, has the stable feature of coating performance, for various types of cutting tools, has a wide range of applications.And this coating production has very strong handiness, each parameter of coating (comprising composition kind and content, thicknesses of layers, alternating deposit number of times etc.) can conveniently regulate.4, the present invention deposits the multi-layer compound structure coating of SiCN and TiCN composition at tool surface by gas phase deposition technology, thereby contributes to obtain the features such as low friction, high rigidity, resistance to oxidation and high surface finish.
Accompanying drawing explanation
Accompanying drawing 1 is the coating structure schematic diagram of SiCN/TiCN multilayer cutter coat of the present invention; Wherein, 1-tool matrix, 2-TiCN layer, 3-SiCN layer.
Embodiment
Below in conjunction with Figure of description and embodiment, the invention will be further described.
With reference to accompanying drawing 1, it is matrix that SiCN/TiCN multilayer film cutter coat of the present invention is selected inserted tool, on the basis of tool matrix 1, first deposit one deck TiCN layer 2, and then deposition one deck SiCN layer 3, be alternating deposit TiCN layer 2 and SiCN layer 3 later successively, form multilayered structure, outermost layer is SiCN layer 3.
Define the modulation period that every adjacent monolayer TiCN and individual layer SiCN thickness sum are multilayer coating; The modulation ratio that the ratio that defines every individual layer TiCN and individual layer SiCN thickness is multilayer coating.Modulation period and modulation ratio are all variable, and can be both the monocycle modulation period, can be also the multicycles, and the numerical value of modulation period and modulation ratio can regulate according to the requirement to coating performance.The total thickness of SiCN/TiCN coating can be determined according to specific requirement and concrete depositing device.For guaranteeing the bonding strength of body material and coating, SiCN/TiCN coating innermost layer is TiCN layer, and then deposition SiCN, and deposition subsequently hockets.
In SiCN and TiCN, each element percentage composition also can be adjusted as required.
Prepare the process that the method for SiCN/TiCN multilayer film cutter coat is passed through pre-treatment, sputter clean, alternating deposit TiCN and SiCN substantially, the Preparation Example of a SiCN/TiCN multilayer film cutter coat is:
A. pre-treatment: tool matrix is used to deionized water successively, and in alcohol and acetone, difference ultrasonic cleaning is 20 minutes, removes surperficial greasy dirt and other dirt settlings, and electricity consumption dries up the rear ion beam assisted depositing filming equipment of putting into rapidly, is evacuated to 4.0 * 10
-4pa (preset value), the present embodiment ion beam assisted depositing filming equipment used comprises 2 plasma sputter sources (Kaufman ion source) and 1 assisting ion source (Kaufman ion source);
B. sputter clean: utilize Ar for working gas, the Ar Ion Cleaning tool matrix surface (plate voltage in assisting ion source is 800eV, and line is 60mA, and bombardment time is 20min) producing with assisting ion source;
C. depositing Ti CN layer: utilize Ar for the working gas in plasma sputter source, one of them sputtering source sends the pure Ti target of Ar ion bombardment, another sputtering source sends the pure graphite target of Ar ion bombardment, N ion bombardment tool surface is sent in assisting ion source, at tool matrix surface deposition TiCN layer, (plate voltage in plasma sputter source is 2500eV, and line is 70mA; The plate voltage in assisting ion source is 300eV, and line is 35mA; Depositing time is 10min), the thickness of TiCN layer is controlled by the parameter in plasma sputter source;
D. deposit SiCN layer: utilize Ar for the working gas in plasma sputter source, one of them sputtering source sends the pure Si target of Ar ion bombardment, another sputtering source sends the pure graphite target of Ar ion bombardment, N ion bombardment tool surface is sent in assisting ion source, at tool matrix surface deposition SiCN layer, (plate voltage in plasma sputter source is 2500eV, and line is 70mA; The plate voltage in assisting ion source is 300eV, and line is 35mA; Depositing time is 30min), the thickness of SiCN layer is controlled by the parameter in plasma sputter source;
E. repeat c, d step 7 time, guarantee that outermost layer is SiCN layer;
F. keep vacuum, can to the coating of deposition, carry out in-situ annealing or naturally cool to room temperature under certain vacuum degree as required;
G. close vacuum apparatus, coating has deposited, and takes out finished product.
The SiCN/TiCN coating that the present embodiment deposits is amorphous-nano-crystalline structure, and in SiCN layer, silicon mainly exists with Si-N key, and carbon is mainly with sp
2key form exists, and has part sp simultaneously
3key.TiCN layer contains the compounds such as titanium nitride (TiN) and titanium carbide (TiC) and metal titanium etc.This coating nano hardness is greater than 20GPa.Coatingsurface roughness Ra is 290nm, than the surfaceness of original cutter, has reduced about 70nm.The thickness of the whole coating in above-mentioned parameter situation is 1.2 μ m.But above-described embodiment is only for the present invention is described, every equivalents of carrying out on the basis of technical solution of the present invention and improvement, all should not get rid of outside protection scope of the present invention.
The SiCN/TiCN multilayer film cutter coat that the present invention adopts CVD (Chemical Vapor Deposition) method to make at carbide tool surface, fully combine the advantage of SiCN and TiCN film, realized a kind of coat multifunctional, possess low friction, high rigidity and the feature such as anti-oxidant, significantly reduced tool surface roughness simultaneously.This class thin film deposition, on various metal cutting tools, is particularly suitable for to the machining of non-ferrous metal.
Claims (6)
1. a SiCN/TiCN multilayer film cutter coat, it is characterized in that: on tool matrix, alternating deposit TiCN layer and SiCN layer form SiCN/TiCN coating successively, what be close to tool matrix is TiCN layer, outermost layer is SiCN layer, described SiCN/TiCN coating is amorphous-nano-crystalline structure, and in described SiCN layer, silicon mainly exists with Si-N key, and carbon is mainly with sp
2key form exists, and has part sp simultaneously
3key; Adopt the method for Assisted by Ion Beam to deposit described TiCN layer and SiCN layer; In described SiCN layer and TiCN layer, each element percentage content is variable.
2. SiCN/TiCN multilayer film cutter coat according to claim 1, is characterized in that: the thickness of each single TiCN layer and SiCN layer can be determined according to specific requirement.
3. SiCN/TiCN multilayer film cutter coat according to claim 1, is characterized in that: the number of times of TiCN layer and SiCN layer alternating deposit can be determined according to specific requirement.
4. SiCN/TiCN multilayer film cutter coat according to claim 2, is characterized in that: the number of times of TiCN layer and SiCN layer alternating deposit can be determined according to specific requirement.
5. according to the SiCN/TiCN multilayer film cutter coat described in claim 1 or 2 or 3 or 4, it is characterized in that: tool matrix is Hardmetal materials.
6. a preparation method for SiCN/TiCN multilayer film cutter coat as described in one of claim 1～5, is characterized in that, comprises the following steps:
A. pre-treatment: tool matrix is cleaned, remove surperficial greasy dirt and other dirt settlings, put into coating equipment after drying up, be evacuated to predefined vacuum tightness;
B. sputter clean: with Ion Cleaning tool matrix surface;
C. depositing Ti CN layer: utilize the method depositing Ti CN layer of Assisted by Ion Beam, control TiCN layer thickness by controlling deposition parameter;
D. deposit SiCN layer: utilize the method deposition SiCN layer of Assisted by Ion Beam, by controlling deposition parameter, control SiCN layer thickness;
E. repeat c, d step, finally guarantee that outermost layer is SiCN layer;
F. aftertreatment: as required the coating of deposition is carried out in-situ annealing or naturally cool to room temperature under certain vacuum degree;
G. close vacuum apparatus, coating has deposited.
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| CN103215545A (en) * | 2013-04-23 | 2013-07-24 | 李固加 | Manufacturing process of screw rod of ceramic-phase nanocrystalline composite coating injection molding machine |
| CN106498351A (en) * | 2016-11-03 | 2017-03-15 | 天津津航技术物理研究所 | A kind of method for improving ion beam reactive sputtering method preparation carbonization germanium film firmness |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1219723A2 (en) * | 2000-12-28 | 2002-07-03 | Kabushiki Kaisha Kobe Seiko Sho | Hard film for cutting tools |
| CN1651596A (en) * | 2004-02-02 | 2005-08-10 | 株式会社神户制钢所 | Hard laminated film, method of manufacturing the same and film-forming device |
| CN101204864A (en) * | 2006-12-15 | 2008-06-25 | 山特维克知识产权股份有限公司 | Coated cemented carbide endmill |
| CN102230154A (en) * | 2011-06-14 | 2011-11-02 | 上海巴耳思新材料科技有限公司 | Technological process of physical vapor deposition coating |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1219723A2 (en) * | 2000-12-28 | 2002-07-03 | Kabushiki Kaisha Kobe Seiko Sho | Hard film for cutting tools |
| CN1651596A (en) * | 2004-02-02 | 2005-08-10 | 株式会社神户制钢所 | Hard laminated film, method of manufacturing the same and film-forming device |
| CN101204864A (en) * | 2006-12-15 | 2008-06-25 | 山特维克知识产权股份有限公司 | Coated cemented carbide endmill |
| CN102230154A (en) * | 2011-06-14 | 2011-11-02 | 上海巴耳思新材料科技有限公司 | Technological process of physical vapor deposition coating |
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