CN102515490B - Stabilization processing technology for pendulous quartz reed - Google Patents
Stabilization processing technology for pendulous quartz reed Download PDFInfo
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- CN102515490B CN102515490B CN201110418555.4A CN201110418555A CN102515490B CN 102515490 B CN102515490 B CN 102515490B CN 201110418555 A CN201110418555 A CN 201110418555A CN 102515490 B CN102515490 B CN 102515490B
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Abstract
The invention discloses a stabilization processing technology for a pendulous quartz reed. The technology comprises the following steps: 1, putting the cut pendulous quartz reed into a heating furnace, heating the heating furnace to 750-850DEG C according to a speed of 5-10DEG C/min, and maintaining the temperature for 15-40min; 2, heating the heating furnace to 950-1150DEG C according to a speed of 5-8DEG C/min, and maintaining the temperature for 60-100min; 3, cooling the heating furnace to 300-450DEG C according to a speed of 3.5-7DEG C/min, and maintaining the temperature for 40-80min; 4, cooling the heating furnace to room temperature, and maintaining the temperature for 35-50min; 5, heating the heating furnace to 300-450DEG C according to a speed of 5-10DEG C/min, and maintaining the temperature for 40-80min; 6, repeating step 4 and step 5 10-15 times; and 7, naturally cooling the heating furnace to room temperature. The technology can effectively reduce the internal stress of the pendulous quartz reed and improve stabilities of mechanical properties and mechanical properties of the pendulous quartz reed.
Description
Technical field
The present invention relates to a kind of stabilizing treatment technique of quartz pendulous reed, relate in particular to the stabilizing treatment technique of quartz pendulous reed for a kind of jerkmeter, belong to jerkmeter production technical field.
Background technology
Pendulum is as the important component part of jerkmeter, and the stability of its structure is an important factor that affects jerkmeter performance.Jerkmeter pendulum adopts fused quartz to process conventionally, the feature such as that this material has is high temperature resistant, linear expansivity is little, chemical stability is good.The complex structure of jerkmeter pendulum, its production technique belongs to accurate body processing category, except the processing method of the glass industries such as grinding, polishing, cutting, cleaning, also use a plurality of special precision working methods such as hot-work, chemical process to realize the structure formation of pendulum precision.In the course of processing, inevitably cause pendulum inside to have unrelieved stress, unrelieved stress in time with the release of the reasons such as envrionment conditions, can produce structural distortion, destruction of pendulum etc.Therefore in pendulum production process, take measures to reduce complete processing particularly important on the impact of pendulum structural stability.
In the prior art, quartz pendulous reed together carries out stabilization treatment with jerkmeter conventionally after jerkmeter has assembled.Owing to also relating to the multiple materials such as metal, polymer in jerkmeter, its stabilization treatment method, to independent pendulum inapplicable, is badly in need of the stabilizing treatment technique of pendulum to improve its structural stability.
Summary of the invention
Technology of the present invention is dealt with problems and is: overcome the deficiencies in the prior art, a kind of stabilizing treatment technique of quartz pendulous reed is provided, to improve the stability of lamellar structure, reduce or the impact of elimination environmental load on thin slice performance.
Technical solution of the present invention is: a kind of stabilizing treatment technique of quartz pendulous reed, comprises the following steps:
(1) quartz pendulous reed after cutting is put into process furnace, first process furnace is warming up to 750 ℃～850 ℃ with the speed of 5 ℃/min～10 ℃/min, be incubated 15～40 minutes;
(2) process furnace is warming up to 950 ℃～1150 ℃ with the speed of 5 ℃/min～8 ℃/min again, is incubated 60～100 minutes;
(3) process furnace is cooled to 300 ℃～450 ℃ with the speed of 3.5 ℃/min～7 ℃/min, is incubated 40～80 minutes;
(4) process furnace is down to room temperature naturally, is incubated 35～50 minutes;
(5) process furnace is warming up to 300 ℃～450 ℃ with the speed of 5 ℃/min～10 ℃/min, is incubated 40～80 minutes;
(6) according to the method for step (4), (5), repeat 10～15 times;
(7) quartz pendulous reed is down to room temperature naturally with process furnace, completes the stabilization treatment of quartz pendulous reed.
The present invention's beneficial effect compared with prior art: with respect to general glass annealing technique, the temperature rate of the present invention to quartz pendulous reed treatment process, the conditions such as soaking time make improvements, adopt treatment process of the present invention, can effectively reduce the internal stress of quartzy thin slice, the mechanical property of the thin slice with different thickness structure and the stability of mechanical property have been improved greatly, can effectively reduce the stress concentration phenomenon that processing causes, avoid the damage that in wafer processes process and working order, unrelieved stress causes, and mechanical property and the mechanical property of lamellar structure have been guaranteed.
Accompanying drawing explanation
Fig. 1 is the temperature curve schematic diagram of stabilizing treatment technique of the present invention.
Embodiment
Below in conjunction with embodiment, the present invention is elaborated.
The existence of quartz material internal stress and uneven distribution can reduce the stability of material greatly, under annealing temperature condition, keep the sufficiently long time, make that atomic structure is lax, strain energy discharges, microtexture trends towards balance and uniform state, therefore can eliminate unrelieved stress, stress concentration phenomenon, reduce the susceptibility of lamellar structure to outside atmosphere; Must cool down with slow speed, to avoid producing new stress simultaneously.Because the special thin slice of size has different thickness structures, must implement stabilization treatment by treatment condition targetedly.
Embodiment 1: for a kind of diameter, be not more than Φ 50mm, total thickness is less than the stabilizing treatment technique of silica glass thin slice 1mm, that have different thickness structure (calling thin slice in the following text), as shown in Figure 1, comprises the following steps:
1) quartz pendulous reed is warmed up to T with the speed of 5 ℃/min～10 ℃/min
1: 750 ℃～850 ℃, insulation t
1: 15～40 minutes;
2) speed with 5 ℃/min～8 ℃/min is warmed up to T
2: 950 ℃～1150 ℃, insulation t
2: 60～100 minutes;
3) speed with 3.5 ℃/min～7 ℃/min cools to T
3: 300 ℃～450 ℃, insulation t
3: 40～80 minutes;
4) process furnace is down to room temperature naturally, insulation t
4: 35～50 minutes;
5) speed with 5 ℃/min～10 ℃/min is warmed up to T
3: 300 ℃～450 ℃, insulation t
5: 40～80 minutes;
6) repeat 4), 5) two step 10～15 time;
7) with stove, be down to room temperature, obtain finished product.
Before and after processing, the numerical value of machining stress is down to 40KPa from 15MPa, and the length dimension velocity of variation before and after processing has reduced 30%.
Embodiments of the present invention are not limited to the above-mentioned example of executing, within the various variations of making under the prerequisite that does not depart from aim of the present invention all belong to protection scope of the present invention.
Claims (1)
1. a stabilizing treatment technique for quartz pendulous reed, is characterized in that comprising the following steps:
(1) quartz pendulous reed after cutting is put into process furnace, first process furnace is warming up to 750 ℃～850 ℃ with the speed of 5 ℃/min～10 ℃/min, be incubated 15～40 minutes;
(2) process furnace is warming up to 950 ℃～1150 ℃ with the speed of 5 ℃/min～8 ℃/min again, is incubated 60～100 minutes;
(3) process furnace is cooled to 300 ℃～450 ℃ with the speed of 3.5 ℃/min～7 ℃/min, is incubated 40～80 minutes;
(4) process furnace is down to room temperature naturally, is incubated 35～50 minutes;
(5) process furnace is warming up to 300 ℃～450 ℃ with the speed of 5 ℃/min～10 ℃/min, is incubated 40～80 minutes;
(6) according to the method for step (4), (5), repeat 10～15 times;
(7) quartz pendulous reed is down to room temperature naturally with process furnace, completes the stabilization treatment of quartz pendulous reed.
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| CN201110418555.4A CN102515490B (en) | 2011-12-15 | 2011-12-15 | Stabilization processing technology for pendulous quartz reed |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110418555.4A CN102515490B (en) | 2011-12-15 | 2011-12-15 | Stabilization processing technology for pendulous quartz reed |
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| CN102515490A CN102515490A (en) | 2012-06-27 |
| CN102515490B true CN102515490B (en) | 2014-03-05 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| TWI510443B (en) * | 2014-06-30 | 2015-12-01 | G Tech Optoelectronics Corp | Method for increasing strengthening behavior of glass |
| CN115466045A (en) * | 2022-08-26 | 2022-12-13 | 江苏亨芯石英科技有限公司 | Heat treatment method and production device for high-uniformity quartz mound |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1982963A1 (en) * | 2007-04-20 | 2008-10-22 | Heraeus Quarzglas GmbH & Co. KG | Method for producing an optical component of synthetic quartz glass with enhanced radiation resistance, and blank for producing the component |
| JP2010101814A (en) * | 2008-10-25 | 2010-05-06 | Mitsubishi Materials Corp | Method of evaluating of synthetic quartz powder |
| CN101913759A (en) * | 2010-08-26 | 2010-12-15 | 湖州东科电子石英有限公司 | Process for relieving stress of quartz glass |
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2011
- 2011-12-15 CN CN201110418555.4A patent/CN102515490B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1982963A1 (en) * | 2007-04-20 | 2008-10-22 | Heraeus Quarzglas GmbH & Co. KG | Method for producing an optical component of synthetic quartz glass with enhanced radiation resistance, and blank for producing the component |
| JP2010101814A (en) * | 2008-10-25 | 2010-05-06 | Mitsubishi Materials Corp | Method of evaluating of synthetic quartz powder |
| CN101913759A (en) * | 2010-08-26 | 2010-12-15 | 湖州东科电子石英有限公司 | Process for relieving stress of quartz glass |
Non-Patent Citations (6)
| Title |
|---|
| 均质石英玻璃退火工艺的研究;王友军等;《全国第二届高新技术用石英制品及相关材料技术与市场研讨会论文集》;20090216;67－73 * |
| 孔敏 等.高性能石英玻璃精密退火工艺研究.《武汉理工大学学报》.2010,第32卷(第22期),149-152. |
| 张武男.石英玻璃退火工艺的研究.《科技信息》.2010,(第9期),125. |
| 王友军等.均质石英玻璃退火工艺的研究.《全国第二届高新技术用石英制品及相关材料技术与市场研讨会论文集》.2009,67－73. |
| 石英玻璃退火工艺的研究;张武男;《科技信息》;20101231(第9期);125 * |
| 高性能石英玻璃精密退火工艺研究;孔敏 等;《武汉理工大学学报》;20101130;第32卷(第22期);149－152 * |
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| CN102515490A (en) | 2012-06-27 |
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