CN102490406A - Self-cleaning glass and manufacturing method thereof - Google Patents
Self-cleaning glass and manufacturing method thereof Download PDFInfo
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- CN102490406A CN102490406A CN2011103421386A CN201110342138A CN102490406A CN 102490406 A CN102490406 A CN 102490406A CN 2011103421386 A CN2011103421386 A CN 2011103421386A CN 201110342138 A CN201110342138 A CN 201110342138A CN 102490406 A CN102490406 A CN 102490406A
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- metal ion
- tio
- colloidal sol
- titanium
- rete
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- 239000005348 self-cleaning glass Substances 0.000 title claims abstract description 44
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000011521 glass Substances 0.000 claims abstract description 83
- 239000000463 material Substances 0.000 claims abstract description 66
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 36
- 229910021645 metal ion Inorganic materials 0.000 claims description 183
- 239000010936 titanium Substances 0.000 claims description 142
- 229910052719 titanium Inorganic materials 0.000 claims description 142
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 134
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 101
- 102000004895 Lipoproteins Human genes 0.000 claims description 47
- 108090001030 Lipoproteins Proteins 0.000 claims description 47
- 239000004065 semiconductor Substances 0.000 claims description 43
- 238000003756 stirring Methods 0.000 claims description 41
- 239000002253 acid Substances 0.000 claims description 36
- 239000007787 solid Substances 0.000 claims description 33
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 32
- 229920001296 polysiloxane Polymers 0.000 claims description 31
- 239000004519 grease Substances 0.000 claims description 26
- 238000002360 preparation method Methods 0.000 claims description 24
- 239000003795 chemical substances by application Substances 0.000 claims description 19
- 239000003112 inhibitor Substances 0.000 claims description 19
- 230000007062 hydrolysis Effects 0.000 claims description 18
- 238000006460 hydrolysis reaction Methods 0.000 claims description 18
- 239000003960 organic solvent Substances 0.000 claims description 18
- 239000008367 deionised water Substances 0.000 claims description 13
- 229910021641 deionized water Inorganic materials 0.000 claims description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 7
- 239000000843 powder Substances 0.000 claims description 7
- 230000001235 sensitizing effect Effects 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 238000004140 cleaning Methods 0.000 abstract description 10
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract description 8
- 238000007146 photocatalysis Methods 0.000 abstract description 7
- 230000001699 photocatalysis Effects 0.000 abstract description 5
- 230000002035 prolonged effect Effects 0.000 abstract description 5
- 239000011159 matrix material Substances 0.000 abstract 3
- 150000001455 metallic ions Chemical class 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 47
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 38
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 20
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 15
- 230000010148 water-pollination Effects 0.000 description 15
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 10
- 229910052742 iron Inorganic materials 0.000 description 10
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical group OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 9
- -1 titanium ester Chemical class 0.000 description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 6
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000003197 catalytic effect Effects 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000004411 aluminium Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium ethoxide Chemical compound [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 2
- RPAJSBKBKSSMLJ-DFWYDOINSA-N (2s)-2-aminopentanedioic acid;hydrochloride Chemical compound Cl.OC(=O)[C@@H](N)CCC(O)=O RPAJSBKBKSSMLJ-DFWYDOINSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical group OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 229940043237 diethanolamine Drugs 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
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Abstract
The invention provides a self-cleaning glass and a manufacturing method thereof. The self-cleaning glass comprises a glass matrix and an embellishment layer, wherein the embellishment layer comprises a SiO2 film layer, a TiO2/ metallic ion/ photosensitive material film layer and a TiO2/ metallic ion film layer which are successively overlaid from the glass matrix; visible light with wavelength less than 500 nm can be utilized by the self-cleaning glass, thus the self-cleaning glass has high photocatalysis efficiency and strong self-cleaning; and the binding power of the embellishment layer and the glass matrix is strong, and the hydrophilicity of the embellishment layer can be prolonged.
Description
Technical field
The present invention relates to a kind of self-cleaning glass and preparation method thereof.
Background technology
Along with the raising of the energy and environmental consciousness, people more and more favor the green glass that has environmental-protection function and can utilize natural conditions to reach automated cleaning.
Self-cleaning glass is to make decorative layer, i.e. titanium dioxide (TiO on the surface of simple glass
2) film, TiO
2The Superhydrophilic that has can make greasy dirt and glass surface isolation on the one hand, can make on the other hand dirt along with moisture film under the gravity effect from the glass surface landing.And titanium dioxide has very strong photo-catalysis capability, can the organic matter and the inorganic matter of glass surface be decomposed, thereby keeps glass surface clean.
Though TiO
2Under ultraviolet excitation, can produce and have the very hole-duplet of high oxidative capacity, but TiO
2Greater band gap, it only can the absorbing ultraviolet light part, and can not utilize the visible light part, thereby causes TiO
2Film is lower to the utilization rate of sunshine, and then causes TiO
2The photo-catalysis capability of film is lower, makes that the automatically cleaning ability of glass is on the low side.In addition, TiO
2Film is difficult for combining with carrier, especially at TiO
2Film keeps under the condition of higher catalytic activity, TiO
2Film is difficult to keep firm combining with carrier, thereby influences the service life of self-cleaning glass; And, under the condition of unglazed photograph, TiO
2The hydrophily retention time of film is short, and common hydrophilic timeliness is no more than 5 hours, promptly surpasses 5 hours hydrophilies and disappears.
Summary of the invention
The present invention proposes a kind of self-cleaning glass, it not only can utilize the visible light part in the sunshine, thereby can improve its automatically cleaning ability; And decorative layer and glass basis can keep good combination.
The invention allows for a kind of preparation method of self-cleaning glass, this method can be produced the self-cleaning glass that automatically cleaning ability height, decorative layer and glass basis keep good combination.
In order to achieve the above object, the present invention proposes a kind of self-cleaning glass, comprise glass basis and decorative layer, it is characterized in that, said decorative layer comprises the SiO that is stacked in said glass basis surface from said glass basis successively
2Rete, TiO
2/ metal ion/photosensitive material layer and TiO
2/ metal ion rete.
Preferably, said SiO
2The thickness of rete is 80～120nm.
Preferably, said TiO
2The thickness of/metal ion/photosensitive material layer is 200～300nm.
Preferably, said TiO
2The thickness of/metal ion rete is 80～120nm.
Preferably, at said TiO
2In/metal ion/photosensitive material layer, said TiO
2, metal ion and sensitising agent the quality percentage composition be respectively: 5～80%, 5～40%, 5～30%.
Preferably, at said TiO
2In/metal ion the rete, said TiO
2Be respectively with the quality percentage composition of metal ion: 30～90% and 10～70%.
The present invention also provides a kind of preparation method of self-cleaning glass, may further comprise the steps:
Obtain Ludox, utilize said Ludox to make SiO on the surface of glass basis
2Rete;
Obtain the titanium colloidal sol that contains photosensitive semiconductor and metal ion, utilize the said titanium colloidal sol that contains photosensitive semiconductor and metal ion to be coated in said SiO
2Film surface is made TiO
2/ metal ion/photosensitive material layer;
Obtain the titanium colloidal sol that contains metal ion, utilize the said titanium colloidal sol that contains metal ion at said TiO
2/ metal ion/photosensitive material layer surface makes TiO
2/ metal ion rete.
Preferably, said Ludox obtains through following steps:
Organosilicon fat is dissolved in the organic solvent, and under 30～50 ℃ temperature, stirs acquisition organosilicon lipoprotein solution;
Be mixed with strong acid solution with strong acid solution and deionized water;
Said strong acid solution is splashed in the said organosilicon lipoprotein solution, under 30～50 ℃ temperature, stir simultaneously and make said organic silicone grease hydrolysis;
The malleableize agent is added in the said organosilicon lipoprotein solution of hydrolysis, stir and be cooled to room temperature, obtain said Ludox.
Preferably, the mass concentration of said organic silicone grease is 5～20%; The mol ratio of said strong acid and said organic silicone grease is 0.5～2.5; The said malleableize agent that adds and the mol ratio of said organo-silicon ester are 0.1～1.5.
Preferably, utilize czochralski method to make said SiO
2Rete, the solid content of said Ludox are 1～5%, and the pull rate of said glass basis is 1～10cm/min, thereby said Ludox is being sticked to said glass basis surface.
Preferably, stick to said Ludox dry 10～30min under 60～100 ℃ temperature on said glass basis surface, thereby obtain said SiO on the surface of said glass basis
2Rete.
Preferably, the said titanium colloidal sol that contains photosensitive semiconductor and metal ion is to obtain through following steps:
Organic titanium liposoluble is formed the organic titanium lipoprotein solution in organic solvent;
In said organic titanium lipoprotein solution, add slaine and inhibitor, under 30～50 ℃ temperature, stir and obtain first mixed liquor;
Be configured to second mixed liquor with strong acid, deionized water and organic solvent;
Said second mixed liquor is splashed into said first mixed liquor, under 30～50 ℃ temperature, stir the titanium colloidal sol that obtains to contain metal ion simultaneously;
The photosensitive semiconductor powder is mixed with strong acid, add then in the said titanium colloidal sol that contains metal ion, thereby obtain the said titanium colloidal sol that contains photosensitive semiconductor and metal ion.
Preferably, the mass concentration of said organic titanium lipoprotein solution is 1～5%; The mol ratio of said organic titanium fat and said slaine is 0.1～1.5, and the mol ratio of said inhibitor and said slaine is 0.1～1.5; The mol ratio of said photosensitive semiconductor powder and said organic titanium fat is 0.1～2.5.
Preferably, utilize czochralski method to make said TiO
2/ metal ion/photosensitive material layer; The said solid content that contains the titanium colloidal sol of photosensitive semiconductor and metal ion is 1.5～4.5%; The pull rate of said glass basis is 2～20cm/min, thereby the said titanium colloidal sol that contains photosensitive semiconductor and metal ion is sticked to said SiO
2Film surface.
Preferably, stick to said SiO
2The said titanium colloidal sol dry 0.5～2h under 250～300 ℃ temperature that contains photosensitive semiconductor and metal ion of film surface, thereby at said SiO
2Film surface obtains said TiO
2/ metal ion/photosensitive material layer.
Preferably, the said titanium colloidal sol that contains metal ion obtains through following steps:
Organic titanium liposoluble is formed the organic titanium lipoprotein solution in organic solvent;
In said organic titanium lipoprotein solution, add slaine and inhibitor, under 30～50 ℃ temperature, stir and obtain first mixed liquor;
Be configured to second mixed liquor with strong acid, deionized water and organic solvent;
Said second mixed liquor is splashed into said first mixed liquor, under 30～50 ℃ temperature, stir simultaneously and obtain said titanium colloidal sol.
Preferably, utilize czochralski method to make said TiO
2/ metal ion rete, the said solid content that contains the titanium colloidal sol of metal ion is 1.5～4.5%, the pull rate of said glass basis is 1～10cm/min, thereby the said titanium colloidal sol that contains metal ion is sticked to said TiO
2The surface of/metal ion/photosensitive material layer.
Preferably, stick to said TiO
2The said titanium colloidal sol dry 0.5～2h under 250～300 ℃ temperature that contains metal ion on/metal ion/photosensitive material layer surface, thereby at said TiO
2The surface of/metal ion/photosensitive material layer makes said TiO
2/ metal ion rete.
Compared with prior art, the present invention has following beneficial effect:
Self-cleaning glass provided by the invention is the stacked successively SiO of setting on the glass basis surface
2Rete, TiO
2/ metal ion/photosensitive material layer and TiO
2/ metal ion rete.Wherein, metal ion has improved TiO
2Photo-catalysis capability, make that the light less than the 500nm wavelength also can be utilized, promptly can be with the visible light utilization in the sunshine, thereby improve the photocatalysis efficiency of self-cleaning glass, and then improve the automatically cleaning ability of self-cleaning glass.SiO
2Rete can improve the bond strength of decorative layer and glass basis, improves the anti-wear performance of decorative layer, thereby has prolonged the hydrophily of decorative layer, and in the environment of dark, the hydrophily of decorative layer can reach 15 days, and the hydrophily of decorative layer does not disappear in promptly 15 days.TiO
2/ metal ion rete can prevent effectively that light-sensitive material is in use contaminated, thereby improves the service life of decorative layer, the harm that can avoid light-sensitive material to cause human body simultaneously.
The preparation method of self-cleaning glass provided by the invention, the titanium colloidal sol that utilizes Ludox, contains the titanium colloidal sol of photosensitive semiconductor and metal ion and contain metal ion has been made on the surface of glass basis and has been comprised SiO
2Rete, TiO
2/ metal ion/photosensitive material layer and TiO
2The decorative layer of/metal ion rete makes self-cleaning glass not only can utilize the light of wavelength less than 500nm, thereby improves the automatically cleaning ability of self-cleaning glass; And decorative layer and glass basis have good binding intensity, improve the anti-wear performance of decorative layer, thereby have prolonged the hydrophily of decorative layer, and in the environment of dark, the hydrophily of decorative layer can reach 15 days, and the hydrophily of decorative layer does not disappear in promptly 15 days.Can prevent effectively that in addition light-sensitive material is in use contaminated, thereby improve the service life of decorative layer, the harm that can avoid light-sensitive material to cause human body simultaneously.
Description of drawings
In order to be illustrated more clearly in the embodiment of the invention or technical scheme of the prior art; To do to introduce simply to the accompanying drawing of required use in embodiment or the description of the Prior Art below; Obviously, the accompanying drawing in describing below only is some embodiments of the present invention, for those of ordinary skills; Under the prerequisite of not paying creative work property, can also obtain other accompanying drawing according to these accompanying drawings.
Fig. 1 is the structural representation of self-cleaning glass provided by the invention;
Fig. 2 is the flow chart of the preparation method of self-cleaning glass provided by the invention.
The specific embodiment
For making those skilled in the art understand technical scheme of the present invention better, self-cleaning glass that the present invention is proposed below in conjunction with accompanying drawing and preparation method thereof is described in detail.
Fig. 1 is the structural representation of self-cleaning glass provided by the invention.See also Fig. 1, the self-cleaning glass that present embodiment provides comprises glass basis 1 and decorative layer 2, and decorative layer 2 comprises from glass basis 1 and is stacked in its surperficial SiO successively
2Rete 21, TiO
2/ metal ion/photosensitive material layer 22 and TiO
2/ metal ion rete 23.
Wherein, SiO
2Rete 21, TiO
2/ metal ion/photosensitive material layer 22 and TiO
2The thickness of/metal ion rete 23 is respectively 80～120nm, 200～300nm and 80～120nm.At TiO
2In/metal ion/photosensitive material layer 22, TiO
2, metal ion and sensitising agent the quality percentage composition be respectively: 5～80%, 5～40%, 5～30%.At TiO
2In/metal ion the rete 23, TiO
2Be respectively with the quality percentage composition of metal ion: 30～90% and 10～70%.
The self-cleaning glass that present embodiment provides is the stacked successively SiO of setting on the glass basis surface
2Rete, TiO
2/ metal ion/photosensitive material layer and TiO
2/ metal ion rete.Wherein, metal ion has improved TiO
2Photo-catalysis capability, make that the light less than the 500nm wavelength also can be utilized, promptly can be with the visible light utilization in the sunshine, thereby improve the automatically cleaning ability of self-cleaning glass.SiO
2Rete can improve the bond strength of decorative layer and glass basis, improves the anti-wear performance of decorative layer, thereby has prolonged the hydrophily of decorative layer, and in the environment of dark, the hydrophily of decorative layer can reach 15 days, and the hydrophily of decorative layer does not disappear in promptly 15 days.TiO
2/ metal ion rete can prevent effectively that light-sensitive material is in use contaminated, thereby improves the service life of decorative layer, the harm that can avoid light-sensitive material to cause human body simultaneously.
Fig. 2 is the flow chart of the preparation method of self-cleaning glass provided by the invention.See also Fig. 2, the preparation method of the self-cleaning glass that present embodiment provides may further comprise the steps:
Step s1 obtains Ludox, utilizes said Ludox to make SiO on the surface of glass basis
2Rete.
Step s1 specifically may further comprise the steps:
Step s11 is dissolved in organosilicon fat in the organic solvent, and under 30～50 ℃ temperature, stirs acquisition organosilicon lipoprotein solution.
Organic silicone grease can be a silester, and organic solvent can be absolute ethyl alcohol, anhydrous propanone or absolute methanol etc.Usually, organic silicone grease need stir 10～20min to obtain mass concentration be 5～20% silicone grease solution under 30～50 ℃ temperature.
Step s12 is mixed with strong acid solution with strong acid and deionized water.
Strong acid can be concentrated hydrochloric acid, red fuming nitric acid (RFNA) or SPA.Hydrogen ion concentration is 0.2N (equivalent concentration) in the strong acid solution.
Step s13 splashes into said strong acid solution in the said organosilicon lipoprotein solution, under 30～50 ℃ temperature, stirs simultaneously and makes said organic silicone grease hydrolysis.
Strong acid can play catalytic action to the hydrolysis of organic silicone grease, and the strong acid of adding and the mol ratio of organic silicone grease are 0.5～2.5.When strong acid solution being splashed in the organosilicon lipoprotein solution, under 30～50 ℃ temperature, stirred the organosilicon lipoprotein solution 1～4 hour, make organic silicone grease hydrolysis.
Step s14 adds the malleableize agent in the said organosilicon lipoprotein solution of hydrolysis, stirs then and is cooled to room temperature, thereby obtain said Ludox.
The malleableize agent can be a kind of or wherein several kinds the mixing in glycerine, polyvinyl alcohol or the dimethyl formamide.The malleableize agent that adds and the mol ratio of organic silicone grease are 0.1～1.5.
The malleableize agent being added in the organosilicon lipoprotein solution of the hydrolysis that step s13 obtains, be cooled to room temperature after then it being stirred, is 1～5% Ludox thereby obtain solid content.
Step s15 puts into Ludox with glass basis, and the speed with 1～10cm/min lifts then, thereby makes Ludox stick to the glass basis surface.
Step s16 is placed on the glass basis of adhesive silicone colloidal sol dry 10～30min under 60～100 ℃ the temperature, thereby obtains said SiO on the surface of glass basis
2Rete.
Step s2 obtains the titanium colloidal sol that contains photosensitive semiconductor and metal ion, utilizes the said titanium colloidal sol that contains photosensitive semiconductor and metal ion to be coated in said SiO
2Film surface is made TiO
2/ metal ion/photosensitive material layer.
Step s2 specifically may further comprise the steps:
Step s21 forms the organic titanium lipoprotein solution with organic titanium liposoluble in organic solvent.
Organic titanium fat can be butyl titanate or tetraethyl titanate, and organic solvent can be absolute ethyl alcohol, anhydrous propanone or absolute methanol.With organic titanium liposoluble in organic solvent and to form mass concentration be 1～5% organic titanium lipoprotein solution.
Step s22 adds slaine and inhibitor in said organic titanium lipoprotein solution, under 30～50 ℃ temperature, stir and obtain first mixed liquor.
Slaine can be iron, nickel, aluminium, tungsten, vanadium or silver.Inhibitor can be diethanol amine or triethanolamine.After in the organic titanium lipoprotein solution, adding slaine and inhibitor, under 30～50 ℃ temperature, stir 10～20min and obtain first mixed liquor.The mol ratio of organic titanium fat and slaine is 0.1～1.5.Inhibitor be for stop slaine and organic titanium ester the reaction, therefore, the addition of inhibitor is benchmark with the slaine, the mol ratio of its addition and slaine is 0.1～1.5.
Step s23 is configured to second mixed liquor with strong acid, deionized water and organic solvent.
Strong acid can be concentrated hydrochloric acid or red fuming nitric acid (RFNA), and organic solvent can be absolute ethyl alcohol, anhydrous propanone or absolute methanol.In second mixed liquor, hydrogen ion concentration is 0.2N.
Step s24 splashes into said first mixed liquor with said second mixed liquor, under 30～50 ℃ temperature, stirs simultaneously and obtains titanium colloidal sol.
Second mixed liquor is splashed into first mixed liquor lentamente; Utilize strong acid to make the hydrolysis of organic titanium ester; The strong acid that adds and the mol ratio of organic titanium ester are 0.5～2.5; Under 30～50 ℃ temperature, stirred 0.5～2 hour simultaneously, thereby acquisition contains the titanium colloidal sol of metal ion, the solid content of the titanium colloidal sol of acquisition is 1.5～4.5%.In step s23, with deionized water and organic solvent the strong acid dilution is helped strong acid and be dispersed in apace in the organic titanium lipoprotein solution.
Step s25 mixes the photosensitive semiconductor powder with strong acid, add the said titanium colloidal sol that contains metal ion then, thereby obtains the said titanium colloidal sol that contains photosensitive semiconductor and metal ion.
Photosensitive semiconductor can be cadmium sulfide or cadmium selenide, and strong acid can be concentrated hydrochloric acid or red fuming nitric acid (RFNA), and hydrionic concentration is 0.2N in the strong acid.The photosensitive semiconductor powder that adds and the mol ratio of organic titanium ester are 0.1～2.5.The mixed solution of photosensitive semiconductor powder and strong acid is added titanium colloidal sol, and evenly mix, thereby the acquisition solid content is 1.5～4.5% the titanium colloidal sol that contains photosensitive semiconductor and metal ion.
Step s26 is manufactured with SiO with the surface
2The glass basis of rete is put into the titanium colloidal sol that contains photosensitive semiconductor and metal ion, and the speed with 2～20cm/min lifts then, thereby makes the titanium colloidal sol that contains photosensitive semiconductor and metal ion stick to SiO
2Film surface.
Step s27 is placed on the glass basis that is stained with the titanium colloidal sol that contains photosensitive semiconductor and metal ion dry 0.5～2h under 250～300 ℃ the temperature, thereby at said SiO
2Film surface obtains said TiO
2/ metal ion/photosensitive material layer.
Step s3 obtains the titanium colloidal sol that contains metal ion, utilizes the said titanium colloidal sol that contains metal ion at said TiO
2/ metal ion/photosensitive material layer surface makes TiO
2/ metal ion rete.
Step s3 specifically may further comprise the steps:
Step s31 obtains the titanium colloidal sol that contains metal ion.
The preparation method and the step s21 of titanium colloidal sol that contains metal ion is identical to step s24, repeats no more here.
Step s32 is manufactured with TiO with the surface
2The glass basis of/metal ion/photosensitive material layer is put into the titanium colloidal sol that contains metal ion, and the speed with 1～10cm/min lifts then, thereby the titanium colloidal sol of metal ion is sticked to TiO
2The surface of/metal ion/photosensitive material layer.
Step s33 is placed on the glass basis that is stained with the titanium colloidal sol that contains metal ion dry 0.5～2h under 250～300 ℃ the temperature, thereby at said TiO
2The surface of/metal ion/photosensitive material layer obtains TiO
2/ metal ion rete.
The preparation method of the self-cleaning glass that present embodiment provides, the titanium colloidal sol that utilizes Ludox, contains the titanium colloidal sol of photosensitive semiconductor and metal ion and contain metal ion has been made on the surface of glass basis and has been comprised SiO
2Rete, TiO
2/ metal ion/photosensitive material layer and TiO
2The decorative layer of/metal ion rete makes self-cleaning glass not only can utilize the light of wavelength less than 500nm, thereby improves the automatically cleaning ability of self-cleaning glass.
And decorative layer and glass basis have good binding intensity, improve the anti-wear performance of decorative layer, thereby have prolonged the hydrophily of decorative layer, and in the environment of dark, the hydrophily of decorative layer can reach 15 days, and the hydrophily of decorative layer does not disappear in promptly 15 days.Wear-resisting method of testing is to utilize the wiper that comprises two windshield wiper blades with 20g/cm
2Active force speed with 14cm/s on self-cleaning glass move, after the repeated friction 1000 times, the hydrophily of measuring self-cleaning glass still exists.
In addition, TiO
2/ metal ion rete can prevent effectively that light-sensitive material is in use contaminated, thereby improves the service life of decorative layer, the harm that can avoid light-sensitive material to cause human body simultaneously.
Embodiment one
A makes SiO on the glass basis surface
2Rete specifically comprises:
A1 is dissolved in silester in the absolute ethyl alcohol, and under 30 ℃ temperature, stirring 20min, to obtain mass concentration be 5% organosilicon lipoprotein solution.
A2 is that the concentrated hydrochloric acid of 0.2N splashes in the organosilicon lipoprotein solution with hydrogen ion concentration, under 30 ℃ temperature, stirs simultaneously and makes organic silicone grease hydrolysis in 1 hour, and the mol ratio of concentrated hydrochloric acid and organic silicone grease is 0.5.
A3 adds the malleableize agent in the organosilicon lipoprotein solution that hydrolysis takes place, the mol ratio of malleableize agent and organic silicone grease is 0.1, is cooled to room temperature after stirring then, and the acquisition solid content is 1% Ludox.
A4, it is 1% Ludox that glass basis is put into solid content, lifts with the speed of 1cm/min, thereby makes Ludox stick to the glass basis surface; The glass basis of adhesive silicone colloidal sol is placed on dry 30min under 100 ℃ the temperature, thereby obtains SiO on the surface of glass basis
2Rete.
B is at SiO
2The surface of rete makes TiO
2/ metal ion/photosensitive material layer specifically comprises:
B1 is dissolved in absolute ethyl alcohol with butyl titanate, and the formation mass concentration is 1% organic titanium lipoprotein solution.
B2, iron and inhibitor in the organic titanium lipoprotein solution, adding, and stirring 10min obtains first mixed liquor under 30 ℃ temperature, and wherein, the mol ratio of organic titanium fat and iron is 0.1, the mol ratio of inhibitor and iron is 0.1.
B3; Use concentrated hydrochloric acid, deionized water and absolute ethyl alcohol to be configured to second mixed liquor of hydrogen ion concentration as 0.2N; Then second mixed liquor is splashed into first mixed liquor; And the mol ratio of strong acid and organic titanium ester is 0.5, and under 30 ℃ temperature, stirring and obtaining solid content in 0.5 hour is 1.5% the titanium colloidal sol that contains metal ion.
B4 mixes cadmium sulfide with concentrated hydrochloric acid, add then that to form solid content in the titanium colloidal sol contain metal ion be 1.5% the titanium colloidal sol that contains photosensitive semiconductor and metal ion, and the mol ratio of cadmium sulfide and organic titanium fat is 0.1.
B5 is manufactured with SiO with the surface
2The glass basis of rete is put into the titanium colloidal sol that contains photosensitive semiconductor and metal ion, and the speed with 2cm/min lifts then, thereby the titanium colloidal sol that will contain photosensitive semiconductor and metal ion sticks to SiO
2Film surface, last under 250 ℃ temperature dry 0.5h, thereby at said SiO
2Film surface obtains TiO
2/ metal ion/photosensitive material layer.
C is at TiO
2The surface of/metal ion/photosensitive material layer makes TiO
2/ metal ion rete specifically comprises:
C1, obtaining solid content according to the step of B1-B3 is 1.5% the titanium colloidal sol that contains metal ion.
C2 is manufactured with TiO with the surface
2It is 1.5% the titanium colloidal sol that contains metal ion that the glass basis of/metal ion/photosensitive material layer is put into solid content, lifts with the speed of 1cm/min, thereby the titanium colloidal sol of metal ion is sticked to TiO
2The surface of/metal ion/photosensitive material layer, the glass basis that will be stained with the titanium colloidal sol that contains metal ion again are placed on dry 0.5h under 250 ℃ the temperature, thereby at said TiO
2The surface of/metal ion/photosensitive material layer obtains TiO
2/ metal ion rete.
Embodiment two
A makes SiO on the glass basis surface
2Rete specifically comprises:
A1 is dissolved in silester in the absolute ethyl alcohol, and under 40 ℃ temperature, stirring 12min, to obtain mass concentration be 10% organosilicon lipoprotein solution.
A2 is that the concentrated hydrochloric acid of 0.2N splashes in the organosilicon lipoprotein solution with hydrogen ion concentration, under 40 ℃ temperature, stirs simultaneously and makes organic silicone grease hydrolysis in 2 hours, and the mol ratio of concentrated hydrochloric acid and organic silicone grease is 1.
A3 adds the malleableize agent in the organosilicon lipoprotein solution that hydrolysis takes place, the mol ratio of malleableize agent and organic silicone grease is 0.5, is cooled to room temperature after stirring then, and the acquisition solid content is 2% Ludox.
A4, it is 2% Ludox that glass basis is put into solid content, lifts with the speed of 5cm/min, thereby makes Ludox stick to the glass basis surface; The glass basis of adhesive silicone colloidal sol is placed on dry 20min under 80 ℃ the temperature, thereby obtains SiO on the surface of glass basis
2Rete.
B is at SiO
2The surface of rete makes TiO
2/ metal ion/photosensitive material layer specifically comprises:
B1 is dissolved in absolute ethyl alcohol with butyl titanate, and the formation mass concentration is 2% organic titanium lipoprotein solution.
B2, iron and inhibitor in the organic titanium lipoprotein solution, adding, and stirring 15min obtains first mixed liquor under 40 ℃ temperature, and wherein, the mol ratio of organic titanium fat and nickel is 0.5, the mol ratio of inhibitor and iron is 0.5.
B3; Use concentrated hydrochloric acid, deionized water and absolute ethyl alcohol to be configured to second mixed liquor of hydrogen ion concentration as 0.2N; Then second mixed liquor is splashed into first mixed liquor; And the mol ratio of strong acid and organic titanium ester is 1, and under 40 ℃ temperature, stirring and obtaining solid content in 1 hour is 2.5% the titanium colloidal sol that contains metal ion.
B4 mixes cadmium sulfide with concentrated hydrochloric acid, add then that to form solid content in the titanium colloidal sol contain metal ion be 2.5% the titanium colloidal sol that contains photosensitive semiconductor and metal ion, and the mol ratio of cadmium sulfide and organic titanium fat is 0.5.
B5 is manufactured with SiO with the surface
2The glass basis of rete is put into the titanium colloidal sol that contains photosensitive semiconductor and metal ion, and the speed with 10cm/min lifts then, thereby the titanium colloidal sol that will contain photosensitive semiconductor and metal ion sticks to SiO
2Film surface, last under 260 ℃ temperature dry 1h, thereby at said SiO
2Film surface obtains TiO
2/ metal ion/photosensitive material layer.
C is at TiO
2The surface of/metal ion/photosensitive material layer makes TiO
2/ metal ion rete specifically comprises:
C1, obtaining solid content according to the step of B1-B3 is 1.5% the titanium colloidal sol that contains metal ion.
C2 is manufactured with TiO with the surface
2It is 2.5% the titanium colloidal sol that contains metal ion that the glass basis of/metal ion/photosensitive material layer is put into solid content, lifts with the speed of 4cm/min, thereby the titanium colloidal sol of metal ion is sticked to TiO
2The surface of/metal ion/photosensitive material layer, the glass basis that will be stained with the titanium colloidal sol that contains metal ion again are placed on dry 1h under 260 ℃ the temperature, thereby at said TiO
2The surface of/metal ion/photosensitive material layer obtains TiO
2/ metal ion rete.
Embodiment three
A makes SiO on the glass basis surface
2Rete specifically comprises:
A1 is dissolved in silester in the absolute ethyl alcohol, and under 45 ℃ temperature, stirring 18min, to obtain mass concentration be 15% organosilicon lipoprotein solution.
A2 is that the concentrated hydrochloric acid of 0.2N splashes in the organosilicon lipoprotein solution with hydrogen ion concentration, under 45 ℃ temperature, stirs simultaneously and makes organic silicone grease hydrolysis in 3 hours, and the mol ratio of concentrated hydrochloric acid and organic silicone grease is 2.
A3 adds the malleableize agent in the organosilicon lipoprotein solution that hydrolysis takes place, the mol ratio of malleableize agent and organic silicone grease is 1, is cooled to room temperature after stirring then, and the acquisition solid content is 3.5% Ludox.
A4, it is 3.5% Ludox that glass basis is put into solid content, lifts with the speed of 8cm/min, thereby makes Ludox stick to the glass basis surface; The glass basis of adhesive silicone colloidal sol is placed on dry 25min under 70 ℃ the temperature, thereby obtains SiO on the surface of glass basis
2Rete.
B is at SiO
2The surface of rete makes TiO
2/ metal ion/photosensitive material layer specifically comprises:
B2, iron and inhibitor in the organic titanium lipoprotein solution, adding, and stirring 18min obtains first mixed liquor under 45 ℃ temperature, and wherein, the mol ratio of organic titanium fat and aluminium is 1, the mol ratio of inhibitor and iron is 1.
B3; Use concentrated hydrochloric acid, deionized water and absolute ethyl alcohol to be configured to second mixed liquor of hydrogen ion concentration as 0.2N; Then second mixed liquor is splashed into first mixed liquor; And the mol ratio of strong acid and organic titanium ester is 2, and under 45 ℃ temperature, stirring and obtaining solid content in 1.5 hours is 4% the titanium colloidal sol that contains metal ion.
B4 mixes cadmium sulfide with concentrated hydrochloric acid, add then that to form solid content in the titanium colloidal sol contain metal ion be 4% the titanium colloidal sol that contains photosensitive semiconductor and metal ion, and the mol ratio of cadmium sulfide and organic titanium fat is 1.5.
B5 is manufactured with SiO with the surface
2The glass basis of rete is put into the titanium colloidal sol that contains photosensitive semiconductor and metal ion, and the speed with 15cm/min lifts then, thereby the titanium colloidal sol that will contain photosensitive semiconductor and metal ion sticks to SiO
2Film surface, last under 280 ℃ temperature dry 1.5h, thereby at said SiO
2Film surface obtains TiO
2/ metal ion/photosensitive material layer.
C is at TiO
2The surface of/metal ion/photosensitive material layer makes TiO
2/ metal ion rete specifically comprises:
C1, obtaining solid content according to the step of B1-B3 is 3.5% the titanium colloidal sol that contains metal ion.
C2 is manufactured with TiO with the surface
2It is 3.5% the titanium colloidal sol that contains metal ion that the glass basis of/metal ion/photosensitive material layer is put into solid content, lifts with the speed of 8cm/min, thereby the titanium colloidal sol of metal ion is sticked to TiO
2The surface of/metal ion/photosensitive material layer, the glass basis that will be stained with the titanium colloidal sol that contains metal ion again are placed on dry 1.5h under 280 ℃ the temperature, thereby at said TiO
2The surface of/metal ion/photosensitive material layer obtains TiO
2/ metal ion rete.
Embodiment four
A makes SiO on the glass basis surface
2Rete specifically comprises:
A1 is dissolved in silester in the absolute ethyl alcohol, and under 50 ℃ temperature, stirring 20min, to obtain mass concentration be 20% organosilicon lipoprotein solution.
A2 is that the concentrated hydrochloric acid of 0.2N splashes in the organosilicon lipoprotein solution with hydrogen ion concentration, under 50 ℃ temperature, stirs simultaneously and makes organic silicone grease hydrolysis in 4 hours, and the mol ratio of concentrated hydrochloric acid and organic silicone grease is 2.5.
A3 adds the malleableize agent in the organosilicon lipoprotein solution that hydrolysis takes place, the mol ratio of malleableize agent and organic silicone grease is 1.5, is cooled to room temperature after stirring then, and the acquisition solid content is 5% Ludox.
A4, it is 5% Ludox that glass basis is put into solid content, lifts with the speed of 10cm/min, thereby makes Ludox stick to the glass basis surface; The glass basis of adhesive silicone colloidal sol is placed on dry 10min under 60 ℃ the temperature, thereby obtains SiO on the surface of glass basis
2Rete.
B is at SiO
2The surface of rete makes TiO
2/ metal ion/photosensitive material layer specifically comprises:
B1 is dissolved in absolute ethyl alcohol with butyl titanate, and the formation mass concentration is 5% organic titanium lipoprotein solution.
B2, iron and inhibitor in the organic titanium lipoprotein solution, adding, and stirring 20min obtains first mixed liquor under 50 ℃ temperature, and wherein, the mol ratio of organic titanium fat and aluminium is 1.5, the mol ratio of inhibitor and iron is 1.5.
B3; Use concentrated hydrochloric acid, deionized water and absolute ethyl alcohol to be configured to second mixed liquor of hydrogen ion concentration as 0.2N; Then second mixed liquor is splashed into first mixed liquor; And the mol ratio of strong acid and organic titanium ester is 2.5, and under 50 ℃ temperature, stirring and obtaining solid content in 2 hours is 4% the titanium colloidal sol that contains metal ion.
B4 mixes cadmium sulfide with concentrated hydrochloric acid, add then that to form solid content in the titanium colloidal sol contain metal ion be 4.5% the titanium colloidal sol that contains photosensitive semiconductor and metal ion, and the mol ratio of cadmium sulfide and organic titanium fat is 2.5.
B5 is manufactured with SiO with the surface
2The glass basis of rete is put into the titanium colloidal sol that contains photosensitive semiconductor and metal ion, and the speed with 20cm/min lifts then, thereby the titanium colloidal sol that will contain photosensitive semiconductor and metal ion sticks to SiO
2Film surface, last under 300 ℃ temperature dry 2h, thereby at said SiO
2Film surface obtains TiO
2/ metal ion/photosensitive material layer.
C is at TiO
2The surface of/metal ion/photosensitive material layer makes TiO
2/ metal ion rete specifically comprises:
C1, obtaining solid content according to the step of B1-B3 is 4.5% the titanium colloidal sol that contains metal ion.
C2 is manufactured with TiO with the surface
2It is 4% the titanium colloidal sol that contains metal ion that the glass basis of/metal ion/photosensitive material layer is put into solid content, lifts with the speed of 10cm/min, thereby the titanium colloidal sol of metal ion is sticked to TiO
2The surface of/metal ion/photosensitive material layer, the glass basis that will be stained with the titanium colloidal sol that contains metal ion again are placed on dry 2h under 300 ℃ the temperature, thereby at said TiO
2The surface of/metal ion/photosensitive material layer obtains TiO
2/ metal ion rete.
The catalytic effect of the decorative layer that the light through detecting different wave length provides the foregoing description finds that visible light can obtain the catalytic effect identical with ultraviolet light equally.Hence one can see that, and the self-cleaning glass that the preparation method that is provided by the foregoing description obtains can utilize visible light, thereby can improve the photocatalysis efficiency of self-cleaning glass, and then improve the automatically cleaning ability of self-cleaning glass.
The above is merely preferred embodiment of the present invention, and is in order to restriction the present invention, not all within spirit of the present invention and principle, any modification of being done, is equal to replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (18)
1. a self-cleaning glass comprises glass basis and decorative layer, it is characterized in that, said decorative layer comprises the SiO that is stacked in said glass basis surface from said glass basis successively
2Rete, TiO
2/ metal ion/photosensitive material layer and TiO
2/ metal ion rete.
2. self-cleaning glass as claimed in claim 1 is characterized in that, said SiO
2The thickness of rete is 80～120nm.
3. self-cleaning glass as claimed in claim 1 is characterized in that, said TiO
2The thickness of/metal ion/photosensitive material layer is 200～300nm.
4. self-cleaning glass as claimed in claim 1 is characterized in that, said TiO
2The thickness of/metal ion rete is 80～120nm.
5. self-cleaning glass as claimed in claim 1 is characterized in that, at said TiO
2In/metal ion/photosensitive material layer, said TiO
2, metal ion and sensitising agent the quality percentage composition be respectively: 5～80%, 5～40%, 5～30%.
6. self-cleaning glass as claimed in claim 1 is characterized in that, at said TiO
2In/metal ion the rete, said TiO
2Be respectively with the quality percentage composition of metal ion: 30～90% and 10～70%.
7. the preparation method of a self-cleaning glass is characterized in that, may further comprise the steps:
Obtain Ludox, utilize said Ludox to make SiO on the surface of glass basis
2Rete;
Obtain the titanium colloidal sol that contains photosensitive semiconductor and metal ion, utilize the said titanium colloidal sol that contains photosensitive semiconductor and metal ion to be coated in said SiO
2Film surface is made TiO
2/ metal ion/photosensitive material layer;
Obtain the titanium colloidal sol that contains metal ion, utilize the said titanium colloidal sol that contains metal ion at said TiO
2/ metal ion/photosensitive material layer surface makes TiO
2/ metal ion rete.
8. preparation method as claimed in claim 7 is characterized in that, said Ludox obtains through following steps:
Organosilicon fat is dissolved in the organic solvent, and under 30～50 ℃ temperature, stirs acquisition organosilicon lipoprotein solution;
Be mixed with strong acid solution with strong acid solution and deionized water;
Said strong acid solution is splashed in the said organosilicon lipoprotein solution, under 30～50 ℃ temperature, stir simultaneously and make said organic silicone grease hydrolysis;
The malleableize agent is added in the said organosilicon lipoprotein solution of hydrolysis, stir and be cooled to room temperature, obtain said Ludox.
9. preparation method as claimed in claim 8 is characterized in that, the mass concentration of said organic silicone grease is 5～20%; The mol ratio of said strong acid and said organic silicone grease is 0.5～2.5; The said malleableize agent that adds and the mol ratio of said organo-silicon ester are 0.1～1.5.
10. preparation method as claimed in claim 8 is characterized in that, utilizes czochralski method to make said SiO
2Rete, the solid content of said Ludox are 1～5%, and the pull rate of said glass basis is 1～10cm/min, thereby said Ludox is being sticked to said glass basis surface.
11. preparation method as claimed in claim 10 is characterized in that, sticks to said Ludox dry 10～30min under 60～100 ℃ temperature on said glass basis surface, thereby obtains said SiO on the surface of said glass basis
2Rete.
12. preparation method as claimed in claim 7 is characterized in that, the said titanium colloidal sol that contains photosensitive semiconductor and metal ion is to obtain through following steps:
Organic titanium liposoluble is formed the organic titanium lipoprotein solution in organic solvent;
In said organic titanium lipoprotein solution, add slaine and inhibitor, under 30～50 ℃ temperature, stir and obtain first mixed liquor;
Be configured to second mixed liquor with strong acid, deionized water and organic solvent;
Said second mixed liquor is splashed into said first mixed liquor, under 30～50 ℃ temperature, stir the titanium colloidal sol that obtains to contain metal ion simultaneously;
The photosensitive semiconductor powder is mixed with strong acid, add then in the said titanium colloidal sol that contains metal ion, thereby obtain the said titanium colloidal sol that contains photosensitive semiconductor and metal ion.
13. preparation method as claimed in claim 12 is characterized in that, the mass concentration of said organic titanium lipoprotein solution is 1～5%; The mol ratio of said organic titanium fat and said slaine is 0.1～1.5, and the mol ratio of said inhibitor and said slaine is 0.1～1.5; The mol ratio of said photosensitive semiconductor powder and said organic titanium fat is 0.1～2.5.
14. preparation method as claimed in claim 12 is characterized in that, utilizes czochralski method to make said TiO
2/ metal ion/photosensitive material layer; The said solid content that contains the titanium colloidal sol of photosensitive semiconductor and metal ion is 1.5～4.5%; The pull rate of said glass basis is 2～20cm/min, thereby the said titanium colloidal sol that contains photosensitive semiconductor and metal ion is sticked to said SiO
2Film surface.
15. preparation method as claimed in claim 14 is characterized in that, sticks to said SiO
2The said titanium colloidal sol dry 0.5～2h under 250～300 ℃ temperature that contains photosensitive semiconductor and metal ion of film surface, thereby at said SiO
2Film surface obtains said TiO
2/ metal ion/photosensitive material layer.
16. preparation method as claimed in claim 7 is characterized in that, the said titanium colloidal sol that contains metal ion obtains through following steps:
Organic titanium liposoluble is formed the organic titanium lipoprotein solution in organic solvent;
In said organic titanium lipoprotein solution, add slaine and inhibitor, under 30～50 ℃ temperature, stir and obtain first mixed liquor;
Be configured to second mixed liquor with strong acid, deionized water and organic solvent;
Said second mixed liquor is splashed into said first mixed liquor, under 30～50 ℃ temperature, stir simultaneously and obtain said titanium colloidal sol.
17. preparation method as claimed in claim 16 is characterized in that, utilizes czochralski method to make said TiO
2/ metal ion rete, the said solid content that contains the titanium colloidal sol of metal ion is 1.5～4.5%, the pull rate of said glass basis is 1～10cm/min, thereby the said titanium colloidal sol that contains metal ion is sticked to said TiO
2The surface of/metal ion/photosensitive material layer.
18. preparation method as claimed in claim 17 is characterized in that, sticks to said TiO
2The said titanium colloidal sol dry 0.5～2h under 250～300 ℃ temperature that contains metal ion on/metal ion/photosensitive material layer surface, thereby at said TiO
2The surface of/metal ion/photosensitive material layer makes said TiO
2/ metal ion rete.
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|---|---|---|---|
| CN2011103421386A CN102490406A (en) | 2011-11-01 | 2011-11-01 | Self-cleaning glass and manufacturing method thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103421386A CN102490406A (en) | 2011-11-01 | 2011-11-01 | Self-cleaning glass and manufacturing method thereof |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105271812A (en) * | 2015-10-29 | 2016-01-27 | 苏州市灵通玻璃制品有限公司 | Preparation process of anti-pollution self-cleaning glass |
| CN107020072A (en) * | 2017-04-28 | 2017-08-08 | 杨林 | A kind of preparation method of the optically catalytic TiO 2 film of high adhesion high dispersive |
| CN108640531A (en) * | 2018-04-13 | 2018-10-12 | 新乡学院 | A kind of preparation method of ion doping composite self-cleaning glass |
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| CN1467023A (en) * | 2002-07-09 | 2004-01-14 | 中国科学院广州能源研究所 | Photocatalyst film having light activity visible basal body and method for preparing the same |
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| CN1467023A (en) * | 2002-07-09 | 2004-01-14 | 中国科学院广州能源研究所 | Photocatalyst film having light activity visible basal body and method for preparing the same |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105271812A (en) * | 2015-10-29 | 2016-01-27 | 苏州市灵通玻璃制品有限公司 | Preparation process of anti-pollution self-cleaning glass |
| CN107020072A (en) * | 2017-04-28 | 2017-08-08 | 杨林 | A kind of preparation method of the optically catalytic TiO 2 film of high adhesion high dispersive |
| CN108640531A (en) * | 2018-04-13 | 2018-10-12 | 新乡学院 | A kind of preparation method of ion doping composite self-cleaning glass |
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Application publication date: 20120613 |