CN102465275A - Film-coating device - Google Patents
Film-coating device Download PDFInfo
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- CN102465275A CN102465275A CN201010549489XA CN201010549489A CN102465275A CN 102465275 A CN102465275 A CN 102465275A CN 201010549489X A CN201010549489X A CN 201010549489XA CN 201010549489 A CN201010549489 A CN 201010549489A CN 102465275 A CN102465275 A CN 102465275A
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- film
- umbrella stand
- cover body
- plating umbrella
- plating
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Abstract
The invention provides a film-coating device which comprises a film-coating umbrella frame, wherein the film-coating umbrella frame is provided with a plurality of accommodating through holes; the accommodating through holes are used for accommodating to-be-coated pieces; the film-coating device further comprises a film-coating umbrella frame cover and a filtering plate; the film-coating umbrella frame cover is used for covering the film-coating umbrella frame from the top of the film-coating umbrella frame; the filtering plate is mounted at the bottom of the film-coating umbrella frame; a plurality of filtering holes are formed on the filtering plate; the filtering holes are used for transmitting gaseous or ionic vapor deposition materials and stopping impurities; and the film-coating umbrella frame cover is used for preventing the to-be-coated pieces from being polluted.
Description
Technical field
The present invention relates to a kind of film coating apparatus, relate in particular to a kind of film coating apparatus with film-plating umbrella stand.
Background technology
Current, many Industrial products surface all is coated with function film, to improve the various performances of product surface.Plate one deck anti-reflective film like surface,, reduce the energy waste of incident light through eyeglass to reduce the reflectivity of lens surface at optical mirror slip.And for example plate one deck filter coating, can filter the light of a certain predetermined band, process various spectral filters on some filter element surface.Usually, film coating method mainly comprises ion plating method, radio frequency magnetron sputter, vacuum vapor deposition method, chemical Vapor deposition process etc.Ichiki; M. wait the people to be published in 2003 Symposium on Design in May, 2003; Test has introduced among the paper Thin film formation-a fabrication onnon-planar surface by spray coating method of Integration andPackaging of MEMS/MOEMS through being sprayed on the method for on-plane surface formation film.
Vapor deposition is a kind of physical gas phase deposition technology, promptly carries out thin film deposition with the mode of physics.Particularly, it heats deposition material through ionic fluid or electron beam, makes deposition material become gaseous state or ionic state, and is deposited on workpiece surface to be plated to form a deposition material rete.
When certain of workpiece is simultaneously carried out plated film; Normally workpiece to be plated is fixed on the film-plating umbrella stand; The vapor deposition target is arranged at the film-plating umbrella stand below, through evaporation target is dashed to film-plating umbrella stand, thereby the one side towards the film-plating umbrella stand below of workpiece to be plated is carried out plated film.Yet, possibly contain impurity in the deposition material, when vapor deposition, impurity also may be plating to workpiece surface, thus defectives such as generation is white, pit.In addition; Only need carry out plated film in the one side below film-plating umbrella stand of workpiece to be plated; But in the vapor deposition processing procedure; The deposition material that becomes gaseous state or ionic state is to move with unordered mode in vacuum cavity, and it flows to the umbrella stand top easily around fixed umbrella stand, thereby pollutes workpiece to be plated attached to the periphery and the another side of workpiece to be plated.
Summary of the invention
In view of this, be necessary to provide a kind of workpiece to be plated contaminated film coating apparatus in film-plating process that prevents.
The present invention provides a kind of film coating apparatus, and it comprises a film-plating umbrella stand, and said film-plating umbrella stand has a plurality of ccontaining through holes, and said a plurality of ccontaining through holes are used for ccontaining workpiece to be plated, and said film coating apparatus also comprises a film-plating umbrella stand mask and a screen plate.Said film-plating umbrella stand mask is used for covering this film-plating umbrella stand from this film-plating umbrella stand top.Said screen plate is installed on this film-plating umbrella stand bottom, is formed with a plurality of filter pore on the said screen plate, and said filter pore is used for seeing through the deposition material of gaseous state or ionic state, and stops impurity.
Compared to prior art; Said film coating apparatus comprises a film-plating umbrella stand mask and a screen plate; Film-plating umbrella stand mask is used for stating film-plating umbrella stand from the main header casing residence; Thereby prevent that deposition material from polluting film-plating umbrella stand and workpiece to be plated from the side, screen plate is installed on the film-plating umbrella stand bottom and has the filter pore that can see through deposition material and stop impurity, thereby prevents contaminating impurity film-plating umbrella stand and workpiece to be plated.
Description of drawings
Fig. 1 is the schematic perspective view of the film coating apparatus that provides of embodiment of the present invention.
Fig. 2 is the perspective exploded view of the film coating apparatus that provides of embodiment of the present invention.
The main element nomenclature
Film-plating umbrella stand 200
Ccontaining through hole 201
Film-plating umbrella stand mask 300
Umbrella support 12
Screw 122
Bolt 24
Screw 402
Embodiment
To combine accompanying drawing below, the present invention will be done further detailed description.
See also Fig. 1 and Fig. 2, embodiment of the present invention provides a kind of film coating apparatus 100, and it comprises a film-plating umbrella stand 200, a film-plating umbrella stand mask 300 and a screen plate 400.
Said film-plating umbrella stand 200 has a plurality of ccontaining through holes 201, is used for ccontaining workpiece to be plated (figure does not show).Said a plurality of ccontaining through hole 201 sizes are identical, and marshalling.Said film-plating umbrella stand 200 be shaped as umbrella.During plated film, vapor deposition source is arranged at the below of film-plating umbrella stand 200, and vapor deposition source is carried out plated film from the lower direction of film-plating umbrella stand 200.
Said film-plating umbrella stand mask 300 is used for stating film-plating umbrella stand 200 from the tip shroud residence of film-plating umbrella stand 200, and it comprises one first cover body 10 and one second cover body 20.Said first cover body 10 directly covers on the film-plating umbrella stand 200, and said second cover body 20 is used to cover first cover body 10.
Said first cover body 10 comprises a hollow umbrella support 12.Said umbrella support 12 comprises a plurality of back shafts 14.Said a plurality of back shaft 14 is and is symmetrically distributed on the umbrella support 12.In this embodiment, the quantity of said back shaft 14 is set to 8.The inboard of said each back shaft 14 is provided with a plurality of shielding plates 16, and said each shielding plate 16 all is set to connect the inboard that hangs on back shaft 14 through a coupling shaft 18.Said coupling shaft 18 can be set to mobilizable being connected on the back shaft 14, thereby makes the angle of shielding plate 16 have certain handiness.In this embodiment, said a plurality of shielding plate 16 sizes are identical and be symmetrically distributed on said first cover body 10.It is identical with the shape of the ccontaining through hole 201 that is used for ccontaining workpiece to be plated of said film-plating umbrella stand 200 that the shape of said each shielding plate 16 is set to, and its arrangement mode is corresponding with the arrangement of the ccontaining through hole 201 of film-plating umbrella stand 200.During plated film, vapor deposition source is carried out plated film from the lower direction of film-plating umbrella stand 200, then workpiece to be plated can be towards that face of the below of film-plating umbrella stand 200 by plated film, and another face can not be plated to.Another face that can make workpiece to be plated sheet 16 that is blocked that is provided with of this first cover body 10 covers, thereby guarantees that another side can not polluted by vapor deposition source.On the other hand, because the temperature during plated film is very high, often be heated to 170 to 200 degree, and workpiece to be plated is as be eyeglass, its material is generally plastic cement, glass etc., at high temperature is easy to produce stress deformation, and causes workpiece to be plated to produce warpage etc., causes yield decline.Being provided with of this shielding plate 16 also can be suppressed workpiece to be plated simultaneously, thereby avoids workpiece generation warpage to be plated.
Said second cover body 20 is used to cover first cover body 10.The height of said first cover body 10 on film-plating umbrella stand 200 bottoms to top-direction is h1; The height of said second cover body on equidirectional is h2; The height h2 of said second cover body 20 is not less than the height h1 of first cover body 10, so, can first cover body 10 be covered in second cover body 20 fully.The shape of said second cover body 20 can be set to round barrel shape or umbrella etc.In this embodiment, this second cover body 20 be shaped as round barrel shape, its inside is hollow structure, and the top is provided with a cruciform bracing frame 22.Certainly, the top of said second cover body 20 also can be set to the hollow umbrella.The center of support frame as described above 22 is provided with a bolt 24.And the top center of the umbrella support 12 of first cover body 10 is provided with a screw 122.The bolt 24 and the screw 122 of said second cover body 20 and first cover body 10 can cooperatively interact, and second cover body 20 is fixedly connected with first cover body 10.Certainly, also can use other mode of connection to fix between said first cover body 10 and second cover body 20.For example, the bottom edge of said second cover body 20 can be provided with several hasp structures, when second cover body 20 covers behind the outside of first cover body 10, can use hasp that first cover body 10 and second cover body 20 is fixing.
The bottom surface of said first cover body 10, second cover body 20 and said film-plating umbrella stand 200 is circle, and its bottom surface diameter is suitable.Preferably, the bottom surface somewhat larger in diameter of said first cover body 10 is diameter in the bottom surface of film-plating umbrella stand 200, and the bottom surface somewhat larger in diameter of second cover body 20 is in the bottom surface diameter of first cover body 10.Like this, first cover body 10 can cover film-plating umbrella stand 200, and second cover body 20 can all cover first cover body 10 and film-plating umbrella stand 200.So, can make the deposition material of gaseous state or ionic state can directly not impact the periphery of the film-plating umbrella stand 200 and first cover body 10, thereby prevent that deposition material from polluting film-plating umbrella stand 200 and workpiece to be plated from the side, improve the cleanliness factor of plated film.
Said screen plate 400 is installed on the bottom of film-plating umbrella stand 200, promptly towards an end of vapor deposition source, is formed with a plurality of filter pore 401 on the said screen plate 400, is used for seeing through the deposition material of gaseous state or ionic state, and stops impurity.Because the physical features of impurity and deposition material is different, therefore in vapor deposition, deposition material can flash to gaseous state or ionic state, and impurity can not.Therefore the size of impurity is greater than the size of the deposition material that is gaseous state or ionic state, therefore can make screen plate 400 can see through the deposition material of gaseous state or ionic state, and stop impurity through the aperture of filter pore 401 is set.The aperture of filter pore 401 can change with the difference of deposition material.In this embodiment, the aperture of filter pore 401 is 15～20 millimeters (mm).
In this embodiment, screen plate 400 is rounded, and its external diameter equals the bottom surface diameter of first cover body 10.On the bottom surface that is formed with screw 402, the first cover bodies 10 on the screen plate 400, be formed with corresponding screw (figure does not show), be used to pass screw (figure does not show), thereby screen plate 400 is installed on first cover body 10.Certainly, said screen plate 400 also can be connected with second cover body 20 or film-plating umbrella stand 200, and mode of connection also can adopt the mode outside the screw connection, and for example hasp connects.
The material of said first cover body 10, second cover body 20, screen plate 400 can be selected from copper, aluminium and stainless steel etc.
Said film coating apparatus 100 covers on first cover body 10 on the film-plating umbrella stand 200 earlier in use, and with the ccontaining through hole 201 of a plurality of shielding plates 16 alignment film-plating umbrella stand 200, at this moment, has placed workpiece to be plated in the ccontaining through hole 201.Then, second cover body 20 is covered on first cover body 10 and the film-plating umbrella stand 200, again bolt 24 is screwed in the screw 122, and make second cover body 20 and first cover body, 10 fixing compacts.At last, through screw screen plate 400 is installed on the bottom surface of first cover body 10.At this moment, promptly can film-plating umbrella stand 200 be carried out follow-up film-plating process.
Compared to prior art; Said film coating apparatus comprises a film-plating umbrella stand mask and a screen plate; Film-plating umbrella stand mask is used for stating film-plating umbrella stand from the main header casing residence; Thereby prevent that deposition material from polluting film-plating umbrella stand and workpiece to be plated from the side, screen plate is installed on the film-plating umbrella stand bottom and has the filter pore that can see through deposition material and stop impurity, thereby prevents contaminating impurity film-plating umbrella stand and workpiece to be plated.
It is understandable that, for the person of ordinary skill of the art, can make other various corresponding changes and distortion by technical conceive according to the present invention, and all these change the protection domain that all should belong to claim of the present invention with distortion.
Claims (9)
1. film coating apparatus, it comprises a film-plating umbrella stand, and said film-plating umbrella stand has a plurality of ccontaining through holes, and said a plurality of ccontaining through holes are used for ccontaining workpiece to be plated, it is characterized in that said film coating apparatus also comprises: a film-plating umbrella stand mask and a screen plate; Said film-plating umbrella stand mask is used for covering this film-plating umbrella stand from this film-plating umbrella stand top; Said screen plate is installed on this film-plating umbrella stand bottom, is formed with a plurality of filter pore on the said screen plate, and said filter pore is used for seeing through the deposition material of gaseous state or ionic state, and stops impurity.
2. film coating apparatus as claimed in claim 1; It is characterized in that said film-plating umbrella stand mask comprises one first cover body, said first cover body is used for directly covering on this film-plating umbrella stand; It comprises a hollow umbrella support; Said umbrella support comprises a plurality of back shafts, and the inboard of said each back shaft is provided with a plurality of shielding plates, and said a plurality of shielding plates are corresponding with the ccontaining through hole of said film-plating umbrella stand.
3. film coating apparatus as claimed in claim 2; It is characterized in that; Said film-plating umbrella stand mask also comprises one second cover body; Said second cover body is used to cover first cover body, and said second cover body is not less than the height of said first cover body on this direction at said film-plating umbrella stand bottom to the height on the top-direction.
4. film coating apparatus as claimed in claim 2 is characterized in that, the shape setting of said a plurality of shielding plates is identical with the shape of the ccontaining through hole of said film-plating umbrella stand.
5. film coating apparatus as claimed in claim 2 is characterized in that, said a plurality of shielding plates size is identical and be symmetrically distributed on said first cover body.
6. film coating apparatus as claimed in claim 2 is characterized in that, said each shielding plate is for hanging on the inboard of corresponding back shaft through coupling shaft, and the coupling shaft of each shielding plate is connected with corresponding back shaft movably.
7. film coating apparatus as claimed in claim 3 is characterized in that, the bottom surface diameter of said first cover body, second cover body and said film-plating umbrella stand is suitable.
8. film coating apparatus as claimed in claim 1 is characterized in that, the aperture of said filter pore is 15～20 millimeters.
9. film coating apparatus as claimed in claim 1 is characterized in that, the material of said film-plating umbrella stand mask and screen plate is copper, aluminium or stainless steel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010549489XA CN102465275A (en) | 2010-11-18 | 2010-11-18 | Film-coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010549489XA CN102465275A (en) | 2010-11-18 | 2010-11-18 | Film-coating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102465275A true CN102465275A (en) | 2012-05-23 |
Family
ID=46069384
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201010549489XA Pending CN102465275A (en) | 2010-11-18 | 2010-11-18 | Film-coating device |
Country Status (1)
| Country | Link |
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| CN (1) | CN102465275A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108193188A (en) * | 2018-02-08 | 2018-06-22 | 丹阳市鼎新机械设备有限公司 | A kind of glasses lens plated machine umbrella stand turntable |
| CN112301314A (en) * | 2020-10-29 | 2021-02-02 | 合肥维信诺科技有限公司 | Evaporation crucible and evaporation device |
Citations (7)
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| JPS62263961A (en) * | 1986-05-12 | 1987-11-16 | Hitachi Ltd | Sputtering device |
| US5135634A (en) * | 1991-02-14 | 1992-08-04 | Sputtered Films, Inc. | Apparatus for depositing a thin layer of sputtered atoms on a member |
| JP2004165655A (en) * | 2002-10-25 | 2004-06-10 | Semiconductor Energy Lab Co Ltd | Sputtering system and method of manufacturing thin film |
| CN1863936A (en) * | 2003-10-10 | 2006-11-15 | 独立行政法人科学技术振兴机构 | Film deposition apparatus having hole-like rotary filter plate for capturing fine particles, and film deposition method |
| CN101363117A (en) * | 2007-08-08 | 2009-02-11 | 鸿富锦精密工业（深圳）有限公司 | Film coating bracket and film-plating machine |
| CN101538699A (en) * | 2008-03-17 | 2009-09-23 | 鸿富锦精密工业（深圳）有限公司 | Film plating device and film-plating umbrella stand mask using same |
| US20090258141A1 (en) * | 2008-04-10 | 2009-10-15 | Raytheon Company | Method and Apparatus for Coating Surfaces |
-
2010
- 2010-11-18 CN CN201010549489XA patent/CN102465275A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62263961A (en) * | 1986-05-12 | 1987-11-16 | Hitachi Ltd | Sputtering device |
| US5135634A (en) * | 1991-02-14 | 1992-08-04 | Sputtered Films, Inc. | Apparatus for depositing a thin layer of sputtered atoms on a member |
| JP2004165655A (en) * | 2002-10-25 | 2004-06-10 | Semiconductor Energy Lab Co Ltd | Sputtering system and method of manufacturing thin film |
| CN1863936A (en) * | 2003-10-10 | 2006-11-15 | 独立行政法人科学技术振兴机构 | Film deposition apparatus having hole-like rotary filter plate for capturing fine particles, and film deposition method |
| CN101363117A (en) * | 2007-08-08 | 2009-02-11 | 鸿富锦精密工业（深圳）有限公司 | Film coating bracket and film-plating machine |
| CN101538699A (en) * | 2008-03-17 | 2009-09-23 | 鸿富锦精密工业（深圳）有限公司 | Film plating device and film-plating umbrella stand mask using same |
| US20090258141A1 (en) * | 2008-04-10 | 2009-10-15 | Raytheon Company | Method and Apparatus for Coating Surfaces |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108193188A (en) * | 2018-02-08 | 2018-06-22 | 丹阳市鼎新机械设备有限公司 | A kind of glasses lens plated machine umbrella stand turntable |
| CN112301314A (en) * | 2020-10-29 | 2021-02-02 | 合肥维信诺科技有限公司 | Evaporation crucible and evaporation device |
| CN112301314B (en) * | 2020-10-29 | 2023-03-31 | 合肥维信诺科技有限公司 | Evaporation crucible and evaporation device |
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Application publication date: 20120523 |