CN102443761A - Casing and manufacturing method thereof - Google Patents
Casing and manufacturing method thereof Download PDFInfo
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- CN102443761A CN102443761A CN2010105041758A CN201010504175A CN102443761A CN 102443761 A CN102443761 A CN 102443761A CN 2010105041758 A CN2010105041758 A CN 2010105041758A CN 201010504175 A CN201010504175 A CN 201010504175A CN 102443761 A CN102443761 A CN 102443761A
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- aluminum
- alon
- aluminum alloy
- alloy matrix
- housing
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Abstract
The invention provides a casing, which comprises an aluminum or aluminum matrix, and a AlON gradient film and an ion implanting film which are sequentially formed on the aluminum or aluminum matrix, wherein the percentages of N atom and O atom in the AlON gradient film are respectively increased in a gradient way from the direction close to the aluminum or aluminum matrix to the direction away from the aluminum or aluminum matrix; and the ion implanting film mainly contains a Ce metallic phase, a Ce-O phase and a Ce-N phase. The corrosion resistance of the casing is remarkably improved by a composition film consisting of the AlON gradient film and the ion implanting film. The invention also provides a manufacturing method of the casing.
Description
Technical field
The present invention relates to a kind of housing and method of manufacture thereof, particularly a kind of housing of aluminum or aluminum alloy and method of manufacture thereof.
Background technology
Aluminum or aluminum alloy is widely used in industrial circles such as Aeronautics and Astronautics, automobile and microelectronics at present.But the standard potential of aluminum or aluminum alloy is very low, and is corrosion-resistant poor, is exposed to cause surface corrosion fast in the physical environment.
The method that improves the aluminum or aluminum alloy erosion resistance normally forms the coating of protectiveness on its surface.There are shortcomings such as complex manufacturing, efficient is low, environmental pollution is serious in the surface treatment method of aluminum or aluminum alloy such as traditional anodic oxidation, galvanic deposit, chemically transformed film technique and plating.
Vacuum plating (PVD) is the film technique of a cleaning.Yet; Because the standard potential of aluminum or aluminum alloy is very low; And inevitably can there be micro pores in itself the PVD coating; Galvanic corrosion takes place in PVD coating easily that therefore be formed at the aluminum or aluminum alloy surface, causes this PVD corrosion resistance of coating to reduce, and is limited to the raising of the corrosion resistance of aluminum or aluminum alloy.
Summary of the invention
Given this, a kind of housing of the aluminum or aluminum alloy of erosion resistance preferably that has is provided.
A kind of method of manufacture of above-mentioned housing also is provided in addition.
A kind of housing; Comprise the aluminum or aluminum alloy matrix, be formed at AlON gradient film and ion implantation film on this aluminum or aluminum alloy matrix successively; The percentage composition of N atom and O atom is by all increasing in gradient near aluminum or aluminum alloy matrix to the direction away from the aluminum or aluminum alloy matrix in the said AlON gradient film; Mainly contain Ce metallographic phase, Ce-O in the said ion implantation film and reach the Ce-N phase mutually, said AlON gradient film forms with the magnetron sputtering embrane method.
A kind of method of manufacture of housing, it comprises the steps:
The aluminum or aluminum alloy matrix is provided;
With nitrogen and oxygen is reactant gases; Adopting the aluminium target is target; Surface magnetic control sputtering in this aluminum or aluminum alloy matrix forms AlON gradient film, and the percentage composition of N atom and O atom is respectively by all increasing in gradient near aluminum or aluminum alloy matrix to the direction away from the aluminum or aluminum alloy matrix in the said AlON gradient film;
On this AlON gradient film, inject cerium ion, form and mainly contain the ion implantation film that Ce metallographic phase, Ce-O reach the Ce-N phase mutually.
The method of manufacture of housing according to the invention; On the aluminum or aluminum alloy matrix, form AlON gradient film and ion implantation film successively; The composite film that this AlON gradient film and ion implantation film are formed can significantly improve the erosion resistance of said housing, and the ME of this housing simply, non-environmental-pollution almost.
Description of drawings
Fig. 1 is the cross-sectional schematic of preferred embodiments housing of the present invention.
The main element nomenclature
Aluminum or aluminum alloy matrix 11
AlON gradient film 15
Ion implantation film 17
Embodiment
See also Fig. 1, the housing 10 of the present invention's one preferred embodiment comprises aluminum or aluminum alloy matrix 11, is formed at alumina nitrogen (AlON) the gradient film 15 and the ion implantation film 17 on this aluminum or aluminum alloy matrix 11 surfaces successively.
The thickness of said AlON gradient film 15 is 0.3～2.0 μ m.Said AlON gradient film 15 forms through the magnetron sputtering embrane method.The percentage composition of N atom and O atom is by all increasing in gradient near aluminum or aluminum alloy matrix 11 to the direction away from aluminum or aluminum alloy matrix 11 in this AlON gradient film 15.
This housing 10 also comprises the aluminium lamination 13 that is formed between this aluminum or aluminum alloy matrix 11 and the AlON gradient film 15.The formation of said aluminium lamination 13 is in order to strengthen the bonding force between said AlON gradient film 15 and the aluminum or aluminum alloy matrix 11.The thickness of said aluminium lamination 13 is 50～200nm.
Said ion implantation film 17 mainly contains Ce metallographic phase, Ce-O and reaches the Ce-N phase mutually.
The method of manufacture of said housing 10 mainly comprises the steps:
Aluminum or aluminum alloy matrix 11 is provided, and this aluminum or aluminum alloy matrix 11 can obtain through impact briquetting, and it has the structure of housing to be made 10.
Said aluminum or aluminum alloy matrix 11 is put into the ultrasonic cleaner that is loaded with ethanol and/or acetone soln shake cleaning, to remove the impurity and the greasy dirt on aluminum or aluminum alloy matrix 11 surfaces.Dry for standby after cleaning finishes.
Again argon plasma is carried out on the surface of aluminum or aluminum alloy matrix 11 and clean, further remove the greasy dirt on aluminum or aluminum alloy matrix 11 surfaces, to improve aluminum or aluminum alloy matrix 11 surfaces and follow-up coating's adhesion.Method that argon plasma cleans is carried out on the surface of aluminum or aluminum alloy matrix 11 comprises the steps: aluminum or aluminum alloy matrix 11 is put on the work rest of coating chamber of a vacuum plating unit (figure does not show), to this coating chamber vacuumize handle to vacuum tightness be 8.0 * 10
-3Pa; In coating chamber, feeding purity with the flow of 300～500sccm (standard state ml/min) is 99.999% argon gas (working gas); On aluminum or aluminum alloy matrix 11, apply-300～-bias voltage of 800V; In said coating chamber, form high-frequency voltage, make said argon gas generation ionize and produce argon plasma physical bombardment is carried out on the surface of aluminum or aluminum alloy matrix 11, and reach purpose aluminum or aluminum alloy matrix 11 surface cleaning.The time that said argon plasma cleans is 3～10min.
Said vacuum plating unit is except that can be in order to carrying out the plasma clean, also can be in order to multi-arc ion plating film, magnetron sputtering plating and surface treatment such as ion implantation.
Adopt the mode of magnetron sputtering to form aluminium lamination 13 and AlON gradient film 15 successively on aluminum or aluminum alloy matrix 11 surfaces.The concrete operation method and the processing parameter that form this aluminium lamination 13 and AlON gradient film 15 are:
After said plasma clean is accomplished, regulate argon gas (working gas) flow to 100～300sccm, heat said coating chamber to 50～180 ℃ (being that sputter temperature is 50～180 ℃); Open the power supply of the aluminium target placed said vacuum plating unit, and to set its power be 2～8kw, on aluminum or aluminum alloy matrix 11, apply-50～-bias voltage of 300V, deposition aluminium lamination 13.The time that deposits this aluminium lamination 13 is 5～10min.
After forming said aluminium lamination 13; With the argon gas is working gas; In said coating chamber, feeding initial flow is the reactant gases nitrogen of 10～20sccm and the reactant gases oxygen that initial flow is 10～20sccm; On aluminum or aluminum alloy matrix 11, apply-150～-bias voltage of 500V, deposit said AlON gradient film 15.In the process of this AlON gradient film 15 of deposition; Every deposition 10～15min increases the flow 10～20sccm of nitrogen and oxygen respectively, makes N atom and the O atom percentage composition in AlON gradient film 15 by all increasing in gradient near aluminum or aluminum alloy matrix 11 to the direction away from aluminum or aluminum alloy matrix 11.The time that deposits this AlON gradient film 15 is 30～90min.
Said AlON gradient film 15 can form Al in its forming process
2O
3Reach the AlN phase mutually, the formation of this two phases compound can suppress the growth of each phase crystal grain simultaneously each other, thereby can reduce the size of each phase crystal grain, strengthens the compactness of said AlON gradient film 15, to improve the erosion resistance of said housing 10.
The percentage composition of N atom and O atom is by all increasing in gradient near aluminum or aluminum alloy matrix 11 to the direction away from aluminum or aluminum alloy matrix 11 in the said AlON gradient film 15; Can reduce the unmatched degree of lattice between AlON gradient film 15 and aluminium lamination 13 or the aluminum or aluminum alloy matrix 11, help making the unrelieved stress that produces in the process of sputter AlON gradient film 15 to the 11 direction transmission of aluminum or aluminum alloy matrix; Again because between AlON gradient film 15 and aluminum or aluminum alloy matrix 11, deposited plasticity aluminium lamination 13 preferably; Can improve the interface mismatch between AlON gradient film 15 and the aluminum or aluminum alloy matrix 11; When the unrelieved stress in the AlON gradient film 15 is big; Can realize the release of unrelieved stress by means of the local plastic deformation of this aluminium lamination 13 and aluminum or aluminum alloy matrix 11; Thereby reduce the unrelieved stress in the said AlON gradient film 15, make housing 10 be difficult for stress corrosion takes place, to improve the erosion resistance of said housing 10.Said stress corrosion is meant in remnants or/and under the effect of applied stress and corrosive medium, the metal failure phenomenon that causes.
After accomplishing the deposition of said AlON gradient film 15, inject cerium ion, form ion implantation film 17 in these AlON gradient film 15 surfaces.The process of described injection cerium ion is: have the aluminum or aluminum alloy matrix 11 of said aluminium lamination 13 and AlON gradient film 15 to place the coating chamber of said vacuum plating unit plating; The ion source of this coating equipment carries out ionization with cerium metal steam; And be accelerated into through high-voltage electric field and have several ten thousand even the cerium ion bundle of millions of electron-volts of energy; Inject the surface of AlON gradient film 15; With in AlON gradient film 15 top layers and atom or the molecule generation series of physical on surface, chemical reaction, the surface deposition of this AlON gradient film 15 forms and mainly contains the ion implantation film 17 that Ce metallographic phase, Ce-O reach the Ce-N phase mutually the most finally.Because the oxidation volume ratio coefficient of metal Ce is greater than 1, when the housing that is formed with said ion implantation film 17 10 is exposed in the air, the Ce atom will diffuse to the top layer of this ion implantation film 17, form the fine and close CeO that contains with oxygen reaction
2Protective membrane, thereby further improve the erosion resistance of said housing 10.
The parameter of injecting said cerium ion in the present embodiment is: the vacuum tightness of coating chamber is 1 * 10
-4Pa, ion source voltage are 30～100kV, and ion beam current intensity is 0.1～5mA, and control cerium ion implantation dosage is 1 * 10
16Ions/cm
2To 1 * 10
18Ions/cm
2Between.
The method of manufacture of the housing 10 of preferred embodiments of the present invention forms aluminium lamination 13 and AlON gradient film 15 successively on aluminum or aluminum alloy matrix 11, on this AlON gradient film 15, form ion implantation film 17 again.The composite film that this aluminium lamination 13, AlON gradient film 15 and ion implantation film 17 are formed has improved the erosion resistance of said housing significantly, and this ME simply, non-environmental-pollution almost.
Claims (10)
1. housing; Comprise the aluminum or aluminum alloy matrix; It is characterized in that: this housing also comprises AlON gradient film and the ion implantation film that is formed at successively on this aluminum or aluminum alloy matrix; The percentage composition of N atom and O atom by increasing in gradient near aluminum or aluminum alloy matrix to the direction away from the aluminum or aluminum alloy matrix, mainly contains Ce metallographic phase, Ce-O in the said ion implantation film and reaches the Ce-N phase mutually respectively in the said AlON gradient film, and said AlON gradient film forms with the magnetron sputtering embrane method.
2. housing as claimed in claim 1 is characterized in that: the thickness of said AlON gradient film is 0.3～2.0 μ m.
3. housing as claimed in claim 1 is characterized in that: said housing also comprises through the magnetron sputtering embrane method and is formed at the aluminium lamination between said aluminum or aluminum alloy matrix and the said AlON gradient film.
4. housing as claimed in claim 3 is characterized in that: the thickness of said aluminium lamination is 50～200nm.
5. the method for manufacture of a housing, it comprises the steps:
The aluminum or aluminum alloy matrix is provided;
With nitrogen and oxygen is reactant gases; Adopting the aluminium target is target; Surface magnetic control sputtering in this aluminum or aluminum alloy matrix forms AlON gradient film, and the percentage composition of N atom and O atom is respectively by all increasing in gradient near aluminum or aluminum alloy matrix to the direction away from the aluminum or aluminum alloy matrix in the said AlON gradient film;
On this AlON gradient film, inject cerium ion, form and mainly contain the ion implantation film that Ce metallographic phase, Ce-O reach the Ce-N phase mutually.
6. the method for manufacture of housing as claimed in claim 5; It is characterized in that: the processing parameter of the said AlON gradient of magnetron sputtering film is: be working gas with the argon gas; Its flow is 100～300sccm; The initial flow that nitrogen and oxygen are set is respectively 10～20sccm, on the aluminum or aluminum alloy matrix, apply-150～-bias voltage of 500V; Every deposition 10～15min increases the flow 10～20sccm of nitrogen and oxygen respectively, and depositing time is 30～90min.
7. the method for manufacture of housing as claimed in claim 5; It is characterized in that: the processing parameter that forms said ion implantation film is: the aluminum or aluminum alloy matrix that will be formed with AlON gradient film places the coating chamber of vacuum plating unit, and vacuumizing this coating chamber to vacuum tightness is 1 * 10
-4Pa, ion source voltage are 30～100kV, and ion beam current intensity is 0.1～5mA, and control cerium ion implantation dosage is 1 * 10
16Ions/cm
2To 1 * 10
18Ions/cm
2Between.
8. the method for manufacture of housing as claimed in claim 5, it is characterized in that: the method for manufacture of said housing comprises that also sputter forms before the said AlON gradient film, in the step of the surface deposition aluminium lamination of said aluminum or aluminum alloy matrix.
9. the method for manufacture of housing as claimed in claim 8; It is characterized in that: the processing parameter that deposits said aluminium lamination is: with the aluminium target is target, and it is 2～8kw that its power is set, on the aluminum or aluminum alloy matrix, apply-50～-bias voltage of 300V; With the argon gas is working gas; Its flow is 100～300sccm, and sputter temperature is 50～180 ℃, and depositing time is 5～10min.
10. the method for manufacture of housing as claimed in claim 8 is characterized in that: the method for manufacture of said housing also is included in before the said aluminium lamination of deposition the step of the aluminum or aluminum alloy matrix being carried out plasma clean.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010105041758A CN102443761A (en) | 2010-10-12 | 2010-10-12 | Casing and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010105041758A CN102443761A (en) | 2010-10-12 | 2010-10-12 | Casing and manufacturing method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102443761A true CN102443761A (en) | 2012-05-09 |
Family
ID=46006694
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010105041758A Pending CN102443761A (en) | 2010-10-12 | 2010-10-12 | Casing and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102443761A (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0215159A (en) * | 1988-07-01 | 1990-01-18 | Mitsubishi Metal Corp | Production of cutting made of surface-treated cermet |
| US20030168539A1 (en) * | 2000-07-06 | 2003-09-11 | Ulrich Schoof | Refiner and method for treating the surface of a tool of a refiner of this type |
| EP2017366A1 (en) * | 2007-07-13 | 2009-01-21 | Hauzer Techno Coating BV | A method for the manufacture of a hard material coating on a metal substrate and a coated substrate |
-
2010
- 2010-10-12 CN CN2010105041758A patent/CN102443761A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0215159A (en) * | 1988-07-01 | 1990-01-18 | Mitsubishi Metal Corp | Production of cutting made of surface-treated cermet |
| US20030168539A1 (en) * | 2000-07-06 | 2003-09-11 | Ulrich Schoof | Refiner and method for treating the surface of a tool of a refiner of this type |
| EP2017366A1 (en) * | 2007-07-13 | 2009-01-21 | Hauzer Techno Coating BV | A method for the manufacture of a hard material coating on a metal substrate and a coated substrate |
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Application publication date: 20120509 |