CN102382505B - Ink composition for forming patterns, light guide plate, luminous unit and liquid crystal display assembly provided with luminous unit - Google Patents
Ink composition for forming patterns, light guide plate, luminous unit and liquid crystal display assembly provided with luminous unit Download PDFInfo
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- CN102382505B CN102382505B CN201010278847.8A CN201010278847A CN102382505B CN 102382505 B CN102382505 B CN 102382505B CN 201010278847 A CN201010278847 A CN 201010278847A CN 102382505 B CN102382505 B CN 102382505B
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Abstract
The invention relates to an ink composition for forming patterns, in particular to an ink composition with high yellowing resistance for forming patterns. The ink composition for forming patterns comprises acrylate-series resin (A) having a cyclic structure, an ethylene-containing unsaturated compound (B) and a photoinitiator (C). The ink composition for forming patterns is printed on a light guide plate for serving as a reflecting pattern, so that light rays entering the reflecting pattern can be scattered and reflected onto the emitting surface of the light guide plate.
Description
Technical field
The present invention forms with ink component relevant with pattern, furthermore, the present invention be ink component for a kind of pattern forms, have pattern that this ink component forms light guiding plate, there is the luminescence unit of this light guiding plate and there is the LCD assembly of this luminescence unit.
Background technology
The display unit that is extensively used as the equipment such as PC, TV, portable telephone has LCD assembly, liquid crystal panel itself non-luminous body due to this LCD assembly, therefore the area source that is called as (backlight) backlight module must be set, utilize this liquid crystal panel of irradiate light that this backlight module sends to reach image display.In recent years, for being applied to the slim liquid-crystal display of the notebook computer etc. of lightweight and miniaturization, be used in light guiding plate one end configuration light source more, and the light this light source being sent via total reflection reaches far-end and form side light type (side light) backlight module of area source, and be not used in the Staight downward type backlight module that light source the place ahead arranges reflector.
In above-mentioned side light type backlight module, utilize the printed patterns that is distributed in bottom surface of light guide plate, destroy the total reflection of light, make light in the irregular scattering of inner generation of this light guiding plate and reflection, directing light penetrates by the exiting surface in this light guiding plate front accordingly.TOHKEMY 2008-095103 Patent Case discloses a kind of pattern formation ink, the macromolecule resin that this ink comprises acrylic resin, the bridging agent of hexamethylene diisocyanate and filling material.Yet this ink easily produces the problem of Yellowing when forming pattern.
Summary of the invention
The first object of the present invention, the pattern formation ink component that provides a kind of yellowing resistance good is provided.This pattern forms the acrylic ester resin (A) that comprises tool ring texture with ink component, compound (B) and the light initiator (C) that contains ethene unsaturated group.
The second object of the present invention, be to provide a kind of light guiding plate, it comprises an incidence surface, an exiting surface and a bottom surface, wherein, it is inner that this incidence surface is injected this light guiding plate for incident beam, this exiting surface penetrates for light, and this bottom surface is relative with this exiting surface, and this bottom surface has the reflection graphic patterns that can make front note incident beam generation scattering and reflection; This reflection graphic patterns is to be formed with ink component and formed by above-mentioned pattern.
The 3rd object of the present invention, be to provide a kind of luminescence unit, it comprises a luminous source and a foregoing light guiding plate, wherein, this light guiding plate is combined with this luminous source, by this luminous source throw light, enter this light guiding plate, this bottom surface of light guide plate has makes aforementioned light produce the reflection graphic patterns of scattering and reflection.
The 4th object of the present invention, be to provide a kind of LCD assembly, it comprises a foregoing luminescence unit and a liquid crystal panel, wherein, this liquid crystal panel is arranged at the exiting surface top of the light guiding plate of this luminescence unit, and utilizes the light show image penetrating by this exiting surface.
Below one by one each composition of the present invention is described in detail.Graphic for ask clear for the purpose of, may have part size and occur exaggerating situation about showing, graphic shown size or ratio, can not be as explaining or limit foundation of the present invention.
In the present invention, with (methyl) vinylformic acid, represent vinylformic acid and/or methacrylic acid, similarly, with (methyl) acrylate, represent acrylate and/or methacrylic ester; With (methyl) acryl, represent acryl and/or methacryloyl; With (methyl) acryloyl-oxy basis representation acryloxy and/or methacryloxy.
(pattern formation ink component)
The acrylic ester resin (A) of tool ring texture
The acrylic ester monomer (a-1) that the acrylic ester resin (A) of tool ring texture of the present invention comprises tool ring texture and other copolymerizable ethylene unsaturated monomers (a-2).
The concrete example of the acrylic ester monomer (a-1) of above-mentioned tool ring texture is as 3-(methyl) acryloyl-oxy methyl propylene oxide (3-[(meth) acryloyloxymethyl] oxetane), 3-(methyl) acryloyl-oxy methyl-3-ethyl propylene oxide, 3-(methyl) acryloyl-oxy methyl-2-methyl propylene oxide, 3-(methyl) acryloyl-oxy Methyl-2-trifluoromethyl propylene oxide, 3-(methyl) acryloyl-oxy methyl-2-pentafluoroethyl group propylene oxide, 3-(methyl) acryloyl-oxy methyl-2-benzyl ring Ethylene Oxide, 3-(methyl) acryloyl-oxy methyl-2,2-difluoro propylene oxide, 3-(methyl) acryloyl-oxy methyl-2,2,4-trifluoro-epoxy propane, 3-(methyl) acryloyl-oxy methyl-2,2,4,4-ptfe ring Ethylene Oxide, 3-(methyl) acrylyl oxy-ethyl propylene oxide, 3-(methyl) acrylyl oxy-ethyl-3-ethyl propylene oxide, 2-ethyl-3-(methyl) acrylyl oxy-ethyl propylene oxide, 3-(methyl) acrylyl oxy-ethyl-2-trifluoromethyl propylene oxide, 3-(methyl) acrylyl oxy-ethyl-2-pentafluoroethyl group propylene oxide, 3-(methyl) acrylyl oxy-ethyl-2-benzyl ring Ethylene Oxide, the fluoro-3-of 2,2-bis-(methyl) acrylyl oxy-ethyl propylene oxide, 3-(methyl) acrylyl oxy-ethyl-2,2,4-trifluoro-epoxy propane, 3-(methyl) acrylyl oxy-ethyl-2,2,4,4-ptfe ring Ethylene Oxide, 2-(methyl) acryloyl-oxy methyl propylene oxide, 2-methyl-2-(methyl) acryloyl-oxy methyl propylene oxide, 3-methyl-2-(methyl) acryloyl-oxy methyl propylene oxide, 4-methyl-2-(methyl) acryloyl-oxy methyl propylene oxide, 2-(methyl) acryloyl-oxy Methyl-2-trifluoromethyl propylene oxide, 2-(methyl) acryloyl-oxy methyl-3-trifluoromethyl propylene oxide, 2-(methyl) acryloyl-oxy methyl-4-trifluoromethyl propylene oxide, 2-(methyl) acryloyl-oxy methyl-2-pentafluoroethyl group propylene oxide, 2-(methyl) acryloyl-oxy methyl-3-pentafluoroethyl group propylene oxide, 2-(methyl) acryloyl-oxy methyl-4-pentafluoroethyl group propylene oxide, 2-(methyl) acryloyl-oxy methyl-2-benzyl ring Ethylene Oxide, 2-(methyl) acryloyl-oxy methyl-3-benzyl ring Ethylene Oxide, 2-(methyl) acryloyl-oxy methyl 4-phenyl propylene oxide, the fluoro-2-of 2,3-bis-(methyl) acryloyl-oxy methyl propylene oxide, the fluoro-2-of 2,4-bis-(methyl) acryloyl-oxy methyl propylene oxide, the fluoro-2-of 3,3-bis-(methyl) acryloyl-oxy methyl propylene oxide, the fluoro-2-of 2,4-bis-(methyl) acryloyl-oxy methyl propylene oxide, the fluoro-2-of 3,4-bis-(methyl) acryloyl-oxy methyl propylene oxide, the fluoro-2-of 4,4-bis-(methyl) acryloyl-oxy methyl propylene oxide, 2-(methyl) acryloyl-oxy methyl-3,3,4-trifluoro-epoxy propane, 2-(methyl) acryloyl-oxy methyl-3,4,4-trifluoro-epoxy propane, 2-(methyl) acryloyl-oxy methyl-3,3,4,4-ptfe ring Ethylene Oxide, 2-(methyl) acrylyl oxy-ethyl propylene oxide, 2-(methyl) acrylyl oxy-ethyl-2-methyl propylene oxide, 2-(methyl) acrylyl oxy-ethyl-4-methyl propylene oxide, 2-(methyl) acrylyl oxy-ethyl-2-trifluoromethyl propylene oxide, 2-(methyl) acrylyl oxy-ethyl-3-trifluoromethyl propylene oxide, 2-(methyl) acrylyl oxy-ethyl-4-trifluoromethyl propylene oxide, 2-(methyl) acrylyl oxy-ethyl-2-pentafluoroethyl group propylene oxide, 2-(methyl) acrylyl oxy-ethyl-3-pentafluoroethyl group propylene oxide, 2-(methyl) acrylyl oxy-ethyl-4-pentafluoroethyl group propylene oxide, 2-(methyl) acrylyl oxy-ethyl-2-benzyl ring Ethylene Oxide, 2-(methyl) acrylyl oxy-ethyl-3-benzyl ring Ethylene Oxide, 2-(methyl) acrylyl oxy-ethyl-4-benzyl ring Ethylene Oxide, the fluoro-2-of 2,3-bis-(methyl) acrylyl oxy-ethyl propylene oxide, the fluoro-2-of 2,4-bis-(methyl) acrylyl oxy-ethyl propylene oxide, the fluoro-2-of 3,3-bis-(methyl) acrylyl oxy-ethyl propylene oxide, the fluoro-2-of 3,4-bis-(methyl) acrylyl oxy-ethyl propylene oxide, the fluoro-2-of 4,4-bis-(methyl) acrylyl oxy-ethyl propylene oxide, 2-(methyl) acrylyl oxy-ethyl-3,3,4-trifluoro-epoxy propane, 2-(methyl) acrylyl oxy-ethyl-3,4,4-trifluoro-epoxy propane, 2-(methyl) acrylyl oxy-ethyl-3,3,4,4-ptfe ring Ethylene Oxide, four membered ring's class of (methyl) vinylformic acid ring butyl ester etc., (methyl) vinylformic acid tetrahydrofuran ester, (methyl) vinylformic acid tetrahydrofuran ester through caprolactone modification, (methyl) vinylformic acid ring pentyl ester, (methyl) vinylformic acid ring penta-2, 4-diene ester, (2-methyl-2-isobutyl--1, 3-dioxy ring penta-4-yl) methyl (methyl) acrylate ((2-methyl-2-isobutyl-1, 3-dioxolan-4-yl) methyl (meth) acrylate), (2-methyl-2-ethyl-1, 3-dioxy ring penta-4-yl) methyl (methyl) acrylate ((2-ethyl-2-methyl-1, 3-dioxolan-4-yl) methyl (meth) acrylate), (1, 4-dioxy volution [4, 5] last of the ten Heavenly stems-2-yl) methyl (methyl) acrylate ((1, 4-dioxaspiro[4, 5] dec-2-yl) methyl (meth) acrylate), (2, 2-dimethyl-1, 3-dioxy ring penta-4-yl) methyl (methyl) acrylate ((2, 2-dimethyl-1, 3-dioxolan-4-yl) methyl (meth) acrylate) etc. five-membered ring class, (methyl) vinylformic acid-3-vinyl cyclohexyl, (methyl) vinylformic acid-3, 3, 5-3-methyl cyclohexanol ester, (methyl) vinylformic acid-1-methyl cyclohexyl, (methyl) vinylformic acid-4-tributyl cyclohexyl, (methyl) vinylformic acid-3-vinyl-2-butyl cyclohexyl, (methyl) cyclohexyl acrylate, (methyl) acryloyl morpholine ((meth) acryloyl morpholine), single (methyl) vinylformic acid-1, 4-dihydroxymethyl cyclohexyl (1, 4-cyclohexanedimethanol mono (meth) acrylate), (methyl) vinylformic acid tetrahydropyrans ester, the six membered ring class of (methyl) vinylformic acid-2-methyl tetrahydropyrans ester etc., seven Yuans lopps of (methyl) vinylformic acid ring heptyl ester etc., eight Yuans lopps of (methyl) vinylformic acid ring monooctyl ester etc.Wherein, be preferably tool four membered ring or ring-type ether acrylic ester monomer more than four membered ring, be more preferred from tool five-membered ring or ring-type ether acrylic ester monomer more than five-membered ring.
The acrylic ester monomer (a-1) of above-mentioned tool ring texture, can independent a kind of use or the use of mixing plural number kind.
The concrete example of above-mentioned other copolymerizable ethylene unsaturated monomers (a-2) as: (methyl) vinylformic acid, butenoic acid, α-chloroacrylic acid, ethylacrylic acid, styracin, toxilic acid, maleic anhydride, fumaric acid, methylene-succinic acid, itaconic anhydride, citraconic acid, citraconic anhydride etc. containing carboxylic acid group's vinyl monomer; The aromatic ethenyl compound of vinylbenzene, alpha-methyl styrene, Vinyl toluene, vinylchlorid, methoxy styrene etc.; The unsaturated carboxylate type of (methyl) methyl acrylate, (methyl) ethyl propenoate, (methyl) propyl acrylate, (methyl) butyl acrylate, (methyl) 2-Hydroxy ethyl acrylate, dodecylacrylate, vinylformic acid tetradecyl ester, aliphatic acrylate, stearyl acrylate acyl ester, vinylformic acid stearyl, vinylformic acid eicosyl ester, vinylformic acid docosyl ester etc.; The unsaturated carboxylic acid ammonia alkane ester class of (methyl) vinylformic acid ammonia ethyl ester, (methyl) vinylformic acid ammonia propyl ester etc.; The vinyl carboxylates class of vinyl acetate, propionate, vinyl butyrate, M-nitro benzoic acid vinyl acetate etc.; The unsaturated ether of methoxy ethylene, ethyl vinyl ether, allyl group glycidyl ethers, methylallyl glycidyl ethers etc.; The vinyl cyanide based compound of vinyl cyanide, methacrylonitrile, α-chloro-acrylonitrile, the sub-ethene of cyaniding etc.; Unsaturated amides or the unsaturated acid imide of acrylamide, Methacrylamide, α-propenyl chloride acid amides, N-hydroxyethyl acrylamide, N-hydroxyethyl methacrylamide, maleinamide etc.; The aliphatics conjugated diene of 1,3-butadiene, isoprene, chloroprene etc.; Polystyrene, polymethyl acrylate, polymethylmethacrylate, butyl polyacrylate, poly-n-butyl methacrylate, polysiloxane etc. have huge monomer (macromonomer) class of single acryl or monomethyl acryl etc. at polymer molecule chain end.Wherein, with (methyl) vinylformic acid, vinylbenzene, (methyl) methyl acrylate, (methyl) 2-Hydroxy ethyl acrylate and the huge monomer of polymethylmethacrylate etc. for better.
Above-mentioned other copolymerizable ethylene unsaturated monomers (a-2), can independent a kind of use or the use of mixing plural number kind.
The acrylic ester resin (A) of tool ring texture of the present invention can various known mixing machines or dispersion machine the acrylic ester monomer (a-1) of tool ring texture and other copolymerizable ethylene unsaturated monomers (a-2) are evenly mixed, and be basis based on this acrylic ester monomer (a-1) and this ethylene unsaturated monomer (a-2), the polymerization initiator that adds 0.01%～3 % by weight polymerization and obtaining under normal temperature, and can be with an organic solvent optionally.
The concrete example of above-mentioned polymerization initiator as: the superoxide of benzoyl peroxide etc., Diisopropyl azodicarboxylate [2,2 '-azobis (isobutyronitrile); Be called for short AIBN], 2,2'-Azobis(2,4-dimethylvaleronitrile) [2,2 '-azobis (methylbutyronitrile); Be called for short AMBN] etc. azo-compound etc.
The concrete example of above-mentioned organic solvent is as ethylene glycol list propyl ether, diethylene glycol dimethyl ether, tetrahydrofuran (THF), ethylene glycol monomethyl ether, ethylene glycol monomethyl ether, acetic acid methoxyl group ethyl ester (methyl cellosolve acetate), diethylene glycol monomethyl ether, TC, Diethylene Glycol single-butyl ether, propylene glycol monomethyl ether acetate, propylene glycol list ethyl ether acetic ester, propylene glycol list propyl ether acetic ester, 3-ethoxyl ethyl propionate (ethyl 3-ethoxy propionate), methylethylketone and acetone etc., wherein with diethylene glycol dimethyl ether, propylene glycol monomethyl ether acetate, 3-ethoxyl ethyl propionate is for better.Above-mentioned organic solvent can independent a kind of use or the use of mixing plural number kind.
When acrylic ester monomer (a-1) ethylene unsaturated monomer (a-2) copolymerizable with other of tool ring texture mixes, based on monomer (a-1) and monomer (a-2), add up to 100 weight parts, (a-1) usage quantity is generally 10～45 weight parts, be preferably 15～40 weight parts, be more preferred from 20～35 weight parts.
When the usage quantity of the acrylic ester monomer (a-1) of tool ring texture is between 10～45 weight parts, polymerization and the homogeneity of acrylic ester resin (A) of tool ring texture good, and ink component is difficult for having the problem of Yellowing when forming pattern.
Compound (B) containing ethene unsaturated group
Compound (B) containing ethene unsaturated group of the present invention can be the compound with 1 ethene unsaturated group, or the compound of 2 above (containing 2) ethene unsaturated group.
The concrete example of the above-mentioned compound with 1 ethene unsaturated group is as acrylamide, (methyl) acryloyl morpholine, (methyl) vinylformic acid-7-amino-3,7-dimethyl monooctyl ester, isobutoxy methyl (methyl) acrylamide, (methyl) vinylformic acid isobornyl 2-ethoxyethyl acetate, (methyl) isobornyl acrylate, (methyl) ethyl acrylate, ethyl Diethylene Glycol (methyl) acrylate, trioctylphosphine (methyl) acrylamide, two acetone (methyl) acrylamide, (methyl) vinylformic acid dimethylamino ester, (methyl) dodecylacrylate, (methyl) vinylformic acid two cyclopentenes 2-ethoxyethyl acetates, (methyl) vinylformic acid two cyclopentenes esters, N, N-dimethyl (methyl) acrylamide, (methyl) vinylformic acid tetrachloro phenyl ester, (methyl) vinylformic acid-2-tetrachloro phenoxy ethyl, (methyl) vinylformic acid tetrahydrofuran ester, (methyl) tetrabromophenyl acrylate, (methyl) vinylformic acid-2-tetrabromo phenoxy ethyl, (methyl) vinylformic acid-2-Trichlorophenoxy ethyl ester, (methyl) tribromophenyl acrylate, (methyl) vinylformic acid-2-tribromophenoxy ethyl ester, (methyl) 2-Hydroxy ethyl acrylate, (methyl) 2-hydroxypropyl acrylate, caprolactam, NVP, (methyl) vinylformic acid phenoxy ethyl, (methyl) Pentachlorophenyl Acrylate, (methyl) vinylformic acid pentabromo-phenyl ester, (methyl) vinylformic acid norbornene ester, poly-single (methyl) vinylformic acid glycol ester, poly-single (methyl) vinylformic acid propylene glycol ester etc.
The above-mentioned concrete example with 2 above (containing 2) ethene unsaturated group compounds is as ethylene glycol bisthioglycolate (methyl) acrylate, two (methyl) vinylformic acid, two cyclopentenes esters, triethylene glycol two (methyl) acrylate, TEG two (methyl) acrylate, three (2-hydroxyethyl) isocyanic acid two (methyl) acrylate, three (2-hydroxyethyl) isocyanic acid three (methyl) acrylate, three (2-hydroxyethyl) isocyanic acid three (methyl) acrylate of caprolactone modification, three (methyl) vinylformic acid trishydroxymethyl propyl ester, three (methyl) vinylformic acid trishydroxymethyl propyl ester of oxyethane (being called for short EO) modification, three (methyl) vinylformic acid trishydroxymethyl propyl ester of epoxy pronane modification (being called for short PO), triethylene glycol two (methyl) acrylate, neopentyl glycol two (methyl) acrylate, BDO two (methyl) acrylate, 1,6-hexylene glycol two (methyl) acrylate, tetramethylolmethane three (methyl) acrylate, tetramethylolmethane four (methyl) acrylate, polyester two (methyl) acrylate, polyoxyethylene glycol two (methyl) acrylate, Dipentaerythritol six (methyl) acrylate, Dipentaerythritol five (methyl) acrylate, Dipentaerythritol four (methyl) acrylate, Dipentaerythritol six (methyl) acrylate of caprolactone modification, Dipentaerythritol five (methyl) acrylate of caprolactone modification, four (methyl) vinylformic acid, two trishydroxymethyl propyl ester, dihydroxyphenyl propane two (methyl) acrylate of EO modification, dihydroxyphenyl propane two (methyl) acrylate of PO modification, Hydrogenated Bisphenol A two (methyl) acrylate of EO modification, Hydrogenated Bisphenol A two (methyl) acrylate of PO modification, glycerine three (methyl) acrylate of PO modification, Bisphenol F two (methyl) acrylate of EO modification, phenolic aldehyde polyglycidyl ether (methyl) acrylate etc.Wherein, with three vinylformic acid trishydroxymethyl propyl ester of three vinylformic acid trishydroxymethyl propyl ester, EO modification, the dipentaerythritol acrylate of three vinylformic acid trishydroxymethyl propyl ester of PO modification, pentaerythritol triacrylate, tetramethylol methane tetraacrylate, dipentaerythritol acrylate, Dipentaerythritol five acrylate, Dipentaerythritol tetraacrylate, caprolactone modification, tetrapropylene acid two trishydroxymethyl propyl ester etc. for better.
The above-mentioned compound (B) containing ethene unsaturated group can independent a kind of use or the use of mixing plural number kind.
Acrylic ester resin (A) 100 weight parts based on tool ring texture, the usage quantity containing the compound (B) of ethene unsaturated group, is generally 5～200 weight parts, is preferably 10～150 weight parts, is more preferred from 20～120 weight parts.
Light initiator (C)
Smooth initiator of the present invention (C) is to be selected from the group being comprised of oxime (oxime) based compound (C-1), methyl phenyl ketone based compound (C-2) and other light initiators (C-3).
The concrete example of above-mentioned oxime compound (C-1) is as ethane ketone, 1-[9-ethyl-6-(2-methyl benzoyl) 9 hydrogen-carbazole-3-substituting group]-, 1-(oxygen-acetyl oxime) (Ethanone, 1-[9-ethyl-6-(2-methylbezoyl) 9H-carbozole-3-yl]-1-(O-acetyl oxime)) (as the OXE02 of Ciba Specialty Chemicals system), ethane ketone, 1-[9-ethyl-6-(the chloro-4-benzene of 2-sulphophenyl formyl radical) 9 hydrogen-carbazole-3-substituting group]-, 1-(oxygen-acetyl oxime) (Ethanone, 1-[9-ethyl-6-(2-chloro-4-benzylsulfonyl benzoyl) 9H-carbozole-3-yl]-1-(O-acetyl oxime)) (rising sun electrification company system), 1-(4-phenyl-thio-phenyl)-butane-1, 2-diketone 2-oxime-oxygen-benzoate, 1-(4-phenyl-thio-phenyl)-octane-1, 2-diketone 2-oxime-oxygen-benzoic ether (as the OXE01 of Ciba Specialty Chemicals system), 1-(4-phenyl-thio-phenyl)-octane-1-ketoxime-oxygen-acetic ester, 1-(4-phenyl-thio-phenyl)-butane-1-ketoxime-oxygen-acetic ester etc.
The concrete example of above-mentioned methyl phenyl ketone based compound (C-2) is as p-dimethylamine methyl phenyl ketone, α, α '-dimethoxy nitrogen benzide ethyl ketone, 2,2 '-dimethyl-2-methyl phenyl ketone, p-methoxyacetophenone, 2-methyl isophthalic acid-(4-methyl thio-phenyl)-2-agate quinoline generation-1-acetone (2-methyl-1-(4-methylthiophenyl)-2-morpholino-1-propanone), 2-benzyl-2-N, N dimethylamine-1-(4-agate quinoline is for phenyl)-1-butanone (2-benzyl-2-N, N-dimethylamino-1-(4-morpholinophenyl)-1-butanone) etc.
The concrete example of above-mentioned other light initiators (C-3) as: 2, 2 '-bis-(o-chloro-phenyl-s)-4, 4 ', 5, 5 '-tetraphenyl diimidazole, 2, 2 '-bis-(ortho-fluorophenyl bases)-4, 4 ', 5, 5 '-tetraphenyl diimidazole, 2, 2 '-bis-(o-aminomethyl phenyls)-4, 4 ', 5, 5 '-tetraphenyl diimidazole, 2, 2 '-bis-(o-p-methoxy-phenyls)-4, 4 ', 5, 5 '-tetraphenyl diimidazole, 2, 2 '-bis-(p-p-methoxy-phenyls)-4, 4 ', 5, 5 '-tetraphenyl diimidazole, 2, 2 '-bis-(2, 2 ', 4, 4 '-tetramethoxy phenyl)-4, 4 ', 5, 5 '-tetraphenyl diimidazole, 2, 2 '-bis-(2, 2 '-dichlorophenyl)-4, 4 ', 5, diimidazole (biimidazole) based compound of 5 '-tetraphenyl diimidazole etc., thioxanthone (thioxantone), 2, the benzophenone based compound of 4-diethyl thioxanthone, thioxanthone-4-sulfone, benzophenone, 4,4 '-bis-(dimethylamine) benzophenone, 4,4 '-bis-(diethylamine) benzophenone etc., α-diketone (α-diketone) compounds of benzil (benzil), ethanoyl etc., keto-alcohol (acyloin) compounds of bitter almond oil camphor (benzoin) etc., keto-alcohol ether (acyloin ether) class of bitter almond oil camphor methyl ether, bitter almond oil camphor ether, bitter almond oil camphor isopropyl ether etc., 2,4,6-trimethylammonium benzoyl diphenyl phosphine oxide, two-(2,6-dimethoxy benzoyl)-2,4, acyl phosphine oxide (acylphosphine oxide) compounds of 4-trimethyl benzyl phosphine oxide etc., the quinones of anthraquinone, 1,4-naphthoquinone etc., the halide compound of chloroacetophenone (phenacyl chloride), trisbromomethyl benzene sulfone, three (trichloromethyl)-s-triazine (tris (trichloro methyl)-s-triazine) etc., the superoxide of two-tributyl superoxide etc. etc.
Above-mentioned smooth initiator (C) separately a kind of or mixing plural number is planted use.Compound (B) 100 weight parts based on containing ethene unsaturated group, the usage quantity of light initiator (C) is generally 2～120 weight parts, is preferably 5～70 weight parts, is more preferred from 10～60 weight parts.
Additive (D)
Pattern formation ink component of the present invention, optionally, can further add additive (D), as: silane coupling agent, filling material, defoamer etc.
The concrete example of silane coupling agent of the present invention is as vinyl trichloro silane, vinyltriethoxysilane, vinyl three ('beta '-methoxy-oxyethyl group) silane, β-(3, 4-epoxycyclohexyl) ethyl trimethoxy silane, γ-glycidoxypropyltrimethoxy silane, γ-epoxypropoxy methyldiethoxysilane, γ-(methyl) acryloyl-oxy propyl trimethoxy silicane, N-(β-aminoethyl)-γ-aminopropyltrimethoxysilane, N-(β-aminoethyl)-γ-aminopropyl trimethylammonium dimethoxy silane, N-phenyl-γ-aminopropyltrimethoxysilane, γ-r-chloropropyl trimethoxyl silane, γ-thiol group propyl trimethoxy silicane, γ-aminopropyltrimethoxysilane, two-1, 2-(trimethoxy is silica-based) ethane and SH6062, SZ6030 (Toray Dow Corning Silicone system), KBE-903, KBE-603, the city dealer product such as KBE-403 (SHIN-ETSU HANTOTAI's chemistry system).
Acrylic ester resin (A) 100 weight parts based on tool ring texture, the usage quantity of silane coupling agent is generally 0～30 weight part, is preferably 3～25 weight parts, is more preferred from 5～20 weight parts.
Filling material of the present invention is to be organic filling material and/or inorganic fill material.The concrete example of organic filling material is: epoxy resin, melamine resin, urea resin, acrylic resin, resol, polyimide resin, polyamide resin, vibrin, Teflon (teflon) resin etc.The concrete example of inorganic fill material is: aluminum oxide, oxygen aluminum hydride, silicon-dioxide, magnesium oxide, magnesium hydroxide, ferric oxide, titanium dioxide, zinc oxide, stannic oxide, silicon nitride, aluminium nitride, talcum, mica, asbestos powder, silica powder, kaolin, wilkinite (bentonite), diatomite, zeolite, gypsum, granulated glass sphere, glass fibre, barium sulfate, magnesium sulfate, calcium carbonate, magnesiumcarbonate, Calucium Silicate powder, pure aluminium silicate, zirconium silicate, potassium titanate, soccerballene (fullerene) etc.Above-mentioned filling material separately a kind of or mixing plural number is planted use.
Filling material used in the present invention, its median size is not particularly limited, and is generally below 10 μ m, is preferably below 5 μ m, is more preferred from below 3 μ m.Acrylic ester resin (A) 100 weight parts based on tool ring texture, the addition of filling material is generally 2～70 weight parts, is preferably 5～60 weight parts, is more preferred from 10～50 weight parts.
Defoamer of the present invention, its concrete example is as the city such as Surfynol MD-20, Surfynol MD-30, EnviroGem AD01, EnviroGem AE01, EnviroGem AE02, Surfynol DF 110D, Surfynol 104E, Surfynol 420, Surfynol DF 37, Surfynol DF 58, Surfynol DF 66, Surfynol DF 70, Surfynol DF 210 (Air products system) dealer product.Acrylic ester resin (A) 100 weight parts based on tool ring texture, the usage quantity of defoamer is generally 1～10 weight part, is preferably 2～9 weight parts, is more preferred from 3～8 weight parts.
The present invention can various known mixing machines or dispersion machine by above-mentioned composition (A) to (C) and the silane coupling agent optionally adding, fill the additives (D) such as material, defoamer and evenly mix, and then obtain pattern formation ink component of the present invention.
(light guiding plate)
Above-mentioned pattern is formed and is printed on light guiding plate with mode of printings such as ink-jet (inkjet), wire mark (screen printing) or transfer printings (imprint) with ink component, form after drying reflection graphic patterns.
Fig. 1 is the side decomposing schematic representation of illustration luminescence unit of the present invention; As shown in Figure 1, light guiding plate of the present invention (41) comprises an incidence surface (412), an exiting surface (414) and a bottom surface with respect to this exiting surface (414) (416), wherein, this incidence surface (412) is formed at a side of this light guiding plate (41), and this bottom surface (416) form oblique angle adjacency with this incidence surface (412), therefore, this light guiding plate (41) forms thickness-tapered by one end of this incidence surface (412) to the relative the other end, according to making being penetrated by this exiting surface (414) of light homogeneous.
This light guiding plate (41) forms reflection graphic patterns as above (41a) in this bottom surface (416), this reflection graphic patterns (41a) does not have the restriction in arrangement or size, this reflection graphic patterns (41a) can make the light of injecting this light guiding plate (41) by this incidence surface (412) produce scattering and reflection, that is equably light is diffused to various directions.This reflection graphic patterns (41a), when printing, can select to form the various shapes such as circle, quadrangle or sexangle, and the scattering of light degree of this reflection graphic patterns (41a) and brightness changes along with the difference of the material of using in ink.
(luminescence unit)
As shown in Figure 1, luminescence unit of the present invention (4) comprises a luminous source (40) and a light guiding plate as above (41), wherein, this light guiding plate (41) is combined with this luminous source (40) side direction, and this incidence surface (412) is relative with this luminous source (40), according to making this luminous source (40) throw light enter this light guiding plate (41) by this incidence surface (412), and the ray guidance that this light guiding plate of mat (41) provides this luminous source (40) projects to liquid crystal panel (1); This luminous source (40) comprises a light source (40a) and a light tube reflection cover (40b), wherein, this light source (40a) can be the light-emittingdiode of pointolite form or the fluorescent tube of line source form, this light tube reflection cover (40b) forms opening in the single direction of this light guiding plate of neighborwise (41), all the other parts of this light tube reflection cover (40b) encase this light source (40a), according to the light that this light source (40a) is sent directly or this light tube reflection cover of mat (40b) reflection, the opening by this light tube reflection cover (40b) projects to this light guiding plate (41).
This luminescence unit (4) further comprises an optical group (42), this optical group (42) comprises a reflector plate (42a), the optical modules such as one diffusion sheet (42b) and a prismatic lens (42c), wherein, this reflector plate (42a) is adjacent with the bottom surface (416) of this light guiding plate (41), by this light reflection that penetrates this light guiding plate (41) by this bottom surface (416) is returned this light guiding plate (41) by this bottom surface (416), this diffusion sheet (42b) is adjacent with the exiting surface (414) of this light guiding plate (41), according to the light that penetrates this light guiding plate (41) by this exiting surface (414) is evenly spread, this prismatic lens (42c) is adjacent with this diffusion sheet (42b), use aggegation light, improve light to the front face brightness of this liquid crystal panel (1) projection.
(LCD assembly)
Fig. 2 is the exploded perspective view of illustration LCD assembly of the present invention.As shown in Figure 2, LCD assembly of the present invention comprises a liquid crystal panel (1) and a luminescence unit as above (4), wherein, this liquid crystal panel (1) can show external image, and it comprises the liquid crystal layer (not shown) that a membrane transistor (TFT) substrate (10) (claiming afterwards TFT substrate), a colored filter (CF) substrate (11) and contain liquid crystal.
Comprise and drive the printed circuit board (PCB) (12) of chip to be connected to this TFT substrate (10) through winding carrying packaged piece (13) (Tape Carrier Package), the needed various signals of show image can and drive chip (not shown) be passed to this TFT substrate (10) by printed circuit board (PCB) (12).
This LCD assembly further comprises a top chassis (2) and a bottom chassis (3), wherein, one accommodation space of opening wide is formed at this bottom chassis (3) top, this bottom chassis (3) supports this liquid crystal panel (1) in this accommodation space part around, and connect this top chassis (2), this top chassis (2) covers and fixes surrounding's part of this liquid crystal panel (1), to prevent that this printed circuit board (PCB) (12) is exposed to the external world, this top chassis (2) intermediate formation opening, to expose the image display region of this liquid crystal panel (1) to the open air by this opening, the accommodation space of this bottom chassis (3) is installed with a foregoing luminescence unit (4), by this luminescence unit (4), provide light, and make light pass through this liquid crystal panel (1), in order to do supplying to show external image.
Fig. 1 and Fig. 2 are as illustrative purposes, and the present invention is not defined in this.Therefore, luminescence unit of the present invention also can be applied to the display equipment of other types; LCD assembly of the present invention also can be used the optical module of other types, such as: polaroid etc.
Accompanying drawing explanation
Fig. 1 is the side decomposing schematic representation of illustration luminescence unit of the present invention.
Fig. 2 is the exploded perspective view of illustration LCD assembly of the present invention.
Primary clustering nomenclature
(1) liquid crystal panel (2) top chassis
(3) bottom chassis
(4) luminescence unit (40) luminous source
(40a) light source (40b) light tube reflection cover
(41) light guiding plate (412) incidence surface
(414) exiting surface (416) bottom surface
(41a) reflection graphic patterns (42) optical group
(42a) reflector plate (42b) diffusion sheet
(42c) prismatic lens
(10) membrane transistor substrate (11) colored filter substrate
(12) printed circuit board (PCB) (13) winding carrying packaged piece
Embodiment
The present invention will be described further with regard to following examples, but will be appreciated that, these embodiment are the use for illustrating only, and should not be interpreted as restriction of the invention process.
[preparing pattern formation ink component]
< synthesis example 1>
By the 2,2'-Azobis(2,4-dimethylvaleronitrile) of the n-butyl acrylate of the methyl methacrylate of the vinylformic acid tetrahydrofuran ester of 30 weight parts, 25 weight parts, 44 weight parts and 1 weight part, (model is ARB-310 to take wandering star type whipping appts; THINKY system) stir, and carry out heat polymerization at 80 ℃, react after 24 hours, can obtain the acrylic resin (A-1) of tool ring texture.
< synthesis example 2～5>
Be same as the working method of synthesis example 1, different places are: change kind and the usage quantity thereof of monomer, obtain respectively tool ring texture acrylic resin (A-2)～(A-5), its formula is as shown in table 1.
< is synthesis example 1> relatively
By the 2,2'-Azobis(2,4-dimethylvaleronitrile) of the 2-hydroxyethyl methacrylate of the n-butyl acrylate of the methyl methacrylate of 25 weight parts, 44 weight parts, 30 weight parts and 1 weight part, with wandering star type whipping appts, stir, and at 80 ℃, carry out heat polymerization, react after 24 hours, can obtain acrylic resin (PA-1).
< is synthesis example 2> relatively
By the 2,2'-Azobis(2,4-dimethylvaleronitrile) of the methacrylic acid epoxypropyl ester of the n-butyl acrylate of the methyl methacrylate of 25 weight parts, 44 weight parts, 30 weight parts and 1 weight part, with wandering star type whipping appts, stir, and at 80 ℃, carry out heat polymerization, react after 24 hours, can obtain acrylic resin (PA-2).
< is synthesis example 3> relatively
By the 2,2'-Azobis(2,4-dimethylvaleronitrile) of the n-butyl acrylate of the methyl methacrylate of 25 weight parts, 44 weight parts and 1 weight part, with wandering star type whipping appts, stir, and at 80 ℃, carry out heat polymerization, and react after 24 hours, can obtain acrylic resin (PA-3).
< embodiment 1>
By 100 weight parts by 1 of the acrylic resin (A-1) of the tool ring texture of synthesis example 1 gained, 80 weight parts, light initiator (C-1) (the 1-hydroxy cyclohexyl phenylketone of 6-hexanediyl ester (B-1) and 8 weight parts, IRGACURE 184, Ciba Specialty Chemicals system), after stirring with wandering star type whipping appts, then (model is FC-90mm to take three roller machines; Numerous Chang system) mix 3 hours, can make pattern formation ink component.Below state assessment item evaluation, acquired results is as shown in table 2.
< embodiment 2 is to 5>
Be same as the working method of embodiment 1, different places are: the kind of feed change and usage quantity thereof, its formula and evaluation result are as shown in table 2.
< comparative example 1>
With the working method of embodiment 1, difference is to use resin (PA-1) to replace resin (A-1).This pattern forms remembers assessment item evaluation below with ink component, and acquired results is as shown in table 2.
< comparative example 2>
With the working method of embodiment 1, difference is to use resin (PA-2) to replace resin (A-1).This pattern forms remembers assessment item evaluation below with ink component, and acquired results is as shown in table 2.
< comparative example 3>
With the working method of embodiment 1, difference is to use resin (PA-3) to replace resin (A-1), and in containing in the compound (B) of ethene unsaturated group, additionally increases the vinylformic acid tetrahydrofuran ester of 20 weight parts.This pattern forms remembers assessment item evaluation below with ink component, and acquired results is as shown in table 2.
[assessment item]
< yellowing resistance >
Pattern is formed and with ink component, take wet film spreader (model is ZFR 2040; ZEHNTNER system), on the glass substrate of one 100mm * 100mm, coating formation thickness is filming of 30 μ m, and through UV-light, (exposure machine model is AG500-4N; M & R Nano Technology system) 850mJ/cm
2after irradiation, the hot and humid stove that is placed in 50 ℃ and relative humidity 80% carries out reliability test for 500 hours, and (model is MC-3100 then to use chroma plane; Large tomb electronics system) measure the value of chromatism (Δ E) of its reliability test front and back, and evaluate with following benchmark.
◎：ΔE＜0.5
○：0.5≤ΔE≤1
△：1＜ΔE≤3
×：ΔE＞3
Only as described above, it is only preferred embodiment of the present invention, when not limiting scope of the invention process with this, the simple equivalence of generally doing according to the present patent application the scope of the claims and description of the invention content changes and modifies, and all should still remain within the scope of the patent.
Table 1 is that the formula of synthesis example of the acrylic ester resin (A) of tool ring texture of the present invention forms.
Table 2 is that pattern of the present invention forms by the embodiment of ink component and the formula of comparative example composition and evaluation result.
Table 1
THFA vinylformic acid tetrahydrofuran ester tetrahydrofurfuryl acrylate
MM-OXE 3-methacryloxy methyl propylene oxide 3-methacryloyloxy methyl oxetane
CHMA cyclohexyl methacrylate cyclohexyl methacrylate
MMA methyl methacrylate methyl methacrylate
N-BA n-butyl acrylate n-butyl acrylate
HEMA methacrylic acid-2-hydroxy methacrylate 2-hydroxyethyl methacrylate
AMBN 2,2'-Azobis(2,4-dimethylvaleronitrile) [2,2 '-azobis (metbylbutyronitrile)]
Table 2
B-1 1,6 hexanediol diacrylate 1,6-hexanediol diacrylate
B-2 tetramethylol methane tetraacrylate pentaerythritol tetraacrylate
B-3 vinylformic acid tetrahydrofuran ester tetrahydrofurfuryl acrylate
C-1 IRGACURE 184, Ciba Specialty Chemicals 1-hydroxycyclohexylphenyl ketone processed
C-2 OXE02, Ciba Specialty Chemicals system (Ethanone, 1-[9-ethyl-6-(2-methylbezoyl) 9H-
carbozole-3-yl]-1-(O-acetyl?oxime))
D-1 IPA-ST, silicon dioxide granule (median size 12nm), daily output chemistry system
D-2 KBM-403, glycidoxy-propyltrimethoxy silane, SHIN-ETSU HANTOTAI's chemistry glycidoxypropyltrimethoxy silane processed
Claims (4)
1. a pattern formation ink component, is characterized in that comprising:
The acrylic ester resin (A) of tool cyclic ether based structures;
Compound (B) containing ethene unsaturated group; And
Light initiator (C);
Wherein, the acrylic ester resin (A) of this tool cyclic ether based structures is closed monomer (a-2) copolymerization and obtained by the acrylic ester monomer (a-1) of tool cyclic ether based structures and copolymerizable ethene insatiable hunger, and the acrylic ester monomer (a-1) of this tool cyclic ether based structures is tool tetra-atomic ring, five-ring, six-ring, the acrylic ester monomer of seven-membered ring or octatomic ring, and the acrylic ester monomer (a-1) based on this tool cyclic ether based structures closes monomer (a-2) total 100 weight parts with this copolymerizable ethene insatiable hunger, the usage quantity of the acrylic ester monomer (a-1) of this tool cyclic ether based structures is 10～45 weight parts.
2. a light guiding plate, comprises an incidence surface, an exiting surface and a bottom surface, it is characterized in that, this bottom surface is relative with this exiting surface, and this bottom surface formation reflection graphic patterns, according to making the light that enters this light guiding plate inside by this incidence surface produce scattering and reflection;
This reflection graphic patterns is formed by ink component, and this ink component comprises:
The acrylic ester resin (A) of tool cyclic ether based structures;
Compound (B) containing ethene unsaturated group; And
Light initiator (C);
Wherein, the acrylic ester resin (A) of this tool cyclic ether based structures is closed monomer (a-2) copolymerization and obtained by the acrylic ester monomer (a-1) of tool cyclic ether based structures and copolymerizable ethene insatiable hunger, and the acrylic ester monomer (a-1) of this tool cyclic ether based structures is tool tetra-atomic ring, five-ring, six-ring, the acrylic ester monomer of seven-membered ring or octatomic ring, and the acrylic ester monomer (a-1) based on this tool cyclic ether based structures closes monomer (a-2) total 100 weight parts with this copolymerizable ethene insatiable hunger, the usage quantity of the acrylic ester monomer (a-1) of this tool cyclic ether based structures is 10～45 weight parts.
3. a luminescence unit, comprises a luminous source and a light guiding plate, it is characterized in that, this light guiding plate is combined with this luminous source side direction, to guide by this light guiding plate the light that this luminous source is provided;
This light guiding plate comprises an incidence surface, an exiting surface and a bottom surface, and wherein, this bottom surface is relative with this exiting surface, and this bottom surface formation reflection graphic patterns, according to making this reflection graphic patterns of light mat that enters this light guiding plate inside by this incidence surface produce scattering and reflection;
This reflection graphic patterns is formed by ink component, and this ink component comprises:
The acrylic ester resin (A) of tool cyclic ether based structures;
Compound (B) containing ethene unsaturated group; And
Light initiator (C);
Wherein, the acrylic ester resin (A) of this tool cyclic ether based structures is closed monomer (a-2) copolymerization and obtained by the acrylic ester monomer (a-1) of tool cyclic ether based structures and copolymerizable ethene insatiable hunger, and the acrylic ester monomer (a-1) of this tool cyclic ether based structures is tool tetra-atomic ring, five-ring, six-ring, the acrylic ester monomer of seven-membered ring or octatomic ring, and the acrylic ester monomer (a-1) based on this tool cyclic ether based structures closes monomer (a-2) total 100 weight parts with this copolymerizable ethene insatiable hunger, the usage quantity of the acrylic ester monomer (a-1) of this tool cyclic ether based structures is 10～45 weight parts.
4. a LCD assembly, comprises a liquid crystal panel and a luminescence unit, it is characterized in that, this luminescence unit provides light to pass through this liquid crystal panel;
This luminescence unit comprises a luminous source and a light guiding plate, and wherein, this light guiding plate is combined with this luminous source side direction, to guide by this light guiding plate the light that this luminous source is provided;
This light guiding plate comprises an incidence surface, an exiting surface and a bottom surface, and wherein, this bottom surface is relative with this exiting surface, and this bottom surface formation reflection graphic patterns, according to making this reflection graphic patterns of light mat that enters this light guiding plate inside by this incidence surface produce scattering and reflection;
This reflection graphic patterns is formed by ink component, and this ink component comprises:
The acrylic ester resin (A) of tool cyclic ether based structures;
Compound (B) containing ethene unsaturated group; And
Light initiator (C);
Wherein, the acrylic ester resin (A) of this tool cyclic ether based structures is closed monomer (a-2) copolymerization and obtained by the acrylic ester monomer (a-1) of tool cyclic ether based structures and copolymerizable ethene insatiable hunger, and the acrylic ester monomer (a-1) of this tool cyclic ether based structures is tool tetra-atomic ring, five-ring, six-ring, the acrylic ester monomer of seven-membered ring or octatomic ring, and the acrylic ester monomer (a-1) based on this tool cyclic ether based structures closes monomer (a-2) total 100 weight parts with this copolymerizable ethene insatiable hunger, the usage quantity of the acrylic ester monomer (a-1) of this tool cyclic ether based structures is 10～45 weight parts.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010278847.8A CN102382505B (en) | 2010-09-01 | 2010-09-01 | Ink composition for forming patterns, light guide plate, luminous unit and liquid crystal display assembly provided with luminous unit |
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| CN201010278847.8A CN102382505B (en) | 2010-09-01 | 2010-09-01 | Ink composition for forming patterns, light guide plate, luminous unit and liquid crystal display assembly provided with luminous unit |
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| TWI510826B (en) * | 2013-04-09 | 2015-12-01 | Chi Mei Corp | Light guide plate, light-emitting unit and liquid crystal display device having the same |
| TWI550033B (en) * | 2015-04-15 | 2016-09-21 | 奇美實業股份有限公司 | Light guide plate, light-emitting unit and liquid crystal display device having the same |
| TWI567143B (en) * | 2015-12-03 | 2017-01-21 | 奇美實業股份有限公司 | Ink for Light Guide Plate, Light Guide Plate, Light Emission Unit and Liquid Crystal Display Device |
| TWI606097B (en) * | 2016-09-28 | 2017-11-21 | 奇美實業股份有限公司 | Ink composition for forming pattern, light guide plate, light emitting unit and liquid crystal display device |
| CN108397702A (en) * | 2018-04-04 | 2018-08-14 | 惠州市华星光电技术有限公司 | Light guide plate, backlight module and display |
Citations (4)
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|---|---|---|---|---|
| CN1553259A (en) * | 2003-05-27 | 2004-12-08 | 明基电通股份有限公司 | Light negative module |
| CN1611971A (en) * | 2003-11-01 | 2005-05-04 | 鸿富锦精密工业（深圳）有限公司 | Light guide board manufacturing method |
| CN101081951A (en) * | 2006-05-30 | 2007-12-05 | 奇美实业股份有限公司 | Ink component for micro color-patch pattern defect correction of colorful filter |
| CN101168634A (en) * | 2006-10-10 | 2008-04-30 | 三星电子株式会社 | Pattern forming ink, method for fabricating the same and light guide plate, light emitting unit and liquid crystal display having the same |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6018384A (en) * | 1983-07-12 | 1985-01-30 | Mitsubishi Paper Mills Ltd | Desensitized ink |
| CN2594812Y (en) * | 2002-12-21 | 2003-12-24 | 鸿富锦精密工业（深圳）有限公司 | Light conducting panel and surface light source devices |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1553259A (en) * | 2003-05-27 | 2004-12-08 | 明基电通股份有限公司 | Light negative module |
| CN1611971A (en) * | 2003-11-01 | 2005-05-04 | 鸿富锦精密工业（深圳）有限公司 | Light guide board manufacturing method |
| CN101081951A (en) * | 2006-05-30 | 2007-12-05 | 奇美实业股份有限公司 | Ink component for micro color-patch pattern defect correction of colorful filter |
| CN101168634A (en) * | 2006-10-10 | 2008-04-30 | 三星电子株式会社 | Pattern forming ink, method for fabricating the same and light guide plate, light emitting unit and liquid crystal display having the same |
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| Title |
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| JP昭60-18384A 1985.01.30 * |
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