CN102378463A - Microwave plasma source having microwave energy conveying device - Google Patents

Microwave plasma source having microwave energy conveying device Download PDF

Info

Publication number
CN102378463A
CN102378463A CN2011102940003A CN201110294000A CN102378463A CN 102378463 A CN102378463 A CN 102378463A CN 2011102940003 A CN2011102940003 A CN 2011102940003A CN 201110294000 A CN201110294000 A CN 201110294000A CN 102378463 A CN102378463 A CN 102378463A
Authority
CN
China
Prior art keywords
microwave
plasma source
inner wire
microwave plasma
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN2011102940003A
Other languages
Chinese (zh)
Other versions
CN102378463B (en
Inventor
J·马伊
H·梅利希
P·沃尔夫
H·施勒姆
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mayer Bolger (germany) AG
Original Assignee
Roth and Rau AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Roth and Rau AG filed Critical Roth and Rau AG
Publication of CN102378463A publication Critical patent/CN102378463A/en
Application granted granted Critical
Publication of CN102378463B publication Critical patent/CN102378463B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01PWAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P5/00Coupling devices of the waveguide type
    • H01P5/08Coupling devices of the waveguide type for linking dissimilar lines or devices
    • H01P5/10Coupling devices of the waveguide type for linking dissimilar lines or devices for coupling balanced lines or devices with unbalanced lines or devices
    • H01P5/103Hollow-waveguide/coaxial-line transitions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192Microwave generated discharge
    • H01J37/32211Means for coupling power to the plasma
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192Microwave generated discharge
    • H01J37/32211Means for coupling power to the plasma
    • H01J37/32229Waveguides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01PWAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P5/00Coupling devices of the waveguide type
    • H01P5/02Coupling devices of the waveguide type with invariable factor of coupling
    • H01P5/022Transitions between lines of the same kind and shape, but with different dimensions
    • H01P5/028Transitions between lines of the same kind and shape, but with different dimensions between strip lines
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/46Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/46Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461Microwave discharges
    • H05H1/463Microwave discharges using antennas or applicators

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)

Abstract

The invention relates to a microwave plasma source which is provided with a microwave energy conveying device. The microwave energy conveying device is used for conveying microwave energy from a microwave supplier (1) to an internal conductor (2) in a protective pipe (3) via a waveguide joint and a coaxial conductor. The protective tube (3) is arranged inside a vacuum chamber (4) and sealed relative to the air. The internal conductor (2) and a protective pipe (3) are connected and kept in the vacuum side plane of the vacuum chamber (4). A waveguide transition joint is arranged with respect to the ground in floating manner. A conduit (8) is arranged axial to inner tube within a coaxial outer conductor (6) in the vacuum side plane of the vacuum chamber (4) such that the inner tube and conduit are arranged in coaxial manner. A movable conductor rod (18) is arranged in the conduit, and is contacted with the internal conductor (2).

Description

Microwave plasma source with microwave energy transport
Technical field
The present invention relates to a kind of microwave plasma source that has according to claim 1 characteristic, it has the microwave energy transport that is used for carrying microwave energy devices to the inner wire of protection tube inside.
Background technology
According to the known various dissimilar microwave plasma sources of prior art; What cherish a special interest at this is the wire plasma source; In the wire plasma source; At least one wire inner wire is arranged in the vacuum chamber in the protection tube of being processed by insulating material, and can be used for the industrialization Cement Composite Treated by Plasma of large area substrates.
For example DE 4136297A1 provides a kind of device, is used for producing plasma by means of microwave excitation in the process chamber part, utilizes this device at an arbitrary position microwave to be coupled in the process chamber targetedly.Preferably carry out microwave transmission in the intermediate space between inner wire and the plasma that produced as coaxial wave mode.With similar ground of coaxial waveguide law Transmission Microwave, plasma is on every side taken on the function of outer conductor in the hollow waveguide body.
This device has the hollow waveguide body of being processed by quartz glass, and this hollow waveguide body and the inner wire that is made of metal are coaxially and keep determining deviation ground extension.This hollow waveguide body is surrounded by metal shell in flange region.This metal shell serves as the wave conductor of microwave, and its prevention has triggered plasma in flange region.This flange also is used for whole device is inserted the wall of process chamber.The hollow waveguide body seals with respect to metal shell through O-ring packing.
The flange form induction element is fixed on vacuum sealing mode on the outside of flange, and it is used to admit hollow conductor, on one end thereof, connects microwave generator.The flange of this induction element and hollow conductor clamps through clamping ring each other.Hollow conductor is fixed on this end of flange through threaded fitting.
In order to produce plasma field, a plurality of this devices are arranged side by side in a vacuum chamber.Inner wire and hollow waveguide body can take out from flange for replacing vertically.
DE 198 01 366 B4 relate to a kind of device, are used for producing plasma by means of alternating electromagnetic field at vacuum chamber.Conductor bar in the inside of the pipe of being processed by insulating material extends in vacuum chamber.The internal diameter of insulated tube is greater than the diameter of conductor.Insulated tube at one end remains in the portion in the wall of vacuum chamber and with respect to outer surface and seals.
Conductor is connected the power supply that is used to produce alternating electromagnetic field on an end.
Two this devices of parallel orientation can be fed the high frequency of same frequency, and they are phase relation fixed to one another in time.Realize thus, connect the so-called half-wave balanced-unbalanced transformer of use in one of two dispense path of waveguide T shape.This basic principle is applied to other inner T shapes of device and connects waveguide, makes high frequency power can be dispensed to a plurality of inner wires of plasma generation system.
Be in this shortcoming, must pull down whole distributor, and must accurately make employed half-wave balanced-unbalanced transformer, distribute so that can obtain the identical and defined high frequency of phase place in order to change insulated tube.
DE 196 289 49 B4 provide a kind of device to be used to produce plasma, wherein, connect waveguide in order to distribute high frequency power a plurality of T shapes of solid metal derby set inside.Connect waveguide through constructing T shape symmetrically, the high frequency power that obtains definition distributes.The shortcoming here is, must pull down the high frequency distributor for maintaining insulated.
DE 198 478 48 C1 provide a kind of device be used for plasma produce excitation/particle of ionization.This device especially should in being lower than the pressure limit of about 13Pa, have sufficiently high efficient and provide sufficient amount excitation/particle of ionization.This device has inlet and is used for process gas is delivered to the outer conductor of coaxial conductor and the inner room between the inner wire, and this inner room forms plasma slab.
DE 197 56 774 B4 describe a kind of microwave plasma source; It has the plasma chamber that is arranged in the vacuum chamber and gets into opening with at least one, through getting into opening course of conveying gas and in getting into opening, can produce the microwave field of the appropriate frequency with definite intensity quantitatively.
The object that constitutes plasma chamber is arranged in the vacuum chamber.Between the shell of the wall of vacuum chamber and microwave conductor, carry out the sealing of vacuum chamber with respect to external environment condition, the shell of microwave conductor extends through and gets into opening and carry at the outside microwave that produces of vacuum chamber.Plasma chamber bears uniform pressure condition in all sides, and between plasma chamber and the sealing of vacuum chamber with respect to atmosphere, keeps space interval.Microwave plasma source should provide the vacuum seal of lasting and reliable operation.
DE 10 2,004 057 851 A1 provide a kind of method to be used for heating active medium through microwave radiation at medicator/reactor.Through coaxial antenna system transmissions microwave energy and through mast antenna microwave energy is fed in medicator/reactor, wherein, mast antenna is longer than the wavelength of applied microwave radiation, and passes the major part of oscillator.Through very compact set-up mode, less medicator also can be in heterogeneity or viewing system design and fixed also being classified to by the microwave radiation ability.
Summary of the invention
Therefore task of the present invention is; A kind of microwave plasma source is provided; It has the microwave energy transport, and said device is used for microwave energy is delivered to the inner inner wire of protection tube, and said device can be according to plain mode and with the installation and removal in process chamber of little space requirement.Said microwave plasma source especially should be applicable to the large-area plasma source of structure.
Preferably use the microwave energy of driving frequency at this as 2.45GHz.Look application mode and also can use the for example lower driving frequency of 915MHz calmly, and than the obvious higher driving frequency of 2.45GHz.Confirm the size of necessary waveguide according to the requirement of the guide technology of corresponding driving frequency.
Said device especially should be applicable to the large-area plasma source of structure.
Preferred and relevant at this with the treatment technology of specification requirement and selection, should make up a plurality of single plasma sources and also be connected with at least one microwave feeds device through common microwave distribution system.
The present invention solves this task through the given characteristic of claim 1.Favourable further scheme of the present invention is represented in the dependent claims, and is further described below in conjunction with explanation and the accompanying drawing to the preferred embodiment for the present invention.
Said device is used for microwave energy is delivered to the inner inner wire of protection tube of microwave plasma source from the microwave feeds device through the waveguide transition joint, and this protection tube is arranged on internal vacuum chamber and with respect to atmospheric sealing.
Main points of the present invention are; Institute's waveguide transition joint is in earthing potential according to guide technology on one side; In waveguide transition joint inside conduit is arranged; The inner inner wire of protection tube of the approximately through microwave plasma source of said conduit, the inner wire of said microwave plasma source approximately ends in the wall of vacuum chamber.Therefore satisfy that stub is guided the basic premise until the tie point of the inner wire of microwave plasma source from the atmospheric side of waveguide transition joint and earth terminal, and can not disturb the waveguide function of this structure.
For the microwave energy transport is installed, the tube connector joint is set on the inlet side of vacuum chamber, according to advantageous manner, said tube connector joint is a vacuum flange.Attached is coupling, and it can be connected and medially keep inner wire and protection tube with the tube connector joint.At this, coupling guarantees the vacuum-tight closing protection tube simultaneously.
Can be provided with the locking nut that at least one is with coupling ring as coupling, said locking nut can be twisted and is connected on connection-pipe joint, perhaps for example links to each other each other by means of bayonet fittings.According to advantageous manner, stub is so constructed, so that it can insert inner wire.Can on stub, construct the tip that attenuates by example I, tubular inner wire is stretched at said tip for this reason.At this, the overlap length at the tip that attenuates of inner wire preferably the driving frequency wavelength at least 1/4.1/4 of wavelength is designated hereinafter simply as λ/4.Except ohmic contact, can also between two members, obtain the dielectric contact thus.But desired pure ohmic contact should be implemented through the plug-socket connected mode according to prior art better.If reach the field contact (being also referred to as the electric capacity contact) of dielectric, the tip that then attenuates can apply suitable dielectric material according to advantageous manner.Suitable material for example is aluminium oxide or silicon dioxide.The dielectric material that is applied should have enough electric strengths and have high as far as possible dielectric constant.
Stub also can guide on catheter interior electric insulation ground when needed.So said stub can be connected with voltage source, and to inner wire supply is superimposed with the alternating voltage of the appropriate frequency of microwave.Thereby can realize additionally influencing plasma in practice.Suitable frequency at about 1MHz to hundreds of MHz frequency range.In order to improve in the microwave plasma body region of on protection tube, constructing and the capacitive coupling in the inner wire of microwave plasma source, the external diameter of inner wire is corresponding in the capacity coupled zone of needs to adapt to requirement.Advantageously, the variation of the external diameter of inner wire only spacing greater than the λ of microwave frequency/4 places just from inner wire and movably the contact point between the stub carry out the transition to new diameter.Inner wire should be realized according to guide technology in the external diameter and the transitional region between the new external diameter of inner wire at contact point place as far as possible " gently ".Under simple scenario, can select continuous transition.The operation of movable conductors rod can be simply manually or utilize arbitrarily drive unit for example to carry out with motor, pneumatic or magnetic means.
Description of drawings
Below further specify the present invention by six embodiment.
The Fig. 1 that belongs to example I illustrates apparatus of the present invention with profile, and it is connected with the microwave feeds device on one side.
The Fig. 2 that belongs to example II illustrates a device, and it is connected with the microwave feeds device on both sides.
The Fig. 3 that belongs to EXAMPLE III schematically shows a device, and wherein, two inner wires are connected with a microwave feeds device.
The Fig. 4 that belongs to EXAMPLE IV illustrates a device with overall pattern, and it has two inner wires.
The Fig. 5 that belongs to EXAMPLE V illustrates a device with overall pattern, wherein, is combined as a total unit according to two of Fig. 4 devices parallelly connectedly.
The Fig. 6 that belongs to example VI schematically shows a device, and wherein, four inner wires are connected with a microwave feeds device.
Fig. 7 illustrates the end view of Fig. 6.
Embodiment
Example I
Basic structure in apparatus of the present invention shown in the example I.This structure also can be used with equivalent way in other embodiments.
Fig. 1 illustrates microwave energy transport of the present invention with profile, and it is used for carrying microwave energy to the wire microwave plasma source.Microwave energy is delivered to the inner wire 2 of dielectric protection tube 3 inside of being processed by quartz glass from microwave feeds device 1.At this, Yi Bian presenting of microwave energy to inner wire 2 carried out.This device is done as a whole remaining in the vacuum flange 5 in the wall of vacuum chamber 4, in this vacuum chamber 4, can carry out plasma process.At atmospheric side, coaxial outer conductor 6 flanges are connected on the vacuum flange 5, and wave converter 7 flanges are connected on the coaxial outer conductor 6, and wave converter self and microwave feeds device 1 coupling couplet.
On the longitudinal axis of inner wire 2 and coaxial outer conductor 6, conduit 8 is set according to the present invention, conduit 8 medially is bearing in the waveguide transition joint 9 and in vacuum flange 5 inside in wave converter 7 inside and medially is bearing in the insulating trip 10.Conduit 8 is arranged in a plane with vacuum flange 5 towards the end face of inner wire 2 orientations basically, and this plane is positioned at vacuum chamber 4 inside, and on vacuum flange 5, is provided with external screw thread.Vacuum flange 5 axially on be provided with locking nut 11, it can be twisted with the internal thread that cooperates and be connected on the vacuum flange 5.Between vacuum flange 5 and locking nut 11, be provided with coupling ring 12.Coupling ring 12 has the inward flange 13 that is parallel to vacuum flange 5 end faces, and the end face of protection tube 3 is close to inward flange 13 through insulating trip 14, wherein, radially between protection tube 3 and coupling ring 12, is provided with vacuum seal 15.Another vacuum seal 16 is between vacuum flange 5 and coupling ring 12.
In first embodiment, exemplarily rectangle hollow conductor-coaxial conductor-converter is used as wave converter 7.Waveguide transition joint 9 is positioned at wave converter 7 inside.Waveguide transition joint 9 can be tapering transition joint or so-called " door knob shape " transition joint perhaps.The waveguide transition joint medially has the hole of matching with the external diameter of conduit 8.Stipulate preferably that at this transition between waveguide transition joint 9 and the conduit 8 connects according to guide technology low ohmly.This for example can realize through these parts are welded.The characteristic of waveguide transition joint 9 is, Yi Bian it is being in earthing potential according to guide technology.
In the present embodiment, known O shape ring is as vacuum seal 15 and 16.Thereby protection tube 3 is separated by vacuum-tight with respect to vacuum chamber 4 inner vacuum spaces in the space of atmospheric side.In protection tube 3 inside, inner wire 2 keeps through insulating trip 14 and another insulating trip 17, the plane of inner wire 2 through conduit 8 end faces.Under installment state, protection tube 3 fixedly remains in the coupling ring 12 together with inner wire 2, and coupling ring 12 clamps through locking nut 11 and vacuum flange 5.Inner wire 2 can contact or also can be separated from each other with conduit 8.
The actual coupling of the microwave energy between conduit 8 and the inner wire 2 is through movably stub 18 realizations, and stub 18 guides in conduit 8 and can contact with inner wire 2.In this example, stub 18 has the tip 19 that attenuates, and tubular inner wire 2 is stretched at the tip 19 that attenuates, through backstop place.The length at the tip 19 that attenuates this be the driving frequency of using wavelength about 1/4.At this, only when installing or dismantle protection tube 3 or inner wire 2, just need move stub 18.In most cases hand instrument is enough to carry out to move, and the drive unit that drives with machine of any type also can be set.
Under the situation of using plasma generating device of the present invention, make 1 running of microwave feeds device, thereby feeding of microwaves is gone into wave converter 7, continue afterwards to be fed to conduit 8, at end to the stub 18 of conduit, at last to inner wire 2 through waveguide transition joint 9.Pressing known way realizes producing plasma around protection tube 3.
Major advantage of the present invention is; In order to realize installing or changing the purpose of inner wire 2 and/or protection tube 3; Only need locking nut 11 is separated with vacuum flange 5, and then coupling ring 12 can take off at the axis with respect to them together with inner wire 2 and protection tube 3 in the radial direction.In addition in the exemplary embodiment, before must from inner wire 2 and protection tube 3, extract the tip that attenuates 19 of stub 18 out.Utilize apparatus of the present invention when installing or dismantling inner wire and/or protection tube, not need the sizable axial space demand required like prior art.Inner wire 2 and protection tube 3 are in the installation and removal simply of vacuum chamber 4 inside.
A plurality of this microwave plasma sources (they have the microwave energy transport that is used for carrying microwave energy to inner wire 2 on one side) also can be arranged a common internal plane each other, so that cover the processing region of expectation with the microwave plasma of stack each other planarly.Can also be that in this favourable part these microwave plasma source alternatelies ground flange of successively changing sides successively is connected on the vacuum chamber, thereby constitute the pectination layout of each microwave plasma source.
Example II
The Fig. 2 that belongs to example II schematically shows the perspective view of microwave plasma source, and this microwave plasma source is included in both sides and carries microwave energy for protection tube 3 inner inner wires 2.That is to say that two ends of inner wire 2 are connected with a microwave feeds device 1 through a wave converter 7 respectively.At this, device corresponds essentially to the structure of example I.It is exemplary that what illustrate is in vacuum chamber 1, above protection tube 3, to have the delivery section 25 of process gas and the substrate holder 21 and vacuum pump pipe joint 22 of the substrate that keeps flat of band.
In this external example II, respectively establish the drive unit 23 of a motor-type on both sides, be used for moving stub 18.As long as favourable technically, also can use other drive units, for example pneumatic actuating device.Insulate through insulated tube 26 at conduit 8 conductor inside rod 18, and be connected on the voltage source 24 at the stub 18 on Fig. 2 right side.In this case, each stub 18 also is connected with the drive unit 23 insulation ground of motor-type.Here for example can realize through ceramic rod.In order to prevent that under the situation that connects voltage source 24 microwave radiation high frequency radiation in other words from releasing, by means of additional housing according to microwave technology shielding conduit 8 and the atmospheric side zone of stub 18 together with the drive unit 23 of motor-type.This housing is corresponding to prior art, for the sake of simplicity not shown in Fig. 2.
EXAMPLE III
The Fig. 3 that belongs to EXAMPLE III schematically shows the microwave distributor based on coaxial conductor.To be connected the microwave energy that the microwave feeds device on the microwave delivery section 30 produced at this and be dispensed to two paths, thereby can supply the only about half of of employed microwave energy respectively by parallelly connected inner wire 2 to two of the microwave plasma source that is connected.Thereby this microwave distributor also can be called two road microwave distributors for short.
According to advantageous manner, the microwave feeds device is connected with microwave delivery section 30, as among the Fig. 1 that implements I, realizing on wave converter 7 by means of coaxial outer conductor 6.At this, microwave delivery section 30 will be as new coaxial inner conductor coaxial outer conductor 6 inner extensions until passing waveguide transition joint 9.
Two road microwave distributors mainly comprise solid ground connection piece 27 and vacuum flange 32, and this ground connection piece 27 is processed by electric conducting material, and this vacuum flange 32 is connected with cylindrical base 33 vacuum-tights.Preferably the rectangle flange is used as vacuum flange at this.By means of vacuum seal 34, vacuum flange 32 is twisted with vacuum chamber 4 vacuum-tights and is connect.Be implemented as coaxial outer conductor in ground connection piece 27 holes inner and that extend between two parties with respect to matrix 33, and these holes penetrate ground connection piece 27 and matrix 33 fully.These two coaxial outer conductors are connected with an additional coaxial outer conductor that extends transverse to them, obtain the coaxial conductor layout of about H shape thus in ground connection piece 27 inside.Conduit 28 and lateral member 31 placed in the middle insertions in the coaxial outer conductor, each coaxial inner conductor of conduit 28 and lateral member 31 these coaxial conductor structures of formation thus.In order to improve the axial restraint of these coaxial inner conductors, supporting slice that for example can application drawing 3 unshowned other dielectrics.Microwave delivery section 30 obtains T just as spindle guide body layout together with lateral member 31, also abbreviates T shape distributor as.The transition joint of the cylindrical thickening part shown on the lateral member 31 and 31 to two conduits 28 of lateral member is used to compensate the field that occurs at the tie point place of coaxial inner conductor to be disturbed.
Conduit 8 stretches out from ground connection piece 27 via cylindrical waveguide transition joint 28, thereby for example can move stub 18 through drive unit 29.At this so-called λ/4 pipe joints are used as the waveguide transition joint, its material by good conduction is processed.If the spacing L between the inner face of the inner face of λ/4 pipe joints and the coaxial outer conductor that extends transverse to conduit 28 equals λ/4 of used driving frequency just; Between lateral member 31 and two conduits 28, obtain the tie point according to high ohm of guide technology so, the transmission of the ripple in the waveguide transition joint area only receives slight interference thus.
Yet λ/4 pipe joints are also removable in coaxial outer conductor inside, thereby these λ/4 pipe joints become λ/4 sliding parts.For example can realize that thus the microwave energy allocation proportion adapts to these two paths of two road microwave distributors, perhaps can wholely improve two road microwave distributors adapt to plasma source according to microwave technology loading condition.Also can stipulate according to advantageous manner, a waveguide transition joint is embodied as λ/4 pipe joints, another waveguide transition joint is embodied as λ/4 sliding parts.
Make this two road microwave distributors, especially H is arranged on ground connection piece 27 inside just as spindle guide body layout, very harsh to the requirement of manufacturing technology aspect.Therefore ground connection piece 27 should be combined by at least two monolithics on the axis of coaxial outer conductor.And then can mill out each coaxial outer conductor halfbody from each monolithic relatively simply.H can make and be arranged in one of them monolithic through supporting slice just as axle inner wire layout in advance.Subsequently these two monolithics are very closely twisted each other and connect and be connected with vacuum flange 32 subsequently.
In this two road microwave distributors, advantageously, only need maintenance seldom at this.After two road microwave distributors are installed, for example, needn't leave no choice but dismantle two road microwave distributors in order to safeguard protection tube 3 or stub 18 or inner wire 2.This functional reliability that has guaranteed device is high.
Two road microwave distributors that provided are not only applicable to having attached protection tube 3 inner wires 2 conveying microwave energies to two on one side, and are applicable on both sides to two inner wires, 2 conveying microwave energies.
When carrying microwave energies on one side for two inner wires 2 that have an attached protection tube 3; Also can two this two road microwave distributor arranged in succession be arranged in the common plane; Thereby constitute planar plasma origin system, Yi Bian it has four at the inner wire that is fed 2 and four protection tubes 3.To plasma process control, a kind of like this system also can be favourable, and wherein, each two road microwave distributor is arranged in a plane, but arranged in succession is arranged in the wall opposite each other of vacuum chamber.If especially in this each protection tube 3 that has a fixing inner wire 2 nested arrangement each other; For example have the half the of spacing between the axis of two inner wires 2 that a spacing approximates one two road microwave distributor greatly, so just can obtain very compact microwave plasma generation system.
EXAMPLE IV
The Fig. 4 that belongs to EXAMPLE IV illustrates a device, and it is used for giving birth to plasma at vacuum chamber 4 inner planar real estates.At this, two inner wires 2 are connected at one two road microwave distributor of both sides and each corresponding to EXAMPLE III with attached dielectric protection tube 3.A coaxial outer conductor 6 and a wave converter 7 are set respectively on these two road microwave distributors.On these wave converters 7, can connect various microwave feeds device.Be with the difference of example I, be provided with one on dielectric protection tube 3 both sides respectively and have utensil with the bayonet fittings of connected body 35,36 bayonet couplings as coupling.
EXAMPLE V
The Fig. 5 that belongs to EXAMPLE V illustrates a device, and wherein, at least two single devices according to EXAMPLE IV are arranged each other and formed large-area device.Shown in the example be, two inner wires 2 of twice are set through substrate holder 37 in vacuum chamber 4, they and the dielectric protection tube 3 common microwave plasma volume arrays that form.
Bayonet fittings is still as coupling.This device that can be applicable to industrial circle can safeguard very effectively, and can change inner wire 2 and protection tube 3 like a dream, and need not to leave no choice but remove other members of two road microwave distributors 27 and microwave feeds device.
Example VI
Fig. 6 and Fig. 7 of belonging to example VI schematically show so-called four road microwave distributors, and wherein, four inner wires 2 can be connected with a microwave feeds device.At this, Fig. 7 illustrates the end view of Fig. 6.Similar at this and EXAMPLE III, the conduit 8 of per two parallel connections is coupled through a lateral member 39 each other, and the H that formation has λ/4 pipe joints and/or λ/4 sliding parts is just as spindle guide body fundamental system.Fig. 6 illustrates two this H just as spindle guide body fundamental system.Two single lateral member 39 connect lateral member 38 through another and are connected with each other.Important part is that each lateral member 39 always is positioned at a plane, is positioned at another plane and connect lateral member 38.Each connect lateral member 39 between these planes through coaxial outer conductor and the coaxial inner conductor that comprises 42 be connected lateral member 38 connections, and at the common T of this formation just as the spindle guide system.Microwave delivery section 41 also constitutes such T just as the spindle guide system together with connecting lateral member 38.Each different coaxial conductor system is positioned at ground connection piece 40 inside.For this reason referring to Fig. 7.Thereby can construct four road microwave distributors, its for example with the scheme described in the EXAMPLE V (referring to Fig. 5) mutually specific energy carry microwave energies with mode that more compactness and expense are cheaper to four single inner wires 2.
At this, the microwave delivery section 41 of leading to four road microwave distributors also can be with respect to Fig. 6 90 degree that stagger.
Under few cases, need to surpass four single inner wires and be connected with a microwave feeds device.If but must so so also can will be installed in other H just as in the spindle guide body fundamental system and in the same level of packing into above two single lateral member 39 according to corresponding manner and method.And required additional connection lateral member 38 is arranged in second plane.Can be installed in the plane identical with the additional required connection lateral member that other microwave delivery section 41 are connected with each other, perhaps in other additional planes with being connected lateral member 38 residing planes.
Based on having a plurality of T just as the spindle guide system; Be used for employed microwave energy is assigned to a plurality of H just as spindle guide body fundamental system; Equally advantageously, in ground connection 40 inside of determining, for example can use other λ/4 pipe joints or λ/4 sliding parts at T on just as the spindle guide system on one side.Thereby can revise once more and possibly influence microwave and distribute symmetric possible mechanical defect.On for example can this additional λ/4 pipe joints or λ/4 sliding parts being installed in coaxial inner conductor 42 and being connected one of two tie points between the lateral member 38.
Reference numerals list
1 microwave feeds device, 22 vacuum pump pipe joints
2 inner wires, 23 drive units
3 protection tubes, 24 voltage sources
4 vacuum chambers, 25 lateral member
5 vacuum flanges, 26 conduits
6 coaxial outer conductors, 27 ground connection pieces
7 waveguide transition joints, 28 insulators
8 conduits, 29 electromagnetic actuator devices
9 tapering transition joints, 30 bayonet fittings
10 insulating trips 31 connect lateral member
11 locking nuts, 32 vacuum flanges
12 coupling rings, 33 matrixes
13 inward flanges, 34 vacuum seal
14 insulating trips, 35 connected bodies
15 vacuum seal portions, 36 connected bodies
16 vacuum seal portions, 37 substrate holders
17 insulating trips 38 connect lateral member
18 stubs 39 connect lateral member
The 19 tip 40 ground connection pieces that attenuate
The delivery section 41 microwave delivery section of 20 process gas
21 substrate holders, 42 coaxial inner conductors

Claims (24)

1. microwave plasma source; It has the microwave energy transport; Said microwave energy transport is used for microwave energy is transported to the inner inner wire (2) of protection tube (3) from microwave feeds device (1) via waveguide transition joint and coaxial conductor system; It is inner and with respect to atmospheric sealing that this protection tube is arranged on vacuum chamber (4), it is characterized in that, said inner wire (2) and protection tube (3) terminate and remain in the plane of inlet side of vacuum chamber (4); The waveguide transition joint that does not have current potential ground ground connection is on one side arranged; Inner wire (2) axially on the conduit (8) as coaxial inner conductor is set, said conduit is vertically on the inner plane of extending up to the inlet side of vacuum chamber (4) of coaxial outer conductor (6); And, make stub to contact with inner wire (2) at conduit (8) set inside stub (18) movably.
2. microwave plasma source according to claim 1 is characterized in that, Yi Bian the tapering transition joint is arranged as there not being the waveguide transition joint (9) of current potential ground ground connection.
3. microwave plasma source according to claim 1 is characterized in that, Yi Bian λ/4 pipe joints or λ/4 sliding parts conduct are arranged at the waveguide transition joint that does not have current potential ground ground connection.
4. microwave plasma source according to claim 1 is characterized in that, at least two inner wires (2) are provided with parallelly connectedly.
5. according to the described microwave plasma source of one of claim 1 to 4, it is characterized in that said inner wire (2) can be connected with a microwave feeds device on one side, perhaps can be connected with a microwave feeds device respectively on both sides.
6. according to claim 4 or 5 described microwave plasma sources, it is characterized in that, be useful in turn and/or the member that is connected with one or more microwave feeds device successively with changing sides the inner wire (2) of at least two parallel connections.
7. microwave plasma source according to claim 4 is characterized in that, the inner wire of at least two parallel connections (2) constitutes a common plane.
8. microwave plasma source according to claim 1; It is characterized in that; For inner wire (2) and protection tube (3) are remained on vacuum chamber (4) inside; Be provided with coupling, this coupling has the locking nut (11) of at least one band coupling ring (12), and said locking nut is twisted and is connected on the tube connector joint.
9. microwave plasma source according to claim 1 is characterized in that, for inner wire (2) and protection tube (3) are remained on vacuum chamber (4) inside, is provided with the utensil of band bayonet fittings (35,36).
10. according to the described microwave plasma source of one of claim 1 to 9, it is characterized in that said stub (18) is configured to, make this stub can insert in the inner wire (2).
11., it is characterized in that said stub (18) guides on conduit (8) built-in electrical insulation ground according to the described microwave plasma source of one of claim 1 to 10.
12. microwave plasma source according to claim 11 is characterized in that, said stub (18) is connected with alternating-current voltage source.
13. according to the described microwave plasma source of one of claim 4 to 12; It is characterized in that; The inner wire of per two parallel connections (2) is connected with microwave delivery section (30) placed in the middle through affiliated conduit (8), waveguide transition joint (28) and through lateral member (31), and so two road microwave distributors of formation can be coupled with a microwave feeds device.
14. microwave plasma source according to claim 13 is characterized in that, λ/4 pipe joints and/or λ/4 sliding parts is arranged as waveguide transition joint (28).
15., it is characterized in that two inner wires (2) are connected with two road microwave distributors on one side or both sides according to the described microwave plasma source of one of claim 4 to 14, said two road microwave distributors can be connected with the microwave feeds device.
16. according to the described microwave plasma source of one of claim 4 to 15; It is characterized in that; At least four inner wires (2) successively in turn are arranged in the vacuum chamber, and at this moment, the inner wire (2) that per two priorities set gradually constitutes one group; These groups are connected with two road microwave distributors on one side or both sides respectively, and said two each microwave distributors can be connected with the microwave feeds device.
17. according to the described microwave plasma source of one of claim 4 to 15; It is characterized in that; At least two two road microwave distributors are arranged in the vacuum chamber with changing sides and are connected with a microwave feeds device respectively, make inner wire (2) that at least four priorities are provided with in two groups successively Yi Bian can be supplied microwave energy respectively.
18. according to the described microwave plasma source of one of claim 4 to 15; It is characterized in that; At least two two road microwave distributors in turn successively, change sides be arranged on a vacuum chamber nestedly on; And can be connected with a microwave feeds device respectively, make at least four inner wires (2) can be supplied microwave energy, the spacing of inner wire (2) approximates spacing half the of axis of each conduit (8) of one two road microwave distributor greatly.
19. according to the described microwave plasma source of one of claim 4 to 15; It is characterized in that; The inner wire of at least four parallel connections (2) is arranged in the inner first common plane of solid metal derby through affiliated conduit (8) and waveguide transition joint (28); Per two conduits (8) are connected to each other through lateral member (39); About the centre position of each lateral member (39) concentric conductor is set greatly, said concentric conductor has the coaxial inner conductor (42) that lateral member (39) is linked to each other with the end that is connected lateral member (38), and said connection lateral member is positioned at second plane; Therefore form four road microwave distributors, said four road microwave distributors can be connected with a microwave feeds device through microwave delivery section (41).
20. microwave plasma source according to claim 19 is characterized in that, waveguide transition joint (28) adopts λ/4 pipe joints and/or λ/4 sliding parts.
21. microwave plasma source according to claim 19 is characterized in that, at least one additional λ/4 pipe joints and/or λ/4 sliding part is arranged on the end that connects lateral member (38).
22. according to the described microwave plasma source of one of claim 4 to 21; It is characterized in that; At least one group of being made up of four inner wires (2) is connected with four road microwave distributors on the one side or the both sides of vacuum chamber, and said four road microwave distributors can be connected with the microwave feeds device.
23. according to the described microwave plasma source of one of claim 4 to 21; It is characterized in that; At least two groups of being made up of four inner wires (2) successively in turn are arranged in the vacuum chamber, and at this, each group successively in turn and is connected with one four road microwave distributor with changing sides.
24. according to the described microwave plasma source of one of claim 4 to 21; It is characterized in that; At least two groups of being made up of four inner wires (2) successively in turn are arranged in the vacuum chamber; Each group is each other approximately nested with half spacing of the spacing of the axis of each inner wire (2) of single group, and this moment, and each group on one side and successively be connected with one four road microwave distributor with changing sides successively.
CN201110294000.3A 2010-07-20 2011-07-20 There is the microwave plasma source of microwave energy conveying device Active CN102378463B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102010027619A DE102010027619B3 (en) 2010-07-20 2010-07-20 Microwave plasma source of microwave distribution system used during plasma treatment process of substrate, has inner tube and conduit that are arranged in coaxial manner, and guard portion arranged in conduit is contacted with inner tube
DE102010027619.7 2010-07-20

Publications (2)

Publication Number Publication Date
CN102378463A true CN102378463A (en) 2012-03-14
CN102378463B CN102378463B (en) 2015-12-02

Family

ID=44859926

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201110294000.3A Active CN102378463B (en) 2010-07-20 2011-07-20 There is the microwave plasma source of microwave energy conveying device

Country Status (2)

Country Link
CN (1) CN102378463B (en)
DE (1) DE102010027619B3 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103269559A (en) * 2013-05-03 2013-08-28 大连海事大学 Strengthening-type microwave liquid-phase electro-discharge plasma generation device
US9431217B2 (en) 2012-04-19 2016-08-30 Meyer Burger (Germany) Ag Microwave plasma generating device and method for operating same
CN105977116A (en) * 2016-03-23 2016-09-28 中国科学院等离子体物理研究所 Long-rod-shaped scalable rotary type ion source
CN108353492A (en) * 2015-10-05 2018-07-31 塞勒姆电子与微波工业应用研究公司 With coaxial applicator, the basic device for generating plasma
CN111344832A (en) * 2017-09-19 2020-06-26 牧歌股份有限公司 Device for treating products with microwaves

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2031258B1 (en) 2022-03-11 2023-09-19 Leydenjar Tech B V Apparatus and method for plasma enhanced chemical vapour deposition
NL2031257B1 (en) 2022-03-11 2023-09-20 Leydenjar Tech B V Apparatus and method for plasma enhanced chemical vapour deposition

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4136297A1 (en) * 1991-11-04 1993-05-06 Plasma Electronic Gmbh, 7024 Filderstadt, De Localised plasma prodn. in treatment chamber - using microwave generator connected to coupling device which passes through the wall of the chamber without using a coupling window
US6161501A (en) * 1998-01-16 2000-12-19 Leybold Systems Gmbh Device for plasma generation
CN1290399A (en) * 1998-10-16 2001-04-04 R3T股份有限公司 Device for producing excited/ionized particles in plasma
CN1623254A (en) * 2002-01-23 2005-06-01 Vega格里沙贝两合公司 Coaxial line plug-in connection with integrated galvanic separation
DE102004021061A1 (en) * 2004-04-29 2005-11-24 GÖTZ, Werner Artificial snow production, e.g. for production of chilled pre-mixed concrete, avoids lump-formation by using draught tube baffle crystallizer vessel, fed with water and liquid nitrogen
DE102004057851A1 (en) * 2004-12-01 2006-06-14 Invertec - Innovative Verfahrenstechnik E.V. Homogeneous microwave heating of an active medium in an applicator/reactor, e.g for use with chemical reactions, makes use of rod antennae
US20070205781A1 (en) * 2006-02-22 2007-09-06 Mikael Eriksson Coaxial connector in radar level gauge

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19756774B4 (en) * 1997-12-19 2009-12-31 Tec Tra Gmbh Microwave plasma source
JP3969081B2 (en) * 2001-12-14 2007-08-29 東京エレクトロン株式会社 Plasma processing equipment
DE102004021016B4 (en) * 2004-04-29 2015-04-23 Neue Materialien Bayreuth Gmbh Device for feeding microwave radiation into hot process spaces

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4136297A1 (en) * 1991-11-04 1993-05-06 Plasma Electronic Gmbh, 7024 Filderstadt, De Localised plasma prodn. in treatment chamber - using microwave generator connected to coupling device which passes through the wall of the chamber without using a coupling window
US6161501A (en) * 1998-01-16 2000-12-19 Leybold Systems Gmbh Device for plasma generation
CN1290399A (en) * 1998-10-16 2001-04-04 R3T股份有限公司 Device for producing excited/ionized particles in plasma
CN1623254A (en) * 2002-01-23 2005-06-01 Vega格里沙贝两合公司 Coaxial line plug-in connection with integrated galvanic separation
DE102004021061A1 (en) * 2004-04-29 2005-11-24 GÖTZ, Werner Artificial snow production, e.g. for production of chilled pre-mixed concrete, avoids lump-formation by using draught tube baffle crystallizer vessel, fed with water and liquid nitrogen
DE102004057851A1 (en) * 2004-12-01 2006-06-14 Invertec - Innovative Verfahrenstechnik E.V. Homogeneous microwave heating of an active medium in an applicator/reactor, e.g for use with chemical reactions, makes use of rod antennae
US20070205781A1 (en) * 2006-02-22 2007-09-06 Mikael Eriksson Coaxial connector in radar level gauge

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9431217B2 (en) 2012-04-19 2016-08-30 Meyer Burger (Germany) Ag Microwave plasma generating device and method for operating same
TWI595809B (en) * 2012-04-19 2017-08-11 羅斯勞股份有限公司 Micro wave plasma producing device and method for using same
CN103269559A (en) * 2013-05-03 2013-08-28 大连海事大学 Strengthening-type microwave liquid-phase electro-discharge plasma generation device
CN103269559B (en) * 2013-05-03 2016-04-20 大连海事大学 A kind of enhancement mode microwave discharge in water plasma producing apparatus
CN108353492A (en) * 2015-10-05 2018-07-31 塞勒姆电子与微波工业应用研究公司 With coaxial applicator, the basic device for generating plasma
CN108353492B (en) * 2015-10-05 2020-08-25 塞勒姆电子与微波工业应用研究公司 Basic device for generating plasma with coaxial applicator
CN105977116A (en) * 2016-03-23 2016-09-28 中国科学院等离子体物理研究所 Long-rod-shaped scalable rotary type ion source
CN111344832A (en) * 2017-09-19 2020-06-26 牧歌股份有限公司 Device for treating products with microwaves
CN111344832B (en) * 2017-09-19 2023-12-12 牧歌股份有限公司 Device for treating products with microwaves

Also Published As

Publication number Publication date
DE102010027619B3 (en) 2011-11-17
CN102378463B (en) 2015-12-02

Similar Documents

Publication Publication Date Title
CN102378463A (en) Microwave plasma source having microwave energy conveying device
US6707051B2 (en) RF loaded line type capacitive plasma source for broad range of operating gas pressure
JP6272298B2 (en) Microwave plasma generator and method of operating the same
CN101022074A (en) Differential feed dielectric barrier discharging low-temperature plasma device
JP2013503430A (en) Penetration type plasma generator for high vacuum chamber
US6975072B2 (en) Ion source with external RF antenna
CN1932077A (en) Apparatus and methods for using high frequency chokes in a substrate deposition apparatus
CN103229272A (en) Plasma processing apparatus
JP2008019470A (en) Power-feeding structure of plasma treatment apparatus
CN201017845Y (en) Differential feeding media blocking discharging low-temperature plasma device
CN101156504B (en) Plasma coating device and method
CN103996591A (en) Microwave ion source and method for starting same
US6416292B1 (en) Method for transporting at least one vaporous substance through the wall of a vacuum chamber and into the vacuum chamber and a device for executing and utilizing the method
CN101257159A (en) Power supply to at least one electricity consumer
CN103003913B (en) For generating the device of plasma by microwave
CN100557756C (en) Electronic injector and ion implantation apparatus
KR20060014206A (en) Atmospheric pressure multi plasma generator and atmospheric pressure plasma processing system using the same
JP5105775B2 (en) Insulating piping, plasma processing apparatus and method
CN107750087A (en) The dual-purpose plasma jet generating means of a kind of bare electrode and dielectric impedance
KR20040010898A (en) Igniting device of Microwave Plasma Discharge System
KR101071092B1 (en) Internal antenna structure and plasma generation apparatus
CN101246099B (en) Dynamic power splitter
CN107146753A (en) A kind of plasma processing apparatus
JP2004515998A (en) Energy transfer system for three-phase currents in the medium and high pressure range
WO2017025709A1 (en) Plasma generator

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C56 Change in the name or address of the patentee
CP01 Change in the name or title of a patent holder

Address after: Germany Horn Stein - Ernstthal

Patentee after: Mayer Bolger (Germany) AG

Address before: Germany Horn Stein - Ernstthal

Patentee before: Roth & Rau AG