CN102373416A - Manufacturing method of shell and shell manufactured by same - Google Patents

Manufacturing method of shell and shell manufactured by same Download PDF

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Publication number
CN102373416A
CN102373416A CN2010102637213A CN201010263721A CN102373416A CN 102373416 A CN102373416 A CN 102373416A CN 2010102637213 A CN2010102637213 A CN 2010102637213A CN 201010263721 A CN201010263721 A CN 201010263721A CN 102373416 A CN102373416 A CN 102373416A
Authority
CN
China
Prior art keywords
nitrogen
matrix
titanyl
rete
housing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2010102637213A
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Chinese (zh)
Inventor
张新倍
陈文荣
蒋焕梧
陈正士
万自成
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
Original Assignee
Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hongfujin Precision Industry Shenzhen Co Ltd, Hon Hai Precision Industry Co Ltd filed Critical Hongfujin Precision Industry Shenzhen Co Ltd
Priority to CN2010102637213A priority Critical patent/CN102373416A/en
Publication of CN102373416A publication Critical patent/CN102373416A/en
Pending legal-status Critical Current

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Abstract

The invention provides a manufacturing method of a shell, which comprises the following steps of: providing a transparent matrix; masking the surface of the matrix; carrying out magnetron sputtering on the matrix by using a titanium target, using oxygen and nitrogen as reaction gases and adopting a magnetron sputtering method so as to form a titanyl nitrogen film layer on the other surface of the matrix, wherein the flow rate of the oxygen is in the range of 10 to 14sccm and the flow rate of the nitrogen is in the range of 115 to 125sccm; and forming a chromium film layer on the titanyl nitrogen film layer by the magnetron sputtering method, so that an L*coordinate value of a chromaticity region shown on the titanyl nitrogen film layer in a CIE LAB color system is in the range of 40 to 55, an a*coordinate value of the chromaticity region shown on the titanyl nitrogen film layer in the CIE LAB color system is in the range of 8 to 10, and a b*coordinate value of the chromaticity region shown on the titanyl nitrogen film layer in the CIE LAB color system is in the range of minus 24 to minus 16. The invention also provides the shell manufactured by the method. The shell shows a claret-colored appearance.

Description

The making method of housing and housing obtained by this method
Technical field
The present invention relates to a kind of making method and housing obtained by this method of housing.
Background technology
Along with the continuous progress of science and technology, various electronic installations such as mobile phone and computingmachine also develop rapidly, and its function is also more and more abundant.For the shell that makes electronic installation has rich colors more, colored plastic capable of using traditionally forms the colored plastic shell, or forms color layer by the mode of spraying paint at the surface of shell of electronic installation.But, use plastic casing can not present good metal texture.
Magnetron sputtering technique is good because of the film wear resistance of its environmental protection, preparation, product appearance has characteristics such as metal-like, therefore uses more and more wider in ornamental plated film field.Though can on plastic casing, obtain the rete of preferable metal-like through magnetron sputtering, the color of the rete but color not as film-forming process such as baking vanish, anodizing is abundant, has seriously limited the competitive power of magnetron sputtering technique in the decoration film coating field.
Summary of the invention
Given this, be necessary to provide a kind of making method with red-purple metal-like housing.
In addition, also be necessary to provide a kind of by the prepared housing of aforesaid method.
A kind of preparation method of housing comprises the steps: the matrix that provides transparent the surface of matrix to be covered; Using the titanium target, is reactant gases with oxygen and nitrogen, and oxygen flow is 10～14sccm; Nitrogen flow is 115～125sccm; Adopt magnetically controlled sputter method that matrix is carried out magnetron sputtering, sputtering time is 75～95 minutes, forms titanyl nitrogen rete with another surface at matrix;
On this titanyl nitrogen rete, form the chromium rete with magnetically controlled sputter method, sputtering time is 0.5 hour, makes chroma areas that this titanyl nitrogen rete one side appears in the L of CIE LAB colour system *Coordinate figure is between 40 to 55, a *Coordinate figure is between 8 to 10, b *Coordinate figure is between-24 to-16.
A kind of housing that makes by aforesaid method; Comprise transparent matrix and be formed at the composite film on the matrix; This composite film comprises titanyl nitrogen rete and chromium rete; This titanyl nitrogen rete directly is formed on the surface of matrix, and this chromium rete is formed on this titanyl nitrogen rete, and the chroma areas that this composite film appears in this titanyl nitrogen rete one side is in the L of CIE LAB colour system *Coordinate figure is between 40 to 55, a *Coordinate figure is between 8 to 10, b *Coordinate figure is between-24 to-16.
The making method of housing of the present invention is passed through in the surface magnetic control sputtering titanyl nitrogen rete of transparent matrix and the composite film of chromium rete; And through control sputter procedure in flow rate of reactive gas so that said composite film forms specific microtexture; And make said housing demonstrate red-purple and the outward appearance of metal-like is arranged; Enrich the color of magnetron sputtering layer, improved the outward appearance competitive power of product.
Description of drawings
Fig. 1 is the cross-sectional schematic of the housing of preferred embodiment of the present invention.
The main element nomenclature
Housing 10
Matrix 11
Internal surface 112
Outside surface 114
Composite film 13
Titanyl nitrogen rete 131
Chromium rete 133
Embodiment
The making method of the housing 10 (as shown in Figure 1) of the present invention's one preferred embodiments comprises the steps:
Transparent matrix 11 is provided, and this matrix 11 can be transparent glass or transparent plastics.This matrix 11 comprises internal surface 112 and outside surface 114.
Matrix 11 is carried out surface cleaning,, clean the dry for standby afterwards that finishes with the impurity of removing matrix 11 surface and greasy dirt etc.Said cleaning comprises that matrix 11 is put into the ultrasonic cleaner that is loaded with ethanol and/or acetone soln shakes cleaning.
Outside surface 114 to matrix 11 covers, in case outer surface 114 pollutes when terminating in internal surface 112 and forming composite films 13.Use high temperature gummed tape outer surface 114 to cover at this preferred embodiment.
Matrix 11 is fixed on the magnetron sputtering coater pivoted frame of (figure does not show), vacuumizes cavity to 8 * 10 of this coating equipment -3Pa; And the temperature that makes this cavity remains on about 0 ℃, and the feeding flow is the high-purity argon gas (working gas) of 400～450sccm (standard state ml/min), is reactant gases with oxygen and nitrogen; Oxygen flow is 10～14sccm, and nitrogen flow is 115～125sccm; Open the power supply of titanium target; Setting power is 8～12kw, and the revolution rotating speed that pivoted frame is set be 3 rpms (revolution per minute, rpm); Internal surface 112 to matrix 11 carries out magnetron sputtering, on this internal surface 112, to form titanyl nitrogen rete 131.The time that sputter forms this titanyl nitrogen rete 131 is 75～95 minutes.
Behind the said titanyl nitrogen of the sputter rete 131, close the titanium target, stop to feed nitrogen and oxygen, opening the chromium target then and regulating the chromium target power output is 8～10kw, proceeds magnetron sputtering, on this titanyl nitrogen rete 131, to form chromium rete 133.The time that sputter forms this chromium rete 133 is 0.5 hour.
After said chromium rete 133 forms, promptly make said composite film 13.
Magnetron sputtering tears high temperature gummed tape after accomplishing.
The outside surface 114 that the composite film of making according to above-mentioned steps 13 sees through matrix 11 is red-purple, and has preferable metal-like.Tristimulus coordinates (the L that described composite film 13 appears in titanyl nitrogen rete 131 1 sides *, a *, b *) be (40～55,8～10 ,-24～-16).
Because composite film 13 is formed at the internal surface 112 of matrix 11, during use, can be with outside surface 114 as appearance, thereby can avoid composite film 13 scratches or come off.
The making method of said housing 10 is passed through in the internal surface 112 magnetron sputtering titanyl nitrogen retes 131 of transparent matrix 11 and the composite film 13 of chromium rete 133; And through flow rate of reactive gas, sputtering time etc. in the control sputter procedure; So that said composite film 13 forms specific microtexture, and make said housing 10 demonstrate red-purple and the outward appearance of metal-like is arranged.
Please consult Fig. 1 again, comprise transparent matrix 11 and be formed at the composite film 13 on the matrix 11 by the prepared housing 10 of aforesaid method.
Matrix 11 can be transparent glass or plastics.Matrix 11 comprises that internal surface 112 reaches and these internal surface 112 opposed outer surface 114, and this outside surface 114 is the appearance of this housing, and this composite film 13 is formed on this internal surface 112.
Composite film 13 comprises titanyl nitrogen rete 131 and chromium rete 133.This titanyl nitrogen rete 131 directly is formed at the internal surface 112 of matrix 11.Chromium rete 133 is formed on this titanyl nitrogen rete 131; The transmittance of said chromium rete 133 is lower; It can stop light to see through well; The effect of playing substrate for titanyl nitrogen rete 131 makes chroma areas that this composite film 13 appeared in titanyl nitrogen rete 131 1 sides in the L of CIE LAB colour system *Coordinate figure is between 40 to 55, a *Coordinate figure is between 8 to 10, b *Coordinate figure is rendered as red-purple between-24 to-16.
Be noted that above-mentioned embodiment is merely preferred embodiments of the present invention, those skilled in the art also can do other variation in spirit of the present invention.These all should be included within the present invention's scope required for protection according to the variation that the present invention's spirit is done.

Claims (6)

1. the making method of a housing, it comprises the steps:
Transparent matrix is provided;
Using the titanium target, is reactant gases with oxygen and nitrogen, and oxygen flow is 10～14sccm; Nitrogen flow is 115～125sccm; Adopt magnetically controlled sputter method that matrix is carried out magnetron sputtering, sputtering time is 75～95 minutes, forms titanyl nitrogen rete with the surface at matrix;
On this titanyl nitrogen rete, form the chromium rete with magnetically controlled sputter method, sputtering time is 0.5 hour, makes chroma areas that this titanyl nitrogen rete one side appears in the L of CIE LAB colour system *Coordinate figure is between 40 to 55, a *Coordinate figure is between 8 to 10, b *Coordinate figure is between-24 to-16.
2. the making method of housing as claimed in claim 1, it is characterized in that: forming this titanyl nitrogen rete is working gas with the argon gas, and the temperature of plated film cavity remains on 0 ℃, and the power of titanium target is 8～12kw.
3. the making method of housing as claimed in claim 1, it is characterized in that: this chromium rete of magnetron sputtering is a target with the chromium target, and the chromium target power output is 8～10kw.
4. the making method of housing as claimed in claim 1, it is characterized in that: said matrix is transparent glass or plastics.
5. the making method of housing as claimed in claim 1 is characterized in that: a said surface shaded to matrix is to adopt high temperature gummed tape to cover.
6. housing that makes by each the described method among the claim 1-5.
CN2010102637213A 2010-08-26 2010-08-26 Manufacturing method of shell and shell manufactured by same Pending CN102373416A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2010102637213A CN102373416A (en) 2010-08-26 2010-08-26 Manufacturing method of shell and shell manufactured by same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2010102637213A CN102373416A (en) 2010-08-26 2010-08-26 Manufacturing method of shell and shell manufactured by same

Publications (1)

Publication Number Publication Date
CN102373416A true CN102373416A (en) 2012-03-14

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CN2010102637213A Pending CN102373416A (en) 2010-08-26 2010-08-26 Manufacturing method of shell and shell manufactured by same

Country Status (1)

Country Link
CN (1) CN102373416A (en)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN88101654A (en) * 1987-03-26 1988-11-02 Ppg工业公司 Titanium oxynitride spray film
JPH05279846A (en) * 1992-03-30 1993-10-26 Sony Corp Target for sputtering and formation of sputtered tion film
JP2000212738A (en) * 1999-01-01 2000-08-02 Tdk Corp Magnetron sputtering method and production of magnetic recording medium
US6107195A (en) * 1997-06-18 2000-08-22 Tokyo Electron Limited Method for depositing a low-resistivity titanium-oxynitride (TiON) film that provides for good texture of a subsequently deposited conductor layer
US20030013607A1 (en) * 2000-01-27 2003-01-16 Takeshi Morikawa Photocatalyst
CN1594644A (en) * 2004-07-12 2005-03-16 广州粤海真空技术有限公司 Preparation method for TiOxNy highly effective solar photo-thermal conversion film
CN101240944A (en) * 2008-02-21 2008-08-13 常州博士新能源科技有限公司 Solar flat-board heat collector plate core and heat collection plate selective absorption membrane plating method
CN101628492A (en) * 2008-07-15 2010-01-20 比亚迪股份有限公司 Film coating material and preparation method thereof

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN88101654A (en) * 1987-03-26 1988-11-02 Ppg工业公司 Titanium oxynitride spray film
JPH05279846A (en) * 1992-03-30 1993-10-26 Sony Corp Target for sputtering and formation of sputtered tion film
US6107195A (en) * 1997-06-18 2000-08-22 Tokyo Electron Limited Method for depositing a low-resistivity titanium-oxynitride (TiON) film that provides for good texture of a subsequently deposited conductor layer
JP2000212738A (en) * 1999-01-01 2000-08-02 Tdk Corp Magnetron sputtering method and production of magnetic recording medium
US20030013607A1 (en) * 2000-01-27 2003-01-16 Takeshi Morikawa Photocatalyst
CN1594644A (en) * 2004-07-12 2005-03-16 广州粤海真空技术有限公司 Preparation method for TiOxNy highly effective solar photo-thermal conversion film
CN101240944A (en) * 2008-02-21 2008-08-13 常州博士新能源科技有限公司 Solar flat-board heat collector plate core and heat collection plate selective absorption membrane plating method
CN101628492A (en) * 2008-07-15 2010-01-20 比亚迪股份有限公司 Film coating material and preparation method thereof

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Application publication date: 20120314