CN102373413A - Shell and method for manufacturing same - Google Patents
Shell and method for manufacturing same Download PDFInfo
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- CN102373413A CN102373413A CN2010102636649A CN201010263664A CN102373413A CN 102373413 A CN102373413 A CN 102373413A CN 2010102636649 A CN2010102636649 A CN 2010102636649A CN 201010263664 A CN201010263664 A CN 201010263664A CN 102373413 A CN102373413 A CN 102373413A
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- nitrogen
- rete
- matrix
- housing
- titanyl
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Abstract
The invention provides a method for manufacturing a shell. The method comprises the following steps of: providing a transparent substrate; using a titanium target, taking oxygen and nitrogen as the reaction gases, and adopting a magnetron sputtering method to carry out magnetron sputtering on the substrate for 50-70 minutes to form a titanium-oxygen-nitrogen film layer on the other surface of the substrate; and forming a chromium film layer on the titanium-oxygen-nitrogen film layer by magnetron sputtering to enable the L* coordinate value of the chroma area presented by the titanium-oxygen-nitrogen film layer in a CIE (International Commission on Illumination) LAB color system to be 82-85, the a* coordinate value to be minus 3-2 and the b* coordinate value to be 20-23, wherein the surface of the substrate is shielded, the oxygen flow is 12-18sccm, and the nitrogen flow is 115-120sccm. The invention also provides the shell manufactured by the method. The shell has yellow appearance.
Description
Technical field
The present invention relates to a kind of making method and housing obtained by this method of housing.
Background technology
Along with the continuous progress of science and technology, various electronic installations such as mobile phone and computingmachine also develop rapidly, and its function is also more and more abundant.For the shell that makes electronic installation has rich colors more, colored plastic capable of using traditionally forms the colored plastic shell, or forms color layer by the mode of spraying paint at the surface of shell of electronic installation.But, use plastic casing can not present good metal texture.
Magnetron sputtering technique is good because of the film wear resistance of its environmental protection, preparation, product appearance has characteristics such as metal-like, therefore uses more and more wider in ornamental plated film field.Though can on plastic casing, obtain the rete of preferable metal-like through magnetron sputtering, the color of the rete but color not as film-forming process such as baking vanish, anodizing is abundant, has seriously limited the competitive power of magnetron sputtering technique in the decoration film coating field.
Summary of the invention
Given this, be necessary to provide a kind of making method with yellow metal-like housing.
In addition, also be necessary to provide a kind of by the prepared housing of aforesaid method.
Transparent matrix is provided, the surface of matrix is covered, use the titanium target; With oxygen and nitrogen is reactant gases; Oxygen flow is 12～18sccm, and nitrogen flow is 115～120sccm, adopts magnetically controlled sputter method that matrix is carried out magnetron sputtering; Sputtering time is 50～70 minutes, forms titanyl nitrogen rete with another surface at matrix;
On this titanyl nitrogen rete, form the chromium rete with magnetically controlled sputter method; Sputtering time is 0.5 hour; Make chroma areas that this titanyl nitrogen rete one side appears in the L* coordinate figure of CIE LAB colour system between 82 to 85, the a* coordinate figure is between-3 to 2, the b* coordinate figure is between 20 to 23.
A kind of housing that makes by aforesaid method; Comprise transparent matrix and be formed at the composite film on the matrix, this composite film comprises titanyl nitrogen rete and chromium rete, and this titanyl nitrogen rete directly is formed on the surface of matrix; This chromium rete is formed on this titanyl nitrogen rete; Between 82 to 85, the a* coordinate figure is between-3 to 2 in the L* coordinate figure of CIE LAB colour system for the chroma areas that this composite film appears in this titanyl nitrogen rete one side, and the b* coordinate figure is between 20 to 23.
The making method of housing of the present invention is passed through in the surface magnetic control sputtering titanyl nitrogen rete of transparent matrix and the composite film of chromium rete; And through control sputter procedure in flow rate of reactive gas so that said composite film forms specific microtexture; And make said housing demonstrate yellow and the outward appearance of metal-like is arranged; Enrich the color of magnetron sputtering layer, improved the outward appearance competitive power of product.
Description of drawings
Fig. 1 is the cross-sectional schematic of the housing of preferred embodiment of the present invention.
The main element nomenclature
Housing 10
Matrix 11
Internal surface 112
Outside surface 114
Composite film 13
Titanyl nitrogen rete 131
Chromium rete 133
Embodiment
The making method of the housing 10 (as shown in Figure 1) of preferred embodiments of the present invention comprises the steps:
Transparent matrix 11 is provided, and this matrix 11 can be transparent glass or transparent plastics.This matrix 11 comprises internal surface 112 and outside surface 114.
Matrix 11 is carried out surface cleaning,, clean the dry for standby afterwards that finishes with the impurity of removing matrix 11 surface and greasy dirt etc.Said cleaning comprises that matrix 11 is put into the ultrasonic cleaner that is loaded with ethanol and/or acetone soln shakes cleaning.
Outside surface 114 to matrix 11 covers, in case outer surface 114 pollutes when terminating in internal surface 112 and forming composite films 13.Use high temperature gummed tape outer surface 114 to cover at this preferred embodiment.
Matrix 11 is fixed on the magnetron sputtering coater pivoted frame of (figure does not show), vacuumizes cavity to 8 * 10 of this coating equipment
-3Pa; And the temperature that makes this cavity remains on about 0 ℃, and the feeding flow is the high-purity argon gas (working gas) of 400～450sccm (standard state ml/min), is reactant gases with oxygen and nitrogen; Oxygen flow is 12～18sccm, and nitrogen flow is 115～120sccm; Open the power supply of titanium target; Setting power is 8～12kw, and the revolution rotating speed that pivoted frame is set be 3 rpms (revolution per minute, rpm); Internal surface 112 to matrix 11 carries out magnetron sputtering, on this internal surface 112, to form titanyl nitrogen rete 131.The time that sputter forms this titanyl nitrogen rete 131 is 50～70 minutes.
Behind the said titanyl nitrogen of the sputter rete 131, close the titanium target, stop to feed nitrogen and oxygen, opening the chromium target then and regulating the chromium target power output is 8～10kw, proceeds magnetron sputtering, on this titanyl nitrogen rete 131, to form chromium rete 133.The time that sputter forms this chromium rete 133 is 0.5 hour.
After said chromium rete 133 forms, promptly make said composite film 13.
Magnetron sputtering tears high temperature gummed tape after accomplishing.
The outside surface 114 that the composite film of making according to above-mentioned steps 13 sees through matrix 11 is yellow, and has preferable metal-like.(L*, a* b*) are (82～85 ,-3～2,20～23) to the tristimulus coordinates that described composite film 13 appears in titanyl nitrogen rete 131 1 sides.
Because composite film 13 is formed at the internal surface 112 of matrix 11, during use, can be with outside surface 114 as appearance, thereby can avoid composite film 13 scratches or come off.
The making method of said housing 10 is passed through in the internal surface 112 magnetron sputtering titanyl nitrogen retes 131 of transparent matrix 11 and the composite film 13 of chromium rete 133; And through flow rate of reactive gas, sputtering time etc. in the control sputter procedure; So that said composite film 13 forms specific microtexture, and make said housing 10 demonstrate yellow and the outward appearance of metal-like is arranged.
Please consult Fig. 1 again, comprise transparent matrix 11 and be formed at the composite film 13 on the matrix 11 by the prepared housing 10 of aforesaid method.
Matrix 11 can be transparent glass or plastics.Matrix 11 comprises that internal surface 112 reaches and these internal surface 112 opposed outer surface 114, and this outside surface 114 is the appearance of this housing, and this composite film 13 is formed on this internal surface 112.
Composite film 13 comprises titanyl nitrogen rete 131 and chromium rete 133.This titanyl nitrogen rete 131 directly is formed at the internal surface 112 of matrix 11.Chromium rete 133 is formed on this titanyl nitrogen rete 131; The transmittance of said chromium rete 133 is lower, and it can stop light to see through well, plays the effect of substrate for titanyl nitrogen rete 131; Make chroma areas that this composite film 13 appeared in titanyl nitrogen rete 131 1 sides in the L* coordinate figure of CIE LAB colour system between 82 to 85; The a* coordinate figure is between-3 to 2, and the b* coordinate figure is rendered as yellow between 20 to 23.
Be noted that above-mentioned embodiment is merely preferred embodiments of the present invention, those skilled in the art also can do other variation in spirit of the present invention.These all should be included within the present invention's scope required for protection according to the variation that the present invention's spirit is done.
Claims (6)
1. the making method of a housing, it comprises the steps:
Transparent matrix is provided;
Using the titanium target, is reactant gases with oxygen and nitrogen, and oxygen flow is 12～18sccm; Nitrogen flow is 115～120sccm; Adopt magnetically controlled sputter method that matrix is carried out magnetron sputtering, sputtering time is 50～70 minutes, forms titanyl nitrogen rete with the surface at matrix;
On this titanyl nitrogen rete, form the chromium rete with magnetically controlled sputter method; Sputtering time is 0.5 hour; Make chroma areas that this titanyl nitrogen rete one side appears in the L* coordinate figure of CIE LAB colour system between 82 to 85, the a* coordinate figure is between-3 to 2, the b* coordinate figure is between 20 to 23.
2. the making method of housing as claimed in claim 1, it is characterized in that: forming this titanyl nitrogen rete is working gas with the argon gas, and the temperature of plated film cavity remains on 0 ℃, and the power of titanium target is 8～12kw.
3. the making method of housing as claimed in claim 1, it is characterized in that: this chromium rete of magnetron sputtering is a target with the chromium target, and the chromium target power output is 8～10kw.
4. the making method of housing as claimed in claim 1, it is characterized in that: said matrix is transparent glass or plastics.
5. the making method of housing as claimed in claim 1 is characterized in that: said surface shaded to matrix is to adopt high temperature gummed tape to cover.
6. housing that makes by each the described method among the claim 1-5.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010102636649A CN102373413A (en) | 2010-08-26 | 2010-08-26 | Shell and method for manufacturing same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010102636649A CN102373413A (en) | 2010-08-26 | 2010-08-26 | Shell and method for manufacturing same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102373413A true CN102373413A (en) | 2012-03-14 |
Family
ID=45792631
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010102636649A Pending CN102373413A (en) | 2010-08-26 | 2010-08-26 | Shell and method for manufacturing same |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102373413A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1057867A (en) * | 1990-06-29 | 1992-01-15 | 株式会社新铁工所 | Be used to form the method that titanium nitride coating and manufacturing are coated with this plated film container |
| JP2000212738A (en) * | 1999-01-01 | 2000-08-02 | Tdk Corp | Magnetron sputtering method and production of magnetic recording medium |
| CN1594644A (en) * | 2004-07-12 | 2005-03-16 | 广州粤海真空技术有限公司 | Preparation method for TiOxNy highly effective solar photo-thermal conversion film |
| CN101628492A (en) * | 2008-07-15 | 2010-01-20 | 比亚迪股份有限公司 | Film coating material and preparation method thereof |
-
2010
- 2010-08-26 CN CN2010102636649A patent/CN102373413A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1057867A (en) * | 1990-06-29 | 1992-01-15 | 株式会社新铁工所 | Be used to form the method that titanium nitride coating and manufacturing are coated with this plated film container |
| JP2000212738A (en) * | 1999-01-01 | 2000-08-02 | Tdk Corp | Magnetron sputtering method and production of magnetic recording medium |
| CN1594644A (en) * | 2004-07-12 | 2005-03-16 | 广州粤海真空技术有限公司 | Preparation method for TiOxNy highly effective solar photo-thermal conversion film |
| CN101628492A (en) * | 2008-07-15 | 2010-01-20 | 比亚迪股份有限公司 | Film coating material and preparation method thereof |
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|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20120314 |