CN102354244A - Temperature feed-forward compensation method for semiconductor heat treatment process - Google Patents
Temperature feed-forward compensation method for semiconductor heat treatment process Download PDFInfo
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Abstract
The invention discloses a temperature feed-forward compensation method for a semiconductor heat treatment process. The method comprises the following steps of: if the difference value between a current actual temperature and a target temperature is not less than a first preset value, adjusting a given temperature of compensation output according to a temperature rising rate of the target temperature to make the given temperature greater than the target temperature to eliminate the lag of the actual temperature relative to the target temperature; when the difference value between the current actual temperature and the target temperature is less than the first preset value and when the temperature rising rate of the current actual temperature is less than that of the target temperature, adjusting the given temperature of the compensation output according to the difference value between the current actual temperature and the target temperature to make the current actual temperature track the change of the target temperature; and if the difference value between the current actual temperature and a final temperature is less than the difference value between the current actual temperature and the target temperature, adjusting the given temperature of the compensation output according to the final temperature to reduce overshooting. By the method provided by the invention, the temperature can be compensated with high precision in a targeted way; and the method has wide applicability.
Description
Technical field
The present invention relates to semiconductor technology heter temperature control technology field, relate in particular to the compensation method of a kind of semiconductor heat treatment process temperature feed-forward.
Background technology
Along with improving constantly of semiconductor technology and integrated level; PROCESS FOR TREATMENT precision to silicon chip surface is had higher requirement; These all depend on the temperature controlled precision in the technological process; And the variation of temperature process is the process that an inertia adds hysteresis, shortens the process time and then improves production capacity in order to compensate this hysteresis characteristic, in temperature control algorithm, has added the feedforward compensation algorithm.Particularly for vertical many warm areas heat treating equipment; Because heat is assembled to reaction chamber top; And the reaction chamber bottom is bigger because of the reasons in structure thermal loss; If give each warm area identical power input like this, all there is difference the time of warm curve of their liter (falling) and hysteresis, thereby stability and the good temperature field of consistance can't be provided; And feedforward arithmetic can be to the corresponding different offset of hysteresis situation output of each warm area, and the warm process of liter (falling) that makes each warm area is the tracking target temperature curve preferably.
Fig. 1 and Fig. 2 have feedforward compensation and not with the temperature control system schematic diagram of feedforward compensation, in having the temperature control system of feedforward compensating function, three groups of temperature datas are arranged: give fixed temperature, Current Temperatures and target temperature.To fixed temperature is the output valve of feedforward compensation part; Current Temperatures is the actual temperature value that temperature collect module collects; Target temperature is the target temperature value that host computer provides.In the temperature control system that does not have feedforward compensating function, have only two groups of temperature datas: Current Temperatures and target temperature, wherein target temperature is to fixed temperature.One typically not possess feedforward compensation temperature-rise period curve as shown in Figure 3
Solid line is for to fixed temperature, i.e. target temperature, and dotted line be the temperature curve of reality under PID (PID) is controlled; From figure, can see; Through the adjustment of each parameter of PID, curve does not almost have overshoot, and the adjustment time is also very short; It is exactly that actual temperature curve integral body lags behind given temperature curve (being aim curve) that but there is the problem of a maximum in this curve, and this hysteresis is that the inertia and the hysteresis characteristic of heating system itself causes.In order to let the accurately variation of tracking target curve of actual temperature curve, must change given temperature curve accordingly according to the delay degree of system, and this relies on usually the method for feedforward compensation to realize.
Present feedforward compensation mainly contains the combination of two kinds of implementation methods or these two kinds of methods: first kind of size according to the retardation time of every section heating curve, and let well heater heat in advance by different time, play the effect that compensation lags behind.Second method is that superpose step function or the exponential function of beginning and ending phase that heat up comes the inertia and the hysteresis characteristic of compensates process itself.But all there is certain defective in these two kinds of methods: the former need confirm the time of hysteresis through a large amount of experiments, and according to different temperature-rise period definite time of heating in advance of size of retardation time, and applicability is poor; Latter's compensation effect is better, but has the problem of applicability equally.
Summary of the invention
The technical matters that (one) will solve
The technical matters that the present invention will solve is: how providing a kind of can compensate targetedly accurately, and the wider semiconductor heat treatment process temperature feed-forward compensation method of applicability.
(2) technical scheme
For addressing the above problem; The invention provides the compensation method of a kind of semiconductor heat treatment process temperature feed-forward; The method comprising the steps of: if the difference between current actual temperature and the target temperature is not less than the first setting value d; Then compensate the fixed temperature of giving of output, make the said fixed temperature of giving, eliminate the hysteresis of actual temperature with respect to target temperature greater than target temperature according to the heating rate adjustment of said target temperature; If the difference between current actual temperature and the target temperature is less than the first setting value d; And the heating rate of current actual temperature is not less than the heating rate of said target temperature; Then, make said current actual temperature tracking target variation of temperature according to the fixed temperature of giving of the adjustment of the difference between said current actual temperature and target temperature compensation output; If the difference between current actual temperature and the finishing temperature is less than the difference ε between current actual temperature and the target temperature, then according to finishing temperature, what the adjustment compensation was exported gives fixed temperature to reduce overshoot.
Wherein, if the difference between current actual temperature and the target temperature is not less than the first setting value d, what compensation output then was set follows the first feedforward compensation function to fixed temperature, and the said first feedforward compensation function is: f
1(t)=and a * ramp_rate * Δ t+start_temp, wherein, Δ t is the increment of said target temperature at each control cycle, and ramp_rate is the heating rate of said target temperature, and start_temp is an initial temperature, a＞1.
Wherein, If the difference between current actual temperature and the target temperature is less than the first setting value d; And the heating rate of current actual temperature is not less than the heating rate of said target temperature, and what compensation output then was set follows the second feedforward compensation function to fixed temperature, said second feedforward compensation function: the f
2(t)=and set_point+b * ramp_rate+ ε, wherein, set_point is said target temperature, d>=ε.
Wherein, less than the difference ε between current actual temperature and the target temperature, what compensation output then was set follows the 3rd feedforward compensation function to fixed temperature as if the difference between current actual temperature and the finishing temperature, and said the 3rd feedforward compensation function is:
Wherein, g (t)=b * ramp_rate-c * ramp_rate * t, target are said finishing temperature.
Wherein, less than the difference ε between current actual temperature and the target temperature, what compensation output then was set follows the 3rd feedforward compensation function to fixed temperature as if the difference between current actual temperature and the finishing temperature, and said the 3rd feedforward compensation function is: f
3(t)=and target, target is said finishing temperature.
(3) beneficial effect
Method of the present invention adopts syllogic feedforward compensation mode, and every section is adopted penalty function accordingly, has realized targetedly compensation accurately; To the heating system of different qualities, the penalty function in every section can be made variation neatly based on system performance.Having adopted with heating rate and temperature difference is the penalty function of variable; Make method of the present invention especially good compensation effect arranged at heating system heat up different heating rate of limit of power endoadaptation and the temperature-rise period between heating zone for thermal characteristic many warm areas that there is some difference heating system.
Description of drawings
Fig. 1 is the temperature control system synoptic diagram that has feedforward compensation;
Fig. 2 is not for having the temperature control system synoptic diagram of feedforward compensation;
Fig. 3 is not for the PID heating curve of feedforward compensation;
Fig. 4 is the semiconductor heat treatment process temperature feed-forward compensation method process flow diagram according to one embodiment of the present invention;
Fig. 5 (a)-5 (b) is respectively according to the temperature curve under two kinds of disposal routes of intensification latter end in the semiconductor heat treatment process temperature feed-forward compensation method of one embodiment of the present invention;
Fig. 6 is through the temperature curve after the semiconductor heat treatment process temperature feed-forward compensation method compensation of one embodiment of the present invention;
Fig. 7～Fig. 9 is the compensation result curve map of this method at different heating rates and many warm areas.
Embodiment
The semiconductor heat treatment process temperature feed-forward compensation method that the present invention proposes specifies as follows in conjunction with accompanying drawing and embodiment.
In the semiconductor heat treatment facility; A complete technological comprises " intensification-constant temperature-cooling " process that several times are different; The stability in the temperature field in constant temperature stage is mainly determined by the control accuracy of temperature control algorithm itself; And heat up with temperature-fall period for let the actual temperature curve accurately the tracking target curve, eliminate lag behind and overshoot as far as possible little, the thought that the present invention has adopted segmentation to control, the problem that will solve according to liter (falling) warm process different phase is divided into three parts with whole temperature-rise period; Problem to every part is corresponding is carried out different processing; To reach the purpose of meticulous control, having introduced with heating rate and temperature gap is the penalty function of variable, within the specific limits; Can both play satisfied compensation effect for the temperature-rise period between different heating rates and heating zone, expand the applicability of algorithm.If this feedforward compensation mode is transplanted to other platform, only need do the experiment that heats up of big several times speed, can confirm the parameter value of each penalty function according to experimental data, improved the portability of algorithm.
Find in incipient stage and the ending phase of heating up through analyzing; Curve all can experience the adjustment process of a rate temperature change; The adjustment process of intensification incipient stage makes curve produce hysteresis, and the adjustment process of intensification ending phase makes the adjustment time of temperature-rise period elongated.To lag behind in order eliminating, to shorten the adjustment time in the intensification ending phase simultaneously, feedforward compensation method of the present invention is divided into three phases: intensification leading portion, intensification stage casing and intensification latter end in the incipient stage of heating up.
As shown in Figure 1, the semiconductor heat treatment facility temperature feed-forward compensation method that accordings to one embodiment of the present invention comprises step:
If the difference between equipment current actual temperature and the target temperature is not less than the first setting value d; Then get into the phase one, the leading portion that promptly heats up is in order to eliminate hysteresis; Even the difference between actual temperature and the target temperature is as far as possible little, what compensation output was set follows first feedforward compensation function: the f to fixed temperature
1(t)=a * ramp_rate * Δ t+start_temp; Will produce exporting like this greater than the target heating rate to fixed temperature; Because always following given temperature variation, actual temperature changes, so actual temperature can be constantly near target temperature value, when its difference during less than d; Think that the hysteresis of actual temperature has been reduced to the acceptable scope, this stage finishes.
Wherein, Δ t is the increment of said target temperature at each control cycle, and ramp_rate is the heating rate of said target temperature heating curve, and start_temp is an initial temperature; A is the coefficient that draws through experiment; Common a＞1, a * ramp_rate has determined the slope of given temperature curve of phase one, promptly given temperature curve will doubly rise to the speed of current goal heating rate (ramp_rate) with a; The variation of ramp_rate when this slope can be along with each heat up and changing, thus can compensate the temperature-rise period of different heating rates within the specific limits.A is a multiplying power, if the target heating rate is 15 ℃/min, a is 1.5, just becomes 30 ℃/min through the adjusted heating rate of this function so; If the maximum heating rate that temperature system allows is 40 ℃/min, the current target heating rate is 10 ℃/min, and the value of a just can be made as any value between 1～4 so.System lags behind big more, and the value of a will be big more.
If the difference between equipment current actual temperature and the target temperature is less than the first setting value d; And the heating rate of current actual temperature is not less than the heating rate of target temperature; Then get into subordinate phase; Promptly heat up and interrupt, follow the variation of target temperature reposefully in order to make current actual temperature, what compensation output was set follows second feedforward compensation function: the f to fixed temperature
2(t)=and set_point+b * ramp_rate+ ε, wherein, set_point is said target temperature; ε is incorporated into feedforward output, can make actual temperature tracking target temperature better according to the size adjustment compensation output of this difference; Make level and smooth that the actual temperature curve in intensification stage casing becomes simultaneously, d is confirmed by the tracking accuracy of subordinate phase usually, and the size of ε has been reacted the size of tracking accuracy; So as long as than ε big slightly just can, therefore, d>=ε; B be through test definite one with relevant parameter system's retardation time, for the temperature-rise period of different heating rates, the actual temperature curve can be different with respect to the delay degree of target temperature curve; And the length of retardation time is directly proportional with ramp_rate; Therefore, b * ramp_rate has reacted the delay degree of the heating curve of corresponding heating rate, can play good compensating action to the temperature-rise period in certain heating rate scope.Usually the method for confirming b is to carry out the intensification experiment of the feedforward compensation effect that do not have of different heating rates several times; Calculate that actual temperature and target temperature are difference DELTA T in every group of data; Calculate corresponding Δ T/ramp_rate then; The value of getting a compromise gets final product as the value of b, for example the intermediate value of maximal value and minimum value.
If the difference between current actual temperature and the finishing temperature is less than the difference ε between current actual temperature and the target temperature; Then get into the phase III; Latter end promptly heats up; The intensification latter end shortens the adjustment time in order to reduce hyperharmonic, and this is to shortening the whole process time, improving production capacity and play an important role.Be provided with in this stage, what compensation was exported follows the 3rd feedforward compensation function to fixed temperature:
f
3(t)＝target (2)，
Wherein, G (t)=b * ramp_rate-c * ramp_rate * t; Target is said finishing temperature, and parameter c * ramp_rate has directly determined the slope of the given temperature curve of compensation output, and the absolute value of slope is big more; The effect that suppresses the overshoot of actual temperature curve is just strong more, can take all factors into consideration overshoot and the suitable c value of adjustment selection of time according to experimental data.Adopt the difference of formula (1) and formula (2) to be: the former can not make compensation output produce sudden change, but need confirm the value of parameter c based on experiment; The latter can make output produce sudden change, but need not confirm parameter, and is easy to use.Two kinds of methods of experiment proof can both play and reduce the effect that stabilization time is shortened in overshoot well.The value of corresponding ε is different in two kinds of methods, and this need adjust based on experiment, and the corresponding ε value of first method is big usually, and the ε value of second method correspondence is smaller.Temperature curve after two kinds of disposal methods is respectively shown in Fig. 5 (a), 5 (b).
Wherein, the c value is the same with a value, is similarly multiplying power, and obtaining value method is also identical substantially, and c * ramp_rate is the phase III slope of a curve, is to eliminate overshoot because the phase III mainly acts on, and therefore gets c＞1 usually., freely dispose as required with interior value for some special situation c also desirable 1.
To the heating system of different qualities, the penalty function in every section can be made variation neatly based on system performance, for example in intensification leading portion and intensification latter end, the function of in adopting this embodiment, mentioning, also can adopt exponential function or jump function etc.
In the method for the invention; Three variablees of difference size of heating rate, actual temperature and target temperature that will be through stage mark value, target temperature before each stage begins come comprehensive which of entering of judging in stage; After executing, each stage penalty function judges whether to jump out this stage; If condition meets, update stage mark value then, stage mark value are updated that back circulation next time just can not get into should the stage; Successively by the penalty function of carrying out intensification leading portion, intensification stage casing and intensification latter end, finish so in order up to feedforward compensation.In order to prevent because of parameter the excessive overshoot of unreasonable generation to be set, when output, added amplitude limit at the intensification latter end.Usually this amplitude limit value can be definite according to the finishing temperature target of temperature-rise period and the difference DELTA T of actual temperature (temperature gap during not with feedforward compensation between actual temperature curve and the target temperature curve); Initial value can be taken as target+ Δ T, and then adjusts a little according to the experiment situation and to get final product.
The size of the heating rate scope that feedforward compensation method of the present invention can compensate depends on the heating efficiency (being maximum heating rate) of heating system itself and the size of a value, and the maximum heating rate of supposing a heating system is Ramp
Max, the heating rate of this method maximum that can compensate is Ramp so
Max/ a.Because each penalty function has stage by stage all been introduced heating rate and has been done parameter; And the difference of actual temperature and target temperature introduced the initial Rule of judgment in each stage; In the temperature-rise period of same group of parameter at different heating rates, the time that each stage continued is dynamic change like this.For the big temperature-rise period of heating rate large time delay, the time that the intensification leading portion continues will be elongated, otherwise for the little temperature-rise period of the little hysteresis of heating rate, the time that the intensification leading portion continues will be very short.
Feedforward compensation method of the present invention has been introduced the thought of segmentation control; Through segmentation refinement to temperature-rise period; Adopt different penalty functions to carry out different processing to every section; Thereby realized high-accuracy compensation; And in penalty function, introduced heating rate (ramp_ate) as variable, made whole backoff algorithm can adapt to the temperature-rise period between different heating rates and different heating zones like this, solved conventional feed forward backoff algorithm problem poor for applicability and can play good compensation effect for many warm areas heating system.Shown in Figure 6, be the temperature curve synoptic diagram after the compensation method compensation that accordings to one embodiment of the present invention.Fig. 7～Fig. 9 is the compensation result curve map of this method at different heating rates and many warm areas.
Above embodiment only is used to explain the present invention; And be not limitation of the present invention; The those of ordinary skill in relevant technologies field under the situation that does not break away from the spirit and scope of the present invention, can also be made various variations and modification; Therefore all technical schemes that are equal to also belong to category of the present invention, and scope of patent protection of the present invention should be defined by the claims.
Claims (5)
1. semiconductor heat treatment process temperature feed-forward compensation method is characterized in that the method comprising the steps of:
If the difference between current actual temperature and the target temperature is not less than the first setting value d; Then compensate the fixed temperature of giving of output based on the heating rate adjustment of said target temperature; Make the said fixed temperature of giving greater than target temperature, eliminate the hysteresis of actual temperature with respect to target temperature;
If the difference between current actual temperature and the target temperature is less than the first setting value d; And the heating rate of current actual temperature is not less than the heating rate of said target temperature; Then, make said current actual temperature tracking target variation of temperature according to the fixed temperature of giving of the adjustment of the difference between said current actual temperature and target temperature compensation output;
If the difference between current actual temperature and the finishing temperature is less than the difference ε between current actual temperature and the target temperature, then according to finishing temperature, what the adjustment compensation was exported gives fixed temperature to reduce overshoot.
2. semiconductor heat treatment process temperature feed-forward as claimed in claim 1 compensation method; It is characterized in that; If the difference between current actual temperature and the target temperature is not less than the first setting value d; What compensation output then was set follows the first feedforward compensation function to fixed temperature, and the said first feedforward compensation function is: f
1(t)=and a * ramp_rate * Δ t+start_temp, wherein, Δ t is the increment of said target temperature at each control cycle, and ramp_rate is the heating rate of said target temperature, and start_temp is an initial temperature, a＞1.
3. semiconductor heat treatment process temperature feed-forward as claimed in claim 2 compensation method; It is characterized in that; If the difference between current actual temperature and the target temperature is less than the first setting value d; And the heating rate of current actual temperature is not less than the heating rate of said target temperature, and what compensation output then was set follows the second feedforward compensation function to fixed temperature, said second feedforward compensation function: the f
2(t)=and set_point+b * ramp_rate+ ε, wherein, set_point is said target temperature, d>=ε.
4. semiconductor heat treatment process temperature feed-forward as claimed in claim 3 compensation method; It is characterized in that; If the difference between current actual temperature and the finishing temperature is less than the difference ε between current actual temperature and the target temperature; What compensation output then was set follows the 3rd feedforward compensation function to fixed temperature, and said the 3rd feedforward compensation function is:
Wherein, g (t)=b * ramp_rate-c * ramp_rate * t, target are said finishing temperature.
5. semiconductor heat treatment process temperature feed-forward as claimed in claim 3 compensation method; It is characterized in that; If the difference between current actual temperature and the finishing temperature is less than the difference ε between current actual temperature and the target temperature; What compensation output then was set follows the 3rd feedforward compensation function to fixed temperature, and said the 3rd feedforward compensation function is: f
3(t)=and target, target is said finishing temperature.
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