CN102337519A - Device and method for preventing gas return of reaction chamber - Google Patents
Device and method for preventing gas return of reaction chamber Download PDFInfo
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- CN102337519A CN102337519A CN2011102736938A CN201110273693A CN102337519A CN 102337519 A CN102337519 A CN 102337519A CN 2011102736938 A CN2011102736938 A CN 2011102736938A CN 201110273693 A CN201110273693 A CN 201110273693A CN 102337519 A CN102337519 A CN 102337519A
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- reaction chamber
- tail gas
- gas pump
- vacuum breaker
- prevents
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Abstract
The invention provides a device and method for preventing gas return of a reaction chamber. The device comprises the reaction chamber and a tail gas pump communicated with the reaction chamber; and a one-way valve is arranged between the reaction chamber and the tail gas pump. The method comprises a step of mounting the one-way valve between the reaction chamber and the tail gas pump; and the one-way valve arranged between a butterfly valve and the tail gas pump can block the tail gas at the outside of the reaction chamber immediately in case of an emergent power fault so as to prevent the reaction chamber from being polluted. The invention has the advantages of simple structure and operation, low cost and energy source economization.
Description
Technical field
The invention belongs to the MOCVD production technical field, be specifically related to a kind of device and method that prevents the anti-gas of reaction chamber.
Background technology
MOCVD is an organometallics
Chemical vapor depositionThe literary composition abbreviation is used in the English source of (Metal-organic Chemical Vapor Deposition), and in MOCVD produced, under the normal circumstances, chamber pressure was 20torr, and the tail gas pumping pressure is 760torr, through the tail gas pump reacted tail gas is extracted out.But owing to reasons such as accident cause that when shutting off power in emergency, the tail gas pump can quit work, produce negative pressure between reaction chamber and the tail gas pump this moment, causes tail gas to flow to reaction chamber and produce anti-gas from the tail gas blowback, and this anti-gas can pollute reaction chamber, very big to the production unit influence.Solution mainly is to adopt UPS (sustainable power supply) at present, meet an urgent need through the sustainable power supply of the short period of time of UPS, but for this main equipment of MOCVD, the charging capacity of need UPS is very big just to meet the demands, and UPS costs an arm and a leg.
Summary of the invention
In order to overcome the shortcoming of above-mentioned prior art; The object of the present invention is to provide a kind of device and method that prevents the anti-gas of reaction chamber; Adopt this device and method, when shutting off power in emergency, can tail gas be blocked in the reaction chamber outside in the very first time; Prevent that reaction chamber is contaminated, have structure and characteristics simple to operate, cheap, save energy.
To achieve these goals, the technical scheme of the present invention's employing is:
A kind of device that prevents the anti-gas of reaction chamber includes the tail gas pump 7 that reaction chamber 1 and reaction chamber 1 are connected, and between reaction chamber 1 and tail gas pump 7, is provided with vacuum breaker 6.
A kind of device that prevents the anti-gas of reaction chamber; Include reaction chamber 1; The tail gas pump 7 that is connected with reaction chamber 1; Concrete mode of connection also is provided with first manual ball valve 2, strainer 3, second manual ball valve 4, butterfly valve 5 successively between reaction chamber 1 and tail gas pump 6, between butterfly valve 5 and tail gas pump 7, be provided with vacuum breaker 6.
Said vacuum breaker 6 for air-flow can only one direction flow can not reversed flow direction control valve.
The forward pressure reduction of said vacuum breaker 6 is greater than 25torr.
The material of said vacuum breaker 6 is a stainless material.
A kind of method that prevents the anti-gas of reaction chamber is installed vacuum breaker 6 between reaction chamber 1 and tail gas pump 7.
, cleans out by vacuum breaker 6 interface of connection before being installed.
Device and method of the present invention solves anti-gas problem through a vacuum breaker 6 is installed between reaction chamber 1 and tail gas pump 7; Utilize the unidirectional conducting principle of vacuum breaker 6; When shutting off power in emergency, tail gas pump 7 quits work, and vacuum breaker 6 can prevent that tail gas is back to reaction chamber 1 from tail gas pump 7; Prevent that reaction chamber 1 is contaminated, these apparatus and method have structure and characteristics simple to operate, cheap, save energy.
Description of drawings
Accompanying drawing is the structural representation of apparatus of the present invention.
Embodiment
Below in conjunction with accompanying drawing the present invention is done further explain.
Shown in accompanying drawing, a kind of device that prevents the anti-gas of reaction chamber of the present invention includes reaction chamber 1; Reaction chamber 1 is connected with tail gas pump 7; Between reaction chamber 1 and tail gas pump 7, be provided with first manual ball valve 2, strainer 3, second manual ball valve 4, butterfly valve 5 successively, between butterfly valve 5 and tail gas pump 7, be provided with vacuum breaker 6, reaction chamber 1 is used for the growing epitaxial sheet; Isolate with first manual ball valve 2 and second manual ball valve 4 respectively when maintenance or cleaning reaction chamber 1 and strainer 3; The effect of butterfly valve 5 is control pressures, and tail gas pump 7 is to be used for taking out reaction chamber gas, the pressure of control reaction chamber 1.
A kind of method that prevents the anti-gas of reaction chamber of the present invention is installed vacuum breaker 6 between reaction chamber 1 and tail gas pump 7, this vacuum breaker 6 is installed between butterfly valve 5 and the tail gas pump 7, before vacuum breaker 6 is installed, cleans out the interface of connection, leaks in the gas preventing.
Principle of work of the present invention is: solve anti-gas problem through a vacuum breaker 6 is installed between reaction chamber 1 and tail gas pump 7; Utilize the unidirectional conducting principle of vacuum breaker; When shutting off power in emergency; Tail gas pump 7 quits work, and the vacuum breaker 6 that is located between butterfly valve 5 and the tail gas pump 7 can prevent that tail gas from flowing to reaction chamber and producing anti-gas from the tail gas blowback, prevents that reaction chamber 1 is contaminated.
Claims (7)
1. a device that prevents the anti-gas of reaction chamber includes reaction chamber (1), and the tail gas pump (7) that is connected of reaction chamber (1), it is characterized in that: between reaction chamber (1) and tail gas pump (7), be provided with vacuum breaker (6).
2. device according to claim 1; It is characterized in that: between reaction chamber (1) and tail gas pump (7), be provided with first manual ball valve (2), strainer (3), second manual ball valve (4) and butterfly valve (5) successively, between butterfly valve (5) and tail gas pump (7), be provided with vacuum breaker (6).
3. device according to claim 1 and 2 is characterized in that: said vacuum breaker (6) for air-flow can only one direction flow can not reversed flow direction control valve.
4. device according to claim 2 is characterized in that: the forward pressure reduction of said vacuum breaker (6) is greater than 25torr.
5. device according to claim 2 is characterized in that: the material of said vacuum breaker (6) is a stainless material.
6. a method that prevents the anti-gas of reaction chamber is characterized in that: between reaction chamber (1) and tail gas pump (7), vacuum breaker (6) is installed.
7. method according to claim 5 is characterized in that: the preceding interface of cleaning out connection of vacuum breaker (6) is being installed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011102736938A CN102337519A (en) | 2011-09-15 | 2011-09-15 | Device and method for preventing gas return of reaction chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011102736938A CN102337519A (en) | 2011-09-15 | 2011-09-15 | Device and method for preventing gas return of reaction chamber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102337519A true CN102337519A (en) | 2012-02-01 |
Family
ID=45513462
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011102736938A Pending CN102337519A (en) | 2011-09-15 | 2011-09-15 | Device and method for preventing gas return of reaction chamber |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102337519A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104962863A (en) * | 2015-05-06 | 2015-10-07 | 中国科学院广州能源研究所 | Atomic-level vacuum gaseous 3 D printing system |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5948169A (en) * | 1998-03-11 | 1999-09-07 | Vanguard International Semiconductor Corporation | Apparatus for preventing particle deposition in a capacitance diaphragm gauge |
| CN1546201A (en) * | 2003-12-09 | 2004-11-17 | 西北工业大学 | Method and apparatus for exhaust gas treatment in chemical vapor deposition / chemical gas phase penetration processes |
-
2011
- 2011-09-15 CN CN2011102736938A patent/CN102337519A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5948169A (en) * | 1998-03-11 | 1999-09-07 | Vanguard International Semiconductor Corporation | Apparatus for preventing particle deposition in a capacitance diaphragm gauge |
| CN1546201A (en) * | 2003-12-09 | 2004-11-17 | 西北工业大学 | Method and apparatus for exhaust gas treatment in chemical vapor deposition / chemical gas phase penetration processes |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104962863A (en) * | 2015-05-06 | 2015-10-07 | 中国科学院广州能源研究所 | Atomic-level vacuum gaseous 3 D printing system |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20120201 |