CN102314072A - Comparison management method for particle attached to mask plate - Google Patents
Comparison management method for particle attached to mask plate Download PDFInfo
- Publication number
- CN102314072A CN102314072A CN2010102164667A CN201010216466A CN102314072A CN 102314072 A CN102314072 A CN 102314072A CN 2010102164667 A CN2010102164667 A CN 2010102164667A CN 201010216466 A CN201010216466 A CN 201010216466A CN 102314072 A CN102314072 A CN 102314072A
- Authority
- CN
- China
- Prior art keywords
- mask
- particle
- comparison
- magnitude
- standard
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention provides a comparison management method for particles attached to a mask plate, which comprises the following steps: setting comparison standards for particles attached to mask plats at different levels according to the levels of the mask plates; delivering the mask plates into a scanning machine for scanning of the particles to obtain scanning results; and selecting the set comparison standards for the particles attached to the mask plates at the corresponding levels according to the levels of the mask plates; comparing the scanning results and the comparison standards, listing the mask plates complying with the standards into an array of mask plates to be distributed, and listing the mask plates non-conforming to the standards into an array of mask plates to be cleaned. By adopting the method, whether the particles on the mask plates at different levels exceeds the standards can be determined accurately, the labor and cost can be greatly saved, the operation can be facilitated, and the working efficiency can be increased.
Description
Technical field
The present invention relates to the technical field of lithography that semiconductor is made, particularly a kind of mask attaching particles thing comparison management method.
Background technology
In semiconductor fabrication process, photoetching process is one of comparatively complicated technology.Mask is to be used for through photoetching process the additional device of complicated circuitry graphic pattern projection on the wafer surface, thus mask be be used in concrete manufacturing process in the parts that are associated of machine or equipment.Therefore, depend on the manufacturing process that will carry out, different masks must be assigned to different machines or equipment.In addition, at given time, have several masks and need be assigned to a certain particular machines or equipment.For this reason, can develop a kind of computing machine mask management system usually and optimize adjustmenting management mask.In the prior art, mask need be placed into usually before getting into the mask management system to scanning machine and carry out particle scanning, to confirm the particle conformance with standard whether on this mask.This mask is stopped entering mask management system if the particle on the mask exceeds standard then; If the particle conformance with standard on the mask then this mask entering mask management system is assigned to a particular machines or equipment.But in the prior art for the particle on the mask of scanning back whether exceed standard usually just artificial the mask management system outside fixed standard of individual setting, read particle scanning result on the scanning machine through manual work and come artificially to judge through the particle on the mask that scans whether in the critical field of setting.But mask is divided into a plurality of grades (for example A-Z level) according to the fine degree of pattern on it usually; The permissible value that has particle on the mask of different brackets is different; Therefore; Through the method for prior art judge particle on the mask whether exceed standard can not accomplish meticulous accurately, and need expend more human cost.
Summary of the invention
The technical matters that the present invention will solve provides a kind of mask attaching particles thing comparison management method, with the mask attaching particles thing comparison method that solves prior art can not accomplish meticulous accurately and need expend the problem of more human cost.
For solving the problems of the technologies described above, the present invention provides a kind of mask attaching particles thing comparison management method, may further comprise the steps:
Comparison standard according to attaching particles thing on the mask of the level setting different brackets of mask;
Mask sent into carry out particle scanning in the scanning machine, draw scanning result;
The comparison standard of the corresponding mask attaching particles thing of selecting according to the grade of mask to have set; And scanning result compared with this comparison standard; If conformance with standard then this mask be put into mask array to be allocated, if do not meet standard then this mask be put into mask array to be cleaned.
Optional, said scanning result comprises the size of each particle on the mask.
Optional, the comparison standard of attaching particles thing comprises that the particle of criterion and each order of magnitude of the order of magnitude of attaching particles thing on these grades mask can allow the maximum numbers that exist on the mask of said different brackets.
Optional, said scanning result is comprised with the step that this comparison standard compares: the order of magnitude of at first confirming each particle in the said scanning result according to the particle order of magnitude comparison standard of setting in the selected comparison standard; Secondly, the particle quantity of each order of magnitude is added up; The particle of each order of magnitude that sets in the particle quantity of each order of magnitude that at last statistics is obtained and the selected comparison standard can allow maximum numbers of existence to compare.
Optional, said conformance with standard is the particle quantity of arbitrary order of magnitude allows existence smaller or equal to the particle of corresponding order of magnitude in the comparison standard maximum numbers.
Mask attaching particles thing provided by the invention comparison management method can be embodied as many grades mask to be set different attaching particles thing comparison standards and automatable realization the particle scanning result of mask is compared with corresponding mask attaching particles thing comparison standard, thereby can confirm that this mask still can distribute mask for needing washing mask.The inventive method can be meticulous confirms accurately whether the particle on the mask of different brackets exceeds standard and can practice thrift a large amount of human costs, and handled easily has improved work efficiency.
Description of drawings
Fig. 1 is the process flow diagram of mask attaching particles thing comparison management method of the present invention.
Embodiment
For make above-mentioned purpose of the present invention, feature and advantage can be more obviously understandable, does detailed explanation below in conjunction with the accompanying drawing specific embodiments of the invention.
Mask attaching particles thing comparison management method of the present invention multiple substitute mode capable of using realizes; Be to explain below through preferred embodiment; Certainly the present invention is not limited to this specific embodiment, and the general replacement that the one of ordinary skilled in the art knew is encompassed in protection scope of the present invention undoubtedly.
Secondly, the present invention utilizes synoptic diagram to describe in detail, and when the embodiment of the invention was detailed, for the ease of explanation, synoptic diagram disobeyed that general ratio is local amplifies, should be with this as to qualification of the present invention.
See also Fig. 1, Fig. 1 is the process flow diagram of mask attaching particles thing comparison management method of the present invention.As shown in Figure 1, mask attaching particles thing comparison management method of the present invention may further comprise the steps:
At first; According to the comparison standard of attaching particles thing on the mask of the level setting different brackets that mask divided, the comparison standard of attaching particles thing comprises that the particle of criterion and each order of magnitude of the order of magnitude of attaching particles thing on these grades mask can allow the maximum numbers that exist on the mask of said different brackets in the mask management system.
Please referring to table 1, table 1 is a kind of embodiment example according to the comparison standard of attaching particles thing on the mask of the level setting different brackets that mask divided.
| Mask grade (A-Z level) | The magnitude range of small particle (um) | The magnitude range (um) of middle particle | The magnitude range of bulky grain thing (um) | The permission quantity of small particle | The permission quantity of middle particle | The permission quantity of bulky grain thing |
| The A-C level | 0-30 | 30-50 | More than 50 | 100 | 10 | 0 |
| The C-D level | 0-20 | 20-40 | More than 40 | 80 | 8 | 0 |
Table 1
Secondly, mask is sent into carried out particle scanning in the scanning machine.
Once more, the scanning result of said scanning machine and the grade of mask are inputed to the mask management system; Said scanning result comprises the size of each particle on the mask.
At last, be chosen in the comparison standard of the corresponding mask attaching particles thing of having set in the mask management system, and scanning result is compared with this comparison standard according to the grade of mask.At first confirm the order of magnitude of each particle in the said scanning result according to the particle order of magnitude comparison standard of setting in the selected comparison standard; Secondly, the particle quantity of each order of magnitude is added up; The particle of each order of magnitude that sets in the particle quantity of each order of magnitude that at last statistics is obtained and the selected comparison standard can allow maximum numbers of existence to compare; If the particle quantity of arbitrary order of magnitude exceeded maximum numbers that the particle of this order of magnitude in the selected comparison standard allows to exist then this mask be put into mask array to be cleaned, otherwise this mask is put into mask array to be allocated.
Obviously, those skilled in the art can carry out various changes and modification to the present invention and not break away from the spirit and scope of the present invention.Like this, belong within the scope of claim of the present invention and equivalent technologies thereof if of the present invention these are revised with modification, then the present invention also is intended to comprise these changes and modification interior.
Claims (5)
1. a mask attaching particles thing is compared management method, may further comprise the steps:
Comparison standard according to attaching particles thing on the mask of the level setting different brackets of mask;
Mask sent into carry out particle scanning in the scanning machine, draw scanning result;
The comparison standard of the corresponding mask attaching particles thing of selecting according to the grade of mask to have set; And scanning result compared with this comparison standard; If conformance with standard then this mask be put into mask array to be allocated, if do not meet standard then this mask be put into mask array to be cleaned.
2. mask attaching particles thing comparison management method as claimed in claim 1 is characterized in that said scanning result comprises the size of each particle on the mask.
3. mask attaching particles thing comparison management method as claimed in claim 1; It is characterized in that the comparison standard of attaching particles thing comprises that the particle of criterion and each order of magnitude of the order of magnitude of attaching particles thing on these grades mask can allow the maximum numbers that exist on the mask of said different brackets.
4. mask attaching particles thing comparison management method as claimed in claim 3; It is characterized in that, said scanning result is comprised with the step that this comparison standard compares: the order of magnitude of at first confirming each particle in the said scanning result according to the particle order of magnitude comparison standard of setting in the selected comparison standard; Secondly, the particle quantity of each order of magnitude is added up; The particle of each order of magnitude that sets in the particle quantity of each order of magnitude that at last statistics is obtained and the selected comparison standard can allow maximum numbers of existence to compare.
5. like claim 1 or 4 described mask attaching particles thing comparison management methods, it is characterized in that said conformance with standard is the particle quantity of arbitrary order of magnitude allows existence smaller or equal to the particle of corresponding order of magnitude in the comparison standard maximum numbers.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010102164667A CN102314072A (en) | 2010-06-30 | 2010-06-30 | Comparison management method for particle attached to mask plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010102164667A CN102314072A (en) | 2010-06-30 | 2010-06-30 | Comparison management method for particle attached to mask plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102314072A true CN102314072A (en) | 2012-01-11 |
Family
ID=45427353
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010102164667A Pending CN102314072A (en) | 2010-06-30 | 2010-06-30 | Comparison management method for particle attached to mask plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102314072A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106933062A (en) * | 2017-03-10 | 2017-07-07 | 上海华力微电子有限公司 | A kind of appraisal procedure of light shield particle size |
| CN107632495A (en) * | 2017-08-16 | 2018-01-26 | 上海华力微电子有限公司 | A kind of mask plate micronic dust impact evaluation method and system |
| CN108152329A (en) * | 2016-12-05 | 2018-06-12 | 中芯国际集成电路制造(上海)有限公司 | A kind of detecting system and detection method of light shield vacuum cup regional pollution object |
-
2010
- 2010-06-30 CN CN2010102164667A patent/CN102314072A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108152329A (en) * | 2016-12-05 | 2018-06-12 | 中芯国际集成电路制造(上海)有限公司 | A kind of detecting system and detection method of light shield vacuum cup regional pollution object |
| CN106933062A (en) * | 2017-03-10 | 2017-07-07 | 上海华力微电子有限公司 | A kind of appraisal procedure of light shield particle size |
| CN107632495A (en) * | 2017-08-16 | 2018-01-26 | 上海华力微电子有限公司 | A kind of mask plate micronic dust impact evaluation method and system |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Johansson | Discrete orthogonal polynomial ensembles and the Plancherel measure | |
| CN102314072A (en) | Comparison management method for particle attached to mask plate | |
| CN101996359A (en) | Dispatching method of semiconductor manufacturing process | |
| CN104915885A (en) | Processing method and device for credit business | |
| CN102129164A (en) | Method and system for judging mask defects | |
| CN101064643A (en) | Method for updating software of remote terminal RF unit in wireless communication system | |
| CN104192652B (en) | The method of protection electric life controller parameter safety and elevator | |
| CN104199738B (en) | A kind of more data processing equipment collaboration working methods and system | |
| TW200501304A (en) | Semiconductor manufacturing system | |
| CN103995439B (en) | A kind of method determining lithographic process window online | |
| US9188853B2 (en) | Charged particle beam drawing apparatus and control method thereof | |
| CN102123398B (en) | Dynamic scheduling method for carrier frequency certificates | |
| CN103179607A (en) | Method and device for optimizing configuration of network frequency scrambling codes | |
| CN101414250B (en) | Method and system for allocating operations when simultaneously printing multiple printers | |
| Hsieh | Reconfigurable fault tolerant deadlock avoidance controller synthesis for assembly production processes | |
| CN102316590A (en) | Method and base station side equipment for resource defragmentation in long term evolution system | |
| CN103869231B (en) | A kind of probe card automatic replacing options of wafer acceptability test | |
| CN112596884B (en) | Task adjusting method and device | |
| CN105182916B (en) | Semiconductor production constrains management-control method | |
| CN204431035U (en) | A kind of grinding table top | |
| CN100518441C (en) | Method for realizing reutilization in printed circuit board design | |
| CN102262566A (en) | Interrupt processing method and system based on interrupt nesting | |
| CN108227508B (en) | Wafer loading and unloading platform efficiency monitoring method | |
| CN101441979A (en) | Method for optimizing silicon chip etching condition | |
| CN101963964A (en) | Method and device for controlling access to management system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20120111 |