CN102298278A - Focusing and levelling detection device and method - Google Patents

Focusing and levelling detection device and method Download PDF

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Publication number
CN102298278A
CN102298278A CN2010102099920A CN201010209992A CN102298278A CN 102298278 A CN102298278 A CN 102298278A CN 2010102099920 A CN2010102099920 A CN 2010102099920A CN 201010209992 A CN201010209992 A CN 201010209992A CN 102298278 A CN102298278 A CN 102298278A
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hot spot
focusing
focus height
detection device
defocush
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CN102298278B (en
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田湍
陈飞彪
李志丹
潘炼东
魏礼俊
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Shanghai Micro Electronics Equipment Co Ltd
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Shanghai Micro Electronics Equipment Co Ltd
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Abstract

The invention relates to a focusing and leveling detection device and method. The device is provided with an oblique incidence detection optical system, a vibration reflecting mirror optical system, a digital-photoelectric detection device, a focusing and leveling measuring detection device controller and a moving table controller. The device is used for measuring the out-of-focus height by utilizing the quantization relation between the position deviation and the time slot of a detection facula on the digital-photoelectric detection device, which is formed by adjusting the vibration caused by the out-of-focus height through a vibration reflecting mirror, ad therefore the focusing and the leveling are realized. According to the focusing and leveling detection method, a digitalized detection method is adopted, therefore the defect that an analog circuit is easy to be affects by environment factors, such as light, electromagnet, heat, and the like is basically eliminated, the antijamming performance of the focusing and leveling detection system is remarkably enhanced, the further improvement of the focusing and leveling precision and the measuring stability are facilitated.

Description

A kind of focusing-levelling detection device and method
Technical field
The present invention relates to field of lithography, relate in particular to the focusing-levelling detection device and the method for lithographic equipment.
Background technology
A kind of focusing-levelling detection device and method have been put down in writing in the U.S. Pat 4650983, wherein adopt oscillating mirror to modulate to comprise testee (such as Semiconductor substrate or silicon chip) the surface light signal of the out of focus elevation information of litho machine projection optical system focal plane relatively, and make light signal be transformed into the analog electrical signal that comprises the out of focus elevation information by light-sensitive detector through the oscillating mirror modulation, from analog electrical signal, demodulate actual out of focus altitude information by phase demodulation (PSD) circuit more at last.In this focusing and leveling detection scheme,, can introduce the neighbourhood noise that is difficult to eliminate to analog measuring circuit because analog electrical signal is subjected to Effect of Environmental such as light, electromagnetism and heat easily.In addition, because analog measuring circuit is to environment sensitive, so the analog module of focusing and leveling detection system must carry out particular design with respect to the layout of system's bare engine module, this brings difficulty for the analog module of focusing and leveling detection system and the topological design of bare engine module.
Summary of the invention
The object of the present invention is to provide a kind of focusing-levelling detection device and detection method, overcome the above-mentioned defective that exists in the prior art.
A kind of focusing-levelling detection device comprises:
The oblique incidence detection optical system, have light source and lighting device, projection slit, first plane mirror and second plane mirror, reflex to substrate surface by first plane mirror from the light of light source and lighting device outgoing after projection slit, substrate surface reflexes to second plane mirror with light;
The oscillating mirror optical system, have oscillating mirror and oscillating mirror driver, the reflecting surface of vibration reflection driver drives oscillating mirror is done periodically simple harmonic oscillation around its turning axle, is incident on the oscillating mirror from the light of the second plane mirror outgoing;
The digital light electric detection device will change digital signal output from the light signal that shines the detection hot spot on its photosensitive surface of the second plane mirror outgoing into;
The focusing and leveling measurement apparatus controller, the output signal of reception digital light electric detection device is calculated also output out of focus height.
Preferably, also comprise motion platform controller, receive the out of focus height of focusing and leveling measurement apparatus controller output, substrate surface is adjusted to the best optics focal plane height and position of projection optical system according to this out of focus height actuation movement platform.
Wherein, projection slit is the projection slit array, and this projection slit array forms projected light beam and measures spot array on substrate surface;
The digital light electric detection device is a digital light electric detection device array, wherein each digital light electric detection device all lip-deep one of corresponding substrate independently measure hot spot;
The focusing and leveling measurement apparatus controller receives one group of output signal of digital light electric detection device array output, the all corresponding independent measurement hot spot of measuring in the spot array of each output signal wherein, the out of focus height of focusing and leveling measurement apparatus controller output are substrate surface with respect to whole out of focus height of best optics focal plane and degree of tilt position deviation.
Preferably, also comprise motion platform controller, receive whole out of focus height of focusing and leveling measurement apparatus controller output, substrate surface is adjusted to the best optics focal plane height and position of projection optical system according to above-mentioned whole out of focus height actuation movement platform.
Wherein, above-mentioned motion platform controller receives above-mentioned degree of tilt position deviation, according to above-mentioned degree of tilt position deviation actuation movement platform with the substrate surface leveling.
Wherein, set when there is not the out of focus height in substrate surface, oscillating mirror detects the geometric center of hot spot when the vibration balancing position and the geometric center of photosensitive surface overlaps, then when there is out of focus height DefocusH in substrate surface, there is deviation e in Z-direction in oscillating mirror detects hot spot when the vibration balancing position geometric center Pe with respect to the geometric center of photosensitive surface; When the reflecting surface of oscillating mirror is done in the process of periodically simple harmonic oscillation around its turning axle Pr, in plane, photosensitive surface place, detecting hot spot will be along Z-direction, with the Pe position is that periodic wobble is made at the center, deviation e is demarcated in advance at scope [E3, E3] in, according to the relation between deviation e and the output signal time waveform changing features amount row time corresponding amount, establish the quantitative relationship between out of focus height DefocusH and the output signal time waveform changing features amount, passing through counting in the testing process obtains after the output signal time waveform changing features amount one row time corresponding amount, according to demarcating the above-mentioned quantitative relationship of coming out in advance, calculate out of focus height DefocusH;
Wherein, the optical axis of the projection optical system in the alignment device is the Z axle; The amplitude that detects the hot spot periodic wobble is Amp, and effective photosensitive surface of digital light electric detection device is D1 along the width of Z-direction, and detecting hot spot is D2 along the Z-direction width, and amplitude A mp is greater than half of D1 and D2 sum, E3=(D1+D2)/2+Amp.
Wherein, when there is out of focus height DefocusH in substrate surface, when being positioned at the vibration balancing position, be 45 degree from the incident angle on the relative oscillating mirror of the detection light beam surface of oblique incidence detection optical system second plane mirror output on the oscillating mirror surface.
Wherein, when there is out of focus height DefocusH in substrate surface, when the oscillating mirror surface is positioned at the vibration balancing position, the detection light beam of above-mentioned second plane mirror output is because the lateral excursion ee that out of focus height DefocusH takes place, above-mentioned lateral excursion ee=kk*e, wherein kk is a proportionality constant.
Wherein, during above-mentioned detection light beam vertical incidence photosensitive surface, aforementioned proportion constant k k=1.
Focusing and leveling detection method of the present invention and device adopt digital circuit to substitute light-sensitive detector in the focusing and leveling detection scheme of prior art and phase demodulation analog circuitry systems such as (PSD), to directly change the digital circuit output signal into by the digital light electric detection device through the light signal of oscillating mirror modulation, and the digital output signal that comprises the out of focus elevation information by counting calculates actual out of focus altitude information in the temporal characteristics amount of the time domain waveform of oscillating mirror in time vibration period.This kind focusing and leveling detection scheme has adopted digitizing detection method, substantially eliminated the drawback that mimic channel is subject to such environmental effects such as light, electromagnetism and heat, significantly strengthen the interference free performance of focusing and leveling detection system, helped the further raising of focusing and leveling accuracy of detection and measurement stability.The layout of the metering circuit module relative system bare engine module of focusing and leveling detection system need not to carry out particular design simultaneously, has made things convenient for the topological design of metering circuit module and system's bare engine module.
Description of drawings
Figure 1 shows that structural representation according to the preferred embodiment of focusing-levelling detection device of the present invention;
Figure 2 shows that and detect the feature locations synoptic diagram that hot spot is swung positive half cycle;
Figure 3 shows that the output signal time waveform synoptic diagram of the feature locations correspondence among Fig. 2;
Figure 4 shows that the feature locations synoptic diagram that detects hot spot swing negative half period;
Figure 5 shows that the output signal time waveform synoptic diagram of the feature locations correspondence among Fig. 4;
Fig. 6 and the typical circuit structural representation that Figure 7 shows that the digital light electric detection device;
Figure 8 shows that and detect the amplitude synoptic diagram that hot spot is made periodic wobble;
Figure 9 shows that the light path synoptic diagram when detecting hot spot departs from its oscillation centre position in the periodic wobble process.
Embodiment
Below, describe in detail according to a preferred embodiment of the invention in conjunction with the accompanying drawings.For convenience of description and highlight the present invention, omitted existing associated components in the prior art in the accompanying drawing, and will omit description these well-known components.
First embodiment
A preferred embodiment of focusing and leveling detection method of the present invention and device as shown in Figure 1.
For embodiment illustrated in fig. 1, establish earlier:
The coordinate system definition: the optical axis 0102 of projection optical system 9 is the Z axle, and positive dirction is to point to 01 from 02; Suppose 0102 vertical some O position by substrate 11 surfaces, and supposition Fig. 1 substrate shown in Figure 1 11 surfaces just in time overlap with the perfect optics focal plane of projection optical system 9, X-axis is defined as by an O vertical with the Z axle so, and X-axis is parallel with Fig. 1 paper shown in Figure 1, and positive dirction is for from left to right; Y-axis by a vertical paper of O inwards.
Projected light beam: the light beam from light source and lighting device 1 send was called as projected light beam before by substrate 11 surface reflections.
Measure hot spot: projected light beam is incident upon substrate 11 surperficial how much hot spots that form of going up and is called as the measurement hot spot.
Detect light beam: the light beam from light source and lighting device 1 send is called as the detection light beam after by substrate 11 surface reflections.
Detect hot spot: detect light-sensitive surface place planar S 3S4 that light beam projects digital light electric detection device 7 and go up how much hot spots that form and be called as the detection hot spot.
The out of focus height: when substrate 11 surfaces were positioned at Z axle height and position shown in the dotted line S1S2, the substrate 11 surfaces best focal plane of perfect optics of projection optical systems 9 relatively were defined as the out of focus height along the height tolerance of Z-direction.
Embodiment illustrated in fig. 1 for Fig. 1, the composition of focusing and leveling checkout equipment comprises:
An oblique incidence detection optical system, this optical system is made up of light source and lighting device 1, projection slit 2, plane mirror 3 and 4.
Wherein, light source and lighting device 1 produce and the output projected light beam.The projected light beam vertical irradiation is to projection slit 2 surfaces, because the slit opening of projection slit 2 surfaces, so the xsect of the projected light beam by projection slit 2 is shaped as and the on all four geometric configuration of projection slit 2 surperficial slit opening geometric configuratioies with appointment geometric configuration (such as rectangle or circle).Projected light beam by projection slit 2 is directed projecting on substrate 11 surfaces through plane mirror 3, and forms a measurement hot spot on substrate 11 surfaces, and this measures hot spot geometric configuration corresponding to projection slit 2 surperficial slit opening geometric configuratioies.Such as: if projection slit 2 surperficial slit opening geometric configuratioies are rectangle, measuring the hot spot geometric configuration so is rectangle or square; If projection slit 2 surperficial slit opening geometric configuratioies are circular, measure the hot spot geometric configuration so for circular or oval.Projected light beam is called as the detection light beam after measuring the process reflection of hot spot position, the detection light beam is reflected by plane mirror 4 and exports to the oscillating mirror optical system.
When substrate 11 surfaces were arranged in height and position shown in Fig. 1 dotted line S1S2, there was out of focus height DefocusH in substrate 11 surfaces.In this case, DefocusH is corresponding with the out of focus height, and the detection light beam of plane mirror 4 outputs is along its light beam vertical direction generation lateral excursion ee.
An oscillating mirror optical system: this optical system is made up of oscillating mirror 5 and oscillating mirror driver 6.
Oscillating mirror driver 6 can drive the reflecting surface of oscillating mirror 5 and do periodically simple harmonic oscillation around its turning axle Pr, and turning axle Pr is positioned on the Y direction.Detection light beam from the oblique incidence detection optical system is incided on oscillating mirror 5 surfaces, and is reflected and exports to digital light electric detection device 7.
As shown in Figure 1, the vibration balancing position of supposing oscillating mirror 5 reflecting surfaces is arranged in the position shown in the figure solid line, in this case, if substrate 11 surfaces also are positioned at the position that out of focus does not take place shown in the solid line, projected light beam and detection light-beam position are also shown in solid line among the figure so.At this moment, the detection light beam of being exported to digital light electric detection device 7 by oscillating mirror 5 reflecting surfaces reflections just in time impinges perpendicularly on the photosensitive surface (being positioned at the S3S4 plane) of digital light electric detection device 7, and the geometric center of the detection hot spot that forms on digital light electric detection device 7 photosensitive surfaces of detection light beam also overlaps with the geometric center Pc of digital light electric detection device 7 photosensitive surfaces in Z-direction.In this case, reflecting surface at oscillating mirror 5 is done in the process of periodically simple harmonic oscillation around its turning axle Pr, in digital light electric detection device 7 photosensitive surface place planar S 3S4, detecting hot spot will be along Z-direction, is that periodic wobble is made at the center with the geometric center Pc of photosensitive surface.
As shown in Figure 1, the vibration balancing position of supposing oscillating mirror 5 reflecting surfaces is arranged in the position shown in the figure solid line, in this case, if substrate 11 surfaces are positioned at the generation out of focus height DefocusH position shown in the dotted line, detect light-beam position so as shown in phantom in FIG..At this moment, the detection light beam of being exported to digital light electric detection device 7 by the reflection of oscillating mirror 5 reflecting surfaces also just in time impinges perpendicularly on digital light electric detection device 7 photosensitive surfaces (being positioned at the S3S4 plane), and the geometric center that detects the detection hot spot that light beam forms on digital light electric detection device 7 photosensitive surfaces is positioned at the Pe position, and there is deviation e (should equal lateral excursion ee) in Pe in the relative Pc of Z-direction position.In this case, reflecting surface at oscillating mirror 5 is done in the process of periodically simple harmonic oscillation around its turning axle Pr, in digital light electric detection device 7 photosensitive surface place planar S 3S4, detecting hot spot will be that periodic wobble is made at the center with the Pe position along Z-direction.
Out of focus height DefocusH is linearly proportional at the deviation e of the relative Pc of Z-direction position with detection hot spot geometric center Pe.DefocusH=k*e, wherein k is a proportionality constant.
Oscillating mirror driver 6 can also be exported vibration synchronizing signal SYNC and give focusing and leveling measurement apparatus controller 8, and the time between adjacent two SYNC signals is vibration period of oscillating mirror.Oscillating mirror vibration period also equals to detect a hunting period of hot spot, and the vibration period of the hunting period of detecting hot spot and oscillating mirror keeps synchronous.When a SYNC signal output, suppose that the reflecting surface of oscillating mirror 5 just in time vibrates the vibration balancing position shown in the solid line among Fig. 1, and the reflecting surface of oscillating mirror 5 vibrates to counter clockwise direction around its turning axle Pr.Corresponding, the geometric center that detects hot spot also just in time is positioned at oscillation centre position Pe, and detects hot spot along the upwards swing of Z axle positive dirction.
In Fig. 1, when oscillating mirror 5 surfaces are positioned at the vibration balancing position, incident angle α from the relative oscillating mirror of detection light beam 5 surfaces of oblique incidence detection optical system plane mirror 4 output is arranged as 45 degree, this only is an optimized angle, also can select non-miter angle to arrange in the reality, as long as can guarantee that the detection light beam of plane mirror 4 outputs can be got final product to surface, digital light electric detection device 7 photosensitive surface places by oscillating mirror 5 surface reflections all the time in relative its vibration balancing position vibration processes in oscillating mirror 5 surfaces.
In Fig. 1, when oscillating mirror 5 surfaces are positioned at the vibration balancing position, the detection light beam of plane mirror 4 outputs is inducted into the detection light beam that is mapped on digital light electric detection device 7 photosensitive surfaces through oscillating mirror 5 surface reflections not to be needed certain vertical with photosensitive surface yet, in this case, the lateral excursion ee that takes place because of out of focus height DefocusH of the detection light beam of plane mirror 4 output no longer equals above-mentioned deviation e.This moment lateral excursion ee=kk*e, wherein kk is a proportionality constant.Above-mentioned detection light beam vertical incidence photosensitive surface only is a preferred embodiment, and in this case, above-mentioned lateral excursion ee equals above-mentioned deviation e, also is aforementioned proportion constant k k=1.
A digital Electro-Optical Sensor Set 7: digital light electric detection device 7 can directly change the light signal that shines the detection hot spot on its photosensitive surface into digital signal out exports to focusing and leveling measurement apparatus controller 8.
As shown in Figure 6 and Figure 7, digital light electric detection device 7 can be to be made of phototriode circuit that is operated on off state or photodiode circuit.The photosensitive surface of digital light electric detection device 7 is exactly the photosensitive surface of phototriode or photodiode.
Is that the center is done in the process of periodic wobble detecting hot spot with Pe shown in Figure 1 position, and when the light beam irradiates that detects hot spot was on digital light electric detection device 7 photosensitive surfaces, for Fig. 6 and circuit conditions shown in Figure 7, digital signal out was high level output; When detection hot spot light beam was not radiated on digital light electric detection device 7 photosensitive surfaces, digital signal out was low level output.For such logic level output, we are defined as positive phase logic output.If add the Digital Logic negative circuit in digital light electric detection device 7 inside, the high-low level of output signal also will take place anti-phase so.For such logic level output, we are defined as inverted logic output.
When the out of focus height DefocusH on substrate 11 surfaces changed, the position deviation e that detects the oscillation centre Pe light-sensitive surface geometric center shown in Figure 1 relatively Pc of hot spot also can change thereupon.Detect the variation of hot spot oscillation centre position deviation e, can cause the time waveform that detect hot spot hunting period time in of output signal between adjacent two SYNC signals, the SYNC signal changes relatively.These output signal time waveforms variations comprise: the relative SYNC signal of output signal carries out the time point time of origin skew of high-low level switching and the duration length change of signal out output high-low level etc.Here, we are called output signal time waveform changing features with above-mentioned these output signal time waveform variation that detects in hot spot time hunting period.
One between adjacent two SYNC signals is detected in hot spot time hunting period, has one-to-one relationship between output signal time waveform changing features and the out of focus height DefocusH.Therefore by demarcating in advance, can set up the quantitative relationship between out of focus height DefocusH and the output signal time waveform changing features.In the actual measurement process, in the detection hot spot hunting period time of real-time collection acquisition between adjacent two SYNC signals, output signal time waveform changing features, and then, can obtain out of focus height DefocusH according to the above-mentioned out of focus height DefocusH of foundation and the quantitative relationship between the output signal time waveform changing features demarcated in advance.
As shown in Figure 8, detecting hot spot is that the amplitude that periodic wobble is made at the center is Amp with Pe shown in Figure 1 position, digital light electric detection device 7 effective photosensitive surfaces are D1 along the width of Z-direction, detecting hot spot is D2 along the Z-direction width, so in order to guarantee that one between adjacent two SYNC signals was detected in hot spot time hunting period, guarantee that the conversion of high-low level can appear in output signal, require amplitude A mp greater than half of D1 and D2 sum.Here the implication of digital light electric detection device 7 effective photosensitive surfaces is defined as follows:
For the positive phase logic output of output signal, when existing, swing position that detects hot spot and effective photosensitive surface overlap when regional, can guarantee that output signal is that high level is exported.
For the output of the inverted logic of output signal, when existing, swing position that detects hot spot and effective photosensitive surface overlap when regional, can guarantee that output signal is that low level is exported.
A focusing and leveling measurement apparatus controller 8: the main effect of focusing and leveling measurement apparatus controller 8 is according to demarcating the out of focus height DefocusH of foundation and the quantitative relationship between the output signal time waveform changing features in advance, an and output signal time waveform changing features that detects digital light electric detection device 7 outputs in hot spot time hunting period between adjacent two SYNC signals, calculate out of focus height DefocusH, and out of focus height DefocusH exported to motion platform controller 12, final by motion platform controller 12 actuation movement platforms 10 with the best optics focal plane height and position of substrate 11 surperficial closed-loop controls to projection optical system 9.
To be described in detail in one-period between adjacent two SYNC signals below in the time, the quantitative relationship between out of focus height DefocusH and the output signal time waveform changing features.For the ease of subsequent descriptions, at first make as giving a definition:
The positive negative direction of out of focus height DefocusH: according to light channel structure shown in Figure 1, relative projection optical system 9 best optics focal planes, substrate 11 surfaces are defined as positive out of focus along the skew of Z axle positive dirction, and skew in the other direction then is defined as negative out of focus.
Detect the positive negative direction of the digital relatively Electro-Optical Sensor Set 7 effective light-sensitive surface geometric center Pc of hot spot oscillation centre: according to light channel structure shown in Figure 1 along the offsets in height e of Z axle, when out of focus height DefocusH is timing, detect the digital relatively Electro-Optical Sensor Set 7 effective light-sensitive surface geometric center Pc of hot spot oscillation centre and be positioned at Z axle positive dirction, the offsets in height e of this moment is defined as forward migration; When out of focus height DefocusH when negative, detect the digital relatively Electro-Optical Sensor Set 7 effective light-sensitive surface geometric center Pc of hot spot oscillation centre and be positioned at Z axle negative direction, offsets in height e at this moment is defined as negative offset.
Detect forward and the negative sense full swing position of hot spot along the Z-direction swing: according to light channel structure shown in Figure 1, determined location definition is swing forward maximum position when the relative oscillation centre Pe of detection hot spot swings to Z to the extreme higher position along Z axle positive dirction.Determined location definition is swing negative sense maximum position when the relative oscillation centre Pe of detection hot spot swings to Z to extreme lower position along Z axle negative direction.
Detect hot spot and swing positive half cycle and negative half period: according to aforementioned supposition as can be known, when oscillating mirror driver 6 sends a SYNC signal, detect hot spot and move along Z axle positive dirction, this is defined as t1 constantly from its oscillation centre Pe; From t1 constantly, detect hot spot and at first swing to swing forward maximum position, and then get back to oscillation centre Pe, this is defined as t2 constantly along the swing of Z axle negative direction along Z axle positive dirction; From t2 constantly, detect hot spot and at first swing to swing negative sense maximum position, and then get back to oscillation centre Pe, this is defined as t3 constantly along the swing of Z axle positive dirction along Z axle negative direction.At t3 constantly, oscillating mirror driver 6 should send next SYNC signal.So far, we define t1 and swing positive half cycle to the t2 time period constantly as detecting hot spot, and definition t2 swings negative half period as detecting hot spot to the t3 time period constantly.Because detecting the vibration period of hot spot hunting period and oscillating mirror 5 keeps synchronously, and both cycle length is also identical, swing the positive half cycle of vibration that positive half cycle also is an oscillating mirror 5 so detect hot spot, detecting hot spot swing negative half period also is the vibration negative half period of oscillating mirror 5.
Owing to have the linear ratio relation between the position deviation e of out of focus height DefocusH and relative digital Electro-Optical Sensor Set 7 effective photosensitive surface geometric center Pc of detection hot spot oscillation centre Pe shown in Figure 1, so the quantitative relationship between out of focus height DefocusH and the output signal time waveform changing features can be converted into the quantitative relationship between deviation e and the output signal time waveform changing features.According to top several definition, below will be when detecting hot spot oscillation centre Pe and be positioned at some feature locations, output signal out describes quantitative relationship between deviation e and the output signal time waveform changing features detecting the time waveform figure of hot spot in hunting period.
The feature locations of the digital relatively Electro-Optical Sensor Set 7 effective photosensitive surface geometric center Pc of detection hot spot oscillation centre Pe shown in Figure 1 is as follows:
Feature locations a1 and a2: this feature locations synoptic diagram is shown in a1 position and the a2 position among Fig. 4 among Fig. 2, and the output signal time waveform synoptic diagram corresponding with this feature locations is respectively shown in a1 and the a2 among Fig. 5 among Fig. 3.At this feature locations, deviation e equals zero, and the Pe position overlaps with the Pc position.
Feature locations b1: this feature locations synoptic diagram is shown in the b1 position among Fig. 2, and the output signal time waveform synoptic diagram corresponding with this feature locations is shown in the b1 among Fig. 3.At this feature locations, deviation e is for just, and the e span is: 0<e<E1, E1=(D1+D2)/2.At this feature locations, when the detection hot spot swings to oscillation centre position Pe, detect hot spot and effectively have lap between the photosensitive surface.
Feature locations c1: this feature locations synoptic diagram is shown in the c1 position among Fig. 2, and the output signal time waveform synoptic diagram corresponding with this feature locations is shown in the c1 among Fig. 3.At this feature locations, deviation e is for just, and e equals E1.At this feature locations, when the detection hot spot swings to oscillation centre position Pe, detect the hot spot lower edge and overlap with effective photosensitive surface upper edge, detect hot spot this moment and effectively just do not have lap between the photosensitive surface.
Feature locations d1: this feature locations synoptic diagram is shown in the d1 position among Fig. 2, and the output signal time waveform synoptic diagram corresponding with this feature locations is shown in the d1 among Fig. 3.At this feature locations, deviation e is for just, and e equals E2, E2=Amp-(D1+D2)/2.At this feature locations, when the detection hot spot swings to oscillation centre position Pe, detect the hot spot lower edge and depart from effective photosensitive surface upper edge, and detect hot spot this moment and effectively do not have lap between the photosensitive surface along the swing of Z axle forward.At this feature locations, when the detection hot spot swings to swing negative sense maximum position, detect the hot spot upper edge and just overlap with effective photosensitive surface lower edge.
Feature locations e1: this feature locations synoptic diagram is shown in the e1 position among Fig. 2, and the output signal time waveform synoptic diagram corresponding with this feature locations is shown in the e1 among Fig. 3.At this feature locations, deviation e is for just, and the e span is: E2<e<E3, E3=Amp+ (D1+D2)/2.At this feature locations, when the detection hot spot swings to oscillation centre position Pe, detect the hot spot lower edge and depart from effective photosensitive surface upper edge, and detect hot spot this moment and effectively do not have lap between the photosensitive surface along the swing of Z axle forward.At this feature locations, when the detection hot spot swings to swing negative sense maximum position, detect hot spot and have lap with effective photosensitive surface.
Feature locations f1: this feature locations synoptic diagram is shown in the f1 position among Fig. 2, and the output signal time waveform synoptic diagram corresponding with this feature locations is shown in the f1 among Fig. 3.At this feature locations, deviation e is for just, and e equals E3.At this feature locations, when the detection hot spot swings to swing negative sense maximum position, detect the hot spot lower edge and just overlap with effective photosensitive surface upper edge.At this feature locations, detect hot spot and in a hunting period, can not occur and effective overlapping situation of photosensitive surface.
Feature locations b2: this feature locations synoptic diagram is shown in the b2 position among Fig. 4, and the output signal time waveform synoptic diagram corresponding with this feature locations is shown in the b2 among Fig. 5.At this feature locations, deviation e is for negative, and the e span is :-E1<e<0.At this feature locations, when the detection hot spot swings to oscillation centre position Pe, detect hot spot and effectively have lap between the photosensitive surface.
Feature locations c2: this feature locations synoptic diagram is shown in the c2 position among Fig. 4, and the output signal time waveform synoptic diagram corresponding with this feature locations is shown in the c2 among Fig. 5.At this feature locations, deviation e is for negative, and e equals-E1.At this feature locations, when the detection hot spot swings to oscillation centre position Pe, detect the hot spot upper edge and overlap with effective photosensitive surface lower edge, detect hot spot this moment and effectively just do not have lap between the photosensitive surface.
Feature locations d2: this feature locations synoptic diagram is shown in the d2 position among Fig. 4, and the output signal time waveform synoptic diagram corresponding with this feature locations is shown in the d2 among Fig. 5.At this feature locations, deviation e is for negative, and e equals-E2.At this feature locations, when the detection hot spot swings to oscillation centre position Pe, detect the below that the hot spot upper edge is positioned at effective photosensitive surface lower edge, detect hot spot this moment and effectively do not have lap between the photosensitive surface.At this feature locations, when the detection hot spot swings to swing forward maximum position, detect the hot spot lower edge and overlap with effective photosensitive surface upper edge.
Feature locations e2: this feature locations synoptic diagram is shown in the e2 position among Fig. 4, and the output signal time waveform synoptic diagram corresponding with this feature locations is shown in the e2 among Fig. 5.At this feature locations, deviation e is for negative, and the e span is :-E3<e<-E2.At this feature locations, when the detection hot spot swings to swing forward maximum position, detect hot spot and have lap with effective photosensitive surface.
Feature locations f2: this feature locations synoptic diagram is shown in the f2 position among Fig. 4, and the output signal time waveform synoptic diagram corresponding with this feature locations is shown in the f2 among Fig. 5.At this feature locations, deviation e is for negative, and e equals-E3.At this feature locations, when the detection hot spot swings to swing forward maximum position, detect the hot spot upper edge and overlap with effective photosensitive surface lower edge.At this feature locations, detect hot spot and in a hunting period, can not occur and effective overlapping situation of photosensitive surface.
Feature locations according to the digital relatively Electro-Optical Sensor Set 7 effective photosensitive surface geometric center Pc of above-mentioned detection hot spot oscillation centre Pe is described, by analyzing, the quantitative relationship between e and the output signal time waveform changing features amount of can deviating is as described in the following table:
Quantitative relationship between form 1: deviation e and the output signal time waveform changing features
Deviation e (DefocusH=k*e, k are proportionality constant) (referring to Fig. 2 and Fig. 4) unit: rice Output signal time waveform changing features amount (referring to Fig. 3 and Fig. 5) unit: second Explanation
E>E3 - No to scale
E=E3 Ta=T1 Tb=0 Can only be according to Ta Time Calculation DefocusH.
E2<e<E3 Ta=Taa+Tab Taa>Taa0 Tab>Tab0 T2<Ta<T1 Tb=0 Can only be according to Ta Time Calculation DefocusH.
E=E2 Ta=Taa+Tab Can only be according to the Ta Time Calculation
Taa=Taa0 Tab=Tab0 T2<Ta<T1 Tb=0 DefocusH.
E1<e<E2 Ta=Taa+Tab T2<Taa<Taa0 0<Tab<Tab0 T2<Ta<T1 0<Tb<Tb1 Can calculate DefocusH according to the Ta time.Also can calculate DefocusH according to the Tb time.
E=E1 Ta=T2 Tb=Tb1 Can calculate DefocusH according to the Ta time.Also can calculate DefocusH according to the Tb time.
0<e<E1 Ta0<Ta<T2 Tb1<Tb<Tb0 Can calculate DefocusH according to the Ta time.Also can calculate DefocusH according to the Tb time.
E=0 Ta=Ta0 Tb=Tb0 Ta0 should equal Tb0 Can calculate DefocusH according to the Ta time.Also can calculate DefocusH according to the Tb time.
-E1<e<0 Ta1<Ta<Ta0 Tb0<Tb<T2 Can calculate DefocusH according to the Ta time.Also can calculate DefocusH according to the Tb time.
E=-E1 Ta=Ta1 Tb=T2 Can calculate DefocusH according to the Ta time.Also can calculate DefocusH according to the Tb time.
-E2<e<-E1 Tb=Tba+Tbb T2<Tba<Tba0 0<Tbb<Tbb0 T2<Tb<T1 0<Ta<Ta1 Can calculate DefocusH according to the Ta time.Also can calculate DefocusH according to the Tb time.
E=-E2 Tb=Tba+Tbb Tba=Tba0 Tbb=Tbb0 T2<Tb<T1 Ta=0 Can only be according to Tb Time Calculation DefocusH.
-E3<e<-E2 Tb=Tba+Tbb Tba>Tba0 Tbb>Tbb0 T2<Tb<T1 Ta=0 Can only be according to Tb Time Calculation DefocusH.
E=-E3 Tb=T1 Can only be according to the Tb Time Calculation
Ta=0 DefocusH.
E<-E3 - No to scale
Can derive according to Fig. 9
The computing formula of Ta and Tb in the form 1.In Fig. 9, the Pe2 point for when the oscillating mirror vibration angle when rotating counterclockwise the θ angle, the detection hot spot is along the geometric center position of Z-direction; The Pe point when also promptly detecting hot spot and being positioned at the oscillation centre position, detects the geometric center position of hot spot along Z-direction for being 0 when the oscillating mirror vibration angle; The Pc point is the geometric center position of the effective light-sensitive surface of digital light electric detection device along Z-direction; When e was positioned at the oscillation centre position for detecting hot spot, its geometric center was along the side-play amount of the relative Pc point of Z-direction position; The oscillating mirror vibration angle is that 0 o'clock detection beam path adopts solid line to represent, the detection beam path when the oscillating mirror vibration angle is θ adopts dotted line to represent.Before the derivation computing formula, establish earlier:
When oscillating mirror 5 surfaces are positioned at the vibration balancing position, from incident angle α=45 degree on the relative oscillating mirror of detection light beam 5 surfaces of oblique incidence detection optical system.
The effective light-sensitive surface Z-direction of digital light electric detection device width is: D1 (unit: rice);
Detecting hot spot Z-direction width is: D2 (unit: rice);
The effective light-sensitive surface distance of vibrating mirror reflecting surface rotation center and digital light electric detection device is: L (unit: rice);
The vibrating mirror vibration frequency is: f (unit: Hz);
Detect hot spot wobble amplitude: Amp (unit: rice), Amp must greater than
Figure BSA00000182596900121
Vibrating mirror angle of throw amplitude is: θ Amp(unit: radian), work as θ AmpWhen spending less than 45, its computing formula is:
θ amp = a tan ( Amp L ) 2 ;
The vibrating mirror vibration is simple harmonic oscillation, and its angle of throw θ computing formula is: θ=θ AmpSin (2 π ft), wherein t is the time, unit is: second;
According to Fig. 9 and above-mentioned setting, the computing formula of Ta and Tb is shown in " form 2Ta computing formula " and " form 3Tb computing formula ".
Form 2Ta computing formula
Figure BSA00000182596900131
Form 3Tb computing formula
Can draw as drawing a conclusion according to " form 1 ", " form 2Ta computing formula " and " form 3Tb computing formula ":
When deviation e greater than E3, during perhaps less than-E3, the out of focus height exceeds measurement range, can't calculate DefocusH this moment.
When deviation e when scope [E3, E3] is interior, by calculating " output signal time waveform changing features amount " row time corresponding, can calculate corresponding out of focus height DefocusH.
When deviation e when scope [E2, E3], only can go out DefocusH according to the Ta Time Calculation.
When deviation e when scope [E3 ,-E2], only can go out DefocusH according to the Tb Time Calculation.
When deviation e scope (E2, E2) in the time, not only can also can go out DefocusH according to the Tb Time Calculation separately separately according to the Ta time.
When deviation e when scope [E1, E1] is interior, only according to the half wobble time, can go out DefocusH according to Ta time or Tb Time Calculation.
When Ta>Tb, deviation e also is that out of focus height DefocusH is positive out of focus for just.
When Ta equaled Tb, deviation e was 0, also was that out of focus height DefocusH is 0.
When Ta<Tb, deviation e also is that out of focus height DefocusH is negative out of focus for negative.
In sum, by calibration offset e in advance at scope [E3, E3] when interior, relation between deviation e and " output signal time waveform changing features amount " row time corresponding amount can be established the quantitative relationship between out of focus height DefocusH and " the output signal time waveform changing features amount ".In actual test process, after counting acquisition " output signal time waveform changing features amount " row time corresponding amount,, can calculate out of focus height DefocusH according to the above-mentioned quantitative relationship of coming out of demarcating in advance.
Second embodiment
Therefore the detection of only having showed a measurement facula position out of focus height DefocusH embodiment illustrated in fig. 1 can only realize that focusing detects.In order to realize that leveling detects, a plurality of measurement hot spots are arranged in the exposure visual field that needs to be positioned at projection optical system 9 on substrate 11 surfaces.On basis embodiment illustrated in fig. 1, realize that the method for leveling detection is as follows:
Projection slit 2 is replaced by a projection slit array: the projection slit array is to be made of one group of projection slit 2, and the projection slit array can make projected light beam form one on substrate 11 surfaces in the exposure field of view of projection optical system 9 and measure spot array;
Digital light electric detection device 7 is replaced by a digital Electro-Optical Sensor Set array: digital light electric detection device array is made of set of number Electro-Optical Sensor Set 7, and hot spot is independently measured on each digital light electric detection device 7 corresponding substrate 11 last one of surface;
One group of output signal of digital light electric detection device array output is replaced by in the Out output that focusing and leveling measurement apparatus controller 8 receives, the corresponding independent measurement hot spot of measuring in the spot array of one of them output signal;
The DefocusH of focusing and leveling measurement apparatus controller 8 output is replaced by substrate 11 surfaces in the exposure field of view of projection optical system 9 whole the out of focus height (FieldH) and degree of tilt (FieldRx, the FieldRy) position deviation of the best optics focal plane of projection optical systems 9 relatively.In focusing and leveling measurement apparatus controller 8,, can calculate the single-point out of focus height DefocusH that measures each independent measurement facula position in the spot array according to one group of output signal.According to one group of single-point out of focus height DefocusH, can calculate whole out of focus height (FieldH) and degree of tilt (FieldRx, FieldRy) position deviation.Whole out of focus height (FieldH) and degree of tilt (FieldRx, FieldRy) position deviation are exported to motion platform controller 12, according to above-mentioned whole out of focus height actuation movement platform substrate surface is adjusted to the best optics focal plane height and position of projection optical system, according to above-mentioned degree of tilt position deviation actuation movement platform with the substrate surface leveling.
Described in this instructions is several preferred embodiment of the present invention, and above embodiment is only in order to illustrate technical scheme of the present invention but not limitation of the present invention.All those skilled in the art all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.

Claims (9)

1. a focusing-levelling detection device is characterized in that, comprising:
The oblique incidence detection optical system, have light source and lighting device, projection slit, first plane mirror and second plane mirror, reflex to substrate surface by first plane mirror from the light of light source and lighting device outgoing after projection slit, substrate surface reflexes to second plane mirror with light;
The oscillating mirror optical system, have oscillating mirror and oscillating mirror driver, the reflecting surface of vibration reflection driver drives oscillating mirror is done periodically simple harmonic oscillation around its turning axle, is incident on the oscillating mirror from the light of the second plane mirror outgoing;
The digital light electric detection device will change digital signal output from the light signal that shines the detection hot spot on its photosensitive surface of the second plane mirror outgoing into;
The focusing and leveling measurement apparatus controller, the output signal of reception digital light electric detection device is calculated also output out of focus height.
2. device according to claim 1, it is characterized in that, also comprise motion platform controller, receive the out of focus height of focusing and leveling measurement apparatus controller output, substrate surface is adjusted to the best optics focal plane height and position of projection optical system according to this out of focus height actuation movement platform.
3. device according to claim 1 is characterized in that, projection slit is the projection slit array, and this projection slit array forms projected light beam and measures spot array on substrate surface;
The digital light electric detection device is a digital light electric detection device array, wherein each digital light electric detection device all lip-deep one of corresponding substrate independently measure hot spot;
The focusing and leveling measurement apparatus controller receives one group of output signal of digital light electric detection device array output, the all corresponding independent measurement hot spot of measuring in the spot array of each output signal wherein, the out of focus height of focusing and leveling measurement apparatus controller output are substrate surface with respect to whole out of focus height of best optics focal plane and degree of tilt position deviation.
4. device according to claim 3, it is characterized in that, also comprise motion platform controller, receive whole out of focus height of focusing and leveling measurement apparatus controller output, substrate surface is adjusted to the best optics focal plane height and position of projection optical system according to above-mentioned whole out of focus height actuation movement platform.
5. device according to claim 4 is characterized in that, above-mentioned motion platform controller receives above-mentioned degree of tilt position deviation, according to above-mentioned degree of tilt position deviation actuation movement platform with the substrate surface leveling.
6. carry out the method that focusing and leveling detects according to claim 1 or 3 described devices, set when there is not the out of focus height in substrate surface, oscillating mirror detects the geometric center of hot spot when the vibration balancing position and the geometric center of photosensitive surface overlaps, then when there is out of focus height DefocusH in substrate surface, there is deviation e in Z-direction in oscillating mirror detects hot spot when the vibration balancing position geometric center Pe with respect to the geometric center of photosensitive surface; When the reflecting surface of oscillating mirror is done in the process of periodically simple harmonic oscillation around its turning axle Pr, in plane, photosensitive surface place, detecting hot spot will be along Z-direction, with the Pe position is that periodic wobble is made at the center, deviation e is demarcated in advance at scope [E3, E3] in, according to the relation between deviation e and the output signal time waveform changing features amount row time corresponding amount, establish the quantitative relationship between out of focus height DefocusH and the output signal time waveform changing features amount, passing through counting in the testing process obtains after the output signal time waveform changing features amount one row time corresponding amount, according to demarcating the above-mentioned quantitative relationship of coming out in advance, calculate out of focus height DefocusH;
Wherein, the optical axis of the projection optical system in the alignment device is the Z axle; The amplitude that detects the hot spot periodic wobble is Amp, and effective photosensitive surface of digital light electric detection device is D1 along the width of Z-direction, and detecting hot spot is D2 along the Z-direction width, and amplitude A mp is greater than half of D1 and D2 sum, E3=(D1+D2)/2+Amp.
7. method according to claim 6, it is characterized in that, when there is out of focus height DefocusH in substrate surface, when the oscillating mirror surface is positioned at the vibration balancing position, be 45 degree from the incident angle on the relative oscillating mirror of the detection light beam surface of oblique incidence detection optical system second plane mirror output.
8. method according to claim 6, it is characterized in that, when there is out of focus height DefocusH in substrate surface, when the oscillating mirror surface is positioned at the vibration balancing position, the detection light beam of above-mentioned second plane mirror output is because the lateral excursion ee that out of focus height DefocusH takes place, above-mentioned lateral excursion ee=kk*e, wherein kk is a proportionality constant.
9. method according to claim 8 is characterized in that, during above-mentioned detection light beam vertical incidence photosensitive surface, and aforementioned proportion constant k k=1.
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CN103389623A (en) * 2012-05-11 2013-11-13 上海微电子装备有限公司 Focusing and leveling device
CN103389623B (en) * 2012-05-11 2015-03-25 上海微电子装备有限公司 Focusing and leveling device
CN104111596A (en) * 2013-04-16 2014-10-22 上海微电子装备有限公司 Apparatus for globally leveling lithography equipment, and method thereof
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CN105700297A (en) * 2014-11-27 2016-06-22 上海微电子装备有限公司 Amplitude monitoring system, focus leveling device and defocusing amount detection method
CN105700297B (en) * 2014-11-27 2018-01-26 上海微电子装备(集团)股份有限公司 Amplitude monitoring system, focusing leveling device and defocusing amount detection method
WO2016082772A1 (en) * 2014-11-27 2016-06-02 上海微电子装备有限公司 Amplitude monitoring system, focusing and leveling device, and defocusing amount detection method
CN106647194A (en) * 2015-07-15 2017-05-10 上海微电子装备有限公司 A focal plane detection unit and an automatically-focusing aligning system
CN106647194B (en) * 2015-07-15 2018-05-04 上海微电子装备(集团)股份有限公司 A kind of focal plane probe unit and automatic focusing to Barebone
CN106814554A (en) * 2017-03-07 2017-06-09 无锡影速半导体科技有限公司 Laser direct imaging exposure machine focusing structure and focus method
CN110967943A (en) * 2019-11-28 2020-04-07 中国科学院微电子研究所 Photoelectric detector for focus-adjusting and leveling system of photoetching machine and use method thereof
CN110967943B (en) * 2019-11-28 2022-02-08 中国科学院微电子研究所 Photoelectric detector for focus-adjusting and leveling system of photoetching machine and use method thereof
CN113050379A (en) * 2019-12-27 2021-06-29 上海微电子装备(集团)股份有限公司 Focus detection signal modulation device and method

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