CN102289153B - 一种制版光刻设备静态稳定性测量方法 - Google Patents
一种制版光刻设备静态稳定性测量方法 Download PDFInfo
- Publication number
- CN102289153B CN102289153B CN 201110143195 CN201110143195A CN102289153B CN 102289153 B CN102289153 B CN 102289153B CN 201110143195 CN201110143195 CN 201110143195 CN 201110143195 A CN201110143195 A CN 201110143195A CN 102289153 B CN102289153 B CN 102289153B
- Authority
- CN
- China
- Prior art keywords
- mask plate
- mobile platform
- plate
- center
- ccd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims abstract description 22
- 238000005530 etching Methods 0.000 title claims abstract description 7
- 238000012545 processing Methods 0.000 claims abstract description 10
- 238000005516 engineering process Methods 0.000 claims abstract description 7
- 230000003068 static effect Effects 0.000 claims description 15
- 238000005259 measurement Methods 0.000 abstract description 7
- 238000001259 photo etching Methods 0.000 abstract description 5
- 239000003550 marker Substances 0.000 abstract 1
- 238000003384 imaging method Methods 0.000 description 6
- 238000001459 lithography Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000013461 design Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000000018 DNA microarray Methods 0.000 description 1
- 230000002730 additional effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000011514 reflex Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Images
Abstract
Description
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201110143195 CN102289153B (zh) | 2011-05-31 | 2011-05-31 | 一种制版光刻设备静态稳定性测量方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201110143195 CN102289153B (zh) | 2011-05-31 | 2011-05-31 | 一种制版光刻设备静态稳定性测量方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102289153A CN102289153A (zh) | 2011-12-21 |
CN102289153B true CN102289153B (zh) | 2013-03-13 |
Family
ID=45335667
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 201110143195 Active CN102289153B (zh) | 2011-05-31 | 2011-05-31 | 一种制版光刻设备静态稳定性测量方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN102289153B (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102566309A (zh) * | 2012-01-12 | 2012-07-11 | 合肥芯硕半导体有限公司 | 用于制版光刻设备的动态稳定性测量方法 |
CN102566311A (zh) * | 2012-01-12 | 2012-07-11 | 合肥芯硕半导体有限公司 | 一种制版光刻设备动态稳定性测量方法 |
CN106483778B (zh) * | 2015-08-31 | 2018-03-30 | 上海微电子装备(集团)股份有限公司 | 基于相对位置测量的对准系统、双工件台系统及测量系统 |
CN112945102B (zh) * | 2021-03-09 | 2023-07-25 | 武汉先河激光技术有限公司 | 一种基于玻璃切割技术的精密平台精度计量与补偿方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101221368A (zh) * | 2008-01-21 | 2008-07-16 | 上海微电子装备有限公司 | 物面像面位置的实时测校装置以及方法 |
CN101231474A (zh) * | 2008-02-27 | 2008-07-30 | 芯硕半导体(中国)有限公司 | 具有超高强度led光源的无掩膜直写光刻机 |
CN101344728A (zh) * | 2008-07-31 | 2009-01-14 | 上海微电子装备有限公司 | 一种光刻机投影物镜波像差在线测量装置及方法 |
CN101576715A (zh) * | 2009-06-23 | 2009-11-11 | 芯硕半导体(中国)有限公司 | 一种微观成像系统的标定方法 |
-
2011
- 2011-05-31 CN CN 201110143195 patent/CN102289153B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101221368A (zh) * | 2008-01-21 | 2008-07-16 | 上海微电子装备有限公司 | 物面像面位置的实时测校装置以及方法 |
CN101231474A (zh) * | 2008-02-27 | 2008-07-30 | 芯硕半导体(中国)有限公司 | 具有超高强度led光源的无掩膜直写光刻机 |
CN101344728A (zh) * | 2008-07-31 | 2009-01-14 | 上海微电子装备有限公司 | 一种光刻机投影物镜波像差在线测量装置及方法 |
CN101576715A (zh) * | 2009-06-23 | 2009-11-11 | 芯硕半导体(中国)有限公司 | 一种微观成像系统的标定方法 |
Also Published As
Publication number | Publication date |
---|---|
CN102289153A (zh) | 2011-12-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN104199257B (zh) | 一种精密定位平台绝对定位精度的测量及补偿方法 | |
CN102354086B (zh) | 一种精密移动平台的正交性实时标定方法 | |
CN104024942B (zh) | 装载可挠性基板的装置及微影装置 | |
EP0230540A2 (en) | X-Y-theta stage apparatus | |
CN111381460B (zh) | 一种兼顾调焦调平和精密对准的测量系统及其测量方法 | |
CN108732871A (zh) | 搬送系统、曝光装置、器件制造方法、搬送方法、曝光方法 | |
TWI401767B (zh) | 定位設備、曝光設備及裝置製造方法 | |
KR20120026631A (ko) | 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 패턴 형성 장치, 노광 방법 및 노광 장치, 그리고 디바이스 제조 방법 | |
KR20130028986A (ko) | 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 위치 제어 방법 및 위치 제어 시스템, 및 디바이스 제조 방법 | |
KR20100057758A (ko) | 이동체 구동 방법 및 이동체 구동 시스템, 그리고 패턴 형성 방법 및 패턴 형성 장치 | |
KR20100046136A (ko) | 이동체 구동 방법 및 이동체 구동 시스템 | |
CN101385120A (zh) | 测定装置及方法、处理装置及方法、图案形成装置及方法、曝光装置及方法、以及元件制造方法 | |
JPWO2008026742A1 (ja) | 移動体駆動方法及び移動体駆動システム、パターン形成方法及び装置、露光方法及び装置、並びにデバイス製造方法 | |
CN102289153B (zh) | 一种制版光刻设备静态稳定性测量方法 | |
CN105241399A (zh) | 一种精密定位平台动态平面度的测量方法 | |
CN104838469A (zh) | 曝光装置及曝光方法、以及器件制造方法 | |
CN109916342A (zh) | 一种定位平台直线度测量系统及方法 | |
CN107450288A (zh) | 图案形成装置、设置基板的方法和制造物品的方法 | |
CN101738873A (zh) | 曝光装置 | |
KR100724261B1 (ko) | 위치 측정 방법 및 위치 측정 장치 및 위치 측정 시스템 | |
CN103383531B (zh) | 掩模对准装置及使用该装置的光刻设备 | |
JP4522142B2 (ja) | 露光装置、露光方法、及び基板製造方法 | |
US7584072B2 (en) | Method for determining correction values for the measured values of positions of structures on a substrate | |
CN104516213B (zh) | 曝光装置、曝光方法以及装置制造方法 | |
CN102566311A (zh) | 一种制版光刻设备动态稳定性测量方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C53 | Correction of patent for invention or patent application | ||
CB03 | Change of inventor or designer information |
Inventor after: Fang Lin Inventor before: Zhang Aiming |
|
COR | Change of bibliographic data |
Free format text: CORRECT: INVENTOR; FROM: ZHANG AIMING TO: FANG LIN |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
PP01 | Preservation of patent right |
Effective date of registration: 20151124 Granted publication date: 20130313 |
|
RINS | Preservation of patent right or utility model and its discharge | ||
PD01 | Discharge of preservation of patent |
Date of cancellation: 20161124 Granted publication date: 20130313 |
|
PP01 | Preservation of patent right |
Effective date of registration: 20161124 Granted publication date: 20130313 |
|
RINS | Preservation of patent right or utility model and its discharge | ||
PD01 | Discharge of preservation of patent |
Date of cancellation: 20170524 Granted publication date: 20130313 |
|
PP01 | Preservation of patent right |
Effective date of registration: 20170524 Granted publication date: 20130313 |
|
PD01 | Discharge of preservation of patent |
Date of cancellation: 20180524 Granted publication date: 20130313 |
|
PD01 | Discharge of preservation of patent | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20190917 Address after: Room B30, 3rd floor, 151 Keyuan Road, China (Shanghai) Free Trade Pilot Area, 200120 Patentee after: Zhongxia Xinji (Shanghai) Technology Co., Ltd. Address before: 230601 No. 68 Jinxiu Avenue, Hefei economic and Technological Development Zone, Anhui, China Patentee before: Hefei AdvanTools Semiconductor Co., Ltd. |