CN102284904A - 镜面研磨机的清洁装置 - Google Patents
镜面研磨机的清洁装置 Download PDFInfo
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- CN102284904A CN102284904A CN2011102851349A CN201110285134A CN102284904A CN 102284904 A CN102284904 A CN 102284904A CN 2011102851349 A CN2011102851349 A CN 2011102851349A CN 201110285134 A CN201110285134 A CN 201110285134A CN 102284904 A CN102284904 A CN 102284904A
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- Prior art keywords
- sponge
- grinding
- cleaning device
- sliding
- machine
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201110285134 CN102284904B (zh) | 2011-09-23 | 2011-09-23 | 镜面研磨机的清洁装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN 201110285134 CN102284904B (zh) | 2011-09-23 | 2011-09-23 | 镜面研磨机的清洁装置 |
Publications (2)
Publication Number | Publication Date |
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CN102284904A true CN102284904A (zh) | 2011-12-21 |
CN102284904B CN102284904B (zh) | 2013-06-12 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN 201110285134 Expired - Fee Related CN102284904B (zh) | 2011-09-23 | 2011-09-23 | 镜面研磨机的清洁装置 |
Country Status (1)
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CN (1) | CN102284904B (zh) |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5938504A (en) * | 1993-11-16 | 1999-08-17 | Applied Materials, Inc. | Substrate polishing apparatus |
US6110013A (en) * | 1997-09-05 | 2000-08-29 | Seiko Instruments Inc. | End-face polishing and cleaning apparatus |
US20050112998A1 (en) * | 2003-10-30 | 2005-05-26 | Hisanori Matsuo | Polishing apparatus |
CN2789249Y (zh) * | 2005-05-20 | 2006-06-21 | 中山市富山玻璃机械有限公司 | 一种平面玻璃用多排盘刷清洗、抛光机 |
CN201371405Y (zh) * | 2009-03-09 | 2009-12-30 | 浙江机电职业技术学院 | 磨削、抛光一体化硅块加工专用机床 |
CN201543609U (zh) * | 2009-11-09 | 2010-08-11 | 上海华虹Nec电子有限公司 | 化学机械抛光设备的硅片清洗装置 |
CN202264137U (zh) * | 2011-09-23 | 2012-06-06 | 无锡天马通用设备有限公司 | 镜面研磨机的清洁装置 |
-
2011
- 2011-09-23 CN CN 201110285134 patent/CN102284904B/zh not_active Expired - Fee Related
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5938504A (en) * | 1993-11-16 | 1999-08-17 | Applied Materials, Inc. | Substrate polishing apparatus |
US6110013A (en) * | 1997-09-05 | 2000-08-29 | Seiko Instruments Inc. | End-face polishing and cleaning apparatus |
US20050112998A1 (en) * | 2003-10-30 | 2005-05-26 | Hisanori Matsuo | Polishing apparatus |
CN2789249Y (zh) * | 2005-05-20 | 2006-06-21 | 中山市富山玻璃机械有限公司 | 一种平面玻璃用多排盘刷清洗、抛光机 |
CN201371405Y (zh) * | 2009-03-09 | 2009-12-30 | 浙江机电职业技术学院 | 磨削、抛光一体化硅块加工专用机床 |
CN201543609U (zh) * | 2009-11-09 | 2010-08-11 | 上海华虹Nec电子有限公司 | 化学机械抛光设备的硅片清洗装置 |
CN202264137U (zh) * | 2011-09-23 | 2012-06-06 | 无锡天马通用设备有限公司 | 镜面研磨机的清洁装置 |
Also Published As
Publication number | Publication date |
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CN102284904B (zh) | 2013-06-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C53 | Correction of patent of invention or patent application | ||
CB02 | Change of applicant information |
Address after: 214023 160 kilometers, 312 National Road, Luo Zhen Town, Huishan District, Wuxi, Jiangsu Applicant after: Jiangsu Tianma Universal Equipment Co.,Ltd. Address before: 214023 160 kilometers, 312 National Road, Luo Zhen Town, Huishan District, Wuxi, Jiangsu Applicant before: Wuxi Tianma Universal Equipment Co., Ltd. |
|
COR | Change of bibliographic data |
Free format text: CORRECT: APPLICANT; FROM: WUXI TIANMA GENERAL EQUIPMENT CO., LTD. TO: JIANGSU TIANMA UNIVERSAL EQUIPMENT CO., LTD. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130612 Termination date: 20180923 |
|
CF01 | Termination of patent right due to non-payment of annual fee |