CN102262350A - 曝光机的曝光程序的验证方法及其使用的掩模 - Google Patents

曝光机的曝光程序的验证方法及其使用的掩模 Download PDF

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Publication number
CN102262350A
CN102262350A CN2010101884020A CN201010188402A CN102262350A CN 102262350 A CN102262350 A CN 102262350A CN 2010101884020 A CN2010101884020 A CN 2010101884020A CN 201010188402 A CN201010188402 A CN 201010188402A CN 102262350 A CN102262350 A CN 102262350A
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pattern
sub
supergraph
sample
layer
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CN2010101884020A
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Chinese (zh)
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巫世荣
刘宗鑫
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Macronix International Co Ltd
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Macronix International Co Ltd
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Priority to CN2010101884020A priority Critical patent/CN102262350A/zh
Publication of CN102262350A publication Critical patent/CN102262350A/zh
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CN2010101884020A 2010-05-25 2010-05-25 曝光机的曝光程序的验证方法及其使用的掩模 Pending CN102262350A (zh)

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CN2010101884020A CN102262350A (zh) 2010-05-25 2010-05-25 曝光机的曝光程序的验证方法及其使用的掩模

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CN102262350A true CN102262350A (zh) 2011-11-30

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050068515A1 (en) * 2003-09-30 2005-03-31 Lothar Bauch Method for detecting positioning errors of circuit patterns during the transfer by means of a mask into layers of a substrate of a semiconductor wafer
CN1770419A (zh) * 2004-11-02 2006-05-10 力晶半导体股份有限公司 用于曝光机器的检测装置及检测方法
CN101435998A (zh) * 2007-11-15 2009-05-20 上海华虹Nec电子有限公司 降低光刻机镜头畸变引起的光刻对准偏差的方法
CN101592869A (zh) * 2008-05-29 2009-12-02 中芯国际集成电路制造(北京)有限公司 曝光设备焦距监测方法
US20100123886A1 (en) * 2008-11-18 2010-05-20 Asml Netherlands B.V. Lithographic Apparatus and Device Manufacturing Method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050068515A1 (en) * 2003-09-30 2005-03-31 Lothar Bauch Method for detecting positioning errors of circuit patterns during the transfer by means of a mask into layers of a substrate of a semiconductor wafer
CN1770419A (zh) * 2004-11-02 2006-05-10 力晶半导体股份有限公司 用于曝光机器的检测装置及检测方法
CN101435998A (zh) * 2007-11-15 2009-05-20 上海华虹Nec电子有限公司 降低光刻机镜头畸变引起的光刻对准偏差的方法
CN101592869A (zh) * 2008-05-29 2009-12-02 中芯国际集成电路制造(北京)有限公司 曝光设备焦距监测方法
US20100123886A1 (en) * 2008-11-18 2010-05-20 Asml Netherlands B.V. Lithographic Apparatus and Device Manufacturing Method

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