CN102253585A - Projection screen and system and manufacture method of projection screen - Google Patents

Projection screen and system and manufacture method of projection screen Download PDF

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Publication number
CN102253585A
CN102253585A CN2010101781325A CN201010178132A CN102253585A CN 102253585 A CN102253585 A CN 102253585A CN 2010101781325 A CN2010101781325 A CN 2010101781325A CN 201010178132 A CN201010178132 A CN 201010178132A CN 102253585 A CN102253585 A CN 102253585A
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CN
China
Prior art keywords
rete
projection screen
substrate
wave bands
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2010101781325A
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Chinese (zh)
Inventor
魏朝沧
陈杰良
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
Original Assignee
Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hongfujin Precision Industry Shenzhen Co Ltd, Hon Hai Precision Industry Co Ltd filed Critical Hongfujin Precision Industry Shenzhen Co Ltd
Priority to CN2010101781325A priority Critical patent/CN102253585A/en
Publication of CN102253585A publication Critical patent/CN102253585A/en
Pending legal-status Critical Current

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Abstract

The invention provides a projection screen, which is used for displaying images by reflecting light rays in three wave bands of red, green and blue. The projection screen comprises a flexible substrate with the light transmittance more than 80% and a selective reflection layer, wherein the substrate is provided with a first surface and a second surface opposite to the first surface, the selective reflection layer is formed on the second surface, the light rays of the three wave bands are transmitted to the selective reflection layer through the substrate, the selective reflection layer has a reflection characteristic to the light rays in the three wave bands and has an absorption characteristic to the light rays in the wave bands except for the three wave bands. The invention further provides a projection system with adoption of the projection screen and a manufacturing method of the projection screen.

Description

The manufacture method of projection screen, optical projection system and this projection screen
Technical field
The present invention relates to the manufacture method of a kind of projection screen, optical projection system and this projection screen, relate in particular to the manufacture method of a kind of reflection type projection screen, optical projection system and this projection screen
Background technology
Hand held optical projection system and projector have been widely used in aspects such as meeting, advertisement, education and amusement, and the performance of projection screen is being played the part of pivotal player on the quality of image.The projection screen of Display projector image can be divided into transmissive projection screen curtain and reflection type projection screen according to displaying principle.The projection screen of the projection screen of the optical image that the transmissive projection screen curtain sends from the projector at its rear by transmission, the reflection type projection screen optical image that projector launched by reflecting its place ahead.
The reflection type projection screen can be according to different ordinary white screen and the bead formula screens of being divided into surface coating of its manufacturing process, white screen is in making behind the spraying whitewash on the yarn fabric, this kind screen reflects too to surround lighting except the light of reflective projection machine projection, so this projection screen only can show the image with low contrast under the middle and high ambient light of bright light.Bead formula projection screen is to spray small glass powder in textile surfaces to make, and this kind screen can increase contrast, and so its effect is limited and should not roll repeatedly, otherwise glass powder comes off easily, influences result of use.
Summary of the invention
In view of this, be necessary to provide a kind of manufacture method that projection screen, optical projection system and this projection screen of clear and bright image can still be arranged under brighter surround lighting or lower projection brightness.
A kind of projection screen, it is by the light display image of three wave bands of reflection red, green, blue, this projection screen comprises that a transmittance is greater than 80% and have a flexual substrate and a selective reflecting layer, this substrate has opposite first and second surface, this selective reflecting layer is located at this second surface, the light of these three wave bands is transmitted through this selective reflecting layer through this substrate, this selective reflecting layer has reflection characteristic to the light of these three wave bands, and the light outside these three wave bands is had absorption characteristic.
A kind of optical projection system, comprise a projection light source and a projection screen, this projection screen passes through reflect red, green, the light display image of blue three wave bands, this projection light source can be sent the light of these three wave bands, this projection screen comprises that a transmittance is greater than 80% and have a flexual substrate and a selective reflecting layer, this substrate has opposite first and second surface, this first surface is near this projection light source, this selective reflecting layer is located at this second surface, the light of these three wave bands is transmitted through this selective reflecting layer through this substrate, this selective reflecting layer has reflection characteristic to the light of these three wave bands, and the light outside these three wave bands is had absorption characteristic.
A kind of manufacture method of projection screen, it comprises: provide a transmittance greater than 80% and have flexual substrate, this substrate has opposite first and second surface; Utilize a sputter rifle to form one first rete in this second surface sputter, this first rete of oxidation forms one second rete, and sputter forms a tertiary membrane layer on this second rete, this first, second and the tertiary membrane layer form a selective reflecting layer.
With respect to prior art, projection screen provided by the invention mainly reflects the light that is used for imaging, and absorb most light that do not participate in imaging, thereby can under brighter surround lighting or lower projection brightness, present contrast height, clear, bright image.Projection screen manufacture method provided by the invention can be made a kind of projection screen that clear and bright image can still be arranged under brighter surround lighting or lower projection brightness.
Description of drawings
Fig. 1 is the synoptic diagram of the projection screen that provides of the embodiment of the invention.
Fig. 2 is the reflection characteristic and the absorption characteristic synoptic diagram of projection screen shown in Figure 1, and transverse axis is represented wavelength, and the longitudinal axis is represented reflectivity.
The main element symbol description
Projection screen 10
Substrate 12
First surface 121
Second surface 122
Selective reflecting layer 14
First rete 140
Second rete 142
Tertiary membrane layer 144
Projection light source 30
Optical projection system 40
Embodiment
See also Fig. 1 and Fig. 2, the optical projection system 40 that the embodiment of the invention provides comprises a projection screen 10 and a projection light source 30.This projection screen 10 is by the light display image of reflect red (R), green (G), blue (B) three wave bands.This projection light source 30 is positioned at projector's (figure does not show), and it can send the light of these three wave bands.
This projection screen 10 comprises a substrate 12 and a selective reflecting layer 14.The transmittance of this substrate 12 is greater than 80%, and has pliability, and substrate 12 can adopt polyvinyl butyral (Polyvinylbutyral, PVB resin) manufacturing, and it has higher light transmission and good pliability.
This substrate 12 has opposite first 121 and second surface 122, and this first surface 121 is near projection light source 30.This selective reflecting layer 14 is located at this second surface 122, is the backreflection film.This selective reflecting layer 14 has reflection characteristic for the light of red (R), green (G), blue (B) three wave bands, and the light outside these three wave bands is had absorption characteristic.
This selective reflecting layer 14 comprises one first rete 140 at least, and the material of this first rete 140 is an aluminium, and thickness is 20~200nm; One second rete 142, the material of this second rete 142 are aluminium oxide, and thickness is 600~650nm; And a tertiary membrane layer 144, the material of this tertiary membrane layer 144 is a chromium, thickness is 2~10nm.
In the present embodiment, second surface 122, the second retes 142 adjacent these first retes 140 of these first rete, 140 the most close substrates 12, tertiary membrane layer 144 adjacent this second rete 142.Certainly, this first rete 140, second rete 142, putting in order of this tertiary membrane layer 144 are not limited to this, can change mutually.
This first rete 140, second rete 142, the thickness of tertiary membrane floor 144 is mainly distinguished certainly in following formula: nd=λ (N ± 1/4), wherein N is a natural number, the wavelength of λ mesentery layer (for example, first rete) desire reflection, n is the thickness of this rete, d is the refractive index of this rete, and amassing of nd is the optical thickness of this rete.When the material of each rete is determined, when the wavelength of desire reflection is determined, can adjust the numerical value of N and determine thicknesses of layers.In the present embodiment, get ruddiness (R) value wavelength region may and be about 642nm, the wavelength region may of getting green glow (G) is about 532nm, and the wavelength region may of getting blue light (B) is about 457nm.
Projection screen 10 is carried out the reflectivity properties test, can obtain reflection characteristic synoptic diagram as shown in Figure 2, scheme as can be known thus, selective reflecting layer 14 is higher at the reflectivity of the wavelength region may at redgreenblue place, and higher in the absorptivity of other wavelength region may, reflectivity is lower in other words.Because this projection light source 30 is sent the light of these three wave bands and can be reflected and the light of other wave band, comprise that the light that does not belong to these three wave bands in the surround lighting will be absorbed, thus this projection screen 10 can be under brighter surround lighting or lower projection brightness still clear display and bright image.Because substrate 12 has pliability, projection screen 10 can curl, and substrate 12 can be avoided outside selective reflecting layer 14 is directly exposed to, and can be by wiping repeatedly, thereby protection selective reflecting layer 14 avoids selective reflecting layer 14 to come off.
The manufacture method of this projection screen 10 may further comprise the steps at least: provide a transmittance greater than 80% and have a flexual substrate 12, and the polyvinyl butyral of 0.5 cm thick for example, this substrate 12 has opposite first 121 and second surface 122; Utilize a sputter rifle (figure does not show) to form first rete 140 in these second surface 122 sputters, it is aluminium lamination, sputter thickness is 650~900nm, making the aluminium lamination oxidation form thickness with the oxygen of going into scheduled volume in reaction chamber (figure does not show) again is the alumina layer of 600~650nm, i.e. second rete 142, and the thickness that makes remaining first rete 140 remains in the scope of 20~200nm, and then utilize the sputter rifle on this second rete 142, to form tertiary membrane layer 144, be the chromium layer, sputter thickness is 2~10nm.
Be understandable that those skilled in the art also can do other variation in spirit of the present invention, all should be included within the present invention's scope required for protection.

Claims (9)

1. projection screen, it is by the light display image of three wave bands of reflection red, green, blue, it is characterized in that: this projection screen comprises that a transmittance is greater than 80% and have flexual substrate and a selective reflecting layer, this substrate has opposite first and second surface, this selective reflecting layer is located at this second surface, the light of these three wave bands is transmitted through this selective reflecting layer through this substrate, this selective reflecting layer has reflection characteristic to the light of these three wave bands, and the light outside these three wave bands is had absorption characteristic.
2. projection screen as claimed in claim 1 is characterized in that: the material of this substrate is a polyvinyl butyral.
3. projection screen as claimed in claim 1 or 2 is characterized in that: this selective reflecting layer comprises:
One first rete, the material of this first rete are aluminium, and thickness is 20~200nm;
One second rete, the material of this second rete are aluminium oxide, and thickness is 600~650nm; And
A tertiary membrane layer, the material of this tertiary membrane layer are chromium, and thickness is 2~10nm.
4. an optical projection system comprises a projection light source and a projection screen, and this projection screen is by the light display image of three wave bands of reflection red, green, blue, and this projection light source can be sent the light of these three wave bands, it is characterized in that:
This projection screen comprises that a transmittance is greater than 80% and have a flexual substrate and a selective reflecting layer, this substrate has opposite first and second surface, this first surface is near this projection light source, this selective reflecting layer is located at this second surface, the light of these three wave bands is transmitted through this selective reflecting layer through this substrate, this selective reflecting layer has reflection characteristic to the light of these three wave bands, and the light outside these three wave bands is had absorption characteristic.
5. optical projection system as claimed in claim 4 is characterized in that: the material of this substrate is a polyvinyl butyral.
6. as claim 4 or 5 described optical projection systems, it is characterized in that: this selective reflecting layer comprises:
One first rete, the material of this first rete are aluminium, and thickness is 20~200nm;
One second rete, the material of this second rete are aluminium oxide, and thickness is 600~650nm; And
A tertiary membrane layer, the material of this tertiary membrane layer are chromium, and thickness is 2~10nm.
7. the manufacture method of a projection screen, it comprises:
Provide a transmittance greater than 80% and have flexual substrate, this substrate has opposite first and second surface;
Utilize a sputter rifle to form one first rete in this second surface sputter, this first rete of oxidation forms one second rete, and sputter forms a tertiary membrane layer on this second rete, this first, second and the tertiary membrane layer form a selective reflecting layer.
8. the manufacture method of projection screen as claimed in claim 7, it is characterized in that: the material of this substrate is a polyvinyl butyral.
9. the manufacture method of projection screen as claimed in claim 7, it is characterized in that: the material of this first rete is an aluminium, and the thickness after this first rete is oxidized is 20~200nm, and the thickness of this second rete is 600~650nm; The material of this tertiary membrane layer is a chromium, and sputter thickness is 2~10nm.
CN2010101781325A 2010-05-20 2010-05-20 Projection screen and system and manufacture method of projection screen Pending CN102253585A (en)

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Application Number Priority Date Filing Date Title
CN2010101781325A CN102253585A (en) 2010-05-20 2010-05-20 Projection screen and system and manufacture method of projection screen

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CN102253585A true CN102253585A (en) 2011-11-23

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105469653A (en) * 2016-01-12 2016-04-06 四川文轩教育科技有限公司 Multimedia teaching system
CN107077249A (en) * 2014-11-07 2017-08-18 3M创新有限公司 touch-sensitive projection screen
CN110750029A (en) * 2018-07-06 2020-02-04 深圳光峰科技股份有限公司 Projection screen

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1734291A (en) * 2004-08-04 2006-02-15 索尼株式会社 Light diffusion sheet and method of producing the light diffusion sheet, and screen
CN1737687A (en) * 2004-07-28 2006-02-22 因芬尼昂技术股份公司 Passivation of multi-layer mirror for extreme ultraviolet lithography
CN1750255A (en) * 2004-09-14 2006-03-22 冲数据株式会社 Semiconductor composite device, method for manufacturing it, LED head and image forming apparatus
CN100465665C (en) * 2005-09-02 2009-03-04 株式会社日立制作所 Optical part and projection type display apparatus using same
CN100487566C (en) * 2003-06-10 2009-05-13 大日本印刷株式会社 Projection screen and projection system containing same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100487566C (en) * 2003-06-10 2009-05-13 大日本印刷株式会社 Projection screen and projection system containing same
CN1737687A (en) * 2004-07-28 2006-02-22 因芬尼昂技术股份公司 Passivation of multi-layer mirror for extreme ultraviolet lithography
CN1734291A (en) * 2004-08-04 2006-02-15 索尼株式会社 Light diffusion sheet and method of producing the light diffusion sheet, and screen
CN1750255A (en) * 2004-09-14 2006-03-22 冲数据株式会社 Semiconductor composite device, method for manufacturing it, LED head and image forming apparatus
CN100465665C (en) * 2005-09-02 2009-03-04 株式会社日立制作所 Optical part and projection type display apparatus using same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107077249A (en) * 2014-11-07 2017-08-18 3M创新有限公司 touch-sensitive projection screen
CN105469653A (en) * 2016-01-12 2016-04-06 四川文轩教育科技有限公司 Multimedia teaching system
CN110750029A (en) * 2018-07-06 2020-02-04 深圳光峰科技股份有限公司 Projection screen

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Application publication date: 20111123