CN102169314B - Image data generating device and method thereof, image forming device and method thereof - Google Patents
Image data generating device and method thereof, image forming device and method thereof Download PDFInfo
- Publication number
- CN102169314B CN102169314B CN2011100510015A CN201110051001A CN102169314B CN 102169314 B CN102169314 B CN 102169314B CN 2011100510015 A CN2011100510015 A CN 2011100510015A CN 201110051001 A CN201110051001 A CN 201110051001A CN 102169314 B CN102169314 B CN 102169314B
- Authority
- CN
- China
- Prior art keywords
- image
- profile
- graphical element
- developer
- developer image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims abstract description 55
- 238000012937 correction Methods 0.000 claims abstract description 87
- 108091008695 photoreceptors Proteins 0.000 claims description 56
- 238000012545 processing Methods 0.000 claims description 37
- 238000010023 transfer printing Methods 0.000 claims description 22
- 238000011161 development Methods 0.000 claims description 14
- 230000000694 effects Effects 0.000 claims description 14
- 230000015572 biosynthetic process Effects 0.000 claims description 10
- 230000004048 modification Effects 0.000 abstract description 3
- 238000012986 modification Methods 0.000 abstract description 3
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 230000008569 process Effects 0.000 description 30
- 238000004140 cleaning Methods 0.000 description 24
- 238000012546 transfer Methods 0.000 description 21
- 230000007246 mechanism Effects 0.000 description 19
- 230000002093 peripheral effect Effects 0.000 description 16
- 239000003795 chemical substances by application Substances 0.000 description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 14
- 239000007788 liquid Substances 0.000 description 14
- 230000007261 regionalization Effects 0.000 description 14
- 230000018109 developmental process Effects 0.000 description 12
- 238000005530 etching Methods 0.000 description 11
- 239000010949 copper Substances 0.000 description 9
- 239000010410 layer Substances 0.000 description 9
- 238000003754 machining Methods 0.000 description 9
- 239000011159 matrix material Substances 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 8
- 238000013461 design Methods 0.000 description 8
- 230000005611 electricity Effects 0.000 description 8
- 239000011889 copper foil Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 230000033228 biological regulation Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 239000007921 spray Substances 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000012530 fluid Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000008676 import Effects 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000001007 phthalocyanine dye Substances 0.000 description 2
- 238000007790 scraping Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 230000007480 spreading Effects 0.000 description 2
- 238000003892 spreading Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- 241000220317 Rosa Species 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- -1 aluminium Chemical class 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 230000003292 diminished effect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000003760 hair shine Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 238000011112 process operation Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
- H04N1/40—Picture signal circuits
- H04N1/409—Edge or detail enhancement; Noise or error suppression
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G15/00—Apparatus for electrographic processes using a charge pattern
- G03G15/14—Apparatus for electrographic processes using a charge pattern for transferring a pattern to a second base
- G03G15/16—Apparatus for electrographic processes using a charge pattern for transferring a pattern to a second base of a toner pattern, e.g. a powder pattern, e.g. magnetic transfer
- G03G15/1605—Apparatus for electrographic processes using a charge pattern for transferring a pattern to a second base of a toner pattern, e.g. a powder pattern, e.g. magnetic transfer using at least one intermediate support
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G15/00—Apparatus for electrographic processes using a charge pattern
- G03G15/14—Apparatus for electrographic processes using a charge pattern for transferring a pattern to a second base
- G03G15/16—Apparatus for electrographic processes using a charge pattern for transferring a pattern to a second base of a toner pattern, e.g. a powder pattern, e.g. magnetic transfer
- G03G15/169—Apparatus for electrographic processes using a charge pattern for transferring a pattern to a second base of a toner pattern, e.g. a powder pattern, e.g. magnetic transfer with means for preconditioning the toner image before the transfer
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
- H04N1/40—Picture signal circuits
- H04N1/409—Edge or detail enhancement; Noise or error suppression
- H04N1/4092—Edge or detail enhancement
Abstract
Provided is an image data generating device and a method thereof, and an image forming device and a method thereof. A data modification part (72) of an image forming device (1) delimits a block of figurative element set from the figurative element set of the image in an original pattern data, which is step 102. The profile of the delimited block of figurative element set is identified, which is step 105. Whether a long edge or a short edge is opposite to the profile of a figurative element which is located within the distance regulated by the identified profile is determined, which is step 106. Correction is calculated based on determination result, which is step 111. The data of the figurative element is modified, which is step 112.
Description
Technical field
The present invention relates to form the technology of developer image (toner image) on object.
Background technology
In the past, as one of method that forms wiring pattern on the objects such as printed circuit board (PCB), Semiconductor substrate, following methods is known: the pattern by forming the resist film corresponding with wiring pattern on Copper Foil (namely, resist pattern: resist pattern), and across the resist pattern, apply etching solution on Copper Foil, remove the position of from the resist film of Copper Foil, exposing with this, thereby form the wiring pattern that is formed by copper.
In the formation of above-mentioned wiring pattern, as the method that forms the resist pattern, for example utilize photoetching process (photolithography), in this photoetching process,, by across mask, the photosensitive resist film that has on object being shone light, form the image of resist pattern with this on resist film, and by this resist film is developed, form the resist pattern corresponding with wiring pattern, wherein, above-mentioned mask has the transmittance section corresponding with wiring pattern or light shielding part.
Following technology is disclosed in TOHKEMY 2002-122977 communique: in the photoetching process operation, by make with the isolated line of resist pattern (namely, on every side without the isolated line of other lines) live width of corresponding mask pattern is thinner than the design live width, with this, prevents that isolated line is because of the optical proximity effect chap.
On the other hand, as the method that forms image, following methods is also known: utilize xeroprinting to form electrostatic latent image having on photosensitive object irradiation light, and provide developer (toner) (namely on this electrostatic latent image, develop), form the developer image with this.following technology is disclosed in No. 3668373 communique of Jap.P.: the edge effect of the electrostatic latent image in order to suppress to develop (, by other regional electric-field strengths that near the electric field the edge part that makes electrostatic latent image compares and the electrostatic latent image edge separates mutually, thereby make near edge part and adhere to than other zones the phenomenon that developer concentration uprises more), when forming electrostatic latent image, in the situation that the concerned pixel from a graphical element is shorter to the bee-line in the distance till the edge of this graphical element, light intensity to the concerned pixel irradiation is diminished, thereby the surplus of the developer while suppressing to develop is adhered to.
But, for utilizing xeroprinting to be formed at electrostatic latent image on photosensitive drums, utilize developing procedure that thereby developer is attached in the situation that forms the developer image on this electrostatic latent image, following situation is known: adhere to developer because of the edge effect surplus in the wire graphical element, the live width of developer image becomes thicker than the live width of electrostatic latent image thus.In addition, with this developer image on object the time, often the superfluous developer that adheres to can be at the object vertical spread.Due to these reasons, the width that often is transferred in the threadlike graph key element of the developer image on object will be greater than the design live width.The situation that also exists the local width that produces this kind threadlike graph key element to increase, as No. 3668373 communique of Jap.P., even adjusted the light intensity that is radiated on concerned pixel based on bee-line, the width that also is difficult to make the threadlike graph key element evenly and equal to design live width, wherein, above-mentioned bee-line refers to, the concerned pixel from the threadlike graph key element is to the bee-line in the distance till the edge of this threadlike graph key element.
Summary of the invention
The present invention relates to the image data generating device for image data generating, its purpose is to revise the increase of the width of the threadlike graph key element that edge effect causes, thereby makes the width of threadlike graph key element of developer image identical with desired width.
The image data generating device that the present invention relates to, generate and be used for forming on object in the xerox mode view data of developer image.Image data generating device has: gabarit recognition unit, the profile of the graphical element group in the image of its identification master pattern data; Identifying unit, it, to being positioned at apart from the graphical element of the position of the described profile predetermined distance that identifies, judges the relation with respect to described profile; Amending unit, its result of determination according to this identifying unit is revised the data of this graphical element.Thus, when forming the developer image on object, the increase of the width of the threadlike graph key element that can the edge effect causes is revised, thereby the width of the threadlike graph key element of developer image can be made desired width.
The another kind of image data generating device that the present invention relates to has: delimit unit, its graphical element group in the image of master pattern data, delimit out a block graphics key element group; The gabarit recognition unit, the profile of a described block graphics key element group of delimiting out unit delimited in its identification; Identifying unit, it, to being positioned at apart from the graphical element of the position of the described profile predetermined distance that identifies in a described block graphics key element group, judges the relation with respect to this profile; Amending unit, its result of determination according to this identifying unit is revised the data of this graphical element.Thus, the increase of the width of the threadlike graph key element that can the edge effect causes is revised, thereby the width of the threadlike graph key element of developer image can be made desired width.
The invention still further relates to a kind of image-data generating method, be used for generating for form the view data of developer image on object in the xerox mode.Image-data generating method comprises: the operation of the profile of the graphical element group in the image of identification master pattern data; , to being positioned at apart from the graphical element of the position of the described profile predetermined distance that identifies, judge the operation with respect to the relation of described profile; The operation of the data of this graphical element being revised according to the result of determination of this identifying unit.
The another kind of image-data generating method that the present invention relates to comprises: the graphical element group in the image of master pattern data, delimit out the operation of a block graphics key element group; The operation of the profile of the described block graphics key element group that identification delimited; , to being positioned at apart from the graphical element of the position of the described profile predetermined distance that identifies in a described block graphics key element group, judge the operation with respect to the relation of this profile; The operation of the data of this graphical element being revised according to result of determination.
The invention still further relates to the image processing system with image data generating device.Image processing system also has: the sub-image forming portion, and it, based on the complete data of correction that described image data generating device generates, forms electrostatic latent image on photoreceptor; Development section, it is by to described electrostatic latent image, providing developer to make described latent electrostatic image developing, thus the developer image before the formation transfer printing; Developer image section, its with described developer image on object.
The invention still further relates to for form the image forming method of developer image on object in the xerox mode.Image forming method comprises: the operation of the profile of the graphical element group in the image of identification master pattern data; , to being positioned at apart from the graphical element of the position of the described profile predetermined distance that identifies, judge the operation with respect to the relation of described profile; The operation of the data of this graphical element being revised according to the result of determination of this identifying unit; According to revising the next operation that forms electrostatic latent image on photoreceptor of complete data; By to described electrostatic latent image, providing developer to make described latent electrostatic image developing, thus the operation of the developer image before the formation transfer printing; With the operation of described developer image on object.
The another kind of image forming method that the present invention relates to comprises: the graphical element group in the image of master pattern data, delimit out the operation of a block graphics key element group; The operation of the profile of the described block graphics key element group that identification delimited; , to being positioned at apart from the graphical element of the position of the described profile predetermined distance that identifies in a described block graphics key element group, judge the operation with respect to the relation of this profile; The operation of the data of this graphical element being revised according to result of determination; Based on revising the next operation that forms electrostatic latent image on photoreceptor of complete data; By to described electrostatic latent image, providing developer to make described latent electrostatic image developing, thus the operation of the developer image before the formation transfer printing; With the operation of described developer image on object.
Above-mentioned purpose and other purpose, feature, mode and advantage, be able to clearly by the detailed description of the invention of referring to accompanying drawing, carrying out.
Description of drawings
Fig. 1 is the figure of structure of the pattern formation system 100 of explanation an embodiment of the invention.
Fig. 2 means the figure of the image recording structure device 1 of pattern formation system shown in Figure 1 100.
Fig. 3 means the process flow diagram of the action of pattern formation system shown in Figure 1 100.
Fig. 4 means the figure of the Potential distribution of photosensitive surface.
Fig. 5 means the figure of the Potential distribution of photosensitive surface.
Fig. 6 means the figure of the Potential distribution of photosensitive surface.
Fig. 7 A means the figure of the relation between electrostatic latent image and developer image.
Fig. 7 B means the figure of the relation between electrostatic latent image and developer image.
Fig. 7 C means the figure of the relation between electrostatic latent image and developer image.
Fig. 8 means the figure of an example of pictorial pattern group.
Fig. 9 A means the figure of the chap mode of the developer image that each is regional.
Fig. 9 B means the figure of the chap mode of the developer image that each is regional.
Fig. 9 C means the figure of the chap mode of the developer image that each is regional.
Figure 10 A means the figure of the correction of pictorial pattern data.
Figure 10 B means the figure of the correction of pictorial pattern data.
Figure 11 A means the figure of the correction of pictorial pattern data.
Figure 11 B means the figure of the correction of pictorial pattern data.
Figure 12 means computed correction and generates the figure of the concrete example of the treatment scheme of revising complete pattern data.
Figure 13 A means the figure for the pictorial pattern of the computation process of explanation correction.
Figure 13 B means the figure for the pictorial pattern of the computation process of explanation correction.
Figure 13 C means the figure for the pictorial pattern of the computation process of explanation correction.
Figure 13 D means the figure for the pictorial pattern of the computation process of explanation correction.
Figure 13 E means the figure for the pictorial pattern of the computation process of explanation correction.
Figure 13 F means the figure for the pictorial pattern of the computation process of explanation correction.
Figure 14 means the figure for the pictorial pattern of the computation process of explanation correction.
Figure 15 means the figure for the pictorial pattern of the computation process of explanation correction.
Figure 16 means the figure for the pictorial pattern of the computation process of explanation correction.
Figure 17 means the figure for the pictorial pattern of the computation process of explanation correction.
Figure 18 means the figure for the pictorial pattern of the computation process of explanation correction.
Figure 19 means the figure for the pictorial pattern of the computation process of explanation correction.
Figure 20 A means the figure for the pictorial pattern of the computation process of explanation correction.
Figure 20 B means the figure for the pictorial pattern of the computation process of explanation correction.
Figure 20 C means the figure for the pictorial pattern of the computation process of explanation correction.
Figure 20 D means the figure for the pictorial pattern of the computation process of explanation correction.
Figure 21 A means the figure for the pictorial pattern of the computation process of explanation correction.
Figure 21 B means the figure for the pictorial pattern of the computation process of explanation correction.
Embodiment
＜apparatus structure 〉
Fig. 1 means the figure of the structure of the pattern formation system 100 that embodiments of the present invention relate to.Pattern formation system 100 is to form the device of wiring pattern on the object 9 of film (film) shape.Object 9 is to have flexual flexibility (flexible) substrate (namely, film substrate), have the insulativity matrix material and an interarea that is formed at this insulativity matrix material conductive layer (being in the present embodiment Copper Foil (Cu)) on the whole of film-form, the resistivity of this conductive layer is 10
-6Ω cm is above and 10
3Below Ω cm.Pattern formation system 100 by etching (etching) thus the Copper Foil on object 9 remove and do not need part to form the copper wiring case, form thus the circuit substrate sheet, this circuit substrate sheet is the continuous sheet components of a plurality of flexible circuit boards, for this reason, also carry out following processing on the surface of this Copper Foil: utilize so-called xerox mode, with the developer printed wiring pattern with elching resistant.
As shown in Figure 1, pattern formation system 100 has: image processing system 1, its will be corresponding with wiring pattern developer image (that is, form) on the surface of the conductive layer of object 9, and make this developer image fixing on conductive layer as the resist pattern; Etaching device 61, its position of by the resist pattern from conductive layer, exposing (that is, the unlapped position of developer image) upper coating etching solution carries out etching, thereby from the insulativity matrix material, removes this position; The first cleaning device 62, it cleans the complete object 9 of etching; Image is removed device 63, and it peels off and remove resist pattern (that is, developer image) from object 9; And the second cleaning device 64, it cleans the object 9 of removing the resist pattern.In the following description, will utilize the surface 91 of conductive layer of the object 9 of image processing system 1 transfer printing developer image to be called " being transferred face 91 ".
Fig. 2 amplifies the figure that shows image processing system 1.As shown in Figure 2, image processing system 1 has: travel mechanism 2, and its maintenance has the object 9 of insulativity matrix material 93 and conductive layer 94, and at the moving direction along being transferred face 91, be (+Y) move on direction; Machining cell 3, it utilizes xeroprinting to form the developer image on photosensitive drums 31; The first current potential applying unit 4, it applies the current potential of regulation from this developer image to the outer peripheral face of photosensitive drums 31; The second current potential applying unit 5, itself and object 9 apply the current potential of regulation in contact to being transferred face 91; And data processing division 7, its pattern data to the formed developer image of machining cell 3 is revised and storage etc.Data processing division 7 has: the design pattern data that master pattern data store 71, its storage become the wiring pattern in developer image source is used as the master pattern data; And data correction section 72, it generates revises complete pattern data, and the complete pattern data of this correction refers to, the master pattern data are carried out the complete data of revised correction.
Machining cell 3 has the photosensitive drums 31 that is connected via speed reduction unit and motor (omitting diagram), and photosensitive drums 31 can be centered by the parallel turning axle 310 of the directions X with in Fig. 2 be rotated along the clockwise direction in Fig. 2.Photosensitive drums 31 has bulging main body 311, and this drum main body 311 is formed by metals such as aluminium, and centered by turning axle 310, and drum main body 311 is electrical ground.Coating (or evaporation) has the single-layer type Organophotoreceptor (being designated hereinafter simply as " photoreceptor 312 ") that for example comprises phthalocyanine dye (phthalocyanine) equably on the outer peripheral face of drum main body 311.In addition, photoreceptor 312, also can be by such as inorganic photoreceptors such as amorphous silicons (amorphoussilicon), forming except the single-layer type Organophotoreceptor by comprising phthalocyanine dye forms.
Machining cell 3 also has: charged device 32, itself and photosensitive drums 31 relatively be arranged on photosensitive drums 31 (+Z) side, be used for making photoreceptor 312 charged; Sub-image forming portion 33, thus the light that its irradiation of outer peripheral face to the photoreceptor 312 after charged image forms use forms electrostatic latent image; Development section 34, its liquid developer by will have elching resistant (for example, be dispersed in the wet developing agent in the insulativity solvent (current-carrying liquid) of isoalkane (isoparaffin) class) be coated on the electrostatic latent image on photoreceptor 312 and make this latent electrostatic image developing, thus form the developer image before transfer printing on the outer peripheral face of photoreceptor 312; Clearer 35, its surface to photoreceptor 312 is cleaned; And except electrical equipment 36, thereby its emergent light removes electricity to photoreceptor 312.
Around the photosensitive drums 31 of machining cell 3, from charged device 32 along the sense of rotation of photosensitive drums 31 (namely, clockwise direction in Fig. 1) dispose sub-image forming portion 33, development section 34, clearer 35 and except electrical equipment 36, be connected with the developer feeding section that the supply developer solution is liquid developer (omitting diagram) on development section 34.In addition, in image processing system 1, around photosensitive drums 31, also dispose the first current potential applying unit 4 between development section 34 and clearer 35.
The first current potential applying unit 4 is to produce ion and by this ion being provided to photoreceptor 312, make the charged corona charging mechanism of photoreceptor 312 by corona discharge (corona discharge), in the present embodiment, utilize grid electrode (scorotron), as the first current potential applying unit 4, photoreceptor 312 is applied current potential (hereinafter referred to as " the first current potential ").In addition, with the first current potential applying unit 4 similarly, the charged device 32 of machining cell 3 is also to make the charged corona charging mechanism of photoreceptor 312 by corona discharge.
The second current potential applying unit 5 has two contacts 51, and contact 51 has the brush (for example carbon brush (carbon brush), electroconductive brush) that is formed by conductive material.Each contact 51 is supported by omitting illustrated support component, and directly is transferred face 91 with the electric conductivity of object 9 and contacts.Due to the electrode of each contact 51 electrical ground, so the face that is transferred 91 of object 9 is also electrical ground.In other words, by the contact 51 of the second current potential applying unit 5, the face that is transferred 91 of object 9 is applied current potential (hereinafter referred to as " the second current potential ") as earthing potential.
In image processing system 1, photosensitive drums 31 (Z) side, by travel mechanism 2 and photosensitive drums 31 oppositely the face that is transferred 91 of mobile object 9 between the first current potential applying unit 4 and clearer 35 near the outer peripheral face of photosensitive drums 31.And, apply current potential by the first current potential applying unit 4 and the second current potential applying unit 5, in photosensitive drums 31 and the immediate position of object 9, the transfer voltage of regulation acts between the face that is transferred 91 of photosensitive drums 31 and object 9, thereby the developer image on the outer peripheral face of photosensitive drums 31 is to the face that is transferred 91 of object 9.In the following description, the immediate position of the face that is transferred 91 of the outer peripheral face of photosensitive drums 31 and object 9 is called " transfer position ".Concerning machining cell 3, transfer position is relatively fixing.In image processing system 1, the first current potential applying unit 4 and the second current potential applying unit 5 are developer image section, it makes the transfer voltage of regulation act between the face that is transferred 91 of photosensitive drums 31 and object 9 in transfer position, thus with developer image on object 9.
As shown in Figure 1, in pattern formation system 100, on the moving direction that object 9 moves by travel mechanism 2, dispose successively Etaching device 61, the first cleaning device 62, image and remove device 63 and the second cleaning device 64 between the photographic fixing section 52 of image processing system 1 and object recoverer 205, if a position on perpetual object thing 9, this position be moved mechanism 2 successively from one the device conveyance install to other.In other words, device 63 and the second shared object transport mechanism of cleaning device 64 are removed by image processing system 1, Etaching device 61, the first cleaning device 62, image by the travel mechanism 2 of mobile object thing 9.
The flow process that＜wiring pattern forms 〉
Fig. 3 means that the pattern formation system 100 that present embodiment relates to forms the figure of the flow process of wiring pattern on the object 9 of film-form.In addition, step S13 shows the flow process of the processing of a part of paying close attention to photoreceptor 312 to step S17, and to photoreceptor 312 generally, in fact, these steps almost walk abreast and carry out in time.In addition, step S18 shows the flow process of processing of the part of perpetual object thing 9 to step S22, and to object 9 generally, in fact, these steps are parallel carrying out almost in time.
At first, in the image processing system 1 of pattern formation system 100, when forming the developer image, the increase of the live width of the threadlike graph key element that (or inhibition) edge effect from causing in order to prevent, utilize the data correction section 72 of data processing division shown in Figure 27, the master pattern data that master pattern data store 71 is stored are revised, thereby generated the complete pattern data of correction (step S11) that threadlike graph key element part attenuates.This step S11 will describe in detail in the back.Revise the image shown in complete pattern data and master pattern data and similarly be bianry image, 3 sub-image forming portion 33 sends and revises complete pattern data (step S12) from data processing division shown in Figure 2 to machining cell.
In image processing system 1, at first, photosensitive drums 31 is centered by turning axle 310, clockwise direction in Fig. 2 starts rotation with certain rotational speed, and in travel mechanism 2, object supply department 203 and object recoverer 205 be respectively along counterclockwise rotation, thus make object 9 start with certain speed to (+Y) direction moves.In machining cell 3, rotation by photosensitive drums 31, the endless member of the cylinder drum type centered by turning axle 310 is photosensitive drums 31, with respect to each peripheral structure around being configured in (be charged device 32, sub-image forming portion 33, development section 34, the first current potential applying unit 4, clearer 35 and except electrical equipment 36), along outer peripheral face continuity ground loopy moving, thereby these peripheral structures start photoreceptor 312 is processed.
Charged device 32 provides electric charge to the part (hereinafter referred to as " object position ") of the photoreceptor 312 that arrives opposed position successively, the surface uniform area that makes the object position for example+700V (volt: electricity volt) (step S13).Object position after charged is mobile to the irradiation position continuity ground of the light of sub-image forming portion 33.
Sub-image forming portion 33 has LED array as light source, at this LED array, disposes a plurality of light emitting diodes (LED) for the light of outgoing provision wavelengths.In sub-image forming portion 33, the complete pattern data of the correction that based on data handling part 7 sends forms the light of use to photoreceptor 312 outgoing images.The position that shines light in the object position of photoreceptor 312, the electric charge on surface moves in photoreceptor 312, makes surface potential be reduced to+100V.In addition, to keep electriferous state constant due to the position that does not shine light, therefore forms the image (being electrostatic latent image) (step S14) based on CHARGE DISTRIBUTION on photoreceptor 312.It must be LED that the light source of sub-image forming portion 33 need not, and can be also for example semiconductor laser or device that lamp (lamp) and liquid crystal light valve (liquid crystal shutter) are combined.
On photosensitive drums 31, be formed with the part (object position) of electrostatic latent image to the opposed position of development section 34, moving.In development section 34, developer roll 341 is connected with developing bias power supply 343, by developing bias power supply 343, is applied in+current potential of 500V.And, because of the bias voltage between developer roll 341 and electrostatic latent image, the wet developing agent of the positively charged in liquid developer (that is, be dispersed in the solvent of liquid developer and with the wet developing agent of the electricity with photoreceptor 312 surperficial identical polars) is coated in (step S15) on electrostatic latent image.In the present embodiment, as the wet developing agent, using particle diameter is the developer that 0.1 μ m is above and 2 μ m are following (more preferably, more than 0.1 μ m and below 0.5 μ m).
Fig. 4 to Fig. 6 schematically shows the figure of Potential distribution that is coated with photoreceptor 312 surfaces of wet developing agent 92 by development section 34 (with reference to Fig. 2).In Fig. 4 to Fig. 6, draw the current potential on photoreceptor 312 surfaces with solid line 301, be positioned at the situation of drum main body 311 an opposite side for just with respect to photoreceptor 312 surfaces with solid line 301.In addition, the size of the distance expression current potential of the above-below direction between solid line 301 and photoreceptor 312 surfaces.
As shown in Figure 4, in object position on photoreceptor 312, only at the position that surface potential is reduced, adhere to wet developing agent 92, electrostatic latent image is developed thus, wherein, this wet developing agent 92 is positive electricity with the electricity with photoreceptor 312 surperficial identical polars.That is, utilize the developer image before the formation transfer printing on the object position of wet developing agent 92 on the outer peripheral face of photoreceptor 312.In image processing system shown in Figure 21, the motor of photosensitive drums 31 and drum rotation use is as developer image maintaining part, and this developer image maintaining part keeps the developer image before transfer printing and makes photoreceptor 312 loopy movings on the outer peripheral face of photoreceptor 312.
In development section 34, unwanted liquid developer on the object position be positioned at developer roll 341 (Z) the scraper plate roller (squeegee roller) of side (that is, the downstream of the loopy moving of photosensitive drums 31) thus 342 scrapings turn back to development section 34.Scraper plate roller 342 is connected with power supply 344 with scraper plate, by scraper plate, uses power supply 344 to be applied in+current potential of 500V.And, scraper plate roller 342 rotates with the scraping liquid developer along the clockwise direction in Fig. 2, thereby the remaining liquid developer on recovery photoreceptor 312 (namely, excessive being coated to by sub-image forming portion 33 reduced liquid developer on the position of surface potential, and to be coated to position that surface potential do not reduce be liquid developer on background (background)).
Then, in the loopy moving process of photosensitive drums 31,, by being configured in transfer position the first current potential applying unit 4 nearby, from the developer image that develops on photoreceptor 312, the outer peripheral face of photoreceptor 312 is applied first current potential (step S16) of the polarity positive polarity identical with the charged polarity of wet developing agent.Thus, as shown in Figure 5, the whole band in the object position of the outer peripheral face of photoreceptor 312 with utilize the charged roughly the same of charged device 32 or the large current potential of absolute value (be about in the present embodiment+800V) electricity.In addition, in the object position, the current potential of the adhering zone of wet developing agent 92 is slightly different from the current potential of non-adhering zone, but the potential difference (PD) of this kind degree can affect the transfer printing of wet developing agent 92 described later hardly.In addition, this potential difference (PD) applies the time of the first current potential and can be eliminated by extending the first current potential applying unit 4.
If applying of the first current potential of the first current potential applying unit 4 shown in Figure 2 is complete, the object position of photosensitive drums 31 arrives transfer position, wherein, this transfer position is the position of the face that is transferred 91 of the object 9 that moves of the most approaching and rotary synchronous photosensitive drums 31, and in transfer position, the object position with the corresponding speed of the rotational speed with photosensitive drums 31 speed of the wiring direction in the perpendicular cross section of the turning axle 310 of the outer peripheral face of photosensitive drums 31 (that is, with) correctly to (+Y) direction moves.In addition, object 9 is by travel mechanism 2, with the identical speed in the object position of the photoreceptor 312 with transfer position to the identical moving direction of the working direction with the object position namely (+Y) direction moves.Thus, with the transfer position utmost point nearby, the position of object 9 (object 9 with opposed position, object position) is fixed with respect to the object position.
At this moment, object 9 is by being configured in respectively (+Y) side and (Y) two contacts 51 of the second current potential applying unit 5 of side and electrical ground (in other words of transfer position, by the second current potential applying unit 5, the face that is transferred 91 to object 9 is applied with earthing potential), the transfer voltage of regulation acts between the object position of the face that is transferred 91 of object 9 of transfer position and photoreceptor 312.Namely, generation is from the object position to the electric field that is transferred face 91, thereby as shown in Figure 6, the masterpiece of the direction of 9 the face that is transferred 91 (that is, the direction of the arrow points that indicates Reference numeral 302 in Fig. 6) is used for wet developing agent 92 from photoreceptor 312 to object.Thus, be attached on the face that is transferred 91 that the image of the developer with positive electricity on the object position of photoreceptor 312 is transferred in object 9 successively (step S17).
In image processing system 1, when according to the master pattern data, generating the complete pattern data of correction, threadlike graph key element in image shown in the master pattern data is attenuated by part, and this amount of attenuating is that the surplus of the developer while in order to make final live width become even as the master pattern data, consider developing spreading while adhering to transfer printing calculated.Therefore, the wet developing agent that is attached to the position that attenuates because edge effect is superfluous, at the face that is transferred 91 vertical spreads of object 9, forms the developer image of the threadlike graph key element that comprises the even and faithful to master pattern data of live width thus on object 9 when transfer printing.
The object position of the photoreceptor 312 after transfer printing wet type developer then moves to the position of clearer shown in Figure 2 35.Clearer 35 utilizes the 351 pairs of object positions of rose ejection cleaning fluids, remains in the unwanted materials (hereinafter referred to as " residual developer ") such as wet developing agent on the object position with this wetting is not transferred on object 9.Thus, be fixed on the residual developer at object position with swelling, thereby residual developer is minimized the bonding force of photoreceptor 312.
Next, by in Fig. 2 in the direction of the clock (namely, the direction identical with the sense of rotation of photosensitive drums 31) the object position that the sponge roller (sponge roller) 352,353,354 that rotates is cleaned photoreceptor 312, with this, residual developer is attached on these sponge rollers, thereby from photoreceptor 312, removes residual developer.The residual developer that is attached on sponge roller is absorbed by suction nozzle together with cleaning fluid, thereby from sponge roller, removes the residual developer that is attached on sponge roller.
If the surface with clearer 35 cleaning photoreceptors 312, thereby photoreceptor 312 mechanically returns to original state, the combination by having lamp and filtrator or LED's etc. except electrical equipment 36, to object position irradiation light, thereby photoreceptor 312 is removed electricity, make it return to electric original state.
As mentioned above, step S13 is to the processing of step S17, for parallel the carrying out almost of each position on photoreceptor 312, each continuity ground, position of the photoreceptor 312 that arrives successively transfer position processed.Therefore, developer integral image on the outer peripheral face of photoreceptor 312 is transferred on object 9 in transfer position, process by repeatedly carrying out this, form the developer image corresponding with the wiring pattern of a plurality of flexible circuit boards on the object 9 that finally becomes a plurality of flexible circuit boards.
In image processing system 1, the position that is formed with the developer image of object 9 by travel mechanism 2 from transfer position to (thereby+Y) side shifting is by the below of photographic fixing section 52, utilize 52 pairs, photographic fixing section to be transferred face 91 and the developer image that is transferred on face 91 heats with this, thereby make the developer image fixing become resist pattern (step S18) being transferred on face 91.
The photographic fixing of object 9 has the position of developer image, 61 move from image processing system 1 to Etaching device by travel mechanism shown in Figure 12, Etaching device 61 is to its coating etching solution, implement etching with this position from developer image (being the resist pattern) exposes to conductive layer 94 (with reference to Fig. 2), thereby from insulativity matrix material 93 (with reference to Fig. 2), remove this position (step S19).Thus, the part that the agent image covers that only is developed in the conductive layer 94 that is formed by copper remains on insulativity matrix material 93, thereby becomes the wiring pattern (being copper electrode and copper wiring) of flexible circuit board.
Move to the first cleaning device 62 from Etaching device 61 by travel mechanism 2 at the etched position that is implemented of object 9, and at the first injected pure water of cleaning device 62, thereby with this cleaning object thing 9, remove etching solution (step S20) on object 9.
The complete position of the cleaning of object 9 is removed device 63 by travel mechanism 2 from the first cleaning device 62 to image and is moved, remove the coated stripper of device 63 at image, peel off the developer image (that is, the resist pattern on formed wiring pattern on insulativity matrix material 93) (step S21) of removing on object 9 from wiring pattern with this.Thus, form the flexible circuit board that has insulativity matrix material 93 and be formed at the copper wiring case on insulativity matrix material 93.
The position that the developer image of object 9 is stripped from is removed device 63 by travel mechanism 2 from image and is moved to the second cleaning device 64,, at the second injected pure water of cleaning device 64, with this cleaning object thing 9, remove stripper (step S22) on object 9.Then, take out of from the second cleaning device 64 by travel mechanism 2 at the complete position of the cleaning of object 9, and after heat as required or air-supply etc. carries out drying to it, by the object recoverer 205 of travel mechanism 2, reeled and reclaimed.Thus, form the continuous circuit substrate sheet of a plurality of flexible circuit boards.
In above operation, pattern formation system 100 in present embodiment will want the design data of the copper wiring case of the flexible circuit board of making to input to data processing division 7 from the CAD system of outside etc., and this design data is stored in master pattern data store 71 as the master pattern data that become developer image source.And, in order finally to form the developer image that conforms to these master pattern data on the surface of object 9 (flexible base, board), consider the distortion (chap) of the pattern in developing procedure, transfer printing process, utilize data correction section 72 to revise the master pattern data, thereby generate, revise complete pattern data (step S11).Like this, in image processing system 1, the effect of data correction section 72 performance image data generating devices, this image data generating device generates the view data that is used to form the developer image and namely revises complete pattern data.Then, utilize that the complete pattern data of this correction exposes, development, transfer printing, etching and stripping process, thereby make flexible circuit board.Then, illustrate that the data correction section 72 of pattern formation system 100 carries out the details of data correction, the i.e. details of above-mentioned step S11.
The general tendency of the developer image chap after＜electrostatic latent image and transfer printing 〉
Fig. 7 A to Fig. 7 C shows electrostatic latent image in following situation and the relation between the developer image, the left side of arrow represents electrostatic latent image, right side represents the developer image, wherein, above-mentioned situation refers to, form the electrostatic latent image of arbitrary graphic pattern with xeroprinting on photoconductor drum, make liquid developer adhere to develop and be transferred on object, thereby form the situation of developer image.Here, so-called pictorial pattern, refer to the graphical element in the image of master pattern data.As shown in Figure 7 B,, in the situation that pictorial pattern is circular evenly chap on all directions, as shown in Fig. 7 C, be in foursquare situation, with respect to the even chap in each limit.In addition, in the situation that pictorial pattern is wire, as shown in Figure 7 A, the developer image is compared with electrostatic latent image, and the chap amount of Width is larger than the chap amount of length direction.
Around＜pictorial pattern group on the impact of the chap of each pictorial pattern
By the result of the present inventors research and development as can be known, be the developer image of pictorial pattern group in the situation that want to form the graphical element group that a plurality of pictorial pattern set form, the state of the developer image chap of each pictorial pattern, to change according to the impact in the zone that does not have pictorial pattern in the profile outside that how to be subject to this pictorial pattern group, and will according to this pictorial pattern in the pictorial pattern group from above-mentioned profile between position relationship and different.Fig. 8 shows an example of pictorial pattern group, and here, in figure, a plurality of pictorial patterns of the line segment (part of blacking in figure) of longitudinal length length are assembled and formation pictorial pattern group with parallel state.
In addition, in the explanation of this Fig. 8, so-called profile, the whole pictorial patterns (line segment of longitudinal length length) that refer to form the pictorial pattern group are regarded a graphical set as, to be arranged in the line that the extended line of the top of the following extended line of the left side of the line segment of the figure leftmost side, whole line segment, the right of line segment that is arranged in the figure rightmost side and whole line segment is linked in sequence and forms, in the inside of this profile, comprise whole pictorial patterns.For this kind pictorial pattern group, utilize the xerox mode to form electrostatic latent image on photoconductor drum, and make liquid developer adhere to develop, then be transferred on object in the situation that obtains the developer image, the each several part of pictorial pattern is subject to, from the mode of the impact in the profile outside, following three kinds of modes are arranged.
The firstth, be not subjected to the situation from the impact outside the profile of pictorial pattern group.The pictorial pattern of the inboard above apart from profile predetermined distance (being 300 μ m here) meets this part.This part is the pictorial pattern that is positioned at the zone that indicates R1 of Fig. 8.
The secondth, be subject to situation from the impact in the profile outside of pictorial pattern group from the short brink of pictorial pattern.Be positioned at apart from the figure pattern groups profile predetermined distance (being 300 μ m here) with position and minor face and the equitant pictorial pattern of profile of the line segment of pictorial pattern meet this part.
The 3rd is that long side from pictorial pattern is subject to the situation from the impact in the profile outside of pictorial pattern group.Be positioned at apart from the figure pattern groups profile predetermined distance (being 300 μ m here) with position and the long limit of the line segment of pictorial pattern and profile overlaid or parallel pictorial pattern meet this part.
With regard to the pictorial pattern group of Fig. 8, contrast three kinds of modes, the pictorial pattern that indicates the zone of R2 in Fig. 8 meets the second mode, similarly, indicates the region conforms Third Way of R3, indicates region conforms the second mode and this dual mode of Third Way of R4.In addition, the region conforms that indicates R1 first mode of the central portion of remaining pictorial pattern group.
And experimentally confirms, at these regionals, formed developer image is with chap as follows.That is, R1 zone is as Fig. 9 A and the orientation independent ground chap ormal weight of line segment.R2 zone is as Fig. 9 B and the front end chap of the orientation independent ground short brink of line segment and become shape as the circular front end of swab stick, and the chap amount is along with away from front end (gabarit), reducing.R3 zone as Fig. 9 C and the chap amount of its rugosity direction of orientation independent ground of line segment along with away from gabarit, reducing.The chap mode in R4 zone is the chap mode that the chap mode in the chap mode in R2 zone and R3 zone superposes.
In addition, here, with profile between predetermined distance namely 300 μ m represent: with the profile outside the developer image of pictorial pattern is brought the distance in the zone of impact without the corresponding liquid developer in graphics field by the charge attraction of the electrostatic latent image of pictorial pattern.The concrete value of this predetermined distance can change according to the characteristic of exposure, the conditioned disjunction liquid developer that develops etc.In fact, can come experimentally to determine according to for example condition of pattern formation system 100.
The modification rule of＜each regional pictorial pattern data 〉
In the present invention, according to above-mentioned and on every side between position relationship and chap mode, utilize corrections that attenuate of 72 pairs of master pattern data as developer image source of data correction section, thereby generate the complete pattern data of correction.This correction is to consider each regional chap mode, carry out according to the modification rule of the impact of offsetting chap so that develop and transfer printing after the developer image have the wiring pattern that equates with the master pattern data.This correction i.e. amount of attenuating considers that the surplus of the developer while developing is adhered to and spreading during transfer printing calculates.And, calculating and revise complete pattern data based on this correction that calculates, pattern data complete according to this correction exposes to form electrostatic latent image on photosensitive drums.
If the particular content according to each zone explanation is revised needs to carry out following correction: because of the orientation independent ground chap ormal weight of R1 zone with line segment, so, for whole line segments, make it the ormal weight that attenuates, 2 μ m for example attenuate.The revised line segment that will attenuate is as revising complete pattern data.
For the master pattern data that are positioned at the R2 zone, table according to Figure 10 A, the front end with the equitant line segment of profile (namely holding limit), make the width of its line segment 12 μ m that attenuate, make the width of its line segment 10 μ m that attenuate in the inboard of distance profile 50 μ m ... ", the width of line segment is attenuated.For example as follows general triangular being cut in the left and right of the front end of line segment attenuates front end: if the master pattern data are that the rugosity that represents with solid line in Figure 10 B is the line segment of 50 μ m, revise complete pattern data as with dashed lines and profile line represent, namely attenuating correction for amounting to 12 μ m with the equitant part of the profile left and right F=6 μ m that attenuates respectively, and in the inboard part of distance profile 50 μ m, the left and right 5 μ m that attenuate respectively.Figure 10 B exaggerates the figure that draws, in figure, and F=6 μ m, E=1 μ m.The revised line segment that will attenuate is as revising complete pattern data.
For being positioned at the master pattern data in R3 zone, table according to Figure 11 A, calculate according to the distance between corresponding master pattern data and profile the correction that attenuates, calculate according to the live width of master pattern data the correction factor 1 that attenuates, according to and adjacent wiring pattern between the width at interval calculate the correction factor 2 that attenuates, and these numerical value are multiplied each other the value that obtains as the correction that attenuates.For example, if the master pattern data are that the rugosity that represents with solid line in Figure 11 B is the line segment of 50 μ m, its outside and profile overlaid, and the 50 μ m that are spaced apart in abutting connection with pattern with opposition side, with profile overlaid one side, there is no adjacent wiring pattern (interval width is more than 250 μ m), the correction that attenuates A with the equitant side of profile be A=12 μ m * 1 * 1.8=19.2 μ m.In addition, be B=10 μ m * 1 * 1=10 μ m in an opposite side.With regard to next wiring pattern, with the distance of the adjacent wire pattern of D side be also 50 μ m, so C=8 μ m * 1 * 1=8 μ m, D=6 μ m * 1 * 1=6 μ m.Thus, revise complete pattern data and become the data that with dashed lines and profile line represent.
The chap mode in R4 zone is the chap mode of mixing the chap mode in the chap mode in R2 zone and R3 zone, thus correction can be also the value that calculates as the R2 zone and the value that calculates as the R3 zone and.But, compare with so simple phase add mode, correction is set as value * β of value * α of calculating as the R2 zone+calculate as the R3 zone=correction, and the coefficient that imports 0≤factor alpha, β≤1 calculates, can be suitable for various conditions.With regard to factor alpha, β, can generate according to original live width, come the table of the value that experimentally determines to use corresponding value with the conditions such as interval width of adjacent lines, perhaps in order simply to stipulate suitable constant.
In addition, the calculating of above-mentioned correction is not limited to this, can carry out other distortion, also can import other thought in addition.For example, with regional R3 similarly, the thought regional R1, R2 also can import the original live width of Fig. 7 and the corresponding correction coefficient of interval width between adjacent lines, multiply by the correction coefficient and calculate above-mentioned correction on the value of correction table.
In addition, the sector region R5 that regional R3 in existence as shown in Figure 21 A and Figure 21 B and R3 clip, perhaps in the situation of the sector region R6 that clips of regional R3 and R2, reply as described below: sector region R5 is carried out the correction same with R3, sector region R6 is generated special-purpose correction table (not shown) etc.
As described above, come in the situation that form the developer image of this pictorial pattern on object 9 in the correction that attenuates by to the pictorial pattern data, can offset edge effect, thereby this developer image can become the shape of this pictorial pattern of master pattern data.
The treatment scheme of complete pattern data is revised in＜calculating 〉
Here, Figure 12 of the concrete example of the treatment scheme of carrying out based on the control device (so-called microcomputer) of expression data processing division 7, the calculating of the correction of the step S11 of key diagram 3 and revise the generation of complete pattern data.
At first, pattern formation system 100 will want the design data of the copper wiring case of the flexible circuit board of making to input to data processing division 7 from the CAD system of outside etc., and store in master pattern data store 71 the master pattern data (step S101) as the pictorial pattern that becomes developer image source into.
Then, then, divide the pictorial pattern group (step S102) that is used for computed correction.Namely, in the present embodiment, the developer that to be positioned at from the distance of the electrostatic latent image of pictorial pattern be the position of 300 μ m left and right is attracted because of electric field, thereby causes chap, if therefore being spaced apart in 300 μ m between pictorial pattern, treat as a pictorial pattern group.Particularly, for the master pattern data that the set of the black line segment by shown in Figure 13 A forms, the each point that makes for the time being whole pictorial patterns is chap 150 μ m left and right on whole directions.Thus, to be 300 μ m disappear and become one with the gap of interior pictorial pattern distance each other, thereby become a larger pictorial pattern.Then, make the each point on every side of this pictorial pattern shrink 150 μ m, thereby obtain Figure 13 B.After, the pictorial pattern that enters into the profile scope of this Figure 13 B is treated as a pictorial pattern group.
In addition, when to have each other distance in master pattern data be a plurality of pictorial pattern group more than 300 μ m, at this step S102, each pictorial pattern group is divided.In other words, the pictorial pattern group from the image of master pattern data delimited out a block graphics pattern groups.Then, each pictorial pattern group is carried out following correcting process.
Then, judge the part (step S103) in the R1 zone that is equivalent to illustrate previously.That is, make the graph Contraction 300 μ m of Figure 13 B, obtain Figure 13 C.The pictorial pattern that enters the profile scope of this Figure 13 C becomes the R1 zone.The pictorial pattern of this part as shown in Figure 13 D, be to Figure 13 C and as Figure 13 A of master pattern data carry out processing with (logical and) and.
Then, judge the R2 zone that is equivalent to illustrate previously, the part (step S 104) that R3 is regional and R4 is regional.That is, remove the R1 zone of Figure 13 C and obtain Figure 13 E from the figure of Figure 13 B, the pictorial pattern that enters into this profile scope becomes R2 zone, R3 zone and R4 zone.The pictorial pattern of this part as shown in Figure 13 F, be to Figure 13 E and as Figure 13 A of master pattern data carry out processing with (logical and) and.
Then, delimit the profile (step S105) of this pictorial pattern group.Here, extract Figure 13 F each pictorial pattern edge and obtain Figure 14.Then, to this Figure 14 with Figure 13 C carries out or (logical OR) processed and obtain Figure 15.And then, make vertical line extend 300 μ m from each point on each limit of edge line of this Figure 15, and the part that will with other edge lines, not overlap is as along all points.Connect this along all points, obtain the profile that represents with thick line in Figure 16.Thus, data correction section 72 identifies profile.
Then, for the each point of each pictorial pattern that becomes profile, judgement is long limit or the minor face (step S106) of pictorial pattern.
Then, mark off the zone (step S107) that is subject to externalities from short brink.Here, as shown in figure 17, the line that drawing out becomes the short brink of pictorial pattern profile on right angle orientation each point is pressed into to the inside from profile, with the zone between this line and profile as from the affected zone of short brink.
Then, mark off the zone (step S108) that is subject to externalities from long side.Here, as shown in figure 18, the line that drawing out becomes the long side of pictorial pattern profile on right angle orientation each point is pressed into to the inside from profile, with the zone between this line and profile as from the affected zone of long side.
Then, judge the part (step S109) in the R4 zone that is equivalent to illustrate previously.That is the intersection from the affected zone of long side (with reference to Figure 19) that marks off from the affected zone of short brink and step S108 that, step S107 is marked off is as the R4 zone.
Then, judge the R2 zone be equivalent to illustrate previously and the part (step S110) in R3 zone.Namely, will be from the zone of removing the R4 zone from the affected zone of short brink that step S107 marks off as the R2 zone, will be from the zone of removing the R4 zone from the affected zone of long side that step S108 marks off as R3 zone (with reference to Figure 19).
Then, by above-mentioned steps S106, to step S110, each pictorial pattern is judged respectively it is the opposed regional R2 of minor face and profile, or long limit and the opposed regional R3 of profile, or minor face and grow limit all with the opposed regional R4 of profile.Like this, view data correction portion 72, to and the profile of the pictorial pattern group that identifies between distance less than the pictorial pattern of the position of predetermined distance, judge the relation with respect to profile, particularly judge the shape that depends on profile and apart from the relation of the distance of profile.
Then, according to each zone of the R1 that illustrates previously, R2, R3 and R4, the correction that corresponding pictorial pattern data are calculated above-mentioned pictorial pattern data i.e. the amount of attenuating (step S111).
Then,, to each pictorial pattern,, based on the correction that calculates, revise each pictorial pattern data.Thus, calculate and revise complete pattern data (step S112).That is, to being positioned at the pictorial pattern data apart from the position of profile predetermined distance, correction attenuates.
Then, utilize the complete pattern data of correction that calculates as described above to form the developer image.
The decision method of＜long limit, minor face 〉
Here, in calculating the treatment scheme of revising complete pattern data, at step S106, judging that the pictorial pattern that becomes profile is the long limit of this pictorial pattern or the method for minor face, an example of its thought is described.
(1) at first,, to the limit as judging object, consider following local coordinate system.
Judge the initial point (0,0) of object edges
Judge the terminal (L, 0) of object edges, wherein L=judges the length of object edges
(2) then, set the square area (this square area is called judges with zone in the following description) of 0≤X≤L and 0≤Y≤L.
(3) then, obtain and be positioned at other limits of judging with zone.
(4) then, obtain the summation J of this judgements with interior other limits, the projected length on directions X in zone.
(5) when L/2≤J, be judged to be and judge that object edges is long limit, when L/2＞J, be judged to be and judge that object edges is minor face.
For example, if G limit and the H limit of the pictorial pattern of Figure 20 A are judged, with regard to the G of limit, as Figure 20 A, because J=J1+J2＜L/2 is minor face so be judged to be limit G.In addition, with regard to the H of limit, as Figure 20 C, because L/2≤J is long limit so be judged to be limit H.
In addition,, if according to such decision rule,, for example in the situation that judge to the judgement object edges I as Figure 20 D, following problem may occur: due to J=0＜L/2, so the former limit I that should be judged to be long limit is judged to be minor face.Therefore, for fear of this kind misinterpretation, in the situation that the length of for example judging object edges, less than 40 μ m, needs only the Exception handling that carries out on the basis of the vector of confirming the limit that is connected with this judgement object edges as " not being judged to be minor face ".
In addition, the calculating of above-mentioned correction, can carry out with bianry image, also can directly with vector data, carry out.
As described above, according to the present invention, in the time will forming the developer image on object 9, the increase of the width of the threadlike graph key element that the edge effect causes is revised, thereby can prevent or suppress the increase of live width, the width of the threadlike graph key element of developer image desired width can be made, for example the value that equates with the design data of wiring pattern can be made.
In the above-described embodiment, by data correction section 72 realize identifying the profile of pictorial pattern group the gabarit recognition unit, judge the identifying unit of the relation between profile and pictorial pattern and carry out the amending unit of correction pattern pattern data according to the result of determination of this identifying unit, but these three unit also can be realized by a plurality of devices.In addition, in the situation that exist the delimitation unit of a plurality of pictorial pattern groups delimitation one block graphics pattern groups also can realize by the device different from data correction section 72 in the image of master pattern data.
At length describe and illustrated invention, but the explanation of stating is example rather than restriction.Therefore, only otherwise depart from the scope of the present invention, can carry out a lot of distortion and maybe can realize a lot of modes.
Claims (12)
1. an image data generating device, generate and be used for forming the view data of developer image in the xerox mode on object, it is characterized in that having:
The gabarit recognition unit, the profile of the graphical element group in the image of its identification master pattern data;
Identifying unit, its judge apart from the distance of the described profile that identifies, graphical element with described profile overlaid or parallel limit, described graphical element group is divided into the outside affected a plurality of zones of developer image from described profile;
Amending unit, its result of determination according to this identifying unit is obtained each the regional correction that marks off, and described master pattern data are revised.
2. the image data generating device of putting down in writing according to claim 1, it is characterized in that, described amending unit is to being positioned at apart from the correction that attenuates of the data of the graphical element of the position of described profile predetermined distance, make in the situation that formed the developer image of this graphical element on described object, thereby with edge effect, offset the shape that makes this developer image form this graphical element of master pattern data.
3. an image data generating device, generate and be used for forming the view data of developer image in the xerox mode on object, it is characterized in that having:
Delimit unit, its graphical element group in the image of master pattern data, delimit out a block graphics key element group;
The gabarit recognition unit, the profile of a described block graphics key element group of delimiting out unit delimited in its identification;
Identifying unit, it is to a described block graphics key element group, judge distance apart from the described profile that identifies, graphical element with described profile overlaid or parallel limit, described graphical element group is divided into the outside affected a plurality of zones of developer image from described profile;
Amending unit, its result of determination according to this identifying unit is obtained each the regional correction that marks off, and described master pattern data are revised.
4. the image data generating device of putting down in writing according to claim 3, it is characterized in that, described amending unit is to being positioned at apart from the correction that attenuates of the data of the graphical element of the position of described profile predetermined distance, make in the situation that formed the developer image of this graphical element on described object, thereby with edge effect, offset the shape that makes this developer image form this graphical element of master pattern data.
5. the image data generating device that according to claim 1 to 4, any one is put down in writing, it is characterized in that, described identifying unit judges that minor face and the described profile of described graphical element is opposed, and still long limit and described profile are opposed, and still long limit and minor face are all opposed with described profile.
6. an image-data generating method, generate and be used for forming the view data of developer image in the xerox mode on object, it is characterized in that, comprising:
The operation of the profile of the graphical element group in the image of identification master pattern data;
Judge distance apart from the described profile that identifies, graphical element with described profile overlaid or parallel limit, described graphical element group is divided into the operation of developer image from outside affected a plurality of zones of described profile;
Obtain each the regional correction that marks off according to result of determination, the operation that described master pattern data are revised.
7. an image-data generating method, generate and be used for forming the view data of developer image in the xerox mode on object, it is characterized in that, comprising:
Graphical element group in the image of master pattern data, delimit out the operation of a block graphics key element group;
The operation of the profile of the described block graphics key element group that identification delimited;
To a described block graphics key element group, judge distance apart from the described profile that identifies, graphical element with described profile overlaid or parallel limit, described graphical element group is divided into the operation of developer image from outside affected a plurality of zones of described profile;
Obtain each the regional correction that marks off according to result of determination, the operation that described master pattern data are revised.
8. an image processing system, be used for forming the developer image in the xerox mode on object, it is characterized in that having:
Image data generating device, its generation is used to form the view data of described developer image,
The sub-image forming portion, it, based on the complete data of correction that described image data generating device generates, forms electrostatic latent image on photoreceptor,
Development section, it is by to described electrostatic latent image, providing developer to make described latent electrostatic image developing, thus the developer image before the formation transfer printing,
Developer image section, its with described developer image on object; Wherein,
Described image data generating device has:
The gabarit recognition unit, the profile of the graphical element group in the image of its identification master pattern data,
Identifying unit, its judge apart from the distance of the described profile that identifies, graphical element with described profile overlaid or parallel limit, described graphical element group is divided into the outside affected a plurality of zones of developer image from described profile,
Amending unit, its result of determination according to this identifying unit is obtained each the regional correction that marks off, and described master pattern data are revised.
9. an image processing system, be used for forming the developer image in the xerox mode on object, it is characterized in that having:
Image data generating device, its generation is used to form the view data of described developer image,
The sub-image forming portion, it, based on the complete data of correction that described image data generating device generates, forms electrostatic latent image on photoreceptor,
Development section, it is by to described electrostatic latent image, providing developer to make described latent electrostatic image developing, thus the developer image before the formation transfer printing,
Developer image section, its with described developer image on object; Wherein,
Described image data generating device has:
Delimit unit, its graphical element group in the image of master pattern data, delimit out a block graphics key element group,
The gabarit recognition unit, the profile of a described block graphics key element group of delimiting out unit delimited in its identification,
Identifying unit, it is to a described block graphics key element group, judge distance apart from the described profile that identifies, graphical element with described profile overlaid or parallel limit, described graphical element group is divided into the outside affected a plurality of zones of developer image from described profile
Amending unit, its result of determination according to this identifying unit is obtained each the regional correction that marks off, and described master pattern data are revised.
According to claim 8 or 9 the record image processing systems, it is characterized in that, described amending unit is to being positioned at apart from the correction that attenuates of the data of the graphical element of described profile predetermined distance, make in the situation that formed the developer image of this graphical element on described object, thereby with edge effect, offset the shape that makes this developer image form this graphical element of master pattern data.
11. an image forming method, be used for forming the developer image in the xerox mode on object, it is characterized in that, comprising:
The operation of the profile of the graphical element group in the image of identification master pattern data;
Judge distance apart from the described profile that identifies, graphical element with described profile overlaid or parallel limit, described graphical element group is divided into the operation of developer image from outside affected a plurality of zones of described profile;
Obtain each the regional correction that marks off according to the result of determination of this identifying unit, the operation that described master pattern data are revised;
According to revising the next operation that forms electrostatic latent image on photoreceptor of complete data;
By to described electrostatic latent image, providing developer to make described latent electrostatic image developing, thus the operation of the developer image before the formation transfer printing;
With the operation of described developer image on object.
12. an image forming method, be used for forming the developer image in the xerox mode on object, it is characterized in that, comprising:
Graphical element group in the image of master pattern data, delimit out the operation of a block graphics key element group;
The operation of the profile of the described block graphics key element group that identification delimited;
To a described block graphics key element group, judge distance apart from the described profile that identifies, graphical element with described profile overlaid or parallel limit, described graphical element group is divided into the operation of developer image from outside affected a plurality of zones of described profile;
Obtain each the regional correction that marks off according to result of determination, the operation that described master pattern data are revised;
Based on revising the next operation that forms electrostatic latent image on photoreceptor of complete data;
By to described electrostatic latent image, providing developer to make described latent electrostatic image developing, thus the operation of the developer image before the formation transfer printing;
With the operation of described developer image on object.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010040778A JP5325814B2 (en) | 2010-02-25 | 2010-02-25 | Image forming apparatus and image forming method |
| JP2010-040778 | 2010-02-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102169314A CN102169314A (en) | 2011-08-31 |
| CN102169314B true CN102169314B (en) | 2013-11-13 |
Family
ID=44490511
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011100510015A Expired - Fee Related CN102169314B (en) | 2010-02-25 | 2011-02-25 | Image data generating device and method thereof, image forming device and method thereof |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5325814B2 (en) |
| KR (1) | KR101221759B1 (en) |
| CN (1) | CN102169314B (en) |
| TW (1) | TWI457856B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102057647B1 (en) | 2013-02-15 | 2019-12-19 | 삼성전자주식회사 | Method for generating writing data and an electronic device thereof |
| JP6668763B2 (en) * | 2016-01-13 | 2020-03-18 | セイコーエプソン株式会社 | Image recognition device, image recognition method, and image recognition unit |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000047365A (en) * | 1998-07-29 | 2000-02-18 | Nec Corp | Manufacture of optical proximity effect correction mask |
| US6441883B1 (en) * | 2000-03-06 | 2002-08-27 | Promos Technologies Inc. | Method and apparatus to reduce bias between dense and sparse photoresist patterns |
| US7202148B2 (en) * | 2004-05-10 | 2007-04-10 | Taiwan Semiconductor Manufacturing Company | Method utilizing compensation features in semiconductor processing |
| CN101261441A (en) * | 2008-04-08 | 2008-09-10 | 芯硕半导体（中国）有限公司 | Mask-free photolithography system exposure graph approach effect correction method |
| JP2010039382A (en) * | 2008-08-07 | 2010-02-18 | Toshiba Corp | Method for creating evaluation pattern, program for creating evaluation pattern, and pattern verification method |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07273985A (en) * | 1994-03-28 | 1995-10-20 | Toppan Printing Co Ltd | Processing method and output device for image data |
| JPH1158835A (en) | 1997-08-18 | 1999-03-02 | Ricoh Co Ltd | Image data processing apparatus |
| JP3668373B2 (en) * | 1998-07-29 | 2005-07-06 | シャープ株式会社 | Image forming apparatus |
| JP3175732B2 (en) * | 1999-06-02 | 2001-06-11 | セイコーエプソン株式会社 | Printing device and pulse generator |
| JP2001080113A (en) * | 1999-09-10 | 2001-03-27 | Ricoh Co Ltd | Digital image forming apparatus |
| TW478036B (en) * | 2000-12-12 | 2002-03-01 | Macronix Int Co Ltd | Developing method of semiconductor process |
| KR100406944B1 (en) * | 2001-01-08 | 2003-11-28 | 삼성전자주식회사 | Method and apparatus for improving printing quality of document in which a text and an image exist together |
| US7152219B2 (en) * | 2002-12-10 | 2006-12-19 | Synopsys Inc. | Reference image generation from subject image for photolithography mask analysis |
| US7498124B2 (en) * | 2003-09-30 | 2009-03-03 | Tokyo Electron Limited | Sacrificial surfactanated pre-wet for defect reduction in a semiconductor photolithography developing process |
| JP4593236B2 (en) * | 2004-10-29 | 2010-12-08 | 株式会社日立ハイテクノロジーズ | Dimensional measurement scanning electron microscope system, circuit pattern shape evaluation system and method |
| JP2007034234A (en) * | 2005-07-29 | 2007-02-08 | Canon Inc | Image forming apparatus and method |
| JP4157569B2 (en) | 2006-05-11 | 2008-10-01 | 株式会社東芝 | Drawing apparatus, drawing method, and drawing program |
| JP4789828B2 (en) | 2007-03-06 | 2011-10-12 | 株式会社沖データ | Printing system |
-
2010
- 2010-02-25 JP JP2010040778A patent/JP5325814B2/en not_active Expired - Fee Related
-
2011
- 2011-02-16 KR KR1020110013518A patent/KR101221759B1/en not_active IP Right Cessation
- 2011-02-23 TW TW100105962A patent/TWI457856B/en not_active IP Right Cessation
- 2011-02-25 CN CN2011100510015A patent/CN102169314B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000047365A (en) * | 1998-07-29 | 2000-02-18 | Nec Corp | Manufacture of optical proximity effect correction mask |
| US6441883B1 (en) * | 2000-03-06 | 2002-08-27 | Promos Technologies Inc. | Method and apparatus to reduce bias between dense and sparse photoresist patterns |
| US7202148B2 (en) * | 2004-05-10 | 2007-04-10 | Taiwan Semiconductor Manufacturing Company | Method utilizing compensation features in semiconductor processing |
| CN101261441A (en) * | 2008-04-08 | 2008-09-10 | 芯硕半导体（中国）有限公司 | Mask-free photolithography system exposure graph approach effect correction method |
| JP2010039382A (en) * | 2008-08-07 | 2010-02-18 | Toshiba Corp | Method for creating evaluation pattern, program for creating evaluation pattern, and pattern verification method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102169314A (en) | 2011-08-31 |
| TWI457856B (en) | 2014-10-21 |
| KR20110097637A (en) | 2011-08-31 |
| KR101221759B1 (en) | 2013-01-14 |
| JP5325814B2 (en) | 2013-10-23 |
| TW201142755A (en) | 2011-12-01 |
| JP2011175187A (en) | 2011-09-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2008525242A (en) | Ink developer foil | |
| CN102169314B (en) | Image data generating device and method thereof, image forming device and method thereof | |
| KR100773183B1 (en) | Image forming apparatus and image forming method | |
| KR19990063799A (en) | Apparatus and method for cleaning a developer from an image processing substrate | |
| JP6070643B2 (en) | Wet development apparatus and wet image forming apparatus | |
| EP0921444B1 (en) | Electrophotographic printer with liquid developer | |
| JP2016194722A (en) | Charging and discharging system for photoreceptor | |
| US6006061A (en) | Method and apparatus for forming high quality images in an electrostatic printing machine | |
| US20200241448A1 (en) | Cleaning station sponges | |
| JP5283452B2 (en) | Image forming apparatus and image forming method | |
| JP2007041457A (en) | Wet type electrophotographic apparatus | |
| JP2008268400A (en) | Image forming apparatus and image forming method | |
| JP4854787B2 (en) | Development method, hard image forming device, and image member | |
| JPH0876642A (en) | Latent image carrier and image forming device using that latent image carrier | |
| JP2008270398A (en) | Image forming apparatus, pattern generating system, image forming method, and pattern generating method | |
| JP2011070077A (en) | Fixing unit, image forming system, and fixing method | |
| US6072971A (en) | Photo injection electrographic imaging | |
| JP3304650B2 (en) | Liquid developing device | |
| US10877425B2 (en) | Fluid application devices with resistive coatings | |
| JP3777104B2 (en) | Developing device and image forming apparatus having the same | |
| JP2010231061A (en) | Pattern drawing apparatus and image forming apparatus | |
| JP2008221642A (en) | Equipment and method for forming pattern | |
| JP2010197810A (en) | Fixing device and image formation system | |
| JP2013076808A (en) | Electrostatic transfer printer, electrostatic transfer printing method, metal wire forming device, and color filter forming device | |
| JPH0738076B2 (en) | Permanent master with a persistent latent image for use in electrostatic transfer |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee |
Owner name: SCREEN GROUP CO., LTD. Free format text: FORMER NAME: DAINIPPON SCREEN MFG. CO., LTD. |
|
| CP01 | Change in the name or title of a patent holder |
Address after: Kyoto City, Kyoto Prefecture, Japan Patentee after: DAINIPPON SCREEN MFG Address before: Kyoto City, Kyoto Prefecture, Japan Patentee before: Dainippon Screen Mfg. Co., Ltd. |
|
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20131113 Termination date: 20170225 |