CN102160831A - Micro-electrode array chip before retina in field of artificial vision - Google Patents
Micro-electrode array chip before retina in field of artificial vision Download PDFInfo
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- CN102160831A CN102160831A CN 201110125528 CN201110125528A CN102160831A CN 102160831 A CN102160831 A CN 102160831A CN 201110125528 CN201110125528 CN 201110125528 CN 201110125528 A CN201110125528 A CN 201110125528A CN 102160831 A CN102160831 A CN 102160831A
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Abstract
The invention discloses a micro-electrode array chip before retina in the field of artificial vision. The micro-electrode array chip comprises a chip substrate, a lead buried in the chip substrate and micro-electrodes protruding the surface of the substrate and forming an array. The edge of the lower end of the chip substrate is provided with at least two lower suture line preformed holes; a micro-electrode arrangement lower area, a micro-electrode arrangement middle area, a micro-electrode arrangement upper area, a substrate reduction area and a substrate expansion area are sequentially arranged on the chip substrate from bottom to top; the substrate expansion area contains contacts corresponding to the electrode arrangement areas, and are connected with the micro-electrodes through the lead buried in the chip substrate; the chip substrate close to the lower end of the substrate reduction area is provided with at least three groups of two sclera cut suture line preformed holes, and two edges are respectively provided with at least two upper suture line preformed holes; and two sides of the substrate expansion area are provided with eye external suture line preformed holes. The micro-electrode array chip can stimulate retinal ganlion cells of the blind to recover partial vision of the blind, and avoids rhegmatogenous retinal detachment, choroidal hemorrhage and sympathetic ophthalmia caused by iatrogenic retinal breaks.
Description
Technical field
The present invention relates to a kind of ophthalmic medical instrument, particularly a kind of preceding microelectrode array chip of retina that is used for the artificial vision field.
Background technology
Visual system is the human knowledge and the most important information source of transforming the objective world.People's visual system is made up of matter between refraction of eye and visual system, has formed lightray propagation, opto-electronic conversion and the signal of telecommunication and has handled conduction, at last the complete procedure of carrying out perception in conjunction with people's life experience by visual centre.Although current medical procedure is to a lot of diseases causing blindnesses such as trachoma, cataract, glaucoma etc., had effective Therapeutic Method, but still do not had highly effective therapy for the retinitis pigmentosa ruined fundus oculi diseases of outer retina (photoreceptor) such as (RP).Only with regard to RP disease, its sickness rate is about 1/3500-1/4500, and according to this numerical calculation, the RP patient of China has 40,000 people approximately.
The proposition of this notion of artificial vision's prosthese, brought hope for treating this type of blinding oculopathy, its design concept is based on such fact, be the ruined patients of many photoreceptors, still can preserve the ganglionic cell that some can the normal conduction visual signal on the retina, therefore, walk around impaired photoreceptor by direct stimulation retinal ganglial cells, just can bring out phosphene, Here it is utilizes electronic equipment to repair the important foundation of visual performance.
At present, international up-to-date based on the artificial vision's prosthesis system that stimulates before the retina (
ArgusII) just ratified listing in Europe, this system partly is made of minisize pick-up head, image processing apparatus, optical-electrical converter, microelectrode array etc.By this system, the patient can discern things, figure, even can read the article of large size block letter.Yet there is following shortcoming in the design of its microelectrode array:
1, the retina front surface fixedly microelectrode array need adopt titanium nail on retina, to punch, this operation has increased the risk of rhegmatogenous detachment of retina;
2, titanium ailing utmost point portion behind retina, this position choroid blood causes choroidal hemorrhage even choroid burst hemorrhage for abundant easily;
3, owing to damaged choroid (a uveal part), bring out uveitis easily, even cause branch hole generation sympathetic ophthalmia;
4, titanium nail design for agnail, be difficult for taking out after hammering into wall of eyeball, if microelectrode array needs to take out or replacing in use for some time, and will be very difficult;
5, this microelectrode array only can stimulate amphiblestroid macular area, can't stimulate amphiblestroid other zones, and promptly the patient only can the recovered part central vision, and peripheral visual field can't recover.
6, after microelectrode array was drawn eyeball, the scleral incision closure was relatively poor, formed the otch seepage easily.
At above-mentioned these shortcomings, the present invention has designed preceding microelectrode array of a kind of brand-new retina and operation implantation mode, is used to address the above problem.
Summary of the invention
The invention provides microelectrode array chip before the retina in a kind of artificial vision of being used for field, the technical problem underlying that solve have following some:
1) shaped design of microelectrode array before the retina;
2) fixed form of microelectrode array (comprising operation implantation mode) before the retina;
3) microelectrode of microelectrode array inside distributes before the retina.
For achieving the above object, the present invention adopts following technical scheme:
A kind of preceding microelectrode array chip of retina that is used for the artificial vision field, comprise chip base, bury the lead of cloth in chip base and protrude in substrate surface and the microelectrode of formation array, it is characterized in that: described chip base lower edge has at least two following suture preformed holes, chip base order from bottom to top is placed with the microelectrode inferior segment of arranging, the microelectrode middle district that arranges, microelectrode is arranged and is gone up the district, substrate constriction district and substrate broadening district, described chip base has two scleral incision sutures of at least three groups preformed hole in the lower end in contiguous substrate constriction district, the two edges of lower end have at least two and go up the suture preformed hole, and the both sides in described substrate broadening district have the outer suture preformed hole of eye.
Described chip base can be polyimides or Parylene material (Parylene).
The material of lead is metal platinum or platinum alloy in described microelectrode 14, contact 15 and the chip base.
The district can to go up district and the microelectrode inferior segment of arranging be rectangle for square, microelectrode are arranged during described microelectrode was arranged.
Arrange Shang Qu, Zhong Qu, inferior segment of described microelectrode contains microelectrode, and the arrangement mode of microelectrode can be arranged arbitrarily.
The contact corresponding with microelectrode contained in the substrate broadening district of described microelectrode, is used to draw lead.
Can be the smooth connection line between described substrate broadening district and the substrate constriction district.
The aperture of described following suture preformed hole, last suture preformed hole, the outer suture preformed hole of eye and scleral incision suture preformed hole can be 0.2～0.4mm.
The width of described chip base is 6～8mm, and the width in district was 4mm～7mm during microelectrode was arranged, and the total length of chip base is 49mm～88mm, and the total length in described substrate broadening district and substrate constriction district is between 4mm～12mm.
Beneficial effect: the present invention is used to stimulate blind person's retinal ganglial cells, to recover blind person's part vision, because implanting this microelectrode array need not punch on retina, there is not amphiblestroid coup injury, the rhegmatogenous detachment of retina of having avoided iatrogenic retinal hole to cause, prevent choroidal hemorrhage and sympathetic ophthalmia, and make the microelectrode array of implantation take out easily and change.Because the microelectrode of microelectrode array inside is divided into three districts of upper, middle and lower, therefore, the district stimulated the macula retinae district during this microelectrode array utilized in theory; Owing to stride across vertical line, therefore utilize the part visual field function that district and inferior segment stimulation can recover patient's nasal side that goes up of microelectrode by central fovea of macula from ganglion cell's nerve fiber of retina temporo side.The design of scleral incision suture preformed hole can increase the closure of scleral incision.In addition, substrate constriction district becomes after the substrate broadening district, can reduce the difficulty of outer guide line welding, increases the reliability of electrode itself.The present invention can be widely used in the artificial vision field.
Description of drawings
The utility model is described in more detail below in conjunction with accompanying drawing.
Fig. 1 is a structural representation of the present invention.
Fig. 2 is the shape sketch map after the present invention fixes.
Reference numeral: 1-microelectrode the arrange middle district, 3-microelectrode of inferior segment, 2-microelectrode that arrange arranges and goes up suture preformed hole, 11 under district, 4-substrate broadening district, 5-substrate constriction district, 6, the last suture preformed hole of 7-, 8,9, the 10-, 12-eye suture preformed hole, 13-chip base, 14-eyeball, 15-contact, 16-scleral incision suture preformed hole outward.
The specific embodiment
Embodiment is referring to Fig. 1, shown in Figure 2, a kind of preceding microelectrode array chip of retina that is used for the artificial vision field, comprise chip base 13, bury the lead of cloth in chip base 13 and protrude in substrate surface and the microelectrode of formation array, it is characterized in that: the lower edge of described chip base 13 has at least two following suture preformed holes 8,9,10, chip base 13 order from bottom to top is placed with the microelectrode inferior segment 1 of arranging, district 2 during microelectrode is arranged, microelectrode is arranged and is gone up district 3, substrate constriction district 5 and substrate broadening district 4, described chip base 13 has two scleral incision sutures of at least three groups preformed hole 16 in 5 lower ends, contiguous substrate constriction district, its two edges have at least two and go up suture preformed hole 6,7, the both sides in described substrate broadening district 4 have the outer suture preformed hole 11 of eye, 12.Arrange Shang Qu, Zhong Qu, inferior segment of described microelectrode contains microelectrode, and the arrangement mode of microelectrode can be arranged arbitrarily.The contact corresponding with microelectrode contained in the substrate broadening district of described microelectrode, is used to draw lead.
Described chip base 13 is polyimides or Parylene material.
The material of lead is metal platinum or platinum alloy in described microelectrode 14, contact 15 and the chip base.
Be the smooth connection line between described substrate broadening district 4 and the substrate constriction district 5, be with microelectrode arrange inferior segment 1, microelectrode arrange in district 2, microelectrode arrange and go up corresponding electrode contacts districts, district 3, by this regional contact can with external power supply to microelectrode arrange inferior segment 1, microelectrode arrange in the microelectrode energising of arranging and going up district 3 of district 2, microelectrode;
The aperture of described following suture preformed hole 8,9,10, last suture preformed hole 6,7, the outer suture preformed hole 11,12 of eye and scleral incision suture preformed hole is 0.2～0.4mm.
The width of described chip base 13 is 6～8mm, and the width in district 2 was 4mm～7mm during microelectrode was arranged, and the total length of chip base 13 is 49mm～88mm, and the total length in described substrate broadening district 4 and substrate constriction district 5 is between 4mm～12mm.
Described substrate 13, substrate constriction district 5 and substrate broadening district 4 are embedded with the arrange lead in district 1,2,3 of the contact that connects substrate broadening district 4 and microelectrode.
The shaped design of microelectrode array and its inner microelectrode distribute before the retina.
Polyimides or Parylene (Parylene) material are adopted in substrate of the present invention, and itself and retina electrodes in contact metal partly adopt platinum, and the lead that is embedded in the substrate also adopts platinum.The shaped design and the internal structure of electrod-array are seen Fig. 1.The diameter that is used to preset the hole of suture in this microelectrode array is 0.3mm, except a, b, c, d to the dimensional requirement strictness, all the other all can require to grasp flexibly according to sunkening cord.Calculate a=7mm, b=5mm according to the eyeball anatomical structure.Its ophthalmic partial-length, promptly the c value should satisfy among the figure:
C=π AL-corneal diameter-7, unit is mm.Wherein, AL is an axiallength.Generally speaking, corneal diameter value 11-12mm.According to Different Individual axis oculi difference difference, the span of calculating c is between 45-80mm.The outer part length of eye, i.e. d value among the figure, span is between 4mm-12mm.
Its axis oculi axial length is 24mm because of the blind patient of retinitis pigmentosa requires the implantation of row vision prosthesis to suppose to have one, and corneal diameter is 11mm.
For the function of recovered part peripheral visual field, this microelectrode array has designed the microelectrode array zone, two places except that macular area especially.After electrode is implanted, because the distributional class of nerve fibre layer is like electric field, if the therefore microelectrode in two zones work will be brought out the phosphene that produces nasal visual field.
Electrode size: the anatomical structure according to eyeball 14 is calculated a=7mm, b=5mm.C=π AL-corneal diameter-7 is 68mm as calculated.The outer part d value 12mm of eye, then the length overall of microelectrode array is 80mm before this retina.
Fixed form of the present invention, the operating procedure of promptly implanting the preceding microelectrode array of this retina is as follows:
At first, need be to the cataract ultrasonic emulsification operation of patient's implementation criteria, with lens extraction (can keep crystal capsule bag), the three cuts vitrectomy of column criterion is cut vitreous body only afterwards.12 positions above eyeball, 3.5mm-4mm does the sclerotic puncture mouth behind the corneoscleral junction, and width is 7mm.In the following suture preformed hole 8,9,10 of microelectrode array end, preset suture with needle, be penetrated into 3.5mm-4mm behind the corneoscleral junction of 6 positions afterwards, utilize that suture preformed hole 8,9,10 and near sclera sutured orbiculus ciliaris are firm down.The remainder of this microelectrode array is slowly inserted eyeball, and district 2 attaches to the macula retinae district in along the eyeball radian microelectrode being arranged.Utilize last suture preformed hole 6,7 and near sclera sutured orbiculus ciliaris of microelectrode array top firm, pass scleral incision suture preformed hole 16 with pin scleral incision is sewed up, make its closure.Remainder is placed on outside the eyeball, utilize 4 both sides, substrate broadening district the eye outer suture preformed hole 11,12 once more with the sclera sutured.So far, the operation of this microelectrode array is implanted and is finished.
Claims (7)
1. microelectrode array chip before the retina that is used for the artificial vision field, comprise chip base (13) and protrude in the chip base surface and the microelectrode of formation array, it is characterized in that: the lower edge of described chip base (13) has at least two following suture preformed holes (8), (9), (10), chip base (13) order from bottom to top is placed with the microelectrode inferior segment (1) of arranging, the microelectrode middle district (2) that arranges, microelectrode is arranged and is gone up district (3), substrate constriction district (5) and substrate broadening district (4), described chip base (13) has at least three groups two scleral incision sutures preformed holes (16) in lower end, contiguous substrate constriction district (5), the two edges of lower end have at least two and go up suture preformed hole (6), (7), the both sides in described substrate broadening district (4) have eye outer suture preformed hole (11), (12), described substrate broadening district (4) is placed with and the electrode district (1) that arranges, (2), (3) Dui Ying contact (15), be used to draw lead, bury the lead that is furnished with connecting terminal (15) and microelectrode (14) in the chip base (13).
2. a kind of preceding microelectrode array chip of retina that is used for the artificial vision field according to claim 1, it is characterized in that: described chip base (13) is polyimides or Parylene material.
3. a kind of preceding microelectrode array chip of retina that is used for the artificial vision field according to claim 1, it is characterized in that: the material of lead is metal platinum or platinum alloy in described microelectrode (14), contact (15) and the chip base.
4. microelectrode array chip before a kind of retina that is used for the artificial vision field according to claim 1 is characterized in that: described microelectrode is arranged, and to go up district (3) and the microelectrode inferior segment (1) of arranging be rectangle for square, microelectrode are arranged in middle district (2).
5. a kind of preceding microelectrode array chip of retina that is used for the artificial vision field according to claim 1 is characterized in that: be the smooth connection line between described substrate broadening district (4) and the substrate constriction district (5).
6. a kind of preceding microelectrode array chip of retina that is used for the artificial vision field according to claim 1, it is characterized in that: the aperture of described following suture preformed hole (8), (9), (10), last suture preformed hole (6), (7), eye outer suture preformed hole (11), (12) and scleral incision suture preformed hole (16) is 0.2～0.4mm.
7. a kind of preceding microelectrode array chip of retina that is used for the artificial vision field according to claim 1, it is characterized in that: the width of described chip base (13) is 6～8mm, the arrange width in middle district (2) of microelectrode is 4mm～7mm, the total length of chip base (13) is 49mm～88mm, and the total length in described substrate broadening district (4) and substrate constriction district (5) is between 4mm～12mm.
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| CN201110125528A CN102160831B (en) | 2011-05-16 | 2011-05-16 | Micro-electrode array chip before retina in field of artificial vision |
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| CN201110125528A CN102160831B (en) | 2011-05-16 | 2011-05-16 | Micro-electrode array chip before retina in field of artificial vision |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102921101A (en) * | 2012-11-08 | 2013-02-13 | 中国医学科学院生物医学工程研究所 | Wide-field retina microelectrode array |
| CN104013491A (en) * | 2014-05-23 | 2014-09-03 | 浙江诺尔康神经电子科技股份有限公司 | Foldable minimally-invasive artificial retina microelectrode array |
| CN104739578A (en) * | 2013-12-26 | 2015-07-01 | 中国人民解放军第二军医大学 | Biological-energy electronic retina |
| WO2017012031A1 (en) * | 2015-07-21 | 2017-01-26 | 林伯刚 | Nerve sensing device capable of suppressing interactive interference |
| CN109364369A (en) * | 2016-08-22 | 2019-02-22 | 深圳硅基仿生科技有限公司 | The stimulating electrode structure and artificial retina of artificial retina |
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| WO2006116625A2 (en) * | 2005-04-28 | 2006-11-02 | California Institute Of Technology | Batch-fabricated flexible intraocular retinal prosthesis systems and methods for manufacturing the same |
| CN101006953A (en) * | 2007-01-18 | 2007-08-01 | 上海交通大学 | Artificial retina neural flexible microelectrode array chips and processing method thereof |
| CN101172069A (en) * | 2007-11-01 | 2008-05-07 | 上海交通大学 | Multicenter film membrane electrode packaging method and device |
| CN202078457U (en) * | 2011-05-16 | 2011-12-21 | 北京大学人民医院 | Microelectrode array chip in front of retina applied to artificial vision field |
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2011
- 2011-05-16 CN CN201110125528A patent/CN102160831B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006116625A2 (en) * | 2005-04-28 | 2006-11-02 | California Institute Of Technology | Batch-fabricated flexible intraocular retinal prosthesis systems and methods for manufacturing the same |
| CN101006953A (en) * | 2007-01-18 | 2007-08-01 | 上海交通大学 | Artificial retina neural flexible microelectrode array chips and processing method thereof |
| CN101172069A (en) * | 2007-11-01 | 2008-05-07 | 上海交通大学 | Multicenter film membrane electrode packaging method and device |
| CN202078457U (en) * | 2011-05-16 | 2011-12-21 | 北京大学人民医院 | Microelectrode array chip in front of retina applied to artificial vision field |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102921101A (en) * | 2012-11-08 | 2013-02-13 | 中国医学科学院生物医学工程研究所 | Wide-field retina microelectrode array |
| CN104739578A (en) * | 2013-12-26 | 2015-07-01 | 中国人民解放军第二军医大学 | Biological-energy electronic retina |
| CN104013491A (en) * | 2014-05-23 | 2014-09-03 | 浙江诺尔康神经电子科技股份有限公司 | Foldable minimally-invasive artificial retina microelectrode array |
| WO2017012031A1 (en) * | 2015-07-21 | 2017-01-26 | 林伯刚 | Nerve sensing device capable of suppressing interactive interference |
| CN109364369A (en) * | 2016-08-22 | 2019-02-22 | 深圳硅基仿生科技有限公司 | The stimulating electrode structure and artificial retina of artificial retina |
| CN109364368A (en) * | 2016-08-22 | 2019-02-22 | 深圳硅基仿生科技有限公司 | The stimulating electrode structure and artificial retina of artificial retina |
| CN109364368B (en) * | 2016-08-22 | 2020-04-21 | 深圳硅基仿生科技有限公司 | Stimulating electrode structure of artificial retina and artificial retina |
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