CN102147542B - Method for producing silicon-based liquid crystal display panel and method for producing substrate thereof - Google Patents
Method for producing silicon-based liquid crystal display panel and method for producing substrate thereof Download PDFInfo
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- CN102147542B CN102147542B CN2010101136867A CN201010113686A CN102147542B CN 102147542 B CN102147542 B CN 102147542B CN 2010101136867 A CN2010101136867 A CN 2010101136867A CN 201010113686 A CN201010113686 A CN 201010113686A CN 102147542 B CN102147542 B CN 102147542B
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Abstract
The invention discloses a method for producing a liquid crystal on silicon display panel and a method for producing a substrate thereof. The method for producing the liquid crystal on silicon display panel comprises the following steps of: at first, providing a substrate material and an alignment layer formed thereon; then providing a transparent plate and a photomask layer, wherein the transparent plate is provided with a first surface and a second surface which are opposite, the transparent plate comprises a bulge protruded from the first surface and the photomask layer provided with an opening is configured on the second surface; configuring the transparent plate and the photomask layer above the alignment layer and making the bulge to face the alignment layer; with the photomask layer as a photomask, carrying out an excimer laser production process on the alignment layer so that the excimer laser passes through the opening, irradiates and melts a part of the alignment layer below the opening, wherein at that time, the transparent plate moves towards the alignment layer to make the bulge to penetrate through the part of the alignment layer below the opening; and then removing the transparent plate and the photomask layer.
Description
Technical field
The method for making that the present invention relates to a kind of display panels with and the method for making of substrate, and the method for making that particularly relates to a kind of liquid crystal on silicon display panel with and the method for making of substrate.
Background technology
Mention LCD, people will associate the LCD that notebook computer or PC are used.Liquid crystal on silicon (liquid crystal on silicon; LCoS) display is a kind of novel LCD; It is for combining semiconductor ultra-large type integrated circuit (very-large-scale integration, VLSI) high-tech product of technology and lcd technology.
CMOS (the complementary metal-oxide-semiconductor of the silicon substrate routine capable of using in the Liquiid crystal on silicon (lcos) display; CMOS) technology is produced in batches; And can be further microminiaturized, and can improve resolution with the development of semiconductor technology.Therefore; Liquiid crystal on silicon (lcos) display possesses characteristics such as low-power consumption, miniature sizes, ultra-light-weight; So Liquiid crystal on silicon (lcos) display is convenient to carry, and its power consumption far below the active-matrix LCD (active-matrix liquid crystal display, AMLCD); And production cost is expected and cathode-ray tube (CRT) (cathode ray tube, CRT) analogy mutually.
The liquid crystal material of existing Liquiid crystal on silicon (lcos) display is between the alignment film (being generally silicon dioxide layer) and glass baseplate that is configured on the single crystal silicon substrate, and through the glue frame that is configured in equally between alignment film and the glass baseplate liquid crystal material is fixed between glue frame, single crystal silicon substrate and the glass baseplate.Yet because the structure of silicon dioxide layer is comparatively loose, therefore, the part (that is part that contacts with liquid crystal of silicon dioxide layer) in order to orientation in the easy entering of the aqueous vapor in the external environment silicon dioxide layer causes the border wild effect and influences fiduciary level.In addition, since silicon dioxide layer and glue frame easily because of the material surface chemical characteristic of the two causes both then property not good, so that the decline of the fiduciary level of Liquiid crystal on silicon (lcos) display.
Summary of the invention
The object of the present invention is to provide a kind of method for making of substrate of liquid crystal on silicon display panel, can promote the then property of the frame glue of substrate and follow-up formation.
The present invention provides a kind of method for making of liquid crystal on silicon display panel, can promote the ability that the liquid crystal on silicon display panel intercepts the aqueous vapor in the external environment.
The method for making that the present invention proposes a kind of substrate of liquid crystal on silicon display panel is described below.At first, a base material is provided.Then, on base material, form a both alignment layers.Then; One transparent panel and a photo mask layer are provided, and transparent panel has a relative first surface and a second surface, and transparent panel comprises at least one convexity; Convexity protrudes in first surface, and photo mask layer is disposed on the second surface and has at least one opening to expose part surface.Afterwards, transparent panel and photo mask layer are disposed at the both alignment layers top, and make protruding towards both alignment layers.Then, be that photomask carries out a PRK manufacture craft to both alignment layers with the photo mask layer, so that PRK shines through opening and the part that is positioned at the opening below of fusion both alignment layers.Then, when being positioned at part below the opening and being in molten state of both alignment layers, transparent panel is moved towards both alignment layers, and make convexity run through the part that is positioned at the opening below of both alignment layers.Afterwards, remove transparent panel and photo mask layer.
In one embodiment of this invention; When carrying out the PRK manufacture craft; More comprise and make PRK shine the also part that is positioned at the opening below of fusion base material through opening; And, make convexity run through both alignment layers be positioned at the part below the opening time, more comprise making protruding the insertion in the base material.
In one embodiment of this invention, opening is positioned at protruding top.
In one embodiment of this invention, the material of base material is monocrystalline silicon or glass.
In one embodiment of this invention, the height that protrudes in first surface of convexity is greater than the thickness of both alignment layers.
In one embodiment of this invention, the material of both alignment layers comprises silicon dioxide.
In one embodiment of this invention, convexity is an annular projection.
In one embodiment of this invention, opening is a circular opening.
The method for making that the present invention proposes a kind of liquid crystal on silicon display panel is described below.At first, a base material is provided.Then, on base material, form a both alignment layers.Then; One transparent panel and a photo mask layer are provided, and transparent panel has a relative first surface and a second surface, and transparent panel comprises at least one convexity; Convexity protrudes in first surface, and photo mask layer is disposed on the second surface and has at least one opening to expose part surface.Afterwards, transparent panel and photo mask layer are disposed at the both alignment layers top, and make protruding towards both alignment layers.Then, be that photomask carries out a PRK manufacture craft to both alignment layers with the photo mask layer, so that PRK shines through opening and the part that is positioned at the opening below of fusion both alignment layers.Then, when being positioned at part below the opening and being in molten state of both alignment layers, transparent panel is moved towards both alignment layers, and makes convexity run through the part that is positioned at the opening below of both alignment layers, with form one run through both alignment layers groove.Afterwards, remove transparent panel and photo mask layer.Then, in groove, form a glue frame, glue frame and base material constitute a containing groove.Afterwards, configuration one subtend base material on base material, wherein the glue frame between base material and subtend base material, and subtend base material covering containing groove.Then, in containing groove, form a liquid crystal layer.
In one embodiment of this invention, opening is positioned at protruding top.
Based on above-mentioned, the present invention is the both alignment layers (with base material) with PRK technology puddle, afterwards, on the part of the fusion of both alignment layers (with base material), forms the groove that runs through both alignment layers again.Therefore; The glue frame that is formed in the groove can become two parts independent of each other with alignment layers separate; Avoiding, produce the border wild effect and influence the problem of fiduciary level because of the part that is positioned at the glue frame that the outer part of glue frame gets into both alignment layers that is positioned at of the aqueous vapor in the external environment by both alignment layers.
For letting the above-mentioned feature and advantage of the present invention can be more obviously understandable, hereinafter is special lifts embodiment, and cooperates appended accompanying drawing to elaborate as follows.
Description of drawings
Figure 1A～Fig. 1 D is the manufacture craft cut-open view of the liquid crystal on silicon display panel of one embodiment of the invention;
Fig. 2 is a kind of variation synoptic diagram of the substrate of Fig. 1 C;
Fig. 3 is a kind of variation synoptic diagram of the liquid crystal on silicon display panel of Fig. 1 D.
The main element symbol description
110,110a: base material
120,120a, 170,170a: both alignment layers
122: first
124: second portion
130: transparent panel
132: first surface
134: second surface
136: convexity
140: photo mask layer
142: opening
150,150a: glue frame
160,160a: subtend base material
180: liquid crystal layer
200, S: substrate
C: containing groove
H: highly
L: PRK
P1: the part that is positioned at the opening below of both alignment layers
P2: the part that is positioned at the opening below of base material
R, R1, R2, R3: groove
T: thickness
Embodiment
Figure 1A～Fig. 1 D illustrates the manufacture craft cut-open view of the liquid crystal on silicon display panel of one embodiment of the invention.Fig. 2 illustrates a kind of variation of the substrate of Fig. 1 C.Fig. 3 illustrates a kind of variation of the liquid crystal on silicon display panel of Fig. 1 D.
At first, please with reference to Figure 1A, a base material 110 is provided, wherein the material of base material 110 for example is monocrystalline silicon or glass.Then, on base material 110, for example form a both alignment layers 120 with the mode of vapor deposition, wherein the material of both alignment layers 120 is for example for silicon dioxide or other are suitable for the material as both alignment layers.
Then, a transparent panel 130 and a photo mask layer 140 are provided, wherein transparent panel 130 has a relative first surface 132 and a second surface 134.Transparent panel 130 comprises a convexity 136, and protruding 136 protrude in first surface 132.Photo mask layer 140 is disposed on the second surface 134 and has an opening 142 exposing part second surface 134, and opening 142 is positioned at protruding 136 tops.
In the present embodiment, protruding 136 the height H that protrudes in first surface 132 is greater than the thickness T of both alignment layers 120.In the present embodiment, protruding 136 is an annular projection haply, but and the shape of the shape respective protrusions 136 of opening 142 and be a circular opening haply.The material of transparent panel 130 is for example transparent and can be by the material that PRK penetrated for quartz etc., and the material of photo mask layer 140 for example can stop the material (like chromium, copper, brass, stainless steel) of PRK for metal etc.
Afterwards, transparent panel 130 and photo mask layer 140 are disposed at both alignment layers 120 tops, and make protruding 136 towards both alignment layers 120.Then; With photo mask layer 140 is that photomask carries out a PRK manufacture craft to both alignment layers 120, so that PRK L shines through opening 142 and the part P1 that is positioned at opening 142 belows of fusion both alignment layers 120 and the part P2 that is positioned at opening 142 belows of base material 110.
Then; Please with reference to Figure 1B; Both alignment layers 120 be positioned at being positioned at part P2 below the opening 142 and being in molten state of part P1 and base material 110 below the opening 142 time; Transparent panel 130 is moved towards both alignment layers 120,, run through both alignment layers 120 and towards the recess R of base material 110 depressions and form one so that protruding 136 run through the part P1 that is arranged in opening 142 belows of both alignment layers 120 and insert base material 110.In the present embodiment, recess R can be divided into a first 122 independent of each other and a second portion 124 with both alignment layers 120, and wherein second portion 124 is around first 122.Afterwards, please with reference to Fig. 1 C, remove transparent panel 130 and photo mask layer 140.At this moment, tentatively accomplish the substrate S of present embodiment.
It should be noted that in other embodiments, can make its only fusion both alignment layers 120 (and not fusion base material 110 or degree of reduction fusion base material 110) through the energy of adjustment PRK L.Thus, after manufacture craft in can make protruding 136 only to run through both alignment layers 120 and do not insert in the base material 110, thereby form like the substrate 200 that Fig. 2 illustrated, wherein the recess R 1 of substrate 200 only runs through both alignment layers 120.
Then, please with reference to Fig. 1 D, in recess R, form a glue frame 150, glue frame 150 constitutes a containing groove C with base material 110.Glue frame 150 is separated the first 122 and second portion 124 of both alignment layers 120, and wherein first 122 is positioned at containing groove C, and second portion 124 is positioned at outside the containing groove C.
Afterwards, configuration one subtend base material 160 on base material 110, wherein glue frame 150 between base material 110 and subtend base material 160, and subtend base material 160 covering containing groove C.Optionally dispose a both alignment layers 170 on the subtend base material 160, and glue frame 150 is positioned on the both alignment layers 170.Then, in containing groove C, form a liquid crystal layer 180, liquid crystal layer 180 can be between the first 122 of both alignment layers 170 and both alignment layers 120.
Known that by aforementioned present embodiment is with PRK technology puddle both alignment layers 120 and part base material 110, afterwards, the part of inserting both alignment layers 120 and the fusion of base material 110 with the convexity 136 of transparent panel 130 again is to form recess R.Thus, be formed on first 122 and second portion 124 that the glue frame 150 in the recess R can be separated both alignment layers 120, get in the first 122 via second portion 124 to avoid the aqueous vapor in the external environment.In addition, because the glue frame 150 of present embodiment directly is connected with base material 110, thus can firmly engage with base material 110, thus the fiduciary level of the liquid crystal on silicon display panel of lifting present embodiment.In addition because PRK has low wavelength and high-octane characteristic, therefore, its can be in the extremely short time both alignment layers 120 (with base material 110) in the fusion predeterminable area, and do not influence the both alignment layers 120 (with base material 110) of predeterminable area periphery.
In the present embodiment; The method that forms liquid crystal layer 180 is included in and disposes after the subtend base material 160 on the base material 110; In containing groove C, inject a liquid crystal material; And the mode of injecting liquid crystal material is for example for the opening (not illustrating) through glue frame 150 injects liquid crystal material, and aforementioned opening is communicated with containing groove C.In other embodiments, the method that forms liquid crystal layer 180 is included on the base material 110 and disposes before the subtend base material 160, in containing groove C, splashes into a liquid crystal material, covers subtend base material 160 afterwards again, so that liquid crystal material is fixed among the containing groove C.
It should be noted that in the present embodiment, the material of base material 110 can be monocrystalline silicon or glass one of them, and the material of subtend base material 160 can be wherein another of monocrystalline silicon or glass.In other words, the PRK manufacture craft of present embodiment can be carried out on single crystal silicon substrate or glass baseplate.
Therefore; In other embodiments; As shown in Figure 3, the PRK manufacture craft can both be carried out on base material 110a, also on subtend base material 160a, carried out; Therefore, glue frame 150a can insert one simultaneously and runs through both alignment layers 120a and run through both alignment layers 170a and among the recess R 3 of subtend base material 160a depression towards the recess R 2 and of base material 110a depression.
Thus; Glue frame 150a can directly be connected with base material 110a and subtend base material 160a; And can firmly connect base material 110a and subtend base material 160a, and can avoid aqueous vapor in the external environment to get into both alignment layers 120a, 170a (that is part that contacts with liquid crystal layer 180 of both alignment layers 120a, 170a).
In sum, the present invention is the both alignment layers (with base material) with PRK technology puddle, afterwards, on the part of the fusion of both alignment layers (with base material), forms the groove that runs through both alignment layers again.Therefore, the glue frame that is formed in the groove can become two parts independent of each other with alignment layers separate, to avoid because of the part that is positioned at the glue frame that the outer part of glue frame gets into both alignment layers that is positioned at of the aqueous vapor in the external environment by both alignment layers.In addition, because glue frame of the present invention is directly to be connected with base material, thus can firmly engage with base material, thus the fiduciary level of liquid crystal on silicon display panel of the present invention promoted.In addition because PRK has low wavelength and high-octane characteristic, therefore, its can be in the extremely short time both alignment layers in the fusion predeterminable area, and do not influence the both alignment layers of predeterminable area periphery.
Though combined above embodiment to disclose the present invention; Yet it is not in order to limit the present invention; Be familiar with this operator in the technical field under any; Do not breaking away from the spirit and scope of the present invention, can do a little change and retouching, thus protection scope of the present invention should with enclose claim was defined is as the criterion.
Claims (8)
1. the method for making of the substrate of a liquid crystal on silicon display panel comprises:
One base material is provided;
On this base material, form a both alignment layers;
One transparent panel and a photo mask layer are provided; This transparent panel has a relative first surface and a second surface; And this transparent panel comprises at least one annular projection; This annular projection protrudes in this first surface, and this photo mask layer is disposed on this second surface and has at least one circular opening to expose this second surface of part;
This transparent panel and this photo mask layer are disposed at this both alignment layers top, and make this annular projection towards this both alignment layers;
With this photo mask layer is that photomask carries out a PRK manufacture craft to this both alignment layers, so that PRK shines through this circular opening and the part that is positioned at this circular opening below of this both alignment layers of fusion;
When being positioned at part below this circular opening and being in molten state of this both alignment layers, this transparent panel is moved towards this both alignment layers, and make this annular projection run through the part that is positioned at this circular opening below of this both alignment layers; And
Remove this transparent panel and this photo mask layer.
2. the method for making of the substrate of liquid crystal on silicon display panel as claimed in claim 1; Wherein when carrying out this PRK manufacture craft; Also comprise and make PRK shine the also part that is positioned at this circular opening below of this base material of fusion through this circular opening; And, make this annular projection run through this both alignment layers be positioned at the part below this circular opening the time, also comprise this annular projection is inserted in this base material.
3. the method for making of the substrate of liquid crystal on silicon display panel as claimed in claim 1, wherein this circular opening is positioned at this annular projection top.
4. the method for making of the substrate of liquid crystal on silicon display panel as claimed in claim 1, wherein the material of this base material is monocrystalline silicon or glass.
5. the method for making of the substrate of liquid crystal on silicon display panel as claimed in claim 1, wherein the height that protrudes in this first surface of this annular projection is greater than the thickness of this both alignment layers.
6. the method for making of the substrate of liquid crystal on silicon display panel as claimed in claim 1, wherein the material of this both alignment layers comprises silicon dioxide.
7. the method for making of a liquid crystal on silicon display panel comprises:
One base material is provided;
On this base material, form a both alignment layers;
One transparent panel and a photo mask layer are provided; This transparent panel has a relative first surface and a second surface; And this transparent panel comprises at least one annular projection; This annular projection protrudes in this first surface, and this photo mask layer is disposed on this second surface and has at least one circular opening should the surface to expose part;
This transparent panel and this photo mask layer are disposed at this both alignment layers top, and make this annular projection towards this both alignment layers;
With this photo mask layer is that photomask carries out a PRK manufacture craft to this both alignment layers, so that PRK shines through this circular opening and the part that is positioned at this circular opening below of this both alignment layers of fusion;
When being positioned at part below this circular opening and being in molten state of this both alignment layers, this transparent panel is moved towards this both alignment layers, and makes this annular projection run through the part that is positioned at this circular opening below of this both alignment layers, with form one run through this both alignment layers groove;
Remove this transparent panel and this photo mask layer;
In this groove, form a glue frame, this glue frame and this base material constitute a containing groove;
Configuration one subtend base material on this base material, wherein this glue frame between this base material and this subtend base material, and this containing groove of this subtend base material covering; And
In this containing groove, form a liquid crystal layer.
8. the method for making of liquid crystal on silicon display panel as claimed in claim 7, wherein this circular opening is positioned at this annular projection top.
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| Application Number | Priority Date | Filing Date | Title |
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| CN2010101136867A CN102147542B (en) | 2010-02-08 | 2010-02-08 | Method for producing silicon-based liquid crystal display panel and method for producing substrate thereof |
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| CN2010101136867A CN102147542B (en) | 2010-02-08 | 2010-02-08 | Method for producing silicon-based liquid crystal display panel and method for producing substrate thereof |
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| CN102147542B true CN102147542B (en) | 2012-07-25 |
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Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102411227A (en) * | 2011-11-29 | 2012-04-11 | 深圳市华星光电技术有限公司 | Thin-film transistor array substrate, liquid crystal display device and manufacturing method thereof |
| CN103941478B (en) * | 2013-01-17 | 2016-12-28 | 立景光电股份有限公司 | Active array base plate and manufacture method thereof |
| CN103258478B (en) * | 2013-05-09 | 2015-04-15 | 友达光电(厦门)有限公司 | Substrate for displayer and display panel |
| TWI533055B (en) * | 2014-09-30 | 2016-05-11 | 群創光電股份有限公司 | Display panel |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101344690A (en) * | 2007-07-10 | 2009-01-14 | 中华映管股份有限公司 | Production method of silicon based liquid crystal panel |
| CN101515098A (en) * | 2008-02-21 | 2009-08-26 | 立景光电股份有限公司 | Liquid crystal on silicon display panel and electronic device using the same |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101344690A (en) * | 2007-07-10 | 2009-01-14 | 中华映管股份有限公司 | Production method of silicon based liquid crystal panel |
| CN101515098A (en) * | 2008-02-21 | 2009-08-26 | 立景光电股份有限公司 | Liquid crystal on silicon display panel and electronic device using the same |
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