CN102147542A - Method for producing liquid crystal on silicon display panel and method for producing substrate thereof - Google Patents
Method for producing liquid crystal on silicon display panel and method for producing substrate thereof Download PDFInfo
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- CN102147542A CN102147542A CN2010101136867A CN201010113686A CN102147542A CN 102147542 A CN102147542 A CN 102147542A CN 2010101136867 A CN2010101136867 A CN 2010101136867A CN 201010113686 A CN201010113686 A CN 201010113686A CN 102147542 A CN102147542 A CN 102147542A
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Abstract
The invention discloses a method for producing a liquid crystal on silicon display panel and a method for producing a substrate thereof. The method for producing the liquid crystal on silicon display panel comprises the following steps of: at first, providing a substrate material and an alignment layer formed thereon; then providing a transparent plate and a photomask layer, wherein the transparent plate is provided with a first surface and a second surface which are opposite, the transparent plate comprises a bulge protruded from the first surface and the photomask layer provided with an opening is configured on the second surface; configuring the transparent plate and the photomask layer above the alignment layer and making the bulge to face the alignment layer; with the photomask layer as a photomask, carrying out an excimer laser production process on the alignment layer so that the excimer laser passes through the opening, irradiates and melts a part of the alignment layer below the opening, wherein at that time, the transparent plate moves towards the alignment layer to make the bulge to penetrate through the part of the alignment layer below the opening; and then removing the transparent plate and the photomask layer.
Description
Technical field
The method for making that the present invention relates to a kind of display panels with and the method for making of substrate, and the method for making that particularly relates to a kind of liquid crystal on silicon display panel with and the method for making of substrate.
Background technology
Mention LCD, people will associate the LCD that notebook computer or PC are used.Liquid crystal on silicon (liquid crystal on silicon, LCoS) display is a kind of novel LCD, it is in conjunction with semiconductor ultra-large type integrated circuit (very-large-scale integration, VLSI) high-tech product of technology and lcd technology.
Silicon substrate in the Liquiid crystal on silicon (lcos) display can utilize conventional CMOS (Complementary Metal Oxide Semiconductor) (complementary metal-oxide-semiconductor, CMOS) technology is produced in batches, and can be further microminiaturized, and can improve resolution with the development of semiconductor technology.Therefore, Liquiid crystal on silicon (lcos) display possesses characteristics such as low-power consumption, miniature sizes, ultra-light-weight, so Liquiid crystal on silicon (lcos) display is convenient to carry, and its power consumption is far below active-matrix LCD (active-matrix liquid crystal display, AMLCD), and production cost be expected with cathode-ray tube (CRT) (cathode ray tube, CRT) comparable.
The liquid crystal material of existing Liquiid crystal on silicon (lcos) display is between the alignment film (being generally silicon dioxide layer) and glass baseplate that is configured on the single crystal silicon substrate, and by the glue frame that is configured in equally between alignment film and the glass baseplate liquid crystal material is fixed between glue frame, single crystal silicon substrate and the glass baseplate.Yet because the structure of silicon dioxide layer is comparatively loose, therefore, the aqueous vapor in the external environment enters easily that the part (that is part that contacts with liquid crystal of silicon dioxide layer) in order to orientation causes the border wild effect and influences fiduciary level in the silicon dioxide layer.In addition, since silicon dioxide layer and glue frame easily because of the material surface chemical characteristic of the two causes both then property not good, so that the decline of the fiduciary level of Liquiid crystal on silicon (lcos) display.
Summary of the invention
The object of the present invention is to provide a kind of method for making of substrate of liquid crystal on silicon display panel, can promote the then property of the frame glue of substrate and follow-up formation.
The invention provides a kind of method for making of liquid crystal on silicon display panel, can promote the ability that the liquid crystal on silicon display panel intercepts the aqueous vapor in the external environment.
It is as described below that the present invention proposes a kind of method for making of substrate of liquid crystal on silicon display panel.At first, provide a base material.Then, on base material, form a both alignment layers.Then, one transparent panel and a photo mask layer are provided, and transparent panel has a relative first surface and a second surface, and transparent panel comprises at least one projection, projection protrudes in first surface, and photo mask layer is disposed on the second surface and has at least one opening to expose part surface.Afterwards, transparent panel and photo mask layer are disposed at the both alignment layers top, and make projection towards both alignment layers.Then, be that photomask carries out an excimer laser manufacture craft to both alignment layers with the photo mask layer, so that excimer laser is shone by opening and the part that is positioned at the opening below of fusion both alignment layers.Then, when being positioned at part below the opening and being in molten state of both alignment layers, transparent panel is moved towards both alignment layers, and make projection run through the part that is positioned at the opening below of both alignment layers.Afterwards, remove transparent panel and photo mask layer.
In one embodiment of this invention, when carrying out the excimer laser manufacture craft, more comprise and make excimer laser shine the also part that is positioned at the opening below of fusion base material by opening, and, make projection run through both alignment layers be positioned at part below the opening time, more comprise projection is inserted in the base material.
In one embodiment of this invention, opening is positioned at the projection top.
In one embodiment of this invention, the material of base material is monocrystalline silicon or glass.
In one embodiment of this invention, Tu Qi the height that protrudes in first surface is greater than the thickness of both alignment layers.
In one embodiment of this invention, the material of both alignment layers comprises silicon dioxide.
In one embodiment of this invention, projection is an annular projection.
In one embodiment of this invention, opening is a circular opening.
It is as described below that the present invention proposes a kind of method for making of liquid crystal on silicon display panel.At first, provide a base material.Then, on base material, form a both alignment layers.Then, one transparent panel and a photo mask layer are provided, and transparent panel has a relative first surface and a second surface, and transparent panel comprises at least one projection, projection protrudes in first surface, and photo mask layer is disposed on the second surface and has at least one opening to expose part surface.Afterwards, transparent panel and photo mask layer are disposed at the both alignment layers top, and make projection towards both alignment layers.Then, be that photomask carries out an excimer laser manufacture craft to both alignment layers with the photo mask layer, so that excimer laser is shone by opening and the part that is positioned at the opening below of fusion both alignment layers.Then, when being positioned at part below the opening and being in molten state of both alignment layers, transparent panel is moved towards both alignment layers, and make projection run through the part that is positioned at the opening below of both alignment layers, to form a groove that runs through both alignment layers.Afterwards, remove transparent panel and photo mask layer.Then, form a glue frame in groove, glue frame and base material constitute a containing groove.Afterwards, configuration one subtend base material on base material, wherein the glue frame between base material and subtend base material, and subtend base material covering containing groove.Then, in containing groove, form a liquid crystal layer.
In one embodiment of this invention, opening is positioned at the projection top.
Based on above-mentioned, the present invention is with the both alignment layers of excimer laser technology puddle (with base material), afterwards, forms the groove that runs through both alignment layers again on the part of the fusion of both alignment layers (with base material).Therefore, the glue frame that is formed in the groove can become alignment layers separate two parts independent of each other, avoiding, produce the border wild effect and influence the problem of fiduciary level because of the part that is positioned at the glue frame that the outer part of glue frame enters both alignment layers that is positioned at of the aqueous vapor in the external environment by both alignment layers.
For above-mentioned feature and advantage of the present invention can be become apparent, embodiment cited below particularly, and cooperate appended accompanying drawing to be described in detail below.
Description of drawings
Figure 1A～Fig. 1 D is the manufacture craft cut-open view of the liquid crystal on silicon display panel of one embodiment of the invention;
Fig. 2 is a kind of variation synoptic diagram of the substrate of Fig. 1 C;
Fig. 3 is a kind of variation synoptic diagram of the liquid crystal on silicon display panel of Fig. 1 D.
The main element symbol description
110,110a: base material
120,120a, 170,170a: both alignment layers
122: first
124: second portion
130: transparent panel
132: first surface
134: second surface
136: projection
140: photo mask layer
142: opening
150,150a: glue frame
160,160a: subtend base material
180: liquid crystal layer
200, S: substrate
C: containing groove
H: highly
L: excimer laser
P1: the part that is positioned at the opening below of both alignment layers
P2: the part that is positioned at the opening below of base material
R, R1, R2, R3: groove
T: thickness
Embodiment
Figure 1A～Fig. 1 D illustrates the manufacture craft cut-open view of the liquid crystal on silicon display panel of one embodiment of the invention.Fig. 2 illustrates a kind of variation of the substrate of Fig. 1 C.Fig. 3 illustrates a kind of variation of the liquid crystal on silicon display panel of Fig. 1 D.
At first, please refer to Figure 1A, a base material 110 is provided, wherein the material of base material 110 for example is monocrystalline silicon or glass.Then, for example the mode with evaporation forms a both alignment layers 120 on base material 110, and wherein the material of both alignment layers 120 for example is suitable for material as both alignment layers for silicon dioxide or other.
Then, provide a transparent panel 130 and a photo mask layer 140, wherein transparent panel 130 has a relative first surface 132 and a second surface 134.Transparent panel 130 comprises a projection 136, and projection 136 protrudes in first surface 132.Photo mask layer 140 is disposed on the second surface 134 and has an opening 142 exposing part second surface 134, and opening 142 is positioned at protruding 136 tops.
In the present embodiment, the height H that protrudes in first surface 132 of projection 136 is greater than the thickness T of both alignment layers 120.In the present embodiment, projection 136 is an annular projection haply, but and the shape of the shape respective protrusions 136 of opening 142 and be a circular opening haply.The material of transparent panel 130 is for example transparent and can be by the material that excimer laser penetrated for quartz etc., and the material of photo mask layer 140 for example can stop the material (as chromium, copper, brass, stainless steel) of excimer laser for metal etc.
Afterwards, transparent panel 130 and photo mask layer 140 are disposed at both alignment layers 120 tops, and make projection 136 towards both alignment layers 120.Then, with photo mask layer 140 is that photomask carries out an excimer laser manufacture craft to both alignment layers 120, so that excimer laser L shines by opening 142 and the part P1 that is positioned at opening 142 belows of fusion both alignment layers 120 and the part P2 that is positioned at opening 142 belows of base material 110.
Then, please refer to Figure 1B, both alignment layers 120 be positioned at being positioned at part P2 below the opening 142 and being in molten state of part P1 below the opening 142 and base material 110 time, transparent panel 130 is moved towards both alignment layers 120, so that projection 136 runs through the part P1 that is arranged in opening 142 belows of both alignment layers 120 and insert base material 110, run through both alignment layers 120 and towards the recess R of base material 110 depressions and form one.In the present embodiment, recess R can be divided into both alignment layers 120 first 122 independent of each other and a second portion 124, and wherein second portion 124 is around first 122.Afterwards, please refer to Fig. 1 C, remove transparent panel 130 and photo mask layer 140.At this moment, tentatively finish the substrate S of present embodiment.
It should be noted that in other embodiments, can make its only fusion both alignment layers 120 (and not fusion base material 110 or degree of reduction fusion base material 110) by the energy of adjusting excimer laser L.Thus, after manufacture craft in can make projection 136 only run through both alignment layers 120 and do not insert in the base material 110, thereby form as the substrate 200 that Fig. 2 illustrated, wherein the recess R 1 of substrate 200 only runs through both alignment layers 120.
Then, please refer to Fig. 1 D, form a glue frame 150 in recess R, glue frame 150 constitutes a containing groove C with base material 110.Glue frame 150 is separated the first 122 and second portion 124 of both alignment layers 120, and wherein first 122 is positioned at containing groove C, and second portion 124 is positioned at outside the containing groove C.
Afterwards, configuration one subtend base material 160 on base material 110, wherein glue frame 150 between base material 110 and subtend base material 160, and subtend base material 160 covering containing groove C.Optionally dispose a both alignment layers 170 on the subtend base material 160, and glue frame 150 is positioned on the both alignment layers 170.Then, form a liquid crystal layer 180 in containing groove C, liquid crystal layer 180 can be between the first 122 of both alignment layers 170 and both alignment layers 120.
By as can be known aforementioned, present embodiment is with excimer laser technology puddle both alignment layers 120 and part base material 110, afterwards, inserts the part of both alignment layers 120 and the fusion of base material 110 to form recess R with the projection 136 of transparent panel 130 again.Thus, be formed on first 122 and second portion 124 that the glue frame 150 in the recess R can be separated both alignment layers 120, enter in the first 122 via second portion 124 to avoid the aqueous vapor in the external environment.In addition, because the glue frame 150 of present embodiment directly is connected with base material 110, thus can firmly engage with base material 110, thus the fiduciary level of the liquid crystal on silicon display panel of lifting present embodiment.In addition because excimer laser has low wavelength and high-octane characteristic, therefore, its can be in the extremely short time both alignment layers 120 (with base material 110) in the fusion predeterminable area, and do not influence the both alignment layers 120 (with base material 110) of predeterminable area periphery.
In the present embodiment, the method that forms liquid crystal layer 180 is included in and disposes after the subtend base material 160 on the base material 110, in containing groove C, inject a liquid crystal material, and the mode of injecting liquid crystal material is for example for the opening (not illustrating) by glue frame 150 injects liquid crystal material, and aforementioned opening is communicated with containing groove C.In other embodiments, the method that forms liquid crystal layer 180 is included on the base material 110 and disposes before the subtend base material 160, splashes into a liquid crystal material in containing groove C, covers subtend base material 160 afterwards again, so that liquid crystal material is fixed among the containing groove C.
It should be noted that in the present embodiment, the material of base material 110 can be monocrystalline silicon or glass one of them, and the material of subtend base material 160 can be wherein another of monocrystalline silicon or glass.In other words, the excimer laser manufacture craft of present embodiment can be carried out on single crystal silicon substrate or glass baseplate.
Therefore, in other embodiments, as shown in Figure 3, the excimer laser manufacture craft can both be carried out on base material 110a, also on subtend base material 160a, carry out, therefore, glue frame 150a can insert one simultaneously and runs through both alignment layers 120a and run through both alignment layers 170a and among the recess R 3 of subtend base material 160a depression towards the recess R 2 and of base material 110a depression.
Thus, glue frame 150a can directly be connected with base material 110a and subtend base material 160a, and can firmly connect base material 110a and subtend base material 160a, and can avoid the aqueous vapor in the external environment to enter both alignment layers 120a, 170a (that is part that contacts with liquid crystal layer 180 of both alignment layers 120a, 170a).
In sum, the present invention is with the both alignment layers of excimer laser technology puddle (with base material), afterwards, forms the groove that runs through both alignment layers again on the part of the fusion of both alignment layers (with base material).Therefore, the glue frame that is formed in the groove can become alignment layers separate two parts independent of each other, to avoid because of the part that is positioned at the glue frame that the outer part of glue frame enters both alignment layers that is positioned at of the aqueous vapor in the external environment by both alignment layers.In addition, because glue frame of the present invention is directly to be connected with base material, thus can firmly engage with base material, thus the fiduciary level of liquid crystal on silicon display panel of the present invention promoted.In addition because excimer laser has low wavelength and high-octane characteristic, therefore, its can be in the extremely short time both alignment layers in the fusion predeterminable area, and do not influence the both alignment layers of predeterminable area periphery.
Though disclosed the present invention in conjunction with above embodiment; yet it is not in order to limit the present invention; be familiar with this operator in the technical field under any; without departing from the spirit and scope of the present invention; can do a little change and retouching, thus protection scope of the present invention should with enclose claim was defined is as the criterion.
Claims (10)
1. the method for making of the substrate of a liquid crystal on silicon display panel comprises:
One base material is provided;
On this base material, form a both alignment layers;
One transparent panel and a photo mask layer are provided, this transparent panel has a relative first surface and a second surface, and this transparent panel comprises at least one projection, this projection protrudes in this first surface, and this photo mask layer is disposed on this second surface and has at least one opening to expose this second surface of part;
This transparent panel and this photo mask layer are disposed at this both alignment layers top, and make this projection towards this both alignment layers;
With this photo mask layer is that photomask carries out an excimer laser manufacture craft to this both alignment layers, so that excimer laser is shone by this opening and the part that is positioned at this opening below of this both alignment layers of fusion;
When being positioned at part below this opening and being in molten state of this both alignment layers, this transparent panel is moved towards this both alignment layers, and make this projection run through the part that is positioned at this opening below of this both alignment layers; And
Remove this transparent panel and this photo mask layer.
2. the method for making of the substrate of liquid crystal on silicon display panel as claimed in claim 1, wherein when carrying out this excimer laser manufacture craft, also comprise and make excimer laser shine the also part that is positioned at this opening below of this base material of fusion by this opening, and, make this projection run through this both alignment layers be positioned at part below this opening the time, also comprise this projection is inserted in this base material.
3. the method for making of the substrate of liquid crystal on silicon display panel as claimed in claim 1, wherein this opening is positioned at this projection top.
4. the method for making of the substrate of liquid crystal on silicon display panel as claimed in claim 1, wherein the material of this base material is monocrystalline silicon or glass.
5. the method for making of the substrate of liquid crystal on silicon display panel as claimed in claim 1, the height that protrudes in this first surface that wherein should projection is greater than the thickness of this both alignment layers.
6. the method for making of the substrate of liquid crystal on silicon display panel as claimed in claim 1, wherein the material of this both alignment layers comprises silicon dioxide.
7. the method for making of the substrate of liquid crystal on silicon display panel as claimed in claim 1, wherein this projection is an annular projection.
8. the method for making of the substrate of liquid crystal on silicon display panel as claimed in claim 1, wherein this opening is a circular opening.
9. the method for making of a liquid crystal on silicon display panel comprises:
One base material is provided;
On this base material, form a both alignment layers;
One transparent panel and a photo mask layer are provided, this transparent panel has a relative first surface and a second surface, and this transparent panel comprises at least one projection, and this projection protrudes in this first surface, and this photo mask layer is disposed on this second surface and has at least one opening should the surface to expose part;
This transparent panel and this photo mask layer are disposed at this both alignment layers top, and make this projection towards this both alignment layers;
With this photo mask layer is that photomask carries out an excimer laser manufacture craft to this both alignment layers, so that excimer laser is shone by this opening and the part that is positioned at this opening below of this both alignment layers of fusion;
When being positioned at part below this opening and being in molten state of this both alignment layers, this transparent panel is moved towards this both alignment layers, and make this projection run through the part that is positioned at this opening below of this both alignment layers, to form a groove that runs through this both alignment layers;
Remove this transparent panel and this photo mask layer;
Form a glue frame in this groove, this glue frame and this base material constitute a containing groove;
Configuration one subtend base material on this base material, wherein this glue frame is between this base material and this subtend base material, and this subtend base material covers this containing groove; And
In this containing groove, form a liquid crystal layer.
10. the method for making of liquid crystal on silicon display panel as claimed in claim 9, wherein this opening is positioned at this projection top.
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| Application Number | Priority Date | Filing Date | Title |
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| CN2010101136867A CN102147542B (en) | 2010-02-08 | 2010-02-08 | Method for producing silicon-based liquid crystal display panel and method for producing substrate thereof |
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| Application Number | Priority Date | Filing Date | Title |
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| CN2010101136867A CN102147542B (en) | 2010-02-08 | 2010-02-08 | Method for producing silicon-based liquid crystal display panel and method for producing substrate thereof |
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| CN102147542A true CN102147542A (en) | 2011-08-10 |
| CN102147542B CN102147542B (en) | 2012-07-25 |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102411227A (en) * | 2011-11-29 | 2012-04-11 | 深圳市华星光电技术有限公司 | Thin-film transistor array substrate, liquid crystal display device and manufacturing method thereof |
| CN103258478A (en) * | 2013-05-09 | 2013-08-21 | 友达光电(厦门)有限公司 | Substrate for displayer and display panel |
| CN103941478A (en) * | 2013-01-17 | 2014-07-23 | 立景光电股份有限公司 | Active array substrate and manufacturing method thereof |
| CN105445969A (en) * | 2014-09-30 | 2016-03-30 | 群创光电股份有限公司 | Display panel |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101344690B (en) * | 2007-07-10 | 2010-06-09 | 中华映管股份有限公司 | Production method of silicon based liquid crystal panel |
| US20090213315A1 (en) * | 2008-02-21 | 2009-08-27 | Himax Display, Inc. | Liquid crystal on silicon display panel and electronic device using the same |
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2010
- 2010-02-08 CN CN2010101136867A patent/CN102147542B/en active Active
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102411227A (en) * | 2011-11-29 | 2012-04-11 | 深圳市华星光电技术有限公司 | Thin-film transistor array substrate, liquid crystal display device and manufacturing method thereof |
| CN103941478A (en) * | 2013-01-17 | 2014-07-23 | 立景光电股份有限公司 | Active array substrate and manufacturing method thereof |
| CN103941478B (en) * | 2013-01-17 | 2016-12-28 | 立景光电股份有限公司 | Active array base plate and manufacture method thereof |
| CN103258478A (en) * | 2013-05-09 | 2013-08-21 | 友达光电(厦门)有限公司 | Substrate for displayer and display panel |
| CN103258478B (en) * | 2013-05-09 | 2015-04-15 | 友达光电(厦门)有限公司 | Substrate for displayer and display panel |
| CN105445969A (en) * | 2014-09-30 | 2016-03-30 | 群创光电股份有限公司 | Display panel |
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| Publication number | Publication date |
|---|---|
| CN102147542B (en) | 2012-07-25 |
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