CN102145897B - Large-pore-volume silicon dioxide with nanoparticle structure and preparation method thereof - Google Patents
Large-pore-volume silicon dioxide with nanoparticle structure and preparation method thereof Download PDFInfo
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- CN102145897B CN102145897B CN201110097369A CN201110097369A CN102145897B CN 102145897 B CN102145897 B CN 102145897B CN 201110097369 A CN201110097369 A CN 201110097369A CN 201110097369 A CN201110097369 A CN 201110097369A CN 102145897 B CN102145897 B CN 102145897B
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- silicon oxide
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- large aperture
- capacity silicon
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CN201110097369A CN102145897B (en) | 2011-04-19 | 2011-04-19 | Large-pore-volume silicon dioxide with nanoparticle structure and preparation method thereof |
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CN201110097369A CN102145897B (en) | 2011-04-19 | 2011-04-19 | Large-pore-volume silicon dioxide with nanoparticle structure and preparation method thereof |
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CN102145897A CN102145897A (en) | 2011-08-10 |
CN102145897B true CN102145897B (en) | 2012-10-24 |
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Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102989210A (en) * | 2011-09-14 | 2013-03-27 | 重庆工商大学 | Silica nanomaterial filter assembly for waste insulating oil |
CN102530970B (en) * | 2012-03-01 | 2014-02-19 | 冷水江三A化工有限责任公司 | Preparation method of toothpaste abrasive silicon dioxide |
CN105460940B (en) * | 2016-02-22 | 2017-05-31 | 冷水江三A新材料科技有限公司 | A kind of mesoporous pharmaceutical carrier silica and preparation method thereof |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3959174A (en) * | 1971-08-24 | 1976-05-25 | W. R. Grace & Co. | Method of selectively producing high pore volume silica gel |
CN1418811A (en) * | 2002-12-18 | 2003-05-21 | 天津化工研究设计院 | Macroporous precipitation silicon dioxide used for achromatic colours, and its prepn. method |
CN1730392A (en) * | 2005-06-16 | 2006-02-08 | 复旦大学 | Large aperture capacity silicon oxide vesicle, foamed material and process for preparing the same |
CN101112991A (en) * | 2006-07-24 | 2008-01-30 | 北京化工大学 | Method for preparing silicon dioxide with large pore volume and large aperture |
CN101837982A (en) * | 2010-03-19 | 2010-09-22 | 福建师范大学 | Method for preparing silicon dioxide aerogel powder |
CN102002120A (en) * | 2010-09-20 | 2011-04-06 | 中国海洋石油总公司 | Method for preparing special silica gel carrier with large pore volume and large specific surface area |
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2011
- 2011-04-19 CN CN201110097369A patent/CN102145897B/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3959174A (en) * | 1971-08-24 | 1976-05-25 | W. R. Grace & Co. | Method of selectively producing high pore volume silica gel |
CN1418811A (en) * | 2002-12-18 | 2003-05-21 | 天津化工研究设计院 | Macroporous precipitation silicon dioxide used for achromatic colours, and its prepn. method |
CN1730392A (en) * | 2005-06-16 | 2006-02-08 | 复旦大学 | Large aperture capacity silicon oxide vesicle, foamed material and process for preparing the same |
CN101112991A (en) * | 2006-07-24 | 2008-01-30 | 北京化工大学 | Method for preparing silicon dioxide with large pore volume and large aperture |
CN101837982A (en) * | 2010-03-19 | 2010-09-22 | 福建师范大学 | Method for preparing silicon dioxide aerogel powder |
CN102002120A (en) * | 2010-09-20 | 2011-04-06 | 中国海洋石油总公司 | Method for preparing special silica gel carrier with large pore volume and large specific surface area |
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CN102145897A (en) | 2011-08-10 |
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Owner name: LENGSHUIJIANG THREE A NEW MATERIALS TECHNOLOGY CO. Free format text: FORMER NAME: LENGSHUIJIANG SAN A CHEMICAL CO., LTD. |
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Address after: 417505 economic development zone, Lengshuijiang, Hunan, Loudi Patentee after: LENGSHUIJIANG SANA NEW MATERIAL TECHNOLOGY CO., LTD. Address before: 417505 economic development zone, Lengshuijiang, Hunan, Loudi Patentee before: Lengshuijiang San A Chemical Co., Ltd. |
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Effective date of registration: 20160309 Address after: 511400 exchange center, Tian An Science Park, No. 555, Panyu Road, Guangzhou Avenue, Guangdong 702, China Patentee after: Guangzhou Wei Wei Technology Group Co., Ltd. Address before: 417505 economic development zone, Lengshuijiang, Hunan, Loudi Patentee before: LENGSHUIJIANG SANA NEW MATERIAL TECHNOLOGY CO., LTD. |
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Address after: 511400 exchange center, Tian An Science Park, No. 555, Panyu Road, Panyu District Avenue, Guangzhou, Guangdong 702, China Patentee after: Guangzhou Lingwei Polytron Technologies Inc Address before: 511400 exchange center, Tian An Science Park, No. 555, Panyu Road, Guangzhou Avenue, Guangdong 702, China Patentee before: Guangzhou Wei Wei Technology Group Co., Ltd. |